Entries |
Document | Title | Date |
20080197282 | Scanning Transmission Charged Particle Beam Device - There is provided a scanning transmission charged particle beam device by which charged particles of a bright-field image and charged particles of a dark-field image may be clearly separated, and bright-field images and dark-field images with high accuracy may be obtained even in a state in which the scanning range of a charged particle beams on a sample is changed. | 08-21-2008 |
20080203300 | Scanning Electron Microscope - Disclosed is a scanning electron microscope capable of checking an abrupt change of probe current due to changes in intensities of the respective condenser lenses when the probe current is intended to be changed by changing the intensities of the respective condenser lenses. The scanning electron microscope includes: an electron source for generating a beam of electrons; a first and second condenser lenses each for condensing the beam of electrons; an object lens for narrowly focusing the beam of electrons on a sample; a deflecting system for two-dimensionally scanning over the sample; and a detecting system for detecting secondary electrons generated from the sample due to the irradiation of the beam of electrons on the sample. In the scanning electron microscope, a first and second aperture plates each for blocking parts of the beam of electrons unnecessary for the sample are sequentially arranged between the first and second condenser lenses. | 08-28-2008 |
20080203301 | Electron Microscope - An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample. | 08-28-2008 |
20080203302 | SAMPLE TRANSFER UNIT AND SAMPLE TRANSFERRING METHOD - There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists. | 08-28-2008 |
20080210867 | Scanning Electron Microscope and Calibration of Image Distortion - In method and apparatus for obtaining a scanning electron microscope image devoid of distortion by measuring a scanning distortion and calibrating the scanning distortion, there occurs a problem that an error takes place in dimension control owing to a scanning distortion of an electron beam. To cope with this problem, an image is obtained by scanning a predetermined region with the electron beam, a plurality of regions are selected from the image, the pattern pitch is measured in each of the regions and a scanning distortion amount is calculated from the result of measurement and then corrected. | 09-04-2008 |
20080210868 | Transmission electron microscope - Chirality distribution in the molecular structure of protein or the like and magnetic domain structure are analyzed with high resolution less than 10 nm. A transmission electron microscope equipped with a spin-polarized electron source is used for holography observation. The phase of transmission spin-polarized electrons changes due to the existence of chirality structure or magnetization in a sample, which is observed as an interference pattern phase shift in holography measurement. | 09-04-2008 |
20080210869 | APPARATUS FOR OBSERVING A SAMPLE WITH A PARTICLE BEAM AND AN OPTICAL MICROSCOPE - An apparatus for observing a sample ( | 09-04-2008 |
20080224040 | Image Forming Method and Electron Microscope - As an image forming method including comparison between images for three-dimensional image construction or the like and an apparatus for forming such images, there are provided an image forming method and an electron microscope capable of obtaining with high accuracy or efficiency information required for comparison. In the image forming method, an image is formed on the basis of comparison between a plurality of images obtained by applying an electron beam to a specimen at different tilt angles. The method includes obtaining a first transmission image with the electron beam applied in a first direction and a second transmission image with the electron beam applied in a second direction, the second transmission image being formed within a region different from a peripheral blurred region resulting from tilting, and making a search in the first transmission image by using the second transmission image. | 09-18-2008 |
20080237462 | Semiconductor Testing Method and Semiconductor Tester - A semiconductor testing method capable of quickly counting semiconductor cells with accuracy is achieved. Since an SEM is adjusted in a specific condition, the rotation axis of a stage and the axis of an optical system are deviated from each other in a different observation environment and a different adjustment environment. The deviation between the axes is easily adjusted in each observation environment, so that the deviation is reduced. A seemingly horizontal or vertical line is drawn with a mouse and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell | 10-02-2008 |
20080237463 | Monochromator and scanning electron microscope using the same - An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope. | 10-02-2008 |
20080237464 | Transmission electron microscope micro-grid and method for making the same - A transmission electron microscope (TEM) micro-grid includes a metallic grid and a carbon nanotube film structure covered thereon. A method for making a TEM micro-grid includes the steps of: (a) providing an array of carbon nanotubes, quite suitably, providing a super-aligned array of carbon nanotubes; (b) drawing a carbon nanotube film from the array of carbon nanotubes; (c) covering the carbon nanotube film on a metallic grid, and treating the carbon nanotube film and the metallic grid with an organic solvent. | 10-02-2008 |
20080237465 | Scanning electron microscope - A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens | 10-02-2008 |
20080245965 | Charged Particle System - To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data. According to the present invention, using information about the angle of irradiation of a sample with a charged particle beam, a two-dimensional display of an ideal pattern (design data, such as CAD data, for example) is converted into a three-dimensional display, and the three-dimensional ideal pattern is displayed with an observation image. If the three-dimensional ideal pattern is superimposed on the observation image, comparison thereof can be easily carried out. Examples of the ideal pattern include a circuit pattern (CAD data) based on semiconductor design information, an exposure mask pattern based on an exposure mask used for exposure of a semiconductor wafer, and an exposure simulation pattern based on exposure simulation based on the exposure mask and an exposure condition can be used, and at least one of these patterns is displayed three-dimensionally. | 10-09-2008 |
20080251719 | SCANNING ELECTRON MICROSCOPE AND METHOD FOR PROCESSING AN IMAGE OBTAINED BY THE SCANNING ELECTRON MICROSCOPE - In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated on the basis of an imaging condition or specimen information, and an image restoration is performed by using a resolving power deterioration factor other than the beam intensity distribution as a target of a deterioration mode, so that a high resolving power image can be acquired under various conditions. In the scanning electron microscope for semiconductor inspections and semiconductor measurements, the restored image is used for pattern size measurement, defect detections, defect classifications and so on, so that the measurements can be improved in precision and so that the defect detections and classifications can be made high precise. | 10-16-2008 |
20080258061 | METHOD AND APPARATUS FOR AUTOMATED IMAGE ANALYSIS OF BIOLOGICAL SPECIMENS - An electronic microscope system including a processor, a movable stage movable in two orthogonal directions under control of the processor, the movable stage including at least one part that determines a current position of the movable stage, a microscope part, which magnifies a sample on the movable stage, an electronic camera part, which obtains an image of a magnified sample at a specified position controlled by the movable stage, and at least one vibration isolation mount, coupled to the stage and isolating vibration between the movable stage and the microscope part. | 10-23-2008 |
20080265160 | Observation Method With Electron Beam - For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis. | 10-30-2008 |
20080265161 | Electron Microscope And Electron Beam Inspection System - An electron microscope includes an electron source, a stage for mounting a specimen, an illuminating lens system that illuminates an electron beam onto the specimen, an imaging lens system that forms a specimen image using a reflecting electron beam of the illuminating electron beam, a beam separator that separates the illuminating electron beam and the reflecting electron beam, a control unit that controls current to be supplied to the beam separator; and a switching unit which enables switching between a first mode and a second mode. The control unit changes a value of the current to be supplied to the beam separator when switching from the first mode to the second mode. | 10-30-2008 |
20080272301 | Micro-protruding structure - A micro-protruding structure which has a high positional precision and an angular (directional) precision, which is made of a linear material having a large aspect ratio, and which is provided for an analyzer, a display device, a machining device, a measuring device and an observation device. The micro-protruding structure is fabricated by growing a linear material of a carbon nano-tube from the bottom of the hole structure perforated by a focused ion beam. This permits a direction from the bottom of the hole structure to the opening to become nearly in alignment with the direction of the linear material that protrudes from the hole structure. | 11-06-2008 |
