| Entries |
| Document | Title | Date |
|---|
| 20080202410 | Multi-substrate size vacuum processing tool - A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. The apparatus may process semiconductor substrates with a selected diameter in a range from about 100 mm to about 450 mm. | 08-28-2008 |
| 20080236478 | DEVICE FOR VACUUM DEPOSITION OF A COATING ON A CONTINUOUS MATERIAL, WITH LIQUID APPLICATOR - The system for vacuum deposition comprises: an evacuable chamber; in said chamber, a feed path of the web material in a vacuum environment; along the feed path, a process roller ( | 10-02-2008 |
| 20080236479 | SUSCEPTOR FOR SEMICONDUCTOR MANUFACTURING APPARATUS - There is provided a susceptor for semiconductor manufacturing apparatus that offers excellent thermal uniformity of a substrate being secured by vacuum chucking. A susceptor for semiconductor manufacturing apparatus includes an aluminum-nitride support member in which heater electrodes are buried to heat the substrate, a recessed wafer pocket formed on an upper surface of the support member, a through hole formed in the wafer pocket, and a seal band that supports the substrate at a periphery of the wafer pocket, and on an upper surface of the seal band, a plurality of gas channels are formed to allow gas in a chamber to pass through the gas channels from an outer circumference of the seal band toward the wafer pocket. | 10-02-2008 |
| 20080236480 | SOLVENT ABSORBING DEVICE AND IMAGE FORMING APPARATUS - The solvent absorbing device includes: a hollow open roller composed of a cylindrical member of which inner side is divided into at least a first space and a second space in such a manner that a cross-section of the cylindrical member in a plane perpendicular to an axial direction of the cylindrical member is divided into a plurality of regions, the cylindrical member having a first opening section and a second opening section passing from an outer surface of the cylindrical member to an inner surface of the cylindrical member and opening respectively to the first space and the second space; a cylindrical absorbing body which is arranged over the outer surface of the cylindrical member and is rotatable in a rotational direction relatively to the hollow open roller; and a pressure application device which applies a negative pressure to the first space of the hollow open roller, and applies a prescribed pressure to the second space of the hollow open roller. The first and second opening sections are disposed other than a position facing a portion of a surface of the absorbing body making in contact with solvent, and the first opening section is disposed on an upstream side of the second opening section in terms of the rotational direction of the absorbing body. | 10-02-2008 |
| 20080245294 | RACK - The subject invention is directed to a rack for supporting at least one article during a vacuum impregnation process with the article having treated and untreated surfaces. The rack includes a metallic body defining at least one nest for accommodating the article, the nest being configured to support the article under vacuum impregnation conditions. Also, non-metallic bearing surfaces are disposed on portions of the nest. The bearing surfaces are configured to contiguously contact the treated surfaces of the article during the vacuum impregnation process with contiguous contact between the treated surfaces of the article and the metallic body being avoided. Advantageously, with the subject invention, a metallic rack may be utilized which avoids damage to the treated surfaces of an article undergoing vacuum impregnation. | 10-09-2008 |
| 20080245295 | DEVICE FOR THE CONTINUOUS COATING OF A STRIP-LIKE SUBSTRATE - The invention relates to a device for the continuous coating of a strip-like substrate in a vacuum, especially for producing coating patterns on the substrate, with a printing roller and a backing roller, the substrate guided between the printing roller and the backing roller. The invention device includes a coating or release agent transferable to the substrate via the printing roller and a servo unit that has a controllable servo motor, wherein in a working position adjustable with the servo unit, the printing roller and the backing roller are in operative connection with one another. The object of the invention is to improve the abadjustability of the generic device. The object is achieved by the servo unit's having a controllable servo motor. | 10-09-2008 |
