Entries |
Document | Title | Date |
20080202560 | Method for Removing Haze in a Photo Mask - An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the chamber, and a discharge device to discharge impurities in the chamber to the outside. | 08-28-2008 |
20080216871 | METHOD AND SYSTEM FOR MONITORING CONTAMINATION ON A SUBSTRATE - A method and system for measuring contamination, such as metal contamination, on a substrate. A dry cleaning system is utilized for non-destructive, occasional removal of contamination, such as metal containing contamination, on a substrate, whereby a monitoring system coupled to the exhaust of the dry cleaning system is employed to determine the relative level of contamination on the substrate prior to dry cleaning. | 09-11-2008 |
20080283097 | SOLVENT FOR URETHANE ADHESIVES AND COATINGS AND METHOD OF USE - A solvent for urethane adhesives and coatings, the solvent having a carbaldehyde and a cyclic amide as constituents. In some embodiments the solvent consists only of miscible constituents. In some embodiments the carbaldehyde is benzaldehyde and in some embodiments the cyclic amide is N-methylpyrrolidone (M-pyrole). An extender may be added to the solvent. In some embodiments the extender is miscible with the other ingredients, and in some embodiments the extender is non-aqueous. For example, the extender may include isopropanol, ethanol, tetrahydro furfuryl alcohol, benzyl alcohol, Gamma-butyrolactone or a caprolactone. In some embodiments a carbaldehyde and a cyclic amide are heated and used to separate a urethane bonded to a component. | 11-20-2008 |
20080295867 | METHOD OF CLEANING TURBO PUMP AND CHAMBER/TURBO PUMP CLEAN PROCESS - A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations. | 12-04-2008 |
20090014034 | BENEFIT COMPOSITIONS AND FORMALDEHYDE SCAVENGERS FOR SAME - Cleaning and/or benefit compositions comprising a formaldehyde-generating agent, particularly a formaldehyde-containing crosslinking agent, and a formaldehyde scavenger are disclosed. Processes for making and using the aforementioned compositions are further disclosed. | 01-15-2009 |
20090014035 | WINDSHIELD DE-ICING - Apparatus for cleaning a window of a vehicle, including a vessel, having an inlet through which a washing fluid is received from a reservoir and an outlet through which the fluid is discharged for cleaning the window. There is a heating element for heating the fluid in the vessel, which element preheats the vessel before the washing fluid is received therein, whereby at least an initial quantity of the fluid is rapidly heated and discharged from the vessel. | 01-15-2009 |
20090071509 | Process for Cleaning Engraved Cylinders Used in Printing and Packaging Industry From Adhesive and/or Ink Residues - A process for the removal of dry adhesives and/or inks from the surface and from the interior of the cells of the engraved cylinders used in printing and coupling processes, using a supercritical mixture formed by one or more organic solvents and a supercritical fluid, preferably consisting of supercritical carbon dioxide. The microscopic cells of the engraved cylinders used in printing industry or of the cylinders used for film coupling in packaging industry are thoroughly and easily cleaned by a process comprising the steps of forming the said supercritical mixture, delivering it in a high pressure autoclave previously filled with the engraved cylinders to be cleaned, cleaning for a given residence time, eliminating the organic solvent residue in the autoclave by washing it with supercritical fluid and precipitating the extracted inks and/or adhesives in one or more separators located downstream the autoclave. | 03-19-2009 |
20090084408 | Method of Cleaning Cavities on Gas Turbine Components - A method of cleaning cavities on gas turbine components, in particular on gas turbine blades, wherein a caustic cleaning medium and subsequently a rinsing medium are directed for this purpose in particular repeatedly through the or each cavity, to be cleaned, of a gas turbine component is disclosed. Before the treatment of the or each cavity with cleaning medium and rinsing medium, the or each cavity of the gas turbine component is flooded with inert gas. The gas turbine component, with the inert gas atmosphere in the or each cavity being maintained, is then subjected to a preferably repetitive thermal treatment, wherein the component is heated for this purpose in a first time interval, is held at this temperature for a second time interval and is then cooled in a third time interval. The cleaning medium and the rinsing medium are then directed through the or each cavity. | 04-02-2009 |
20090120463 | AQUEOUS CLEANING OF LIQUID RESIDUE BY ETCHING - The present invention is a method of cleaning an object in an open aqueous cleaning system. The method is directed to an open cleaning vessel into which water used for cleaning a material or object can be introduced. A means is provided for introducing a reactant chemical to the vessel to form an aqueous solution. Cleaning of the surface is in the form of bubble formation on the part that vaporizes the chemical in order to react the oxidizer in the vapor state to the exposed surface at the bubble growth area. Treatment in the form of etching or any other process in which material is removed from a solid surface displaces the liquid residue from the surface. The resulting process produces no dissolution or emulsion of the contaminant and therefore can be easily separated from the chemical cleaner. The process also conserves chemistry, water, energy, and reduces pollution. | 05-14-2009 |
20090133721 | METHOD AND APPARATUS FOR TOUCHLESS CLEANING OF A CHANDELIER - A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat, imperforate bottom panel. A central aperture is formed in the top panel and a zipper extends from the central aperture to an outer periphery of the top panel so that the central opening is enlarged when the zipper is open. The chandelier passes through the central aperture when the zipper is open and is enclosed within the enclosure when the zipper is closed. A mist of hot water is sprayed onto the chandelier with a wand that extends though a small opening in the enclosure. The time required to clean a typical chandelier drops from hours to minutes, no chemicals are used, and the chandelier is touched only by the hot mist. | 05-28-2009 |
20090235955 | APPARATUS AND METHOD FOR THE RAPID THERMAL CONTROL OF A WORK PIECE IN LIQUID OR SUPERCRITICAL FLUID - A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface. | 09-24-2009 |
20090277479 | Detonative Cleaning Apparatus - An apparatus for cleaning a surface within a vessel has a combustion conduit extending from an upstream end to a downstream end. The downstream end is associated with an aperture in the wall of the vessel and is positioned to direct a shockwave toward the surface. A source of fuel and oxidizer is coupled to the conduit to deliver the fuel and oxidizer to the conduit. An initiator is coupled to the conduit in position to initiate combustion of the fuel and oxidizer to form the shockwave. A buffer chamber is between the conduit and the source. | 11-12-2009 |
20090288683 | ALKALINE PEROXYGEN FOOD SOIL CLEANER - The present invention relates to compositions and methods for removing soils, e.g., thermally degraded food soils, from surfaces. The cleaning compositions of the present invention can be activated using heat and/or an activator complex to generate oxygen gas in situ on and in the soil to be removed. Surfaces suitable for cleaning using the compositions and methods of the present invention include any surface that can be heated during use and/or cleaning, e.g., smokers, ovens, fryers. | 11-26-2009 |
20100031975 | METHOD FOR DRYING A SUBSTRATE - A method for drying workpieces includes immersing the workpieces in a liquid bath, raising the workpieces with a first holder until a central opening of the workpieces is visible above liquid surface, then using a dry second holder rod inserted through said central opening to continue raising process. Due to this, a drying portion of the workpiece is not held by a wet holding mechanism. | 02-11-2010 |