20080277584 | Method for Changing Energy of Electron Beam in Electron Column - The present invention relates to a method of effectively changing the energy of an electron beam in an electron column for generating an electron beam. This includes the step of additionally applying voltage to an electrode such that the electron beam finally has the desired energy so as to freely control the energy when the electron beam reaches a sample. | 11-13-2008 |
20080283748 | Electron microscope - An electron microscope for simultaneously adjusting the tilt, rotation and temperature of the specimen, and rapidly heating a desired localized section of the specimen. Specimen holders support the specimen on one side, and contain a space on the other side. A laser beam mechanism for heating the vicinity of the specimen irradiates a focused laser beam onto the specimen from this space. The output from a light position sensor installed in the specimen holders is utilized to adjust the irradiation position of the focused laser beam by controlling a fine motion mechanism for inputting light into the vicinity of the specimen stand. | 11-20-2008 |
20080283749 | Corrective For Eliminating the Third-Order Aperture Aberration and the First-Order, First-Degree Axial, Chromatic Aberration - A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the other in the direction of the optical axis, in which each correction piece has a plurality of quadrupole fields (QP) and at least one octupole field (OP.) Each correction piece is constructed such that it is symmetrical with respect to its central plane (S, S′) with each correction piece having an uneven number of at least five quadrupole fields (QP) and at least one octupole field (OP). Each correction piece is further constructed so that it is symmetrical with respect to its central plane. The central quadrupole field is arranged so that it is centered with respect to the central plane of the correction piece and is electromagnetic. The quadrupole fields of the two correction pieces are antisymmetrical and a transfer lens system is arranged such that it is symmetrical with respect to the central plane of the corrective between the correction pieces. The transfer lens system has two round lenses and the setting of the transfer lens system takes place so that the two round lenses image the central plane of the two correction pieces anamorphically onto one another, in which the enlargement in one main section is the reciprocal of the enlargement in the other main section and with an octupole field superimposed on the central quadrupole field. | 11-20-2008 |
20080283750 | Sample Observation Method and Transmission Electron Microscope - There is provided a transmission electron microscope capable of a capturing continuous field-of-view image without having an influence of aberration. In order to obtain an electron beam image of the whole of a predetermined range of a sample, the transmission electron microscope specifies a region with little aberration in a field of view of an image pickup device, moves a sample stage in units of the specified regions, captures the whole of the predetermined range as a plurality of continuous field-of-view images. | 11-20-2008 |
20080290274 | DEFECT REVIEW METHOD AND DEVICE FOR SEMICONDUCTOR DEVICE - A defect review method and device of the invention solves the previous problem of a long inspection time that is caused by the increase of a process-margin-narrow pattern as a result of the size reduction of a semiconductor device. With the method and device of the invention, an SEM (Scanning Electron Microscope) image is derived by capturing an image of a process-margin-narrow pattern portion extracted based on lithography simulation with image-capturing conditions of a relatively low resolution. The resulting SEM image is compared with CAD (Computer Aided Design) data for extraction of any abnormal section. An image of the area extracted as being abnormal is captured again, and the resulting high-resolution SEM image is compared again with the CAD data for defect classification based on the feature amount of the image, e.g., shape deformation. The abnormal section is then measured in dimension at a position preset for the classification result so that the time taken for inspection can be prevented from increasing. | 11-27-2008 |
20080290275 | Electron beam device - Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose. | 11-27-2008 |
20080296498 | In-situ STEM sample preparation - A method for STEM sample preparation and analysis that can be used in a FIB-STEM system without a flip stage. The method allows a dual beam FIB/STEM system with a typical tilt stage having a maximum tilt of approximately 60 to be used to extract a STEM sample to from a substrate, mount the sample onto a TEM sample holder, thin the sample using FIB milling, and rotate the sample so that the sample face is perpendicular to a vertical electron column for STEM imaging. | 12-04-2008 |
20080296499 | Charged Particle Instrument Equipped with Optical Microscope - An optical microscope slide in a charged particle instrument such as an electron microscope or a focused ion beam instrument. Conventional microscope slides are not fit for use in an electron microscope as they are insulating and would thus charge when viewed in an electron microscope due to the impinging beam of charged particles. However, microscope slides exist that show a coating with a conductive layer of e.g. Indium Tin Oxide (ITO). These microscope slides are normally used for heating the object mounted on the slide by passing a current through the conductive layer. Experiments show that these microscope slides can be used advantageously in a charged particle instrument by connecting the conductive layer to e.g. ground potential, thereby forming a return path for the impinging charged particles and thus avoiding charging. The invention further relates to a charged particle instrument that is further equipped with an optical microscope. | 12-04-2008 |
20080302965 | Electron Interferometer or Electron Microscope - In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses ( | 12-11-2008 |
20080315096 | Portable Electron Microscope Using Micro-Column - Provided is a portable electron microscope using a microcolumn. The portable electron microscope includes a microcolumn, a low vacuum pump, a high vacuum pump, an ultra-high vacuum ion pump, a first chamber for receiving and fixing the microcolumn and a sample to be measured and forming a vacuum by means of the pumps, a controller, and a case for receiving the pumps, the chamber and the controller. | 12-25-2008 |
20080315097 | Charged particle beam apparatus and specimen holder - Information of a specimen holder or information of a specimen mounted on the specimen holder is stored in a memory inside the specimen holder mounted to an electron microscope. The memory is accessed to transmit the information of the specimen holder to the electron microscope, thereby ensuring that the user can use the specimen holder without mistaking characteristics of the specimen holder and danger of erroneous recording of the specimen information can be reduced. | 12-25-2008 |
20090008551 | Electron beam apparatus with aberration corrector - An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other. | 01-08-2009 |
20090014651 | CHARGED PARTICLE BEAM EQUIPMENTS, AND CHARGED PARTICLE BEAM MICROSCOPE - In an electron microscope to which a phase retrieval method is applied, an image size determined by a pixel size p of a diffraction pattern, a camera length L, and a wavelength λ of an illumination beam is allowed to have a certain relation with an illumination area on a specimen. Further, a beam illumination area or a scanning area of a deflector when a magnified image is observed is set by an illumination adjustment system, so that an image size when the magnified image is used for the phase retrieval method is allowed to have a certain relation with the image size determined by the pixel size of the diffraction pattern, the camera length, and the wavelength of the illumination beam. Accordingly, the information of the diffraction pattern is substantially equal to an object image to be reconstructed. | 01-15-2009 |
20090032709 | Aberration Correction System - An aberration correction system for use in an electron microscope and which produces a negative spherical aberration and corrects a higher-order aberration. The aberration correction system has three stages of multipole elements which, respectively, produce fields of 3-fold symmetry with respect to the optical axis. Any two stages of multipole elements are disposed in directions not to cancel out the 3-fold fields. However, the three stages of multipole elements are so disposed as to cancel out 3-fold astigmatisms. | 02-05-2009 |
20090032710 | SCANNING ELECTRON MICROSCOPE - Disclosed herein is a scanning electron microscope capable of determining quality of a semiconductor pattern, deformation of contact-holes, and inclination of the sidewall of the contact-holes, respectively. To that end, the scanning electron microscope includes image pickup means for picking up images of a circuit pattern formed on a semiconductor wafer on a preset condition, calculation means for comparing each of the images picked up by the image pickup means with a prestored reference image to thereby calculate a feature of the images picked up, and a computer for executing evaluation on quality of the circuit pattern on the basis of the feature calculated by the calculation means, and calculation of the feature is executed independently with reference to a secondary electron image, and each of back-scattering electron images. | 02-05-2009 |
20090039263 | PATTERN MEASUREMENT APPARATUS - Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information. | 02-12-2009 |
20090039264 | ELECTRON MICROSCOPE - Disclosed herein are a method for applying, while a charged particle beam is in a state being irradiated toward the sample, a voltage to the sample so that the charged particle beam does not reach the sample (hereafter such state may be referred to as a mirror state) and detecting information on a potential of a sample using a signal obtained then, and a device for automatically adjusting conditions of the device based on the result of measuring. | 02-12-2009 |
