| Entries |
| Document | Title | Date |
|---|
| 20080197295 | Device And Method For Producing Resist Profiled Elements - The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam. | 08-21-2008 |
| 20080197296 | Particle beam irradiation system - A particle beam irradiation system includes a particle beam irradiation apparatus, which is free of a gantry structure, having a particle beam irradiator for irradiating an affected area of a patient with a particle beam, the particle beam irradiator being housed in a chamber, a CT scanner installed in the chamber, for positionally confirming the affected area of the patient, a drive unit for moving the patient from a detection range to an irradiation range, a patient fixing device for fixing the patient in position, the device being mounted on the drive unit for rotation, and a housing unit having a structure housing the drive unit with the patient fixing device mounted and the CT scanner, the housing unit being rotatable about an axis perpendicular to a plane including a direction in which the particle beam is applied and a direction in which the drive unit moves. | 08-21-2008 |
| 20080203323 | Irradiation Device - Irradiation device ( | 08-28-2008 |
| 20080217561 | PHANTOM FOR ION RANGE DETECTION - A phantom for heavy ion radiation therapy provides characterization of an ion beam that may enter but not exit from the phantom. The phantom may include multiple materials and multiple spatially dispersed ion detectors to obtain signals that may be fit to known beam curves to accurately characterize the location and other parameters of Bragg peak of a given ion beam within a patient. | 09-11-2008 |
| 20080217562 | METHOD FOR REFORMING CARBONACEOUS MATERIALS - A carbonaceous material containing 30 atm % or more of carbon atom is reformed. The reforming is carried out by applying a DC pulse voltage to an electrode set within a chamber to generate an electron beam, and by then irradiating a surface of the carbonaceous material with the electron beam. The DC pulse voltage has a duty ratio of pulse duration per pulse of 0.05 to 5.0%, an input energy of 0.01 J/cm | 09-11-2008 |
| 20080237491 | APPARATUS AND METHODS FOR SYSTEMATIC NON-UNIFORMITY CORRECTION USING A GAS CLUSTER ION BEAM - Embodiments of an apparatus and methods for correcting systematic non-uniformities using a gas cluster ion beam are generally described herein. Other embodiments may be described and claimed. | 10-02-2008 |
| 20080237492 | METHODS AND PROCESSING SYSTEMS FOR USING A GAS CLUSTER ION BEAM TO OFFSET SYSTEMATIC NON-UNIFORMITIES IN WORKPIECES PROCESSED IN A PROCESS TOOL - Embodiments of an apparatus and methods for offsetting systematic non-uniformities using a gas cluster ion beam are generally described herein. Other embodiments may be described and claimed. | 10-02-2008 |
| 20080237493 | ELECTRON BEAM LITHOGRAPHY SYSTEM - An electron beam lithography method is provided for sequentially irradiating an electron beam deflected by a deflector on a shot-by-shot basis to draw a pattern on a surface of a sample mounted on a stage. This method includes the step of irradiating the electron beam on the sample surface as a combination of shots each irradiated in one of rectangular or square regions having the same area and different shapes, in order to draw a correction pattern. This method also includes the steps of correcting the shape of the electron beam based on the drawn correction pattern, and drawing a pattern using the shape-corrected electron beam. | 10-02-2008 |
| 20080237494 | CONFIGURATION MANAGEMENT AND RETRIEVAL SYSTEM FOR PROTON BEAM THERAPY SYSTEM - In a complex, multi-processor software controlled system, such as proton beam therapy system (PBTS), it may be important to provide treatment configurable parameters that are easily modified by an authorized user to prepare the software controlled systems for various modes of operation. This particular invention relates to a configuration management system for the PBTS that utilizes a database to maintain data and configuration parameters and also to generate and distribute system control files that can be used by the PBTS for treatment delivery. The use of system control files reduces the adverse effects of single point failures in the database by allowing the PBTS to function independently from the database. The PBTS accesses the data, parameters, and control settings from the database through the system control files, which insures that the data and configuration parameters are accessible when and if single point failures occur with respect to the database. | 10-02-2008 |
| 20080237495 | Particle Therapy System - A particle therapy system for irradiating a volume of a patient to be irradiated with high-energy particles is provided. The system includes a radiation outlet of a radiation delivery and acceleration system from which a particle beam exits in order to interact with the patient positioned in an irradiation position; an imaging device for verifying the position of the volume to be irradiated in relation to the particle beam; and a patient-positioning device with which the patient can be brought into the irradiation position for irradiation. The imaging device checks the position of the volume to be irradiated in an imaging position of the patient that is spatially remote from the irradiation position, and the patient-positioning device automatically changes position between imaging position and irradiation position. | 10-02-2008 |
| 20080258082 | Plasma Processing Method and Plasma Processing Apparatus - It is intended to provide a plasma processing method and apparatus capable of increasing the uniformity of amorphyzation processing. | 10-23-2008 |
| 20080258083 | Beam Allocation Apparatus and Beam Allocation Method for Medical Particle Accelerators - The invention relates to a beam allocation apparatus ( | 10-23-2008 |
| 20080290297 | Particle Accelerator for Radiotherapy by Means of Ion Beams - The invention relates to a particle accelerator for radiotherapy by means of ion beams ( | 11-27-2008 |
| 20080290298 | METHOD AND SYSTEM FOR TREATING AN INTERIOR SURFACE OF A WORKPIECE USING A CHARGED PARTICLE BEAM - A method and system of treating an interior surface on an internal cavity of a workpiece using a charged particle beam. A beam deflector surface of a beam deflector is placed within the internal cavity of the workpiece and is used to redirect the charged particle beam toward the interior surface to treat the interior surface. | 11-27-2008 |
| 20080290299 | PARTICLE THERAPY SYSTEM - A particle therapy system is provided. The particle therapy system includes at least two acceleration units, with each of which acceleration units particles can be accelerated to at least an energy necessary for the irradiation; and a common energy selection system, connected downstream of the at least two acceleration units, with which system the energy of particles that have been accelerated by one of the acceleration units can be reduced. | 11-27-2008 |
| 20080296515 | CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD - A charged particle beam writing apparatus includes a stage on which a target object is placed and which moves in a predetermined direction, a first column configured to irradiate a first charged particle beam on a writing region of the target object, a second column which is located at the back of the first column in the predetermined direction and configured to irradiate a second charged particle beam on the writing region of the target object, and a sensor configured to measure a height level of the target object at any one of a position in front of a position where the first column irradiates the first charged particle beam in the predetermined direction and a position almost immediately under the position where the first charged particle beam is irradiated. | 12-04-2008 |
| 20080315127 | Ion Implanter Operating in Pulsed Plasma Mode - The present invention relates to an ion implanter IMP comprising a pulsed plasma source SPL, a substrate-carrier tray PPS, and a power supply ALT for the tray. The implanter also includes a capacitor C connected directly to ground E and connected downstream from the tray power supply ALT. The invention also provides a method of using the implanter. | 12-25-2008 |
| 20080315128 | Method and Apparatus For Flattening Solid Surface - A method for flattening a sample surface by irradiating the sample surface with a gas cluster ion beam, generates clusters of source gas in a cluster generating chamber, ionizes the generated clusters in an ionization chamber, accelerates the ionized cluster beam in an electric field of an accelerating electrode, selects a cluster size using a magnetic field of a sorting mechanism, and irradiates the surface of a sample. An irradiation angle between the sample surface and the gas cluster ion beam is less than 30° and an average cluster size of the gas cluster ion beam is 50 or above. | 12-25-2008 |
| 20090001289 | Recording Medium - A method and apparatus for a recording medium is described. In one embodiment, the invention is an apparatus. The apparatus includes a substrate. The apparatus also includes a phase change layer disposed on the substrate. The phase change layer has a first phase with a first secondary emission ratio and a second phase with a second secondary emission ratio. | 01-01-2009 |
| 20090001290 | Ion Source and Method For Operating Same - An ion source is provided that can generate an ion beam in which the width is wide, the beam current is large, and the uniformity of the beam current distribution in the width direction is high, and that can prolong the lifetime of a cathode. | 01-01-2009 |
| 20090020711 | A PARTICLE BEAM APPLICATION DEVICE AND AN IRRADIATION DEVICE AS WELL AS A METHOD FOR GUIDING A PARTICLE BEAM - The invention relates to a particle beam application device for directing a particle beam at a target volume for irradiating the target volume. A beam shaping device which can be disposed in a beam path of the particle beam shapes a cross-sectional profile of the particle beam, the beam shaping device being implemented such that, after shaping, the particle beam has a line-like cross-sectional profile. A controller varies the relative position of the particle beam and target volume during an irradiation run, the controller being implemented such that, by changing the relative position, the particle beam with the line-like cross-sectional profile can be scanned over the target volume to be irradiated. A line-like cross-sectional profile of a particle beam is formed for guiding a particle beam. A trajectory of the particle beam is variably changed in a direction parallel to the beam trajectory direction. | 01-22-2009 |
| 20090050824 | METHOD OF FABRICATING A STRUCTURE FROM DIAMOND MATERIAL OR DIAMOND-LIKE CARBON MATERIAL - A method of fabricating a structure from diamond material or diamond-like carbon material, and a structure according to the method, the method comprising the steps of imposing a structural transformation on the crystallographic structure of the material in a first region located at a first depth below a surface of the material; imposing a structural transformation on the crystallographic structure of the material in a second region located at a second depth below the surface of the material and above of the first region, the second depth being selected so that the first region is separated from the second region by a third region; and removing at least a portion of the material of the first and second regions; wherein the structural transformations are imposed so that the crystallographic structure of the third region is largely unaffected and the third region has opposite surface portions from which material of the first and second regions has been removed. | 02-26-2009 |
| 20090057571 | CHARGED-PARTICLE BEAM LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD - This invention discloses a charged-particle beam lithography apparatus which comprises a projection system which projects a charged-particle beam, and images a pattern on a substrate with the projected charged-particle beam. The projection system comprises a symmetrical magnetic doublet lens configured to generate a magnetic field, and an electro-static lens configured to generate an electric field superimposed on the magnetic field. The electro-static lens includes an electrode configured to apply, on at least the pupil plane of the symmetrical magnetic doublet lens, a potential to accelerate the charged-particle beam which has entered the symmetrical magnetic doublet lens. | 03-05-2009 |
| 20090078890 | ION SOURCE, ION IMPLANTATION APPARATUS, AND ION IMPLANTATION METHOD - This ion source generates a ribbon-like ion beam whose dimension in the Y direction is larger than the dimension in the X direction. This ion source includes a plasma generating vessel having an ion extraction port extending in the Y direction, a plurality of cathodes arranged in a plurality of stages along the Y direction on one side in the X direction in the plasma generating vessel, a reflecting electrode arranged on the other side in the X direction in the plasma generating vessel opposite to the cathodes, and electromagnets for generating magnetic fields along the X direction in regions including the plurality of cathodes in the plasma generating vessel. | 03-26-2009 |
| 20090084987 | CHARGE NEUTRALIZATION IN A PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a process chamber, a source configured to generate a plasma in the process chamber, and a platen configured to support a workpiece in the process chamber. The platen is biased with a pulsed platen signal having pulse ON and OFF time periods to accelerate ions from the plasma towards the workpiece during the pulse ON time periods and not the pulse OFF time periods. A plate is positioned in the process chamber. The plate is biased with a plate signal to accelerate ions from the plasma towards the plate to cause an emission of secondary electrons from the plate during at least a portion of one of the pulse OFF time periods of the pulsed platen signal to at least partially neutralize charge accumulation on the workpiece. | 04-02-2009 |
| 20090114851 | FIB MILLING OF COPPER OVER ORGANIC DIELECTRICS - Apparatus and processes are disclosed for milling copper adjacent to organic low-k dielectric on a substrate by directing a charged-particle beam at a portion of the copper and exposing the copper to a precursor sufficient to enhance removal of the copper relative to removal of the dielectric, wherein the precursor contains an oxidizing agent, has a high sticking coefficient and a long residence time on the copper, contains atoms of at least one of carbon and silicon in amount sufficient to stop oxidation of the dielectric, and contains no atoms of chlorine, bromine or iodine. In one embodiment, the precursor comprises at least one of the group consisting of NitroEthanol, NitroEthane, NitroPropane, NitroMethane, compounds based on silazane such as HexaMethylCycloTriSilazane, and compounds based on siloxane such as Octa-Methyl-Cyclo-Tetra-Siloxane. Products of the processes are also disclosed. | 05-07-2009 |
| 20090114852 | PARTICLE BEAM THERAPY SYSTEM - Disclosed herein is a particle beam therapy system which includes a synchrotron which accelerates beams of charged particles to a desired energy level and permits extraction of the beams of charged particles exceeding the stability limit, an irradiation device which irradiates an object with the beams of charged particles, a beam transport system which conducts the beams of charged particles extracted from the synchrotron to the irradiation device, and a control unit which works in such a way as to remove part of the beams of charged particles circling in the synchrotron and allow the rest of the circling beams of charged particles to be extracted from the synchrotron and conducted to the irradiation device. The particle beam therapy system produces irradiation beams suitable for high-precision particle beam therapy by the spot scanning method or the like. | 05-07-2009 |
| 20090121159 | CLUSTER E-BEAM LITHOGRAPHY SYSTEM - A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where features above 32 nm, and a cluster e-beam lithography system for expose pattern area where features is sub 32 nm. | 05-14-2009 |
| 20090140174 | Impurity Introducing Apparatus and Impurity Introducing Method - It is an object to prevent functions expected originally from being unexhibited when impurities to be introduced into a solid sample are mixed with each other, and to implement plasma doping with high precision. | 06-04-2009 |
| 20090140175 | Method and system for fabricating a data storage medium - Embodiments of the present invention recite a method and system for fabricating a data storage medium. In one embodiment, a detectable pattern is created at the surface of a substrate. An electron beam lithography process is then initiated upon the substrate. The detectable pattern is used to control the positioning of an electron beam relative to the surface of the substrate during the electron beam lithography process | 06-04-2009 |
| 20090140176 | NON-AMBIPOLAR RADIO-FREQUENCY PLASMA ELECTRON SOURCE AND SYSTEMS AND METHODS FOR GENERATING ELECTRON BEAMS - An electron generating device extracts electrons, through an electron sheath, from plasma produced using RF fields. The electron sheath is located near a grounded ring at one end of a negatively biased conducting surface, which is normally a cylinder. Extracted electrons pass through the grounded ring in the presence of a steady state axial magnetic field. Sufficiently large magnetic fields and/or RF power into the plasma allow for helicon plasma generation. The ion loss area is sufficiently large compared to the electron loss area to allow for total non-ambipolar extraction of all electrons leaving the plasma. Voids in the negatively-biased conducting surface allow the time-varying magnetic fields provided by the antenna to inductively couple to the plasma within the conducting surface. The conducting surface acts as a Faraday shield, which reduces any time-varying electric fields from entering the conductive surface, i.e. blocks capacitive coupling between the antenna and the plasma. | 06-04-2009 |
| 20090159818 | LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES - A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 μm or larger with at least on roller; providing a linear electron source having a housing acting as an anode, the housing having side walls; a slit opening in the housing for trespassing of a linear electron beam, the slit opening defining a length direction of the source; a cathode being arranged within the housing and having a first side facing the slit opening; at least one gas supply for providing a gas into the housing; and a power supply for providing a high voltage between the anode and the cathode; and emitting the linear electron beam, wherein the high voltage is adjusted for providing an electron energy to implant electrons of the electron beam within the web or foil. | 06-25-2009 |
| 20090184262 | DEVICE AND METHOD FOR ALTERING THE CHARACTERISTICS OF THREE-DIMENSIONAL SHAPED PARTS USING ELECTRONS AND USE OF SAID METHOD - The invention relates to a device and a method for altering the characteristics of a three-dimensional molded part by means of electrons, including at least one electron accelerator for generating accelerated electrons and two electron exit windows, wherein the two electron exit windows are arranged opposite one another, wherein the two electron exit windows and at least one reflector delimit a process chamber in which the surface or an edge layer of the molded part are bombarded with electrons, wherein an energy density distribution inside the process chamber can be detected at least over one spatial dimension by means of a sensor system. | 07-23-2009 |
| 20090184263 | Charged Particle Beam Irradiation System - A charged particle beam irradiation system comprises a high-speed steerer (beam dump device) | 07-23-2009 |
| 20090189094 | ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE - A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is scanned so as to completely fill servo elements corresponding to a plurality of tracks one by one during one rotation of the substrate by X-Y deflecting the electron beam and vibrating back and forth in the radius direction. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation. | 07-30-2009 |
| 20090189095 | ION RADIATION THERAPY SYSTEM WITH VARIABLE BEAM RESOLUTION - An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and/or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity. | 07-30-2009 |