20100065086 | DRUM-TYPE WASHER AND TUB CLEANING METHOD OF THE SAME - A drum-type washer capable of easily cleaning a tub and a method of cleaning the tub of the drum-type washer are disclosed. The drum-type washer includes a tub installed in a cabinet to be supplied with washing water, a drum rotatably disposed in the tub such that laundry articles are loaded into the drum, a motor which rotates the drum, a controller which controls a rotational velocity of the motor to rotate the drum at a specified rotational velocity such that the washing water circulates along an inner peripheral surface of the tub to clean the inner peripheral surface of the tub, and a steam supply device which is controlled by the controller to supply high-temperature, high-pressure steam into the tub and the drum. | 03-18-2010 |
20100065087 | METHOD FOR REMOVING LINT FROM A HEAT EXCHANGER OF A DOMESTIC APPLIANCE AND CORRESPONDING DOMESTIC APPLIANCE - A method is provided for the removal from a heat exchange of lint that is generated during a drying process in a domestic appliance for laundry care. A rinsing fluid is run through the heat exchanger for cleaning and the rinsing fluid is deflected during a cleaning phase with the magnitude of deflection or the direction of deflection of the rinsing fluid being a function of the strength of an air flow that is applied to deflect the rinsing fluid. The rinsing fluid is thus run through various regions of the heat exchanger depending on the deflection. | 03-18-2010 |
20100078045 | SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR CLEANING SAME - An LPCVD apparatus is provided with a processing chamber and a reaction cooling apparatus. The reaction cooling apparatus is placed outside the processing chamber and is configured to generate hydrogen fluoride gas by reaction of hydrogen gas and fluorine gas and to cool the hydrogen fluoride gas. The hydrogen fluoride gas cooled by the reaction cooling apparatus is supplied into the processing chamber as a cleaning gas. | 04-01-2010 |
20100095985 | STEAM CLEANER AND METHOD FOR STEAM CLEANING - Steam cleaner, comprising a water tank, heating means for forming steam, at least one connecting socket for a steam hose, a receiving tank for waste and a suction device for sucking waste into said receiving tank, wherein the receiving tank is provided with at least one inlet for steam into said receiving tank. | 04-22-2010 |
20100101608 | SUBSTRATE CLEANING METHOD AND APPARATUS - A substrate cleaning method for cleaning and removing foreign materials adhered to a surface of a substrate includes heating the substrate to peel off the foreign materials from the surface of the substrate by a thermal stress, removing the foreign materials from the surface of the substrate by a temperature gradient created in a proximity of the surface of the substrate, and collecting the foreign materials removed from the surface of the substrate by a collecting unit facing the substrate. | 04-29-2010 |
20100116294 | PROCESS GAS FILTRATION - The present invention relates to a spray drying system provided with a gas filtering system, which system is intended for use in the pharmaceutical industry for aseptic production of sterile pharmaceutical products or in other industries e.g. production of food, where an intake of sterile air for the drying process is necessary. The spray drying system for providing a particulate material comprises a spray drying chamber ( | 05-13-2010 |
20100126527 | APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE SUBJECTED TO EXPOSURE PROCESS - A method of processing a substrate subjected to an exposure process includes the steps of: transporting a substrate subjected to the exposure process to a cleaning processing part and performing a cleaning process in said cleaning processing part on said substrate subjected to the exposure process. The method also includes the steps of transporting said substrate subjected to the cleaning process from said cleaning processing part to a heating processing part and performing a heating process in said heating processing part on said substrate subjected to the cleaning process. A first interprocess time interval between the instant at which the exposure process of a substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant, and a second interprocess time interval between the instant at which the cleaning process of the substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant. | 05-27-2010 |
20100154827 | DISHWASHER STEAM PURGE METHOD - A steam purge method for a dishwasher includes a washing cycle, a steam purge cycle and a rinse cycle. During the steam purge cycle, a dishwasher tub is filled with fluid to a level below a heating element in a wash chamber, heated and at least partially converted to steam in the wash chamber. After the steam purge cycle, the dishwasher is drained and the rinse cycle commences. Optionally, a heated drying cycle may be performed upon termination of the rinse cycle. A single heating element arranged in the wash chamber is utilized for heating washing fluid during each of washing, purging and steam generation cycles, as well as for the heated drying cycle. | 06-24-2010 |
20100163075 | METHOD FOR THERMAL DEBURRING - In the thermal deburring of work pieces, sensitive surfaces are provided with a removable surface protection. | 07-01-2010 |
20100175720 | CLEANING AGENT AND PROCESS FOR CLEANING RESIN-MOLDING MACHINE USING THE SAME - The present invention has an object to provide a cleaning agent that has excellent cleaning properties and replacement properties and can further improve the workability during the cleaning of a resin-molding machine, a process for cleaning a resin-molding machine using the same, and the like. | 07-15-2010 |
20100192978 | Cyclic Nucleation Process - The present invention discloses a surface treatment to nucleate, grow, detach, implode and collapse vapor bubbles for various cleaning and surface treatment applications. The process can be accomplished by using alternating temperature and chemical, in addition to vacuum/pressure to produce a pulsing and continuous action within a fluid. In an aspect, a thermal cycle nucleation process employs temperature cycling with controlled heating and cooling processes, and with or without vacuum cycles for cleaning delicate surfaces. In another aspect, a chemical cycle nucleation employs varying concentrations fluid mixtures of chemical vapors/fluids to either create, grow vapor bubbles to treat the surface by collapse or implode vapor bubbles. Different chemical vapors or liquids can form chemical mixtures directly on surfaces to inhibit or eliminate re-deposition of particle, and can be tailored to promote rapid chemical dissolving and breakdown of surface contaminates. | 08-05-2010 |
20100206334 | Method for cleaning a reactor - The present invention relates to a method for cleaning a reactor having a tendency of fouling by deposition of solids, wherein a hot solvent, in which the solids are soluble and which has a temperature of at least about 75° C., is applied to the reactor, the solids being substantially dissolved and the dissolved solids being discharged from the reactor, wherein the method is carried out without opening the reactor to atmosphere. | 08-19-2010 |
20100206335 | WASHING PLANT - Washing plant to perform a washing cycle of objects providing at least a pre-wash operation and a washing and heat disinfecting the objects operation. The plant includes a first battery of pre-wash units, in series one after the other along a first alignment axis and a second battery of washer and heat disinfection machines along a second alignment axis, different from the first alignment axis to operate parallel with each other and perform object washing and heat disinfecting. The second battery is able to receive, along a feed direction transverse to the second alignment axis, the objects subjected to pre-wash exiting from the first battery along the first axis alignment. The second battery feed direction is also transverse to the first alignment axis. Movement members are provided to divert the objects exiting from the first battery and direct them, aligned with the direction of feed, towards the second battery. | 08-19-2010 |
