| Entries |
| Document | Title | Date |
|---|
| 20080230958 | In-Mould Coating Method and Device for the Same - An in-mould coating method and a coating device for the same, wherein the inserts in the mould of the coating device are made of transparent material and are each coated with reflective material. In each insert are installed light generators, light sensors, cameras, etc. The coating method comprises the steps of: closing the mould after placing a semi-finished product formed by injection molding or other processes in the mould; injecting liquid lacquer or other liquid coating material, and using the cameras to monitor filling; and after finishing filling, starting the light generators and utilizing the light sensors to monitor the amount of light irradiated on the injected liquid lacquer or other liquid coating materials in such a manner that the injected liquid lacquer or other liquid coating materials is hardened to form a coating film on the surface of the semi-finished product. | 09-25-2008 |
| 20090001634 | Fine resist pattern forming method and nanoimprint mold structure - A light-transmitting mold structure having a mold pattern corresponding to a portion to form a pattern by nanoimprint and a conductive film pattern corresponding to a portion to form a pattern by nonadiabatic near-field exposure is used to irradiate UV light from a back surface of the mold structure and to perform nonadiabatic near-field light exposure in an imprint process so that all patterns having various sizes for simulating various designs can be faithfully transferred by a single imprint process (imprint & UV exposure). | 01-01-2009 |
| 20090140468 | PROCESS FOR PRODUCING MOLD - To provide a process for producing a hollow cylindrical or solid cylindrical mold having a seamless patterned layer comprising a fluoropolymer. | 06-04-2009 |
| 20090166931 | PROCESS FOR MANUFACTURING KEYPAD MODULES OF NON-BACKLIGHTED PANELS - A manufacturing process for a keypad module includes the steps of: providing an opaque layer, one side of the opaque layer having symbol regions; providing a mold formed thereon with a planar recession and a plurality of pits for forming keys; injecting a gel-like ultraviolet curable resin into the planar recession and pits of the mold; adhering the surface of the opaque layer having the symbol regions on the planar recession of the mold so as to contact the ultraviolet curable resin; irradiating the mold with an ultraviolet light so as to cure the ultraviolet curable resin; and taking out the opaque layer and the cured ultraviolet curable resin to obtain a keypad module. | 07-02-2009 |
| 20090174121 | In-Mold Lamination Of Decorative Products - A method of manufacturing decorative plastic composites having a decorative layer, a backing layer and a clear outer layer which provides exceptional “depth of image” is disclosed. Decorative or protective appliqués' having a wide range of decorative patterns may be formed by injection molding a backing layer behind and a clear outer layer on the top surface of a thin foil, film, fabric or veneer. A method is also disclosed for coating the exposed surface of the decorative layer between injection of the backing and outer layers to impart a desired visual effect or repair the surface. Use of multiple layers of decorative film, clear plastic and colored/opaque plastic is also disclosed to provide distinguishing visual effects. | 07-09-2009 |
| 20090189316 | METHOD FOR MANUFACTURING KEYPAD HAVING THREE-DIMENSIONAL PATTERNS - In a method for manufacturing keypad having three-dimensional patterns, curable resin is filled in a mold, and a ultra-violet lamp irradiates the curable resin, thereby curing the resin. A plurality of different materials is overlapped with each other, and a coating layer is coated on the surface of each three-dimensional pattern, thereby manufacturing a key having three-dimensional patterns. Via the above arrangement, the recognition and aesthetic feeling of each three-dimensional pattern can be increased. | 07-30-2009 |
| 20090189317 | METHOD OF FORMING RESIST PATTERN BY NANOIMPRINT LITHOGRAPHY - A method of forming a resist pattern of high aspect ratio excelling in etching resistance by the use of nanoimprint lithography. The method of forming a resist pattern by nanoimprint lithography comprises the steps of disposing organic layer ( | 07-30-2009 |
| 20090194913 | Method of micro/nano imprinting - Disclosed is a method of micro/nano imprinting, which applies soft mold, pre-shaping sealing film, and soft holder arrangements to the micro/nano structure imprinting process of the curved substrates. The method of the present invention can prevent the curved surface from crumbling, which may result from high gas pressuring, and can obtain uniform imprinting pressure distribution throughout the whole curved substrate. Moreover, replicating micro/nano structures onto double-sided curve, both convex and concave, surfaces can also be achieved. | 08-06-2009 |
| 20090230594 | IMPRINT METHOD AND MOLD - An imprint method of, in a state in which an indented surface of a mold comes in contact with a to-be-transferred surface of a to-be-transferred object, irradiating with electromagnetic waves to soften the to-be-transferred surface, and transferring an indented shape of the indented surface to the to-be-transferred surface, includes a heating layer forming step of forming, on the indented surface, a heating layer which absorbs the electromagnetic waves and generates heat; and a softening step of irradiating the heating layer with the electromagnetic waves, through the mold or the to-be-transferred object, at least one of the mold and the to-be-transferred object being made of a material which transmits the electromagnetic waves, causing the heating layer to generate heat, and softening the to-be-transferred surface. | 09-17-2009 |
| 20090243157 | Antibiotic Laminating Film - An antibiotic film is preferably comprised of a base adhesive layer of Ethylene Vinyl Acetate (EVA), a second layer of Polyethylene Terephthalate (PET), and a final layer of an antibiotic, preferably a zeolite contained in a water-based acrylic coating. The film is applied to a laminate using the inventive method. The laminate may be applied to printed items such as menus, placemats, posters, decontamination materials, and medical documentation. | 10-01-2009 |
| 20090256287 | UV Curable Silsesquioxane Resins For Nanoprint Lithography - Radiation-curable silsesquioxane resin materials are employed for micro- and nanolithography. The resin materials can include a radiation-curable silsesquioxane resin and a photo-initiator having low viscosity. The low viscosity of the liquid system allows imprinting with low pressure and low temperature; e.g. room temperature. The resist's dry etching resistance is increased and the cured film is more easily separated from the mask. Due to its high modulus after cure, the material allows the fabrication of micro- and nano-features having high aspect ratios while providing a high throughput. Various pattern sizes, for example, ranging from tens of microns to as small as a few nanometers, may be achieved with the UV-curable material system. | 10-15-2009 |
