Class / Patent application number | Description | Number of patent applications / Date published |
134029000 | One a soap or an alkaline agent | 20 |
20090007940 | Process For Cleaning A Semiconductor Wafer Using A Cleaning Solution - Semiconductor wafers are cleaned using a cleaning solution containing an alkaline ammonium component in an initial composition, wherein the semiconductor wafer is brought into contact with the cleaning solution in an individual-wafer treatment, and in the course of cleaning hydrogen fluoride is added as further component to the cleaning solution, and the cleaning solution has at the end of cleaning, a composition that differs from the initial composition. | 01-08-2009 |
20100012157 | METHOD FOR CLEANING A SURFACE - A method for cleaning a surface of a plate-like article includes the steps of:
| 01-21-2010 |
20100139707 | WASHABLE FILMIC LAMINATES - A process for removing a washable PSA laminate from a substrate is provided. The process comprises contacting the washable PSA laminate with water and optionally, a base, at a temperature sufficient to remove the washable PSA laminate from the substrate; wherein the washable PSA laminate comprises at least one facestock layer, at least one adhesive base layer, and at least one tackifier layer; wherein the facestock layer comprises at least one facestock material; wherein the adhesive base layer comprises at least one adhesive base polymer; wherein the tackifier layer comprises at least one tackifier and optionally at least one adhesive base polymer; wherein the tackifier layer is applied to the adhesive base layer side of the washable PSA laminate. Specifically, a process is provided for removing a washable PSA laminate from a bottle comprising contacting the washable PSA laminate with water and optionally, a base, at a temperature sufficient to remove the washable PSA laminate from the bottle. | 06-10-2010 |
20100180917 | CLEANER COMPOSITION FOR REMOVING LEAD-FREE SOLDERING FLUX, AND METHOD FOR REMOVING LEAD-FREE SOLDERING FLUX - The object of the present invention is to provide a novel cleaner composition that not only reduces ignition by flame and has a small influence on the environment, but that also has an excellent property of dissolving flux residues adhered on narrow portions or in narrow gaps in an object to be cleaned that was subjected to soldering with a lead-free solder, and reduces recontamination of the object in the water-rinsing process. The present invention uses a halogen-free organic solvent (A) represented by a specific Formula; an amine-based compound (B) represented by a specific Formula; a chelating agent having no amino group (C); and, as required, water. | 07-22-2010 |
20100192986 | WATER-SOLUBLE POUCH - A detergent multi-compartment pouch having a plurality of water-soluble films forming a plurality of compartments the pouch comprising two side-by-side compartments superposed onto another compartment wherein at least two different compartments contain two different compositions. | 08-05-2010 |
20100263690 | Cleaning with controlled release of acid - The present invention discloses a method for cleaning a substrate comprising contacting the substrate in a cleaning cycle with an aqueous cleaning solution comprising an aqueous diluent and a detergent composition, the detergent composition comprising a glycolic and/or lactic acid oligomer with an average degree of polymerization between 1.8 and 6. Preferably, the substrate is contacted in a rinse cycle with an aqueous rinse which is substantially free of an intentionally added rinse agent or fabric softener. | 10-21-2010 |
20110023913 | PROCESS FOR CLEANING SUBSTRATES WITH OXIDISING AGENTS AND REDUCING AGENTS - The present invention relates to a method for the purification of substrates, characterized in that the purification is carried out by at least one oxidation agent, selected from the group consisting of permanganate and ferrate (VI), and subsequently by a reduction agent. Organic residue, such as legionella or extracellular polymer substances (EPS) can be removed from surfaces of filtration or classification devices and from transport and storage devices utilizing said method. The use of oxidation agents further relates to the oxidation of extracellular polymer substances (EPS). | 02-03-2011 |
20110100402 | TUNABLE POLYMERIC SURFACTANTS FOR MOBILIZING OIL INTO WATER - The present invention relates to compositions comprising tunable polymeric surfactants and methods for enhanced oil recovery. | 05-05-2011 |
20120060870 | Cleansing Apparatus for Substrate and Cleansing Method for the Same - The invention relates generally to a cleansing apparatus for a substrate and a cleansing method for cleansing byproducts generated after an etching process of the substrate. The cleansing apparatus comprises: a first cleansing device including a first supply unit for providing a first cleansing fluid to an etched substrate; a second cleansing device including a second supply unit for providing a second cleansing fluid to the substrate cleansed by the first cleansing fluid; and a third cleansing device including a third supply unit for providing a third cleansing fluid to the substrate cleansed by the second cleansing fluid. The first cleansing fluid and the third cleansing fluid are pure water (DI water), and the second cleansing fluid is an alkali solution. | 03-15-2012 |
20120152287 | METHOD AND SYSTEM TO STABILIZE AND PRESERVE ION ARTIFACTS - A method, system and device to use a dilute alkaline solution held at sub-critical temperature and pressure conditions to remove rapidly chloride ions from corroded iron artifacts. | 06-21-2012 |