20100224219 | SUBSTRATE TREATING APPARATUS AND METHOD - A substrate treating apparatus includes a treating unit for treating substrates, a piping for supplying a treating liquid to the treating unit, a heater mounted on the piping, an electronic thermal unit mounted on the piping in series with the heater, a temperature sensor for measuring a temperature of the treating liquid, and a controller for controlling the heater and the electronic thermal unit. The controller sets a first temperature control mode for performing a room temperature control using the electronic thermal unit when the temperature measured by the temperature sensor is below a predetermined boundary temperature between room temperature and high temperature, and for performing a high temperature control with the heater when the temperature measured by the temperature sensor is above the predetermined boundary temperature between room temperature and high temperature. The controller sets a second temperature control mode for performing a heating control using the heater and the electronic thermal unit to heat the treating liquid when a difference between the temperature measured by the temperature sensor and a target temperature at least corresponds to a first specified value set beforehand. Further, the controller sets the first temperature control mode when, after the second temperature control mode is set, the difference between the temperature measured by the temperature sensor and the target temperature becomes less than a second specified value set beforehand. | 09-09-2010 |
20100242998 | COMPOSITIONS AND METHODS FOR REMOVING ORGANIC SUBSTANCES - Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices. | 09-30-2010 |
20100242999 | COMPOSITIONS AND METHODS FOR REMOVING ORGANIC SUBSTANCES - Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices. | 09-30-2010 |
20100252073 | LOOP REACTOR FOR EMULSION POLYMERISATION - A polymerisation reactor comprising one or more circulation loops with one or more inlets for raw material, one or more outlets, and a circulation pump for circulating a reactor charge within the circulation loop. A by-pass line for by-passing the circulation pump connects a point of the loop upstream of the pump with a point downstream of the pump, both points being provided with a three way valve. | 10-07-2010 |
20100252074 | ENDOSCOPE CLEANING/DISINFECTING APPARATUS AND ENDOSCOPE CLEANING/DISINFECTING METHOD - An endoscope cleaning/disinfecting apparatus for processing an endoscope in a cleaning tank using a diluted chemical obtained by diluting a chemical with hot water in a dilution tank of the present invention introduces the hot water into the cleaning tank immediately before processing, introduces the hot water into the dilution tank after the temperature of the hot water introduced into the cleaning tank falls within a specified temperature range, generates the diluted chemical, introduces the diluted chemical into the cleaning tank and processes the endoscope. | 10-07-2010 |
20100288310 | METHOD FOR THE PRETREATMENT OF POLYMER SURFACES TO BE PAINTED - The invention relates to a method for the pretreatment of polymer surfaces of components ( | 11-18-2010 |
20100294312 | REMOVAL OF AROMATIC HYDROCARBONS FROM COKE-OVEN GAS BY ABSORPTION - The invention relates to a method of removing aromatic hydrocarbons from coke-oven gas. The coke-oven gas is contacted with a wash liquid in a gas scrubber, and aromatic hydrocarbons are separated by absorption from the coke-oven gas. Subsequently the wash liquid enriched with aromatic hydrocarbons is heated, and the aromatic hydrocarbons are stripped from the wash liquid using water vapor. After cooling the wash liquid is finally returned to the gas scrubber. According to the invention biodiesel is used as the wash liquid. | 11-25-2010 |
20100307536 | Process For Removing Hydrocarbons And Noxious Gasses From Reactors And Media-Packed Equipment - A process for quickly removing hydrocarbon contaminants and noxious gases in a safe and effective manner from catalytic reactors, other media packed process vessels and associated equipment in the vapor phase without using steam. The cleaning agent contains one or more solvents, such as terpenes or other organic solvents. The cleaning agent is injected into contaminated equipment, along with a carrier gas, in the form of a cleaning vapor. | 12-09-2010 |
20100319730 | Integrated cleaner and dryer system - Methods and apparatuses for integrated cleaning of objects comprising a sequence of wet cleaning and vacuum drying in a same process chamber. The present integrated cleaning process can eliminate moving parts, improving the system reliability. Vacuum decontamination can be included for degassing and decontaminating the cleaned objects. In an embodiment, a cleaner system combines various movements into an integrated movement to be handled by a robot, for example, to improve the throughput. For example, an integrated robot movement comprising picking up a closed container from the input load port, moving both the lid and body together, and then depositing the body and lid separately into the appropriate positions in the cleaner to be cleaned. | 12-23-2010 |
20110000507 | SUPERCRITICAL PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND SUPERCRITICAL PROCESSING METHOD - Disclosed is a supercritical processing apparatus which can suppress the occurrence of pattern collapse, improve the throughput, and prolong a maintenance interval. In the disclosed supercritical processing apparatus to remove a liquid remained on a substrate by a super-critical state processing fluid, a heating unit heats the processing fluid to place the processing fluid into a processing receptacle in a supercritical state, and a cooling mechanism forcibly cools an area capable of transferring the heat to the substrate from the heating unit in order to suppress the liquid from being evaporated from the substrate until the substrate is disposed on a seating unit. | 01-06-2011 |
20110011424 | Method for Cleaning Insulating Coats from Metal Contact Surfaces - A process flow employing a liquid cleaning agent ( | 01-20-2011 |
20110030733 | POST SPUTTER WASH PROCESS MODULE - In one embodiment, a method for cleaning a substrate in a cleaning module is disclosed. The method includes an operation that receives the substrate into a first level of the cleaning module. In another operation, the substrate is spun while contemporaneously applying a cleaning fluid to top and bottom surfaces of the substrate. In yet another operation, the substrate is spun at a second level of the cleaning module. The method also includes an operation to dry the substrate in an enclosed cavity at a third level of the cleaning module. | 02-10-2011 |
20110041878 | Solvent Compositions Comprising Unsaturated Fluorinated Hydrocarbons - Disclosed is a method for removing residue from a surface comprising: contacting the surface with a composition comprising at least one unsaturated fluorinated hydrocarbon selected from the group consisting of compounds having the formula E- or Z—R | 02-24-2011 |
20110048461 | TOOL FOR A STEAM CLEANING DEVICE AND METHOD OF CLEANING - Tool for a steam cleaning device, provided with a steam element that is provided with nozzles, and a steam guide for guiding steam through said steam element to said nozzles, wherein said steam element is arranged to extend along different sides of an object for dispensing steam to said object. Method of cleaning at least a part of an object wherein steam is dispensed by a steam element that extends at least partly along at least two different sides of said object, and dispenses steam to said object. | 03-03-2011 |
20110061684 | CLEANING METHOD FOR SEMICONDUCTOR WAFER - A cleaning method for a semiconductor wafer with cleaning liquid comprising:
| 03-17-2011 |
20110067733 | METHOD FOR CLEANING WITH FLUORINE COMPOUND - To provide a cleaning method capable of favorably removing an object to be cleaned having a plasma polymer formed in a plasma etching step employing a fluorinated gas. | 03-24-2011 |
20110073135 | STEAM APPLIANCE - A steam appliance includes a steam applicator which is connectable to the steam appliance, but the steam applicator is permitted to rotate without loosening or disengaging the connection of the steam applicator to the steam appliance. Embodiments may be particularly suitable for use with a portable, handheld steam appliance that employs steam pocket technology. | 03-31-2011 |
20110073136 | REMOVAL OF GALLIUM AND GALLIUM CONTAINING MATERIALS - Methods of removing gallium and gallium-containing materials from surfaces within a substrate processing chamber using a cleaning mixture are described. The cleaning mixture contains an iodine-containing compound and is introduced into the processing chamber. Iodine reacts with gallium resident within the chamber to produce thermally volatile Gal | 03-31-2011 |
