| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 250423000 | Field ionization type | 13 |
| 20080210883 | Liquid metal ion gun - An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture. | 09-04-2008 |
| 20080217556 | ELECTRONIC APPARATUS - An electronic apparatus of the present invention includes an ion generator which generates ions in an atmosphere to remove chemical emission such as VOC and odor. The ion generator is arranged inside the duct which leads the chemical emission generated from the fixing unit to the discharge opening, and also generates positive ions and negative ions in the atmosphere, thereby can efficiently remove the chemical emission. With this arrangement, an electronic apparatus is realized which sufficiently suppresses the chemical emission such as VOC and odor, and is less likely to dirty the surroundings of the electronic apparatus such as the outer surface thereof and the walls surrounding the electronic apparatus. | 09-11-2008 |
| 20080245969 | Method and Apparatus for Creating a Plasma - An apparatus is provided for producing a plasma for a work surface, for example to deposit material thereon. The apparatus comprises an enclosure which contains an ionizable gas, a plurality of plasma excitation devices each of which is arranged to enable microwaves to travel from a first end thereof to a second end and radiate therefrom into the gas, and means for generating a magnetic field in the gas. A source of microwaves feeds microwaves to the first ends of the excitation devices. In use, regions exist within the said gas where the direction of the electric vector of the microwaves is non-parallel to the lines of the magnetic field, and the magnetic field has value B, and the microwaves have a frequency f such as to substantially satisfy the relationship: B=πmf D e where m and e are the mass and charge respectively of an electron. | 10-09-2008 |
| 20080277592 | COLD-CATHODE-BASED ION SOURCE ELEMENT - An ion source element includes a cold cathode, a grid electrode, and an ion accelerator. The cold cathode, the grid electrode, and the ion accelerator are arranged in that order and are electrically separated from one another. A space between the cold cathode and the grid electrode is essentially smaller than a mean free path of electrons at an operating pressure. The ion source element is thus stable and suitable for various applications. | 11-13-2008 |
| 20080277593 | Ion source - A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber, the cathode holder positioned such that a surface thereof opposes or surrounds a side surface of a cathode. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned on the same plane as, outward from, or inward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, a surface of the first heat shield positioned to oppose or surround the side surface of the cathode. At a rear end of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material. | 11-13-2008 |
| 20080296510 | Ion Implantation System and Ion Implantation System - It is devised to transport plasma including charged particles made of containment target atom ions and charged particles of a polarity opposite to that of the containment target atom ions, up to an empty fullerene film on a deposition-assistance substrate by a uniform magnetic field, and to give acceleration energies to the containment target atoms by a bias voltage applied to the deposition-assistance substrate, thereby implanting the containment target atoms into the fullerene film. Since attractive forces act between the charged particles constituting the plasma so that the plasma is not diverged, it becomes possible to achieve a high density ion implantation to improve a yield of containing-fullerene even in ion implantation with a low energy. | 12-04-2008 |
| 20090001280 | ION GENERATING ELEMENT, CHARGING DEVICE AND IMAGE FORMING APPARATUS - In an ion generating element according to the present invention, a discharge electrode and an inductive electrode are provided to face each other with a dielectric body therebetween, and a heater electrode for producing heat with Joule heat generated by electrification and the inductive electrode are provided independently on the same surface of the dielectric body. Further, the heater electrode and the inductive electrode are connected and positioned such that a heater current does not flow into the inductive electrode. Thereby, it is possible to appropriately set a size or a shape of the inductive electorde according to a condition at low costs, allowing stable and effective discharge. | 01-01-2009 |
| 20090032727 | ELEVATED TEMPERATURE RF ION SOURCE - An elevated temperature RF ion source system, comprising an ion source body, an RF antenna coil external to the ion source body, a vacuum enclosure surrounding both the outside surface of the ion source body and the RF antenna coil, at least one power supply, a gas delivery system operatively coupled to the ion source body, a vacuum condition between the outside surface of the ion source body and the RF antenna coil, the RF antenna coil operatively coupled to the at least one power supply, and a water cooling system operatively coupled to the RF antenna coil and the vacuum enclosure. | 02-05-2009 |
| 20090039282 | MATRIX-ASSISTED LASER DESORPTION WITH HIGH IONIZATION YIELD - Analyte ions are generated in an ion source by matrix-assisted laser desorption (MALDI) in which laser light pulses have significantly less than one nanosecond duration, focal diameters of less than twenty micrometers and energy densities such that only about one picogram of sample is desorbed per pulse of laser light and per laser spot. An unexpectedly high degree of ionization of analyte molecules is produced for selected matrix substances. Many laser spots can be generated side-by-side from a single laser light pulse for use with MALDI time-of-flight mass spectrometers. Applying pulses with a repetition rate of around 50 kilohertz and moving the sample or guiding the laser light beam so each laser light pulse impinges on a cool sample spot allows the ion source to be used with spectrometers that require a constant ion current. | 02-12-2009 |
| 20090084977 | METHOD AND DEVICE FOR ADJUSTING A BEAM PROPERTY IN A GAS CLUSTER ION BEAM SYSTEM - A method and device for adjusting a beam property, such as a beam size, a beam shape or a beam divergence angle, in a gas cluster beam prior to ionization of the gas cluster beam is described. A gas cluster ion beam (GCIB) source is provided, comprising a nozzle assembly having a gas source, a stagnation chamber and a nozzle that is configured to introduce under high pressure one or more gases through the nozzle to a vacuum vessel in order to produce a gas cluster beam. Additionally, the GCIB source comprises a gas skimmer positioned downstream from the nozzle assembly that is configured to reduce the number of energetic, smaller particles in the gas cluster beam. Furthermore, the GCIB source comprises a beam adjustment device positioned downstream from the gas skimmer that is configured to adjust at least one beam property of the gas cluster beam, and an ionizer positioned downstream from the beam adjustment device that is configured to ionize the gas cluster beam to produce a GCIB. | 04-02-2009 |
| 20090101834 | Ion beam extraction assembly in an ion implanter - The present invention relates to an ion beam extraction assembly for use in an ion beam generation apparatus such as those used, for example, in an ion implanter. An ion beam extraction assembly is provided for mounting within an ion beam generating apparatus comprising an ion source such that the extraction assembly is operable to extract ions from the ion source as an ion beam. The extraction assembly comprises an electrode assembly separate from the ion source, an electrode of the electrode assembly defining at least partly a path through the extraction assembly for passage of an ion beam. At least a part of the electrode assembly adjacent the path is tungsten and at least a part of the electrode assembly that is remote from the path is formed from a less expensive and/or lighter material. | 04-23-2009 |
| 20090140164 | INDUCTION ELECTRODE, ION GENERATION ELEMENT, ION GENERATION APPARATUS, AND ELECTRIC EQUIPMENT - An ion generation element includes an induction electrode and a plurality of discharge electrodes. The induction electrode is formed of one metal plate. A circumferential portion of a through hole is bent, and a thickness of a wall portion of the through hole is greater than a thickness of a top plate portion . A needle-like tip end of the discharge electrode is located within a range of the thickness of the through hole. Thus, an induction electrode having a structure realizing a small thickness, capable of lessening variation in an amount of ion generation caused by variation in positional relation between the tip end of the discharge electrode and the induction electrode, an ion generation element, an ion generation apparatus, and electric equipment can be obtained. | 06-04-2009 |