| 20090194711 | ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM - When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial direction position of each area based on a predetermined encoder pulse for each radial direction position among those generated according to the rotational angle of the rotation stage that occurs after a predefined encoder pulse that occurs ahead in a rotational direction of a radial direction position whose write start position in a circumferential direction in each area arrives first at the writing position as the rotation stage rotates and ahead of the write start position in the circumferential direction with respect to each radial direction position, and after a predetermined time from the predetermined encoder pulse. | 08-06-2009 |
| 20090200489 | HERMETICALLY SEALED HOUSING WITH ELECTRICAL FEED-IN - The invention relates to a hermetically sealed housing with an electrical feed-in. A standard printed circuit board | 08-13-2009 |
| 20090200490 | GENERATING AND VISUALIZING AN ION BEAM PROFILE - A method for generating and visualizing an ion beam profile is provided. The method includes specifying an incidence direction of a particle beam, specifying a target region that is to be irradiated by said particle beam, creating an ion beam profile from points that are located on a downstream side of the target region or that are located in front of the target region and project onto the contour of the target region with respect to the incidence direction, and displaying a graphical representation of the ion beam profile. | 08-13-2009 |
| 20090200491 | ION IMPLANTATION METHOD AND APPARATUS - Using a beam current of an ion beam, and a dose amount to a substrate, and an initial value of a scan number of the substrate set to 1, a scan speed of the substrate is calculated. If the scan speed is within the range, the current scan number and the current scan speed are set as a practical scan number and a practical scan speed, respectively. If the scan speed is higher than the upper limit of the range, the calculation process is aborted. If the scan speed is lower than the lower limit of the range, the scan number is incremented by one to calculate a corrected scan number. A corrected scan speed is calculated by using the corrected scan number, etc. The above steps are repeated until the corrected scan speed is within the allowable scan speed range. | 08-13-2009 |
| 20090200492 | ION IMPLANTATION METHOD AND APPARATUS - Using a beam current of an ion beam, a dose amount to a substrate, and a reference scan speed, a scan number of the substrate is calculated as an integer value in which digits after a decimal point are truncated. If the scan number is smaller than 2, the process is aborted. If the scan number is equal to or larger than 2, it is determined whether the scan number is even or odd. If the scan number is even, the current scan number is set as a practical scan number. If the scan number is odd, an even scan number which is smaller by 1 than the odd scan number is obtained, and the obtained even scan number is set as a practical scan number. A practical scan speed of the substrate is calculated by using the practical scan number, the beam current, and the dose amount. | 08-13-2009 |
| 20090212238 | Apparatus for ion nitriding an aluminum alloy part and process employing such apparatus - The invention relates to a device for implanting ions in an aluminium alloy part ( | 08-27-2009 |
| 20090212239 | Charged particle beam apparatus - An assist gas having a very small amount and a uniform concentration is fed by a charged particle beam apparatus, in which a supply amount of gas is intermittently fed by a massflow controller, and gas is passed through a diffusion mechanism connected to the massflow controller, whereby an assist gas having a very small amount and a uniform concentration. | 08-27-2009 |
| 20090230327 | Particle therapy apparatus and method for modulating a particle beam generated in an accelerator - The invention relates to a particle therapy apparatus having an accelerator for generating a particle beam, a passive energy modulator comprising an absorber element, and a control entity. The control entity is designed to switch between an active adjustment of the energy in the accelerator and a passive energy modulation by the energy modulator, for the purpose of changing the energy of the particle beam from a high energy level to a low energy level in a step-by-step manner. In particular, this has the effect of shortening the dead times when changing between the energy levels. | 09-17-2009 |
| 20090230328 | ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM - When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a predetermined rotational position of the substrate by a blanking-OFF signal, performing writing in a rotational direction of the substrate along with the rotation of the substrate, and terminating the writing by a blanking-ON signal based on write data to perform writing for one round, and repeating the writing based on the ON/OFF control by moving the electron beam or substrate in a radial direction of the substrate and rotation control is performed for controlling the rotation speed of the rotation stage so as to be increased for inner track writing and decreased for outer track writing inversely proportional to the radius of the writing position. | 09-17-2009 |
| 20090283702 | CHARGED PARTICLE BEAM EXTRACTION SYSTEM AND METHOD - A charged particle beam extraction system and method capable of shortening the irradiation time and increasing the number of patients treatable per unit time. The charged particle beam extraction system comprises a synchrotron for cyclically performing patterned operation including four steps of introducing, accelerating, extracting and decelerating an ion beam, an on/off switch for opening or closing connection between an RF knockout electrode and an RF power supply for applying RF power to the RF knockout electrode, and a timing controller for controlling on/off-timing of the on/off switch such that when extraction of the ion beam is stopped at least once during the extraction step of the synchrotron, an amount of the ion beam extracted from the synchrotron in one cycle is held substantially at a setting value. | 11-19-2009 |
| 20090283703 | ION BEAM IRRADIATION APPARATUS AND ION BEAM MEASURING METHOD - A beam profile monitor is disposed on an orbit of an ion beam, and measures a beam intensity distribution of the ion beam. A pair of beam blocking members are opposed to each other across the ion beam in the x direction, and forms an opening through which the ion beam passes: At least one of the beam blocking members includes a plurality of movable blocking plates disposed without forming a gap in the y direction, and in an independently reciprocable manner in the x direction. A minute opening is formed between the beam blocking members opposed to each other by adjusting the positions of the beam blocking members. From a result of the intensity distribution measurement which is performed by said beam profile monitor on the ion beam passed through the minute opening, the emittance of the ion beam is calculated. | 11-19-2009 |
| 20090283704 | PARTICLE BEAM IRRADIATION SYSTEM - It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle. | 11-19-2009 |
| 20090289204 | ELECTRON BEAM EMITTER WITH SLOTTED GUN - An electron beam emitter includes an electron generator for generating electrons. The electron generator can have a housing containing at least one electron source for generating the electrons. The at least one electron source has a width. The electron generator housing can have an electron permeable region spaced from the at least one electron source for allowing extraction of the electrons from the electron generator housing. The electron permeable region can include a series of narrow elongate slots and ribs formed in the electron generator housing and extending laterally beyond the width of the at least one electron source. The electron permeable region can be configured and positioned relative to the at least one electron source for laterally spreading the electrons that are generated by the at least one electron source. | 11-26-2009 |
| 20090294697 | Charged particle beam apparatus - The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10 | 12-03-2009 |
| 20090309046 | MULTI-FIELD CHARGED PARTICLE CANCER THERAPY METHOD AND APPARATUS COORDINATED WITH PATIENT RESPIRATION - The invention relates generally to treatment of solid cancers. More particularly, the invention relates to a multi-field imaging and/or a multi-field charged particle cancer therapy method and apparatus coordinated with patient respiration via use of feedback sensors used to monitor and/or control patient respiration. Preferably, the multi-field imaging, such as X-ray imaging, and the charged particle therapy are performed on a patient in a partially immobilized and repositionable position. X-ray and/or proton delivery is timed to patient respiration via control of charged particle beam injection, acceleration, extraction, and/or targeting methods and apparatus. | 12-17-2009 |
| 20090309047 | PARTICLE THERAPY SYSTEM - The present embodiments relate to a particle therapy system having an accelerator unit for providing a particle beam and having a particle beam transport system for guiding the particle beam. The particle beam transport system has a first subarea by which the particle beam can be guided out from a level of the accelerator unit. A gantry-based radiation room is connected to the first subarea of the particle beam transport system. The present embodiments may also relate to a particle therapy system having foundations, where the foundations are dimensioned at one point such that a gantry-based radiation room can be retrofitted at the one point. In particular the foundations at the one point are located essentially at the same height as the foundations underneath an accelerator unit and/or underneath a particle beam transport system. | 12-17-2009 |
| 20090314959 | HORIZONTAL AND VERTICAL BEAM ANGLE MEASUREMENT TECHNIQUE - A system and method of quickly determining the parameters of an ion beam are disclosed. An ion beam, having a width and height dimension, is made up of a number of individual beamlets. By using a plurality of detectors, deployed over the entire beam, it is possible to quickly determine the mean angle of the beam at various locations. This information can then be used to adjust the beamline components. The detector allows a small portion of the beam to enter through a narrow slit. Varying voltages are applied to a set of electrostatic deflection plates, which enable rapid determination of the incoming beam angle. By positioning a plurality of these detectors along one or both dimensions of an ion beam, a profile of the beam can be quickly generated. This profile can then be used to adjust the various beam line components so as to improve the spread of the ion beam. This adjustment can either be made manually, or via an automated controller. | 12-24-2009 |
| 20090314960 | PATIENT POSITIONING METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a semi-vertical or seated patient positioning, alignment, and/or control method and apparatus used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. Patient positioning constraints are used to maintain the patient in a treatment position, including one or more of: a seat support, a back support, a head support, an arm support, a knee support, and a foot support. One or more of the positioning constraints are movable and/or under computer control for rapid positioning and/or immobilization of the patient. The system optionally uses an X-ray beam that lies in substantially the same path as a proton beam path of a particle beam cancer therapy system. The generated image is usable for: fine tuning body alignment relative to the proton beam path, to control the proton beam path to accurately and precisely target the tumor, and/or in system verification and validation. | 12-24-2009 |
| 20090314961 | METHOD AND APPARATUS FOR INTENSITY CONTROL OF A CHARGED PARTICLE BEAM EXTRACTED FROM A SYNCHROTRON - The invention comprises intensity control of a charged particle beam acceleration, extraction, and/or targeting method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Particularly, intensity of a charged particle stream of a synchrotron is described. Intensity control is described in combination with turning magnets, edge focusing magnets, concentrating magnetic field magnets, winding and control coils, and extraction elements of the synchrotron. The system reduces the overall size of the synchrotron, provides a tightly controlled proton beam, directly reduces the size of required magnetic fields, directly reduces required operating power, and allows continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron. | 12-24-2009 |
| 20090321665 | Irradiation Device - The present invention relates to an irradiation device for irradiating an irradiation object with heavy charged particles at an irradiation station, comprising a particle accelerator for providing a particle beam and a swivelling device for swivelling the particle beam impinging on the irradiation object, wherein the swivelling device comprises a carrier pivotable about an axis. In accordance with the invention, the irradiation device is characterized in that the particle accelerator is mounted on the pivotable carrier. | 12-31-2009 |
| 20100001212 | CHARGED PARTICLE BEAM IRRADIATION SYSTEM AND CHARGED PARTICLE BEAM EXTRACTION METHOD - A charged particle beam irradiation system includes measurement means | 01-07-2010 |
| 20100006778 | ION RADIATION THERAPY SYSTEM WITH DISTAL GRADIENT TRACKING - An ion radiation therapy machine provides a control of the range of the ion beam that a Bragg peak of the beam is located according to a determined gradient of the dose plan. | 01-14-2010 |
| 20100012859 | Method For Treating A Target Volume With A Particle Beam And Device Implementing Same - A method for treating or irradiating a target volume ( | 01-21-2010 |
| 20100012860 | ELECTRON BEAM PROCESSING DEVICE - An electron beam processing device includes a chamber housing that defines a chamber interior space and has a first opening. A carriage is movable along the first opening. An electron beam generator is disposed on the carriage so that the generated electron beam passes through the first opening when the carriage moves along the first opening. A disk is disposed between the chamber housing and the carriage and is rotatable about a rotational axis, which is perpendicular to the first opening, at least between a first rotational position and a second rotational position. The disk has a second opening spaced from the rotational axis of the disk in the radial direction. The rotational axis of the disk is disposed so that the first opening always overlaps the second opening at least along an electron beam propagation axis when the disk rotates between the first and second rotational positions. | 01-21-2010 |
| 20100032587 | Electron beam exciter for use in chemical analysis in processing systems - The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam. | 02-11-2010 |
| 20100044594 | Apparatus for aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate - The apparatus includes a particle beam, having an axis which functions as a primary optical axis, which particle beam is used to generate a pattern on a substrate. The apparatus also includes an optical reader, having an axis which functions as a secondary optical axis. A position fiducial is located at a stationary position relative to the substrate. Registration of a pre-existing pattern and the particle beam axis to the position fiducial periodically during production of a particle-beam-generated pattern continually provides an improvement in the overall alignment of the pattern being created with the pre-existing pattern on the substrate. | 02-25-2010 |
| 20100059693 | SCRIBE PROCESS MONITORING METHODOLOGY - One embodiment of the present invention sets forth a computer-implemented method for tuning laser scribe parameters during the fabrication of a solar module. The method includes analyzing the visual appearance of a laser scribe to extract various morphological parameters related to the quality of a laser scribe process used to produce the scribe. Based on the morphological parameters, the laser scribe parameters may be modified in-situ to achieve settings that are optimal for performing laser scribing in each layer of the solar module. As a result, laser scribe process cycle time may be minimized while providing better indication of the laser scribe process stability and quality relative to the prior art approaches. | 03-11-2010 |
| 20100059694 | PRESSURE-BASED GAS DELIVERY SYSTEM AND METHOD FOR REDUCING RISKS ASSOCIATED WITH STORAGE AND DELIVERY OF HIGH PRESSURE GASES - Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes. | 03-11-2010 |
| 20100072400 | METHOD FOR CLEANING A HIGH RESOLUTION SCANNING ELECTRON MICROSCOPE SAMPLE WITH A LOW POWER ION BEAM - A method for cleaning a high resolution electron microscope sample with a low power ion beam includes the following steps. One sample is transmitted to a dual beam system to perform the milling operation. The sample includes at least one cross-sectional area. The cross-sectional area includes a plurality of active areas (AA), a plurality of gates, and a plurality of gate oxides (GOx). During the milling process, re-deposition is generated, and the re-deposition covers the active area of the cross-sectional area and the gate oxide in the middle of the gate. An ion beam is applied to the cross-sectional area to remove the re-deposition. An oxide etching operation is performed to the surface of the cross-sectional area to generate surface topography. A high resolution scanning electron microscope is used to obtain an image from the cross-sectional area. The active area and the gate oxide are checked and analyzed. | 03-25-2010 |
| 20100084576 | HYBRID SCANNING FOR ION IMPLANTATION - A hybrid scanner is disclosed that is capable of performing at least one of an electric and magnetic scanning of an ion beam. The hybrid scanner comprises a plurality of magnetic elements configured to generate a magnetic field across the ion beam for magnetic scanning, and a plurality of electric elements configured to generate an electric field proximate to the ion beam for electric scanning. A power delivery controller is coupled to at least one of the magnetic elements and at least one of the electric elements, and is configured to selectively provide power to the magnetic and electric elements. | 04-08-2010 |
| 20100084577 | TECHNIQUES FOR ION IMPLANTATION OF MOLECULAR IONS - Techniques for ion implantation of molecular ions are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation comprising an ion implanter for implanting a target material with a molecular ion at a predetermined temperature to improve at least one of strain and amorphization of the target material, wherein the molecular ion is generated in-situ within an ion source. | 04-08-2010 |
| 20100084578 | ELECTRON BEAM LITHOGRAPHY APPARATUS AND STAGE MECHANISM THEREOF - A stage mechanism which comprises a positioning mechanism including a rotating stage and a linear movement stage, the positioning mechanism being housed in a vacuum chamber, and pipes leading from the outside of the vacuum chamber to the positioning mechanism. In the vacuum chamber, a trench-like space spreading underneath the positioning mechanism is provided, and the pipes connected between the positioning mechanism and vacuum bulkheads are laid to be shaped substantially like a U so as to deform in response to movement of the linear movement stage without touching an inside wall or the like of the vacuum chamber in this space. | 04-08-2010 |
| 20100090131 | METHOD OF DETERMINING ANGLE MISALIGNMENT IN BEAM LINE ION IMPLANTERS - A method includes directing an ion beam at a plurality of differing incident angles with respect to a target surface of a substrate by tilting the substrate as the ion beam is distributed across the target surface to implant ions into a plurality of portions of the substrate, wherein each one of the plurality of differing incident angles is associated with a different one of the plurality of portions, measuring angle sensitive data from each of the plurality of portions of to the substrate, and determining an angle misalignment between the target surface and the ion beam incident on the target surface from the angle sensitive data. | 04-15-2010 |
| 20100096567 | REDUCTION IN STAGE MOVEMENT REACTION FORCE IN AN ELECTRON BEAM LITHOGRAPHY MACHINE - An electron beam lithography machine ( | 04-22-2010 |
| 20100096568 | SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF THE SAME - A method for cleaning a substrate processing apparatus in which a first ion beam generator and a second ion beam generator are arranged opposite to each other to sandwich a plane on which a substrate is to be placed, and which processes two surfaces of the substrate, comprises steps of retreating the substrate from a position between the first ion beam generator and the second ion beam generator, and cleaning the second ion beam generator by emitting an ion beam from the first ion beam generator to the second ion beam generator. | 04-22-2010 |