20110120497 | CORROSION PRODUCT CHEMICAL DISSOLUTION PROCESS - A method for removing corrosion products from a system, the method including: adjusting the system temperature to between 115° F. to 212° F.; injecting a cleaning dissolution solvent into the system; injecting a gas into the system after the system is filled with the cleaning dissolution solvent; the gas mixing with the solvent in the system; draining the solvent from the system after a predetermined period of time of dissolution; injecting a passivation composition into the system; injecting a gas into the system, the gas mixing the passivation composition; draining the system of the composition after a predetermined period of time of passivation; rinsing the system with a low volume solution; and rinsing the system at with a full volume solution. | 05-26-2011 |
20110126860 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - Disclosed are a substrate processing apparatus, a substrate processing method and a storage medium, capable of removing contaminant materials from a substrate by using SPM liquid (sulfuric acid and hydrogen peroxide mixture) while preventing degradation of the function of the SPM liquid for removing the contaminant materials. The SPM liquid is filled in a processing bath and the substrate is immersed in the SPM liquid. A heating unit is provided in the circulation path to heat the SPM liquid. A hydrogen peroxide supply line supplements hydrogen peroxide to the SPM liquid in the circulation path. A control unit adjusts the temperature of the SPM liquid to the predetermined temperature in the range of 135° C. to 170° C. based on a temperature detection value and outputs a control signal to supplement the sulfuric acid to compensate for the SPM liquid as the SPM liquid is evaporated by heating. | 06-02-2011 |
20110132404 | METHOD AND APPARATUS FOR CLEANING OF LAPAROSCOPIC SURGICAL INSTRUMENTS - The invention is a method and apparatus for cleaning and disinfecting laparoscopic surgical instruments. The method comprises the introduction into the interior channels of the instruments of cleaning fluid heated at a predetermined temperature, and activated of the fluid by the introduction of sonic energy into the fluid at varying frequencies. The apparatus includes a unitary cleaning station containing receptacles for holding the laparoscopic instruments in a bath, and for directing cleaning fluid from the bath through the interior of the instruments while providing a source of ultrasonic mechanical energy to the cleaning fluid both inside and outside the laparoscopic instruments. | 06-09-2011 |
20110139185 | Systems and Methods for Phasing Multiple Impulse Cleaning Devices - Embodiments provide systems and methods for removing debris from a surface. A system can include a first impulse cleaning device and a second impulse cleaning device, each impulse cleaning device generating shock waves directed to a surface to be cleaned, wherein the first impulse cleaning device and the second impulse cleaning device are oriented such that the respective shock waves intersect at or proximate the surface. The system can further include a controller in operable communication with the first impulse cleaning device and the second impulse cleaning device, wherein the controller is configured to selectively cause phased operation of the first impulse cleaning device and the second impulse cleaning device such that the phased operation selectively controls the location of the intersection of the respective shock waves. | 06-16-2011 |
20110168209 | SYSTEM AND METHOD FOR CLEANING, TESTING, AND REUSING RISER TUBES WITH ALUMINUM BUILD UP - A cleaning system and method for cleaning die cast metal waste from an interior of a die cast machine riser tube is provided whereby the cleaning system includes a riser tube stand, a heating means, a cleaning tool and leak test materials. The method includes heating the riser tube to a predetermined temperature to melt away the waste and cleaning the remaining residue with the cleaning tool. | 07-14-2011 |
20110174337 | METHOD AND APPARATUS FOR RECOVERING PATTERN ON SILICON SUBSTRATE - A method for recovering a shape of patterns, formed etching on a silicon substrate by etching, by removing foreign substances grown between the patterns is provided. The method includes heating the silicon substrate accommodated in a chamber to a temperature of about 160° C. or higher. | 07-21-2011 |
20110226284 | DEVICE TO IMPROVE EFFECTIVENESS OF PULSE DETONATION CLEANING - A system and associated method for removing accumulated debris from a surface of a vessel. The system includes an impulse cleaning device defining a combustion chamber in which combustible fuel and air are mixed and ignited to produce combustion that is directed at the surface to be cleaned within the vessel, and an eductor assembly surrounding a downstream end of the chamber for inducting surrounding atmosphere into the combustion to widen the area being cleaned. | 09-22-2011 |
20110284033 | CLEANING OF NATURAL GAS ASH DEPOSITS FROM COMBUSTION CHAMBERS - A method is provided for removing carbonaceous ash deposits from a light hydrocarbon gas combustion chamber. The method comprises contacting the gas combustion chamber containing the ash deposits with alkali metal hydroxide. The alkali metal hydroxide causes the ash to soften and in one embodiment, to flake off, often down to bare metal. The combustion chamber can be part of a spark-ignited engine run on natural gas or propane. | 11-24-2011 |
20110297186 | THERMODE CLEANING METHOD - A method for cleaning a thermode tip including applying an energy pulse to the thermode tip. The energy pulse involves raising the temperature of the thermode tip higher than the working temperature of the thermode tip. A method for cleaning a thermode tip may include periodically performing a predetermined number of soldering cycles at a working temperature; and applying an energy pulse to the thermode tip. | 12-08-2011 |
20120060867 | Method for Cleaning Oil Soaked Bonded Panels and Laminates - A method of cleaning a contaminated composite part, so as to provide a surface suitable for adhesive bonding. The method includes applying a wicking medium adjacent to a surface of the contaminated composite material. Then applying a solvent medium soaked in a cleaning solution adjacent to the wicking medium. Then vapor barrier is applied adjacent to the solvent medium. Next a breather material is applied adjacent to the vapor barrier. Then a vacuum bagging film with a vacuum port is applied and sealed against the composite part. The composite part is then heated and vented to remove contaminates from the composite material. | 03-15-2012 |
20120073607 | POLYMERIC OR MONOMERIC COMPOSITIONS COMPRISING AT LEAST ONE MONO-AMIDE AND/OR AT LEAST ONE DIAMIDE FOR REMOVING SUBSTANCES FROM SUBSTRATES AND METHODS FOR USING THE SAME - Compositions and methods useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. Methods are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. The compositions and methods may be suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices. | 03-29-2012 |
20120080055 | Pulsed Detonation Cleaning Systems and Methods - The present application provides a pulsed detonation cleaning system for cleaning an enclosed structure. The pulsed detonation cleaning system may include a pulsed detonation combustor cleaner and an external fuel-air flow. The pulsed detonation combustor cleaner delivers the external fuel-air flow into the enclosed structure and ignites the external fuel-air flow to clean the enclosed structure. | 04-05-2012 |
20120080056 | SYSTEM AND METHOD FOR REMOVING ORGANIC RESIDUE FROM A CHARGED PARTICLE BEAM SYSTEM - A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled to the column and is for increasing the temperature in the column. A pump is coupled to the column and is for removing a gas from the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen. | 04-05-2012 |