20090045339 | Charged particle beam equipment - Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift. | 02-19-2009 |
20090045340 | ELECTRON MICROSCOPE WITH ELECTRON SPECTROMETER - A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters. | 02-19-2009 |
20090050804 | METHOD OF MEASURING DIMENSION OF FILM CONSTITUTING ELEMENT AND APPARATUS THEREFOR - A method of evaluating an element that includes the step of preparing a thin evaluation sample including a first portion in which a first layer containing a first material and a second layer containing a second material are laminated, a second portion containing the first material, and a third portion containing the second material; and calculating the thickness of the first layer in the first portion. | 02-26-2009 |
20090050805 | SCANNING ELECTRON MICROSCOPE - A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses and the hole diameter of a diaphragm. The angle α of aperture of the electron beam is changed in accordance with the visual field range corresponding to a single pixel, i.e. what is called the pixel size. | 02-26-2009 |
20090057558 | SCANNING ELECTRON MICROSCOPE - An object of the invention is provide a scanning electron microscope including a permanent magnet forming a condenser lens with a variable value of probe current. | 03-05-2009 |
20090078869 | MAGNETIC ELECTRON MICROSCOPE - Below 50-nm-diameter extremely narrow electrically-conductive fiber is used instead of the electron beam biprism used in the conventional interference electron microscope method. A phenomenon is utilized where a focus-shifted shadow of this fiber is shifted from a straight line by a distance which is proportional to a differentiation of phase change amount of an electron beam due to a sample with respect to a direction perpendicular to the fiber. The phase change amount is quantified by calibrating this shift amount through its comparison with a shift amount caused by another sample in terms of which the corresponding phase change amount has been quantitatively evaluated in advance. The differentiation amount of the quantified phase change in the electron beam due to the sample is visualized, or eventually, is integrated thereby being transformed into absolute phase change amount to be visualized. | 03-26-2009 |
20090095904 | Charged particle beam reflector device and electron microscope - A charged particle beam reflector device is configured to include at least two electrostatic mirrors arranged with a predetermined interval on a linear optical axis, each having a through hole through which a charged particle beam radiated from an electron gun along a linear optical axis passes, and having a function of reflecting the charged particle beam or allowing the charged particle beam to pass through the through hole in accordance with an applied voltage, and a controller controlling an applied voltage to the at least two electrostatic mirrors. The controller applies, to each of the electrostatic mirrors, a reflection voltage allowing the electrostatic mirrors to reflect the charged particle beam at a predetermined timing so that the charged particle beam from the electron gun is reflected by the at least two electrostatic mirrors a plurality of times. | 04-16-2009 |
20090101818 | Corrector - The invention concerns a corrector ( | 04-23-2009 |
20090101819 | ENERGY FILTER FOR COLD FIELD EMISSION ELECTRON BEAM APPARATUS - An electron beam apparatus and a method for providing an energy-filtered primary electron beam are described. Therein, a primary electron beam having an asymmetric first energy distribution is generated by means of an electron source. The primary electron beam is high-pass energy filtered using a retarding lens. | 04-23-2009 |
20090108200 | Method and System of Performing Three-Dimensional Imaging Using An Electron Microscope - A method and electron microscope system of performing three-dimensional imaging using an electron microscope. At least some of the illustrative embodiments are methods comprising generating an electron beam, and creating a hollow-cone electron beam (by passing the electron beam through an annular aperture), focusing the hollow-cone electron beam to form a probe, scanning a specimen using the probe; and performing three-dimensional imaging based on the scanning. | 04-30-2009 |
20090140143 | CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREFOR - Potentials at a plurality of points on a diameter of a semiconductor wafer | 06-04-2009 |
20090146056 | Corrector for axial and off-axial beam paths - A corrector ( | 06-11-2009 |
20090146057 | ELECTRON BEAM MEASUREMENT APPARATUS - The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam measurement apparatus has a unit for irradiating the patterns delineated on a substrate by a multi-exposure method, and classifying the patterns in an acquired image into multiple groups according to an exposure history record. The exposure history record is obtained based on brightness of the patterns and a difference between white bands of the patterns. | 06-11-2009 |
20090152463 | METHOD AND APPARATUS OF PATTERN INSPECTION AND SEMICONDUCTOR INSPECTION SYSTEM USING THE SAME - A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers. | 06-18-2009 |
20090159797 | Transmission Electron Microscope - An apparatus which permits high-angle annular dark-field (HAADF) imaging comprises an electron gun, a specimen chamber in which a specimen is set, a gas cylinder for supplying environmental gas around the surface of the specimen through both a gas flow rate controller and a gas nozzle, a vacuum pump for evacuating the inside of the specimen chamber, an objective lens including upper and lower polepieces, a detector for detecting electrons transmitted through the specimen, a display device for displaying a transmission image of the specimen, orifice plates having minute holes, holders supporting the orifice plates, a drive mechanism for driving the holders, and a motion controller. The orifice plates can be moved in a direction crossing the optical axis of the beam on the upper and lower surfaces of the upper and lower polepieces of the objective lens. | 06-25-2009 |
20090189076 | Method for Imaging the Ionomer Spatial Distribution in Fuel Cell Electrodes - A method for evaluating the spatial distribution of an ionomer in a fuel cell MEA. The method includes embedding the MEA in an epoxy, and then slicing thin sections from the MEA. The sliced sections are then exposed to a titanium tetrachloride vapor that stains the epoxy. The stained sections are then viewed with, for example, a transmission electron microscope (TEM) where the lighter regions in the TEM image show the ionomer distribution. | 07-30-2009 |
20090194691 | ELECTRONIC MICROSCOPE APPARATUS - To enable measurement of an elastically scattered electron image, a characteristic-X-ray-based element image and an electron-beam-energy-spectroscopy-based element image with a high S/N and high spatial resolution in an electronic microscope having a function to produce an element image. Measurement of a characteristic X-ray signal and electron beam energy loss spectra or measurement of a plurality of energy filter signals including a core loss of an observed element is performed simultaneously and continuously with detection of elastically scattered electrons transmitted through a specimen to be analyzed, and element images based on characteristic X-rays and electron beam energy spectroscopy are added up while correcting a positional misalignment with respect to elastically scattered electron images continuously observed (see FIG. | 08-06-2009 |
20090194692 | CHARGED PARTICLE RADIATION APPARATUS - A magnetic shield with which a high magnetic field suppression effect is realized in a restricted space and a charged particle radiation apparatus using the magnetic shield are described below. To achieve the above-described object, a scanning electron microscope wherein a shield for shielding against an external magnetic field is formed of a plurality of plate portions made of a magnetic material, the plate portions being disposed on the circumference of a circle whose center corresponds to a center of the space so that each plate portion has a surface direction set different from a line tangent to the circle, is proposed (see FIG. | 08-06-2009 |
20090200465 | PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE - A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point. | 08-13-2009 |
20090206258 | ELECTRON BEAM OBSERVATION DEVICE USING PRE-SPECIMEN MAGNETIC FIELD AS IMAGE-FORMING LENS AND SPECIMEN OBSERVATION METHOD - An electron beam observation device includes a mechanism which disposes a specimen at an upstream side in an electron beam traveling direction outside an objective lens, from which an image is transferred under a magnification of ⅕ to 1/30, in addition to an inside of the objective lens in which a specimen is disposed at a time of ordinary observation. | 08-20-2009 |
20090206259 | REVIEW METHOD AND REVIEW DEVICE - A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. | 08-20-2009 |
20090212215 | SCANNING ELECTRON MICROSCOPE AND METHOD OF MEASURING PATTERN DIMENSION USING THE SAME - In dimension measurement of semiconductor pattern by CD-SEM, the error value between dimensional measurement value and actual dimension on the pattern is much variational as it is dependent on the cross-sectional shape of the pattern, and a low level of accuracy was one time a big problem. In the present invention, a plurality of patterns, each different in shape, were prepared beforehand with AFM measurement result and patterns of the same shape measured by CD-SEM. These measurement results and dimensional errors were homologized with each other and kept in a database. For actual measurement of dimensions, most like side wall shape, and corresponding CD-SEM measurement error result are called up, and the called-up error results are used to correct CD-SME results of measurement object patterns. In this manner, it becomes possible to correct or reduce dimensional error which is dependent on cross-sectional shape of the pattern. | 08-27-2009 |