| 20090267270 | PROCESS FOR PRODUCING FILM WITH CONCAVO-CONVEX PATTERN - The present invention provides a process for producing a concavo-convex pattern film which excels in its peelability from an embossing roll and in coatability of an anti-reflection layer, etc. There is provided a process of producing a concavo-convex pattern film by forming a concavo-convex pattern on the surface of a transparent resin film employing an embossing roll having on the surface a convex-concavo pattern, characterized in that the embossing roll is made of glass and a photocatalyst layer is provided on the surface of the embossing roll, characterized in that the process comprises the steps of introducing a UV curable resin composition between the embossing roll and a transparent resin film provided around the embossing roll to form a UV curable resin layer, exposing the UV curable resin layer to UV rays to form a UV cured resin layer having on the surface a concavo-convex pattern, the UV rays being emitted from the interior of the embossing roll, and peeling the UV cured resin layer together with the transparent resin film from the embossing roll. | 10-29-2009 |
| 20090283937 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD - A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns. | 11-19-2009 |
| 20090283938 | IMPRINT APPARATUS, IMPRINT METHOD, AND MOLD FOR IMPRINT - An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold. | 11-19-2009 |
| 20090289395 | METHOD FOR MANUFACTURING SURFACE ACOUSTIC WAVE DEVICE - A method for manufacturing a surface acoustic wave device comprises depositing a detecting material layer on a substrate, forming a predetermined pattern on the detecting material layer using a nanoimprint method to obtain a detecting film with a predetermined pattern formed thereon, and forming an input interdigital transducer and an output interdigital transducer on two opposite sides of the detecting material layer on the substrate, thus obtaining a surface acoustic wave device comprising the detecting film. | 11-26-2009 |
| 20100038827 | Interferometric Analysis Method for the Manufacture of Nano-Scale Devices - The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape. | 02-18-2010 |
| 20100072672 | UV NANOIMPRINT LITHOGRAPHY PROCESS AND APPARATUS - A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps. | 03-25-2010 |
| 20100109205 | PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES - An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance. | 05-06-2010 |
| 20100117268 | FINE MOLD AND METHOD FOR REGENERATING FINE MOLD - A fine mold comprises a regeneration target film forming a convex part of a formation surface, and a light shielding unit that is configured deeper than a bottom of the formation surface and that regenerates the regeneration target film. A manufacturing cost of a product having a three-dimensional structure can be reduced. | 05-13-2010 |
| 20100140851 | In-Mould Coating Method - An in-mould coating method and a coating device for the same, wherein the inserts in the mould of the coating device are made of transparent material and are each coated with reflective material. In each insert are installed light generators, light sensors, cameras, etc. The coating method comprises the steps of: closing the mould after placing a semi-finished product formed by injection molding or other processes in the mould; injecting liquid lacquer or other liquid coating material, and using the cameras to monitor filling; and after finishing filling, starting the light generators and utilizing the light sensors to monitor the amount of light irradiated on the injected liquid lacquer or other liquid coating materials in such a manner that the injected liquid lacquer or other liquid coating materials is hardened to form a coating film on the surface of the semi-finished product. | 06-10-2010 |
| 20100156006 | METHOD AND APPARATUS FOR IMPRINTING ENERGY RAY-SETTING RESIN, AND DISCS AND SEMICONDUCTOR DEVICES WITH IMPRINTED RESIN LAYER - Disclosed herein is a method for transferring a pattern of minute dents and projections to an energy ray-setting resin layer coated on a substrate plate by pressing a master pattern on a transfer mold, followed by irradiation of energy rays. The pattern transfer method comprises the steps of pressing a master pattern on a transfer mold against the resin layer under a predetermined imprinting pressure, irradiating the resin layer under the imprinting pressure with energy rays, interrupting the irradiation of energy rays and at the same time cancelling application of the imprinting pressure and holding the resin layer and the transfer mold in a non-pressed state to relieve the resin layer of internal stresses, and recommencing irradiation of the resin layer with energy rays to complete hardening of the resin layer which is held in contact with the transfer mold in a non-pressed state. | 06-24-2010 |
| 20100207301 | METHOD OF FORMING FINE CHANNEL USING ELECTROSTATIC ATTRACTION AND METHOD OF FORMING FINE STRUCTURE USING THE SAME - A method of forming micro/nano channels and a method of forming micro/nano structures are provided which can easily form micro- and nano-sized channels and structures through simple processes. UV curable polymer patterns are formed on a first substrate, and the UV curable polymer patterns and a second substrate are sealed together by an electrostatic attraction. Then, a channel is formed by irradiating UV light. Also, after reversibly sealing the polymer patterns and a third substrate, prepolymer patterns are formed on the third substrate by flowing prepolymer. Then, the third is removed to form a fine structure. The nano-sized channels as well as the micro-sized channels can be formed through the substantially equal processes. Also, the reversible sealing or the irreversible sealing can be freely selected according to the coating of the curable polymer and UV irradiation time. | 08-19-2010 |
| 20100213642 | RESIN STAMPER MOLDING DIE AND METHOD FOR MANUFACTURING RESIN STAMPER USING THE SAME - According to one embodiment, the present invention provides a resin stamper injection molding die including a fixed side template having a metal stamper mounting surface mirror-ground in a random direction, a metal stamper having a front surface with recesses and protrusions and a back surface mirror-ground in a random direction, and a moving side template. The metal stamper has a surface roughness of 0 to 50 nm. The metal stamper mounting surface has a surface roughness of 0 to 1.0 nm, and has a coefficient of static friction of at most 0.20 with respect to the second main surface of the metal stamper. | 08-26-2010 |