20120132230 | Substrate Processing Apparatus, Substrate Processing Method, and Storage Medium - Disclosed is a substrate processing apparatus including a processing vessel in which a target substrate W is processed by using a high-pressure fluid in a supercritical state or a subcritical state, and pipes that are divided into a first pipe member and a second pipe member in a flowing direction of the fluid and circulate the fluid are connected to processing vessel. A connecting/disconnecting mechanism moves at least one of first and second pipe members between a connection position and a separation position of first pipe member and the second pipe member, and opening/closing valves are installed in each of first and second pipe members and are closed at the time of separating pipe members. | 05-31-2012 |
20120138095 | VAPOR CLEAN FOR HAZE AND PARTICLE REMOVAL FROM LITHOGRAPHIC PHOTOMASKS - A reticle is cleaned by vapor condensing on the active surface of the reticle. An embodiment includes positioning the reticle in a cleaning chamber having a bottom surface, with the active surface of the reticle facing the bottom surface of the cleaning chamber, and directing vapor at the active surface of the reticle. Embodiments further include filling a reservoir in a bottom portion of the cleaning chamber with liquid and directing vapor by heating the liquid. Embodiments further include cooling the reticle concurrently with heating the liquid. Embodiments further include rotating the reticle concurrently with heating the liquid and cooling the reticle. Embodiments further include emptying the reservoir and dry spinning the reticle, subsequent to cleaning the reticle. | 06-07-2012 |
20120138096 | DISHWASHER WITH SHARED HEATER - An automatic dishwasher having a heater shared by the recirculation system and the air supply system to heat the liquid in the recirculation system and the air in the air supply system. | 06-07-2012 |
20120138097 | METHOD AND APPARATUS FOR SURFACE TREATMENT USING INORGANIC ACID AND OZONE - Improved removal of ion-implanted photoresist in a single wafer front-end wet processing station is achieved by dissolving gaseous ozone into relatively cool inorganic acid, dispensing the acid ozone mixture onto a wafer, and rapidly heating the surface of the wafer to a temperature at least 30° C. higher than the temperature of the acid ozone mixture. | 06-07-2012 |
20120247511 | METHOD FOR CLEANING THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND THIN FILM FORMING APPARATUS - A method for cleaning a thin film forming apparatus by removing extraneous matter attached to an interior of the thin film forming apparatus after supplying a treatment gas into a reaction chamber of the thin film forming apparatus and forming a thin film on an object to be processed, the method including: supplying a cleaning gas including fluorine gas, hydrogen fluoride gas, and chlorine gas into the reaction chamber heated to a predetermined temperature to remove the extraneous matter. | 10-04-2012 |
20120260947 | SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING SUBSTRATE CLEANING PROGRAM RECORDED THEREIN - Provided are a substrate cleaning apparatus, a substrate cleaning method, and a substrate cleaning program that preferably cleans the substrate without causing damage on the surface of the substrate. The substrate cleaning apparatus includes a liquid layer holding unit including a substrate cleaning nozzle that holds a liquid layer of the cleaning solution, a substrate heating unit that heats the surface of the substrate higher than the boiling point of the cleaning solution, and a moving up/down mechanism that approaches a substrate cleaning nozzle to the substrate. The moving up/down mechanism is controlled to boil the liquid layer held in the substrate cleaning nozzle by the heat of the surface of the substrate heated by the substrate heating unit to form a vapor layer between the surface of the substrate and the liquid layer to clean the surface of the substrate. | 10-18-2012 |
20120312326 | METHODS FOR CLEANING A SURFACE OF A SUBSTRATE USING A HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD) CHAMBER - Methods for cleaning a surface of a substrate using a hot wire chemical vapor deposition (HWCVD) chamber are provided herein. In some embodiments, a method for cleaning a surface of a substrate may include providing a substrate having a material disposed on a surface of the substrate to a hot wire chemical vapor deposition (HWCVD) chamber; providing hydrogen (H | 12-13-2012 |
20130032174 | CLEANING SYSTEM FOR PHOTOMASK UNIT AND METHOD FOR CLEANING PHOTOMASK UNIT - A cleaning system for a photomask unit is disclosed. The photomask unit defines an inner chamber and includes a photomask, a pellicle frame, a diaphragm-like pellicle film, and a ventilation port. The cleaning system includes: a housing defining an outer chamber; and a reduced-pressure generating unit disposed to intermittently generate a reduced-pressure zone in the outer chamber and in proximity to the photomask unit such that a pressure differential is generated between the inner chamber and the reduced-pressure zone to cause a central film portion of the diaphragm-like pellicle film to move toward or away from a central pattern region of the photomask so as to permit the cleaning gas to flow out of or into the ventilation port alternately. | 02-07-2013 |
20130042890 | METHOD FOR CLEANING INSIDE OF PRESSURE TIGHT CONTAINER FOR BLASTING TREATMENT - Provided is a method for cleaning the inside of a pressure tight container for a blasting treatment, wherein the inside of a pressure tight container can be cleaned for a short period of time after a blasting treatment. The method is comprised of a setting process wherein a cleaning blast ( | 02-21-2013 |
20130056033 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE - A substrate cleaning method includes removing a foreign material attached to a substrate while preventing deterioration of the substrate and any film formed on or above the substrate. A cleaning gas at a pressure between 0.3 MPa and 2.0 MPa is sprayed towards a wafer W with attached foreign material | 03-07-2013 |
20130068257 | METHOD AND DEVICE FOR CLEANING SEMICONDUCTOR SUBSTRATE - According to one embodiment, a method for cleaning a semiconductor substrate comprises supplying water vapor to a surface of a semiconductor substrate on which a concave-convex pattern is formed while heating the semiconductor substrate at a predetermined temperature, cooling the semiconductor substrate after stopping the heating and the supply of the water vapor and freezing water on the semiconductor substrate, after freezing the water, supplying pure water onto the semiconductor substrate and melting a frozen film, and after melting the frozen film, drying the semiconductor substrate. | 03-21-2013 |
20130112227 | Elimination of hydraulic fluid contamination through internal bright annealing - A method and apparatus for cleaning a tubular member is disclosed. A storage device holds the tubular member in a finished form and a translation device passes the tubular member from the first storage device. A gas is supplied through the tubular member. A heating device heats the drawn tubular member and the gas passing through the tubular member to clean debris from inside the tubular member. | 05-09-2013 |
20130174872 | PROLONGED OPERATION HEATER PROTECTION IN AN APPLIANCE - An appliance and method for non-thermal heater protection during prolonged operation of the appliance is provided. A time limit determination apparatus may prevent prolonged operation heater protection that prevents significant damage to the appliance. | 07-11-2013 |
20130174873 | SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS AND STORAGE MEDIUM FOR CLEANING SUBSTRATE - A substrate cleaning method is capable of preventing a liquid stream on a substrate from being cut and circuit patterns thereon from being damaged. The substrate cleaning method includes a liquid film forming process that forms a liquid film on an entire substrate surface by supplying a cleaning liquid L from a central portion of the substrate W toward a peripheral portion thereof while rotating the substrate; a drying region forming process that discharges a gas G on the substrate surface and removes the cleaning liquid on the substrate surface; and a residual liquid removing process that removes the cleaning liquid remaining between the circuit patterns by discharging a gas G while moving in a diametrical direction of the substrate. | 07-11-2013 |