20090230304 | SCANNING ELECTRON MICROSCOPE - In a VP-SEM that uses gas multiplication induced within a low-vacuum sample chamber and uses a method of detecting a positive displacement current, a secondary electron detector for the VP-SEM that responds at high speed, which can acquire a TV-Scan rate image at a low cost while saving a space is provided. A secondary electron detector is formed by forming the electron supplying electrode and the detection electrode on the flexible thin film type substrate such as a polyimide film, etc., by an etching method. Thereby, the space can be saved while realizing low cost due to mass production. Further, the ion horizontally moving with respect to the surface of the secondary electron detector is detected and the ion moving in a vertical direction returned to the sample holder is not detected, making it possible to realize a high-speed response. | 09-17-2009 |
20090236523 | Analysis apparatus and analysis method for semiconductor device - An analysis apparatus for a semiconductor device, capable of attaining highly efficient analysis of failure in the semiconductor device by a secondary-electron image, including: a region determination unit which determines a region constituting a secondary-electron image of a semiconductor device to be analyzed obtained by irradiating charged particle beam, based on the secondary-electron image and design data of the semiconductor device as a source of comparison; a material identification unit which identifies a material of each configuration of an image obtained by the region determination unit, based on the design data of the semiconductor device; a unit which calculates a potential in the each region identified by the material identification unit, based on the design data of the semiconductor device; a unit which colors each region of an image obtained by the material identification unit in accordance with the potential and generates a dummy good-product secondary-electron image; and a unit which displays the dummy good-product secondary-electron image and the secondary-electron image for the semiconductor device to be analyzed. | 09-24-2009 |
20090242765 | SCANNING ELECTRON MICROSCOPE - It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an error from an abnormality, the scanning electron microscope extracts a sample image lm(t2) obtained by retroceding from a sample image lm(te) stored so as to be associated with time te of error occurrence by a predetermined video quantity (for example, total recording time period t2) previously set and registered by an input-output device, from sample images stored in a recording device while being overwritten, and stores a resultant sample image in another recording device. | 10-01-2009 |
20090242766 | TRANSMISSION ELECTRON MICROSCOPE HAVING ELECTRON SPECTROSCOPE - A transmission electron microscope is capable of correcting, with high efficiency and high accuracy, an electron energy loss spectrum extracted from each of measured portions included in an electron energy loss spectral image with two axes representing the amount of an energy loss and positional information on a measured portion. The transmission electron microscope has an electron spectroscope and a spectrum correction system. The spectrum correction system corrects a spectrum extracted from each measured portion included in an electron energy loss spectral image acquired from a sample based on a difference between a spectrum extracted from a standard portion of a standard spectral image and a spectrum extracted from a portion different from the standard portion. | 10-01-2009 |
20090256076 | CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH-RESOLUTION AND HIGH-CONTRAST OBSERVATION - A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply. Thus, whether landing energy of an electron beam varies widely, the electron beam can be focused with the electromagnetic superposition type objective lens approached to the sample. | 10-15-2009 |
20090261252 | Method and apparatus for pattern inspection - Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image forming principles of the apparatus are different from those of conventional SEM type inspection apparatuses. In order to solve the above conventional problem, the present invention has made it possible for the user to examine such conditions as inspection speed, inspection sensitivity, etc. intuitively by displaying the relationship among the values of inspection speed S, inspection object digital signal image pixel size D, inspection object image size L, and image signal acquisition cycle P with use of a time delay integration method as a graph on an operation screen. The user can thus determine a set of values of a pixel size, an inspection image width, and a TDI sensor operation cycle easily with reference to the displayed graph. | 10-22-2009 |
20090272902 | ELECTRON MICROSCOPE AND OBSERVATION METHOD - An electron microscope includes an electron gun for generating an electron beam, an accelerator for accelerating the electron beam to apply the electron beam to a sample, a spectroscope for selecting electrons having a specific energy out of the electron beam transmitted through the sample and losing an energy by an interaction with the sample, and a detector for detecting the electrons of the specific energy selected by the spectroscope and giving a transmission signal or a diffraction signal at a depth of the sample corresponding to a lost energy quantity of the electrons. | 11-05-2009 |
20090289186 | Small electron gun - To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10 | 11-26-2009 |
20090309025 | PARTICLE OPTICAL ARRANGEMENT - A particle optical arrangement providing an electron microscopy system | 12-17-2009 |
20100001186 | METHOD OF MEASURING DIMENSION OF PATTERN AND RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME - A method of measuring a dimension of a measurement pattern by using a scanning electron microscope is provided. The method of measuring the dimension of the pattern includes: (a) moving to a correction pattern that is adjacent to the measurement pattern. The correction pattern comprises circular patterns to correct focus and/or stigmatism of the scanning electron microscope with respect to the correction pattern. The method further includes (b) measuring the dimension of the measurement pattern under measurement conditions to which the corrected focus and/or the stigmatism are reflected. | 01-07-2010 |
20100025580 | GRID HOLDER FOR STEM ANALYSIS IN A CHARGED PARTICLE INSTRUMENT - A grid holder for STEM analysis in a charged-particle instrument has a base jaw and a pivoting jaw. Both jaws have a substantially congruent inclined portion. The base jaw has a flat portion for mounting the holder on the sample carousel of a charged-particle instrument, such as a dual beam FIB. The inclined portion of the jaws is inclined to the flat portion of the holder at an angle A approximately equal to the difference between 90 degrees and the angle between the electron beam and the ion beam in the charged-particle instrument. The inclined portion of the jaws has a pocket for receiving and holding a sample grid. When a sample is mounted on the grid and the grid is held by the grid holder, the sample will be correctly oriented for ion-beam thinning when the sample carousel is horizontal. The thinned sample may then be placed perpendicular to the electron beam for STEM analysis by tilting the sample carousel by the same angle A. | 02-04-2010 |
20100038537 | Particle beam apparatus having an annularly-shaped illumination aperture - A particle beam apparatus has an optical axis (OA), an illuminating system ( | 02-18-2010 |
20100038538 | OBJECTIVE LENS - An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter D | 02-18-2010 |
20100044566 | POSITIONING DEVICE FOR A PARTICLE BEAM APPARATUS - A positioning device and a particle beam apparatus including a positioning device ensure reliable positioning of a holder for holding an object at any working distance. The positioning device includes a positionable holder for holding the object. A light source generates a light beam which is guided in the direction of the positionable holder. A detector detects the light beam. An injection area injects particles of a particle beam such that they are guided in the direction of the positionable holder. The light beam passes the injection area. The injection area has an output side for the light beam and the particle beam, which is directed toward the holder. The detector includes a detector element situated in an area between the output side and the holder. The light source includes a light source element situated in an area which extends away from the holder, starting from the output side. | 02-25-2010 |
20100051807 | PHASE PLATE, IN PARTICULAR FOR AN ELECTRON MICROSCOPE - The invention concerns a phase plate, in particular for an electron microscope, which is disposed in an electron beam path ( | 03-04-2010 |
20100059676 | CHARGED PARTICLE BEAM APPARATUS - Disclosed herewith is a charged particle beam apparatus capable of controlling each of the probe current and the objective divergence angle to obtain a desired probe current and a desired objective divergence angle in accordance with the diameter of the subject objective aperture. The apparatus is configured to include an objective aperture between first and second condenser lenses to calculate and set a control value of a first condenser lens in accordance with the diameter of the hole of the objective aperture so as to obtain a desired probe current and calculate a control value of a second condenser lens setting device in accordance with the diameter of the hole of the objective divergence angle and the control value of the second condenser lens setting device, thereby setting the calculated control value for the second condenser lens setting device to control the objective divergence angle. | 03-11-2010 |