| 20100102254 | ELECTRON BEAM APPARATUS - A writing apparatus includes a beam current detector which detects abeam current of the electron beam during execution of the writing when the substrate is not irradiated; a fluctuation value calculator which calculates a fluctuation value of the electron beam based on the beam current; and a corrector which corrects the electron beam fluctuation during the writing based on the fluctuation value. | 04-29-2010 |
| 20100108915 | Conductive Contamination Resistant Insulator - An apparatus that forms a source bushing, while comprehending the possible formation of electrically conductive films thereon, is disclosed. Such an apparatus may advantageously be used to isolate an ion source from other components within the ion implanter, as these components may be at different electrical potentials. In one embodiment, the source bushing is constructed from a material having a lower electrical resistance than is currently used. By constructing the bushing in this manner, the effects of the applied lower resistance films is reduced, as the change in effective resistance is reduced. In other embodiments, the source bushing is purposely lined with an electrically semiconducting material, so that the effects of the later applied lining are minimized. In either case, the electrical potential between the two devices that are being isolated by the bushing is more evenly applied across the bushing. | 05-06-2010 |
| 20100127190 | CHARGED PARTICLE BEAM MASKING FOR LASER ABLATION MICROMACHINING - An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser. | 05-27-2010 |
| 20100163755 | ROTATING IRRADIATION THERAPY APPARATUS - A rotating irradiation therapy apparatus used for particle beam therapy includes a rotating gantry equipped with a charged particle beam irradiation device beam transport devices for guiding a charged particle beam to the irradiation device and a roller in contact with a ring member included in the rotating gantry and supporting the gantry. A front ring is disposed in contact with the roller of a rotating body support device at one end in the axial direction of the rotating gantry and a rear ring is disposed in contact with the roller at the other end in the axial direction of the rotating gantry. At least one intermediate ring is disposed in a position different in the axial direction of the gantry between the front and rear rings and in contact with the roller. | 07-01-2010 |
| 20100171046 | LITHOGRAPHY SYSTEM AND PROJECTION METHOD - The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections. | 07-08-2010 |
| 20100171047 | PARTICLE BEAM IRRADIATION APPARATUS AND PARTICLE BEAM IRRADIATION METHOD - To ensure irradiation accuracy and safety, even when an irradiation device employing a different irradiation method is used, disclosed is herein a charged particle beam irradiation apparatus that irradiates an irradiation target with charged particle beams includes: | 07-08-2010 |
| 20100176309 | ION RADIATION THERAPY SYSTEM WITH ROCKING GANTRY MOTION - A radiation therapy system for heavy ions employs a rocking motion of a fan beam used to treat the patient, the fan beam having individually modulated beamlets, the rocking limited in angular extent to provide improved conformance of the dose to a tumor while shielding distal tissue from radiation. | 07-15-2010 |
| 20100181499 | ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION - An ion implantation method and system that incorporate beam neutralization to mitigate beam blowup, which can be particularly problematic in low-energy, high-current ion beams. The beam neutralization component can be located in the system where blowup is likely to occur. The neutralization component includes a varying energizing field generating component that generates plasma that neutralizes the ion beam and thereby mitigates beam blowup. The energizing field is generated with varying frequency and/or field strength in order to maintain the neutralizing plasma while mitigating the creation of plasma sheaths that reduce the effects of the neutralizing plasma. | 07-22-2010 |
| 20100187445 | ION BOMBARDMENT METHOD FOR REDUCING THE POROSITY OF METAL DEPOSITS - The invention relates to a method for treating a metal deposit to reduce or eliminate the porosity thereof by bombarding the same with an ion source. The source is, for example, an electron cyclotron resonance (RCE) source. The metal can be gold. The ion bombardment has the effect of sealing the porosity of the metal deposit according to the type, energy, amount and angle of incidence of the ions. | 07-29-2010 |
| 20100187446 | Heavy Ion Therapy with Microbeams - A method for delivering therapeutic heavy ion radiation to a subject, wherein a therapeutic dose of heavy ions is delivered substantially only to a target volume within the subject by generating a broad field of radiation effect substantially only within the target volume, and wherein the broad field of radiation effect is not generated in non-targeted tissue. The method includes the step of irradiating the target volume with at least two arrays of heavy ion microbeams, wherein the at least two arrays each have at least two parallel, spatially distinct heavy ion microbeams. The two arrays of microbeams are interleaved substantially only within the target volume to form a substantially continuous broad beam of radiation substantially only within the target volume. | 07-29-2010 |
| 20100193708 | METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESS - Disclosed are methods of operation to grow, modify, deposit, or dope a layer upon a substrate using a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system. Also disclosed is a method of forming a shallow trench isolation (STI) structure on a substrate, for example, an SiO | 08-05-2010 |
| 20100200773 | APPARATUS AND METHOD FOR CHARGED-PARTICLE BEAM WRITING - An average write speed M is calculated by averaging write speeds for blocks of a tentative block size La, and write speed variation σ of the blocks with respect to the average write speed M is calculated (Step S | 08-12-2010 |
| 20100207041 | Method of Smoothing Solid Surface with Gas Cluster Ion Beam and Solid Surface Smoothing Apparatus - Scratches or similar surface roughness in a solid surface is reduced by gas cluster ion beam irradiation. A method of smoothing a solid surface with a gas cluster ion beam includes an irradiation step in which the solid surface is irradiated with a gas cluster ion beam, and the irradiation step includes a process of causing clusters from a plurality of directions to collide with at least an area (spot) irradiated with the gas cluster ion beam on the solid surface. Collision of the clusters from a plurality of directions with the spot is brought about by an irradiation of the gas cluster ion beam in which flight directions of the clusters diverge with respect to a center of the beam, for example. | 08-19-2010 |
| 20100207042 | PARTICLE BEAM TREATMENT APPARATUS AND RESPIRATION NAVIGATION APPARATUS USED THEREFOR - Target respiration information is created in which a patient respiration pattern is set in advance to a cycle suitable for an operation cycle of a synchrotron, and the target respiration information is informed to the patient, so that a patient respiration timing becomes a state suitable for an operation of the synchrotron in such a manner that the patient consciously matches with the informed information. | 08-19-2010 |
| 20100213393 | CHARGED PARTICLE BEAM PROCESSING METHOD - Plural charged particle beams are simultaneously radiated to a surface of an object for processing it while the beams are moved relative to the surface of the object by the same movement. Among the plurality of charged particle beams, a first charged particle beam is an ion beam for a shape correcting process that is used to variable control a scanning speed along a raster scan trajectory. A second charged particle beam is an ion beam for a smoothing process that is used to variable control a pulse width or the amount of current according to a variation in the scanning speed. Plural processing operations with different distributions of the number of particles that reach a unit area on surface of the object are performed at the same time. Therefore, the processing time is reduced. | 08-26-2010 |
| 20100213394 | OPTIMIZATION OF CONTROL PARAMETERS FOR A PARTICLE IRRADIATION SYSTEM - A device for determining control parameters for a particle irradiation system that deposits different dose values at different target points in a target volume through the selection of sampling points by a particle beam is provided. The device includes an input for receiving information relating to a predefined dose distribution via target points, and a determination component for determining a particle number distribution that is to be deposited during the irradiation via sampling points. The determining takes place using the predefined dose distribution and a variable, which takes into account differences in the particle number distribution between particle numbers of different sampling points. | 08-26-2010 |
| 20100219357 | SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A DISPENSER CATHODE FOR HOMOGENEOUS ELECTRON EMISSION - A dispenser cathode which is comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, and emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area. | 09-02-2010 |
| 20100230616 | METHOD OF SMOOTHING SOLID SURFACE WITH GAS CLUSTER LON BEAM AND SOLID SURFACE SMOOTHING APPARATUS - Surface roughness having intervals of several tens of nanometers to about a hundred micrometers in a solid surface is reduced by directing a gas cluster ion beam to the surface. An angle formed between the normal to the solid surface and the gas cluster ion beam is referred to as an irradiation angle, and an irradiation angle at which the distance of interaction between the solid and the cluster colliding with the solid dramatically increases is referred to as a critical angle. A solid surface smoothing method includes an irradiation step of directing the gas cluster ion beam onto the solid surface at an irradiation angle not smaller than the critical angle. The critical angle is 70°. | 09-16-2010 |
| 20100237260 | Ion implantation systems - An ion implantation apparatus of high energy is disclosed in this invention. The new and improved system can have a wide range of ion beam energy at high beam transmission rates and flexible operation modes for different ion species. This high energy implantation system can be converted into a medium current by removing RF linear ion acceleration unit. | 09-23-2010 |
| 20100237261 | CHARGED PARTICLE BEAM WRITING APPARATUS - A blanking deflector | 09-23-2010 |
| 20100237262 | ELECTRON BEAM WRITING METHOD AND APPARATUS - When performing pattern writing by emitting an electron beam, a fixed frequency component, which is a component of a variation in an encoder signal from the encoder in one rotation of the rotation stage that commonly appears in a plurality of different rotational speeds of the rotation stage, is compensated for by deflection correcting the electron beam in a circumferential direction, and a variable frequency component, which is a component of the variation in the encoder signal other than the fixed frequency component, is compensated for by changing the clock frequency of a write clock. | 09-23-2010 |
| 20100243919 | METHOD FOR MODIFYING A MATERIAL LAYER USING GAS CLUSTER ION BEAM PROCESSING - A method of modifying a material layer on a substrate is described. The method comprises forming the material layer on the substrate. Thereafter, the method comprises establishing a gas cluster ion beam (GCIB) having an energy per atom ratio ranging from about 0.25 eV per atom to about 100 eV per atom, and modifying the material layer by exposing the material layer to the GCIB. | 09-30-2010 |
| 20100243920 | METHOD FOR ENHANCING A SUBSTRATE USING GAS CLUSTER ION BEAM PROCESSING - A method of enhancing a material layer on a substrate is described. The method comprises establishing a gas cluster ion beam (GCIB), and treating a host region of the substrate by exposing the host region of the substrate to the GCIB. The treatment with the GCIB may selectively remove an undesirable specie and/or introduce a desirable specie to the host region. | 09-30-2010 |
| 20100243921 | ION RADIATION THERAPY SYSTEM WITH VARIABLE BEAM RESOLUTION - An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and/or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity. | 09-30-2010 |
| 20100264335 | PATTERN WRITING ON A ROTATING SUBSTRATE - A method of producing an array of islands ( | 10-21-2010 |
| 20100288945 | METHOD FOR CREATING A THERAPY PLAN - A method for creating a therapy plan for a particle therapy, in which a filter is used to adjust the depth of penetration of the particle beam and an immobilization device is used to immobilize a body region of a patient to be treated, includes adjusting the geometry of a deformable mass of a filter to the geometry of the immobilization device. The deformable filter mass is applied, at least partially, to the immobilization device. A planning data record is obtained with recordings of the filter, so that the properties of the filter are determined on the basis of the recordings and are used in the therapy plan. | 11-18-2010 |
| 20100288946 | CHARGED PARTICLE BEAM IRRADIATION APPARATUS - In a charged particle beam irradiation apparatus to be adapted to a particle beam cancer treatment system or the like, a desired depth dose distribution is highly precisely created. In the charged particle beam irradiation apparatus that irradiates a particle beam, which is radiated from a particle beam generation unit, to a subject to be irradiated via a ridge filter exhibiting a cyclic thickness distribution for causing the particle beam to exhibit a desired energy distribution, the ridge filter has plural ridges thereof arranged to be perpendicular to entering directions of the particle beam. | 11-18-2010 |
| 20100294955 | METHOD AND SYSTEM OF MONITORING E-BEAM OVERLAY AND PROVIDING ADVANCED PROCESS CONTROL - A method for monitoring overlay of a direct-write system. The method includes providing a substrate having a pattern formed thereon by the direct-write system, generating data associated with the substrate pattern, decomposing the data by applying a transformation matrix, and determining an overlay index based on the decomposed data, the overlay index corresponding to a variation component of the substrate pattern relative to a target pattern. | 11-25-2010 |
| 20100301235 | METHOD AND APPARATUS FOR IRRADIATION OF A MOVING TARGET VOLUME - A method of determining an actual, especially an actual effective, radiation dose distribution of a moving target volume includes detecting first and further positions of volume elements of the target volume in a first and at least one further motional state of the moving target volume, determining transformation parameters by transformation of the first positions into the further positions, irradiating the moving target volume in accordance with an irradiation plan which comprises a plurality of raster points to be irradiated, wherein during the irradiation of a raster point it is detected which of the motional states is occupied by the moving target volume, assigning raster points to subirradiation plans and determining the actual effective dose for each of the plurality of volume elements, in each case from contributions from the raster points of the subirradiation plans using the transformation parameters. Calculation and application of correction parameters which compensate for changes, caused by movement, to the position of the Bragg maximum and to the biologically effective dose applied. | 12-02-2010 |
| 20100308235 | Programmable Particle Scatterer for Radiation Therapy Beam Formation - Interposing a programmable path length of one or more materials into a particle beam modulates scattering angle and beam range in a predetermined manner to create a predetermined spread out Bragg peak at a predetermined range. Materials can be “low Z” and “high Z” materials that include fluids. A charged particle beam scatterer/range modulator can comprise a fluid reservoir having opposing walls in a particle beam path and a drive to adjust the distance between the walls of the fluid reservoir under control by a programmable controller. A “high Z” and, independently, a “low Z” reservoir, arranged in series, can be used. When used for radiation treatment, the beam can be monitored by measuring beam intensity, and the programmable controller can adjust the distance between the opposing walls of the “high Z” reservoir and, independently, the distance between the opposing walls of the “low Z” reservoir according to a predetermined relationship to integral beam intensity. Beam scattering and modulation can be done continuously and dynamically during a treatment in order to deposit dose in a target volume in a predetermined three dimensional distribution. | 12-09-2010 |
| 20100308236 | MASKING APPARATUS FOR AN ION IMPLANTER - A masking apparatus includes a mask positioned upstream of a target positioned for treatment with ions. The mask is sized relative to the target to cause a first half of the target to be treated with a selective treatment of ions through the mask and a second half of the target to be treated with a blanket treatment of ions unimpeded by the mask during a first time interval. The masking apparatus also includes a positioning mechanism to change a relative position of the mask and the target so that the second half of the target is treated with the selective treatment of ions and the first half of the target is treated with the blanket implant during a second time interval. An ion implanter having the masking apparatus is also provided. | 12-09-2010 |
| 20100308237 | OPTICAL ELEMENT PROCESSING METHOD - The entire processing apparatus is prevented from growing in size due to the size of an optical effective region of an optical element to be processed. The optical effective region of the optical element is divided into a plurality of divided regions by the dividing line and each divided region is sequentially aligned to the processable region of the ion beam. The entire optical effective region is processed by repeating the process of a raster scan with the ion beam for each divided region in all divided regions. The entire processing apparatus can be made to be small by reducing the scanning range of the ion beam. | 12-09-2010 |
| 20100314559 | IMPLANT MASK WITH MOVEABLE MASK SEGMENTS - This apparatus has two mask segments. Each mask segment has apertures that an ion beam may pass through. These mask segments can move between a first and second position using hinges. One or more workpieces are disposed behind the mask segments when these mask segments are in a second position. The two mask segments are configured to cover the one or more workpieces in one instance. Ions are implanted into the one or more workpieces through the apertures in the mask segments. | 12-16-2010 |
| 20100314560 | D/A Converter and electron beam exposure apparatus - A D/A converter includes a D/A converter base part having a first D/A converter unit performing D/A conversion of high order bits and a second D/A converter unit performing D/A conversion of low order bits and including an auxiliary bit assigned an identical weight to a least significant bit, a correction D/A converter part, an error detection processing section generating a digital code to be set to a correction D/A converter unit in the correction D/A converter part, and a control section. The control section compares one bit current source with another bit current source in a lower order than the one bit current source, and corrects a value of the one bit current source by causing the error detection processing section to generate the digital code to be set to the correction D/A converter unit when judging that the value of the one bit current source changes. | 12-16-2010 |
| 20100320403 | ION ACCELERATION SYSTEM FOR MEDICAL AND/OR OTHER APPLICATIONS - The ion acceleration system or complex (T) for medical and/or other applications is composed in essence by an ion source ( | 12-23-2010 |
| 20100320404 | PARTICLE THERAPY INSTALLATION - A particle therapy system includes an ECR ion source for production of charged ions, which are accelerated in an accelerator unit that follows the ECR ion source. The accelerator unit accelerates the charged ions to an energy that is used for irradiation, where the magnetic fields of the ECR ion source are matched to operation of the ECR ion source for lightweight ions, such that the ECR ion source is operated in the afterglow mode. In the afterglow mode, an afterglow beam pulse is emitted from the ECR ion source after a microwave resonance pulse has been switched off. The current level of the afterglow beam pulse is higher than a current that is emitted from the ECR ion source during use of the microwave resonance pulse. | 12-23-2010 |
