| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 118052000 | WITH MEANS TO CENTRIFUGE WORK | 22 |
| 20090031948 | Substrate processing apparatus - A substrate processing apparatus includes a rotary cup disposed outside a substrate holding member to surround a substrate held on the substrate holding member and to rotate along with the substrate holding member, and having a wall portion that receives a process liquid thrown off from the substrate being rotated. Further, this apparatus includes an exhaust and drain cup disposed outside the rotary cup to surround the rotary cup and the substrate holding member, and including an annular liquid receptacle that receives the process liquid thrown off from the substrate being rotated and an inner annular space formed on an inward side from the annular liquid receptacle. An exhaust mechanism is connected to the inner annular space of the exhaust and drain cup. | 02-05-2009 |
| 20100101487 | Use of Blended Solvents in Defectivity Prevention - The present invention provides a blended solvent for solubilizing an ultraviolet photoresist. The blended solvent comprises a mixture of from about 5 vol % to about 95 vol % of a first solvent, wherein the first solvent comprises a cyclic ester. A balance of the mixture comprises a second solvent, wherein the second solvent comprises a volatile organic liquid. | 04-29-2010 |
| 20100192843 | Device for coating a substrate - By means of the device for coating a substrate ( | 08-05-2010 |
| 20110023774 | METHOD OF PROVIDING A MOISTURE VAPOR BARRIER LAYER TO A CORE OF A GOLF BALL - A method of forming a water vapor barrier layer to a core of a golf ball is provided. The method includes placing the core of the golf ball into a vapor barrier composition, withdrawing the lifting device, and spinning and optionally oscillating the core within the composition for a time sufficient for the composition to form a layer on the core. The present invention also provides an apparatus that can be used to form a water vapor barrier layer. | 02-03-2011 |
| 20110061588 | Device for Colouring Microscope Slides - The subject of the invention is a device for coloring microscope slides | 03-17-2011 |
| 20110179994 | COATING APPARATUS - A coating apparatus includes a first vessel, a revolving unit, and a motor having a drive shaft. The first vessel has a receiving space defined therein for receiving substrates and a first solution. The revolving unit is received in the receiving space and rotatable relative to the first vessel to impart a centrifugal force to the first solution. The drive shaft is coupled to the revolving unit. The motor is configured for rotating the revolving unit. | 07-28-2011 |
| 20110253038 | SPIN COATING DEVICE - A spin coating device includes a container and a rotating member. The container is used for holding a first solution and includes a sidewall which a plurality of substrates are arranged on. The rotating member is rotatable within the container and includes an inlet and at least one outlet. A second solution flows into the rotating member through the inlet, and flows into the container through the at lease one outlet. A mixture of the first solution and the second solution is spread onto the substrate by centrifugal force of the rotating member. | 10-20-2011 |
| 20120060752 | APPARATUS FOR FORMING SILICON OXIDE FILM - An apparatus for forming silicon oxide film is disclosed. The apparatus includes a spin coating unit, a carrying unit, and an oxidation unit. The spin coating unit forms a polymer film above a substrate by spin coating a solution including a polymer containing a silazane bond dissolved in an organic solvent. The carrying unit carries the substrate to the oxidation unit without contacting the polymer film. The oxidation unit, when receiving the substrate from the carrying unit, converts the polymer film into the silicon oxide film by either immersing the polymer film with a heated aqueous solution containing hydrogen peroxide, spraying the heated aqueous solution containing hydrogen peroxide over the polymer film, or exposing the polymer film to a reaction gas containing a hydrogen peroxide vapor. The apparatus, by itself, completes the polymer film formation and the polymer-to-silicon oxide film conversion within the apparatus itself. | 03-15-2012 |
| 20120186514 | DEPOSITION OF VISCOUS MATERIAL - Embodiments of the invention provide methods and systems for depositing a viscous material on a substrate surface. In one embodiment, the invention provides a method of depositing a viscous material on a substrate surface, the method comprising: applying a pre-wet material to a surface of a substrate; depositing a viscous material atop the pre-wet material; rotating the substrate about an axis to spread the viscous material along the surface of the substrate toward a substrate edge; and depositing additional pre-wet material in a path along the surface and adjacent the spreading viscous material. | 07-26-2012 |
