Class / Patent application number | Description | Number of patent applications / Date published |
313231010 | FLUENT MATERIAL SUPPLY OR FLOW DIRECTING MEANS | 52 |
20090206721 | SYSTEM, METHOD AND APPARATUS FOR COUPLING A SOLID OXIDE HIGH TEMPERATURE ELECTROLYSIS GLOW DISCHARGE CELL TO A PLASMA ARC TORCH - The present invention provides a glow discharge cell comprising an electrically conductive cylindrical vessel having a first end and a second end, and at least one inlet and one outlet; a hollow electrode aligned with a longitudinal axis of the cylindrical vessel and extending at least from the first end to the second end of the cylindrical vessel, wherein the hollow electrode has an inlet and an outlet; a first insulator that seals the first end of the cylindrical vessel around the hollow electrode and maintains a substantially equidistant gap between the cylindrical vessel and the hollow electrode; a second insulator that seals the second end of the cylindrical vessel around the hollow electrode and maintains the substantially equidistant gap between the cylindrical vessel and the hollow electrode; a non-conductive granular material disposed within the gap, wherein the non-conductive granular material (a) allows an electrically conductive fluid to flow between the cylindrical vessel and the hollow electrode, and (b) prevents electrical arcing between the cylindrical vessel and the hollow electrode during a electric glow discharge; and wherein the electric glow discharge is created whenever: (a) the glow discharge cell is connected to an electrical power source such that the cylindrical vessel is an anode and the hollow electrode is a cathode, and (b) the electrically conductive fluid is introduced into the gap. | 08-20-2009 |
20140055024 | ION SOURCE DEVICES AND METHODS - An ion source includes a chamber defining an interior cavity for ionization, an electron beam source at a first end of the interior cavity, an inlet for introducing ionizable gas into the chamber, and an arc slit for extracting ions from the chamber. The chamber includes an electrically conductive ceramic. | 02-27-2014 |
313231110 | Lightning or surge arrester | 1 |
20160087409 | DEVICES AND METHODS RELATED TO GAS DISCHARGE TUBES - Disclosed are devices and methods related to gas discharge tubes (GDTs). In some embodiments, a plurality of GDTs can be fabricated from an insulator plate having a first side and a second side, with the insulator plate defining a plurality of openings. Each opening can be dimensioned to be capable of being covered by first and second electrodes on the first and second sides of the insulator plate to thereby define an enclosed gas volume configured for a GDT operation. | 03-24-2016 |
313231310 | Plasma | 45 |
20090066212 | Apparatus and Process for Generating, Accelerating and Propagating Beams of Electrons and Plasma - An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma. | 03-12-2009 |
20090146543 | PLASMA LAMP WITH DIELECTRIC WAVEGUIDE INTEGRATED WITH TRANSPARENT BULB - A dielectric waveguide integrated plasma lamp (DWIPL) with a body comprising at least one dielectric material having a dielectric constant greater than approximately 2, and having a shape and dimensions such that the body resonates in at least one resonant mode when microwave energy of an appropriate frequency is coupled into the body. A dielectric bulb within a lamp chamber in the body contains a fill which when receiving energy from the resonating body forms a light-emitting plasma. The bulb is transparent to visible light and infrared radiation emitted by the plasma. Radiative energy lost from the plasma is recycled by reflecting the radiation from thin-film, multi-layer coatings on bulb exterior surfaces and/or lamp chamber surfaces back into the bulb. The lamp further includes two- or three-microwave probe configurations minimizing power reflected from the body back to the microwave source when the source operates: (a) at a frequency such that the body resonates in a single mode; or (b) at one frequency such that the body resonates in a relatively higher mode before a plasma is formed, and at another frequency such that the body resonates in a relatively lower order mode after the plasma reaches steady state. | 06-11-2009 |
20090179545 | CERAMIC PLASMA REACTOR AND REACTION APPARATUS - The ceramic plasma reactor includes: a plurality of unit electrodes each of which comprises a plate-shaped ceramic dielectric body | 07-16-2009 |
20090200910 | Plasma generator and work processing apparatus provided with the same - A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated. | 08-13-2009 |
20100007262 | MATERIAL FOR ELECTRODES OF LOW TEMPERATURE PLASMA GENERATORS - The material contains a porous metal matrix impregnated with a material emitting electrons. The material uses a mixture of copper and iron powders as a porous metal matrix and a Group IIIB metal component such as Y | 01-14-2010 |