20100065741 | Method For The Production Of Multiplayer Electrostatic Lens Array - The invention relates to a method for the production of a multilayer electrostatic lens arrangement with at least one lens electrode in general, a method for the production of a phase plate in particular as well as the lens arrangement, the phase plate and a transmission electron microscope with the phase plate. | 03-18-2010 |
20100078557 | ELECTRON BEAM SOURCE AND METHOD OF MANUFACTURING THE SAME - A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core. | 04-01-2010 |
20100084555 | PREPARATION METHOD FOR AN ELECTRON TOMOGRAPHY SAMPLE WITH EMBEDDED MARKERS AND A METHOD FOR RECONSTRUCTING A THREE-DIMENSIONAL IMAGE - A manufacturing method for an electron tomography specimen with embedded fiducial markers includes the following steps. A chip of wafer is provided. The chip includes at least one inspecting area. At least one trench is produced beside the inspecting area. A liquid with the markers is filled into the trenches. A first protection layer is coated on the chip, and then a second protection layer is deposited on the first protection layer. Therefore, the markers can be embedded into the electron tomography specimen. The embedded markers can improve the alignment process, due to those embedded markers are easily tracked during feature tracking procedure. In addition, our novel invention also successfully provides a modified version of the technique to deposit gold beads onto TEM pillar samples for much improved 3D reconstruction. | 04-08-2010 |
20100102227 | ELECTRON BEAM APPARATUS - The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review. | 04-29-2010 |
20100108884 | Micromechanical Devices for Materials Characterization - The present disclosure describes micromechanical devices and methods for using such devices for characterizing a material's strength. The micromechanical devices include an anchor pad, a top shuttle platform, a nanoindenter in movable contact with the top shuttle platform and at least two sample stage shuttles. The nanoindenter applies a compression force to the top shuttle platform, and the at least two sample stage shuttles move apart in response to the compression force. Each of the at least two sample stage shuttles is connected to the top shuttle platform and to the anchor pad by at least one inclined beam. Methods for using the devices include connecting a sample between the at least two sample stage shuttles and applying a compression force to the top shuttle platform. Application of the compression force to the top shuttle platform results in a tensile force being applied to the sample. Measuring a tip displacement of the nanoindenter is correlated with the sample's strength. Illustrative materials that can be studied using the micromechanical devices include, for example, nanotubes, nanowires, nanorings, nanocomposites and protein fibrils. | 05-06-2010 |
20100140474 | METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF - A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined. | 06-10-2010 |
20100155598 | ELECTRON SPIN DETECTOR, AND SPIN POLARIZED SCANNING ELECTRON MICROSCOPE AND SPIN-RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPE USING THE ELECTRON SPIN DETECTOR - An electron spin detector includes plural magnetoresistive sensors and a deceleration lens of an electron beam, and each magnetoresistive sensor is inclined so that the electron beam spread by the deceleration lens can be input perpendicularly to the magnetoresistive sensor. | 06-24-2010 |
20100181481 | Phase contrast electron microscope - A phase contrast electron microscope has an objective ( | 07-22-2010 |
20100181482 | TRANSMISSION ELECTRON MICROSCOPE MICRO-GRID - A transmission electron microscope (TEM) micro-grid includes a grid, a carbon nanotube film structure and two electrodes electrically connected to the carbon nanotube film structure. | 07-22-2010 |
20100224781 | Electron Microscope - An electron microscope is offered which facilitates aberration correction even during high-magnification imaging. The microscope has a spherical aberration corrector, a transfer lens system mounted between the corrector and an objective lens, an aperture stop mounted in a stage preceding the corrector so as to be movable relative to the optical axis, and an angular aperture stop mounted at or near the principal plane of the transfer lens system movably relative to the optical axis to adjust the angular aperture of the electron beam. | 09-09-2010 |
20100252735 | Method, Device and System for Measuring Nanoscale Deformations - A method for measuring nanoscale deformations in a portion (B) of a crystal specimen, comprising steps consisting in:
| 10-07-2010 |
20100258724 | Tip-sharpened carbon nanotubes and electron source using thereof - An electron microscope comprising an electron emitting cathode equipped with a carbon nanotube and an extraction unit to field-emit electrons. The carbon nanotube contains a sharp portion which is approximately conical shape at tip thereof closed at the electron-emitting cathode. | 10-14-2010 |
20100294932 | Magnetic Domain Imaging System - A magnetic domain imaging system is offered which permits application of a strong magnetic field to a specimen. The imaging system includes a transmission electron microscope having an objective lens. The specimen that is magnetic in nature is placed in the upper polepiece of the objective lens. An electron beam transmitted through the specimen is imaged and displayed on a display device. A field application coil assembly for applying a magnetic field to the specimen and two deflection coil assemblies for bringing the beam deflected by the field applied to the specimen back to the optical axis are mounted in the upper polepiece. | 11-25-2010 |
20100301212 | SUBSTRATE-FREE GAS-PHASE SYNTHESIS OF GRAPHENE SHEETS - A substrate-free gas-phase synthesis apparatus and method that is capable of rapidly and continuously producing graphene in ambient conditions without the use of graphite or substrates is provided. Graphene sheets are continuously synthesized in fractions of a second by sending an aerosol consisting of argon gas and liquid ethanol droplets into an atmospheric-pressure microwave-generated argon plasma field. The ethanol droplets are evaporated and dissociated in the plasma, forming graphene sheets that are collected. The apparatus can be scaled for the large-scale production of clean and highly ordered graphene and its many applications. The graphene that is produced is clean and highly ordered with few lattice imperfections and oxygen functionalities and therefore has improved characteristics over graphene produced by current methods in the art. The graphene that is produced by the apparatus and methods was shown to be particularly useful as a support substrate that enabled direct atomic resolution imaging of organic molecules and interfaces with nanoparticles at a level previously unachievable. | 12-02-2010 |
20100308221 | CALIBRATION STANDARDS FOR ELECTRON MICROSCOPES AND ELECTRON COLUMN TOOLS - A calibration standard structured to obtain both morphology and chemistry information with respect to particles analyzed simultaneously. The standard is structured to verify the accuracy of the data obtained in the particle analysis. Related methods of manufacture and use are provided. | 12-09-2010 |
20110057101 | CHARGED PARTICLE BEAM SYSTEM - A charged particle beam system wherein the output of the secondary electron detector is detected while the retarding voltage is varied between the values for which the secondary electrons do not reach the sample and the values for which the secondary electrons reach the sample, and the surface potential of the sample is determined on the basis of the relationship between the retarding voltage and the detected output of the secondary electron detector. | 03-10-2011 |
20110062327 | Charged Particle Beam Device - There is provided a charged particle beam device which can prevent a specimen from not being able to be observed due to entering of a part of a grid of a mesh in a field of view, in which each pixel of a scanning transmission electron microscope image is displayed on the basis of a gray value of a predetermined gradation scale. In the case where the number of pixels of the predetermined gray value is not less than a predetermined percentage, it is judged that the mesh image is included in the scanning transmission electron microscope image. When the mesh image is not anymore included in the scanning transmission electron microscope image, the predetermined gradation scale is converted to another gradation scale and a scanning transmission electron microscope image is obtained. | 03-17-2011 |
20110062328 | Defect Review Apparatus and Method of Reviewing Defects - The present invention aims to provide a defect review apparatus capable of suppressing a reduction in throughput with a minimized deviation-amount measurement, and capable of optimizing an FOV of a monitoring image. To this end, the review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated. Thereby, the reduction in throughput is suppressed to the minimum level, and furthermore a FOV necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount. | 03-17-2011 |
20110073759 | ELECTROMAGENTIC FIELD APPLICATION SYSTEM - The present invention is based on the property that the electric and magnetic fields are independent of each other and normal to each other and the property that the deflection of a charged particle beam by the electromagnetic field follows the rule of linear combination. The present invention employs a system that creates a region in which there exist both electromagnetic field and controls the deflection of a charged particle beam in each of the electric and magnetic fields. | 03-31-2011 |
