| Entries |
| Document | Title | Date |
|---|
| 20080251502 | CONTROLLED FUSION IN A FIELD REVERSED CONFIGURATION AND DIRECT ENERGY CONVERSION - A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, plasma ions are magnetically confined in the FRC while plasma electrons are electrostatically confined in a deep energy well, created by tuning an externally applied magnetic field. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by the nuclear force, thus forming fusion products that emerge in the form of an annular beam. Energy is removed from the fusion product ions as they spiral past electrodes of an inverse cyclotron converter. Advantageously, the fusion fuel plasmas that can be used with the present confinement and energy conversion system include advanced (aneutronic) fuels. | 10-16-2008 |
| 20080283507 | PLASMA TREATMENT APPARATUS AND METHOD OF PLASMA TREATMENT - A plasma treatment apparatus and a method of plasma treatment for reducing generation of Na atoms in the case where a silica glass and the like are used for a member made of dielectric material are provided. The provided plasma treatment apparatus includes a dielectric member having an impurity element forming positive and movable ions, a vacuum chamber partially sealed with the dielectric member, and a radiator radiating electromagnetic wave into the vacuum chamber through the dielectric member to generate plasma in the vacuum chamber and to treat a workpiece using the plasma. The apparatus further includes an electrode on the dielectric member on a surface opposite the surface exposed to the plasma. The generation of Na can be reduced by applying to the plasma a negative DC potential which is lower than a floating potential measured at the surface of the dielectric member exposed to the plasma. | 11-20-2008 |
| 20080283508 | Method for Cleaning a Torch and Flame Treatment Assembly - A method for cleaning a work surface ( | 11-20-2008 |
| 20090032502 | Method and apparatus for sensing the length of a lead - The technology features an apparatus and a method for sensing the length of a lead that connects to a power source to a thermal processing system such as a plasma torch system. Components disposed in the thermal processing system enable the length of the lead to be sensed. In addition, the time for contact starting a thermal processing system enables determination of the length of the lead. | 02-05-2009 |
| 20090159571 | Plasma Cutter Having High Power Density - Systems and methods are provided for a torch power system having a high power density. In one embodiment, a system is provided that includes a torch power unit having a compressor and power electronics that include one or more power converters, wherein the torch power unit has a power output density of at least 2 watts per cubic inch, 80 watts per pound, or a combination thereof. A power conversion assembly for a torch power unit is provided that includes a single circuit board, a torch power converter mounted on the single circuit board, and a non-torch power converter mounted on the single circuit board. An electrical torch system is also provided that includes a circuit board and a power converter coupled to the circuit board, wherein the power converter includes a planar transformer, a foil wound transformer, or a combination thereof. | 06-25-2009 |
| 20090159572 | Plasma Cutter Having Thermal Model for Component Protection - A system is provided that includes a torch power unit. The torch power unit includes a monitor and/or control configured to determine a temperature of a component of the torch power unit based on the one or more inputs without a direct temperature measurement of the component. A method of operation is provided that includes receiving one or more inputs associated with a device, and estimating a temperature of the device based on the one or inputs without directly measuring temperature of the device. A tangible machine-readable medium is provided that includes code for determining a thermal capacity of the device, code for determining a thermal resistance of the device, and code for determining a temperature of the device based on thermal capacity and the thermal resistance method. | 06-25-2009 |
| 20090159573 | FOUR SURFACES COOLING BLOCK - A cooling block for coupling a remote plasma source to a resistor is disclosed. As processed substrates become larger for solar panels, organic light emitting diodes, and flat panel displays, a greater amount of cleaning gas and hence, plasma from a remote plasma source, may be necessary. When large amounts of cleaning gas such as fluorine containing gas is ignited into a plasma, the temperature of the remote plasma source that ignites the plasma may become very hot. The hot plasma may transfer heat to adjacent components and to any components through which the plasma flows. By cooling the block connecting the remote plasma source to the resistor, the plasma may be cooled prior to reaching the resistor and hence, prior to reaching the processing chamber. | 06-25-2009 |
| 20090250443 | PLASMA PROCESSING APPARATUS - Provided is a plasma processing apparatus including a chamber, a lower electrode, an upper electrode, and a substrate sensor. The chamber is configured to provide a reaction space. The lower electrode is disposed at a lower region in the chamber to mount a substrate thereon. The upper electrode is disposed at an upper region in the chamber to be opposite to the lower electrode. The substrate sensor is provided on the chamber to sense the substrate. Herein, the upper electrode includes an electrode plate and an insulating plate attached on the bottom of the electrode plate, and at least one guide hole is formed in the upper electrode to guide light output from the substrate sensor toward the substrate. | 10-08-2009 |
| 20090261080 | ENHANCED PLASMA FILTER - A device is provided for compressing a plasma stream flowing in a plasma flow direction and maintaining the plasma stream in the compressed state. The device has a plasma compression region; a plurality of first magnets positioned around the plasma compression region for compressing the plasma stream, each of the first magnets having a dominant magnetic force direction that is non-parallel to the plasma flow direction; a reaction region positioned down stream from the plasma compression region; and a plurality of second magnets positioned around the reaction region for maintaining the plasma stream in its compressed state. | 10-22-2009 |