| 20100230864 | Nanoimprint Lithography Template and Method of Fabricating Semiconductor Device Using the Same - Nanoimprint lithography templates and methods of fabricating semiconductor devices using the nanoimprint lithography templates are provided. The nanoimprint lithography template includes a transparent substrate having a first refractive index, a stamp pattern on a surface on the transparent substrate and having inclined sidewalls, and a coating layer formed on the inclined sidewalls of the stamp pattern, the coating layer having a second refractive index higher than the first refractive index. | 09-16-2010 |
| 20100244328 | CURABLE COMPOSITION FOR PHOTOIMPRINT, AND METHOD FOR PRODUCING CURED PRODUCT USING SAME - A curable composition for photoimprints comprising a photopolymerizable monomer, a polymerization initiator and a compound of the following formula (1), wherein the content of compounds having a molecular weight of at least 1000 is at most 10% by mass of all the solid content therein, and the content of the compound of the formula (1) is from 0.3 to 10.0% by mass of all the solid content therein: | 09-30-2010 |
| 20100252960 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography apparatus is disclosed that includes a first imprint template provided with pattern recesses and a second imprint template provided with pattern recesses, wherein the pattern recesses of the first imprint template are configured to form features on a substrate which interconnect laterally with features formed by the pattern recesses of the second imprint template, and wherein the pattern recesses of the second imprint template have a critical dimension which is three or more times greater than the critical dimension of the pattern recesses of the first imprint template. | 10-07-2010 |
| 20100264567 | APPARATUS FOR FIXING PLASTIC SHEET AND METHOD OF FABRICATING NANO PATTERN ON PLASTIC SHEET USING THE SAME - There are provided an apparatus for fixing a plastic sheet which fixes a plastic sheet to fabricate a nano pattern and a method of fabricating a nano pattern on a plastic sheet using the same. The apparatus for fixing a plastic sheet includes: a pair of planar metal guide rings interposingly fixing a plastic sheet from above and below, respectively; and a sheet fixing chuck including: a ring fixer sucking the pair of planar metal guide rings through a vacuum groove to be fixed thereto; and a sheet fixer having a plurality of vacuum pin holes formed therein, the vacuum pin holes sucking a bottom of the plastic sheet fixed by the planar metal guide rings. The apparatus allows fabrication of the nano pattern on the plastic sheet having less roughness than that of a semiconductor substrate or a glass substrate. | 10-21-2010 |
| 20100276845 | PROCESS FOR PRODUCING LINEAR PROFILES - The invention relates to a method for producing extruded profiled elements ( | 11-04-2010 |
| 20100289187 | Film for insert injection molding and insert injection molding method using the same - Disclosed herein are a film for insert injection molding and an insert injection molding method using the same. The film has a symmetrical structure about a thin metallic base film. Such a structure realizes superior appearance and reliability. | 11-18-2010 |
| 20110037201 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography method is disclosed for forming a patterned layer from a UV-curable, imprintable liquid medium on a substrate by means of an imprint template with a patterned surface. The method involves bringing together the patterned surface and the UV-curable medium for a filling period, illuminating the UV-curable medium with UV-radiation for an illumination period, holding the patterned surface and the UV-curable imprintable liquid medium together for a holding period such that the UV-curable medium has formed a self-supporting patterned layer, and separating the patterned surface and the patterned layer at the end of the holding period. The start time of the illumination period is earlier than the end time of the filling period by a pre-cure period. Also, a method is disclosed where the end time of the illumination period is earlier than the end time of the holding period. | 02-17-2011 |
| 20110042862 | Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography - Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes. | 02-24-2011 |
| 20110062635 | Stimuli-responsive surfaces and related methods of fabrication and use - Biomimetic stimuli-responsive surfaces and articles of manufacture, together with methods of fabrication and related methods of use. | 03-17-2011 |
| 20110068510 | IMPRINT LITHOGRAPHY METHOD AND APPARATUS - An imprint lithography method is disclosed that includes bringing an imprint template into contact with imprintable medium provided on a substrate, and directing actinic radiation at the imprintable medium, the actinic radiation being oriented such that it is not perpendicularly incident upon a patterned surface of the imprint template. | 03-24-2011 |
| 20110079939 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed. | 04-07-2011 |
| 20110187028 | Blow Molded Liner for Overpack Container and Method of Manufacturing the Same - The present disclosure relates to flexible, three-dimensional injection blow molded or injection stretch blow molded liners for use in overpacks, bottles, containers, etc. and methods for manufacturing the same. A method for manufacturing a liner may include injecting a polymeric material into a preform mold die to form a preform, blow molding the preform to form the liner, collapsing the liner and positioning the liner in an overpack, and inflating the liner. A fluoropolymer may be used for the preform. A liner may comprise a flexible body that substantially conforms to the interior of an overpack and a fitment port integral with the flexible body. The flexible body may be adapted to be removably inserted into the overpack by collapsing the flexible body, inserting the flexible body into the overpack, and re-inflating the flexible body inside the overpack. The flexible body may comprise a fluoropolymer and may comprise multiple layers. | 08-04-2011 |
| 20110210480 | Nanostructures with anti-counterefeiting features and methods of fabricating the same - Embodiments of the invention relate to methods of anti-counterfeiting for nanostructures and nanostructured devices. Specifically we describe a method of embedding a coded micro- or nanopatterns in nanostructures fabricated using Near-field rolling mask lithography, where areas of such features can be embedded into a transparent cylindrical or conic frame, or fabricated on the surface of flexible film laminated on the surface of the frame. Alternatively, specific coded nanofeatures distribution can be created using modulation of intensity or wavelength of the light source along the width or length of such cylinder or cone, or modulation of flexible film thickness or contact pressure between the rotatable mask and a substrate. | 09-01-2011 |
