Class / Patent application number | Description | Number of patent applications / Date published |
134004000 | Including forming a solidified or hardened coating for cleaning | 42 |
20080196744 | In-chamber member, a cleaning method therefor and a plasma processing apparatus - An in-chamber member to use in the chamber of a plasma processing vessel has a coating film formed by a coating agent. The in-chamber member having deposits formed on the coating film is separated from the chamber and is immersed into a peeling solvent, e.g., acetone. Since the coating agent is made of a resist formed of a main component of, e.g., cyclized rubber-bisazide and a photosensitive component, the deposits can be separated from the in-chamber member together with the coating film being separated. | 08-21-2008 |
20080216866 | Surface Treatment Process and Applicator - A packaged cleaning composition and process for cleaning a surface involves the simultaneous application of two liquids to the surface, such that a self-supporting gel is formed, acting on soil while delaying it from drying out. The gel and entrained soil are subsequently removed. | 09-11-2008 |
20080251101 | Substrate Cleaning Method, Substrate Cleaning Equipment, Computer Program, and Program Recording Medium - In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W. | 10-16-2008 |
20080257381 | Use of Polyvinyl Acetate Dispersions for Cleaning Purposes - The invention relates to the use of dispersions containing polyvinyl acetate for cleaning purposes, for example for cleaning plaster floors, ceramic wall and floor linings, steps, window sills, gravestones, sculptures, and jointing materials. According to the invention, the dispersion containing polyvinyl acetate is applied to part or all of the surface to be cleaned. Once said layer has dried through, it can be removed from the surface to be cleaned in the form of a film. The dispersion forms a solid composite with the impurities, such that the impurities can also be removed with the film. | 10-23-2008 |
20080271753 | METHOD OF CLEANINIG STANNANE DISTRIBUTION SYSTEM - Methods for cleaning a stannane distributions system. A stannane distribution system connecting a stannane supply source and a semiconductor manufacturing tool is provided. Stannane is flown through the system, and a tin layer is formed on the components of the distribution system. This tin layer is then cleaned from the distribution system without the use of liquid cleaning chemicals. | 11-06-2008 |
20090032058 | Biodegradable detergent concentrate for medical instruments and equipment - An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface. | 02-05-2009 |
20090107523 | METHOD AND TOOL FOR CLEANING CAVITIES - A method for cleaning cavities in workpieces, a cleaning device for this purpose and a device for the supply of media to a cleaning device of this type. Supercritical carbon dioxide is introduced into the cavity and the cavity is rinsed. The supercritical carbon dioxide located in the cavity is relieved of pressure after rinsing of the cavity, so that carbon dioxide gas and carbon dioxide snow are formed in the cavity and subsequently driven out of the cavity. | 04-30-2009 |
20090145457 | Method For The Wet-Chemical Treatment Of A Semiconductor Wafer - A method for the wet-chemical treatment of a semiconductor wafer involves: a) rotating a semiconductor wafer; b) applying a cleaning liquid comprising gas bubbles having a diameter of 100 μm or less to the rotating wafer such that a liquid film forms on the wafer; c) exposing the rotating semiconductor wafer to a gas atmosphere containing a reactive gas; and d) removing the liquid film from the wafer. | 06-11-2009 |
20090165816 | HIGHLY DOPED III-NITRIDE SEMICONDUCTORS - A method of forming a highly doped layer of AlGaN, is practiced by first removing contaminants from a MBE machine. Wafers are then outgassed in the machine at very low pressures. A nitride is then formed on the wafer and an AlN layer is grown. The highly doped GaAlN layer is then formed having electron densities beyond 1×10 | 07-02-2009 |
20090250078 | METHODS FOR REMOVING RESIDUAL PARTICLES FROM A SUBSTRATE - Methods for removing residual particles from a substrate are presented including: receiving the substrate including the residual particles; and functionalizing the residual particles with functionalizing molecules, wherein the functionalizing molecules selectively attach with a surface the residual particles, where the functionalizing molecules impart a changed chemical characteristic to the residual particles, and where the changed chemical characteristic facilitates removal of the residual particles from the substrate. In some embodiments, methods further include: before functionalizing, cleaning the substrate, where the cleaning leaves residual particles adhered with a surface of the substrate, and where the residual particles are hydrophilic; and if the surface of the substrate is hydrophobic, performing the functionalizing. In some embodiments, methods further include removing the residual particles from the surface of the substrate where removing the residual particles includes removing the functionalizing molecules. | 10-08-2009 |
