Class / Patent application number | Description | Number of patent applications / Date published |
134031000 | Gas or vapor condensation or absorption on work | 23 |
20100132747 | Thermal De-Scaling Surfaces With Cryogenic Liquids And Gases - Cryogenic fluids are used to remove contaminants such as hard scale deposits from heating and/or heat transfer equipment. The fluid may be cryogenically cooled to achieve a liquid phase and/or a mixture of liquid and gas phases. The fluid may also be pressurized. The mixture does not include a solid phase. A particle injection port is not required. The cryogenic fluid contacting the surface of a scale or other contaminant that has built-up during service of heating or heat exchanging equipment causes a near instantaneous contraction at the scale surface. Cracks form at the scale surface contacted by the cryogenic fluid. These cracks extend through the scale thickness to the underlying material of the equipment of the heating and/or heat exchanging component. The fractured surface scale separates by spalling or de-cohesion from the underlying equipment structure and is moved off the surface by the action of the exiting cryogenic fluid. | 06-03-2010 |
20100154835 | CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS - A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF | 06-24-2010 |
20100154836 | Processing system, processing method, and storage medium - A processing system 1 comprises: a processing vessel 30 configured to accommodate an object to be processed W in a processing space 83; a process-fluid generating part 41 configured to generate a process fluid of a predetermined temperature; and a main duct 56 arranged between the process-fluid generating part 41 and the processing vessel 30, the main duct 56 being configured to guide the process fluid supplied from the process-fluid generating part 41. A process-fluid supply duct 171 is arranged on a downstream side of the main duct 56 via a switching valve 70, the process-fluid supply duct 171 being configured to introduce the process fluid into the processing space 83 of the processing vessel 30. A process-fluid bypass duct 172 is arranged on the downstream side of the main duct 56 via the switching valve 70, the process-fluid bypass duct 172 being configured to guide a process fluid, which is not introduced to the process-fluid supply duct 171, so as to bypass the processing space 83. The main duct 56 is provided with a flow-rate adjusting mechanism 65 for adjusting a flow rate of the process fluid flowing through the main duct 56. | 06-24-2010 |
20100252076 | CONDENSATION AND WASHING DEVICE, POLYMERISATION DEVICE AND METHOD FOR CLEANING PROCESS STEAM DURING THE PRODUCTION OF THE POLYLACTIDE - The present invention relates to a condensation and washing device with which in particular the process vapours which occur during the production of polylactide can be processed and cleaned. Furthermore, the present invention relates to a polymerisation device for the production of polylactide and also to a method for processing process vapours which occur during the production of polylactide; possibilities for use of both the condensation and washing devices and of the method are likewise mentioned. | 10-07-2010 |
20110011426 | PART WASHER AND PART WASHING METHOD USING THE SAME - Disclosed herein are a part washer and a part washing method using the same. The part washer includes a condensing unit which condenses VOC gas, thus markedly reducing the density of VOC gas in a chamber. | 01-20-2011 |
20110079251 | METHOD FOR IN-SITU CLEANING OF DEPOSITION SYSTEMS - A method for in-situ cleaning of a deposition system is disclosed. The method includes providing a deposition system with portions of the deposition system deposited with at least a group III element or a compound of a group III element. Halogen containing fluid is introduced into the deposition system. The halogen containing fluid is permitted to react with the group III element to form a halide. The halide in solid state is converted to a gaseous state. The halide in gaseous state is purged out of the deposition system. | 04-07-2011 |
20110259374 | CLEANING APPARATUS AND CLEANING METHOD - A cleaning apparatus for cleaning an object by supplying a hydrogen radical to the object includes a generation unit configured to generate the hydrogen radical by supplying gas to a heated catalyst, a limitation unit configured to limit supply of gas from the generation unit to the object, and an exhaust unit configured to exhaust gas around the catalyst without passing it through the object in a state where the supply of the gas is limited by the limitation unit. | 10-27-2011 |
20120024324 | Regeneration of Purification Beds with a Jet Compressor in an Open Loop Cycle - Methods and systems for regenerating a purification bed take advantage of inert gas pressure, such as, for example, supplied by a pipeline. The inert gas ( | 02-02-2012 |