20100123381 | CATHODE DISCHARGE APPARATUS - A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels. | 05-20-2010 |
20100133979 | RC plasma jet and method - A resistor-capacitor (“RC”) plasma jet device, produces a safe plasma for human contact. In an example embodiment, the RC plasma jet device includes a power supply, a gas supply and an electrode. A working gas can be injected into the gas inlet of the electrode from the gas supply. The electrode, is connected to the power supply through a resistance and a capacitance. The electrode may be a hollow tube with a gas inlet and a gas outlet. The device can be portable, safe, easy to operate, and inexpensive. By changing the values of the capacitor (s) and resistor (s), and using different excitation sources and working gas, the intensity and gas temperature of the plasma jet can be adjusted. When the gas temperature is close to room-temperature, the plasma jet is touchable by a human hand without an arcing risk. The plasma can also be ejected to an open space by different geometric shapes or configuration in various directions and the device can be modified or applied to many large-scale applications at room-temperature and atmospheric pressure. | 06-03-2010 |
20100164353 | WIDE AREA ATMOSPHERE PRESSURE PLASMA JET APPARATUS - A wide area atmospheric pressure plasma jet apparatus including a transmission mechanism, a plasma housing and two plasma-generating devices is provided. The transmission mechanism includes a rotation output end that has a center axis. The plasma housing has an opening. The plasma housing further has a air-attracting hole near the rotation output end and extended from an outer wall of the plasma housing to the interior of the plasma housing, so that the heat of the plasma housing can be dissipated due to the generated gas circulation. The plasma-generating devices are disposed within the plasma housing and connected with the rotation output end. Each of the plasma-generating devices has a plasma nozzle located at the opening and tilts from the center axis. When the rotation output end drives the plasma-generating devices to rotate, two plasma beams are obliquely ejected from the plasma nozzle and the plasma processing area is increased. | 07-01-2010 |
20100277050 | PLASMA PROCESSING APPARATUS - The invention provides a plasma processing apparatus that can uniformly supply a gas between a cathode electrode and an anode electrode, even when areas of both electrodes are increased, and that can reduce thicknesses of both electrodes. | 11-04-2010 |
20110050076 | PLASMA GENERATOR FOR ELECTROTHERMAL-CHEMICAL WEAPON SYSTEM COMPRISING IMPROVED CONNECTORS, AND METHOD FOR PREVENTING THE ELECTRICAL CONTACT OF THE PLASMA GENERATOR FROM BEING BROKEN - The invention relates to a plasma generator ( | 03-03-2011 |
20110181169 | MICROCAVITY AND MICROCHANNEL PLASMA DEVICE ARRAYS IN A SINGLE, UNITARY SHEET - An array of microcavity plasma devices is formed in a unitary sheet of oxide with embedded microcavities or microchannels and embedded metal driving electrodes isolated by oxide from the microcavities or microchannels and arranged so as to generate sustain a plasma in the embedded microcavities or microchannels upon application of time-varying voltage when a plasma medium is contained in the microcavities or microchannels. | 07-28-2011 |
20110215705 | MICRO-CHIP PLASMONIC SOURCE - A surface plasmon polariton device that may be integrated onto a single microchip is disclosed. The device employs a laser that emits polarized light across a gap into a plasmonic waveguide. Surface plasmon polaritons are thereby created in an efficient matter. The device provides a source of surface plasmon polaritons at near infrared wavelengths in an integrated package. | 09-08-2011 |
20110298354 | PLASMA LAMP WITH SMALL POWER COUPLING SURFACE - In an example embodiment, an electrodeless plasma lamp is provided which comprises a dielectric body having an effective dielectric constant greater than two. The dielectric body may have a surface with a first region coated with an electrically conductive material and a second region that is not coated with the electrically conductive material. A bulb is located proximate to the second region of the dielectric body and having an outer surface area and the second region may have an uncoated surface area that is less than about sixty percent (60%) of the outer surface area of the bulb. A power source is coupled to the dielectric body to provide radio frequency power to the dielectric body at a frequency that resonates at a fundamental mode in the dielectric body. The bulb contains a fill that forms a plasma when the radio frequency power is provided from the dielectric body through the second region. | 12-08-2011 |