20090250079 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS - The present invention relates to a substrate cleaning method for cleaning a substrate whose static contact angle with respect to water is 85 degrees or more. The substrate cleaning method includes a step in which the substrate is held horizontally by a substrate holder in such a manner that a central part of the substrate and a central part in rotation correspond to each other; a step in which, while the substrate holder is being rotated about a vertical axis, a cleaning liquid is discharged from a cleaning-liquid nozzle to the central part of the substrate and is spread over all the surface of the substrate by a centrifugal force; a step in which, while the substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a distance between an interface on a side of a to-be-discharged position of the gas in the to-be-discharged position of the cleaning liquid and an interface on a side of the to-be-discharged position of the cleaning liquid in the to-be-discharged position of the gas is set between 9 mm and 15 mm; and a step in which, while the substrate holder is being continuously rotated, the to-be-discharged position of the cleaning liquid is moved toward a periphery of the substrate at a speed lower than a speed at which the dried area is spread outward. | 10-08-2009 |
20090288680 | METHOD FOR PRODUCING ORGANIC LIGHT-EMITTING DEVICE - A method for producing an organic light-emitting device is provided for an organic light-emitting device having a substrate provided with external connection terminals, organic light-emitting elements provided on the substrate, and a protective film that covers the organic light-emitting elements. The method includes, sequentially, providing a protective film removal layer on the external connection terminals, forming the protective film on the substrate, dividing the substrate on which the protective film has been formed, and cleaning the substrate with water, an aqueous solution, or a solvent. The protective film removal layer and the protective film are removed from the external connection terminals as a result of cleaning the substrate. | 11-26-2009 |
20090293909 | ARRANGEMENT AND METHOD FOR REMOVING ALKALI- OR ALKALINE EARTH-METALS FROM A VACUUM COATING CHAMBER - The invention relates to a cleaning method in which from a vacuum coating chamber ( | 12-03-2009 |
20100037913 | CLEANING APPARATUS AND METHOD FOR CLEANING GLUE - A cleaning apparatus includes a heating device, a freezing device, and a conveying belt. The heating device includes a hot water source and a hot water container. The hot water container includes an exit shutter and defines a water inlet and a water outlet. The hot water source being communicated to the hot water container via the water inlet. The freezing device includes an aerosol spray system and a freezing container. The spray system includes a spray head. The freezing container includes an entrance shutter. The spray head is received in the freezing container. The conveying belt extends into the hot water container via the exit shutter and into the freezing container via the entrance shutter and thereby bridges the hot water container and the freezing container. | 02-18-2010 |
20100229890 | Method of Particle Contaminant Removal - Apparatus and methods for removing particle contaminants from a surface of a substrate includes coating a layer of a viscoelastic material on the surface. The viscoelastic material is coated as a thin film and exhibits substantial liquid-like characteristic. An external force is applied to a first area of the surface coated with the viscoelastic material such that a second area of the surface coated with the viscoelastic material is not substantially subjected to the applied force. The force is applied for a time duration that is shorter than a intrinsic time of the viscoelastic material so as to access solid-like characteristic of the viscoelastic material. The viscoelastic material exhibiting solid-like characteristic interacts at least partially with at least some of the particle contaminants present on the surface. The viscoelastic material along with at least some of the particle contaminants is removed from the first area of the surface while the viscoelastic material is exhibiting solid-like characteristics. | 09-16-2010 |
20120073599 | APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE - A rinsing liquid adheres to a substrate subjected to a cleaning process. The rinsing liquid on the substrate is first replaced with IPA liquid. While the substrate covered with the IPA liquid is held in a dryer chamber, liquid carbon dioxide is supplied to the surface of the substrate. Liquid nitrogen is supplied to cool down the interior of the dryer chamber. This solidifies the liquid carbon dioxide on the substrate into solid carbon dioxide. Thereafter, the pressure in the dryer chamber is returned to atmospheric pressure, and gaseous nitrogen is supplied into the dryer chamber. Thus, the temperature in the dryer chamber increases. The solid carbon dioxide on the surface of the substrate is sublimated, and is hence removed from the substrate. All of the steps are performed while carbon dioxide is not in a supercritical state but in a non-supercritical state. | 03-29-2012 |
20120145188 | SOIL RESISTANT FLOOR TREATMENT - A soil resistant floor surface treatment composition is provided. In particular, a composition comprises a maleic/olefin copolymer and an optional cleaning agent. Methods for treating a porous floor surface with a soil resistant agent and kits comprising a floor treatment composition, an applicator, a removal agent for removing a plurality of soils from a treated surface, and instructions for use are further provided by the present invention. | 06-14-2012 |