20130199571 | NOVEL THERMAL METHOD FOR RAPID COKE MEASUREMENT IN LIQUID ROCKET ENGINES - There is disclosed a method of cleaning a liquid hydrocarbon-cooled bipropellant rocket engine. In an embodiment, method includes heating the engine to a temperature. The method includes applying ozone for a period of time. The method includes determining the temperature and the period of time are each sufficient to remove carbonaceous deposits. In another embodiment, the method may further include thermally imaging the heat transfer surfaces. There is disclosed apparatus for cleaning a liquid hydrocarbon-cooled bipropellant rocket engine. In one embodiment, the apparatus includes a heater, an ozone source, and a thermal camera. Other embodiments are also disclosed. | 08-08-2013 |
20130199572 | FILM-FORMING APPARATUS, AND METHOD FOR MAINTAINING FILM-FORMING APPARATUS - Ignition sections are provided at two locations on each of lower portions of the side surfaces on both sides of a film-forming chamber so as to be provided at four locations in total. A flowing current is applied to the ignition sections when a flammable by-product is ignited. A first detecting section for measuring a pressure in the film-forming chamber is formed on the side surface of the film-forming chamber. A second detecting section is formed at the lower portion of the side surface of the film-forming chamber. A third detecting section for measuring a spatial temperature in the film-forming chamber is formed at an upper portion of the film-forming chamber. | 08-08-2013 |
20130213439 | Holder Assembly for Cooperating with an Environmental Cell and an Electron Microscope - A holder assembly comprises a first and a separable second part, the first part detachable from the second part, the first part comprising a tube and an environmental cell interface and the second part comprising an electron microscope interface, as a result of which the first part can be cleaned at high temperatures without exposing the second part to said high temperature. | 08-22-2013 |
20130220376 | PROCESSES AND COMPOSITIONS FOR CLEANING MIXING DEVICES TO IMPROVE POLYMER PRODUCTION - Processes and compositions for cleaning mixing devices are disclosed that improve the production and quality of thermoplastic polymer resins subsequently produced in the mixing device, while reducing the time needed for cleaning and/or change over. A cleaning mixture comprising polymeric resin pellets having a Rockwell R hardness of 85 to 140 externally coated with an aqueous solution containing sulfonate salts, alkyl aryl sulfonate salts, alkyl sulfate salts, C6 to C36 carboxylic acid salts, or mixtures thereof, is used to purge the mixing device. The surfactant salt is present in the aqueous solution at 0.2 to 30 wt % of the solution, the aqueous solution having a pH of 6.0 to 9.0. | 08-29-2013 |
20130220377 | METHOD OF CLEANING A FILM-FORMING APPARATUS - A method of cleaning a film-forming apparatus to remove at least a part of a silicon-based material deposited on a constituent member of the film-forming apparatus after used to form thin films includes introducing a first-gas including fluorine gas and a second gas including nitrogen monoxide gas into the film-forming apparatus, and heating the constituent member. The constituent member includes quartz or silicon carbide, and the silicon-based material includes silicon nitride. | 08-29-2013 |
20130239993 | FILM-FORMING APPARATUS AND METHOD FOR CLEANING FILM-FORMING APPARATUS - A film-forming apparatus includes a heat generator exposed to a film-forming gas drawn into a chamber to generate film formation species. A film-forming gas supply system supplies the film-forming gas into the chamber. A control unit sets the heat generator in a non-heated state during a cleaning process that discharges a film formation residue from the chamber. A cleaning gas supplying system supplies a cleaning gas including ClF3 into the chamber. A temperature adjustment unit adjusts the chamber to a target temperature from 100° C. or higher to 200° C. or less in the cleaning process. A discharge system discharges a reaction product produced by a reaction between the film formation residue and the cleaning gas from the chamber. | 09-19-2013 |
20130276835 | Method and Apparatus to Clean Ash from Ash Ponds or a Landfill - A method of cleaning an ash material byproduct of a coal fired power plant of metal and hydrocarbon impurities. Dewatered feed material containing the ash material byproduct is preheated and crushed and then heated in a volatilizer to a temperature at which the metal and hydrocarbon impurities are volatilized. The ash is then separated from the volatilized materials. | 10-24-2013 |
20130284209 | APPARATUS AND METHOD FOR CLEANING SUBSTRATES - The substrate cleaning apparatus includes a first process chamber in which a liquid treating process is performed on a substrate by supplying a treating solution, a second process chamber in which a drying process is performed on the substrate, and a carrying unit carrying the substrate between the first process chamber and the second process chamber. The first process chamber includes a liquid treating housing providing a space in which the liquid treating process is performed on the substrate, a spin chuck supporting the substrate within the liquid treating housing, and a liquid supply member supplying the treating solution onto the substrate supported by the spin chuck. The second process chamber includes a drying housing providing a space in which the substrate is dried, a substrate support member supporting the substrate within the drying housing, and a heater heating the substrate. | 10-31-2013 |
20130291898 | Process For Removing Hydrocarbons And Noxious Gasses From Reactors And Media-Packed Equipment - A process for quickly removing hydrocarbon contaminants and noxious gases in a safe and effective manner from catalytic reactors, other media packed process vessels and associated equipment in the vapor phase without using steam. The cleaning agent contains one or more solvents, such as terpenes or other organic solvents. The cleaning agent is injected into contaminated equipment, along with a carrier gas, in the form of a cleaning vapor. | 11-07-2013 |
20130319467 | ACIDIC COMPOSITIONS INCLUDING REDUCING AGENTS FOR ELIMINATION OF HARD WATER SCALE AND DECOLORIZATION OF METAL STAINS - An acidic destaining composition for removing hard water and metal stains is disclosed. The composition comprises an acid in combination with a reducing agent and may preferably be formulated as a solid. | 12-05-2013 |
20130319468 | WASHING METHOD AND APPARATUS FOR REMOVING CONTAMINATIONS FROM ARTICLE - A method for washing an article to remove contaminations such as oils and fats, foreign substances and the like from a surface of the article is provided. The washing method comprises the steps of: cooling a washing solution to obtain a super-cooled washing solution; heating an article to increase its surface temperature to the temperature which is not lower than the boiling point of the washing solution; and washing and drying the article concurrently, while spraying the super-cooled washing solution to the heated article. The washing apparatus for carrying out this washing method is also provided. Using these washing method and apparatus, it becomes possible to downsize a scale of the washing apparatus, and to operate the washing apparatus under the energy-saving conditions as a result of reduction in an amount of the consumed energies, and the washing process at an accelerated speed. | 12-05-2013 |
20130340792 | BOWLING BALL MAINTENANCE DEVICE - A bowling ball maintenance device performs a de-oiling process on bowling balls having porous surfaces. The maintenance device may comprise a container sized to store at least one bowling ball within the container and structured to receive the bowling ball. A heating element is structured to warm an internal environment of the container at least to a level at which oil that may have accumulated in the pores of the ball begins to flow out of the pores. Embodiments also include a ball support cup within the container that is structured to contain the oil that has flowed out of the pores of the ball. Depending on the embodiment, the ball support cup may include three or more ball support extensions structured to support the ball in a stationary position over a height of the walls or edges of the ball support cup during operation of the maintenance device. | 12-26-2013 |