| 20090020070 | VACUUM EVAPORATION APPARATUS FOR SOLID MATERIALS - The invention relates to an apparatus for evaporating solid materials, for instance, selenium for coating a substrate. The solid material is brought into a first crucible via a feeding source. In this crucible the material melts at a temperature which is preferably slightly higher than its melting point. The molten material flows via a transporting device, for instance, a pipe into a second crucible, where the material evaporates at a temperature higher than its boiling point and is transported to a substrate. In order to stop the evaporation within a very short time preferably within only one to two minutes, a cooling device for cooling the material beyond its melting point is arranged at the transporting device. With this cooling device the material in the transporting device can be cooled down beyond its melting point in a very short time. | 01-22-2009 |
| 20090025630 | VACUUM TRANSFER APPARATUS AND METHOD - A vacuum transfer apparatus including an auxiliary vacuum chamber and a main vacuum chamber is used for transferring an uneven pattern to a disk substrate with a stamper. The auxiliary vacuum chamber is vacuumized or opened to air because the disk substrate is conveyed to and from the vacuum transfer apparatus through the auxiliary vacuum chamber. The disk substrate conveyed to the auxiliary vacuum chamber and then to the main vacuum chamber after the auxiliary vacuum chamber is vacuumized. In the main vacuum chamber, transferring of the uneven pattern with the stamper, curing of UV-curable resin, and removal of the stamper are performed to provide a disk substrate with the uneven pattern. Then, the disk substrate is conveyed from the vacuum transfer apparatus through the auxiliary vacuum chamber. An operation at the auxiliary-vacuum-chamber side and an operation at the main-vacuum-chamber side are performed in parallel. | 01-29-2009 |
| 20090025631 | GAS-TIGHT MODULE AND EXHAUST METHOD THEREFOR - A gas-tight module capable of preventing the collapse of a pattern formed on a principal surface of a substrate, without lowering throughput. A load lock module of a substrate processing system includes a transfer arm, a chamber, and a load lock module exhaust system. A plate-like member is disposed in the chamber such as to face the principal surface of a wafer transferred into the chamber. An exhaust passage isolated from the remaining space in the chamber is defined by the wafer and the plate-like member at a location right above the principal surface of the wafer. The sectional area of the exhaust passage is smaller than that of the remaining space in the chamber. | 01-29-2009 |
| 20090038544 | FILM COATING HOLDER AND FILM COATING DEVICE USING SAME - A film coating holder includes a main body, a number of workpiece holders, and a number of driving elements. The main body defines a number of separate openings. The workpiece holders are received in the corresponding separate openings, and rotatably mounted on the main body. The driving elements are fixed to the main body and geared with the corresponding workpiece holders. | 02-12-2009 |
| 20090064924 | Method for the Consolidation of Ornamental Stones, Device and Relevant Plant - The method for consolidating plate-like, slice-like or modularelement-like ornamental stones comprises: the impregnation by means of the pressure created in the treatment environment with a water glass solution wherein the material being treated is plunged for enough time for the full penetration in fissures and microporosities of the surface thereof; characterised in that it has the following steps:—A pre-treatment of the material by exhausting;—A permanence of the pre-treatment step for enough time to extract gases, steams and powders existing in said fissures and microporosities;—An injection of the impregnating solution with a water glass solution and keeping the treatment chamber under vacuum during the injection and in the following impregnation step. The absolute pre-treatment pressure is preferably of 0.2-0.3 mbar; for the injection it is preferably between 10 and 100 mbar, while for the impregnation it is preferably kept at a pressure close to the steam pressure of the water glass solution being used. The implant being used and the device for the stowage and handling of the materials to be treated are also described. | 03-12-2009 |
| 20090084312 | PROCESS AND EQUIPMENT FOR THE CONVEYANCE OF POWDERED MATERIAL - The invention concerns a process and a device ( | 04-02-2009 |
| 20090095213 | THERMAL EVAPORATION SOURCES FOR WIDE-AREA DEPOSITION - A thermal evaporation source includes:
| 04-16-2009 |
