| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 134027000 | One a neutralizer for another | 11 |
| 20080276970 | Apparatus and method for treating materials with compositions - An apparatus and method for treating subject materials with compositions includes a material treatment section for treating a subject material with a composition of a silane-containing material and a hydrocarbon solvent to form a treated material, and a neutralizing section for neutralizing the treated material such that the treated material has a pH in a range of approximately 7 to approximately 8. | 11-13-2008 |
| 20090056764 | Liquid processing apparatus, liquid processing method, and storage medium - A liquid processing apparatus | 03-05-2009 |
| 20110056522 | METHOD OF CLEANING MEMBRANES - Methods for cleaning polymeric microfiltration or ultrafiltration membranes. The membrane may be contacted with a first cleaning solution including at least one oxidising agent. A second cleaning solution including at least one reducing agent may then be introduced to the membrane and first cleaning solution. The oxidising and reducing agents may undergo a neutralisation reaction to form an oxidation-neutral mixed cleaning solution. The membrane may be simultaneously cleaned during the neutralisation reaction. | 03-10-2011 |
| 20110220155 | NEUTRAL OR ALKALINE MEDIUM CHAIN PEROXYCARBOXYLIC ACID COMPOSITIONS AND METHODS EMPLOYING THEM - The present invention relates to medium chain peroxycarboxylic acid compositions of neutral or alkaline pH, to methods of making these compositions, and to methods employing these compositions. The methods include methods of cleaning. The compositions include cleaning compositions. | 09-15-2011 |
| 20110259373 | METHOD AND AGENT FOR SURFACE PROCESSING OF PRINTED CIRCUIT BOARD SUBSTRATE - A surface processing method and a surface processing agent for effectively removing smear produced in a via or the like are disclosed. The smear is to be removed without etching an inner metalized layer without using expensive permanganates that might impose a greater load on an environment and operators. By removing the smear, the tightness in adhesion between an inner metalized circuit layer and plating metal as well as reliability in electrical connection may be improved. To this end, a surface processing method for a resin-containing substrate of a printed circuit board is provided in which the smear left in an opening, such as a blind via, a through-hole or a trench, formed in the substrate, may be removed without etching a metalized inner layer. The surface processing method immerses the interconnect substrate in a weakly acidic to weakly alkaline first processing solution at least containing hydrogen peroxide and subsequently in a second processing solution at least containing an alkali compound and an organic solvent. | 10-27-2011 |
| 20120192901 | APATITE SURFACE NEUTRALIZATION WITH ALKALI SOLUTIONS - The present invention discloses methods of neutralizing apatite surfaces, for example after a flow-through collection of a target and prior to cleaning the chromatography solid support. | 08-02-2012 |
| 20120312331 | METHOD OF PREPROCESSING MAGNESIUM ALLOY FOR ELECTROPLATING - This invention relates to a method of preprocessing a magnesium alloy for electroplating, including pickling the magnesium alloy with an ethyleneglycol-nitric acid solution. | 12-13-2012 |
| 20120312332 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - A liquid processing apparatus | 12-13-2012 |
| 20150007859 | PROCESS FOR PREPARING ARAMID COPOLYMER YARN USING AN ACID WASH - The present invention concerns methods for removing sulfur from yarn comprising the steps of: a) contacting never-dried polymeric yarn with an aqueous base, the polymer comprising imidazole groups and said polymer comprising sulfur atoms characterized as being in the form of sulfate anions; b) contacting the yarn with an aqueous acid solution of pH 5 or lower; and c) rinsing the yarn. | 01-08-2015 |
| 20150144160 | ETCHANT, PREPARATION THEREOF AND METHOD OF USING THE SAME IN THE CLEANING PROCESS - The present invention provides an etchant which is a reaction product of sulfuric acid and ammonium persulfate, wherein the concentration of the ammonium persulfate is 1˜25%, the concentration of the sulfuric acid is 98%. The etchant is produced by adding the ammonium persulfate into the sulfuric acid at a temperature of 100 to 200 degree Celsius. According to the present invention, the ammonium persulfate substitute the conventional oxidizing agent of hydrogen peroxide. Since the ammonium persulfate is in a powder form, the operation becomes more convenient. Furthermore, since sulfuric acid is formed as a by-product instead of water, the etchant will not be diluted after being used for many times, which reduces the production cost. | 05-28-2015 |
| 20160061773 | METHOD FOR TREATING A SEMICONDUCTOR DEVICE - A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad. | 03-03-2016 |