| 20100327188 | METHOD AND APPARATUS FOR IRRADIATION OF A TARGET VOLUME - A method of generating a data set defining a plurality of target points in a target volume in a body at which a particle beam is to be directed in a continuous or discontinuous process includes directing a particle beam to each of the target points so as to provide a spatial dose distribution in an area around the respective target point. The target points include a first target point having z-spacing, measured in a direction of the particle beam in a homogenous body equivalent to the body, from an adjacent second target point at a higher or lower particle energy. The method also includes defining the target points in the data set by at least one of the z-spacing and the spatial dose distribution in dependence upon a particle energy of the respective target point. | 12-30-2010 |
| 20110006224 | Digital Tomosynthesis in Ion Beam Therapy Systems - Some embodiments include creation of projection images of a patient volume using one or more x-ray sources, performance of digital tomosynthesis on the projection images to generate a cross-sectional image of the patient volume, determination of a location of a target within the patient volume based on the cross-sectional image, determination of a location of a Bragg peak associated with an ion beam, and determination of a difference between the location of the target and the location of the Bragg peak. | 01-13-2011 |
| 20110006225 | METHOD AND APPARATUS FOR EBEAM TREATMENT OF WEBS AND PRODUCTS MADE THEREFROM - A method and apparatus for sterilization of webs and products made therefrom using electron beams (ebeams) is provided. A controller is configured to modulate an ebeam to ensure that a non-continuously moving web is sterilized within a desired range of exposure. During sterilization in place operations, manifolds are configured to operate to ensure that sterilants do not enter an irradiation zone to prevent damage to ebeam emitters. | 01-13-2011 |
| 20110012030 | EBEAM STERILIZATION APPARATUS - Improved electron beam sterilization apparatus and shielding techniques for use in are provided. A controller modulates an ebeam when sterilizing an interior to an object to ensure that adequate dose is received. Sterilization carousels are configured with input/discharge feeds to reduce the possibility of humans being exposed to dangerous levels of radiation. The system reduces the amount of shielding required to thereby lower cost of installation. | 01-20-2011 |
| 20110012031 | CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS - A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame. | 01-20-2011 |
| 20110012032 | ELECTRON BEAM STERILIZATION APPARATUS - Improved electron beam sterilization apparatus and shielding techniques for use in are provided. A controller modulates an electron beam when sterilizing an interior to an object to ensure that adequate dose is received. Sterilization carousels are configured with input/discharge feeds to reduce the possibility of humans being exposed to dangerous levels of radiation. The system reduces the amount of shielding required to thereby lower cost of installation. | 01-20-2011 |
| 20110062351 | ELECTRON BEAM IRRADIATING APPARATUS WITH MONITORING DEVICE - The electron beam irradiating apparatus with the monitoring device has an electron beam irradiating means for irradiating materials in an irradiation chamber. The monitoring device has a photographing means for imaging a lights emitted by irradiating an electron beam to the materials; a storage means that stores state of electron beam irradiation in advance; and a calculating means that processes an image, which is captured by the photographing means, to decide a state of electron beam irradiation. The storage means has stored at least three state of electron beam irradiation and also has stored image luminance associated with those states of electron beam irradiation. The calculating means loads the image, which is captured by the photographing means, to compare the loaded image with the image luminance stored in the storage means, thereby deciding a state of electron beam irradiation. | 03-17-2011 |
| 20110073777 | ION BEAM INCIDENT ANGLE DETECTION ASSEMBLY AND METHOD - In an ion implanter, a detector assembly is employed to monitor the ion beam current and incidence angle at the location of the work piece or wafer. The detector assembly includes a plurality of pairs of current sensors and a blocker panel. The blocker panel is disposed a distance away from the sensors to allow certain of the beamlets that comprise the ion beam to reach the sensors. Each sensor in a pair of sensors measures the beam current incident thereon and the incident angle is calculated using these measurements. In this manner, beam current and incidence angle variations may be measured at the work piece site and be accommodated for, thereby avoiding undesirable beam current profiles. | 03-31-2011 |
| 20110073778 | CHARGED PARTICLE IRRADIATION SYSTEM AND METHOD FOR CONTROLLING THE SAME - A beam extraction process (interruption and restart) is appropriately performed when a failure occurs during irradiation of a spot group. A charged particle irradiation system includes a synchrotron | 03-31-2011 |
| 20110084220 | ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY - The present invention relates to a projection leis assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode. | 04-14-2011 |
| 20110084221 | ELECTRON BEAM IRRADIATION APPARATUS FOR OPEN-MOUTHED CONTAINERS - The apparatus has a rotating body | 04-14-2011 |
| 20110101245 | EVAPORATION SYSTEM - The present invention relates to an evaporation system comprising a vacuum chamber, a crucible for receiving an evaporation material, a substrate holder for receiving a substrate, and an electron beam source for heating the evaporation material to be deposited on the substrate, wherein the electron beam source together with the crucible and the substrate holder are arranged inside of the vacuum chamber, the electron beam source is a field emission electron beam source, and the evaporation system further comprises a control unit for controlling the direction of electrons emitted by the field emission electron beam source such that the emitted electrons heat the evaporation material such that it evaporates. | 05-05-2011 |
| 20110101246 | ACCELERATED PARTICLE IRRADIATION EQUIPMENT - Accelerated particle irradiation equipment, which performs irradiation of accelerated particles, includes an irradiation device and a building. The irradiation device includes a rotating unit rotatable about a rotation axis and performs irradiation of the accelerated particles generated by a particle accelerator. The building has an installation space in which the irradiation device is installed. The irradiation device is formed to be thin so as to have a small length in a direction of the rotation axis. A portion of the irradiation device, which has the maximum width in a radial direction orthogonal to the direction of the rotation axis, is disposed along the maximum width of the installation space. | 05-05-2011 |
| 20110101247 | TEMPERATURE CONTROL OF A SUBSTRATE DURING A PLASMA ION IMPLANTATION PROCESS FOR PATTERNED DISC MEDIA APPLICATIONS - Embodiments of the invention provide a method of reducing thermal energy accumulation during a plasma ion implantation process for forming patterns including magnetic and non-magnetic domains on a magnetically susceptible surface on a substrate. In one embodiment, a method of controlling a substrate temperature during a plasma ion implantation process includes (a) performing a first portion of a plasma ion implantation process on a substrate having a magnetically susceptible layer formed thereon in a processing chamber for a first time period, wherein a temperature of the substrate is maintained below about 150 degrees Celsius, (b) cooling the temperature of the substrate after the first portion of the plasma ion implantation process has been completed, and (c) performing a second portion of the plasma ion implantation process on the substrate, wherein the temperature of the substrate is maintained below 150 degrees Celsius. | 05-05-2011 |
| 20110101248 | Electron beam sterilizer - There is provided an electron beam sterilizer judging, in an electron beam irradiation zone, whether an electron beam amount to be irradiated to a resin bottle is proper or improper. The sterilizer includes an electron beam irradiator for irradiating the resin bottle with an electron beam through an irradiation window and a bottle conveyer for conveying the resin bottle, and the resin bottle conveyed in front of the irradiation window is irradiated with the electron beam to thereby sterilize the bottle. A beam collector is disposed in front of the irradiation window so as to oppose thereto. The beam collector is supported in an electrically insulated manner by an insulating member. When the electron beam irradiates the beam collector, an electric current flowing the beam collector is measured by an electric current measuring device. The measured electric current is compared with a predetermined reference value by a comparator, and a judging unit judges whether an amount of the electron beam irradiated to the resin bottle is proper or improper. In the judgement, when it is judged to be improper, the improper resin bottle and other resin bottles conveying before and after that resin bottle are removed by a reject unit in accordance with instructions from a command unit. | 05-05-2011 |
| 20110140005 | ION IMPLANTING SYSTEM - An ion implanting system includes an ion generating system that generates ion beams and an ion implanting chamber in which a work-piece that is irradiated with the ion beams generated from the ion generating system is provided and into which the ion beams generated from the ion generating unit are directed. The ion generating system includes a first ion generating unit that irradiates ions to an upper portion of the work-piece and a second ion generating unit irradiating ions to a lower portion of the work-piece. The ion implanting system a can implant ions into a large work-piece through one ion implantation process with ion generating units arranged alternately with respect to each other in the transfer direction of the work-piece. | 06-16-2011 |
| 20110174994 | PARTICLE BEAM IRRADIATION APPARATUS - A particle beam irradiation apparatus which can perform high-precision beam irradiation position is obtained. The apparatus is provided with inverse mapping means having an inverse mapping mathematical expression model for generating an command value for the scanning electromagnet and an command value for kinetic energy of the charged particle beam from a desired irradiation position coordinate of the charged particle beam in an irradiation subject so that irradiation to the irradiation subject is implemented on the basis of the command values concerned, and the scanning electromagnet and the kinetic energy of the charged particle beam are controlled on the basis of the command values generated from the desired irradiation position coordinate of the charged particle beam in the irradiation subject by using the inverse mapping mathematical expression model, thereby irradiating the irradiation subject with the charged particle beam while scanning the charged particle beam. | 07-21-2011 |
| 20110180731 | Method for Biological Modulation of Radiation Therapy - A method for the biological modulation of external beam radiation therapy, in which the temporal and spatial patterning of imparted dose is modified to maximize the dose rate to the target volume while minimizing the dose rate to healthy tissues surrounding the target volume, is provided. | 07-28-2011 |
| 20110180732 | ELECTRON IRRADIATION APPARATUS OF DC-TYPE DIELECTRIC BARRIER DISCHARGE AND ELECTRICAL THERAPEUTIC APPARATUS - A DC power supply | 07-28-2011 |
| 20110186755 | METHODS AND APPARATUS FOR THE PLANNING AND DELIVERY OF RADIATION TREATMENTS - Methods and apparatus are provided for planning and delivering radiation treatments by modalities which involve moving a radiation source along a trajectory relative to a subject while delivering radiation to the subject. In some embodiments the radiation source is moved continuously along the trajectory while in some embodiments the radiation source is moved intermittently. Some embodiments involve the optimization of the radiation delivery plan to meet various optimization goals while meeting a number of constraints. For each of a number of control points along a trajectory, a radiation delivery plan may comprise: a set of motion axes parameters, a set of beam shape parameters and a beam intensity. | 08-04-2011 |
| 20110198513 | CONTROL METHOD FOR ELECTRON BEAM STERILIZING DEVICE AND DEVICE PERFORMING SAID METHOD - An electron beam sterilizing device, comprises: an electron-generating filament; a beam-shaper; an output window; a high-voltage supply, capable of creating a high-voltage potential between the electron-generating filament and the output window, for acceleration of electrons; a high-voltage supply for driving current through the electron-generating filament; a control unit for controlling the operation of the electron beam sterilizing device. The electron beam sterilizing device has at least three operational states which include: an OFF-state, where there is no drive current through the electron-generating filament; an ON-state, where the electron-generating filament is kept at a temperature above the emission temperature so as to generate electrons for sterilization; and a standby state, between the OFF-state and ON-state, where the electron-generating filament is kept at a predetermined temperature just below the emission temperature. The control unit controls the device to assume the standby state. | 08-18-2011 |
| 20110204264 | ION IMPLANTATION THROUGH LASER FIELDS - Ions are generated and directed toward a workpiece. A laser source generates a laser that is projected above the workpiece in a line. As the laser is generated, a fraction of the ions are blocked by the laser. This may enable selective implantation or modification of the workpiece. In one particular embodiment, the lasers are generated while ions are directed toward the workpiece and then stopped. Ions are still directed toward the workpiece after the lasers are stopped. | 08-25-2011 |
| 20110226968 | METHOD FOR MULTI-BEAM EXPOSURE ON A TARGET - For irradiating a target with a beam of energetic electrically charged particles comprising a plurality of beamlets, the target is exposed in a sequence of exposure stripes composed image pixels. These stripes (s | 09-22-2011 |
| 20110240888 | METHOD OF TESTING ELECTRONIC COMPONENTS - A method for testing the sensitivity of electronic components and circuits against particle and photon beams using plasma acceleration, in which the flexibility of the multifaceted interaction can produce several types of radiation such as electron, proton, ion, neutron and photon radiation, and combinations of these types of radiation, in a wide range of parameters that are relevant to the use of electronic components in space, such as satellites, at high altitudes or in facilities that work with radioactive substances such as nuclear power plants. Relevant radiation parameter ranges are accessible by this method, which are hardly accessible with conventional accelerator technology. Because of the compactness of the procedure and its versatility, radiation testing can be performed in smaller laboratories at relatively low cost. | 10-06-2011 |
| 20110248189 | METHOD FOR PREVENTING DETERIORATION OF EDIBLE OIL OR INDUSTRIAL OIL AND APPARATUS THEREFOR - A fluororesin-coated electric wire cable is wound around a ring-shaped groove defined by an outer periphery of a cylinder and two flange edges immersed in an edible oil in a tank, forming each oscillating unit having a coil part; and the oscillating units are connected to an electromagnetic wave generator through a relay unit. Electromagnetic waves are irradiated from the coil parts based on an alternating current having a single frequency, an alternating current having a plurality of single frequencies different from one another, or an alternating current having a timewise varying frequency, the alternating currents each being within a frequency band of 4 kHz to 25 kHz, and a treatment based on a far-infrared heater or far-infrared ceramic is used combinedly therewith, to prevent deterioration of an edible oil or industrial oil. | 10-13-2011 |
| 20110253911 | Charged Particle Beam Writing Apparatus and Charged Particle Beam Writing Method - A charged particle beam writing apparatus according to an embodiment, includes a first dose calculating unit configured to calculate a first dose map for each set of a proximity effect correction coefficient map and a base dose map of a beam; a dimension map creation unit configured to create a dimension map of a pattern by using the first dose map calculated for each set; an adder configured to add dimensions of all sets for each position of the dimension map by using the dimension map of each set; a set map creation unit configured to create a set of a proximity effect correction coefficient map and a base dose map by using an added dimension map after addition; and a second dose calculating unit configured to calculate a second dose map by using a created set of the proximity effect correction coefficient map and the base dose map. | 10-20-2011 |
| 20110266465 | ION BEAM DEVICE - Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip ( | 11-03-2011 |
| 20110278477 | SYNCHRONIZED X-RAY / BREATHING METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises an X-ray system that is orientated to provide X-ray images of a patient in the same orientation as viewed by a proton therapy beam, is synchronized with patient respiration, is operable on a patient positioned for proton therapy, and does not interfere with a proton beam treatment path. Preferably, the synchronized system is used in conjunction with a negative ion beam source, synchrotron, and/or targeting method apparatus to provide an X-ray timed with patient respiration and performed immediately prior to and/or concurrently with particle beam therapy irradiation to ensure targeted and controlled delivery of energy relative to a patient position resulting in efficient, precise, and/or accurate noninvasive, in-vivo treatment of a solid cancerous tumor with minimization of damage to surrounding healthy tissue in a patient using the proton beam position verification system. | 11-17-2011 |
| 20110291029 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF - In a charged particle beam drawing apparatus, if at least one of calculating portions is free and at least one memory includes a free portion, a report that a next process can be additionally started by using at least one free calculating portion and the free portion of the memory, is transferred from a daemon to a writing control unit, and the next process is additionally started by the daemon on the basis of a start request transferred from the writing control unit to the daemon. If there is a possibility of a shortage of the calculating portions and the memory, and if a start request for starting a next process is transferred from the writing control unit to the daemon, the start request for starting the next process is refused by the daemon. | 12-01-2011 |
| 20120001096 | HADRON TREATMENT PLANNING WITH ADEQUATE BIOLOGICAL WEIGHTING - Treatment planning methods are provided that determine the variability of relative biological effectiveness (RBE) along a beam line and calculate, among other things, what intensity of hadron beam such as a proton or a carbon ion beam should be applied to achieve a desired biological dose at treatment site of a patient afflicted with a medical condition. Typically, three or four RBE values at three or four corresponding spacially-dispersed intervals along the beam line are calculated. In one embodiment, two RBE values for the spread-out Bragg peak (SOBP) region of the treatment site; one for the proximal section and one for the declining distal section is calculated. A third and different RBE value may be determined for the distal edge region of the SOBP. A fourth value may also be calculated for a pre-SOBP region. | 01-05-2012 |
| 20120025105 | POWER CONCENTRATOR FOR TRANSMUTING ISOTOPES - A method of effecting a chemical, physical or transmutational change in a target material using a high power particle beam concentrated on the target material. The particle beam is scanned in a controlled manner to reduce its power density and to avoid damage to equipment which is unable to tolerate high power densities. Movement between the target and the scanned beam is synchronized to cause the scanned beam to persistently or continuously strike the target to effect the chemical, physical or transmutational change, thereby concentrating the beam on the target. | 02-02-2012 |