| 20110241261 | Methods for Polymerizing Films In-Situ Using a Radiation Source - A method for formation of a polymer film in-situ according to the invention comprises steps of: providing a polymerizable composition in one or multiple parts; prior to completion of polymerization of the polymerizable composition, forming a film therefrom; and initiating polymerization of the polymerizable composition using a radiation source to form the polymer film. | 10-06-2011 |
| 20110291330 | REPLICATION METHOD AND ARTICLES OF THE METHOD - A lamination or replication method for making an article having a structured solid layer, including:
| 12-01-2011 |
| 20110298159 | IMPRINTING APPARATUS AND IMPRINTING METHOD USING THE SAME - Disclosed is an imprinting apparatus and imprinting method using the same that prevent a process of forming a pattern on a substrate from being affected by flatness of a stage. The imprinting apparatus comprises a chamber unit in which a process of forming a pattern on a substrate is carried out; a stage for supporting the substrate on which a resin layer is formed; an installing member positioned above the stage and having a mold member attached to transform the resin layer so as to form the pattern on the substrate; and a first spraying unit for spraying fluid to separate the substrate supported by the stage from the stage, wherein the installing member moves the mold member in the direction getting near to the substrate separated from the stage so that the mold member and the resin layer are brought into contact with each other. | 12-08-2011 |
| 20120013045 | MATTE LAMINATE FILM - A matte laminate film comprising a transparent resin film substrate and a matte layer formed on at least one surface of the transparent resin film substrate, in which the transparent resin film substrate is a laminate film comprising a layer (A) formed of a polycarbonate resin and a layer (B) formed of a methacrylic resin which is laminated on at least one surface of the layer (A). The matte laminate film is preferably used as a decorative film having good resistance to whitening and high mechanical properties and surface hardness. | 01-19-2012 |
| 20120043702 | PROCESSING METHOD FOR IN-MOLD COATING INTEGRATIVE SYSTEM - A processing method for in-mold coating integrative system is used in cooperation with an injection molding machine. The injection molding machine comprises a rotatable work platform and a combination of at least one male mold and at least two female molds. The rotatable work platform is divided averagely into several work areas, and the processing proceeds sequentially in each work area by the rotation of the rotatable work platform. The processing method comprises following steps: injection molding a solid workpiece firstly, and leaving the solid work-piece on the male mold; rotating the rotatable work platform; performing surface coloring; rotating the rotatable work platform; injecting UV top-coat, the top-coat female mold is made of light-directing material and has a die cavity and a UV paint cavity on the surface of the solid workpiece, and a UV top-coat layer is injected into the UV paint cavity through a paint channel; irradiating the UV top-coat layer by a UV top-coat hardening lamp; and demolding to achieve a finished product. The method is of benefit to mass production, and can reduce labor cost and processing cost. | 02-23-2012 |
| 20120061881 | Fabrication Method of Flexible Devices - Disclosed is a method of fabricating a flexible device, which includes surface-treating one or both sides of a carrier plate so that regions with different surface-treatments are formed on the same side of the carrier plate, forming a glass-filler reinforced plastic substrate film on the surface-treated carrier plate, forming thin film patterns on the glass-filler reinforced plastic substrate film, and separating the glass-filler reinforced plastic substrate film having the thin film patterns formed thereon from the carrier plate, and in which the surface-treating of the carrier plate enables the glass-filler reinforced plastic substrate film to be easily separated from the carrier plate without an additional process such as using a solvent or a laser release technique. | 03-15-2012 |
| 20120080824 | CAST POLYURETHANE AND POLYUREA COVERS FOR GOLF BALLS - Compositions for golf balls that include thermoset polyurethane and/or thermoset polyurea In particular, the compositions of the invention, which are based on a polyurethane and/or polyurea, have improved crosslink density and hardness from crosslinking after the curative step. | 04-05-2012 |
| 20120080825 | IMPRINTING LITHOGRAPHY APPARATUS AND IMPRINTING LITHOGRAPHY METHOD - According to one embodiment, an imprint lithography apparatus includes an arithmetic unit calculating a mixing ratio of a demolding agent and a resist to be contained in a pattern forming agent on a basis of a pattern size formed on a template, a mixer mixing the resist and the demolding agent, a nozzle dropping the pattern forming agent on a substrate from the mixer, and an irradiation apparatus irradiating the pattern forming agent dropped on the substrate with light after pressing the template onto the pattern forming agent. | 04-05-2012 |
| 20120080826 | RESIN COMPOSITION FOR NANOIMPRINT, AND METHOD FOR FORMING STRUCTURE - A resin composition for nanoimprint includes a cationically polymerizable compound that has crystalline characteristics and is solid at ordinary temperature, and a photo cationic polymerization initiator. | 04-05-2012 |
| 20120133084 | Method of processing a substrate - In a method of processing a substrate in accordance with an embodiment, a trench may be formed in the substrate, imprint material may be deposited at least into the trench, the imprint material in the trench may be embossed using a stamp device, and the stamp device may be removed from the trench. | 05-31-2012 |
| 20120175820 | DIGITALLY PREPARED STAMP MASTERS AND METHODS OF MAKING THE SAME - Positive and negative stamp masters derived from UV curable ink molds comprising ultraviolet (UV) curable inks and methods for digitally preparing those stamp masters. In particular, the digitally prepared molds provide a method of printing micropatterns of fine variable features or images in a more efficient manner than the methods currently available. | 07-12-2012 |
| 20120175821 | PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING MOLDED PRODUCT WITH FINE PATTERN - To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. | 07-12-2012 |
| 20120205838 | DEVICE AND METHOD FOR TRANSFERRING MICRO STRUCTURE - A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source. | 08-16-2012 |