| 20090152473 | Photon source comprising an ecr source with pressure gradient - The invention relates to a photon source comprising an electron cyclotron resonance (ECR) multicharged ion plasma source, the multicharged ions corresponding to several charge states of a first constituent (g | 06-18-2009 |
| 20090189083 | Ion-beam source - An ion-beam source comprising: a plasma-generation unit for generating plasma and an ion-extraction unit for extraction and acceleration of ions from the aforementioned plasma, where the ion-extraction unit is made in the form of at least one grid under a negative potential. The plasma generating unit consists of a working chamber having a deeply immersed antenna cell. The cell contains a ferromagnetic core, a heat conductor with a heat sink, at least one inductive coil wound onto the ferromagnetic core, and a cap made from a dielectric material that sealingly covers the ferromagnetic core and the inductive coil. | 07-30-2009 |
| 20090194704 | METHOD AND DEVICE OF ION SOURCE GENERATION - An implanter is equipped with an ion beam current detector, a temperature sensor, a temperature controller and a cooling system to increase the ratio of a specific ion cluster in the ion source chamber of the implanter. Therefore, the implanting efficiency for a shallow ion implantation is increased consequently. | 08-06-2009 |
| 20090206274 | MULTI-ELECTRODE NEGATIVE ION GENERATOR - A negative ion generator includes a multi-electrode device with an emitter for generating a current. A first counter electrode includes an aperture therein with a distal end of said emitter being operatively positioned within said first counter electrode. A second cylindrical electrode includes an aperture therein with the second counter electrode being spaced a predetermined distance from the first counter electrode and being operatively positioned relative to the emitter for increasing the through-put of the negative ion generator by reducing the total emitted current while maintaining a fairly constant level of available negative ion current. | 08-20-2009 |
| 20090212232 | ION SOURCE AND ION IMPLANTATION APPARATUS - An ion source is to extract a ribbon-shaped ion beam longer in the Y direction in the Z direction and provided with a plasma generating chamber, a plasma electrode which is disposed near the end of the plasma generating chamber in the Z direction and has an ion extracting port extending in the Y direction, a plurality of cathodes for emitting electrons into the plasma generating chamber to generate a plasma and arranged in a plurality of stages along the Y direction, and a magnetic coil which generates magnetic fields along the Z direction in a domain containing the plurality of cathodes inside the plasma generating chamber. | 08-27-2009 |
| 20090230318 | TARGET DESIGN FOR HIGH-POWER LASER ACCELERATED IONS - Methods for designing a laser-accelerated ion beam are disclosed. The methods include modeling a system including a heavy ion layer, an electric field, and high energy light positive ions having a maximum light positive ion energy, correlating physical parameters of the heavy ion layer, the electric field, and the maximum light positive ion energy using the model, and varying the parameters of the heavy ion layer to optimize the energy distribution of the high energy light positive ions. One method includes analyzing the acceleration of light positive ions, for example protons, through interaction of a high-power laser pulse with a double-layer target using two-dimensional particle-in-cell (PIC) simulations and a one-dimensional analytical model. The maximum energy acquired by the accelerated light positive ions, e.g., protons, in this model depends on the physical characteristics of the heavy-ion layer—the electron-ion mass ratio and effective charge state of the ions. The hydrodynamic equations for both electron and heavy ion species solved and the test-particle approximation for the protons is applied. It was found that the heavy ion motion modifies the longitudinal electric field distribution, thus changing the acceleration conditions for the light positive ions. | 09-17-2009 |
| 20090283694 | DOUBLE-FACED ION SOURCE - Disclosed is an ion source comprising a plate-shaped source body which has radioactivity on its both sides and allows positive and negative ions to penetrate through the source body. The present invention gives beneficial effects. First, the ion source structure can improve the ionization efficiency of sample molecules, and the generated sample ions have a centralized distribution within a flat space on both sides of the source body. Such distribution of ion cloud facilitates to improve the IMS sensitivity. Meanwhile, the source body of the present invention has a transmittance in itself. Thus, positive and negative ions generated on both sides of the source body can penetrate through the source body and be separated to the both sides of the source body. In this way, it is possible to improve the utilization efficiency of ions. | 11-19-2009 |
| 20090309041 | TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE - Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation comprising an ion source that operates in multiple modes such that a first mode is an arc-discharge mode and a second mode is an RF mode. | 12-17-2009 |
| 20090309042 | ION SOURCES - This invention relates to an Ion gun ( | 12-17-2009 |
| 20090314951 | ION SOURCE CLEANING METHOD AND APPARATUS - In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits. | 12-24-2009 |
| 20090314952 | ION SOURCE FOR GENERATING NEGATIVELY CHARGED IONS - An ion source for generating negatively charged ions is presented and described, said ion source having a closure plate which is provided with an outlet opening and which has a wall which surrounds a combustion chamber, wherein the wall has a tubular section, which extends from the outlet opening and is formed from an insulating material, and has a rear wall, wherein the rear wall is arranged at the end of the tubular section which lies opposite the outlet opening and closes off the combustion chamber, having a coupling coil whose windings are arranged around the tubular section of the wall outside the combustion chamber, and having a filter field magnet. The problem of making available an ion source for generating negatively charged ions which has an increased yield and is also suitable for generating ions from substances which are only available in a gaseous form is solved by virtue of the fact that the rear wall is formed from an insulating material and has an inlet opening, and in that the filter field magnet is arranged on that side of the tubular section which faces away from the combustion chamber. | 12-24-2009 |
| 20090314953 | IONIZATION DEVICE - An ionization device includes an ionization chamber ( | 12-24-2009 |
| 20090321657 | SYSTEM AND METHOD OF CONTROLLING BROAD BEAM UNIFORMITY - An ion beam uniformity control system, wherein the uniformity control system comprising a differential pumping chamber that encloses an array of individually controlled gas jets, wherein the gas pressure of the individually controlled gas jets are powered by a controller to change the fraction of charge exchanged ions, and wherein the charge exchange reactions between the gas and ions change the fraction of the ions with original charge state of a broad ion beam, wherein the charge exchanged portion of the broad ion beam is removed utilizing an deflector that generates a magnetic field, a Faraday cup profiler for measuring the broad ion beam profile; and adjusting the individually controlled gas jets based upon feedback provided to the controller to obtain the desired broad ion beam. | 12-31-2009 |
| 20100001205 | ION GENERATING APPARATUS - An ion generating apparatus includes an ion generating element having a positive ion discharger for generating positive ions, and a negative ion discharger for generating negative ions. The positive ion discharger and the negative ion discharger are arranged separately from and independently of each other on a base member with a distance securing insulation between the positive and negative dischargers. The ion generating apparatus also includes a blower for releasing the ions generated by the positive and negative ion dischargers into air and a voltage application circuit. The blower blows wind in a direction parallel to a surface of the base member. | 01-07-2010 |
| 20100038556 | HOT CATHODE AND ION SOURCE INCLUDING THE SAME - A hot cathode includes: a hollow external conductor; a hollow internal conductor which is placed coaxially inside the external conductor; and a connection conductor which electrically connects tip end portions of the conductors. A heating current is folded back through the connection conductor to flow in opposite directions in the external conductor and the internal conductor. | 02-18-2010 |
| 20100044579 | APPARATUS - An apparatus for accelerating an ion beam, comprising at least one electrode mounted in a moveable mount. | 02-25-2010 |