| 20090283502 | PLASMA PROCESSING APPARATUS AND CONTROL METHOD FOR PLASMA PROCESSING APPARATUS - A unit for minimizing the problem that affects a substrate to be processed at the time of turning off a plasma is provided in a plasma processing apparatus using a magnetic field. The plasma processing apparatus comprises: a plasma-generating high-frequency power supply; a bias power supply; and a coil power supply which is connected to a coil disposed outside a vacuum process chamber and generates a magnetic field inside the vacuum process chamber, and the plasma processing apparatus further comprises: a magnetic field measuring unit which measures a magnetic field strength inside the vacuum process chamber; and a control unit which turns off an output on/off signal of the plasma-generating high-frequency power supply or the bias power supply when a magnetic field strength, which is measured after an output on/off signal of the coil power supply is turned off, decays to a predetermined value. | 11-19-2009 |
| 20100044351 | Connection Between a Plasma Torch Wearing Part and a Plasma Torch Wearing Part Holder, Plasma Torch Wearing Part and Plasma Torch Wearing Part Holder - Connection between a plasma torch wearing part and a plasma torch wearing part holder, plasma torch wearing part and plasma torch wearing part holder. | 02-25-2010 |
| 20100096367 | APPARATUS FOR GENERATING REMOTE PLASMA - Provided is an apparatus for generating remote plasma, which can improve thin-film quality by preventing an arc at a bias electrode. The apparatus includes a radio frequency (RF) electrode installed inside an upper portion of a chamber, a bias electrode installed apart from the RF electrode, and including a plurality of through holes through which plasma passes, wherein a bias power is supplied to the bias electrode, a plasma generating unit formed between the RF electrode and the bias electrode, wherein a plasma gas is supplied to the plasma generating unit, and a ground electrode installed under and spaced apart from the bias electrode, and including plasma through holes corresponding to the through holes of the bias electrode, wherein a pulsed DC bias of a second voltage level, which has a first voltage level periodically, is applied to the bias electrode. | 04-22-2010 |
| 20100147808 | CASING AND PLASMA JET SYSTEM USING THE SAME - A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel. | 06-17-2010 |
| 20120285934 | DEVICE AND METHOD FOR GENERATING A PLASMA BY MEANS OF A TRAVELING WAVE RESONATOR - A device for generating a plasma, comprises an alternating voltage source, a travelling wave resonator and coupling means that are designed to couple the alternating voltage generated by the alternating voltage source into the travelling wave resonator in such a manner that travelling electromagnetic waves are produced, wherein the travelling wave resonator is designed to increase the electric field strength of the travelling electromagnetic waves in such a manner that a plasma is ignited in a gas. The invention further relates to a method for generating a plasma, comprising the steps of: generating an alternating voltage; generating travelling electromagnetic waves in a travelling wave resonator by coupling said alternating voltage into the travelling wave resonator; and increasing the electric field strength of the travelling electromagnetic waves in the travelling wave resonator in order to ignite a plasma in a gas. | 11-15-2012 |
| 20130062321 | Apparatus for Changing Area Ratio In A Plasma Processing System - A plasma processing system has an upper electrode and a lower electrode. The upper electrode includes a first and a second upper electrode portions. The first upper electrode portion annularly surrounds the second upper electrode portion. The lower electrode includes a first and a second lower electrode portions, and the first lower electrode portion annularly surrounds the second lower electrode portion. A radio frequency (RF) power source provides RF energy to the second lower electrode portion. The lower surface of the first upper electrode portion is non-planar with a substrate-facing surface of the second upper electrode portion such that the first gap between the lower surface of the first upper electrode portion and the upper surface of the first lower electrode portion is smaller than the second gap between the substrate bearing surface of the second lower electrode portion and the substrate-facing surface of the second upper electrode portion. | 03-14-2013 |
| 20130112669 | HEAT TREATMENT APPARATUS - The present invention provides a heat treatment apparatus which can reduce a surface roughing of a processed substrate while keeping a heat efficiency high, even in the case of heating a sample to be heated to 1200° C. or higher. The present invention is a heat treatment apparatus carrying out a heat treatment of a sample to be heated, wherein a plasma generated by a glow electric discharge is used as a heating source, and the sample to be heated is indirectly heated. | 05-09-2013 |
| 20130112670 | HEAT TREATMENT APPARATUS - Provided is a heat treatment apparatus that is high in thermal efficiency and can reduce surface roughness of a substrate to be treated even when a specimen is heated at 1200° C. or higher. | 05-09-2013 |
| 20130126485 | PLASMA WHIRL REACTOR APPARATUS AND METHODS OF USE - An apparatus for synergistically combining a plasma with a comminution means such as a fluid kinetic energy mill (jet mill), preferably in a single reactor and/or in a single process step is provided by the present invention. Within the apparatus of the invention potential energy is converted into kinetic energy and subsequently into angular momentum by means of wave energy, for comminuting, reacting and separation of feed materials. Methods of use of the apparatus in the practice of various processes are also provided by the present invention. | 05-23-2013 |
| 20130168369 | COOLING BLOCK FORMING ELECTRODE - The present invention is a cooling block that forms an electrode for generating a plasma for use in a plasma process, and includes a channel for a cooling liquid, the cooling block comprising: a first base material and a second base material respectively made of aluminum, at least one of the first and second base materials having a recess for forming a channel for a cooling liquid; and a diffusion bonding layer, in which zinc is diffused in aluminum, and an anti-corrosion layer of a zinc oxide film, the layers being formed by interposing zinc between the first and second base materials, and by bonding the first and second base materials with zinc interposed therebetween in a heating atmosphere containing oxygen. | 07-04-2013 |
| 20130299464 | Methods and Apparatus for Ex Situ Seasoning of Electronic Device Manufacturing Process Components - In one aspect, a method of improving the performance of an electronic device manufacturing facility is provided, including the step of reducing the number of electronic device manufacturing component seasoning steps which are performed using production equipment, whereby the amount of electronic device manufacturing system downtime is reduced. Several other aspects are provided. | 11-14-2013 |