| 20120025106 | BEAM HEAD - The present embodiments relate to a beam head including a vacuum housing, in which an electron source is arranged. The beam head also includes a beam finger that is connected to the vacuum housing and has an outlet window at a distal end. The beam head includes a transformer housing, in which a transformer connected to the electron source is arranged. The transformer housing is arranged directly on the vacuum housing. | 02-02-2012 |
| 20120056107 | UNIFORMITY CONTROL USING ION BEAM BLOCKERS - An ion beam is generated and the energy of this ion beam is changed from a first energy to a second energy through, for example, acceleration or deceleration. A portion of the ion beam is blocked after the energy is changed and the ion beam is implanted into a workpiece. A plurality of blockers may be used to block the beam. Each blocker may be attached to a drive unit configured to translate one of the blockers in a first direction. | 03-08-2012 |
| 20120056108 | SURFACE MODIFICATION METHOD OF FLUOROPOLYMERS BY ELECTRON BEAM IRRADIATION AND THE FABRICATION OF SUPERHYDROPHOBIC SURFACES USING THE SAME - A method for the surface modification of fluoropolymer films using electron beam irradiation to generate superhydrophobic surfaces is provided. This surface modification method can cause simultaneously both a physical modification roughening the fluoropolymer surfaces and a chemical modification changing the surface composition of the fluoropolymers, and therefore fabricating the superhydrophobicity on a fluoropolymer surface by controlling the dose of electron beam irradiation. Therefore, this method for the surface modification of fluoropolymers by electron beam irradiation can be used in the generation of superhydrophobic surfaces required in various industries such as paint, glue, fine chemistry, electrical and electronics, cars, and display manufacturing. | 03-08-2012 |
| 20120056109 | METHOD FOR EVALUATING RADIATION MODEL DATA IN PARTICLE BEAM RADIATION APPLICATIONS - A method for evaluating radiation model data in particle beam radiation applications, in particular in proton beam therapy of a determined target volume of malignant tissue within a patient, includes the following steps: a) gaining diagnostic data for a determined target volume to be irradiated; b) calculating a particle range in the predetermined target volume based on the diagnostic data for the determined target volume; c) designing a radiation model with particle beam characteristics based on the calculated particle range and optionally on a calculated dose depth distribution; d) applying a single pencil beam shot to the determined target volume at an elevated beam energy as compared to the particle beam characteristics of the radiation model; e) measuring the beam range of the single pencil beam shot downstream of the determined target volume; and f) comparing the measured beam range to a reference beam range calculated on the basis of the radiation model. | 03-08-2012 |
| 20120061593 | Charged-Particle Beam Lithographic Apparatus and Lithographic Method Therefor - A charged-particle beam lithographic method is implemented by irradiating resist applied on a material surface with successive shots of a variably shaped charged-particle beam. A table is drawn up which indicates the relations of the distances of each shot of interest to adjacent shots to corresponding amounts of correction applied to sides of the shot of interest taking account of the influence of forward scattering. Corrective shot data is found from the table by translating the sides of the shot of interest located opposite to the adjacent shots. Corrective values for a proximity effect produced under the influence of backward scattering are calculated based on the corrective shot data. The shots of the beam are carried out based on the corrective shot data and on the corrective values. | 03-15-2012 |
| 20120080618 | LASER ACCELERATOR DRIVEN PARTICLE BRACHYTHERAPY DEVICES, SYSTEMS, AND METHODS - A laser accelerator driven electronic brachytherapy system, device, and method for particle based treatment of a tumor or other human diseases and conditions. | 04-05-2012 |
| 20120085936 | METHOD FOR MONITORING ION IMPLANTATION - A method capable of monitoring ion implantation. First, an ion beam and a workpiece are provided. Next, implant the workpiece by the ion beam and generate a profile having numerous signals relevant to respectively numerous relative positions between the ion beam and the workpiece, wherein the profile has at least a higher portion, a gradual portion and a lower portion. Therefore, by directly analyzing the profile without referring to a pre-determined profile and without using a profiler measuring the ion beam, some ion beam information may be acquired, such as beam height, beam width, ion beam current distribution on the ion beam cross-section, and so on, and the ion implantation may be monitored real-timely. Furthermore, when numerous workpieces are implanted in sequence, the profile(s) of one or more initially implanted workpiece(s) may be to generate a reference for calibrating the ion implantation of the following workpieces. | 04-12-2012 |
| 20120085937 | Ion Beam Sample Preparation Thermal Management Apparatus and Methods - Disclosed are embodiments of an ion beam sample preparation thermal management apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. A heat sink means is configured to conduct heat away from the sample undergoing sample preparation in the ion beam. The ion beam irradiating means may modulate ion beam intensity between at least two intensities. The shield retention stage may be stationary or rotating. | 04-12-2012 |
| 20120085938 | Ion Beam Sample Preparation Apparatus and Methods - Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. A retention stage lifting means allows the creation of a loading chamber that is isolated from the main vacuum chamber where sample ion beam milling takes place. A heat sink means is configured to conduct heat away from the sample undergoing sample preparation in the ion beam. | 04-12-2012 |
| 20120085939 | Ion Beam Sample Preparation Apparatus and Methods - Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises a tilting ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. The tilting ion beam irradiating means may direct ions at the sample from more than one tilt angle. A rotating shield retention stage is also disclosed which works in concert with the tilting ion beam irradiating means to improve the flexibility and efficiency of the apparatus in preparing samples for microscopic observation. | 04-12-2012 |
| 20120085940 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a shot division unit configured to divide a figure defined in layout data into a plurality of shot figures each having a size which can be irradiated by one shot of a charged particle beam, a shot data generating unit configured to generate each shot data for each shot figure of the plurality of shot figures, where a number of times of generating the each shot data equals a number of times of multiple writing of the each shot figure of the plurality of shot figures, such that multiplicity of the multiple writing is variable per the each shot figure, and a writing unit configured to perform the multiple writing of the each shot figure onto a target workpiece, in accordance with the number of times of the each shot data generated for the each shot figure, using a charged particle beam. | 04-12-2012 |
| 20120091370 | IMPRINT MASK MANUFACTURING METHOD, IMPRINT MASK MANUFACTURING DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A pattern is formed on a mask substrate. Positional deviation information between an actual position of the pattern formed on the mask substrate and a design position decided at the time of designing the pattern is calculated. A heterogeneous layer of which a volume expands more greatly than that of surrounding mask substrate region is formed in a predetermined position within the mask substrate so that volume expansion of the heterogeneous layer according to the positional deviation information is achieved. | 04-19-2012 |
| 20120097868 | MODULATING IMPLANTATION FOR IMPROVED WORKPIECE SPLITTING - A first species is implanted into an entire surface of a workpiece and helium is implanted into this entire surface with a non-uniform dose. The first species may be, for example, hydrogen, helium, or nitrogen. The helium has a higher dose at a portion of a periphery of the workpiece. When the workpiece is split, this split is initiated at the periphery with the higher dose. The non-uniform dose may be formed by altering a scan speed of the workpiece or an ion beam current of the helium. In one instance, the non-uniform dose of the helium is larger than a uniform dose of the hydrogen. | 04-26-2012 |
| 20120119113 | Implementation of CO-Gases for Germanium and Boron Ion Implants - An ion implantation system for improving performance and extending lifetime of an ion source is disclosed. A fluorine-containing dopant gas source is introduced into the ion chamber along with one or more co-gases. The one or more co-gases can include hydrogen or krypton. The co-gases mitigate the effects caused by free fluorine ions in the ion source chamber which lead to ion source failure. | 05-17-2012 |
| 20120119114 | METHOD FOR OPERATING A PARTICLE THERAPY SYSTEM - The present embodiments relate to a method for operating a particle therapy system. The particle therapy system includes a particle generation device, a beam generating device for generating a particle beam from at least one portion of the generated irradiation particles, a measuring device for automatically measuring a particle beam intensity of the particle beam, and a particle beam influencing device. The particle beam influencing device is configured to adjust the particle beam intensity as a function of the measured particle beam intensity and a predefined setpoint value for the particle beam intensity. | 05-17-2012 |
| 20120119115 | RESPIRATORY INDUCTION APPARATUS, RESPIRATORY INDUCTION PROGRAM, AND PARTICLE BEAM THERAPY SYSTEM - The objective is to obtain a respiratory induction apparatus and a particle beam therapy system in which respiration can appropriately be induced by accurately evaluating the respiration. There are provided a respiratory induction control unit ( | 05-17-2012 |
| 20120126145 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a storage unit configured to store writing data in which there are defined a plurality of figures and resizing information indicating, with respect to each of the plurality of figures, a resizing status whether or not to perform resizing and a resizing direction used when performing resizing, a judgment determination unit configured to input the writing data and judge, with respect to each of the plurality of figures, the resizing status whether or not to perform resizing and the resizing direction used when performing resizing, a resize processing unit configured to resize, with respect to each of the plurality of figures, a dimension of a figure concerned in a judged resizing direction when it is judged to perform resizing, and a writing unit configured to write a pattern onto a target workpiece with using a resized figure and a charged particle beam. | 05-24-2012 |
| 20120126146 | ION MILLING DEVICE - Disclosed is a shield ( | 05-24-2012 |
| 20120145929 | ELECTRON BEAM STERILIZER - Plastic containers fed by an article feeder housed in a shield chamber sterilized by being irradiated with an electron beam that is radiated from an irradiation window of an electron beam irradiation unit which is coupled to an opening of the shield chamber. In a maintenance mode, an adjustment irradiation box is detachably mounted on the electron beam irradiation unit in covering relation to the irradiation window of the electron beam irradiation unit. The adjustment irradiation box houses therein an electron beam receiver for receiving the electron beam radiated from the irradiation window, a cooling mechanism for cooling the electron beam receiver, and an exhaust mechanism for discharging an atmosphere in the adjustment irradiation box. | 06-14-2012 |
| 20120161037 | Dose Measurement Method using Calorimeter - An ion implantation system for implanting ions into a workpiece is provided, having a process chamber and an energy source configured to produce a plasma of ions within the process chamber. A workpiece support having a support surface configured to position the workpiece within an interior region of the process chamber is configured to expose an implantation surface of the workpiece to the plasma of ions. A pulse generator is in electrical communication with the workpiece support, wherein the pulse generator is configured to apply an electrical pulse to the support, therein attracting ions to the implantation surface of the workpiece and implanting ions into the workpiece. A calorimeter is further associated with the workpiece support, wherein a controller is configured to monitor a signal from the calorimeter and to control the implantation of ions into the workpiece based, at least in part, on the signal from the calorimeter. | 06-28-2012 |
| 20120161038 | ACCELERATOR AND METHOD FOR IRRADIATING A TARGET VOLUME - A device operable to accelerate a particle beam to an energy for irradiating a target volume. The device includes a particle accelerator operable in a first working phase in which particles of the particle beam are accelerated to the energy and a second working phase in which the particles of the particle beam are provided and extracted for irradiating the target volume. The device further includes a control device operable to interrupt an irradiation of the target volume if the target volume assumes a predetermined state. The control device is also operable to control the particle accelerator as a function of a comparison between a residual particle number stored in the accelerator and a reference value. | 06-28-2012 |
| 20120175532 | COMPACT MODULAR EBEAM SYSTEMS AND METHODS - In an Ebeam system, the cathode assembly and/or the window assembly can be simply and quickly replaced or exchanged as required by conditions of use, without replacing the vacuum chamber, or other component systems. In some cases, replacement may be made without removing the vacuum chamber from its installed position. As a result, the cathode assembly and the window assembly can be readily changed over for maintenance. In addition, modular replacement cathode assemblies and window assemblies having varying characteristics may be selected to match a specific desired application, and then installed into the system. The system may be designed as a compact and lightweight portable device. | 07-12-2012 |
| 20120181456 | SYSTEMS AND METHODS OF VARYING CHARGED PARTICLE BEAM SPOT SIZE - Methods and devices enable shaping of a charged particle beam. A modified dielectric wall accelerator includes a high gradient lens section and a main section. The high gradient lens section can be dynamically adjusted to establish the desired electric fields to minimize undesirable transverse defocusing fields at the entrance to the dielectric wall accelerator. Once a baseline setting with desirable output beam characteristic is established, the output beam can be dynamically modified to vary the output beam characteristics. The output beam can be modified by slightly adjusting the electric fields established across different sections of the modified dielectric wall accelerator. Additional control over the shape of the output beam can be excreted by introducing intentional timing de-synchronization offsets and producing an injected beam that is not fully matched to the entrance of the modified dielectric accelerator. | 07-19-2012 |
| 20120187314 | IRRADIATION OR IRRADIATION PLANNING SYSTEM FOR A RESCANNING METHOD USING A PARTICLE BEAM - A method for irradiating a target volume includes defining a target region having a plurality of target points. The target points are individually approachable. The method includes defining a number of rescanning passes, in which the target region is scanned multiple times, such that the plurality of target points of the target region is approached variously often during the rescanning passes. At least some target points of the plurality of target points are not approached in all of the rescanning passes. The approaching of the plurality of target points is distributed among the rescanning passes such that for a target point of the plurality of target points that is not approached in all of the rescanning passes, at least one further rescanning pass, in which the target point is not approached, is located before a final rescanning pass, in which the target point is approached. | 07-26-2012 |
| 20120205557 | Method for Identifying Possible Changes in the Range of a Planned Irradiation Field Before the Patient is Irradiated with Charged Particles - A method serves as a supplemental safety mechanism before the irradiation of a patient with charged particles. By this method, differences which occur from day to day in the density composition within the patient are found, and the influence on the range of the planned irradiation field is determined. For this purpose, two high-resolution x-ray detectors are required, which form an angle of 60-120° to each other. | 08-16-2012 |
| 20120211674 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a storage unit to store each pattern data of plural figure patterns arranged in each of plural small regions made by virtually dividing a writing region of a target workpiece to be written on which resist being coated. The charged particle beam writing apparatus further including an assignment unit to assign each pattern data of each figure pattern to be arranged in each of the plural small regions concerned, and a writing unit to write, for each of plural groups, each figure pattern in each of the plural small regions concerned by using a charged particle beam. | 08-23-2012 |
| 20120211675 | MASK MAKING DECISION FOR MANUFACTURING (DFM) ON MASK QUALITY CONTROL - The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features. | 08-23-2012 |
| 20120217421 | METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH OVERLAPPING SHOTS - A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots is determined that is capable of forming a pattern on a surface, where a plurality of shots in the same exposure pass overlap, and where the dose margin from the set of shots is calculated. A method for forming patterns on a surface is also disclosed. | 08-30-2012 |
| 20120223254 | RI MANUFACTURING APPARATUS - An RI manufacturing apparatus includes: an accelerator which accelerates charged particles; a target which is irradiated with the charged particle accelerated by the accelerator, thereby manufacturing a radioactive isotope; a built-in shield that may be a wall body which surrounds the accelerator and the target to shield radiation; and a target shield that may be a wall body which is disposed between the built-in shield and the accelerator and surrounds the target to shield the radiation | 09-06-2012 |
| 20120228521 | PARTICLE BEAM THERAPY SYSTEM - The objective is to obtain a particle beam therapy system that can suppress the effect of a leakage dose. There are provided a scanning nozzle that irradiates in a predetermined direction a particle beam emitted from an accelerator; an irradiation control unit that controls operation of the irradiation nozzle in such a way that the particle beam of a predetermined dose is sequentially irradiated onto each of a plurality of spots set in a planar direction in an irradiation subject; and a control unit that on/off-controls emission of the particle beam from the accelerator. The irradiation control unit makes the irradiation nozzle scan in a diluting manner the particle beam onto a predetermined area in the irradiation subject, in a predetermined period after a time point when emission is switched from ON to OFF, or in a period from the time point when emission is switched from ON to OFF to a time point when the particle beam is cut off. | 09-13-2012 |
| 20120228522 | CHARGED PARTICLE BEAM IRRADIATION SYSTEM AND NEUTRON BEAM IRRADIATION SYSTEM - A charged particle beam irradiation system includes: an accelerator which accelerates charged particles along an orbit, thereby emitting a charged particle beam; a gantry on which the accelerator is mounted and which can rotate or oscillate around a given axis; and an irradiation section which is mounted on the gantry and can irradiate the charged particle beam emitted from the accelerator, toward an irradiated body, wherein a shielding body which is provided in the gantry and shields radiation that is radiated from a side of the accelerator, which may be a face intersecting the radial direction of the orbit, is disposed. | 09-13-2012 |