20120174945 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 07-12-2012 |
20120247506 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a liquid droplet nozzle which generates droplets of a treatment liquid which are sprayed on a spouting region on an upper surface of the substrate held by the substrate holding unit; and a protective liquid nozzle which spouts a protective liquid obliquely onto the upper surface of the substrate held by the substrate holding unit for protection of the substrate to cause the protective liquid to flow toward the spouting region on the upper surface of the substrate, whereby the spouting region is covered with a film of the protective liquid and, in this state, the treatment liquid droplets are caused to impinge on the spouting region. | 10-04-2012 |
20120272999 | Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same - A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %. | 11-01-2012 |
20120273000 | SULFONATE-FUNCTIONAL COATINGS AND METHODS - A coated article having a substrate coated with a layer of a sulfonate-functional coating, and methods of making and using. | 11-01-2012 |
20130037048 | POLYMER COMPOSITION - This invention relates to a polymer composition, comprising: water; a water-soluble polymer; and solid particulates of a sequestering agent. The composition may be used for decontaminating, cleaning and/or washing substrates contaminated with contaminants and/or contaminated materials. | 02-14-2013 |
20130104931 | Liquid Chemical for Forming Protective Film, and Cleaning Method for Wafer Surface | 05-02-2013 |
20130180543 | DEPOSITION CHAMBER CLEANING METHOD INCLUDING STRESSED CLEANING LAYER - A method for cleaning a deposition chamber includes forming a deposited layer over an interior surface of the deposition chamber, wherein the deposited layer has a deposited layer stress and a deposited layer modulus; forming a cleaning layer over the deposited layer, wherein a material comprising the cleaning layer is selected such that the cleaning layer adheres to the deposited layer, and has a cleaning layer stress and a cleaning layer modulus, wherein the cleaning layer stress is higher than the deposited layer stress, and wherein the cleaning layer modulus is higher than the deposited layer modulus; and removing the deposited layer and the cleaning layer from the interior of the deposition chamber. | 07-18-2013 |
20140041685 | SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND MEMORY MEDIUM - An apparatus for cleaning a substrate includes a cleaning chamber which accommodates a substrate inside the cleaning chamber, a treatment solution supply device which supplies a treatment solution having a volatile component and capable of solidifying or being cured to form a treatment film through vaporization of the volatile component, and a removal solution supply device which supplies a removal solution capable of removing the treatment film formed on a surface of the substrate. The treatment solution supply device supplies the treatment solution on the surface of the substrate set inside the cleaning chamber, and the removal solution supply device supplies the removal solution onto the treatment film formed on the surface of the substrate. | 02-13-2014 |
20140060575 | SUBSTRATE TREATING METHOD - Provided is a substrate treating method. The substrate treating method may include treating a substrate by using a chemical solution; rinsing the substrate by using pure water after treating the substrate by using the chemical solution; and treating the substrate by using an organic solvent, wherein the substrate treating method further includes coating the substrate with a hydrophobic membrane between the treating of the chemical solution and the treating of the organic solvent. | 03-06-2014 |
20140083454 | METHOD FOR REMOVING FOREIGN PARTICLES ADHERED TO MOLDS - Positions on a mold at which foreign matter is present are detected, and adhered position information related to the positions is obtained. Corresponding position information related to positions on a substrate, which are positions that correspond to the positions of the foreign matter when a pattern of protrusions and recesses and a surface of the substrate on which a curable composition is coated face each other and undergo a predetermined positioning operation, is generated based on the adhered position information. At least one droplet of the curable composition is arranged at the positions of the substrate. The pattern of protrusions and recesses is pressed against the surface of the substrate on which the composition is coated while administering the predetermined positioning operation. The curable composition is cured, and the mold is separated from the cured composition. Thereby, foreign matter adhered to molds can be removed efficiently and at low cost. | 03-27-2014 |