20120204908 | Method for Removal of a Hydrophobic and Particulate Soil Composition - The invention relates to a hydrophobic and particulate soil removal composition and method for removal of hydrophobic and particulate soil from an article. Stubborn hydrophobic greasy or oily soils, including associated organic particulate soils, such as finely divided elemental carbon, are frequently encountered on hard surfaces including vehicle parts. The composition is selected to provide enhanced soil removal, preferably in vehicle cleaning applications. | 08-16-2012 |
20130092197 | METHOD OF REMOVING AND PREVENTING REDEPOSITION OF PROTEIN SOILS USING SUGAR ESTERS - A novel approach to the method of removing and preventing redeposition of protein soils on surfaces using sugar esters is disclosed. Protein deposition and streaking and spotting are common on machine washed dishes. Applicants have found a new method of recycling a sump water composition in an automatic dish machine from a first cleaning cycle into subsequent cleaning cycles using a protein-removing/anti-redeposition agent that can remove and prevent redeposition of protein soils on ware washed surfaces. | 04-18-2013 |
20130112228 | Particle Removal Method Using An Aqueous Polyphosphate Solution - A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution. | 05-09-2013 |
20130233354 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD - A substrate treating apparatus for treating substrates by immersing the substrates in a treating solution includes the following elements. A treating tank for storing the treating solution; a lifter capable of supporting a plurality of substrates, and vertically movable between an upper withdrawn position above the treating tank and a treating position inside the treating tank; a treating solution supply device for supplying the treating solution to the treating tank; a dripping device for dripping a surfactant to a surface of the treating solution stored in the treating tank; and a control device for causing the treating solution supply device to supply the treating solution to the treating tank, causing the lifter to place the substrates in the treating position, and causing the dripping device to drip the surfactant when raising the lifter to the upper withdrawn position after treatment of the substrates with the treating solution. | 09-12-2013 |
20140076365 | CLEANING COMPOSITION AND METHOD FOR CLEANING A SEMICONDUCTOR DEVICE SUBSTRATE AFTER CHEMICAL MECHANICAL POLISHING - An aqueous cleaning composition and method for post-CMP cleaning of a semiconductor device which contains a copper interconnect wherein the cleaning composition contains (A) N,N,N′-trimethyl-N′-(2-hydroxyethyl)ethylenediamine; and (B) at least one corrosion inhibitor selected from the group consisting essentially of uric acid, xanthine, theophyline, paraxanthine, theobromine, caffeine, guanine, hypoxanthine, adenine, and combinations thereof. | 03-20-2014 |
20140102486 | CLEANING AGENT FOR REMOVAL OF CONTAMINATES FROM MANUFACTURED PRODUCTS - A composition effective for removing contaminates from a manufactured product either as a concentrated material or when diluted with water. The composition designed for effective removal of all types of undesirable contaminates from a manufactured product, including but not limited to, solder flux, oils, greases, soil, and particulate matter. Depending on the nature of the process the cleaning composition maybe used in a multistep process. The composition contains propylene glycol phenyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present. | 04-17-2014 |
20140373878 | COMPOSITION AND METHOD FOR REMOVAL OF ORGANIC PAINT COATINGS FROM SUBSTRATES - The invention relates to a non-aqueous stripping composition for removing cured organic paint from substrates comprising
| 12-25-2014 |
20160027635 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM STORED WITH SUBSTRATE PROCESSING PROGRAM - Disclosed is a substrate processing apparatus (a substrate processing method, and a computer readable storage medium having a substrate processing program stored therein) of cleaning an etched substrate with a polymer removing liquid, in which any of isopropyl alcohol vapor, water vapor, deionized water and isopropyl alcohol, ammonia water, and ammonia water and isopropyl alcohol is supplied to the substrate before the substrate is cleaned with the polymer removing liquid. | 01-28-2016 |
20160053206 | LIQUID SOAP HAVING ENHANCED ANTIBACTERIAL ACTIVITY - Method of cleansing human skin employing an aqueous soap composition comprising of fatty acid soap, at least one silver (I) compound having a silver ion solubility (in water at 25° C.) of at least 1×10 | 02-25-2016 |
20220135907 | REDUCING AGENT AS CORROSION INHIBITOR FOR MACHINE WAREWASH - Warewash detergent compositions with reducing agents to overcome corrosion challenges in stainless steel dish machines subject to conditions from chlorine sanitizing rinse steps (or other oxidizing chlorine containing compositions) are provided. Liquid and solid detergent composition beneficially containing a reducing agent that reacts with chlorine introduced in sanitizing rinse steps that follow detergent cleaning steps are provided. Methods for ware washing using the detergent compositions with reducing agents and methods for reducing residual chlorine in a ware washing cycle are also provided. | 05-05-2022 |