| 20100051825 | ION SOURCE - An ion source includes a plasma generating chamber into which an ionization gas containing fluorine is introduced, a hot cathode provided on one side in the plasma generating chamber, an opposing reflecting electrode which is provided on other side in the plasma generating chamber and reflects electrons when a negative voltage is applied from a bias power supply to the opposing reflecting electrode, and a magnet for generating a magnetic field along a line, which connects the hot cathode and the opposing reflecting electrode, in the plasma generating chamber. The opposing reflecting electrode is formed of an aluminum containing material. | 03-04-2010 |
| 20100084569 | ION DEPOSITION APPARATUS - This invention relates to a broad beam ion deposition apparatus ( | 04-08-2010 |
| 20100108905 | PLASMA SOURCES - This invention relates to a plasma source in the form of plasma generator ( | 05-06-2010 |
| 20100140495 | CATHODE HAVING ELECTRON PRODUCTION AND FOCUSING GROVES, ION SOURCE AND RELATED METHOD - A cathode having electron production and focusing grooves for an ion source of an ion implanter system, the ion source and a related method are disclosed. In one embodiment, the cathode includes a working surface having a plurality of electron production and focusing grooves positioned therein. A repeller of the ion source may be similarly structured. | 06-10-2010 |
| 20100193701 | MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM - Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer. | 08-05-2010 |
| 20100200767 | OPTICAL APPARATUS FOR PLASMA - An optical apparatus for plasma includes a light collection lens provided to receive optical emission spectrum from plasma, a first aperture stop disposed between the light collection lens and the plasma to block out-focused light, a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light, and a pinhole disposed at the imaging area of the light collection lens to limit depth of focus. | 08-12-2010 |
| 20100243912 | ISOLATION CIRCUIT FOR TRANSMITTING AC POWER TO A HIGH-VOLTAGE REGION - A sequence of series-connected transformers for transmitting power to high voltages incorporates an applied voltage distribution to maintain each transformer in the sequence below its withstanding voltage. | 09-30-2010 |
| 20100243913 | PRE-ALIGNED NOZZLE/SKIMMER - The pre-aligned nozzle/skimmer module includes an internal pre-aligned nozzle assembly and internal pre-aligned skimmer cartridge assembly to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module can be pre-aligned to more accurately position the GCIB. The pre-aligned nozzle/skimmer module more accurately controls the formation of the gas clusters of a pre-aligned Gas Cluster Ion Beam (GCIB). | 09-30-2010 |
| 20110036990 | PLATEN TO CONTROL CHARGE ACCUMULATION - An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the workpiece is in a clamped position, and a conductor to electrically couple the conductive portion of the first plurality of embossments to ground. An ion implanter having such an embossed platen is also provided. | 02-17-2011 |
| 20110049383 | ION IMPLANTER AND ION IMPLANT METHOD THEREOF - An ion implanter and an ion implant method for achieving a two-dimensional implantation on a wafer are disclosed. The ion implanter includes an ion source, a mass analyzer, a wafer driving mechanism, an aperture mechanism, and an aperture driving mechanism. The ion source and the mass analyzer are capable of providing an ion beam. The wafer driving mechanism is configured to drive a wafer along only a first direction. The aperture mechanism has an aperture for filtering the ion beam before the wafer is implanted. The aperture driving mechanism is configured to drive the aperture along a second direction intersecting the first direction. By moving the wafer and the aperture along different directions separately, the projection of the ion beam can achieve a two-dimensional implantation on the wafer. Here, at least one of the directions is optionally parallel to the longer dimension of the two-dimensional cross-section of the ion beam. | 03-03-2011 |
| 20110089335 | Stripping Member, A Stripping Assembly And A Method For Extracting A Particle Beam From A Cyclotron - The present invention relates to a strip-ping member for stripping electrons off a negatively charged particle beam at the periphery of a cyclotron for extracting a particle beam out of said cyclotron, said stripping member comprising a first stripper foil adapted for being located at the periphery of said cyclotron so that said particle beam passes through said first stripper foil, characterized in that it comprises a second stripper foil adapted for being located side-by-side with the first foil at the periphery of said cyclotron at a more peripheral radius than said first stripper foil so that said negatively charged particle beam passes through said second stripper foil when said first stripper foil is damaged. | 04-21-2011 |
| 20110095199 | METHOD TO MEASURE CURRENT USING PARALLEL PLATE TYPE IONIZATION CHAMBER WITH THE DESIGN OF GUARD ELECTRODE - An ionization chamber includes a chamber, two outer electrode plates and a center electrode plate. The center electrode plate is disposed at the center of the chamber, and signals produced in the chamber can be collected completely by the center electrode plate to avoid signal losses and improve the accuracy of the test result of the ionization chamber. The center electrode plate also can maintain a constant internal volume of the chamber and prevent a change of effective volume within the chamber due to a change of electric field and enhance the stability of the test result of the ionization chamber. A guard electrode is wrapped by an insulation pin of the electrode and the outer insulation ring to form an insulation shield that can greatly reduce current leakage of the protection electrode and improve the accuracy of the test result of the ionization chamber. | 04-28-2011 |
| 20110101237 | CARBON ION GENERATING DEVICE AND TUMOR TREATMENT APPARATUS USING THE SAME - Provided are a carbon ion generating device and a tumor treatment apparatus using the same. The carbon ion generating device includes a carbon nanostructure, a carbon emitting structure, an ionizing structure, and an accelerator. The carbon emitting structure is configured to induce an emission of carbon atoms from one end of the carbon nanostructure. The ionizing structure is configured to ionize the emitted carbon atoms. The accelerator is configured to accelerate the ionized carbon atoms. | 05-05-2011 |
| 20110139998 | ION BEAM GENERATOR - [Objective of the Invention] An ion beam generator, a thermal distortion in a grid assembly is reduced. | 06-16-2011 |
| 20110155922 | ION DETECTING APPARATUS AND ION GENERATING APPARATUS - An air blower including a motor | 06-30-2011 |
| 20110210265 | Method and Apparatus for a Porous Metal Electrospray Emitter - An ionic liquid ion source can include a microfabricated body including a base and a tip. The microfabricated body can be formed of a porous metal compatible (e.g., does not react or result in electrochemical decaying or corrosion) with an ionic liquid or a room-temperature molten salt. The microfabricated body can have a pore size gradient that decreases from the base of the body to the tip of the body, so that the ionic liquid can be transported through capillarity from the base to the tip. | 09-01-2011 |
| 20110240876 | APPARATUS FOR CONTROLLING THE TEMPERATURE OF AN RF ION SOURCE WINDOW - An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source. | 10-06-2011 |
| 20110272593 | GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS - A processing system is provided for irradiating a substrate with a gas cluster ion beam (GCIB). The system includes a vacuum vessel that has an interior and is configured to support the substrate therein, and at least one nozzle for forming and emitting a gas cluster beam. The at least one nozzle is configured to direct the gas cluster beam within the vacuum vessel toward the substrate. An ionizer is positioned to ionize the gas cluster beam to form the GCIB. A main gas supply of the system is in fluid communication with the at least one nozzle for supplying gas to the nozzle. The system also includes a plasma-generating apparatus that communicates with the interior of the vacuum vessel and which is configured to receive a cleaning gas and selectively emit plasma for cleaning the interior of the vacuum vessel. | 11-10-2011 |
| 20110272594 | GAS CLUSTER ION BEAM SYSTEM WITH RAPID GAS SWITCHING APPARATUS - A processing system is provided for irradiating a substrate with a gas cluster ion beam (GCIB). The system includes a nozzle for forming and emitting gas cluster beams through a nozzle outlet, and a stagnation chamber that is located upstream of and adjacent the nozzle. The stagnation chamber has an inlet, and the nozzle is configured to direct a single gas cluster beam toward the substrate. An ionizer is positioned downstream of the outlet and is configured to ionize the gas cluster beam to form the GCIB. The system also includes a gas supply that is in fluid communication with the inlet of the stagnation chamber, and which includes a gas source and a valve located between the gas source and the nozzle for controlling flow of a gas between the gas source and the nozzle. | 11-10-2011 |