20120098405 | Method and system for introducing process fluid through a chamber component - A method and system for introducing a process fluid through a chamber component in a processing system is described. The chamber component comprises a chamber element having a first surface on a supply side of the chamber element and a second surface on a process side of the chamber element, wherein the process side is opposite the supply side. Furthermore, the chamber component comprises a conduit extending through the chamber element from the supply side to the process side, wherein the conduit comprises an inlet configured to receive a process fluid and an outlet configured to distribute the process fluid. | 04-26-2012 |
20120326592 | Transmission Line RF Applicator for Plasma Chamber - A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor. | 12-27-2012 |
20130015757 | MULTI-GRID ASSEMBLY IN PLASMA SOURCE SYSTEM AND METHODS FOR IMPROVING SAMEAANM Hegde; Hariharakeshava SarpangalaAACI FremontAAST CAAACO USAAGP Hegde; Hariharakeshava Sarpangala Fremont CA US - A plasma processing system with a multi-grid arrangement is provided. The system includes a plurality of grids, which includes at least a beam grid, a ground grid and a suppressor grid. The beam grid is positioned facing a plasma producing area, wherein the beam grid having similar electrical potential as a plasma. The ground grid is positioned to face a substrate during substrate processing and is configured to be electrically grounded. The suppressor grid is positioned between the beam grid and the ground grid and is configured to be negatively charged. The plurality of grids further includes a set of grid mounting posts configured for at least one of stabilizing said multi-grid arrangement, spatially separating adjacent grids, and fastening the plurality of grids into the multi-grid arrangement. | 01-17-2013 |
20130038199 | SYSTEM, METHOD, AND APPARATUS FOR MICROSCALE PLASMA ACTUATION - A device is provided having a flow passage with at least one surface and at least one electrode pair positioned thereon for effecting fluid flow through the flow passage. When at least one electrode of an electrode pair of the at least one electrode pair is powered, a sheath region is generated in the flow passage, wherein the sheath region has a high electric field relative to the remainder of the flow passage. In an embodiment, one electrode of the electrode pair is separated from the other electrode of the electrode pair by a horizontal, vertical, depth, and/or total distance of about 1 microns. | 02-14-2013 |
20130119854 | RADIO FREQUENCY (RF) POWER COUPLING SYSTEM UTILIZING MULTIPLE RF POWER COUPLING ELEMENTS FOR CONTROL OF PLASMA PROPERTIES - A radio frequency (RF) power coupling system is provided. The system has an RF electrode configured to couple RF power to plasma in a plasma processing system, multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on the RF electrode, and an RF power system coupled to the multiple power coupling elements, and configured to couple an RF power signal to each of the multiple power coupling elements. The multiple power coupling elements include a center element located at the center of the RF electrode and peripheral elements located off-center from the center of the RF electrode. A first peripheral RF power signal differs from a second peripheral RF power signal in phase. | 05-16-2013 |
20130147340 | DEVICE FOR PROVIDING A FLOW OF PLASMA - A device for forming at an ambient atmospheric pressure a gaseous plasma comprising active species for treatment of a treatment region. The device comprises a plasma cell for forming the gaseous plasma for treating the treatment region. The plasma cell comprises an inlet for receiving gas from a source and an outlet for discharging active species generated in the cell. A dielectric substrate made of a polyimide encloses the flow path for gas conveyed from the inlet to the outlet and an electrode is formed on the dielectric substrate for energising gas along the flow path to form the active species. A protective coating or lining is located on an inner surface of the dielectric substrate for resisting reaction of the active species generated in the plasma cell with the material of the dielectric substrate. | 06-13-2013 |
20130221833 | Transmission line RF applicator for plasma chamber - A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor. | 08-29-2013 |
20130334955 | PLASMA GENERATOR AND CLEANING/PURIFICATION APPARATUS USING SAME - A plasma generator includes: a liquid containing part containing water; a gas containing part; and a partition wall part that separates the liquid containing part and the gas containing part and is provided with a gas passage through which the gas in the gas containing part is led to the liquid containing part. The plasma generator is also provided with a first electrode arranged in the gas containing part and a second electrode arranged to be in contact with the liquid in the liquid containing part. The plasma generator is further provided with: a gas supply unit which supplies the gas to the gas containing part; a plasma power supply unit; and a projected part which serves as a drainage promotion part that prevents the liquid from remaining in the gas passage after the liquid in the liquid containing part is drained. | 12-19-2013 |