| 20120248340 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a division/distribution processing unit to divide and distribute processed data into data groups each having an approximately equal data amount respectively, transmitting units to transmit the processed data of the groups such that processed data is transmitted in descending order with respect to order of writing processing for each data group and the groups are transmitted in parallel, memories to store the processed data of the groups such that each of the memories stores processed data of each different one of the groups, a writing order data output unit to output them, regardless of data group and in order of writing processing, and a writing unit to write a pattern on a target workpiece with a charged particle beam, based on the processed data output in the order of writing processing. | 10-04-2012 |
| 20120280150 | GANTRY COMPRISING BEAM ANALYSER FOR USE IN PARTICLE THERAPY - The present invention relates to a particle therapy apparatus used for radiation therapy. More particularly, this invention relates to a gantry for delivering particle beams which comprises means to analyse the incoming beam. Means are integrated into the gantry to limit the momentum spread of the beam and/or the emittance of the beam. | 11-08-2012 |
| 20120286174 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A writing apparatus wherein, for each figure pattern representative of a chip, the figure patterns are divided into shot figures represented by shot division image information for discriminating a size of each of the shot figures and an arrangement position in each of the figure patterns of each of the shot figures. Using the shot division image information and information on alignment coordinates of each of the figure patterns, an allotting processing unit allots each of the shot figures to be arranged in each of mesh regions virtually divided by a predetermined size from a reference position different from an end portion of a figure pattern concerned in a chip region. For each of the mesh regions, there is calculated a number of shots of the beam used when writing inside of a mesh region concerned based on the number of allotted shot figures. | 11-15-2012 |
| 20120286175 | COOLED MANIPULATOR TIP FOR REMOVAL OF FROZEN MATERIAL - The disclosed apparatus enables attachment to a sample to be excised from a frozen bulk sample, the transfer of the excised sample from the bulk sample to a separate cooled support structure by means of a manipulator tip that can be cooled and maintained at a temperature below that of vitreous ice and which provides both an active cooling path and cryogenic shielding to maintain the temperature of the excised sample below that of vitreous ice. The cryogenic shielding also helps minimize contamination of the cooled sample by condensation of volatile material. A method is disclosed for extracting a portion of a frozen sample, comprising attaching a thermally-isolated cooled manipulator tip to the sample with vapor deposition and removing a portion of the sample affixed to the tip without changing phase of the portion of the sample being removed, with a focused ion beam. | 11-15-2012 |
| 20120292534 | Multi-phase Gating for Radiation Treatment Delivery and Imaging - A multi-phase radiation therapy treatment method is provided that includes computational software to simultaneously optimize radiation plans for each phase of delivery. A specific realization of multi-phase therapy, dual gating, is described where the first radiation therapy treatment plan provides treatment during an inhale phase of a patient breathing cycle and the second radiation therapy treatment plan provides treatment during an exhale phase of the patient breathing cycle. Using a radiation therapy machine, the first radiation therapy treatment plan is delivered during the inhale phase and the second radiation therapy treatment plan is delivered during the exhale phase of the patient breathing cycle. An associated imaging method is provided for gated volumetric image guidance at multiple different phases in a single imaging acquisition. | 11-22-2012 |
| 20130001440 | SYSTEM AND METHOD FOR ION IMPLANTATION WITH DUAL PURPOSE MASK - A system for implanting a substrate. The system includes a substrate holder disposed within a process chamber of the system and coupled to ground. The system also includes an electrode disposed within the process chamber and coupled to a power source, the power source configured to supply voltage to the electrode as an unbalanced voltage pulse train, wherein a negative peak voltage during a negative voltage pulse period of the unbalanced voltage pulse train is higher than a positive peak voltage during a positive voltage pulse period of the unbalanced pulse train. The system further includes a movable mask, wherein the movable mask is configured to move between a first position proximate the substrate holder, and a second position proximate the driven electrode. | 01-03-2013 |
| 20130001441 | RADIATION SCANNING AND DISABLING OF HAZARDOUS TARGETS IN CONTAINERS - In one example, a method of examining a container is disclosed comprising detecting a potential threat within contents of a container using radiation scanning and disabling the potential threat with radiation. In another example, a method of examining a container is disclosed comprising scanning at least a portion of the container with a first radiation beam, detecting radiation interacting with contents of the container, identifying a potential threat contained based, at least in part, on the detected radiation, and disabling the potential threat with a dose of radiation from a second radiation beam. The potential threat may be a nuclear, chemical, and/or biological weapon, for example. Chemical and/or biological detectors may also be provided. The threat and/or electronics associated with the threat, may be disabled. Systems are also disclosed. | 01-03-2013 |
| 20130043413 | Arrangement of optical fibers, and a method of forming such arrangement - A method of forming an optical fiber array. The method comprises providing a substrate having a first surface and an opposing second surface. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. Additionally, a plurality of fibers is provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. For each fiber, from the first surface side of the substrate, the fiber is inserted in a corresponding aperture such that the fiber end is positioned in close proximity of the second surface. Then the fiber is bent in a predetermined direction such that the fiber abuts a side wall of the aperture at a predetermined position. Finally, the bent fibers are bonded together using an adhesive material. | 02-21-2013 |
| 20130048882 | CHARGED PARTICLE BEAM FORMING APERTURE AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS - An aperture that forms a charged particle beam includes a non-evaporable getter on a surface of the aperture. The non-evaporable getter is disposed in a position to which the charged particle beam is irradiated. The degradation of the exhaust performance around a charged particle source while the charged particle source is driven is suppressed. | 02-28-2013 |
| 20130048883 | SYSTEMS AND METHODS FOR PREVENTING UNSAFE MEDICAL TREATMENT - A treatment safety device is operable by a computer-based treatment safety module to prevent, by at least one of an operational interlock and a warning indicator, a medical treatment unless the treatment safety module determines that predetermined treatment verification criteria are met. The treatment safety device can tie into an existing operational interlock, such as an electrical door interlock. In a radiation oncology application, the treatment safety module verification criteria can include a satisfactory correspondence between elements of a pending treatment and an intended treatment. | 02-28-2013 |
| 20130056653 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted naphtholphthalein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate, excellent characteristics in adhesion and implantation onto a non-planar substrate, a good pattern profile after light exposure, and an ion implantation resistance at the time of ion implantation; and a patterning process. | 03-07-2013 |
| 20130056654 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted fluorescein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate with excellent pattern profile after light exposure, adhesion, implantation characteristics onto a non-planar substrate, and in addition, ion implantation resistance at the time of ion implantation; and to provide a patterning process. | 03-07-2013 |
| 20130082193 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing. | 04-04-2013 |
| 20130082194 | CHARGED PARTICLE RADIATION DEVICE AND SOUNDPROOF COVER - A charged particle radiation device includes a sample chamber in which a sample stage adapted to mount a sample is installed, a charged particle radiation irradiation section adapted to irradiate the sample with a charged particle radiation to observe and fabricate the sample, sidewalls installed on a periphery of the sample chamber and the charged particle radiation irradiation section, a ceiling board installed on a plane located in an upper part of the sidewalls, and a sound absorbing structure section disposed below the ceiling board, and including a plurality of hole sections and a hollow section communicated with the hole sections. The sound absorbing structure section has an absorption band including a frequency band of a standing wave generated in a space surrounded by the sidewalls and the ceiling board. Further, a soundproof cover may include the sidewalls, ceiling board and sound absorbing structure. | 04-04-2013 |
| 20130087721 | CHARGED PARTICLE DOSE SIMULATION DEVICE, CHARGED PARTICLE BEAM IRRADIATION DEVICE, CHARGED PARTICLE DOSE SIMULATION METHOD, AND CHARGED PARTICLE BEAM IRRADIATION METHOD - A simulation device includes an input unit which receives an input of simulation data including material information of the irradiation target and irradiation information of a charged particle beam, and an arithmetic unit which calculates the dose distribution of the charged particle beam in the irradiation target on the basis of simulation data received by the input unit and the dose distribution kernel. The arithmetic unit segments the charged particle beam spread to a predetermined range at an intermediate portion in the traveling direction of the charged particle beam, hypothesizes a plurality of virtual shapes having conical spread with a segmented position as a start point, and calculates the dose distribution of the charged particle beam in the irradiation target on the basis of simulation data received by the input unit and a plurality of virtual shapes of the charged particle beam. | 04-11-2013 |
| 20130099139 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a unit to calculate a gradient of a convolution amount that is calculated from a convolution operation between an area density and a distribution function, a unit to calculate a small influence radius phenomenon dose correction coefficient that corrects for dimension variation due to a phenomenon whose influence radius is on an order of microns or less, by using the convolution amount and the gradient, a unit to calculate a proximity effect dose correction coefficient that corrects for dimension variation due to a proximity effect, by using a first function depending on the small influence radius phenomenon dose correction coefficient, a unit to calculate a dose by using the proximity effect dose correction coefficient and the small influence radius phenomenon dose correction coefficient, and a unit to write a figure pattern concerned on a target object, based on the dose. | 04-25-2013 |
| 20130134328 | PROCESSING SYSTEM - A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam. | 05-30-2013 |
| 20130140473 | Automatic Control System for Selection and Optimization of Co-Gas Flow Levels - An ion implantation system for improving performance and extending lifetime of an ion source is disclosed whereby the selection, delivery, optimization and control of the flow rate of a co-gas into an ion source chamber is automatically controlled. | 06-06-2013 |
| 20130146790 | APPARATUS AND METHOD FOR CHARGE NEUTRALIZATION DURING PROCESSING OF A WORKPIECE - A processing system may include a plasma source for providing a plasma and a workpiece holder arranged to receive ions from the plasma. The processing system may further include a pulsed bias circuit electrically coupled to the plasma source and operable to switch a bias voltage supplied to the plasma source between a high voltage state in which the plasma source is biased positively with respect to ground and a low voltage state in which the plasma source is biased negatively with respect to the ground. | 06-13-2013 |
| 20130153791 | Mask Manufacturing Device - According to one embodiment, a mask manufacturing device includes a positional-deviation calculating unit that acquires positional deviation information between an actual position of a pattern formed on a mask substrate and a design position decided at the time of designing the pattern to a predetermined area of a square on the mask substrate; an irradiating-condition calculating unit that calculates an irradiating condition including an irradiating amount and an irradiating position of radiation to correct the positional deviation calculated to the predetermined area of a square on the mask substrate by using positional-deviation correction information, which indicates a relationship between the irradiating amount and the irradiating position of the radiation to the mask substrate and a pattern position change after irradiation of the radiation; and an irradiating unit that irradiates the mask substrate with the radiation under the irradiating condition calculated by the irradiating-condition calculating unit. | 06-20-2013 |
| 20130175459 | MULTI-SECTIONAL LINEAR IONIZING BAR AND IONIZATION CELL - A multi-sectional linear ionizing bar with at least four elements is disclosed. First, disclosed bars may include at least one ionization cell with at least one axis-defining linear ion emitter for establishing an ion cloud along the length thereof. Second, disclosed bars may include at least one reference electrode. Third, disclosed bars may include a manifold for receiving gas or air from a source and for delivering same past the linear emitter(s) such that substantially none of the gas/air flows into the ion cloud. Fourth, disclosed bars may include means for receiving the ionizing voltage and for delivering same to the linear emitter(s) to thereby establish the ion cloud. In this way, disclosed ionizing bars may transport ions from the plasma region toward a charge neutralization target without inducing substantial vibration of the linear emitter and without substantial contaminants from the gas/air flow reaching the linear emitter. | 07-11-2013 |
| 20130193353 | CHARGED PARTICLE ACCELERATOR AND PARTICLE BEAM THERAPY SYSTEM - The objective is to obtain a charged particle accelerator where the amount of pattern data for operating an acceleration cavity and electromagnets based on time clocks is reduced and the pattern data communication time is shortened. An accelerator control apparatus provided in a charged particle accelerator of the present invention is characterized by including a clock generation unit that generates an acceleration cavity clock and an electromagnet clock that is synchronized with the acceleration cavity clock and has a frequency lower than that of the acceleration cavity clock; a high-frequency control unit that controls an acceleration cavity, based on an acceleration cavity pattern stored in a first pattern memory and the acceleration cavity clock; and a deflection electromagnet control unit that controls a deflection electromagnet, based on a deflection electromagnet pattern stored in a second pattern memory and the electromagnet clock. | 08-01-2013 |
| 20130200280 | METHODS OF FORMING LAYERS - A method of forming a layer, the method including providing a substrate having at least one surface adapted for deposition thereon; and directing a particle beam towards the surface of the substrate, the particle beam including moderately charged ions (MCIs), substantially all the MCIs independently have charges from ±2 to ±6 and kinetic energies of not greater than about 200 eV, wherein the MCIs do not penetrate more than about 30 Å into the surface of the substrate to form a layer on the substrate. | 08-08-2013 |
| 20130221243 | Linear Accelerators - The primary collimator for a radiotherapy apparatus can be made up of several layers, each comprising several apertures, and each layer being moveable so as to select a specific aperture to build up the primary collimator shape. In this way, the shape of the primary collimator can be tailored and/or the beam filters incorporated into the primary collimator assembly. This saves space in the radiation head whilst also allowing filters to be easily interchanged. | 08-29-2013 |
| 20130221244 | ELECTRON BEAM IRRADIATION APPARATUS - An electron beam irradiation apparatus is provided that includes a vacuum room, an electron beam generator, a window frame, and an irradiation foil. The vacuum room includes a wall having an opening through which an electron beam is irradiated. An internal atmosphere of the vacuum room is evacuated. The electron beam generator is provided inside the vacuum room. The window frame is attached to and surrounds the opening in the wall of the vacuum room. The irradiation foil, through which an electron beam generated in the vacuum room is transmitted, is fixed to the window frame. The surface of the window frame, at least an area exposed to the vacuum room, is substantially covered with material including an element or elements with an atomic number less than or equal to 10. | 08-29-2013 |
| 20130228708 | Ion Beam Sample Preparation Apparatus and Methods - Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. A retention stage lifting means allows the creation of a loading chamber that is isolated from the main vacuum chamber where sample ion beam milling takes place. A heat sink means is configured to conduct heat away from the sample undergoing sample preparation in the ion beam. | 09-05-2013 |
| 20130240759 | Method and Apparatus for Clamping and Cooling a Substrate for ION Implantation - A system and method are disclosed for holding and cooling substrates during processing. A substrate clamp has an engagement portion for engaging a substrate about the inside diameter as well as a portion of the substrate surface immediately adjacent to the inside diameter. The clamp has a retracted position which enables the engagement portion to fit through the substrate ID, and an expanded position which enables the engagement portion to engage the substrate ID and the substrate surface immediately adjacent to the inside diameter. The clamp can include a conformal coating to enhance engagement between the substrate and the engagement portion. The clamp can also include an energy absorbing coating on one or more surfaces to maximize the absorption of radiative energy emitted from the substrate. Other embodiments are described and claimed. | 09-19-2013 |
| 20130240760 | Treatment Method for Stamping Tool Surface - To enable fabrication of a precise stamped product having an extremely low surface roughness. Ripples | 09-19-2013 |
| 20130264497 | DRAWING APPARATUS, DRAWING METHOD, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing overlaid with a shot formed on a substrate with a plurality of charged particle beams based on a plurality of drawing stripe data that constitute drawing data. The apparatus includes a charged particle optical system configured to generate the plurality of charged particle beams; and a controller configured to generate a plurality of intermediate stripe data as data of a plurality of intermediate stripes, adjacent ones of the plurality of intermediate stripes overlapping with each other, to obtain information on distortion of the shot, and to transform the plurality of intermediate stripe data based on the information on the distortion to generate the plurality of drawing stripe data. | 10-10-2013 |
| 20130284947 | METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH MULTIPLE EXPOSURE PASSES - A method and system for optical proximity correction or fracturing or mask data preparation or mask process correction or proximity effect correction for charged particle beam lithography are disclosed in which a set of shaped beam shots is determined which, when used in a shaped beam charged particle beam writer, will form a pattern on the surface, where the set of shots includes shots for a plurality of exposure passes, and where the determination of the shots includes increasing the dose margin of the pattern by adding a shot in a single exposure pass. | 10-31-2013 |