| 20120012755 | ION SOURCE APPARATUS - An ion source apparatus has an ion source assembly and a neutralizer. The ion source assembly has a body, a heat-dissipating device, an anode chunk and a gas distributor. The heat-dissipating device has a thermal transfer plate and a first thermal side sheet. The thermal transfer plate has a top, a protrusion and an annular disrupting recess. The protrusion is formed at the top of the thermal transfer plate. The disrupting recess is radially formed around the protrusion. The first thermal side sheet surrounds the protrusion. The gas distributor is mounted securely in the protrusion. Because the protrusion is located between the gas distributor and the first thermal side sheet and the disrupting recess is radially formed around the protrusion, accumulated ions, molecules and deposition film particles are longitudinally disrupted and do not form a short circuit between the gas distributor and the first thermal side sheet. | 01-19-2012 |
| 20120018649 | ION SUPPLY DEVICE AND WORKPIECE PROCESSING SYSTEM PROVIDED WITH THE SAME - An ion supply device includes an ion generator for generating ions for removing static electricity, a carrier gas supply unit for supplying to the ion generator a carrier gas for carrying the ions generated in the ion generator, and an ion supply nozzle for blowing the ions and the carrier gas from the ion generator through a blow-off opening toward an electricity removal target from which static electricity is to be removed. A slit is provided at the blow-off opening and has an increased width as the slit gets distant from the electricity removal target. The ion supply nozzle includes an internal flow path and a plurality of internal fins provided at a portion of the internal flow path near the blow-off opening so that the ions and the carrier gas blown from the slit is uniformly distributed along a lengthwise direction of the slit. | 01-26-2012 |
| 20120068082 | ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT - An ion generation apparatus includes an opposing electrode, a discharge electrode for generating ions between itself and the opposing electrode, and a slider constructed to be movable between a contact state in which contact with the discharge electrode is established and a non-contact state in which contact is not established in order to clean the discharge electrode. Thus, an ion generation apparatus and electric equipment capable of preventing lowering in ion generation efficiency even in an environment where there is much dust can be obtained. | 03-22-2012 |
| 20120175526 | IONIZATION GENERATING TUBE AND AN IONIZATION GENERATING DEVICE COMPRISING THE SAME - This invention relates to an ionization tube and an ionization device including the same. The ionization tube according to one aspect of this invention has a hollow structure, and the tube is formed using a mixture of a ceramic and a radioactive material, and the radioactive material is distributed along the entire length of the tube. Consequently, the ionization tube according to this invention can enhance ionization efficiency because the surface area over which alpha particles are emitted can be increased. | 07-12-2012 |
| 20120235056 | Multi-Needle Multi-Parallel Nanospray Ionization Source for Mass Spectrometry - An electrospray ion source for a mass spectrometer for generating ions of an analyte from a sample comprising the analyte dissolved in a liquid solvent comprises: an electrode receiving the sample and comprising at least a first plurality of protrusions protruding from a base, each protrusion of the at least a first plurality of protrusions having a respective tip; and a voltage source, wherein, in operation of the electrospray ion source, the sample is caused to move, in the presence of a gas or air, from the base to each protrusion tip along a respective protrusion exterior so as to form a respective stream of charged particles emitted towards an ion inlet aperture of the mass spectrometer under application of voltage applied to the electrode from the voltage source. | 09-20-2012 |
| 20120267546 | Vacuum System Cold Trap Filter - A cold trap filter and method is provided for filtering chemical species from a vacuum system of an ion implantation system. A canister is in fluid communication with an exhaust of a high vacuum pump and an intake of a roughing pump used for evacuating an ion source chamber. One or more paddles are positioned within the canister, wherein each paddle has a cooling line in fluid communication with a coolant source. The coolant source passes a coolant through the cooling line, thus cooling the one or more paddles to a predetermined temperature associated with a condensation or deposition point of the chemical species, therein condensing or depositing the chemical species on the paddles while not interfering with a vacuum capacity of the high vacuum and roughing pumps. The paddles can also be electrically biased to electrostatically attract the chemical species to the paddles in one or more biasing steps. | 10-25-2012 |
| 20120280139 | Method of Anion Production from Atoms and Molecules - Ion sources are described for producing negative ion beams with low mass bias in which a neutral vapor of an electropositive element ionizes neutral atoms or molecules. | 11-08-2012 |
| 20120292525 | Atmospheric Pressure Ionization Inlet for Mass Spectrometers - Methods and systems for mass spectrometry and more particularly to an interface providing charged particles to a mass spectrometer are described herein. | 11-22-2012 |
| 20120292526 | Ionization apparatus and ionization analysis apparatus - A sampling nozzle | 11-22-2012 |
| 20120305799 | PORTABLE ION GENERATOR - An ion generator is disclosed. The ion generator has improved portability and ion generation efficiency. As is apparent from the above description, the ion generator according to the present invention is configured so that the discharge unit is constituted by the felts, and the piezoelectric element, not the coil type transformer, is used in the high voltage generation unit which generates high voltage. Consequently, the present invention has the effect of improving portability of the ion generator and the present invention has the effect of improving ion generation efficiency although the portability of the ion generator is improved by configuring the ion generator according to the present invention so that the discharge unit is constituted by the felts, and the piezoelectric element, not the coil type transformer, is used in the high voltage generation unit which generates high voltage. | 12-06-2012 |
| 20120319003 | ION BEAM DEVICE - Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip ( | 12-20-2012 |
| 20130020496 | PARTICLE SOURCES AND APPARATUSES USING THE SAME - The present disclosure provides a particle source comprising a base having a gently-shaped top, and a tip formed as a tiny protrusion on the top of the base. | 01-24-2013 |
| 20130020497 | ELECTROSTATIC ATOMIZING DEVICE - An electrostatic atomizing device comprises an electrostatic atomizing part ( | 01-24-2013 |
| 20130082189 | PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE - A pre-aligned multi-output nozzle/skimmer (PMNS) module includes a pre-aligned nozzle assembly having at least two nozzles and a pre-aligned skimmer subassembly. The PMNS module can be pre-aligned to more accurately position a Multi-Beam Gas Cluster Ion Beam (MBGCIB), and to more accurately control the formation of the multi-beam gas clusters of a pre-aligned MBGCIB. | 04-04-2013 |
| 20130099133 | FOCUSED ION BEAM APPARATUS - Provided is a focused ion beam apparatus including a gas field ion source, the gas field ion source including: an emitter ( | 04-25-2013 |
| 20130105705 | ION BEAM EXTRACTION ELECTRODE AND ION SOURCE | 05-02-2013 |
| 20130119264 | Ion Wind Generator and Ion Wind Generating Device - Provided is an ion wind generator capable of diversifying either or both of the amount of wind or wind direction. An ion wind generator is provided with a first electrode, a second electrode having a downstream area which is arranged at a position in a plan view shifted from first electrode towards the positive side in the x direction, and a dielectric between the first electrode and the second electrode. In a plane view, the distance (d) in the x-direction from a downstream side edge of the first electrode to the downstream side edge of the downstream area differs in the y-direction which is perpendicular to the x-direction. | 05-16-2013 |
| 20130126749 | ION GENERATOR - A partition is formed between an ion generating unit at the windward side and an ion generating unit at the leeward side, so that the amount of airflow to pass through the ion generating unit at the windward side will become more in comparison to the amount of airflow to pass through the ion generating unit at the leeward side. | 05-23-2013 |