| 20090107395 | Deposition Apparatus With Guide Roller For Long Superconducting Tape - Disclosed herein is a deposition apparatus with a guide roller for a long superconducting tape. The deposition apparatus has a supply reel which is provided in a vacuum chamber and rotated to supply the tape, a feed and deposition unit which is spaced apart from the supply reel and vacuum deposits a superconducting layer on the tape while feeding the tape, and a collection reel which is spaced apart from the feed and deposition unit and is rotated to collect the vacuum-deposited tape. The feed and deposition unit includes a drum which is rotated to wind the tape on a predetermined portion of an outer circumference of the drum several times, thus feeding the tape, and a guide roller which is spaced apart from the drum, includes a plurality of rollers each having on an outer circumference thereof grooves and protrusions at regular intervals, and is inclined at a predetermined angle with respect to a rotating shaft of the drum by a sum of a width of the tape and a thickness of each of the protrusions, with the tape passing over an outer circumference of the guide roller. The invention deposits a superconducting layer while maintaining constant tension when the tape is thermally deposited, thus preventing the tape from being deformed because of the difference in the thermal expansion and contraction of the tape resulting from non-uniform tension. | 04-30-2009 |
| 20090107396 | Vacuum chamber on a frame basis for coating installations - The present invention relates to a vacuum chamber and to its production. According to the invention, the vacuum chamber comprises a frame into which insert plates are placed. The insert plates form together with the frame a closed space in which a vacuum can be created. Preferably, the shell of the frame is extracted from an integrally formed metal piece, with a large portion of material being removed, leading to openings for the insert plates to be created. This has among others the advantage that no welding seams are necessary where the individual plates are inserted. | 04-30-2009 |
| 20090165705 | Batch forming system for amorphous silicon film - A batch forming system for amorphous silicon films is composed of at least one p-layer formation chamber having a sealing gate that can be opened or closed; at least one i-layer formation chamber having a sealing gate that can be opened or closed; at least one n-layer formation chamber having a sealing gate that can be opened or closed; a common vacuum chamber connected with said formation chambers; a conveyance device having a bearing surface movable to the fronts of said sealing gates respectively; and a cart for carrying a plurality of plate-shaped materials, being allowed passing through said sealing gates to enter said formation chambers respectively from said bearing surface or to exit said formation chambers and then go back to the bearing surface. Therefore, batch forming system can speedy up the production and do the batch formation of a multiplicity of the amorphous silicon films at a time. | 07-02-2009 |
| 20090250000 | VACUUM PROCESSING APPARATUS - A vacuum processing apparatus capable of attaining compatibility between the decrease for the number of foreign particles deposited on a sample in a lock chamber and improvement of the throughput, in which an open speed controllable valve is disposed and the depressurization speed can be controlled automatically by a controlling computer. | 10-08-2009 |
| 20090301392 | VACUUM PROCESSING APPARATUS - There is a vacuum processing apparatus which can reduce the amount of foreign particle occurrence by enhancing the ease of maintenance of a gas diffuser installing portion in the vacuum processing apparatus. A gas diffuser chamber for accommodating a gas diffuser is installed in the vacuum processing apparatus. | 12-10-2009 |
| 20090314199 | Vacuum Chamber - The present invention provides a vacuum chamber capable of simplifying the structure of the arrangement of a cooling passage. The vacuum chamber of the present invention includes a plurality of wall members, the plurality of the wall members are connected to each other to construct a chamber main body by connection portions where connection surfaces each of which is part of a surface of each wall member are hermetically connected to each other, and at least part of the connection portions are built-in gap type connection portions each of which has a gap extending along the corresponding connection surfaces inside the connection surfaces and in which peripheries of the connection surfaces are hermetically connected to each other by welding. | 12-24-2009 |
| 20090320747 | TAKE-UP TYPE VACUUM FILMING DEVICE - [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller. | 12-31-2009 |