| 20130299721 | ENERGY DEGRADER AND CHARGED PARTICLE IRRADIATION SYSTEM INCLUDING THE SAME - An energy degrader includes: a damping unit that attenuates energy of incident charged particles and has a thickness changing stepwise or continuously according to a position of a two-dimensional coordinate system within a plane crossing a traveling direction of charged particles; and a driving unit that performs translational driving of the damping unit in first and second axial directions that are directions of two axes crossing each other in the two-dimensional coordinate system. | 11-14-2013 |
| 20130299722 | ION IMPLANTATION METHOD AND ION IMPLANTER - An ion implantation method and an ion implanter with a beam profiler are proposed in this invention. The method comprises setting scan conditions, detecting the ion beam profile, calculating the dose profile according to the detected ion beam profile and scan conditions, determining the displacement for ion implantation and implanting ions on a wafer surface. The ion implanter used the beam profiler to detect the ion beam profile, calculate dose profile and determine the displacement and used the displacement in ion implantation for optimizing, wherein the beam profiler comprises a body with ion channel and detection unit behind the ion channel in the body for beam profile detection. The beam profiler may be a 1-dimensional, 2-dimensional or angle beam profiler. | 11-14-2013 |
| 20130334442 | DRIFT CORRECTION METHOD AND PATTERN WRITING DATA GENERATION METHOD - A writing area of a sample is divided into a plurality of stripes having a width corresponding to an area density of a pattern to be written on the sample with a charged-particle beam. The writing is stopped when writing of at least one stripe is terminated, and a drift amount is measured. An irradiation position of the charged-particle beam is corrected with the use of the drift amount. When the average value of the area density is more than a predetermined value, a stripe has a width smaller than the reference width, and when the average value of the area density is less than the predetermined value, the stripe has a width larger than the reference width. The width of the stripe is preferably a width corresponding to the variation of a drift from the beginning of irradiation with the charged-particle beam. | 12-19-2013 |
| 20140001380 | MASK DRAWING METHOD, MASK DRAWING APPARATUS | 01-02-2014 |
| 20140021373 | BEAMLINE ELECTRODE VOLTAGE MODULATION FOR ION BEAM GLITCH RECOVERY - An ion implantation system and method are disclosed in which glitches in voltage are minimized by use of a modulated power supply system in the implanter. The modulated power supply system includes a traditional power supply and a control unit associated with each power supply, where the control unit is used to isolate the power supply from an electrode if a glitch or arc is detected. The control unit then restores connectivity after the glitch condition has been rectified. | 01-23-2014 |
| 20140021374 | POWER SOURCES - Methods and systems are described for providing a high frequency high voltage source. For example, a power source for use in a particle accelerator, an arc welder or an inductive heater. | 01-23-2014 |
| 20140021375 | PARTICLE BEAM IRRADIATION SYSTEM AND OPERATING METHOD - A particle beam irradiation system having a multi-energy extraction control operation that controls the extraction beam energy in a synchrotron within a short time, such that when the ion beam irradiation is halted, an operating cycle is updated within a short time and a dose rate is improved. To this end, operating control data for each of the devices constituting the synchrotron is constructed by multi-energy extraction control pattern data for controlling extraction of beams of a plurality of energy levels at one operating cycle, and a plurality of sets of deceleration control data that correspond to the extraction control of the beam of the plurality of energy levels. The devices are controlled by using the operating control data. | 01-23-2014 |
| 20140027655 | PEPTIDE NANOSTRUCTURES AND METHODS OF GENERATING AND USING THE SAME - A tubular or spherical nanostructure composed of a plurality of peptides, wherein each of the plurality of peptides includes no more than 4 amino acids and whereas at least one of the 4 amino acids is an aromatic amino acid. | 01-30-2014 |
| 20140061511 | TARGETING METHOD FOR MICROBEAM RADIOSURGERY - A method of performing microbeam radiosurgery on a patient whereby opposing portions of target tissue within a patient are exposed to a flux of high energy quanta via microbeam envelopes. The microbeam envelopes are applied in multiple non-parallel orientations such that the exposed portions of the target tissue define a substantially closed volume. The tissue remaining inside is thereby denied blood flow and dies. | 03-06-2014 |
| 20140077103 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a dose calculation unit to calculate, for each of a plurality of first small regions made by virtually dividing a writing region of a target object to be mesh-like regions each having a size larger than an influence radius of forward scattering of a charged particle beam, a dose of the charged particle beam shot in a first small region concerned of the plurality of first small regions, by using a dose formula which is different depending on a shot type classified by whether a shot figure formed by the charged particle beam is at an edge of a figure pattern or inside the figure pattern in the first small region concerned, and a writing unit to write, for each of the plurality of first small regions, the figure pattern with a dose calculated by the dose formula. | 03-20-2014 |
| 20140091237 | Ion Beam Sample Preparation Apparatus and Methods - Disclosed are embodiments of an ion beam sample preparation apparatus and methods. The apparatus has disposed in a vacuum chamber at least one tilting ion beam irradiating means with intensity control, a rotation stage with rotation control, a sample holder, and an adjustable positioning stage that has two axes of positional adjustment that are operable to move the region of the sample being prepared by the ion beam relative to the ion beam. The apparatus may also include a vacuum-tight optical window for observing the sample and a shutter for protecting the optical window from debris while the sample is prepared in the ion beam. | 04-03-2014 |
| 20140091238 | ENERGY DEGRADER AND CHARGED PARTICLE BEAM IRRADIATION SYSTEM EQUIPPED THEREWITH - An energy degrader includes a plurality of attenuating members configured to attenuate the energy of an incident charged particle beam, the plurality of attenuating members having different amounts of energy to be attenuated. A low-energy-side attenuating member that is the attenuating member with a larger amount of energy to be attenuated is made of a material having a higher transmittance of the charged particle beam than that of a high-energy-side attenuating member that is the attenuating member with a smaller amount of energy to be attenuated. | 04-03-2014 |
| 20140103228 | ELECTRON BEAM EMITTER WITH A COOLING FLANGE, AND A METHOD OF COOLING AN ELECTRON BEAM EMITTER - An electron beam emitter comprises a housing enclosing a cathode capable of emitting electrons within the housing and a window for allowing the emitted electrons to exit the housing, wherein the housing has an opening adapted to be at least partly engaged with a high voltage connector assembly, the assembly being adapted to connect the cathode to a power supply, the electron beam emitter further comprising a cooling flange surrounding the opening and having an interior channel extending between an inlet port and an outlet port for receiving cooling fluid for cooling the high voltage connector assembly. The invention further relates to a method of cooling an electron beam device. | 04-17-2014 |
| 20140110607 | ION IMPLANTER POWER SUPPLY WHICH IS INTENDED TO LIMIT THE LOADING EFFECT - The invention relates to a power supply ALT for an ion implanter, the power supply comprising: an electricity generator SOU placed between a substrate-carrier tray PPS and ground E, and a capacitor CDS in a parallel branch likewise connected between the substrate-carrier tray PPS and ground E. The capacitor CDS has a capacitance of less than 5 nF. The invention also provides an ion implanter incorporating the power supply. | 04-24-2014 |
| 20140110608 | MOVEMENT-FREE BENDING METHOD FOR ONE-DIMENSIONAL OR TWO-DIMENSIONAL NANOSTRUCTURE USING ION BEAM - The movement-free bending method means the one of deformation methods for a one- or two-dimensional nanostructures using an ion beam capable of bending and deforming them and furthermore, changing a bending direction without requiring a motion such as a rotation of the nanostructures. The present invention affords a movement-free bending method for deforming the nanostructure | 04-24-2014 |
| 20140117259 | ELECTRON BEAM DEVICE AND A METHOD OF MANUFACTURING SAID ELECTRON BEAM DEVICE - An electron beam device having a tubular body of elongate shape with an electron exit window extending in the longitudinal direction of the tubular body. The tubular body is at least partly forming a vacuum chamber, the vacuum chamber comprising therein a cathode comprising a cathode housing having an elongate shape, and at least one electron generating filament and a control grid both extending along the elongate shape of the cathode housing. The control grid and the cathode housing are attached to each other by attachment mechanisms. Free longitudinal end portions of either the control grid or the cathode housing are bent in a direction towards each other to form bulge-like shapes for the formation of electron beam shaping electrodes. The invention is further comprising a method of manufacturing the electron beam device. | 05-01-2014 |
| 20140124684 | MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS - A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams. | 05-08-2014 |
| 20140158915 | CHARGED PARTICLE BEAM IRRADIATION DEVICE - A charged particle beam irradiation device includes an accelerator that accelerates charged particles and emits a charged particle beam; an irradiation unit that irradiates a body with the charged particle beam; a duct that transports the charged particle beam to the irradiation unit; a tubular body arranged on a propagation path of the charged particle beam within the irradiation unit, has inert gas filled thereinto, and has particle beam transmission films transmitting the charged particle beam therethrough at an inlet and an outlet thereof; a gas supply unit that supplies the inert gas into the tubular body; and a leak valve that leaks the inert gas inside the tubular body to the outside when the internal pressure of the tubular body is equal to or higher than a set pressure. The gas supply unit has a plurality of supply lines having different amounts of supply of inert gas. | 06-12-2014 |
| 20140197336 | ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE - The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares. | 07-17-2014 |
| 20140239200 | CATHODE OPERATING TEMPERATURE ADJUSTING METHOD, ANDWRITING APPARATUS - A cathode operating temperature adjusting method includes acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode and an operating temperature of the cathode at which a bias voltage becomes saturated at the emission current, measuring a current density of an electron beam from the cathode when in the state where an n-th emission current value and an n-th cathode operating temperature are set in the electron beam source, determining whether the measured current density is within a first tolerance range, changing the n-th emission current value to an (n+1)th emission current value when the measured current density is not within the first tolerance range, calculating an operating temperature of the cathode corresponding to the (n+1)th emission current value by the approximate equation, and setting the calculated operating temperature, as an (n+1)th cathode operating temperature, in the electron beam source. | 08-28-2014 |
| 20140246606 | CHARGED PARTICLE BEAM IRRADIATION APPARATUS - A charged particle beam irradiation apparatus includes: an irradiation section configured to irradiate an irradiated body with a charged particle beam; a gantry in which an irradiation section is disposed and which can rotate or oscillate around a central axis line; an enclosure in which the irradiated body is disposed; and a gantry-side transport line that has an inlet section on which a charged particle beam emitted from an accelerator is incident and that is supported on the gantry and configured to transport an incident charged particle beam to the irradiation section, in which the gantry has a first bearing section provided between the inlet section of the gantry-side transport line and the enclosure, and a second bearing section provided on a side opposite to the first bearing section with respect to the enclosure. | 09-04-2014 |
| 20140264085 | METHOD FOR EXPOSING A WAFER - A method for exposing a wafer according to pattern data using a charged particle lithography machine generating a plurality of charged particle beamlets for exposing the wafer. The method comprises providing the pattern data in a vector format, rendering the vector pattern data to generate multi-level pattern data, dithering the multi-level pattern data to generate two-level pattern data, supplying the two-level pattern data to the charged particle lithography machine, and switching on and off the beamlets generated by the charged particle lithography machine on the basis of the two-level pattern data, wherein the pattern data is adjusted on the basis of corrective data. | 09-18-2014 |
| 20140284501 | PROCESSING MATERIALS - Biomass feedstocks (e.g., plant biomass, animal biomass, and municipal waste biomass) are processed to produce useful products, such as fuels. For example, novel systems, methods and equipment for conveying and/or cooling treated biomass are described. | 09-25-2014 |
| 20140291553 | CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR ACQUIRING DOSE MODULATION COEFFICIENT OF CHARGED PARTICLE BEAM - A apparatus includes a unit to operate a first dose of a beam corrected for a proximity effect for each of second mesh regions of a second mesh size obtained by dividing the first mesh size by a product of a natural number and a number of passes, by using a dose model using a dose threshold; a unit to operate a representative temperature rising due to heat transfer originating from irradiation of the beam by using a dose for an applicable pass of the first dose and a unit to operate a polynomial having a term obtained by multiplying a dose modulation coefficient based on the representative temperature by a pattern area density as an element, and a dose that makes a difference between a value obtained by operating the polynomial and the dose threshold within a tolerance is used. | 10-02-2014 |
| 20140299788 | MARKING PAPER PRODUCTS - Methods of marking paper products and marked paper products are provided. Some methods include irradiating the paper product to alter the functionalization of the paper. | 10-09-2014 |
| 20140299789 | MARKING PAPER PRODUCTS - Methods of marking paper products and marked paper products are provided. Some methods include irradiating the paper product to alter the functionalization of the paper. | 10-09-2014 |
| 20140319383 | CHARGED PARTICLE BEAM IRRADIATION SYSTEM - A charged particle beam irradiation system including: an accelerator configured to accelerate charged particles and emit a charged particle beam; a stand in which an irradiation section is disposed; a transport line which has an energy selection system configured to extract a charged particle beam having a second energy width smaller than a first energy width from a charged particle beam having the first energy width, emitted from the accelerator, and is configured to transport the charged particle beam from the accelerator to the irradiation section; and a building having an irradiation chamber and a separate room, wherein the accelerator is disposed in the irradiation chamber, the energy selection system of the transport line is disposed in the separate room, and the building has a partition wall which separates the irradiation chamber and the separate room and is configured to shield against radiation. | 10-30-2014 |
| 20140332699 | Ion Beam Sample Preparation Apparatus and Methods - Ion beam sample preparation apparatus and methods are described. The apparatus has disposed in a vacuum chamber at least one tilting ion beam irradiating means with intensity control, a rotation stage with rotation control, a sample holder, and an adjustable positioning stage that has two axes of positional adjustment that are operable to move the region of the sample being prepared by the ion beam relative to the ion beam. The apparatus may also include a vacuum-tight optical window for observing the sample and a shutter for protecting the optical window from debris while the sample is prepared in the ion beam. The apparatus may also include an instrument controller responsive to the state of the apparatus and to the condition of the sample and is operable to control the preparation of the sample. | 11-13-2014 |
| 20140339441 | AEROSOL IONIZER - A system and method comprising an ion production chamber having a plasma source disposed in said chamber, a harvest gas disposed to flow through the chamber from an inlet to an outlet, and a jet, said jet operable to introduce a sample into the harvest gas flow. In some embodiments the system includes using helium as the harvest gas. Certain embodiments include introducing a sample perpendicular to the harvest gas flow and using multiple sample introduction jets to increase mixing efficiency. The charge sample may be coupled to a MEMS-based electrometer. | 11-20-2014 |
| 20140353525 | CONTROL MODULE FOR AN ION IMPLANTER - The present invention relates to a control module for an ion implanter having a power supply, the power supply comprising:
| 12-04-2014 |
| 20140374624 | SENSITIVITY CORRECTION METHOD FOR DOSE MONITORING DEVICE AND PARTICLE BEAM THERAPY SYSTEM - In a particle beam therapy system which scans a particle beam and irradiates the particle beam to an irradiation position of an irradiation subject and has a dose monitoring device for measuring a dose of the particle beam and an ionization chamber smaller than the dose monitoring device, the ionization chamber measuring a dose of a particle beam passing through the dose monitoring device, the dose of the particle beam irradiated by the dose monitoring device is measured; the dose of the particle beam passing through the dose monitoring device is measured by the small ionization chamber; and a correction coefficient of the dose measured by the dose monitoring device corresponding to the irradiation position is found based on the dose of the particle beam measured by the small ionization chamber. | 12-25-2014 |
| 20150008341 | CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING A CHARGED PARTICLE BEAM SYSTEM - The present disclosure relates to a charged particle beam system, comprising a noble gas field ion beam source, a charged particle beam column, and a housing defining a first vacuum region and a second vacuum region. A noble gas field ion beam source is arranged within the first vacuum region. A first mechanical vacuum pump is functionally attached to the first vacuum region, an ion getter pump is attached to the charged particle beam column, and a gas supply is attached to the first vacuum region configured to supply a noble gas to the noble gas field ion beam source. | 01-08-2015 |
| 20150008342 | CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING A CHARGED PARTICLE BEAM SYSTEM - The present disclosure relates to a charged particle beam system comprising a charged particle beam source, a charged particle column, a sample chamber, a plurality of electrically powered devices arranged within or at either one of the charged particle column, the charged particle beam source and the sample chamber, and at least one first converter to convert an electrical AC voltage power into an electrical DC voltage. The first converter is positioned at a distance from either of the charged particle beam source, the charged particle column and the charged particle chamber, and all elements of the plurality of electrically powered devices, when operated during operation of the charged particle beam source, are configured to be exclusively powered by the DC voltage provided by the converter. | 01-08-2015 |