20140144464 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING SYSTEM - A method for cleaning a substrate includes supplying a treatment solution which includes a volatile component onto the front surface of a substrate, solidifying or curing the treatment solution through vaporization of the volatile component of the treatment solution such that a treatment film is formed on the entire portion of the front surface of the substrate, treating a different surface of the substrate while the entire portion of the front surface of the substrate is covered with the treatment film, and supplying to the substrate a removal solution which removes the treatment film in the amount sufficient such that the treatment film covering the entire portion of the front surface of the substrate is removed substantially in entirety after the treating of the different surface of the substrate is finished. | 05-29-2014 |
20140144465 | SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND MEMORY MEDIUM - A substrate cleaning system has a first processing apparatus including a first holding device for holding a substrate, and a treatment solution supply device for supplying onto the entire portion of the front surface of the substrate a treatment solution which includes a volatile component and solidifies or is cured to form a treatment film, and a second processing apparatus including a second holding device for holding the substrate, and a removal-solution supply device for supplying onto the substrate a removal solution which removes the treatment film formed on the front surface of the substrate after the treatment solution supplied by the treatment solution supply device solidifies or is cured. | 05-29-2014 |
20140230846 | METHOD OF PRODUCING A COMPONENT OF A DEVICE, AND THE RESULTING COMPONENTS AND DEVICES - The present method comprises providing a flexible web substrate (e.g., polymeric flexible web substrates) that forms at least part of a component of a device, coating so as to wet-out on and cover all or a substantial portion of a major surface on one side or both sides of the flexible web substrate with flowable polymeric material, while the flexible web substrate is moving in a down-web direction, and solidifying the polymeric material so as to form one cleaning layer on the major surface of one side or both sides of the flexible web substrate. The present invention can be utilized in a continuous in-line manufacturing process. In applications of the present invention where the flexible web substrate will not form a component of a device, the present invention broadly provides a method for cleaning particles from a flexible web of indefinite length. Each cleaning layer forms a substantially adhesive bond to the major surface that is readily removable without damaging or leaving a substantial residue of cleaning layer material on the major surface. A substantial number of the particles that were on this major surface are captured by and removable with the cleaning layer. | 08-21-2014 |
20140290692 | Methods of Mitigating Bituminous Material Adhesion Using Nano-Particles - Embodiments relate to solid nano-particles applied to the surface of well equipment to treat bituminous material adhesion. An embodiment provides a method of treating the surface of well equipment. The method may comprise applying a solid nanoparticle film to the surface of the well equipment with a treatment fluid comprising solid nanoparticles. The method may further comprise allowing the solid nanoparticles to interact with the surface of the well equipment and/or bituminous materials adhered to the surface of the well equipment to remove at least a portion of the bituminous materials from the surface of the well equipment. | 10-02-2014 |
20140373870 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 12-25-2014 |
20150020849 | Regenerative Compositions for the Entrapment of Particles and Methods for its Use - Compositions and methods of removing particulate matter from a surface. An example comprises contacting a kneadable dust removal composition with the surface so that the particulate matter adheres or becomes embedded within the composition, and is removed from the surface with the dust removal composition. Preferably the dust removal composition comprises a polymerized siloxane, more preferably a substituted polymerized siloxane, even more preferably, a non-cross-linked, linear polymerized siloxane. In other embodiments the invention comprises a kneadable dust removal composition, preferably comprising a polymerized siloxane. The dust removal composition may be packaged to be attachable to a broom, sweeper, or mop so that it make used to pick up residue from sweeping, brushing or mopping. In other embodiments the dust removal composition may be packaged in a “twist-up” or other similar package permitting the composition to be extruded or advanced to expose a fresh surface. | 01-22-2015 |
20150020850 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus comprises: a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate W held horizontally; a cooling gas discharge nozzle which discharges cooling gas of a temperature lower than a freezing point of the liquid forming the liquid film to the liquid film; a thawing liquid discharge nozzle which discharges a thawing liquid to a frozen film formed by freezing the liquid film; a thawing liquid supplier which supplies the heated thawing liquid to the thawing liquid discharge nozzle via a pipe; and a receiver which receives the cooling gas and the thawing liquid respectively discharged from the cooling gas discharge nozzle and the thawing liquid discharge nozzle at the respective retracted position and guides the cooling gas and the thawing liquid to a common flow passage. | 01-22-2015 |