20110073760 | Charged Particle Beam Irradiation System - It is to prevent an image drift from occurring caused by a specimen being charged when observing the specimen including an insulating material. | 03-31-2011 |
20110079712 | Optical Microscope - An optical microscope for optically measuring a sample ( | 04-07-2011 |
20110084209 | REPRODUCIBLE LATTICE STRAIN MEASUREMENT METHOD - Lattice strain is reproducibly measured using geometric phase analysis (GPA) of a high angle annular dark field mode scanning transmission electron microscope (HAADF-STEM). Errors caused by beam shift (also known as fly-back error) between scan lines are eliminated. | 04-14-2011 |
20110095184 | SCANNING ELECTRON MICROSCOPE AND METHOD OF IMAGING AN OBJECT BY USING THE SCANNING ELECTRON MICROSCOPE - A scanning electron microscope capable of modifying the focal position of a condenser lens with high speed and high reproducibility in order that low-magnification images are obtained at large depths of focus and that high-magnification images are obtained at high resolution. The microscope has a specimen-holding portion, an electron beam source, a condenser lens for converging the electron beam, an objective lens for focusing the converged beam into a very small spot onto a specimen, scan coils, a detector for detecting a specimen signal emanating from the specimen, and a display portion for displaying the detected specimen signal as an image. An axisymmetric electrode is disposed within the magnetic field produced by the condenser lens. A voltage is applied to the electrode. | 04-28-2011 |
20110095185 | SEMICONDUCTOR INSPECTING APPARATUS - In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam. | 04-28-2011 |
20110133084 | ELECTRON MICROSCOPE - An electron microscope according to the present invention includes a phase plate ( | 06-09-2011 |
20110139986 | Electron Microscope - An electron microscope has an electron beam source generating an accelerated electron beam, electromagnetic lenses for converging the electron beam, alignment coils for adjusting the optical axis of the beam transmitted through the lenses, a control unit for controlling the ambient around a specimen, at least one vacuum pump mounted in a given location of the electron optical column, a gas inlet device mounted near the specimen, an imager for creating an image based on a signal arising from the region of the specimen illuminated with the beam, an image output device for recording and displaying the image, and a computer for controlling these components. The computer finds the orifices to be used and diameters of orifices at which the pressure is maintained without electrical discharge in an electron beam source from the selected gas species and the pressure around the specimen. | 06-16-2011 |
20110186735 | ELECTRON SOURCE, ELECTRON GUN, AND ELECTRON MICROSCOPE DEVICE AND ELECTRON BEAM LITHOGRAPHY DEVICE USING IT - An electron source is implemented which has a lower work function of an electron emission surface, yields emitted electrons of a narrower energy bandwidth and higher current density, and lasts longer than existing Zr/O/W electron sources. Further, an electron microscope which yields an image of higher-resolution in a shorter time and an electron beam lithography device which yields higher throughput are also provided. The electron source comprises a needle-shaped electrode made of metal having its tip in a needle shape, a heating body which heats up the needle-shaped electrode, and a diffusion source capable of being heated up by the heating body and made of a mixture of barium composite containing oxygen and carbon particles. | 08-04-2011 |
20110192975 | SELECTABLE COULOMB APERTURE IN E-BEAM SYSTEM - A selectable Coulomb aperture in charged particle system comprises a non-magnetic conductive plate with a plurality of holes therein. The plurality of holes has variant sizes or diameters to select different beam currents of primary beam in the charged particle system. The charged particle system may include a charged particle source for emitting a primary beam, a condenser lens for receiving the primary beam and condensing the primary beam, an objective lens for receiving the primary beam and focusing the primary beam on a surface of a specimen. The selectable Coulomb aperture is positioned between the charged particle source and the condenser lens. | 08-11-2011 |
20110192976 | ABERRATION-CORRECTING DARK-FIELD ELECTRON MICROSCOPY - A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector corrects the electron beam for at least a spherical aberration. A specimen holder is provided to hold a specimen in the path of the electron beam. A detector is used to detect the electron beam transmitted through the specimen. The transmission electron microscope operates in a dark-field mode in which a zero beam of the electron beam is not detected. The microscope may also be capable of operating in an incoherent illumination mode. | 08-11-2011 |
20110204229 | ELECTRON MICROCOPE WHITH INTEGRATED DETECTOR(S) - An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and an x-ray detector positioned within the vacuum chamber. The x-ray detector includes an x-ray sensitive solid-state sensor and a mechanical support system for supporting and positioning the detector, including the sensor, within the vacuum chamber. The entirety of the mechanical support system is contained within the vacuum chamber. Multiple detectors of different types may be supported within the vacuum chamber on the mechanical support system. The mechanical support system may also include at least one thermoelectric cooler element for thermo-electrically cooling the x-ray sensors. | 08-25-2011 |
20110204230 | ELECTRON BEAM TYPE SUBSTRATE INSPECTING APPARATUS - An electron beam type substrate inspection apparatus ( | 08-25-2011 |
20110226950 | LINEAR MOTOR PAIR, MOVING STAGE AND ELECTRON MICROSCOPE - When using a moving magnet type linear motor pair for a moving stage, the magnetic field in a space defined by the linear motor pair varies greatly in association with the movement of movable bodies. For this reason, 4N sets (N is a natural number) of magnet pairs | 09-22-2011 |
20110233402 | Phase-shifting element and particle beam device having a phase-shifting element - A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element. | 09-29-2011 |
20110233403 | INCOHERENT TRANSMISSION ELECTRON MICROSCOPY - A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector corrects the electron beam for at least a spherical aberration. A specimen holder is provided to hold a specimen in the path of the electron beam. A detector is used to detect the electron beam transmitted through the specimen. The transmission electron microscope may operate in an incoherent mode and may be used to locate a sequence of objects on a molecule. | 09-29-2011 |
20110278454 | SCANNING ELECTRON MICROSCOPE - A scanning electron microscope having a charged particle beam that when in a state being irradiated toward a sample, a voltage is applied to the sample so that the charged particle beam does not reach the sample. The scanning electron microscope also detects information on a potential of a sample using a signal obtained, and a device for automatically adjusting conditions based on the result of measuring. | 11-17-2011 |
20120138796 | Signal Processing Method for Charged Particle Beam Device, and Signal Processing Device - Provided is a signal processing method for a charged particle beam, and a signal processing device, wherein the amount of beam radiation per unit area is restricted, while maintaining the magnifications in the X and Y directions constant. Proposed, in order to achieve the above-mentioned purpose, is a signal processing method and a signal processing device wherein a plurality of images taken at different places are added up, and an image is formed. Proposed as a specific example is a signal processing method and a signal processing device that obtains a repeating pattern formed on a sample and having the same shape or similar shapes, by moving the field of view, and that forms an image (or a signal waveform) by adding up the obtained signal, and conducts measurements using this image. | 06-07-2012 |
20120145900 | APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC LENS - An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface. | 06-14-2012 |
20120153147 | Corrector - A corrector ( | 06-21-2012 |
20120217394 | OBJECT AUTHENTICATION METHOD AND USE THEROF - An identification and verification system and a process for said identification and verification of documents is disclosed, which is based on the use of nanoparticles embedded or adsorbed in the document support, utilising the different optical reflectance characteristics thereof in order to obtain, by combining several nanoparticles with specific characteristics, a high effectiveness in the identification of counterfeits. | 08-30-2012 |
20120241610 | System and Method for Detecting at Least One Contamination Species in a Lithographic Apparatus - A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface. | 09-27-2012 |
20120241611 | Electron Microscope - An object of the present invention relates to measurement of a quantitative element image with a high S/N ratio and measurement of an electron energy loss spectrum with high energy precision and energy resolution. The present invention relates to measurement of a characteristic X-ray spectrum obtained by correcting dead time due to excessive X rays and measurement of an electron energy loss spectrum obtained by correcting energy based on a zero loss peak in the case where the characteristic X-ray spectrum and the electron energy loss spectrum are measured by irradiating one irradiation position on a sample with an electron beam for a predetermined time while scanning the surface of the sample to observe a Z-contrast image. According to the present invention, it becomes possible to measure a quantitative element image with a high S/N ratio by a characteristic X ray, an element image with a high S/N ratio by an electron energy loss spectrum and a high energy resolution spectrum. | 09-27-2012 |
