| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 216054000 | PATTERN OR DESIGN APPLIED BY TRANSFER | 10 |
| 20090212012 | CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION - Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer. | 08-27-2009 |
| 20090302001 | Method for Patterning a Surface - The present invention is directed to methods for patterning surfaces using contact printing and pastes, and products formed therefrom. | 12-10-2009 |
| 20110068083 | METHOD FOR MANUFACTURING TEMPLATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, a method for manufacturing a template for imprinting includes preparing a first template having a device pattern and a plurality of identification patterns, and forming a second template by transferring the device pattern and at lest desired one of the identification patterns to a template substrate. | 03-24-2011 |
| 20110108522 | MICROSTRUCTURED SEPARATION ELEMENT WITH A POROUS SURFACE COATING - A fluidic device for separating different components of a sample, the fluidic device comprising a microstructured body and porous material covering at least a portion of a surface of the microstructured body. | 05-12-2011 |
| 20110303640 | NANOIMPRINT METHOD - A nanoimprint method is provided. A substrate and a master stamp are first provided. The substrate has a first resist layer, a transition layer, and a second resist layer orderly formed thereon. The master stamp has a nanopattern defined therein. The second resist layer is a layer of hydrogen silsesquioxane. The nanopattern of the master stamp is then pressed into the second resist layer to form a nanopattern in the second resist layer at normal temperature which is in a range from about 20 centidegrees to about 50 centidegrees. Finally, the nanopattern of the second resist layer is transferred to the substrate. | 12-15-2011 |
| 20120145669 | PROCESS FOR MAKING RELIEF PRINTING PLATE AND RINSING LIQUID FOR MAKING RELIEF PRINTING PLATE - Provided is a process for making a relief printing plate in which a residue on the plate that is generated during engraving can be easily removed and a rinsing liquid for making a relief printing plate that is suitably used for the process for making a relief printing plate. | 06-14-2012 |
| 20130075365 | METHOD FOR BUILDING A SUBSTRATE HOLDER - A method for making a support of at least one substrate, including: making a stack including at least two substrates, each of the two substrates including two opposite main faces, both substrates being secured to each other such that one of the main faces of a first of the two substrates is positioned facing one of the main faces of the second of the two substrates and against an etch-stop material; etching, through the first of the two substrates and with stop on the etch-stop material, at least one location that can receive a substrate that can be supported by the support. | 03-28-2013 |
| 20130319973 | LAYER-BY-LAYER REMOVAL OF GRAPHENE - The present invention provides methods of selectively removing one or more graphene layers from a graphene material by: (1) applying a metal to a surface of the graphene material; and (2) applying a hydrogen containing solution to the surface of the graphene material that is associated with the metal. The hydrogen containing solution dissolves the metal along with one or more layers of graphene associated with the metal, thereby removing the layer(s) of graphene from the graphene material. In some embodiments, the hydrogen containing solution is an acidic solution, such as hydrochloric acid. In some embodiments, the metal is zinc. In some embodiments, the methods of the present invention are utilized to selectively remove one or more layers of graphene from one or more targeted sites on the surface of a graphene material. | 12-05-2013 |
| 20140034607 | IMPLANTABLE INTRAOCULAR PRESSURE DRAIN - An implanted parylene tube shunt relieves intra-ocular pressure. The device is implanted with an open end in the anterior chamber of the eye, allowing excess fluid to be drained through the tube out of the eye. In one embodiment, only a first end of the tube implanted into the anterior chamber of the eye is open. Intra-ocular pressure (IOP) is then monitored, for example utilizing an implanted sensor. When IOP exceeds a critical valve, a practitioner intervenes, puncturing with a laser a thinned region of the tube lying outside the eye, thereby initiating drainage of fluid and relieving pressure. In accordance with alternative embodiments, the both ends of the tube are open, and the tube includes a one-way valve configured to permit drainage where IOP exceeds the critical value. The tube may include projecting barbs to anchor the tube in the eye without the need for sutures. | 02-06-2014 |
| 20160023503 | CONCAVE-CONVEX PATTERN TRANSFER MATERIAL - Forming a film by means of water-pressure transfer is subject to wrinkling and other problems. Accordingly, provided is a pressurization transfer film constituted by a support layer, water-soluble resin layer, and ink layer stacked on top of each other in this order, wherein a concave-convex surface is formed on the ink layer side of the water-soluble resin layer. | 01-28-2016 |