20150128994 | SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY MEDIUM - A method for cleaning a substrate includes supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the substrate, supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate, and supplying to the processing film formed on the substrate a dissolving-processing liquid which dissolves the processing film after the supplying of the strip-processing liquid. | 05-14-2015 |
20150128995 | SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY MEDIUM - A method for cleaning a substrate, includes supplying to a substrate having a hydrophilic surface a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the hydrophilic surface of the substrate, and supplying to the substrate having the processing film a strip-processing liquid for stripping the processing film from the substrate. | 05-14-2015 |
20150307817 | METHOD OF MINIMIZING ENZYME BASED AEROSOL MIST USING A PRESSURE SPRAY SYSTEM - Disclosed herein are methods for improving safety and delivery of commercial application of cleaning compositions that include enzymes and other protein irritants. The methods reduce the mist and aerosolization of proteins so that inhalation and exposure to the same are reduced. According to the invention, when commercial pressurized sprayers are used to apply protein containing use cleaning compositions of up to 5 ppm protein, aerosolization is decreased to below 60 ng active protein per meter cubed. Applicants have also identified a specific metering tip/nozzle, dispense rate, and low pressure application of not more than 100 psi are critical to achieving the benefits of the invention. | 10-29-2015 |
20160035561 | SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDING MEDIUM - An object of the present invention is to obtain a high removing performance of particles. The substrate processing system according to the exemplary embodiment comprises a holding unit and a removing solution supply unit. The holding unit holds a substrate that has a treatment film formed thereon, wherein the treatment film comprises an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent. The removing solution supply unit supplies to the treatment film formed on the substrate, a removing solution capable of removing the treatment film. | 02-04-2016 |
20160035564 | SUBSTRATE CLEANING METHOD AND RECORDING MEDIUM - An object of the present invention is to be able to obtain a high removing performance of particles. The substrate processing method according to the exemplary embodiment comprises a film-forming treatment solution supply step and a removing solution supply step. The film-forming treatment solution supply step comprising supplying to a substrate, a film-forming treatment solution containing an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent is supplied. The removing solution supply step comprises supplying to a treatment film formed by solidification or curing of the film-forming treatment solution on the substrate, a removing solution capable of removing the treatment film. | 02-04-2016 |
20160035595 | PROCESSING APPARATUS, PROCESSING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE - According to one embodiment, a processing apparatus includes a first supply section, a second supply section, a gas supply section, and a sublimation section. The first supply section supplies a first fluid on surfaces of a plurality of workpieces. The second supply section supplies a fluid containing a sublimable material on the surfaces of the plurality of workpieces to which the first fluid is supplied. The gas supply section supplies gas on the surfaces of the plurality of workpieces to which a fluid containing the sublimable material is supplied. The sublimation section sublimates a layer containing the sublimable material formed on each surface of the plurality of workpieces. The gas supply section controls a thickness of the layer containing the sublimable material formed each surface of the plurality of workpieces by controlling a flow velocity of the gas in each surface of the plurality of workpieces. | 02-04-2016 |
20160059272 | Cleaning Method And Composition In Photolithography - The present disclosure provides one embodiment of a method. The method includes applying a first cleaning fluid to a substrate, thereby cleaning the substrate and forming a protection layer on the substrate; and applying a removing process to the substrate, thereby removing the protection layer from the substrate. The first cleaning fluid includes a cleaning chemical, a protection additive and a solvent. | 03-03-2016 |
20160163534 | SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND MEMORY MEDIUM - A method for cleaning a substrate includes setting a substrate inside a cleaning chamber, supplying on a surface of the substrate a treatment solution which includes a volatile component and forms a treatment film, vaporizing the volatile component of the treatment solution supplied on the surface of the substrate such that the treatment solution solidifies or is cured on the surface of the substrate and the treatment film is formed on the surface of the substrate, and supplying onto the treatment film formed on the surface of the substrate a removal solution which removes the treatment film. | 06-09-2016 |