| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 250430000 | With valve or pump actuator | 7 |
| 20080258076 | MEDICAL ISOTOPE GENERATOR SYSTEMS - Medical isotope generator systems are disclosed according to some aspects. In one aspect, a | 10-23-2008 |
| 20140097353 | SYSTEMS AND METHODS FOR REDUCTION OF PATHOGENS IN A BIOLOGICAL FLUID USING VARIABLE FLUID FLOW AND ULTRAVIOLET LIGHT IRRADIATION - A system for reducing pathogens in a biological fluid such as whole blood or blood-derived products includes a pump configured to propagate the fluid through a serpentine-shaped flow path while exposing the fluid to UV irradiation. Extensive mixing of flow is accomplished by a pump control system programmed to cause the pump to vary the flow of fluid. In embodiments, the pump may be automatically operated to periodically switch the flow back and forth between a high flow rate and a slow flow rate. Alternatively, the pump may be periodically stopped or even cause the flow to reverse direction for short periods of time. | 04-10-2014 |
| 20140264069 | WORKPIECE SUPPORT STRUCTURE WITH FOUR DEGREE OF FREEDOM AIR BEARING FOR HIGH VACUUM SYSTEMS - A workpiece adjustment assembly is disclosed. The assembly can include a shaft, a spherical bearing, and a wafer support. A spherical housing receives the spherical bearing and allows the bearing to rotate therein. The housing and bearing may form an air bearing. A seal may be formed in the housing to prevent gas from the air bearing and the ambient atmosphere from migrating to a process chamber side of the housing. A set of spherical air pads may be positioned on an ambient side of the bearing to press the bearing against the housing when the process chamber is not under vacuum conditions. The seal can include a set of differentially pumped grooves. The spherical bearing enables the wafer manipulation end, and a wafer attached thereto, to be moved with four degrees of freedom. The arrangement facilitates isocentric scanning of a workpiece. Methods for using the assembly are also disclosed. | 09-18-2014 |
| 20140264070 | Ultraviolet Disinfection Case - A solution for disinfecting flowable products, such as liquids, suspensions, creams, colloids, emulsions, powders, and/or the like, as well as accessories and products relating thereto, such as containers, caps, brushes, applicators, and/or the like, using ultraviolet radiation is provided. In an embodiment, an ultraviolet impermeable cap is configured to enclose a volume corresponding to a flowable product. At least one ultraviolet radiation source can be mounted on the cap and be configured to generate ultraviolet radiation for disinfecting the enclosed area. The ultraviolet radiation source can be configured to only generate ultraviolet radiation when the volume is enclosed by the ultraviolet impermeable cap. | 09-18-2014 |
| 20150060691 | SEMICONDUCTOR PROCESS PUMPING ARRANGEMENTS - A semiconductor process pump configured to mitigate losses in pump speed during operation. The semiconductor process pump may include a housing having an inlet port for receiving gas molecules therethrough, wherein a forward-most terminus of the inlet port defines an inlet face, one or more working surfaces disposed within the housing, and a mounting flange disposed on an exterior of the housing for facilitating attachment of the pump to a gas enclosure, wherein a forward-most terminus of the mounting flange defines a flange face. The flange face may be offset from the inlet face rearwardly along the housing by a distance d. Thus, when the semiconductor process pump is mounted to a wall of a gas enclosure, the housing may extend into the wall and the inlet face may be disposed within or immediately adjacent the interior of the gas enclosure. | 03-05-2015 |
| 20150338336 | Reflective Transparent Optical Chamber - A chamber configured to increase an intensity of target radiation emitted therein is provided. The chamber includes an enclosure at least partially formed by a set of transparent walls. Each transparent wall can comprise a first material transparent to the target radiation and having a refractive index greater than 1.1 for the target radiation. The outer surface of the set of transparent walls can include a set of cavities, each cavity comprising an approximately prismatic void. Additionally, a medium located adjacent to an outer surface of the set of transparent walls can have a refractive index within approximately one percent of a refractive index of a vacuum for the target radiation. | 11-26-2015 |
| 20160086768 | OZONE SUPPLYING APPARATUS, OZONE SUPPLYING METHOD, AND CHARGED PARTICLE BEAM DRAWING SYSTEM - An ozone supplying apparatus according to an embodiment of the present invention is an ozone gas supplying apparatus which supplies an ozone gas to a vacuum apparatus. The ozone supplying apparatus includes an ozone generator configured to generate the ozone gas, a first flow controller configured to control a flow rate of the ozone gas generated by the ozone generator, a second flow controller configured to control a flow rate of the ozone gas supplied to the vacuum apparatus, and a main pipe provided on a secondary side of the first flow controller and on a primary side of the second flow controller, with the ozone gas being introduced into the main pipe at such a flow rate that an internal pressure of the main pipe is controlled to be lower than atmospheric pressure by the first flow controller. | 03-24-2016 |