| 20130146781 | ION GENERATING DEVICE AND ELECTRICAL APPARATUS - An arrangement area of a transformer drive circuit, an arrangement area of a high-voltage transformer, and an arrangement area of an ion generating unit are two-dimensionally divided from each other in a casing. A connection terminal is electrically connected to the transformer drive circuit and is formed of a conductive film arranged to be exposed to the outside of the casing. Accordingly, an ion generating device whose size and thickness can be easily reduced and an electrical apparatus including the ion generating device can be provided. | 06-13-2013 |
| 20130214173 | ION GENERATING DEVICE - To prevent a reduction in an amount of an ion emission while preventing generation of electromagnetic noise. A high-voltage generating circuit section that supplies a high voltage to an ion generating element that generates ions is housed in a housing, and sealed with filled resin. An emission port for emitting the generated ions is formed in the housing, and an outer surface of the housing except the emission port is covered with a shield case. A passage port communicating with the emission port is formed in the shield case. A periphery of the passage port of the shield case is covered with an electrically insulating covering sheet so that emitted ions do not adhere to the shield case. The ions emitted from the emission port do not adhere to the shield case covered with the covering sheet. | 08-22-2013 |
| 20130228700 | METHOD AND APPARATUS FOR A POROUS ELECTROSPRAY EMITTER - An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip. | 09-05-2013 |
| 20130234035 | ION SUPPLY DEVICE AND WORKPIECE PROCESSING SYSTEM PROVIDED WITH THE SAME - An ion supply device includes an ion generator for generating ions for removing static electricity, a carrier gas supply unit for supplying to the ion generator a carrier gas for carrying the ions generated in the ion generator, and an ion supply nozzle for blowing the ions and the carrier gas from the ion generator through a blow-off opening toward an electricity removal target from which static electricity is to be removed. A slit is provided at the blow-off opening and has an increased width as the slit gets distant from the electricity removal target. The ion supply nozzle includes an internal flow path and a plurality of internal fins provided at a portion of the internal flow path near the blow-off opening so that the ions and the carrier gas blown from the slit is uniformly distributed along a lengthwise direction of the slit. | 09-12-2013 |
| 20130292581 | Integrated Electrospray Ionization Emitter and Detection Cell for Parallel Measurements by Fluorescence and Mass Spectrometry - An integrated mass spectrometer electrospray emitter and fluorescence detector allows improved volumetric measurements of separate components from a liquid chromatography column by improving correlation between the readings of these instruments and reducing dead volume and sample size requirements. | 11-07-2013 |
| 20130327954 | ELECTRON CYCLOTRON RESONANCE ION SOURCE DEVICE - An electron cyclotron resonance ion source device includes a plasma chamber configured to contain a plasma; a high-frequency system configured to transmit a high-frequency wave into the chamber; a magnetic field generator configured to generate a magnetic field in the chamber; an accelerating tube including an isolating structure and an extraction system, the magnetic field generator for generating a magnetic field being entirely located downstream of the isolating structure. | 12-12-2013 |
| 20140151572 | GAS MIXTURE METHOD AND APPARATUS FOR GENERATING ION BEAM - A gas mixture method and apparatus of prolonging lifetime of an ion source for generating an ion beam particularly an ion beam containing carbon is proposed here. By mixing the dopant gas and the minor gas together to generate an ion beam, undesired reaction between the gas species and the ion source can be mitigated and thus lifetime of the ion source can be prolonged. Accordingly, quality of ion beam can be maintained. | 06-05-2014 |
| 20140197332 | ION GENERATOR - Two flow passages are provided for allowing the passage of air sent out from a blower in the same direction individually and discharging the air to outside. An ion generation unit for generating positive ions by only corona discharge is arranged at one flow passage, and an ion generation unit for generating electrostatic atomized water particles with negative polarity by electrostatic atomizing phenomenon is arranged at the other flow passage. A throttle is provided at the one flow passage for making the wind speed of air flowing through the one flow passage faster than the wind speed of air flowing through the other flow passage. Since positive ions having shorter lifetime are emitted more than electrostatic atomized water particles with negative polarity having longer lifetime, the balance between positive and negative polarities in the air can be sustained over a long period of time. | 07-17-2014 |
| 20140264067 | AIR CONDITIONING DEVICE - The air conditioning device discharges ions into air inflowing through an inflow port and outflows the air from the outflow port. The air conditioning device includes an air passage branched into a first passage connected to a peripheral region including a part of a space close to an inner surface of the outflow port and a second passage connected to a central region including a center of the outflow port. The first passage is narrowed continuously from the upstream to the downstream of the air flow, so that the air passing through the first passage is accelerated to outflow at a higher speed than the air passing through the second passage. The ions contained in the air outflowing while passing through the second passage are blocked from charged things around the outflow port by the high-speed air outflowing while passing through the first passage. | 09-18-2014 |
| 20140264068 | METHOD AND APPARATUS FOR TUNING AN ELECTROSTATIC ION TRAP - An apparatus includes an electrostatic ion trap and electronics configured to measure parameters of the ion trap and configured to adjust ion trap settings based on the measured parameters. A method of tuning the electrostatic ion trap includes, under automatic electronic control, measuring parameters of the ion trap and adjusting ion trap settings based on the measured parameters. | 09-18-2014 |
| 20140291542 | EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM - There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member. | 10-02-2014 |
| 20140291543 | INSULATION STRUCTURE OF HIGH VOLTAGE ELECTRODES FOR ION IMPLANTATION APPARATUS - An insulation structure of high voltage electrodes includes an insulator having an exposed surface and a conductor portion, which includes a joint region in contact with the insulator, and a heat-resistant portion provided, along at least part of an edge of the joint region, in such a manner as to be adjacent to the exposed surface of the insulator. The heat-resistant portion is formed of an electrically conductive material whose melting point is higher than that of the conductor portion. The heat-resistant portion may be so provided as to have a gap between the insulator and the exposed surface. | 10-02-2014 |
| 20140291544 | Combined Ion Source for Electrospray and Atmospheric Pressure Chemical Ionization - An ion source for a mass spectrometer comprises: a capillary having a nozzle for emitting a nebulized fluid sample; an electrode of the capillary; a high voltage power supply electrically coupled to the electrode; a second electrode disposed within or configurable to be disposed within a path of the nebulized fluid sample, wherein the capillary and capillary electrode are configurable so as to ionize the nebulized fluid sample by electrospray ionization and the second electrode is configurable so as to ionize the nebulized sample by atmospheric pressure chemical ionization and wherein the second electrode is moveable between positions such that the second electrode is and is not disposed within the path of the nebulized fluid sample, respectively. | 10-02-2014 |
| 20140312244 | MULTIMODE IONIZATION DEVICE - A multimode ionization device includes an electrospray unit, a charge generating unit, and a plasma supplying unit. The electrospray unit is configured to form an electrospray plume which travels along a traveling path. The charge generating unit is configured to permit a liquid electrospray medium to leave the electrospray unit as the electrospray plume. The plasma supplying unit can generate and guide a plasma plume to mix with the electrospray plume so as to obtain a plume combination in a confluent zone, and is oriented to permit at least one of analytes carried in the plume combination to travel to the receiving unit along a linearly-extending end zone of the traveling path. | 10-23-2014 |