| 20150028230 | METHOD FOR CHARGED-PARTICLE MULTI-BEAM EXPOSURE - To irradiate a target with a beam of energetic radiation formed by electrically charged particles, the beam is formed and imaged onto a target, where it generates a pattern image composed of pixels. The pattern image is moved along a path on the target over a region to be exposed, and this movement defines a number of stripes covering said region in sequential exposures and having respective widths. The number of stripes is written in at least two subsequent passes such that for each pass, the widths of the stripes of one pass combine into a cover of the total width of the region to be exposed; and each pass is associated with one of a number of partial grids of pattern pixels which are exposable during the respective pass. The mutually different partial grids combine to the complete plurality of pattern pixels which compose the region to be exposed. | 01-29-2015 |
| 20150034842 | DRIVING APPARATUS, CHARGED PARTICLE BEAM IRRADIATION APPARATUS, METHOD OF MANUFACTURING DEVICE - A driving apparatus includes an electromagnetic actuator configured to generate a motive power by an electromagnetic force; a movable portion configured to be movable by the electromagnetic actuator; a magnetic shield unit that surrounds the electromagnetic actuator, wherein the magnetic shield unit includes a first magnetic shield having an opening and a second magnetic shield having an opening arranged in this order from a side closer to electromagnetic actuator. The opening opposes the second magnetic shield at least part of an area of the opening, and the movable portion is bent so as to penetrate through the openings of the first and the second magnetic shields. | 02-05-2015 |
| 20150060703 | PARTICLE BEAM IRRADIATION SYSTEM AND OPERATING METHOD - The operation control data about the component device constituting the synchrotron | 03-05-2015 |
| 20150069271 | SYSTEM FOR STERILISING PLASTIC PARISONS WITH SIMULTANEOUS INTERNAL AND EXTERNAL STERILIZATION - A system for sterilizing plastic containers and in particular plastic parisons with a transport device which transports the plastic parisons along a predetermined transport path (P), has a first sterilizing device which is suitable for applying radiation to an external surface of the plastic containers in order to sterilise this external surface, and a second sterilizing device which is suitable for applying radiation to an internal surface of the plastic containers in order to sterilise this internal surface. At least one holding device is disposed on the transport device and has an engaging element which can be introduced into a mouth region of the plastic container in order to hold it, wherein at least one component of the second sterilizing device is integrated into this holding device. | 03-12-2015 |
| 20150076370 | PARTICLE THERAPY SYSTEM - A particle therapy system is capable of reducing an increase in treatment time caused by the initialization operation of magnets in the execution of the scanning irradiation method successively changing the energy level of a beam extracted from an accelerator. An irradiation control apparatus has a scheme that calculates setting vales of excitation current for bending magnets for a transport system on every irradiation condition (energy condition), and sets appropriate excitation current values according to the irradiation sequence. The irradiation control apparatus | 03-19-2015 |
| 20150083935 | SYSTEMS AND METHODS OF MODIFYING A PROTON BEAM IN A PROTON TREATMENT SYSTEM - Systems and methods of controlling characteristics of a proton beam emitted from a nozzle of a proton treatment system including one or more beam modifying members to define a characteristic of an emitted proton beam, and a clamping member mounted to the nozzle, the clamping member having one or more receiving portions to receive the one or more beam modifying members therein. In some embodiments, the beam modifying members comprise plate structures and the receiving portions include a plurality of slots spaced apart from one another on opposing surfaces of the clamping member to receive opposing ends of the plate structures. | 03-26-2015 |
| 20150115179 | CHARGED PARTICLE BEAM SYSTEM - First ions and second ions that are heavier than first ions are generated in an ion source. One kind of ions of the first ions and second ions is injected into an accelerator by action of a switching magnet and accelerated in the accelerator. An ion beam including the one kind of ions is extracted from the accelerator to a beam transport system and a tumor volume of a patient is irradiated with the ion beam from an irradiation nozzle. In the irradiation of the ion beam, a tumor volume depth and the largest underwater range of each ion species are compared, and an ion species in which the tumor volume depth becomes the longest underwater range or lower is injected into the accelerator, and accelerated by the accelerator. The tumor volume is irradiated with the ion species. | 04-30-2015 |
| 20150305134 | DEVICE AND METHOD FOR COLLECTING ELECTRICALLY CHARGED PARTICLES - A device for collecting electrically charged particles comprising a first shell and a second shell disposed concentrically around the first shell is provided. Each of the shells is divided respectively into a first half-shell and a second half-shell. A first switch is disposed between the first half-shell of the first shell and the second half-shell of the first shell. A second switch is disposed between the second half-shell of the first shell and the first half-shell of the second shell. The first half-shell of the second shell has a through opening. | 10-22-2015 |
| 20150311028 | Apparatus and Method for Sample Preparation - A sample preparation apparatus ( | 10-29-2015 |
| 20150325408 | Charged Particle Beam Apparatus and Program - The movement distance of a second adjustment slider | 11-12-2015 |
| 20150325409 | TEM SAMPLE PREPARATION - A method and apparatus for altering the orientation of a charged particle beam sample is presented. Embodiments of the method includes providing a first work piece on a sample stage having a sample stage plane, the first work piece including a lamella plane in a first orientation. A sample is milled from the first work piece using an ion beam so that the sample is substantially free from the first work piece. A probe is attached to the sample, the probe including a shaft having a shaft axis, the shaft axis oriented at a shaft angle in relation to the sample stage plane, the shaft angle being non-normal to the sample stage plane. The probe is rotated about the shaft axis through a rotational angle so that the lamella plane is in a second orientation. The sample is attached to or placed on the sample on either the first work piece, the first work piece being the work piece from which the sample was milled, or on a second work piece, the second work piece being a work piece from which the sample was not milled. The sample is thinned using the ion beam to form a lamella, the lamella being oriented in the lamella plane. | 11-12-2015 |
| 20150325412 | ION IMPLANTER PROVIDED WITH A PLURALITY OF PLASMA SOURCE BODIES - The invention relates to an ion implanter that comprises an enclosure ENV having arranged therein a substrate carrier PPS connected to a substrate power supply ALT via a high voltage electrical passage PET, the enclosure ENV being provided with pump means PP, PS, the enclosure ENV also having at least two cylindrical source bodies CS | 11-12-2015 |
| 20150357146 | CATHODE OBTAINING METHOD AND ELECTRON BEAM WRITING APPARATUS - A cathode obtaining method includes producing a plurality of cathodes each including an electron emission member and a cover part, provided with a gap, which covers a side surface of the electron emission member, measuring an outer dimension of the upper surface of the electron emission member, for each of a plurality of cathodes, measuring an outer dimension of the gap at the same surface as the upper surface of the electron emission member, for each of a plurality of cathodes, calculating an area ratio by dividing the area of the gap, for each of a plurality of cathodes, obtaining an upper limit of the area ratio corresponding to a desired brightness by using a correlation between brightness and the area ratio, and selecting a cathode having the area ratio less than or equal to the upper limit from a plurality of cathodes that have been produced. | 12-10-2015 |
| 20150357944 | LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a lithography apparatus for forming a pattern on a substrate, including a motor configured to drive a table for holding the substrate in accordance with a driving profile, a setting unit configured to set one of a normal mode and a power saving mode as an operation mode of the motor, and a controller configured to change the driving profile when the power saving mode is set, such that an amount of generated heat of the motor caused by driving of the table is smaller than that in the normal mode, and the number of substrates to be processed by the lithography apparatus per unit time is satisfied. | 12-10-2015 |
| 20150380212 | ION IMPLANTATION COMPOSITIONS, SYSTEMS, AND METHODS - Ion implantation compositions, systems and methods are described, for implantation of dopant species. Specific selenium dopant source compositions are described, as well as the use of co-flow gases to achieve advantages in implant system characteristics such as recipe transition, beam stability, source life, beam uniformity, beam current, and cost of ownership. | 12-31-2015 |
| 20160013012 | Charged Particle Beam System | 01-14-2016 |
| 20160027611 | PROGRAM FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION, DEVICE FOR CALCULATING DEGREE OF CORRECTION OF CHARGED PARTICLE RADIATION LOCATION, CHARGED PARTICLE RADIATION SYSTEM, AND METHOD FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION - The present invention provides a non-transitory medium storing a program for correcting an irradiation position of a charged particle beam, a correction amount calculation device, a charged particle beam irradiation system, and a method for correcting an irradiation position of a charged particle beam. The medium includes instructions for causing a control unit to perform actions including replacing charging of a resist with surface charges at an interface between the resist and a work piece, and calculating a charge density distribution of the surface charges; calculating a trajectory of a charged particle based on the charge density distribution; calculating an amount of error of the irradiation position of the charged particle beam based on the trajectory and calculating an amount of correction of the irradiation position of the charged particle beam based on the error amount. | 01-28-2016 |
| 20160035536 | Particle Beam Detector - A particle beam detector is disclosed. The particle beam detector can include a particle beam receiving portion configured to convert particle beam energy to heat, and a plurality of temperature measuring devices disposed about the particle beam receiving portion. A location of a particle beam on the particle beam receiving portion can be determined by a temperature difference between at least two of the plurality of temperature measuring devices. | 02-04-2016 |
| 20160042908 | MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS - A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams. | 02-11-2016 |
| 20160042909 | GCIB NOZZLE ASSEMBLY - A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle. | 02-11-2016 |
| 20160042915 | ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS - An ion implanter includes: a beam deflector that deflects an ion beam passing through a previous stage beam path and outputs the beam to pass through a subsequent stage beam path toward a wafer; a beam filter slit that partially shields the beam traveling through the subsequent stage beam path and allows passage of a beam component having a predetermined trajectory toward the wafer; a dose cup that is disposed between the beam deflector and the beam filter slit and measures a part of the beam exiting from the beam deflector as a beam current; and a trajectory limiting mechanism that is disposed between the beam deflector and the dose cup and prevents a beam component having a trajectory deviated from the predetermined trajectory from being incident to a measurement region of the dose cup. | 02-11-2016 |
| 20160056009 | CHARGED-PARTICLE BEAM DRAWING APPARATUS AND VIBRATION DAMPING MECHANISM - A charged-particle beam drawing apparatus has an airtight first elastic tube that is provided on an outer surface of the vacuum chamber and communicates with an inner space of the vacuum chamber, a vibrator that is airtight and provided at an end of the first elastic tube at an opposite side to the vacuum chamber, and communicates with an inner space of the first elastic tube, a second elastic tube that is airtight and provided at an end of the vibrator at an opposite side to the first elastic tube and communicates with an inner space of the vibrator, a terminal closer that is provided at an end of the second elastic tube at an opposite side to the vibrator, and closes the end of the second elastic tube, and a gap holder to keep a gap between the outer surface of the vacuum chamber and the terminal member. | 02-25-2016 |
| 20160079032 | ION IMPLANTER AND METHOD OF ION BEAM TUNING - An energy analysis slit of an ion implanter is configured to enable switching between a standard slit opening used for implantation processing performed under a predetermined implantation condition and a high-precision slit opening having higher energy precision than the standard slit opening and used to tune an acceleration parameter for a radio frequency linear accelerator. The acceleration parameter is determined for the predetermined implantation condition so that at least a part of ions supplied to the radio frequency linear accelerator is accelerated to have target energy, and so that the beam current amount measured by a beam measurement unit is equivalent to a target beam current amount. | 03-17-2016 |
| 20160079033 | LITHOGRAPHY METHOD WITH COMBINED OPTIMIZATION OF THE RADIATED ENERGY AND OF THE GEOMETRY APPLICABLE TO COMPLEX SHAPES - A method of generating data relative to the writing of a pattern by electronic radiation initially includes the provision of a pattern to be formed which form the work pattern with a single external envelope. The work pattern is broken down into a set of elementary outlines, each including a single external envelope. A set of insolation conditions is defined to model each elementary outline. An irradiated simulation pattern is calculated from the sets of insolation conditions associated with the sets of elementary outlines. The simulation pattern is compared with the pattern to be formed. If the simulation pattern is not representative of the pattern to be formed, shift vectors are calculated. The shift vectors are representative of different intervals existing between the two patterns. The external envelope of the pattern to be formed is modified from displacement vectors determined from the shift vectors. A new iteration is carried out. | 03-17-2016 |
| 20160079035 | AutoSlice and View Undercut Method - A method is provided for slice and view processing of samples with dual beam systems. The slice and view processing includes providing a location for particles and material resulting from the slice and view process to collect without obscuring the sample face to be viewed and imaged. This location is formed as an undercut located beneath or in front of the sample face. | 03-17-2016 |
| 20160086766 | Charged Particle Beam Device - An evacuation structure of a charged particle beam device includes: a vacuum chamber provided with a charged particle source; vacuum piping connected to the vacuum chamber; a main vacuum pump which is connected via the vacuum piping and evacuates the inside of the vacuum chamber; a non-evaporable getter pump disposed at a position between the vacuum chamber and the main vacuum pump in the vacuum piping; and a coarse evacuation port connected at a position between the vacuum chamber and the non-evaporable getter pump in the vacuum piping The coarse evacuation port includes: a coarse evacuation valve that opens and closes the coarse evacuation port; and a leak valve to open the vacuum chamber to the atmosphere. | 03-24-2016 |
| 20160093410 | ELECTRON BEAM SYSTEM - Apparatus for electron beam treatment of three-dimensional parts that includes cavities in a shielded rotating drum that preferably includes additional rotation mechanism for rotating parts within cavities in said drum. Radiation associated with the electron beam emitter is substantially shielded by the combination of the drum and the additional radiation shielding. The rotating drum is preferably made of at least four sections axially stacked, and its shielding properties are enhanced by including lead filled holes drilled in the sections. | 03-31-2016 |
| 20160111253 | METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING METHOD - In a method for forming a resist film, a first resist film is formed on a light shielding film formed on a substrate, by using a spin coating method. A protective film is formed on the first resist film. The protective film and the first resist film are simultaneously removed at the same region to expose a portion of the light shielding film. A first region in which the second resist film is formed on the light shielding film and a second region in which the second resist film is formed on the first resist film through the protective film, are provided. The protective film and the second resist film are simultaneously removed in the second region to expose the first resist film. A region in which the first resist film, and a region in which the second resist film, is formed, are separately provided on the substrate. | 04-21-2016 |
| 20160118221 | LITHOGRAPHY SYSTEM AND METHOD OF MANUFACTURING ARTICLES - At least one method of manufacturing articles and at least one lithography system are provided herein. A lithography system according to an exemplary embodiment of the present disclosure includes a drawing apparatus that includes a plurality of optical systems and draws a pattern on a substrate with beams having been respectively shaped by the plurality of optical systems, and a transmission unit configured to select pattern data to be used by the drawing apparatus from a plurality of types of pattern data commonly used by the plurality of optical systems and configured to transmit the selected pattern data to the drawing apparatus. The pattern data is a set of data including a plurality of sub pattern data, and a width of a stripe-shaped drawing region corresponding to one sub pattern data piece is equivalent to a length obtainable by dividing a drawing width of the beams by an integer value. | 04-28-2016 |
| 20160126060 | ENDPOINTING FOR FOCUSED ION BEAM PROCESSING - To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met. | 05-05-2016 |
| 20160126062 | DRAWING APPARATUS, LITHOGRAPHY SYSTEM, PATTERN DATA CREATION METHOD, DRAWING METHOD, AND METHOD OF MANUFACTURING ARTICLES - At least one drawing apparatus according to an exemplary embodiment includes a plurality of optical systems and repeats an operation to draw a pattern on a substrate while partly overlapping stripe-shaped regions drawn by the optical systems. The drawing apparatus includes a creation unit configured to create data to be supplied to each of the plurality of optical systems by using a plurality of sub pattern data, each of the plurality of sub pattern data serving as unit data of pattern data used by the plurality of optical systems, corresponding to a region having a width obtainable by dividing the stripe-shaped regions in a drawing width direction, and including information relating to continuity of drawing instruction data and exposure amount information. The creation unit is configured to create the data by changing exposure amount information corresponding to an overlapping drawing region based on the information relating to the continuity. | 05-05-2016 |
| 20160133433 | Charged Particle Beam Device - An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber ( | 05-12-2016 |
| 20160141147 | AUTOMATED TEM SAMPLE PREPARATION - Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition. | 05-19-2016 |
| 20160148779 | Specimen Preparation Device - A specimen preparation device prepares a cross section of a specimen by applying an ion beam, the specimen preparation device including: an ion beam generator that generates the ion beam; a specimen holder that holds the specimen; a shield plate that shields part of the specimen from the ion beam; and a tilted plate that is placed to intersect a path of the ion beam on a downstream side of the specimen, and has an incidence surface that is tilted relative to a direction in which the ion beam is incident. | 05-26-2016 |
| 20160152519 | Glass Pane Bombardment Degassing Device | 06-02-2016 |
| 20160181070 | DEVICE FOR ION IMPLANTATION | 06-23-2016 |
| 20160189930 | EXPOSURE APPARATUS AND EXPOSURE METHOD - To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample. | 06-30-2016 |
| 20160196951 | DEVICE MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF MAGNETIC DEVICE | 07-07-2016 |