20120285492 | METHODS OF DRY STRIPPING BORON-CARBON FILMS - Embodiments of the invention generally relate to methods of dry stripping boron-carbon films. In one embodiment, alternating plasmas of hydrogen and oxygen are used to remove a boron-carbon film. In another embodiment, co-flowed oxygen and hydrogen plasma is used to remove a boron-carbon containing film. A nitrous oxide plasma may be used in addition to or as an alternative to either of the above oxygen plasmas. In another embodiment, a plasma generated from water vapor is used to remove a boron-carbon film. The boron-carbon removal processes may also include an optional polymer removal process prior to removal of the boron-carbon films. The polymer removal process includes exposing the boron-carbon film to NF | 11-15-2012 |
20130014785 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUSAANM KIMURA; MasahiroAACI KyotoAACO JPAAGP KIMURA; Masahiro Kyoto JPAANM OTSUJI; MasayukiAACI KyotoAACO JPAAGP OTSUJI; Masayuki Kyoto JP - A substrate processing method includes a removing step of removing unwanted matter from a substrate and a vaporizing step performed in parallel to the removing step. In the removing step, an HF vapor that contains hydrogen fluoride and a solvent vapor that contains a solvent capable of dissolving water and having a lower boiling point than water is supplied onto the substrate to etch and remove the unwanted matter. In the vaporizing step, the solvent on the substrate is vaporized. | 01-17-2013 |
20130037063 | MATTRESS SANITATION SYSTEM - A mobile mattress sanitizing and cleaning system. A cleaning chamber and drying chamber may be located within the body of truck which may also carry a water supply and steam generator. The cleaning and drying chambers are dimensioned and configured to receive a mattress therein, and may be separate or combined. The mattress is steam cleaned in the cleaning chamber and air dried in the drying chamber. The cleaning and drying chambers may face the rear of the truck to facilitate loading and may be oriented such that mattresses stand on edge when being cleaned and dried. The system may include a water purifier. Drying may be conducted by blowers mounted to the drying chamber. Drying air may be heated. | 02-14-2013 |
20130133703 | VAPORIZED MATERIAL SUPPLY APPARATUS, SUBSTRATE PROCESSING APPARATUS HAVING SAME AND VAPORIZED MATERIAL SUPPLY METHOD - A vaporized material supply apparatus includes: a storage tank for storing a liquid material; a first temperature controller for controlling the storage tank to be at a first temperature; a carrier gas inlet line for introducing a carrier gas into the storage tank; a processing gas outlet line for discharging a processing gas out of the storage tank; a container having an inlet port connecting to the processing gas outlet line and an outlet port via which the processing gas is discharged; an interference member to interfere with flow of the processing gas in the container; and a second temperature controller for controlling the container to be at a second temperature lower than the first temperature. | 05-30-2013 |
20130146103 | METHOD AND SYSTEM FOR IMPROVING PERFORMANCE AND PREVENTING CORROSION IN MULTI-MODULE CLEANING CHAMBER - A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated. | 06-13-2013 |
20130146104 | Method For Cleaning The Usable Space Of A Climatic Cabinet - The present invention relates to a method for cleaning a usable space of a climatic cabinet, said usable space being surrounded by walls and optionally being provided with fittings, in which steam is generated by heating a water reservoir while at the same time steam is caused to condense on said walls and on any fittings present in the usable space. | 06-13-2013 |
20130319474 | APPARATUS AND METHOD FOR CLEANING BOWLING BALLS - A compact and portable bowling ball cleaner apparatus has a controlled heated temperature/timed steam process that properly and effective removes oil and dirt from the pores and surface of reactive bowling balls and gives restored life and performance to the ball without changing the coverstock or mechanics. The cleaner apparatus is not only cost effective, but a must have product for any avid/league/pro bowler that uses reactive bowling balls. The cleaner apparatus provides an effective, safe, affordable, user friendly, compact and attractive solution for removing oil and dirt from bowling balls. | 12-05-2013 |
20140014138 | GAS-LIQUID PHASE TRANSITION METHOD AND APPARATUS FOR CLEANING OF SURFACES IN SEMICONDUCTOR MANUFACTURING - A method and apparatus for cleaning an article in semiconductor manufacturing are provided. The method includes subjecting a first chamber containing the article to a vapor source while controlling a temperature of the article and a temperature of the vapor source such that vapor from the vapor source condenses on a surface of the article to form a liquid film. The method further includes evaporating the liquid film, whereby the evaporating liquid transports contaminants from the surface of the article. Evaporating includes exposing the first chamber to condensing surfaces having a temperature lower than a temperature of the article, whereby the evaporated liquid condenses on the condensing surfaces. The apparatus includes a first chamber for housing the article, a vapor source connected to the first chamber, a temperature controller, and a second chamber connected with the first chamber to collect the vapor evaporated from the article. | 01-16-2014 |