| 20120228804 | NEAR-FIELD EXPOSURE MASK, RESIST PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, NEAR-FIELD EXPOSURE METHOD, PATTERN FORMING METHOD, NEAR-FIELD OPTICAL LITHOGRAPHY MEMBER, AND NEAR-FIELD NANOIMPRINT METHOD - A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials. | 09-13-2012 |
| 20120256354 | METHODS AND MATERIALS FOR FABRICATING MICROFLUIDIC DEVICES - Materials and Methods are provided for fabricating microfluidic devices. The materials include low surface energy fluoropolymer compositions having multiple cure functional groups. The materials can include multiple photocurable and/or thermal-curable functional groups such that laminate devices can be fabricated. The materials also substantially do not swell in the presence of hydrocarbon solvents. | 10-11-2012 |
| 20120274002 | METHOD FOR MANUFACTURING SEAMLESS BELT FOR ELECTROPHOTOGRAPHY - A method capable of efficiently manufacturing a high-quality seamless belt for electrophotography is provided. The method is a method for manufacturing a seamless belt for electrophotography including a base layer having a thermoplastic resin composition, and a surface layer, wherein the method includes: (1) forming an energy curable coated film having a glass transition temperature on an outer surface of a test tube-shaped preform including a thermoplastic resin; then blow molding the preform to obtain a blow bottle; (2) irradiating the blow bottle with an energy ray to cure the coated film to thereby form the surface layer; and (3) cutting out a seamless belt from the blow bottle obtained in (2) and having a surface layer. | 11-01-2012 |
| 20120299222 | METHOD AND DEVICE FOR FULL WAFER NANOIMPRINT LITHOGRAPHY - The present application relates to a full wafer nanoimprint lithography device comprises a wafer stage, a full wafer coated with a liquid resist, a demolding nozzle, a composite mold, an imprint head, a pressure passageway, a vacuum passageway and a UV light source. The present application also relates to an imprinting method using the full wafer nanoimprint lithography device comprises the following steps: 1) a pretreatment process; 2) an imprinting process; 3) a curing process; and 4) a demolding process. The device and the method can be used for high volume manufacturing photonic crystal LEDs, nano patterned sapphire substrates and the like in large scale patterning on the non-planar surface or substrate. | 11-29-2012 |
| 20120313296 | COMPONENT PROTECTIVE OVERMOLDING - Techniques for component protective overmolding include selectively applying a protective material substantially over one or more elements coupled to a framework, forming an inner molding substantially over the framework, the one or more electrical elements coupled to the framework, and the protective material. In some examples, the inner molding is formed after the protective material has been selectively applied, forming an outer molding substantially over the inner molding and the outer molding is configured to protect the framework and to provide a surface configured to receive a pattern. Further, the outer molding may be configured to be removable if a defect is found during an inspection performed after the outer molding is formed. | 12-13-2012 |
| 20130020741 | IMPRINT METHOD AND IMPRINT SYSTEM - According to one embodiment, an imprint method comprises coating a photo-curable organic material on a film to be processed, bringing a concave-convex pattern of a template into contact with the photo-curable organic material, applying a force to the template in such a state that the template is brought into contact with the photo-curable organic material, curing the photo-curable organic material by irradiating light onto the photo-curable organic material, in such a state that the template is brought into contact with the photo-curable organic material, and releasing the template from the photo-curable organic material after the light irradiation. The force applied to the template corresponds to a gap between a surface of the film to be processed and the template. | 01-24-2013 |
| 20130140744 | METHOD FOR PRODUCING PRODUCT HAVING UNEVEN MICROSTRUCTURE ON SURFACE THEREOF - A method for producing a product having an uneven microstructure on a surface thereof includes: a step (I) which treats a surface of a roll mold ( | 06-06-2013 |
| 20130187312 | NANOIMPRINT LITHOGRAPHY - The present invention relates to a nanoimprint lithography method. Said nanoimprint lithography method comprises: a preparation step during which a resin ( | 07-25-2013 |
| 20130264747 | SELF-ASSEMBLY PATTERNING OF ORGANIC MOLECULES ON A SURFACE - The embodiments disclosed herein include all-electron control over a chemical attachment and the subsequent self-assembly of an organic molecule into a well-ordered three-dimensional monolayer on a metal surface. The ordering or assembly of the organic molecule may be through electron excitation. Hot-electron and hot-hole excitation enables tethering of the organic molecule to a metal substrate, such as an alkyne group to a gold surface. All-electron reactions may allow a direct control over the size and shape of the self-assembly, defect structures and the reverse process of molecular disassembly from single molecular level to mesoscopic scale. | 10-10-2013 |
| 20130270746 | APPARATUS AND METHOD FOR MAKING AN OBJECT - An apparatus ( | 10-17-2013 |
| 20130307195 | CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE CURABLE COMPOSITION - The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. The curable composition for transfer materials comprises a silsesquioxane skeleton-containing compound having, in its molecule, a specific silsesquioxane skeleton and a curable functional group. | 11-21-2013 |
| 20140027955 | IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - An imprint apparatus performs includes an irradiation unit which irradiates a resin on a substrate with light, and a control unit which controls the irradiation unit. The imprinting is performed in an edge shot region, including an edge of the substrate, of a plurality of shot regions on the substrate. The edge shot region includes a pattern forming region where a pattern is to be formed, and a near-edge region closer to a side of the edge than the pattern forming region, and the control unit controls the irradiation unit to irradiate the resin which spreads from a position on the pattern forming region to a position on the near-edge region as the pattern surface comes into contact with the resin in the pattern forming region. | 01-30-2014 |
| 20140061975 | Process and Apparatus for Ultraviolet Nano-Imprint Lithography - A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process. | 03-06-2014 |