20140014135 | METHOD FOR DRYING A SUBSTRATE - A method for drying a workpiece using an apparatus comprising a liquid bath for immersing said workpiece, a deionized water supply for supplying deionized water to said bath, a partially enclosed volume of heated inert gas located above said liquid bath and a heated inert gas supply for supplying heated inert gas. A first holder is used for holding said workpiece in said liquid bath with a vertical orientation between the first holder and said liquid bath and a second holder, comprising a horizontal member, that is able to hold said at least one workpiece in such a way as to substantially prevent said workpiece from sliding along said horizontal member. | 01-16-2014 |
20140076362 | CONTINUOUS SUBSTRATE TREATMENT PLANT AND CLEANING METHOD - A substrate treatment plant includes a process chamber delimited by chamber walls and in the process chamber a substrate conveying unit for the horizontal conveyance of slab-shaped substrates in one conveying plane and in one conveying direction. The substrate conveying unit includes an arrangement of rotatably mounted, cylindrical conveying rollers transversely arranged to the conveying direction, the topmost generatrices of the conveying rollers defining the conveying plane, and at least one substrate treatment unit, which is located above the conveying plane, and at least one gas inlet. In the region of the substrate treatment unit at least one additional heating unit is located below the conveying plane and a condensation unit is located under the substrate conveying unit. | 03-20-2014 |
20140083461 | METHOD OF REMOVING DAMAGED EPOXY FROM ELECTROSTATIC CHUCK - A method of removing an epoxy band from an electrostatic chuck includes securing the electrostatic chuck in a servicing fixture, applying a thermal source to the epoxy band to breakdown a plurality of adhesive bonds securing the epoxy band to the electrostatic chuck, forming a hole in the epoxy band and pulling the epoxy band from the electrostatic chuck. A system for removing an epoxy band from an electrostatic chuck is also described. | 03-27-2014 |
20140083462 | Gas Expansion Displacement CNX Concept, Methods and Apparatus - A cyclic bubble generation and termination process can be used to effectively clean objects in a liquid. The bubbles can be generated from dissolved gas in the liquid during a pressurizing phase of the cyclic bubble process. Alternatively, the bubbles can be generated from as a by-product in a chemical reaction between chemicals in the liquid and material or chemicals at the surface of a part being processed. A vacuum process or a hyperbaric process can be used for cycling the pressure. | 03-27-2014 |
20140090669 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - The inventive substrate treatment apparatus includes a spin chuck which horizontally holds and rotates a wafer; a heater which is disposed in opposed relation to a lower surface of the wafer held by the spin chuck and heats the wafer from a lower side; a phosphoric acid nozzle which spouts a phosphoric acid aqueous solution to a front surface (upper surface) of the wafer held by the spin chuck; and a suspension liquid nozzle which spouts a silicon suspension liquid to the front surface of the wafer held by the spin chuck. The wafer is maintained at a higher temperature on the order of 300° C. and, in this state, a liquid mixture of the phosphoric acid aqueous solution and the silicon suspension liquid is supplied to the front surface of the wafer. | 04-03-2014 |
20140137894 | PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES - A process is described that is useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays. A process is presented for applying a minimum volume of a chemical stripping composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic substances are completely removed by rinsing. The process may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties, and especially negative dry film photoresist from electronic devices. | 05-22-2014 |
20140166049 | CLEANING METHOD OF PROCESS CHAMBER - A cleaning method of a process chamber to remove a nitride layer including aluminum and a transition metal, which is adhered to an inner surface of the process chamber, includes removing the nitride layer by supplying cleaning gases to the process chamber, wherein the cleaning gases comprises a first gas including boron and a second gas including fluorine. | 06-19-2014 |
20140190521 | SELF-CLEANING TOP BURNER FOR A STOVE - A pyrolytic cleaning top burner system for a stove having a normal cooking mode includes a top burner coupled to a stove, a cover for seating on the stove surface, means for heating a top burner, and an exhaust outlet. The cover covers at least the top burner in a cleaning mode. The heating means heats to a cleaning temperature in a cleaning mode that permits baked on food that is positioned under the cover to be disintegrated with heat. The exhaust outlet exhausts air from under the cover. A method for pyrolytically cleaning a top burner of a stove or cooktop is also disclosed. | 07-10-2014 |
20140261554 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - In a substrate processing device | 09-18-2014 |
20140326279 | CLEANING EQUIPMENT OF SAMPLE BOTTLE FOR CHRIMATOGRAPHY ANALYSIS AND CLEANING METHOD THEREOF - A cleaning equipment of sample bottle for chromatography analysis comprising: a base; a support frame vertically fixed to the base; a horizontal column having two ends, wherein one of the ends is disposed at the support frame through an adjustment knob; a rotary drive device fixed to the other end of the horizontal columns; a rotation disk which can rotate through driving of the rotary drive device, and a side edge of the rotation disk provides with multiple placing holes for receiving and fixing sample bottles; a cleaning agent recycling tank disposed below the rotation disk, wherein a side wall of it provides with an ejector pipe connected with a water pump; and a control unit for controlling on/off and rotation speed of the rotary drive device, and on/off of the water pump. The invention also provides a cleaning method of sample bottle for chromatography analysis. | 11-06-2014 |
20150047677 | SUBSTRATE PROCESSING APPARATUS AND HEATER CLEANING METHOD - A substrate processing apparatus includes a heater having an infrared lamp and a housing for heating an upper surface of a substrate held by a substrate holding mechanism with the heater in opposed relation to the upper surface. A heater cleaning method includes locating the heater at a position above a lower nozzle in opposed relation to a first spout of the lower nozzle, the lower nozzle being in opposed relation to a lower surface of the substrate held by the substrate holding mechanism, and a lower cleaning liquid spouting step of supplying a cleaning liquid to the lower nozzle to spout the cleaning liquid upward from the first spout with no substrate being held by the substrate holding mechanism to thereby supply the cleaning liquid to an outer surface of the housing of the heater located at the heater cleaning position. | 02-19-2015 |
20150068557 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - A substrate treatment method is provided, which includes a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate, and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step, wherein an output of the heater is changed from a previous output level in the heater heating step. | 03-12-2015 |
20150090296 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - A substrate processing device | 04-02-2015 |
20150090297 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - A substrate processing device | 04-02-2015 |
20150090298 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W on which a cleaning liquid and a volatile solvent coexist. The magnetic field forming unit stirs and mixes the cleaning liquid and the volatile solvent on the surface of the substrate W to promote replacement of the cleaning liquid with the volatile solvent. | 04-02-2015 |
20150101640 | DEVICE AND METHOD FOR DE-ICING RAILWAY TRUCKS AND ORE CONCENTRATE IN RAILWAY TRUCKS - The invention relates to an arrangement for de-icing railway trucks and ore concentrate in railway trucks. The arrangement comprises a tunnel ( | 04-16-2015 |