20140014139 | SPRAY LANCE ARRANGEMENT - A two media spray lance and nozzle useful for moistening at least a portion of absorbent material present in a mixer. The nozzle includes a central body with a connecting portion for connecting the nozzle to the two media spray lance for a supply of liquid and gas thereto, and an atomizing portion. The atomizing portion delivers droplets of liquid to the absorbent material present in the mixer to obtain moistened absorbent material. | 01-16-2014 |
20140261570 | SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APPARATUS, AND STORAGE MEDIUM - Disclosed is a substrate liquid processing method. The substrate liquid processing method includes: forming a liquid film of a processing liquid having a diameter smaller than that of the substrate on a surface of a substrate by providing the processing liquid to a central portion of the surface of the substrate from a first nozzle while rotating the substrate around a vertical axis in a horizontal posture; supplying, from a second nozzle, a processing liquid, which is the same as the processing liquid supplied from the first nozzle, to a peripheral edge of the liquid film of the processing liquid formed on the surface by the first nozzle; and moving a position of supplying the processing liquid from the second nozzle to the surface of the substrate toward a peripheral edge of the substrate and as a result, expanding the liquid film of the processing liquid toward the peripheral edge of the substrate. | 09-18-2014 |
20140332035 | METHOD FOR VAPOR-CLEANING OBJECT TO BE CLEANED AND DEVICE THEREFOR - When an object to be cleaned is vapor cleaned in the prior art, a tubular cleaning tube is arranged on the top face of the cover plate, at the outer periphery of the outlet, so that the cleaning vapor can accumulate, allowing very little pushing out the air in the working chamber. In the present invention, an outlet is provided in a cover plate through which cleaning vapor flows out into an ordinary pressure working chamber thereabove; condensation of this outflowing cleaning vapor at a low position in the ordinary pressure working chamber is made possible by a condensation unit; and a tubular cleaning tube is arranged at the outer periphery of the outlet on the top face of a cover plate, whereby the cleaning vapor rises up in the cleaning tube so that an object to be cleaned can be vapor cleaned by receiving it in this cleaning tube. | 11-13-2014 |
20150027501 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS - In order to remove the particles attached to the wafer W, the distance between a front end of a nozzle unit | 01-29-2015 |
20150068559 | Device Manufacturing Cleaning Process Using Vaporized Solvent - A cleaning method using vaporized solvent is provided. A solvent-containing vapor is generated, wherein the solvent-containing vapor comprises a solvent. The solvent-containing vapor is conducted to a substrate having debris or contaminants to clean the substrate, wherein the solvent-containing vapor condenses to form a liquid on a surface of the substrate. The liquid phase of the solvent-containing vapor is changed to a solid phase. The solid phase of the solvent-containing vapor is changed back to a liquid phase. The substrate is spun dried to remove the solvent-containing vapor in liquid phase and any debris or contaminants. | 03-12-2015 |
20150290686 | SOLVENT VAPOR PHASE DEGREASING AND DEFLUXING COMPOSITIONS, METHODS, DEVICES AND SYSTEMS - The present invention relates, in part, to compositions that include (1) a first component comprising an alcohol, (b) a second component selected from the group consisting of a glycol ether, a terpene, a halogenated hydrocarbon, and combinations thereof, (c) a third component selected from the group consisting of a hydrohaloether, a decahalopentane, and combinations thereof. | 10-15-2015 |
20160141170 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - The substrate treatment apparatus includes a first nozzle, a second nozzle, a detector, and a controller. The first nozzle supplies an organic sublimable material-containing liquid capable of displacing a rinsing liquid, to a surface of a substrate treated with the rinsing liquid. The second nozzle supplies vapor of a solvent in which the organic sublimable material is capable of dissolving, to the surface of the substrate. The detector detects a first physical amount of the vapor on the surface of the substrate. The controller controls a second physical amount of the vapor according to the first physical amount. | 05-19-2016 |