20120241612 | Electron Beam Biprism Device and Electron Beam Device - Disclosed are an electron beam biprism device and an electron beam device, in which, in order to implement a fringe scan method in an electron beam interferometer, a deflection function in one direction is added to the function of an electron beam biprism, and electron beams passing the left and right sides of a filament electrode can be respectively deflected at different angles. | 09-27-2012 |
20130009058 | ELECTRON MICROSCOPE - An electron microscope which utilizes a polarized electron beam and can obtain a high contrast image of a sample is provided. The microscope includes: a laser; a polarization apparatus that polarizes a laser beam into a circularly polarized laser beam; a semiconductor photocathode that is provided with a strained superlattice semiconductor layer and generates a polarized electron beam when irradiated with the circularly polarized laser beam; a transmission electron microscope that utilizes the polarized electron beam; an electron beam intensity distribution recording apparatus arranged at a face reached by the polarized electron beam that has transmitted through the sample. An electron beam intensity distribution recording apparatus records an intensity distribution before and after the polarization of the electron beam is reversed, and a difference acquisition apparatus calculates a difference therebetween. | 01-10-2013 |
20130026363 | CHARGED PARTICLE RADIATION DEVICE - The present invention provides a scanning charged particle beam device including a sample chamber ( | 01-31-2013 |
20130062520 | Distortion Free Stigmation of a TEM - A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. | 03-14-2013 |
20130099117 | SCANNING TRANSMISSION TYPE ELECTRON MICROSCOPE - Disclosed is a scanning transmission type electron microscope provided with a scanning transmission electron microscope provided with an aberration corrector | 04-25-2013 |
20130112874 | IMAGING MODALITY USING PENETRATING RADIATIONS - Systems and methods which use penetrating radiation to obtain novel type of information about objects of interest. This information may be represented as novel type of image. In the present embodiments, penetrating radiation is directed through the object of interest. The attenuated radiation emerging from the object of interest is detected by at least one detector. A plurality of measurements is collected. At least one statistical parameter describing variations of the measurements may be calculated and used for reconstructing an image representing fluctuations of the attenuation of the penetrating radiation in the object of study. At least one other statistical parameter representing the mean attenuation image, the error of the fluctuation image, or the error of the mean attenuation image may also be calculated and used to reconstruct images of the object of interest. | 05-09-2013 |
20130112875 | SCANNING TRANSMISSION ELECTRON MICROSCOPE AND AXIAL ADJUSTMENT METHOD THEREOF - A scanning transmission electron microscope equipped with an aberration corrector is capable of automatically aligning the position of a convergence aperture with the center of an optical axis irrespective of skill and experience of an operator. The scanning transmission electron microscope system includes an electron source; a condenser lens configured to converge an electron beam emitted from the electron source; a deflector configured to cause the electron beam to perform scanning on a sample; an aberration correction device configured to correct an aberration of the electron beam; a convergence aperture configured to determine a convergent angle of the electron beam; and a detector configured to detect electrons passing through or diffracted by the sample. The system acquires information on contrast of a Ronchigram formed by the electron beam passing through the sample, and determines a position of the convergence aperture on the basis of the information. | 05-09-2013 |
20130193322 | PHASE PLATE - A phase plate for a charged particle beam system, such as a transmission electron microscope (TEM), is described. The phase plate comprises a support having a through-hole and an elongate member which is magnetisable in a direction along its length and which extends partially across the through-hole and which is narrower than the through-hole. | 08-01-2013 |
20130206987 | Transmission Electron Microscope - A transmission electron microscope ( | 08-15-2013 |
20130234025 | ELECTRON GUN EMITTING UNDER HIGH VOLTAGE, IN PARTICULAR FOR ELECTRON MICROSCOPY - A field-emission electron gun including an electron emission tip, an extractor anode, and a mechanism creating an electric-potential difference between the emission tip and the extractor anode. The emission tip includes a metal tip and an end cone produced by chemical vapor deposition on a nanofilament, the cone being aligned and welded onto the metal tip. The electron gun can be used for a transmission electron microscope. | 09-12-2013 |
20130284925 | ELECTRON BEAM DEVICE - An electron beam device includes a first electron biprism between an acceleration tube and irradiation lens systems, and an electron biprism in the image forming lens system. The first electron biprism splits the electron beam into first and second electron beams, radiated to differently positioned first and second regions on objective plane of an objective lens system having a specimen perpendicular to an optical axis. The first and second electron beams are superposed on the observation plane by the electron biprism of the image forming lens system. The superposed region of those electron beams is observed or recorded. Optical action of the irradiation lens system controls each current density of the first and second electron beams on the objective plane of the objective lens system having the specimen, and distance on electron optics between the first electron biprism and the objective plane of the objective lens system having the specimen. | 10-31-2013 |
20130313432 | INTERFERENCE ELECTRON MICROSCOPE - In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism. | 11-28-2013 |
20140027635 | CHARGED PARTICLE BEAM APPARATUS - Provided is a charged particle beam apparatus adapted so that even when an additional device is not mounted in the charged particle beam apparatus, the apparatus rapidly removes, by neutralizing, a local charge developed on a region of a sample that has been irradiated with a charged particle beam. | 01-30-2014 |
20140042318 | SAMPLE HOLDING APPARATUS FOR ELECTRON MICROSCOPE, AND ELECTRON MICROSCOPE APPARATUS - A sample holding apparatus for electron microscope includes: a sample holding assembly including an assembly of three components of an upper diaphragm holding part, a sample holding plate and a lower diaphragm holding part; and a holding part that holds the sample holding assembly replaceably. The sample holding assembly includes a cell defined between a diaphragm of the upper diaphragm holding part and a diaphragm of the lower diaphragm holding part, and a flow channel connected to the cell, in which a sample mounted at a protrusion of the sample holding plate is placed. The diaphragm of the upper diaphragm holding part, the sample and the diaphragm of the lower diaphragm holding part are disposed along an optical axis of an electron beam. | 02-13-2014 |
20140077080 | X-ray Detector for Electron Microscope - Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt. | 03-20-2014 |
20140084160 | PHOTON INDUCED NEAR FIELD ELECTRON MICROSCOPE AND BIOLOGICAL IMAGING SYSTEM - A method of obtaining PINEM images includes providing femtosecond optical pulse, generating electron pulses, and directing the electron pulses towards a sample. The method also includes overlapping the femtosecond optical pulses and the electron pulses spatially and temporally at the sample and transferring energy from the femtosecond optical pulses to the electron pulses. The method further includes detecting electron pulses having an energy greater than a zero loss value, providing imaging in space and time. | 03-27-2014 |
20140103208 | ELECTRON MICROSCOPE - This electron microscope ( | 04-17-2014 |
20140183358 | Phase Plate and Method of Fabricating Same - A method of fabricating a phase plate, for use in a transmission electron microscope, with simple process steps is offered. The method includes a step (S | 07-03-2014 |
20140252228 | DEVICE AND METHOD FOR CREATING GAUSSIAN ABERRATION-CORRECTED ELECTRON BEAMS - Electron beam phase gratings have phase profiles that produce a diffracted beam having a Gaussian or other selected intensity profile. Phase profiles can also be selected to correct or compensate electron lens aberrations. Typically, a low diffraction order produces a suitable phase profile, and other orders are discarded. | 09-11-2014 |
20140291519 | AUTOMATIC FILTERING OF SEM IMAGES - A method, system, and computer program product to automatically evaluate a scanning electron microscope (SEM) image are described. The method includes obtaining a source image and the SEM image taken of the source image. The method also includes evaluating the SEM image based on comparing source contours extracted from the source image and SEM contours extracted from the SEM image to determine whether the SEM image passes or fails. | 10-02-2014 |