20140062285 | Method and Apparatus for a Large Area Inductive Plasma Source - A plasma source for providing dissociated gas to semiconductor process chamber is provided. The plasma chamber can have at least one gas inlet and at least one chamber wall for containing the gas, a plurality of magnetic cores disposed relative to the plasma chamber such that the plasma chamber passes through each of the plurality of magnetic cores. A primary winding can be coupled to the plurality of magnetic cores. The plasma chamber can generate a toroidal plasma along a plane extending through the plasma chamber and which is at least substantially parallel to a top surface of a sample holder disposed within the semiconductor process chamber. | 03-06-2014 |
20140117834 | PLASMA GENERATOR AND PLASMA GENERATING DEVICE - The plasma generator has the dielectric having the inner circumferential surface, and a pair of electrodes which are arranged separated from each other in the direction along the inner circumferential surface and are isolated from each other by the dielectric and which are capable of generating plasma on the inner circumferential surface by application of voltage. In the inner circumferential surface, at the positions between the pair of electrodes in a plan view, recessed portions causing electric field concentration are formed. | 05-01-2014 |
20140125215 | MICROWAVE RESONANT CAVITY - A microwave resonant cavity is provided. The microwave resonant cavity includes: a sidewall having a generally cylindrical hollow shape; a gas flow tube disposed inside the sidewall and having a longitudinal axis substantially parallel to a longitudinal axis of the sidewall; a plurality of microwave waveguides, each microwave waveguide having a longitudinal axis substantially perpendicular to the longitudinal axis of the sidewall and having a distal end secured to the sidewall and aligned with a corresponding one of a plurality of holes formed on the sidewall; a top plate secured to one end of the sidewall; and a sliding short circuit having: a disk slidably mounted between the sidewall and the gas flow tube; and at least one bar disposed inside the sidewall and arranged parallel to the longitudinal axis of the sidewall. | 05-08-2014 |
20140203702 | PLASMA PROCESSING APPARATUS - Disclosed is a plasma processing apparatus including a mounting table within a processing container. The mounting table includes a lower electrode. A shower head constituting an upper electrode is provided above the mounting table. A gas inlet tube is provided above the shower head. The shower head includes a plurality of downwardly opened gas ejection holes, and first and second separate gas diffusion chambers on the gas ejection holes. The first gas diffusion chamber extends along a central axis that passes through a center of the mounting table. The second gas diffusion chamber extends circumferentially around the first gas diffusion chamber. The gas inlet tube includes a cylindrical first tube wall and a cylindrical second tube wall provided outside the first tube wall, and defines a first gas inlet path inside the first tube wall, and a second gas inlet path between the first and second tube walls. | 07-24-2014 |
20140217881 | Plasma generator, manufacturing method of rotating electrode for plasma generator, method for performing plasma treatment of substrate, and method for forming thin film having mixed structure by using plasma - A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode on the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts. | 08-07-2014 |
20150305132 | BASIC ELECTROMAGNETIC FORCE FIELD - An electromagnetic force field configured to protect designated assets against incoming objects, comprising a plurality of layers, wherein the layers are a member of a group consisting of a supercharged plasma window, a curtain of high-energy laser beams arranged in a lattice-like configuration, and a carbon nanotube (CNT) layer, wherein the laser beams are positioned at equal distance between each other and as such as to ensure that at least four laser beams are in the path of the smallest object, and wherein, the CNT layer comprises a plurality of CNT sheets. | 10-22-2015 |
20150351212 | Coil Assembly for Plasma Generation - A coil assembly for generating plasma, is disclosed. The coil assembly includes a cylindrical coil having a cylindrical inner mesh, a cylindrical outer mesh and a cylindrical dielectric separating the inner and outer meshes, an insulating stand at each of the first and second end of the cylindrical coil configured for mounting the cylindrical coil in an elevated position, wherein supply of voltage to the inner and outer meshes generates plasma which is discharged from the outer mesh. | 12-03-2015 |
