Class / Patent application number | Description | Number of patent applications / Date published |
134104100 | Having self cleaning means | 13 |
20090014038 | Washing Container - The invention relates to an entry region of a conveyor-type dishwasher. A conveyor belt which moves in the conveying direction is located in the entry region. The entry region comprises a trough base which is bounded by sidewalls arranged laterally. The entry region contains at least one washing container which stores a stock of fluid and, upon emptying, cleans the trough base. | 01-15-2009 |
20090032071 | LID FOR A SEMICONDUCTOR DEVICE PROCESSING APPARATUS AND METHODS FOR USING THE SAME - A lid for a semiconductor device processing apparatus is provided. The lid comprises a cover having an opening and a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening, and one or more cover edges including one or more edge walls; an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover, wherein the outer door interfaces with the wall formed around the opening and the one or more edge walls; and an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover. Numerous other aspects are provided. | 02-05-2009 |
20090056768 | LIQUID EJECTION HEAD, LIQUID EJECTION APPARATUS, AND MANUFACTURING METHOD OF LIQUID EJECTION HEAD - A liquid ejection head includes an energy-generating element arranged on a semiconductor substrate, a barrier layer deposited on the semiconductor substrate for forming a liquid chamber in the periphery of the energy-generating element, and a nozzle sheet bonded on the barrier layer and having a nozzle formed at a position opposing the energy-generating element, in which the liquid ejection head ejects liquid contained in the liquid chamber from the nozzle as liquid droplets by the energy-generating element, and the barrier layer is provided with a plurality of depressions, each having an independent contour, arranged within a range, which is separated from the border of the barrier layer, on an adhesive region adhering to the nozzle sheet. | 03-05-2009 |
20090159104 | METHOD AND APPARATUS FOR CHAMBER CLEANING BY IN-SITU PLASMA EXCITATION - A substrate processing chamber for processing substrates such as semiconductor wafers, flat panel substrate, solar panels, etc., includes mechanism for in-situ plasma clean. The chamber body has at least one plasma source opening provided on its sidewall. A movable substrate holder is situated within the chamber body, the substrate holder assumes a first position wherein the substrate is positioned below the plasma source opening for in-situ plasma cleaning of the chamber, and a second position wherein the substrate is positioned above the plasma source opening for substrate processing. A plasma energy source is coupled to the plasma source opening. | 06-25-2009 |
20110120508 | DISHWASHER - A dishwasher is provided that effectively cleans a filter. The dishwasher may include a rack positioned in a washing space and at least one nozzle that directs washing fluid into the washing space, a sump that receives washing fluid to be supplied to the washing space, and a filter device provided in the sump, including a first filter and a second filter. A driver rotates the first filter or the second filter so as to separate foreign materials from the filter device and prevent the filter device from clogging. | 05-26-2011 |
20110126865 | DISHWASHER - A dishwasher is provided that prevents foreign materials from remaining lodged in a filter. The dishwasher may include a sump in which washing fluid is collected, a filter provided in the sump so as to separate foreign materials from the washing fluid, and a cleaning device including at least one blade that scrapes foreign materials from the filter as the cleaning device moves, either in a rotating direction or a linear direction. | 06-02-2011 |
20120186609 | DISHWASHER - A dishwasher, in particular a household dishwasher, includes a circulation pump for circulating a washing liquid in a hydraulic circuit. Connected to an induction side of the circulation pump is a pump sump through which washing liquid flows. The sump pump includes at least one filter element that retains dirt particles contained in the washing liquid and can be cleaned by at least one cleaning device provided in the pump sump. | 07-26-2012 |
20120234364 | SUBSTRATE TREATMENT APPARATUS - The substrate treatment apparatus includes a first substrate transport robot having a hand which holds a substrate, a second substrate transport robot having a hand which holds the substrate, and a hand cleaning unit which cleans the hand of the first substrate transport robot and the hand of the second substrate transport robot. The hand cleaning unit is configured to be accessible by the hand of the first substrate transport robot and the hand of the second substrate transport robot, and is disposed above or below a substrate transfer place at which the substrate is transferred between the first and second substrate transport robots. | 09-20-2012 |
20130291905 | SUBSTRATE TREATMENT APPARATUS - A substrate treatment apparatus is provided, which includes: a seal chamber including a chamber body having an opening, a lid member provided rotatably with respect to the chamber body and configured to close the opening, and a first liquid seal structure which liquid-seals between the lid member and the chamber body, the seal chamber having an internal space sealed from outside; a lid member rotating unit which rotates the lid member; a substrate holding/rotating unit which holds and rotates a substrate in the internal space of the seal chamber; and a treatment liquid supplying unit which supplies a treatment liquid to the substrate rotated by the substrate holding/rotating unit. | 11-07-2013 |
20140190530 | SUBSTRATE CLEANING APPARATUS AND POLISHING APPARATUS - A substrate cleaning apparatus capable of preventing a cleaning vessel from being corroded by a chemical liquid while constituting the cleaning vessel with a low-price material is provided. The substrate cleaning apparatus includes: a cleaning vessel for holding a substrate therein; a substrate holder arranged in the cleaning vessel; a chemical liquid nozzle for supplying a chemical liquid onto the substrate held by the substrate holder; and a plurality of cleaning liquid nozzles for supplying a cleaning liquid onto an inner surface of the cleaning vessel. The inner surface of the cleaning vessel has been subjected to a hydrophilization treatment. | 07-10-2014 |
20140238446 | ROTATING FILTER FOR A DISHWASHING MACHINE - A dishwasher with a tub at least partially defining a washing chamber, a liquid spraying system for spraying liquid within the washing chamber, a liquid recirculation system defining a recirculation flow path, and a liquid filtering system. The liquid filtering system includes a rotating filter disposed in the recirculation flow path to filter the liquid. | 08-28-2014 |
20150096599 | FILTER CLEANER FOR A DISHWASHING APPLIANCE - A cleaner is provided for a filter of a dishwashing appliance. The filter cleaner rotates within the filter and uses nozzles to remove particulates on the filter surface. Energy from fluid flow caused by a pump is used to rotate the filter cleaner. The particulates removed from the filter are pumped away for disposal. | 04-09-2015 |
20150367505 | SET OF MECHANICAL MEANS THAT CAN BE INCORPORATED INTO A DELTA ROBOT FOR LINING ENDS - The invention relates to a set of mechanical means specifically designed to be incorporated into a delta robot, forming a machine that can gum lids at a much greater speed than those traditionally used and with substantially greater efficiency. In some cases, the machine is defined by a pair of arms, the ends of which includes a rectangular machined zone housing a stop element that provides a connection with a bolt. In some cases, the bearings are inserted on both sides of the machined zone by means of a bore-hole characterised in that it extends from the inner portion outwards, such that the hole is not a through-hole along its entire length and the bearings abut against the outer wall of the arm. | 12-24-2015 |