20150114432 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A substrate processing method that is a method for removing a resist, the surface layer of which has been cured, from a substrate having a pattern disposed inside the resist and includes an SPM supplying step of supplying an SPM, formed by mixing sulfuric acid and a hydrogen peroxide solution, to the substrate and a liquid temperature increasing step of changing, in parallel to the SPM supplying step, a mixing ratio of the sulfuric acid and the hydrogen peroxide solution used to form the SPM to increase the liquid temperature of the SPM supplied to the substrate in the SPM supplying step. | 04-30-2015 |
20150311061 | METHODS AND APPARATUS FOR CLEANING SUBSTRATE SURFACES WITH ATOMIC HYDROGEN - Methods and apparatus for cleaning substrate surfaces are provided herein. In some embodiments, a method of cleaning a surface of a substrate may include providing a hydrogen containing gas to a first chamber having a plurality of filaments disposed therein; flowing a current through the plurality of filaments to raise a temperature of the plurality of filaments to a process temperature sufficient to decompose at least some of the hydrogen containing gas; and cleaning the surface of the substrate by exposing the substrate to hydrogen atoms formed from the decomposed hydrogen containing gas for a period of time. | 10-29-2015 |
20150320288 | WAREWASHER WITH DRAIN WATER TEMPERING SYSTEM WITH ENERGY RECOVERY - A warewash machine includes a sump for collecting hot cleaning water that is recirculated in the chamber during cleaning, a drain path for draining cleaning water from the sump and a fresh water input line including at least a fresh water input that receives fresh water. A waste water heat recovery arrangement includes a plurality of heat exchange compartments arranged in series flow communication and forming part of the drain path. A waste water input is associated with a first of the heat exchange compartments and a waste water output associated with a last of the heat exchange compartments. Waste water at least partially fills each of the heat exchange compartments. At least part of the fresh water input line passes through each of the heat exchange compartments. Heat from waste water is transferred to fresh water in the drain line within each heat exchange compartment. | 11-12-2015 |
20150375274 | METHOD AND DEVICE FOR CLEANING INTERIORS OF TANKS AND SYSTEMS - A method and a cleaning device for removing deposits in interiors of tanks and systems by explosion technology. The cleaning device, an explosive, gaseous mixture is provided and caused to explode in order to clean the interior. The explosion pressure wave is conducted into the interior via an outlet opening in the cleaning device. The explosive mixture or gaseous components thereof are introduced into an accommodating chamber of the cleaning device from pressure vessels at high velocity. | 12-31-2015 |
20150377294 | Bearing Grease - A method is disclosed for replacing grease in a main bearing of a wind turbine, the main bearing located in a housing and the housing having least one cover plate. the bearing cover plate is removed from the housing, grease is manually removed from the main bearing, and a flushing cover is installed on the housing in place of the bearing cover plate. The flushing cover has at least two parts, the parts fitting around the main shaft, and each part having a seal so that when its attached to the bearing housing, the flushing cover forms a seal with the main shaft. The flushing cover has holes allowing access to the main bearing, and a solvent or oil is sprayed via one of the holes onto the main bearing to remove grease, the remaining holes being sealed by a removable plug. Solvent or oil is pumped out of the housing via a port at the bottom of the housing or flushing cover. The process is repeated for each hole, and the flushing cover removed, the main bearing packed with grease, and the bearing cover plate re-affixed. The spraying step involves pumping solvent or oil from a reservoir to the spray nozzle, and the step of pumping solvent or oil out of the bearing housing involves pumping solvent or oil to the reservoir via a return hose. This means that the solvent or oil is recycled during the replacing of the grease. An apparatus for flushing grease from a main bearing of a wind turbine is also described. | 12-31-2015 |
20160002574 | Cleaning Gas and Cleaning Method - A cleaning gas according to the present invention is intended for removing a silicon carbide-containing deposit on a base of at least partially graphitized carbon and is characterized by containing iodine heptafluoride. It is possible by the use of such a cleaning gas to remove silicon carbide without etching of graphite. | 01-07-2016 |
20160047013 | PROCESS AND SYSTEM FOR DE-COATING OF ALUMINUM SCRAP CONTAMINATED WITH ORGANIC COATINGS - A method for removal of organic coatings from loose aluminum scrap includes passing the scrap through a Multiple Hearth Furnace operatively maintained in the range of 500° F.-1600° F. Each hearth in the furnace is independently temperature controlled and held under a slightly negative pressure environment. The hearths heat the scrap such that pyrolysis of the coatings occurs within the hearth. Organic compounds liberated during this process are partially or entirely consumed within the furnace combustion products are exhausted through the top. Hydrogen fluoride contained in the products of combustion is incinerated prior to final discharge from the system and routing to additional environmental equipment for particle removal. Scrap is continuously fed into the top of the furnace, and agitated and mechanically moved within each hearth toward an output of another hearth therebelow. The agitation and movement of the scrap exposes the scrap to the hearth atmosphere to assist in processing of the scrap. The discharge of the scrap in the final hearth supplies hot (250° F.-900° F.), clean material for the next step in the process for secondary aluminum recycling. | 02-18-2016 |
20160053201 | Caustic Aqueous Alkylglycoside Stripping Composition - Compositions, process mixtures, methods, and kits are provided for removing one or more coatings from a polymeric substrate using single-phase aqueous solution. The single-phase aqueous solution may include an inorganic base composition, a surfactant composition including one or more alkylglycosides, and water. | 02-25-2016 |
20160053205 | Diester Stripping Composition - Compositions, process mixtures, kits, and methods are provided for removing one or more coatings from a polymeric substrate using a single-phase aqueous solution. The single-phase aqueous solution may include water and an organic ester fraction. The organic ester fraction may include one or more alkyldioic acid dialkylesters. | 02-25-2016 |
20160081528 | WAREWASHER WITH DRAIN WATER TEMPERING SYSTEM WITH ENERGY RECOVERY USING PLATE HEAT EXCHANGERS - A warewash machine includes a housing at least in part defining a chamber for cleaning wares and a sump for collecting hot cleaning water that is recirculated through the chamber during cleaning A drain path is provided for draining cleaning water from the sump and a fresh water input line includes at least a fresh water input that receives fresh water. A waste water heat recovery arrangement includes one or more plate heat exchanger units that transfer heat from the draining cleaning water to the incoming fresh water. | 03-24-2016 |
20160088996 | METHOD FOR OPERATING A DISHWASHER, AND DISHWASHER - A method is provided for operating a dishwasher ( | 03-31-2016 |
20160113478 | BATCH DISHWASHER AND METHOD FOR OPERATING A BATCH DISHWASHER - The invention relates to a commercial dishwasher ( | 04-28-2016 |
20160146557 | METHOD OF CLEANING A HEAT EXCHANGER - The present invention relates to heat exchangers, and in particular to a method for treatment of a heat exchanger which in operation is used to cool process water which has been in contact with polymer particles, which method comprises passing to the process side of the heat exchanger a treatment stream whilst the heat exchanger is at an elevated temperature compared to the temperature when the heat exchanger is in operation. | 05-26-2016 |
20170233656 | METAL CAVITY INWALL DECOKING METHOD | 08-17-2017 |
20190148212 | SEMICONDUCTOR WAFER CLEANING APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR WAFER | 05-16-2019 |