20150371829 | PLASMA GENERATOR - A large-sized plasma generator is suited to various surface shapes and has a longer service life and improved energy conservation. An example of the plasma generator ( | 12-24-2015 |
20160005588 | Plasma Light Source, Inspection Apparatus Including Plasma Light Source, and Method of Generating Plasma Light - A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed. | 01-07-2016 |
20160042924 | PLASMA GENERATION CHAMBER WITH SMOOTH PLASMA RESISTANT COATING - A faceplate or a selectivity modulation device (SMD) for a plasma generation chamber has a plasma resistant ceramic coating on a surface of the faceplate or SMD, wherein the plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%. | 02-11-2016 |
20160204281 | Energy storage device with large charge separation | 07-14-2016 |
313231410 | Arc discharge type | 13 |
20110018423 | INDIRECT HEATED CATHODE OF ION IMPLANTER - A proposed indirect heated cathode has an inner tubular shell inserted into an arc chamber for creating plasma by a filament, which is disposed in the inner tubular shell and then covered by an end cap. There are at least two outstanding talons disposed on the end surface of the inner tubular shell, and a step gap is configured on between the end surface of the inner tubular shell and the outstanding talons. The end cap can be lodged into the step gap, and fixed. Therefore, the end cap can be easily uncovered from the end of the inner tubular shell, as a result to simplify the replacement of the filament. | 01-27-2011 |
20120169208 | DEVICE AND METHOD FOR CIRCUIT PROTECTION - A device for diverting energy away from an electrical arc flash is provided. The device comprises an arc source configured to create a second arc flash, a plasma gun configured to inject plasma in proximity of the arc source in response to the arc flash, an arc containment device to house the arc source and the plasma gun, an exhaust port configured to route exhaust gases out of the device in a first direction, and an exhaust duct coupled in flow communication with the exhaust port, the exhaust duct comprising a substantially hollow tube including a first tube portion and a second tube portion, the first tube portion coupled in flow communication with the exhaust port, the second tube portion defining an exhaust vent and coupled in flow communication with the first tube portion to route the exhaust gases out of the device in a second direction. | 07-05-2012 |
20120267996 | CERAMIC ELECTRODE FOR GLIDING ELECTRIC ARC - A ceramic electrode for a gliding electric arc system. The ceramic electrode includes a ceramic fin defining a spine, a heel, and a tip. A discharge edge of the ceramic fin defines a diverging profile approximately from the heel of the ceramic fin to the tip of the ceramic fin. A mounting surface coupled to the ceramic fin facilitates mounting the ceramic fin within the gliding electric arc system. One or more ceramic electrodes may be used in the gliding electric arc system or other systems which at least partially oxidize a combustible material. | 10-25-2012 |
20130020926 | SOLID OXIDE HIGH TEMPERATURE ELECTROLYSIS GLOW DISCHARGE CELL AND PLASMA SYSTEM - The present invention provides a glow discharge cell comprising an electrically conductive cylindrical vessel having a first end and a second end, and at least one inlet and one outlet; a hollow electrode aligned with a longitudinal axis of the cylindrical vessel and extending at least from the first end to the second end of the cylindrical vessel, wherein the hollow electrode has an inlet and an outlet; a first insulator that seals the first end of the cylindrical vessel around the hollow electrode and maintains a substantially equidistant gap between the cylindrical vessel and the hollow electrode; a second insulator that seals the second end of the cylindrical vessel around the hollow electrode and maintains the substantially equidistant gap between the cylindrical vessel and the hollow electrode; a non-conductive granular material disposed within the gap, wherein the non-conductive granular material (a) allows an electrically conductive fluid to flow between the cylindrical vessel and the hollow electrode, and (b) prevents electrical arcing between the cylindrical vessel and the hollow electrode during a electric glow discharge; and wherein the electric glow discharge is created whenever: (a) the glow discharge cell is connected to an electrical power source such that the cylindrical vessel is an anode and the hollow electrode is a cathode, and (b) the electrically conductive fluid is introduced into the gap. | 01-24-2013 |
20140062286 | ION GENERATION METHOD AND ION SOURCE - An ion generation method uses a direct current discharge ion source provided with an arc chamber formed of a high melting point material, and includes: generating ions by causing molecules of a source gas to collide with thermoelectrons in the arc chamber and producing plasma discharge; and causing radicals generated in generating ions to react with a liner provided to cover an inner wall of the arc chamber at least partially. The liner is formed of a material more reactive to radicals generated as the source gas is dissociated than the material of the arc chamber. | 03-06-2014 |