| 20130239883 | ARRANGEMENT FOR THE PRODUCTION OF STRUCTURED SUBSTRATES - An arrangement for producing structured substrates is provided, which includes a device for applying layer systems including a device for applying liquid materials to rotating substrates, a housing, a rotating holder for the substrate to be coated, a feeder for liquid materials to be applied, and a collection device having multiple removal contraptions for liquid materials that do not remain on the substrate. The housing of the device is filled with an inert gas, in particular dried, molecular nitrogen, noble gas, or a mixture thereof. The additional receptacles and conduits of the arrangement for producing structured substrates are gas-tight and are designed such that an inert molecular nitrogen or noble gas atmosphere is created above the liquid contents thereof. The collection device has various collection zones in which different liquid materials can be selectively collected and selectively removed via the associated removal contraption. | 09-19-2013 |
| 20140060424 | PROCESSING CUP AND SUBSTRATE PROCESSING APPARATUS - A substrate is surrounded by an inner cup and an outer cup. A distance between an upper surface of an inner cup lower portion and a lower surface of an inner cup upper portion of the inner cup is gradually reduced outward from an outer periphery of the substrate. A clearance is formed between the upper surface of the inner cup lower portion and the lower surface of the inner cup upper portion at outer peripheries of the inner cup lower portion and the inner cup upper portion. A collection space is formed between the upper surface of the inner cup lower portion and the lower surface of the inner cup upper portion. A scatter capturing space that allows a processing liquid that has passed through the clearance to scatter and captures the scattering processing liquid is formed by an outer cup. An upper portion and an outer periphery of the scatter capturing space are covered by a lower surface and an inner side surface of the outer cup, respectively. The processing liquid that has passed through the clearance is led to the inner side surface by the lower surface of the outer cup. | 03-06-2014 |
| 20140137796 | SPIN COATING METHOD AND SPIN COATING APPARATUS - A spin coating apparatus that supplies a coating liquid to a substrate and rotating the substrate to form a coating film, has a holding part that holds the substrate mounted thereon in a horizontal position; a rotationally driving source that rotationally drives the holding part about a rotational axis parallel with the vertical direction, thereby rotating the substrate; and a coating liquid supplying part that supplies the coating liquid to the substrate held by the holding part. | 05-22-2014 |
| 20140261162 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus for processing a substrate comprises: a plurality of chuck pins each having an accommodating groove for accommodating a portion of peripheral part of the substrate, holding the substrate at a hold position in a horizontal posture by pressing inner faces of the accommodating grooves toward portions of peripheral part of the substrate; and a plurality of guide members, being disposed on or above the respective plurality of chuck pins, guiding process liquid discharged from the substrate to a surrounding area of the substrate; wherein each of the plurality of guide member includes: an inner-edge guide disposed at a position inward and above the accommodating groove; and an outer-edge guide disposed at a position level with or below the inner-edge guide and outward the chuck pin. | 09-18-2014 |
| 20140261163 | LIQUID TREATMENT APPARATUS - In one embodiment, a cleaning member has an annular part and an opening positioned radially inside the annular part, and can be moved up and down between a first position and a second position relative to a cleaning nozzle. For cleaning of the back surface of the wafer, the cleaning member is placed at its first position that allows a cleaning liquid to reach the back surface of the substrate through the opening of the cleaning member. For cleaning of the cup structure, the cleaning member placed at its second position higher than the first position is being rotated, and a cleaning liquid discharged from the cleaning nozzle collides with an annular part of the cleaning member and is guided to the inner surface of a cup structure. | 09-18-2014 |
| 20140352608 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus capable of preventing corrosion of metal interconnects of a substrate formed thereon is disclosed. The substrate processing apparatus includes a substrate holder configured to hold a substrate horizontally and rotate the substrate, and a slit nozzle configured to supply a processing liquid onto a surface of the substrate. The slit nozzle is adjacent to the surface of the substrate and extends in approximately a radial direction of the substrate. | 12-04-2014 |