| 20140332695 | IONIZATION AT INTERMEDIATE PRESSURE FOR ATMOSPHERIC PRESSURE IONIZATION MASS SPECTROMETERS - An ion source able to ionize liquid and gaseous effluents from interfaced liquid or gaseous separation techniques and from direct introduction of the analyte to the entrance of the ionization region. The liquid effluents from sources such as a liquid chromatograph are ionized by inlet ionization methods and the gaseous effluents from sources such as a gas chromatograph are ionized by a corona or Townsend electrical discharge, or an alpha or beta emitter, or by inlet ionization, or by photoionization. Ionization occurs in an intermediate pressure region linking atmospheric pressure and the vacuum of the mass analyzer. The source has the ability to ionize compounds from both liquid and gaseous sources, which facilitates ionization of volatile compounds separated by gas chromatography, volatile or non-volatile compounds separated by liquid chromatography, or infused into the ionization. The ionization methods can be achieved with a single configuration or with separately optimized configurations. | 11-13-2014 |
| 20150028220 | ELECTRON EXIT WINDOW FOIL - An electron exit window foil for use with a high performance electron beam generator operating in a corrosive environment is provided. The electron exit window foil comprises a sandwich structure having a film of Ti, a first layer of a material having a higher thermal conductivity than Ti, and a flexible second layer of a material being able to protect said film from said corrosive environment, wherein the second layer is facing the corrosive environment. | 01-29-2015 |
| 20150041675 | AIR BLOWER, ION TRANSMITTING DEVICE, ELECTRICAL APPLIANCE, AND REMOTE CONTROL HOLDING STRUCTURE - An inlet port | 02-12-2015 |
| 20150053866 | Repair Apparatus - There is provided a repair apparatus including a gas field ion source which includes an ion generation section including a sharpened tip, a cooling unit which cools the tip, an ion beam column which forms a focused ion beam by focusing ions of a gas generated in the gas field ion source, a sample stage which moves while a sample to be irradiated with the focused ion beam is placed thereon, a sample chamber which accommodates at least the sample stage therein, and a control unit which repairs a mask or a mold for nano-imprint lithography, which is the sample, with the focused ion beam formed by the ion beam column. The gas field ion source generates nitrogen ions as the ions, and the tip is constituted by an iridium single crystal capable of generating the ions. | 02-26-2015 |
| 20150090897 | SiC Coating In An Ion Implanter - An ion implanter has a coating of low resistivity silicon carbide on one or more of the conductive surfaces that are exposed to ions. For example, ions are generated in an ion source chamber, and the interior surfaces of the walls are coated with low resistivity silicon carbide. Since silicon carbide is hard and resistant to sputtering, this may reduce the amount of contaminant ions that are introduced into the ion beam that is extracted from the ion source chamber. In some embodiments, the extraction electrodes are also coated with silicon carbide to reduce the contaminant ions introduced by these components. | 04-02-2015 |
| 20150090898 | ION SOURCE - The invention provides an ion source comprising first and second cathode pole pieces spaced apart from one another to form a cavity therebetween, an edge of the first cathode pole piece being spaced apart from an edge of the second cathode pole piece to define an elongate cathode gap between the respective edges of the pole pieces, the elongate cathode gap having a longitudinal axis; at least one magnet arranged for magnetising the first and second cathode pole pieces with opposite magnetic polarities; an elongate anode located in the cavity, the anode being spaced apart from the first and second cathode pole pieces and having a longitudinal axis, the longitudinal axis of the elongate anode and the longitudinal axis of the elongate cathode gap substantially coplanar; a first electrical connection which extends from outside the cavity to the anode; and a gas feed conduit which extends from outside the cavity to inside the cavity for introducing a gas into the cavity. | 04-02-2015 |
| 20150108363 | AIR BLOWING DEVICE - There is provided an air blowing device that is easy to carry and is convenient, the air blowing device that has little adverse effect on the blowing function and is configured to be able to disperse electrically-charged particles while ensuring safety. | 04-23-2015 |
| 20150108364 | CHARGED PARTICLE EMISSION DEVICE AND AIR-BLOWING DEVICE - A charged particle emission and air-blowing device includes a communication port biased toward an end portion in a predetermined direction with respect to an air outlet, and a width expander configured to widen a flow path between an air directing plate of the end portion and a second blowing duct wider than a periphery. Emitted light from a light guide plate is reflected by the air directing plate in the delivery direction of an air flow. An air flow passes from a downward direction to an upward direction along a circuit board in an auxiliary suction path, and an opening portion faces the upper portion of the circuit board. | 04-23-2015 |
| 20150123008 | ION GENERATOR - In an ion generator, a flexible discharge electrode | 05-07-2015 |
| 20150136997 | AIR BLOWING DEVICE AND AIR BLOWING METHOD - An air blowing device | 05-21-2015 |
| 20150357151 | ION IMPLANTATION SOURCE WITH TEXTURED INTERIOR SURFACES - An ion implementation system includes an ion source chamber having a textured surfaced to reduce surface film delamination on the interior walls of the ion source chamber. The residual stresses originated from the thermal expansion mismatch due to temperature changes and the tensile residual stress between film and the substrate (liners). The textured feature alters the width to thickness ratio so that it will peel off when it reaches its fracture tensile stress. The machine textures surface increases the mechanical interlocking of the film that builds up on the surface of the ion source chamber, which delays delamination and reduces the size of the resulting flake thereby reducing the likelihood that the flake will bridge a biased component to a ground reference surface and correspondingly increases the life of the ion source. | 12-10-2015 |
| 20150364314 | OFF-AXIS CHANNEL IN ELECTROSPRAY IONIZATION FOR REMOVAL OF PARTICULATE MATTER - The present invention relates to electrospray ionization (ESI) at atmospheric pressure coupled with a mass spectrometer, in particular to a special kind of micro-electrospray with liquid flows in the range of 0.1 to 100 microliters per minute. The invention describes the use of an off-axis pre-entrance channel in an ESI ion source to prevent particulate matter with higher inertia than the (charged) gas molecules, such as droplets, from entering the mass spectrometer. The elimination of the particulate matter improves the quantitative precision of an LC/MS bioassay, minimizes the contamination of the mass spectrometer and improves the robustness for high throughput assays. | 12-17-2015 |
| 20150380226 | IONIZATION CHAMBER - An ionization chamber | 12-31-2015 |
| 20160005564 | Apparatus For Dynamic Temperature Control Of An Ion Source - An apparatus for controlling the temperature of an ion source is disclosed. The ion source includes a plurality of walls defining a chamber in which ions are generated. To control the temperature of the ion source, one or more heat shields is disposed exterior to the chamber. The heat shields are made of high temperature and/or refractory material designed to reflect heat back toward the ion source. In a first position, these heat shields are disposed to reflect a first amount of heat back toward the ion source. In a second position, these heat shields are disposed to reflect a lesser second amount of heat back toward the ion source. In some embodiments, the heat shields may be disposed in one or more intermediate positions, located between the first and second positions. | 01-07-2016 |
| 20160013011 | ION IRRADIATION DEVICE AND ION IRRADIATION METHOD | 01-14-2016 |
| 20160049277 | ION BEAM SOURCE - An ion beam source includes a magnetic field unit including a first side facing a target object to be treated and a second side, where the first side is opened and the second side is closed, and the first side includes a plurality of magnetic pole portions arranged at predetermined intervals with an N-pole and an S-pole alternatively or with same magnetic poles and configured to form a closed loop of plasma electrons and an electrode unit arranged at a lower end of the closed loop. The ion beam source is configured to rotate the plasma electrons within a process chamber along the closed loop, to generate plasma ions from an internal gas within the process chamber, and to provide the plasma ions to the target object. | 02-18-2016 |
| 20160049283 | LASER ABLATION CELL - A laser ablation cell ( | 02-18-2016 |