20140097740 | PLASMA-GENERATING DEVICE - A plasma-generating device includes an anode plate and a cathode plate spaced apart from the anode plate. The cathode plate includes a substrate and a hybrid diamond layer formed on the substrate. The hybrid diamond layer includes ultra-nanocrystalline diamond grains, an amorphous carbon disposed among and bonded to the ultra-nanocrystalline diamond grains, micro-crystalline diamond grains disposed among the ultra-nanocrystalline diamond grains, and a graphite phase disposed among the ultra-nanocrystalline diamond grains. Each of the micro-crystalline diamond grains is surrounded by the graphite phase. | 04-10-2014 |
20140232255 | HIGH TEMPERATURE ELECTROLYSIS GLOW DISCHARGE DEVICE - A glow discharge cell includes an electrically conductive cylindrical vessel, a hollow electrode, a cylindrical screen, a first insulator, a second insulator and a non-conductive granular material. The hollow electrode is aligned with a longitudinal axis of the cylindrical vessel and extends at least from the first end to the second end of the cylindrical vessel. The hollow electrode has an inlet, an outlet, and a plurality of slots or holes. The cylindrical screen is aligned with the longitudinal axis of the cylindrical vessel and disposed between the hollow electrode and the cylindrical vessel to form a substantially equidistant gap between the cylindrical screen and the hollow electrode. The first insulator seals the first end of the cylindrical vessel around the hollow electrode. The second insulator seals the second end of the cylindrical vessel around the hollow electrode. The non-conductive granular material is disposed within the substantially equidistant gap. | 08-21-2014 |
20140306597 | PLASMA GENERATING APPARATUS - Disclosed herein is a plasma generating apparatus having excellent sterilization performance and deodorization performance together with high safety. The plasma generating apparatus includes a pair of electrodes formed with a dielectric film on at least one side of facing surfaces thereof, and serves to apply a predetermined voltage between the electrodes to discharge plasma, wherein the dielectric film has a relative dielectric constant of 20 to 200. | 10-16-2014 |
20150303034 | PLASMA DEVICE - A plasma device including a casing, a first electrode, a second electrode, a nozzle and a gas ejection port is provided. The casing has a first chamber. The first electrode is disposed within the first chamber and has a second chamber. The second electrode capable of rotating in relative to the casing has a third chamber connected with the second chamber. The second chamber and the third chamber are adapted for accommodating plasma formed between the first electrode and the second electrode. The nozzle and the gas ejection port are independently disposed at the bottom of the second electrode respectively, wherein the nozzle is configured to eject the plasma, and forms an included angle with or is spaced a distance apart from a rotating axis of the second electrode. The gas ejection port is configured to eject cold gas. | 10-22-2015 |
20160066403 | High Temperature Electrolysis Glow Discharge Device - A glow discharge cell includes an electrically conductive cylindrical vessel, a hollow electrode, a cylindrical screen, a first insulator, a second insulator and a non-conductive granular material. The hollow electrode is aligned with a longitudinal axis of the cylindrical vessel and extends at least from the first end to the second end of the cylindrical vessel. The hollow electrode has an inlet, an outlet, and a plurality of slots or holes. The cylindrical screen is aligned with the longitudinal axis of the cylindrical vessel and disposed between the hollow electrode and the cylindrical vessel to form a substantially equidistant gap between the cylindrical screen and the hollow electrode. The first insulator seals the first end of the cylindrical vessel around the hollow electrode. The second insulator seals the second end of the cylindrical vessel around the hollow electrode. The non-conductive granular material is disposed within the substantially equidistant gap. | 03-03-2016 |
313231510 | With tangential fluent supply | 2 |
20120025693 | ANODE OF AN ARC PLASMA GENERATOR AND THE ARC PLASMA GENERATOR - An anode of an arc plasma generator and the arc plasma generator are disclosed. The plasma generator is a multi-stage gas admission type arc plasma generator, and the plasma generator includes a cathode and an anode. The anode comprises at least two portions ( | 02-02-2012 |
