| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 257749000 | At least portion of which is transparent to ultraviolet, visible or infrared light | 11 |
| 20100090341 | NANO-PATTERNED ACTIVE LAYERS FORMED BY NANO-IMPRINT LITHOGRAPHY - Patterned active layers formed by nano-imprint lithography for use in devices such as photovoltaic cells and hybrid solar cells. One such photovoltaic cell includes a first electrode and a first electrically conductive layer electrically coupled to the first electrode. The first conductive layer has a multiplicity of protrusions and recesses formed by a nano-imprint lithography process. A second electrically conductive layer substantially fills the recesses and covers the protrusions of the first conductive layer, and a second electrode is electrically coupled to the second conductive layer. A circuit electrically connects the first electrode and the second electrode. | 04-15-2010 |
| 20100230814 | NANOSCALE, SPATIALLY-CONTROLLED GA DOPING OF UNDOPED TRANSPARENT CONDUCTING OXIDE FILMS - An article of manufacture comprising a nanowire and methods of making the same. In one embodiment, the nanowire includes a Ga-doped trace formed on a surface of an indium oxide layer having a thickness in nano-scale, and wherein the Ga-doped trace is formed with a dimension that has a depth is less than a quarter of the thickness of the indium oxide layer. In one embodiment, the indium oxide layer, which is optically transparent and electrically insulating, comprises an In | 09-16-2010 |
| 20110049715 | METHOD FOR DEPOSITING METAL OXIDE FILMS - A method for depositing a metal oxide film on a surface of a supporting body for the film, comprising the steps of: —providing a deposition chamber; —providing a pulsed beam of electrons and plasma in the deposition chamber; —supplying a supporting body in the deposition chamber, the supporting body having a deposition surface; —providing a target body made of a material which comprises the metal oxide in the deposition chamber, the target body having a target surface; —forming a plume of metal oxide ablated from the target surface by means of the impact of the pulsed beam of electrons and plasma against the target surface; and —depositing a metal oxide film on the deposition surface by means of the contact of the plume with the deposition surface. | 03-03-2011 |
| 20110163448 | SUBSTRATE HAVING A TRANSPARENT ELECTRODE AND METHOD FOR PRODUCING THE SAME - A zinc oxide transparent electroconductive oxide has been difficult to use as a substrate having a transparent electrode because the oxide, when configured as a thin film, because of increased resistivity due to air and/or moisture exposure. Though doping can inhibit increase of resistance to some extent, there has been difficulty in selecting a type and an amount of a doping substance and because doping causes high initial resistance. A substrate having a transparent electrode with stable resistivity against various environments is produced by a magnetron sputtering method using a target composed of a zinc oxide transparent electroconductive oxide containing 0.50 to 2.75% silicon dioxide by weight relative to the oxide. | 07-07-2011 |
| 20110221061 | ANODE FOR AN ORGANIC ELECTRONIC DEVICE - There is provided an anode for an organic electronic device. The anode has (a) a first layer which is a conducting inorganic material and (b) a second ultrathin layer which is a metal oxide | 09-15-2011 |
| 20120256316 | SIGNAL LINE STRUCTURE OF A FLAT DISPLAY - The signal line structure is disposed between a gate driver and a display area of a display. The signal line structure includes a substrate, first metal layers, a first insulation layer, second metal layers, a second insulation layer and third metal layers. The first metal layers are arranged in parallel and toward a first direction in the substrate. The first insulation layer is disposed in the substrate and covers the first metal layers. The second metal layers are disposed on the positions of the first insulation layer corresponding to the first metal layers. The second insulation layer is disposed on the second metal layers and the first insulation layer. The third metal layers are disposed on the positions corresponding to the second metal layers in the second insulation layer. The distance between two adjacent second metal layers is less than that between two adjacent first metal layers. | 10-11-2012 |
| 20130249094 | METHOD OF PREPARING TRANSPARENT CONDUCTING OXIDE FILMS - The present invention discloses a method of preparing a transparent conducting oxide (TCO) film comprising the steps of: applying surface modified TCO nanoparticles onto a surface of a substrate; and cross-linking the surface modified TCO nanoparticles. The present invention also provides a transparent conducting oxide film prepared according to the method. | 09-26-2013 |
| 20140291846 | ARRAY SUBSTRATE AND FANOUT LINE STRUCTURE OF THE ARRAY SUBSTRATE - A fanout line structure of an array substrate includes a plurality of fanout lines arranged on a fanout area of the array substrate, where the fanout line is used to connect a signal line with a bonding pad. Lengths of different fanout lines are different. At least one fanout line includes a first subsection and a second subsection. An electrical resistivity of material of the second subsection of the fanout line is greater than an electrical resistivity of material of the first subsection of the fanout line. Length of a first fanout line is greater than length of a second fanout line, and length of a second subsection of the second fanout line is greater than length of a second subsection of the first fanout line. | 10-02-2014 |
| 20150309381 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, LIQUID CRYSTAL DISPLAY PANEL, AND DISPLAY DEVICE - The invention provides an array substrate and a manufacturing method thereof, a liquid crystal display panel and a display device. The array substrate includes a display region and a non-display region, wherein a plurality of data signal lines are provided in the display region, and a plurality of connection terminal pads and a plurality of metal wires connecting the connection terminal pads with the respective data signal lines are provided in the non-display region, wherein at least one blocking part covering the plurality of metal wires is provided above the plurality of metal wires. In the array substrate of the invention, as the at least one blocking part covering the metal wires is provided above the metal wires, which can block foreign objects from contacting the metal wires, thus the cutting debris can be prevented from scratching the metal wires in the cutting process. | 10-29-2015 |
| 20160027955 | Microwave-Annealed Indium Gallium Zinc Oxide Films and Methods of Making the Same - A microwave-annealed indium gallium zinc oxide (IGZO) film and methods of making the same are disclosed. The methods may comprise: depositing an IGZO film onto a substrate; and microwave annealing the IGZO film to produce a microwave-annealed IGZO film. | 01-28-2016 |
| 20160141537 | NANOSTRUCTURED ANODE-CATHODE ARRAY FOR OPTOELECTRONIC DEVICES - The nanostructured anode-cathode array for optoelectronic devices is an interdigitated electrode assembly for organic optoelectronic devices. The electrode assembly provides efficiency enhancement in metal oxide (ZnO) and metal (Ag) electrodes for organic optoelectronic devices. The assembly has vertically orientated nanorods in a range of patterns, configurations and volume fractions. The rods have lateral dimensions in the range of 1 nm-500 nm and lengths of 1 nm-10,000 nm. The anode-cathode array can be tuned by altering the dimensions of the individual electrodes and/or modifying the center-to-center distance of anode-anode, cathode-cathode or anode-cathode pairs. | 05-19-2016 |