| 20160086784 | IONIZATION CHAMBER WITH TEMPERATURE-CONTROLLED GAS FEED - The invention relates to an ionization chamber for connection to a mass spectrometer. The ionization chamber has a temperature-control block with a gas inlet and a gas channel which starts at the gas inlet and leads into a gas outlet. A temperature-control device is positioned along the gas channel and ensures that a gas flowing in the gas channel is brought to a specific temperature, i.e. it is heated or cooled, before it enters the ionization chamber. The temperature-control block has a formed part into which a structure of the gas channel is incorporated and which is fabricated by means of a sol-gel process, for example out of a glass or ceramic material. | 03-24-2016 |
| 20160104610 | IONIZATION PROBE ASSEMBLIES - The invention relates generally to sample ionization, and provides ionization probe assemblies, systems, computer program products, and methods useful for this purpose. | 04-14-2016 |
| 20160111241 | Ion Beam Uniformity Control - A plasma chamber having improved controllability of the ion density of the extracted ribbon ion beam is disclosed. A plurality of pairs of RF biased electrodes is disposed on opposite sides of the extraction aperture in a plasma chamber. In some embodiments, one of each pair of RF biased electrodes is biased at the extraction voltage, while the other of each pair is coupled to a RF bias power supply, which provides a RF voltage having a DC component and an AC component. In another embodiment, both of the electrodes in each pair are coupled to a RF biased power supply. A blocker may be disposed in the plasma chamber near the extraction aperture. In some embodiments, RF biased electrodes are disposed on the blocker. | 04-21-2016 |
| 20160111242 | METHOD AND APPARATUS FOR A POROUS ELECTROSPRAY EMITTER - An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip. | 04-21-2016 |
| 20160133451 | METHOD AND APPARATUS TO GENERATE BEAMS OF IONS WITH CONTROLLED RANGES OF MOBILITIES - A method and apparatus that generate beams of ions with controlled ranges of mobility is described. Ions are introduced through an inlet in a channel. An axial electric field pushes the ions forward through said channel towards an outlet. The invention also incorporates regions in which ions are depleted, and which travel along said channel at a controlled velocity. These Regions are sequentially induced by locally applying a transversal electric field that deflects the ions away from the axis of said channel, or an axial field that pushes the ions backwards and deflects them away from said axis. Ions that travel at different velocity from the velocity of said regions eventually hit or are hit by said regions, and they do not reach the outlet, while ions of the selected mobility (which travel at the same velocity as said regions) travel through said channel unaltered and reach the outlet. | 05-12-2016 |
| 20160155597 | CARBON ION BEAM INJECTOR APPARATUS AND METHOD OF USE THEREOF | 06-02-2016 |
| 20160189935 | IN SITU CONTROL OF ION ANGULAR DISTRIBUTION IN A PROCESSING APPARATUS - A processing apparatus may include a plasma source coupled to a plasma chamber to generate a plasma in the plasma chamber, an extraction plate having an aperture disposed along a side of the plasma chamber; a deflection electrode disposed proximate the aperture and configured to define a pair of plasma menisci when the plasma is present in the plasma chamber; and a deflection electrode power supply to apply a bias voltage to the deflection electrode with respect to the plasma, wherein a first bias voltage applied to the deflection electrode is configured to generate a first angle of incidence for ions extracted through the aperture from the plasma, and a second bias voltage applied to the deflection electrode is configured to generate a second angle of incidence of ions extracted through the aperture from the plasma, the second angle of incidence being different from the first angle of incidence. | 06-30-2016 |
| 20080217555 | SYSTEMS AND METHODS FOR A GAS FIELD IONIZATION SOURCE - In one aspect the invention provides a gas field ion source assembly that includes an ion source in connection with an optical column such that an ion beam generated at the ion source travels through the optical column. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the methods provide for manufacturing, maintaining and enhancing the performance of a gas field ion source including sharpening the tip of the ion source in situ. | 09-11-2008 |
| 20090057566 | GAS ION SOURCE WITH HIGH MECHANICAL STABILITY - A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit. | 03-05-2009 |
| 20090114840 | Ion sources, systems and methods - Ion sources, systems and methods are disclosed. | 05-07-2009 |
| 20090272912 | ION GENERATOR - An ion generator is capable of efficiently generating ions and includes a case accommodating an ion-generating element that generates ions by discharging electricity from a discharging needle electrode and a cover having openings for ion discharge. Resistive elements are disposed at peripheral portions of the openings, and the resistive elements are grounded. Since the resistive elements are grounded, the peripheral portions of the openings are prevented from being electrostatically charged. As a result, retention of ions at the openings is suppressed, and ions are efficiently generated and discharged. | 11-05-2009 |
| 20090283692 | ION-GENERATING DEVICE AND ELECTRICAL APPARATUS - An outer casing is partitioned, in a plan view, into a high-voltage transformer drive circuit block for disposing at least a high-voltage transformer drive circuit, a high-voltage transformer block for disposing at least a secondary side of a high-voltage transformer, and an ion-generating element block for disposing an ion-generating element. It is thereby possible to obtain an ion-generating device suitable for reduction in size and thickness, and an electrical apparatus mounted with the same. | 11-19-2009 |
| 20090283693 | INTEGRALLY GATED CARBON NANOTUBE IONIZER DEVICE - Described herein is a field ionization and electron impact ionization device consisting of carbon nanotubes with microfabricated integral gates that is capable of producing short pulses of ions. | 11-19-2009 |
| 20110315890 | GAS ION SOURCE WITH HIGH MECHANICAL STABILITY - A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit. | 12-29-2011 |
| 20140042335 | ELECTROMAGNETIC WAVE GENERATOR AND BIT GENERATOR USING OSCILLATION OF CHARGED PARTICLES - An electromagnetic wave generator includes first and second electrodes facing each other and spaced apart from each other; a chargeable particle disposed between the first and second electrodes; a voltage source which applies a voltage between the first and second electrodes; and an antenna electrically connected to one of the first and second electrodes and which radiates an electromagnetic wave due to induced current oscillation based on the applied voltage. | 02-13-2014 |
| 20150008332 | CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING A CHARGED PARTICLE BEAM SYSTEM - The present disclosure relates to a gas field ion source having a gun housing, an electrically conductive gun can base attached to the gun housing, an inner tube mounted to the gun can base, the inner tube being made of an electrically isolating ceramic, an electrically conductive tip attached to the inner tube, an outer tube mounted to the gun can base, the outer tube being made of an electrically isolating ceramic, and an extractor electrode attached to the outer tube. The extractor electrode can have an opening for the passage of ions generated in proximity to the electrically conductive tip. | 01-08-2015 |
| 20150083930 | CHARGED PARTICLE MICROSCOPE - The ionized gas supplied to the emitter tip of a gas field ionization ion source is cooled and purified to enable supplying a reliable and stable ion beam. Impurities contained in the ionized gas destabilize the field ionization ion source. The invention is configured to include a first heat exchanger thermally connected to a part of the field ionization ion source, a cryocooler capable of cooling a second gas line and a cold head, the second gas line being connected to the first heat exchanger and circulating a refrigerant, and a second heat exchanger that cools the first and second gas lines and is connected to the cold head. | 03-26-2015 |
| 20160044770 | ION GENERATOR - Provided is an ion generator that has a potential sensor provided integrally inside the main body of the ion generator, and that can measure, with the potential sensor, an electric field that reaches the potential sensor from a member from which static charge is to be eliminated, without being affected by an electric field between a discharge electrode and an opposing electrode. This ion generator comprises a discharge electrode, an opposing electrode, and a main body part including these electrodes, the ion generator sending out, toward a member from which static charge is to be eliminated, air ions generated by applying a high voltage between the electrodes. A potential sensor that measures the potential of the member from which static charge is to be eliminated is provided integrally to the main body part, and a projecting electrostatic-shielding plate that projects from the main body part is provided between the potential sensor and a discharge part constituted by the discharge electrode and the opposing electrode. | 02-11-2016 |