| 20140077418 | Method for Preparing Article Having Uneven Microstructure on Surface Thereof - A method for preparing an article having an uneven microstructure on a surface thereof, including coating a surface of a mold having an uneven microstructure formed from an anodized alumina oxide on a surface with a release treatment solution including a mold release agent that includes one or more kinds of phosphoric ester compound and the pH of the aqueous solution when extracted with 50 mL of water with respect to 1 g of the mold release agent is 3.0 or more; and | 03-20-2014 |
| 20140084519 | METHODS AND A MOLD ASSEMBLY FOR FABRICATING POLYMER STRUCTURES BY IMPRINT TECHNIQUES - The present disclosure relates to mold components and imprint lithography techniques applied on the basis of organic mold materials in order to form polymer microstructure elements. It has been recognized that adapting surface characteristics of at least one mold component may significantly enhance performance of the lithography process, in particular with respect to suppressing residual polymer material, which in conventional strategies may have to be removed on the basis of an additional etch process. | 03-27-2014 |
| 20140110888 | STABILIZATION OF VINYL ETHER MATERIALS - A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR═CR | 04-24-2014 |
| 20140151936 | PATTERN TRANSFERRING APPARATUS AND PATTERN TRANSFERRING METHOD - A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area. | 06-05-2014 |
| 20140175707 | METHODS OF USING NANOSTRUCTURED TRANSFER TAPE AND ARTICLES MADE THEREFROM - A method of making patterned structured solid surfaces is disclosed that includes filling a structured template with backfill material to produce a structured transfer film and laminating the structured transfer film to a receptor substrate. The receptor substrate comprises a patterned adhesion promotion layer. The template layer is capable of being removed from the backfill layer while leaving at least a portion of the structured surface of the backfill layer substantially intact. The backfill layer can include at least two different materials, one of which can be an adhesion promotion layer. In some embodiments the backfill layer includes a silsesquioxane such as polyvinyl silsesquioxane. The structured transfer film is a stable intermediate that can be covered temporarily with a release liner for storage and handling. | 06-26-2014 |
| 20140210140 | NANOIMPRINTING METHOD AND RESIST COMPOSITION EMPLOYED IN THE NANOIMPRINTING METHOD - A nanoimprinting method employs a resist composition including polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm. The polymerization initiating agent has an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds. Further, exposure of the resist composition is executed by light having spectral intensity properties that satisfy a predetermined relational formula. The present invention enables contamination of molds by adhered matter to be suppressed, and enables formation of resist patterns having sufficient etching resistance by nanoimprinting. | 07-31-2014 |
| 20140291896 | COMPONENT PROTECTIVE OVERMOLDING - Techniques for component protective overmolding include selectively applying a securing coating substantially over one or more elements coupled to a framework, molding a first protective layer over the framework, the one or more elements, and the securing coating, after the securing coating has been selectively applied, and molding a second protective layer over the first protective layer. In one embodiment, the second protective layer is configured to provide a surface configured to receive a pattern and is removable if a defect is yielded during inspection. Further, the securing coating may be a curable material, such as an ultra violet curable material. | 10-02-2014 |
| 20140306382 | MAKING MULTI-LAYER MICRO-WIRE STRUCTURE - A method of making a multi-layer micro-wire structure includes providing a substrate with a plurality of micro-channels. First and second material compositions are provided. The first material composition is coated over the substrate and micro-channels and then removed from the substrate surface but not the micro-channels. The second material composition is coated over the substrate, in the micro-channels, and over the first materials, and then removed from the substrate surface but not the micro-channels. The first and second material compositions are cured in the micro-channels in a common step to form a cured first material layer and a cured second material layer in the micro-channels. The cured first material layer and the cured second material layer form an electrically conductive multi-layer micro-wire in each micro-channel. | 10-16-2014 |
| 20140319739 | DIGITAL EMBOSSING AND CREASING - A method of printing and embossing a receiver having first and second sides and having a thickness is disclosed. The method includes depositing a pattern of image toner on a first side of a receiver, the image toner including toner particles; fixing the pattern of image toner onto the receiver; depositing an embossing pattern of embossing particles on a side of the receiver, the embossing pattern having an embossing-pattern thickness corresponding to a fixed stack height of at least 30% of the thickness of the receiver, wherein the embossing particles have average diameters greater than the average diameters of the toner particles of the image toner; and pressing the receiver between a hard nip roller and a compliant nip roller, the pressure being selected so that the embossing pattern permanently deforms the receiver. | 10-30-2014 |
| 20150014891 | PATTERNED THIN FILMS BY THERMALLY INDUCED MASS DISPLACEMENT - The described invention provides a method of patterning a thin film deposited on a substrate comprising applying a moving focused field of thermal energy to the thin film deposited on the substrate; and dewetting the thin film from the substrate. Dewetting the thin film from the substrate is characterized by a negative space of a desired design; and displacement of the thin film into adjacent structures, thereby accumulating thin film in the adjacent structures. | 01-15-2015 |
| 20150014892 | IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which forms a pattern on an imprint material on a substrate by using a mold, including a first optical member interposed between an illumination optical system and a detection optical system, and a mold, and configured to guide a first light from the illumination optical system and a second light from the detection optical system to the mold, and a second optical member interposed between the first optical member and the detection optical system, and configured to transmit the second light which is reflected by a mark formed on the mold or a mark formed on the substrate and travels toward the detection optical system through the first optical member, and block the first light which travels toward the detection optical system through the first optical member. | 01-15-2015 |