20140021854 | PLASMA TORCH - A plasma torch includes an electrically conductive cylindrical vessel, a hollow electrode, a first insulator, a concentric reducer, a tangential inlet, an electrode housing and a first electrode. The hollow electrode is aligned with a longitudinal axis of the electrically conductive cylindrical vessel and extends into the electrically conductive cylindrical vessel. The first insulator seals the electrically conductive cylindrical vessel around the hollow electrode. A non-conductive granular material is disposed between the electrically conductive cylindrical vessel and the hollow electrode. The concentric reducer is disposed within the electrically conductive cylindrical vessel and extends from the electrically conductive cylindrical vessel to the hollow electrode. The electrode housing is connected to the electrically conductive cylindrical vessel. The first electrode is aligned with the longitudinal axis of the electrically conductive cylindrical vessel and extends through the electrode housing into the electrically conductive cylindrical vessel. | 01-23-2014 |
313231610 | Electromagnetic output (i.e., light) | 1 |
20090026911 | METHOD AND APPARATUS TO REDUCE ARCING IN ELECTRODELESS LAMPS - A lamp and methods of forming are shown. In one example, a dielectric layer is formed over a gap between conductors in a plasma lamp. Electric arcing is reduced or eliminated, thus allowing tighter gaps and/or higher voltages. In one example a glass frit method is used to apply the dielectric layer. A lamp is shown with a barrier layer that prevents tarnish such as tarnish from sulfur exposure. The barrier layer reduces or prevents degradation of the lamp due to conversion of a conductor material to non-conductive tarnish material. | 01-29-2009 |
313231710 | Arc discharge lamp or radiation source | 4 |
20130181598 | DISCHARGE ELEMENT AND METHOD OF MANUFACTURING THE SAME - A discharge element includes a first electrode that is made of a plastically-deformable conductive material and that has an internal space and an opening communicating with the internal space, a base that is made of an insulating material and that is air-tightly joined to the opening so that the internal space of the first electrode becomes an airtight space, and a second electrode that is made of a conductive material and that is inserted into the internal space via the base so as to form a spark gap between itself and the first electrode. Therefore, it is possible to provide the discharge element that realizes a high production yield, a simple structure, and a cost reduction and a simple manufacturing method of the discharge element. | 07-18-2013 |
20140103793 | ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT USING THE SAME - In this ion generation apparatus, tip end portions of needle electrodes are aligned in an X direction with being oriented in a Z direction, and protrude from a casing. A protective cover covers the tip end portions of the needle electrodes. The protective cover is provided with holes opened to allow tip ends of the needle electrodes to be seen from the Z direction, and an opening opened to allow the needle electrodes to be seen from a Y direction. Therefore, ions generated at the tip end portions of the needle electrodes can be emitted efficiently out of the casing. Further, a user can be prevented from touching the tip end portion of the needle electrode and injuring his or her finger or the like. | 04-17-2014 |
20140117835 | IONIZATION CHAMBER WITH BUILT-IN TEMPERATURE SENSOR - The present disclosure relates to an ionization chamber with a built-in temperature sensor, which is especially adapted for devices, such as X-ray units, gamma irradiators and linear accelerators, whichever is used for performing radiation dose output measurement accordingly. In an embodiment, the ionization chamber comprises: a cavity, an inner electrode, a chamber wall, an outer electrode, a guard electrode and a calibrated temperature sensor for detecting real-time temperature inside the cavity of ionization chamber to be used in the correction process of radiation dose measurement signals. With the aforesaid device, not only the accuracy of measurement can be improved effectively, but also the time consumed in a radiation dose measurement period can be reduced greatly since it will no longer bear the disadvantage that the radiation dose measurement has to wait until the temperatures inside and outside the cavity of ionization chamber had reached a thermal equilibrium before the measurement. | 05-01-2014 |
20140319994 | Flourine and HF Resistant Seals for an Ion Source - An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. Electrically insulating seal element(s) engaging an outer surface of the arc chamber body are provided for impeding material from exiting the chamber interior openings of the arc chamber body. The seal element(s) have a ceramic body that includes an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall. The electrically insulating seal element comprises a Boron Nitride (BN) material. | 10-30-2014 |