| 20160196949 | ATMOSPHERIC IONIZER INCLUDING A SOURCE THAT SUPPLIES ELECTRICAL ENERGY TO AN ION-GENERATING STRUCTURE WITHOUT WIRES | 07-07-2016 |
| 20160204581 | ION GENERATION APPARATUS AND ELECTRICAL EQUIPMENT | 07-14-2016 |
| 20080272310 | COLD ELECTRON EMITTER DEVICE FOR DISPLAY - An electron emitter for a display provides an electron source, an electron accelerator, an electron collector disposed between the electron source and the electron accelerator, and one or more electron deflectors to selectively deflect electrons in an electron beam or electron plane towards the electron collector phosphorous coating on a display screen, within a non-metallic vacuum chamber having an adjustable vacuum. Pinhead electrode electron deflectors may each control one color of a pixel, and each set of three adjacent pinhead electrodes may comprise a complete pixel on the display screen. | 11-06-2008 |
| 20100127186 | Laser produced plasma EUV light source - A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume. | 05-27-2010 |
| 20110248181 | SYSTEM FOR FAST IONS GENERATION AND A METHOD THEREOF - The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions. | 10-13-2011 |
| 20120006998 | CONFIGURATIONS OF USING A POINT LIGHT SOURCE IN THE CONTEXT OF SAMPLE SEPARATION - A sample detection apparatus for detecting a fluidic sample in a flow cell of a sample separation system, the sample detection apparatus comprising an electromagnetic radiation source having a chamber configured for generating a plasma, and an energy source configured for generating and directing an energy beam towards the plasma for heating the plasma so that the plasma emits primary electromagnetic radiation, and a detection path being arranged in a detection direction, wherein the detection direction is arranged angularly displaced with respect to a propagation direction of the energy beam, so that primary electromagnetic radiation propagating in the detection direction enters the detection path, wherein the detection path comprises an electromagnetic radiation detector configured for detecting secondary electromagnetic radiation being characteristic for the fluidic sample and resulting from an interaction between the fluidic sample and the primary electromagnetic radiation propagating in the detection direction or at least a portion thereof. | 01-12-2012 |
| 20120132827 | ION ACCELERATION METHOD, ION ACCELERATION APPARATUS, ION BEAM IRRADIATION APPARATUS, AND ION BEAM IRRADIATION APPARATUS FOR MEDICAL USE - A laser light is emitted from a laser light source and focused inside a cluster-gas. A nozzle is installed in a vacuum. The nozzle is configured so that a jet of gas can be jetted from its top into the vacuum. The gas is a mixed gas of helium and carbon dioxide. The gas jetted into the vacuum undergoes adiabatic expansion with a steep cooling, which produces the cluster-gas. In the cluster gas, a large number of CO | 05-31-2012 |
| 20120280138 | FILM MEMBER, FILM TARGET FOR LASER-DRIVEN ION ACCELERATION, AND MANUFACTURING METHODS THEREOF - The present disclosure provides a method of manufacturing film member for laser-driven ion acceleration, a film target, and a method of manufacturing the same, so that only the film member exists at a laser focusing point on the film target, allowing repeated ion acceleration from the film member by focusing high power laser beams thereon. The method includes preparing a film member solution containing a film material to be used for laser-driven ion acceleration; forming a film member on a base substrate by using the film member solution; and separating the film member from the base substrate by dipping the base substrate having the film member formed thereon into a film parting solvent. | 11-08-2012 |
| 20130153783 | SYSTEM FOR FAST IONS GENERATION AND A METHOD THEREOF - The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions. | 06-20-2013 |
| 20130161530 | LASER ION SOURCE - According to one embodiment, a laser ion source is configured to generate ions by application of a laser beam, the laser ion source including a case to be evacuated, an irradiation box disposed in the case and including a target which generates ions by irradiation of laser light, an ion beam extraction mechanism which electrostatically extracts ions from the irradiation box and guides the ions outside the case as an ion beam, a valve provided to an ion beam outlet of the case, the valve being opened at ion beam emission and being closed at other times, and a shutter provided between the valve and the irradiation box, the shutter being intermittently opened at ion beam emission and being closed at other times. | 06-27-2013 |
| 20130221234 | LASER ION SOURCE - According to one embodiment, there is provided a laser ion source. The laser ion source includes a vacuum chamber which is vacuum-exhausted and in which a target is transported and set, a valve which is opened when the target is transported into the vacuum chamber and is closed except for the transportation, a target supply chamber which holds the target to be movable, and a transportation unit which transports to the vacuum chamber the target held on the target supply chamber while opening the valve after the target supply chamber is vacuum-exhausted while closing the valve. | 08-29-2013 |
| 20130228698 | ION SOURCE - According to one embodiments, an ion source connected with a vacuum-exhausted downstream apparatus is provided. The ion source includes a vacuum chamber which is vacuum-exhausted, a target which is set in the vacuum chamber and generates ions by irradiation of a laser beam, a transportation unit which transports the ions generated by the target to the downstream apparatus, and a vacuum sealing unit which seals the transportation unit so as to separate vacuum-conditions of the vacuum chamber side and the downstream apparatus side before exchanging the target set in the vacuum chamber. | 09-05-2013 |
| 20130228699 | ION SOURCE - According to one embodiment, there is provided an ion source. The ion source includes a vacuum-exhausted vacuum chamber, a target which is set in the vacuum chamber and generates a plurality of valences of ions by irradiation of a laser beam, an acceleration electrode which is applied with voltage in order to accelerate the ions generated by the target, and an intermediate electrode which is provided between the target and the acceleration electrode and is applied with reverse voltage of the voltage applied to the acceleration electrode. | 09-05-2013 |
| 20130299716 | APPARATUSES FOR GENERATING PROTON BEAM - Provided is an apparatus for generating a proton beam, which includes a laser system providing a laser pulse, a target generating a proton beam by using the laser pulse, and a phase conversion plate disposed between the laser system as a light source and the target to convert the laser pulse into a circularly polarized laser pulse having a spiral shape. | 11-14-2013 |
| 20150041674 | Chemically Stable Visible Light Photoemission Electron Source - A method of producing electrons via photoemission comprising providing diamond doped p-type with boron, treating a surface of the diamond by exposing it to atomic hydrogen inside an ultrahigh vacuum chamber, illuminating the surface with photons, and extracting the photoemitted electons. A chemically stable visible light photoemission electron source comprising a diamond film having a surface terminated with hydrogen and a light source. | 02-12-2015 |
| 20160043522 | HEURISTIC LASER DEVICE USING AN APPARATUS FOR PRODUCING LASER PULSES, AND CORRESPONDING HEURISTIC METHOD - A laser device includes an apparatus for producing amplified laser pulses, using a plurality of amplifying optical fibers, and groups the basic amplified pulses into an overall amplified pulse, as well as a target, onto which the overall amplified pulse is directed such as to generate a predetermined physical process thereon, which causes a change of state in the target. The laser device is configured to measure at least one distinctive parameter of the generated physical process; adjust at least one characteristic for adjusting the basic amplified laser pulses; and analyze a plurality of measurements for different adjustments. The device analyzes the measurements many times in loops for different laser pulse adjustment characteristics, enabling an optimization by a heuristic method. Also provided is a heuristic optimization method implemented by the laser device. | 02-11-2016 |
| 20160071716 | MALDI IMAGING AND ION SOURCE - An ion source for a mass spectrometer is disclosed comprising a lens and mirror arrangement which focuses a laser beam onto the upper surface of a target substrate. The lens has an effective focal length≦300 mm. The laser beam is directed onto the target substrate at an angle θ with respect to the perpendicular to the target substrate, wherein θ≦3°. One or more ion guides receive ions released from the target substrate and onwardly transmit the ions along an ion path which substantially bypasses the lens and mirror. | 03-10-2016 |