20140319347 | Mounting structures for multi-detector electron microscopes - A detector support for an electron microscope including a detector support ring and flexible elements, wherein a first end of each of the flexible elements is connected to the support ring, and wherein the detector support ring and the flexible elements are configured to support at least two detectors in a circumferential arrangement around an optical axis of the electron microscope such that an optical axis of each of the at least two detectors intersects the optical axis of the electron microscope and a target point of the at least two detectors is maintained relatively constant over a temperature change. | 10-30-2014 |
20140353500 | CHARGED PARTICLE BEAM MICROSCOPE, SAMPLE HOLDER FOR CHARGED PARTICLE BEAM MICROSCOPE, AND CHARGED PARTICLE BEAM MICROSCOPY - There is provided an apparatus that can capture a rotation series of images of an observation area within a range of −180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of −180° to +180° around the y axis thereof. | 12-04-2014 |
20140367571 | METHOD OF WELDING A FROZEN AQUEOUS SAMPLE TO A MICROPROBE - The invention relates to a method of welding a vitreous biological sample at a temperature below the glass transition temperature of approximately −137° C. to a micromanipulator, also kept at a temperature below the glass transition temperature. Where prior art methods used IBID with, for example, propane, or a heated needle (heated resistively or by e/g/laser), the invention uses a vibrating needle to locally melt the sample. By stopping the vibration, the sample freezes to the micromanipulator. The heat capacity of the heated parts is small, and the amount of material that stays in a vitreous condition thus large. | 12-18-2014 |
20140374594 | Detector and Charged Particle Beam Instrument - A detector ( | 12-25-2014 |
20150008323 | DEVICE AND METHOD FOR EMITTING ELECTRONS AND DEVICE COMPRISING SUCH A SYSTEM FOR EMITTING ELECTRONS - A device and method for emitting electrons by a field effect. The device ( | 01-08-2015 |
20150014530 | CHARGED PARTICLE BEAM APPARATUS - Provided is a charged particle beam apparatus ( | 01-15-2015 |
20150014531 | SCANNING ELECTRON MICROSCOPE - It is an object of the present invention to provide a scanning electron microscope for discriminating an angle of an electron ejected from a sample without providing an opening for restricting the angle at outside of an axis. In order to achieve the object described above, there is proposed a scanning electron microscope which includes a deflector to deflect an irradiating position of an electron beam, and a control unit to control the deflector, and further includes a detector to detecting an electron provided by irradiating a sample with the electron beam, an opening configuring member arranged between the detector and the deflector and having an opening for passing the electron beam, and a secondary signal deflector to deflect an electron ejected from the sample, in which the secondary signal deflector is controlled to deflect the electron ejected from the sample toward an opening of passing the electron beam in accordance with a deflection control of the deflector. | 01-15-2015 |
20150053857 | STAGE APPARATUS, AND CHARGED PARTICLE BEAM APPARATUS USING SAME - The purpose of the present invention is to provide a stage apparatus that effectively suppresses the transmission of heat generated by a drive mechanism to a sample, and a charged particle beam apparatus using the same. In order to achieve the purpose, there are proposed a stage apparatus and a charged particle beam apparatus. The stage apparatus comprises a table; a drive source that drives the table in a predetermined direction; a first connection member provided between the table and the drive source; a second connection member provided between the table and the drive source and closer to the drive source than the first member; a slide unit supported by the second connection member; and a rail guiding the slide unit in a predetermined direction, the first connection member comprising a member having a relatively low heat conductivity with respect to the second connection member. | 02-26-2015 |
20150060670 | System and Method for Controlling Charge-up in an Electron Beam Apparatus - The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface. | 03-05-2015 |
20150069235 | Particle Optical System - A particle optical system comprises a beam generating system ( | 03-12-2015 |
20150108351 | Scanning Electron Microscope - Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron. The electron beam enters the sample at a predetermined convergence semi-angle, and a lattice image is acquired at a second convergence semi-angle larger than a first convergence semi-angle at which a beam diameter is minimized on the sample. | 04-23-2015 |
20150136980 | Image Acquisition Method and Transmission Electron Microscope - An image acquisition method and system for use in transmission electron microscopy and capable of providing information about a wide range of frequency range. The method is initiated with setting at least one of the spherical aberration coefficient and chromatic aberration coefficient of the imaging system of the microscope to suppress attenuation of a contrast transfer function due to an envelope function. Then, an image is obtained by the imaging system placed in defocus conditions. | 05-21-2015 |
20150311029 | Transmission Electron Microscope - A transmission electron microscope ( | 10-29-2015 |
20150332889 | Multipole Lens, Aberration Corrector, and Electron Microscope - A multipole lens ( | 11-19-2015 |
20150357156 | Charged-Particle Beam Device - The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck ( | 12-10-2015 |
20150380209 | DIMENSION MEASUREMENT APPARATUS CALIBRATION STANDARD AND METHOD FOR FORMING THE SAME - A method for forming a dimension measurement apparatus calibration standard over a substrate is provided. The method includes forming strip structures over the substrate. The method includes depositing a calibration material layer over the substrate and the strip structures. The calibration material layer and the strip structures are made of different materials. The method includes removing the calibration material layer over top surfaces of the strip structures to expose the strip structures. The method includes removing the strip structures. The calibration material layer remaining over sidewalls of the strip structures forms linear calibration structures. | 12-31-2015 |
20160042910 | DESKTOP ELECTRON MICROSCOPE AND WIDE RANGE TUNABLE MAGNETIC LENS THEREOF - A wide range tunable magnetic lens for the desktop electron microscope is provided. The wired range tunable magnetic lens comprises a coil support, an inner pole piece, a permanent-magnet, a first outer pole piece and a second outer pole piece. The inner pole piece covers the coil support and forms a first magnetic-circuit gap. The permanent-magnet forms a ring structure according to the central axis and is disposed at the outer side of the inner pole piece away from the central axis. The first outer pole piece is adjacently disposed at the upper-side of the permanent-magnet and extends to the central hole of the coil support. The second outer pole piece is adjacently disposed at the under-side of the permanent-magnet and extends to the central hole of the coil support, wherein the first outer pole piece and the second outer pole piece forms a second magnetic-circuit gap. | 02-11-2016 |
20160042911 | DESKTOP ELECTRON MICROSCOPE AND COMBINED ROUND-MULTIPOLE MAGNETIC LENS THEREOF - A combined round-multipole magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil support and at least a second pole shoe of the second pole piece under the coil support respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetric according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrically arranged, and the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap is formed between the first pole shoe and the adjacent second pole shoe, for generating a magnetic field distribution of multi-poles and reducing the volume and the number of power supplies. | 02-11-2016 |
20160189918 | SAMPLE HOLDING DEVICE FOR STUDYING LIGHT-DRIVEN REACTIONS AND SAMPLE ANALYSIS METHOD USING THE SAME - A sample holding device for studying light-driven reactions and a sample analysis method using the same are disclosed. The sample holding device comprises a main body, a supporting structure and a light source assembly. The main body has a channel which has a first end and a second end opposite to the first end, and a focusing lens which is located on the second end. The supporting structure is located on one end of the main body for sample supporting. The light source assembly is detachably disposed on the other end opposite to the end which is disposed with the supporting structure. The light source assembly emits a light beam into the first end of the channel. The light beam then irradiates the sample which locates on the supporting structure after passing through the focusing lens. | 06-30-2016 |
20170236684 | Electron Microscope and Method of Aberration Measurement | 08-17-2017 |
20180025885 | COMPOSITE CHARGED PARTICLE BEAM DEVICE | 01-25-2018 |
20190148106 | Charged Particle Beam Device | 05-16-2019 |
20190148107 | REFERENCE SAMPLE WITH INCLINED SUPPORT BASE, METHOD FOR EVALUATING SCANNING ELECTRON MICROSCOPE, AND METHOD FOR EVALUATING SIC SUBSTRATE | 05-16-2019 |
20220139667 | CHARGED PARTICLE BEAM DEVICE - An object of the invention is to provide a charged particle beam device capable of increasing the contrast of an observation image of a sample as much as possible in accordance with light absorption characteristics that change for each optical parameter. The charged particle beam device according to the invention changes an optical parameter such as a polarization plane of light emitted to the sample, and generates the observation image having a contrast corresponding to the changed optical parameter. An optical parameter that maximizes a light absorption coefficient of the sample is specified according to a feature amount of a shape pattern of the sample (refer to FIG. | 05-05-2022 |