| 20150014893 | PROCESS FOR PRODUCING ARTICLE HAVING FINE PATTERN ON ITS SURFACE - To provide a process for producing an article having a fine pattern on its surface, by which peeling of a cured resin layer having a fine pattern is suppressed, and a defect of the cured resin layer by repelling when a photocurable resin composition is applied is suppressed. | 01-15-2015 |
| 20150014894 | CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT AND METHOD FOR MANUFACTURING A CURED PRODUCT - Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator. | 01-15-2015 |
| 20150028524 | RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME - In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator. | 01-29-2015 |
| 20150048557 | Apparatus for Thermal Processing of Flexographic Printing Elements - An apparatus for thermally processing a relief image printing element and a method of using the same are described. The printing element comprises at least one photopolymer layer and is selectively exposed to actinic radiation to crosslink portions of the at least one photopolymer layer. The apparatus comprises: (a) means for supporting the printing element; (b) heating means for melting or softening non-crosslinked portions of the at least one photopolymer layer; (c) at least one rotatable roll that is capable of bringing a blotting material into contact with the at least one photopolymer layer to remove the melted or softened non-crosslinked portions of the at least one photopolymer layer; and (d) an element arranged adjacent to the at least one rotatable roll for removing non-crosslinked photopolymer remaining on a surface of the at least one rotatable roll after step c). The apparatus may alternatively be operated without a blotting material. | 02-19-2015 |
| 20150091217 | MOLDING PROCESS, MOLDED PRINTED MATERIAL, PROCESS FOR PRODUCING IN-MOLD MOLDED ARTICLE, IN-MOLD MOLDED ARTICLE, AND DECORATIVE SHEET - A molding process that comprises, in order, a preparation step of preparing a sheet having a textured pattern due to projections formed by curing an ink composition above one face of a substrate, a placement step of placing the face of the sheet having the textured pattern so that it faces a mold, and a molding step of carrying out molding with the sheet and the mold in contact with each other. | 04-02-2015 |
| 20150290847 | IMPRINT MOLD MANUFACTURING METHOD, IMPRINT MOLD, AND IMPRINT MOLD MANUFACTURING KIT - A method for manufacturing an imprint mold which can prevent accumulation of the transferring resin at the joining portion of the film mold is provided. A method for manufacturing an imprint mold, including a winding step to wind a resin film mold onto a cylindrical transferring roll, the resin film mold being provided with a reverse pattern of a desired fine concave-convex pattern and the resin film mold being wound onto the transferring roll so that a gap without the reverse pattern is provided at a butting portion of both ends of the resin film mold; a resin filling step to fill a resin composition into the gap; and a pattern forming step to form a pattern substantially the same as the reverse pattern onto the resin composition, is provided. | 10-15-2015 |
| 20150314326 | METHOD FOR MANUFACTURING PLANARIZED FABRIC SUBSTRATE FOR FLEXIBLE DISPLAY - Disclosed herein is a method for manufacturing a fabric substrate for a flexible display. According to the present invention, the method comprises the steps of preparing step for preparing a fabric substrate, calendering step for thermal stability and dimensional stability of the fabric substrate, a first coating step for coating a first planarization layer for planarizing the calendered fabric substrate, a plasma processing step for processing plasma to the first planarization layer, and a second coating step for coating a second planarization layer on the plasma-processed first planarization layer. | 11-05-2015 |
| 20150315322 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING - A curable composition for imprinting in a condensable gas atmosphere, wherein the maximum condensable gas solubility (gas/(curable composition+gas)) (g/g) is 0.1 or more and 0.4 or less, and the curable composition for imprinting has a viscosity of 40 cP or less at 23° C. The maximum condensable gas solubility is determined by charging a 9-ml brown bottle with 3 g of the curable composition, measuring the weight of the curable composition at 23° C. at 1 atm before and after bubbling of the condensable gas at a flow rate of 0.1 L/min for 15 minutes, and dividing the increased weight due to the bubbling by the total weight of the curable composition and the condensable gas. | 11-05-2015 |
| 20150367540 | INTEGRAL VASCULATURE - A system and method is provided for creating a structure including a vasculature network. A film deposition device is configured to dispense droplets onto a surface of a substrate to form a curable fugitive pre-patterned liquid film on the surface of the substrate. An electrohydrodynamic film patterning (EHD-FP) device has a patterned electrode structure formed to generate an electric field and to subject the film on the surface of the substrate to the electric field. The film thereby being formed by the EHD-FP into patterned features in response to being subjected to the electric field. Then a casting system is configured to cover the patterned features in an epoxy to form patterned structures, wherein the patterned structures comprise a fugitive vasculature structure. | 12-24-2015 |
| 20160009946 | UNDER LAYER FILM-FORMING COMPOSITION FOR IMPRINTS AND METHOD FOR FORMING PATTERN | 01-14-2016 |
| 20160023399 | METHOD OF FORMING ALIGNED PATTERN IN PATTERN FORMATION REGION BY USING IMPRINT PROCESS - A method of forming a pattern by using an imprint process includes: forming an adhesion promoting layer only in a pattern formation region on a substrate; coating a resin to cover the substrate and the adhesion promoting layer; transferring a pattern of a stamp mold to the resin covering the substrate and the adhesion promoting layer, by pressing the stamp mold onto the resin; irradiating ultraviolet light onto the resin covering the substrate and the adhesion promoting layer, to cure the resin and form a pattern of the cured resin to correspond to the pattern of the stamp mold, on the substrate; and detaching the stamp mold from the substrate, to leave a portion of the cured resin pattern only on the adhesion promoting layer on the substrate and to remove a remaining portion of the cured resin pattern from the substrate. | 01-28-2016 |