| 20150059642 | SPIN TREATMENT APPARATUS - A spin treatment apparatus according to an embodiment includes: an annular liquid receiver surrounding a rotating substrate at a distance from an outer periphery of the substrate and configured to receive liquid flying from the rotating substrate and accommodate the liquid; an annular cup body surrounding the liquid receiver at a distance from an outer periphery of the liquid receiver and forming an annular outer exhaust flow channel for generating an airflow along an upper surface to an outer peripheral surface of the liquid receiver; and an annular partitioning member provided inside the annular liquid receiver and forming an annular inner exhaust flow channel for generating an airflow along an inner peripheral surface to a lower surface of the liquid receiver. | 03-05-2015 |
| 20150068450 | SUBSTRATE TREATMENT APPARATUS - A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a substrate rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; a treatment liquid supplying unit which supplies a treatment liquid to an upper surface of the substrate held by the substrate holding unit; an opposing member to be located in opposed spaced relation to the upper surface of the substrate held by the substrate holding unit in contact with a film of the treatment liquid formed on the upper surface of the substrate so as to receive a lift force from the liquid film; a support member which supports the opposing member; and an opposing member holding mechanism which causes the support member to hold the opposing member in a vertically relatively movable manner. | 03-12-2015 |
| 20150336127 | MULTI-SIZE ADAPTABLE SPIN CHUCK SYSTEM - A novel interchangeable spin chuck system is provided that allows the user to quickly change substrate sizes and spin chuck styles without any extra tools. This system has a two-piece design and overcomes many of the drawbacks of previous spin chuck designs, such as difficulty in seating the spin chuck and ensuring that the spin chuck is at a consistent flatness and height. Furthermore, this spin chuck system allows the spin chucks to be manufactured at a lower cost. Thus, rather than restricting users to “make do” with incorrect spin chucks due to budget limitations, this economical design gives users access to a wider range of spin chuck sizes and styles. | 11-26-2015 |
| 20150343484 | REMOVABLE SPIN CHAMBER WITH VACUUM ATTACHMENT - A removable air flow control housing having a chamber for holding a substrate which is rotatable with and attachable by vacuum to a spin chuck of a spin coating apparatus. The housing has a lid in a top wall that can be hinged, screwed, magnetically secured or frictionally held in place. The chuck is nestable within a cutout region disposed within a central inner portion of the housing while an outer portion of the housing has a toroidal shape beyond edges of the chuck for reducing air turbulence and capturing excess coating fluid. The cutout region forms a shape that corresponds to the chuck shape. An upper cutout wall has vacuum holes in vertical alignment with vacuum holes of the chuck. The housing is attachable by vacuum to the chuck when the chuck is nested within the cutout region and the substrate is positioned on an upper surface of the upper cutout wall. The housing and substrate are rotatable with the chuck about a chuck axis of rotation as a coating solution is dispensed onto the substrate. | 12-03-2015 |
| 20180021806 | THERMAL PROCESSING DEVICE, SUBSTRATE PROCESSING APPARATUS AND THERMAL PROCESSING METHOD | 01-25-2018 |
| 20220136099 | CARRIER COMPONENT AND COATING DEVELOPER DEVICE - Provided are a carrier component and a coating developer device. The carrier component includes a supporting pillar, a first carrier stage and a second carrier stage that is provided with an accommodating cavity and a through mounting hole in communication with the accommodating cavity and includes at least two casings which are assembled to form the through mounting hole matched with the supporting pillar and the accommodating cavity surrounding the first carrier stage; and the at least two casings are detachably connected to one another. | 05-05-2022 |
| 118053000 | Plural axes of rotation of work | 1 |
| 20150083038 | SPIN TREATMENT APPARATUS - A spin treatment apparatus according to an embodiment performs a treatment while rotating a substrate and includes: at least three clamp pins configured to contact an outer peripheral surface of the substrate and clamp the substrate; rotatable pin rotators provided for the respective clamp pins and each configured to retain the corresponding clamp pin at a position offset from a rotation axis of the pin rotator parallel with a rotation axis of the substrate; magnet gears provided for the respective pin rotators around outer peripheral surfaces thereof and each having a magnetic-pole part formed spirally about the rotation axis of the pin rotator; rotation magnets provided for the respective magnet gears and positioned to attract and be attracted by the magnetic-pole part of the corresponding magnet gear; and a movement mechanism configured to move the rotation magnets along the rotation axes of the pin rotators. | 03-26-2015 |