| 20160062004 | FILLED LARGE-FORMAT IMPRINTING METHOD - A method of making a filled large-format imprinted structure includes providing a substrate, locating a curable layer over the substrate, imprinting the curable layer, and curing the curable layer to form a cured layer including a layer surface having one or more areas. Each area has a plurality of imprinted micro-cavities, wherein each micro-cavity has a micro-cavity width less than or equal to 20 microns. A rib separates each micro-cavity from an adjacent micro-cavity by a rib width that is less than the micro-cavity width, the rib extending from a bottom of the micro-cavity to the layer surface. A common curable material is located in each micro-cavity and cured to form common cured material in each micro-cavity, thereby defining a filled large-format imprinted structure. | 03-03-2016 |
| 20160062005 | RIBBED LARGE-FORMAT IMPRINTING METHOD - A method of making a filled large-format imprinted structure includes providing a substrate, locating a curable layer over the substrate, imprinting the curable layer, and curing the curable layer to form a cured layer including a layer surface and one or more imprinted micro-cavities. Each micro-cavity has a micro-cavity depth and a micro-cavity width and one or more ribs extending from the bottom of the micro-cavity toward the top of the micro-cavity. Each rib has a rib width that is less than one half of the micro-cavity width, a rib height that is less than the micro-cavity depth, and each rib separates the micro-cavity into portions, each portion having a portion width less than or equal to 20 microns. A curable material is located in each micro-cavity and cured to form cured material located in each micro-cavity, thereby defining a filled large-format imprinted structure. | 03-03-2016 |
| 20160062008 | STACKED LARGE-FORMAT IMPRINTING METHOD - A method of making a filled large-format imprinted structure includes providing a substrate, locating a first curable layer over the substrate, imprinting the first curable layer, and curing the first curable layer to form a first cured layer imprinted with a first micro-cavity. A first curable material of a first color is located in the first micro-cavity and cured to form first cured material in the first micro-cavity. A second curable layer is located on the first cured layer and the first cured material, imprinted, and cured to form a second cured layer imprinted with a second micro-cavity. A second curable material of a second color different from the first color is located in the second micro-cavity and cured to form second cured material, thereby defining a large-format imprinted structure. | 03-03-2016 |
| 20160062181 | MULTI-LAYER LARGE-FORMAT IMPRINTING METHOD - A method of making a filled large-format imprinted structure includes providing a substrate, locating a first curable layer over the substrate, imprinting the first curable layer, and curing the first curable layer to form a first cured layer imprinted with a first micro-cavity having a first micro-cavity width less than or equal to 20 microns. A curable material is located in the first micro-cavity and cured to form cured material in the first micro-cavity. A second curable layer is located on the first cured layer and the first cured material, imprinted and cured to form a second cured layer imprinted with a second micro-cavity having a second micro-cavity width less than or equal to 20 microns. The curable material is located in the second micro-cavity and cured to form cured material in the second micro-cavity, thereby forming a large-format imprinted structure. | 03-03-2016 |
| 20160131970 | METHOD OF MANUFACTURING A MASK - A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern. | 05-12-2016 |
| 20160136852 | METHOD AND DEVICE FOR APPLICATION OF STRUCTURAL MATERIALS - There is disclosed a method of applying activatable material to a member of an article of manufacture such as an automotive vehicle. According to the method, the activatable material is provided to an applicator followed by applying the activatable material to the member wherein the activatable material is attached by way of a mechanical interlock via one or more through-holes. | 05-19-2016 |
| 20160136874 | METHOD AND APPARATUS FOR EMBOSSING A PATTERN ON A SUBSTRATE COATED WITH A VARNISH - A method and an apparatus for embossing a pattern into a varnish on a sheet-like substrate are provided. The method applies a planar stamp using a roller, while the apparatus includes a roller having a planar stamp. | 05-19-2016 |
| 20160144554 | PHOTOCURABLE COMPOSITION, METHODS FOR PRODUCING FILM, OPTICAL COMPONENT, CIRCUIT BOARD, AND ELECTRONIC COMPONENT BY USING THE SAME, AND CURED PRODUCT - An imprint method that uses a condensable gas process has a problem in that the surface of a resist cured film is rough. This is resolved by a photocurable composition used for performing imprint in an atmosphere containing a condensable gas. The photocurable composition contains a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator, and a component (C) which is a mold releasing agent. A saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm. | 05-26-2016 |
| 20160147143 | IMPRINT METHOD AND APPARATUS - An imprint method includes: placing a light-curable composition on a workpiece substrate (placement); bringing the light-curable composition and a mold into contact with each other an atmosphere of a condensable gas (contact); aligning the mold and the workpiece substrate (alignment); irradiating the light-curable composition with light to obtain a light-cured composition (irradiation); and separating the light-cured composition and the mold from each other after the irradiation (release). The film thickness of the light-curable composition during the alignment is 20% or more greater than that of the light-cured composition after the release. | 05-26-2016 |
| 20160185035 | MICRO DEVICE TRANSFERRING APPARATUS, METHOD FOR TRANSFERRING MICRO DEVICE, AND METHOD FOR FABRICATING TRANSFERRING APPARATUS - A micro device transferring apparatus includes: a base; and a stamping array disposed on the base. The stamping array includes at least two transferring projections protruding from the base at a predetermined spacing therebetween. According to the present disclosure, the adhesion between a micro device and a target substrate can be enhanced, and the transferring apparatus can be used repeatedly and simply controlled so that the cost for handling the micro device can be saved. In addition, the positions of micro devices can be scaled in multiple dimensions, so that the micro devices can be mounted in a scalable manner. | 06-30-2016 |
| 20220135787 | PHOTOCURABLE COMPOSITION, METHOD FOR PRODUCING CONCAVE-CONVEX STRUCTURE, METHOD FOR FORMING FINE CONCAVE-CONVEX PATTERN, AND CONCAVE-CONVEX STRUCTURE - Provided is a photocurable composition used for forming a resin layer of a concave-convex structure including a substrate and a resin layer provided on the substrate and having fine concavities and convexities formed on a surface thereof. A cured film of the photocurable composition has a surface free energy of 15 mJ/m | 05-05-2022 |