| 20100043699 | Method for Siliconizing Carbon-Containing Materials - A method for treating workpieces that consist of porous carbon material with liquid silicon with the formation of silicon carbide, comprising the steps: Preheating porous carbon workpieces under inert gas to the selected operating temperature T | 02-25-2010 |
| 20100071614 | Fluid distribution apparatus and method of forming the same - A fluid distribution apparatus and method of forming such an apparatus is provided. A fluid distribution apparatus includes a body, a plenum, an inlet, and an outlet. The body is formed from at least one of a nitride, carbide, carbonitride, oxynitride of elements comprising boron, aluminum, silicon, gallium, refractory hard metals, transition metals, and rare earth metals, or complexes or combinations thereof. The plenum is positioned within the body. The inlet passes through a first portion of the body and is in fluid communication with the plenum, and the outlet passes through a second portion of the body and is also in fluid communication with the plenum. | 03-25-2010 |
| 20100095885 | Shadow Mask Deposition Of Materials Using Reconfigurable Shadow Masks - A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a deposition vacuum vessel along with a material deposition source. Materials from the material deposition sources are deposited on the substrate via openings in corresponding compound shadow masks, each opening being formed by the whole or partial alignment of apertures in the shadow masks forming the compound shadow mask, to form an array of electronic elements on the substrate. | 04-22-2010 |
| 20100162949 | Methods and Systems for Coating and Sealing Inside of Piping Systems - Methods and systems for cleaning, coating and sealing leaks in existing pipes, in a single operation. A piping system can be cleaned in one pass by dry particulates forced and pulled by air throughout the piping system by a generator and a vacuum. Pipes can be protected from water corrosion, erosion and electrolysis, extending the life of pipes such as copper, steel, lead, brass, cast iron piping and composite materials. Coatings can be applied to pipes having diameters up to approximately 6″. Leak sealants of at least approximately 4 mils thick can cover insides of pipes, and can include novel mixtures of fillers and epoxy materials, and viscosity levels. A positive pressure can be maintained within the pipes during applications. Piping systems can be returned to service within approximately 96 hours. | 07-01-2010 |
| 20100192842 | PEROVSKITE-OXIDE FILM, PIEZOELECTRIC DEVICE, AND LIQUID DISCHARGE DEVICE - A film formed on a substrate different from the monocrystalline perovskite substrate contains a piezoelectric oxide expressed as A(B | 08-05-2010 |
| 20100242837 | COMBINATORIAL DEPOSITION METHOD AND APPARATUS THEREOF - A combinatorial deposition method is characterized in that, in a method of performing thin-film coating onto a substrate disposed in a vacuum, two or more substrates are moved between a deposition position and a cooling position, sequentially only substrates to be coated is moved to the deposition position while substrates at the cooling position are cooled by a cooling mechanism, and substrates are respectively deposited under different deposition conditions in only one vacuum evacuation process. Various deposition conditions with regard to sputtering and the like are accurately controlled, so that coating films can be efficiently produced under different deposition conditions. | 09-30-2010 |
| 20100251960 | CHAMBER AND FILM FORMING APPARATUS - The present invention provides a chamber | 10-07-2010 |
| 20100275838 | COATING APPARATUS - A coating apparatus includes a chamber device and a transporting device. The chamber device defines two coating chambers, two parallel coating channels, and a transportation channel communicating with the coating channels. The coating chambers are separated from each other. The coating chambers and the coating channels are alternately arranged. Each coating chamber defines at least one coating slot communicating with the respective coating channel. The transporting device includes a shaft rotatable with respect to the chamber device and a carrying board fixed on the shaft. The shaft is axially movable in the transportation channel. The carrying board is receivable in each of the coating channels for exposing a substrate to the corresponding coating chamber via the associated coating slot. The carrying board is rotatable about the shaft in each of the coating channels and jointly movable with the shaft in and along the transportation channel between the coating channels. | 11-04-2010 |
| 20100313809 | SUBSTRATE PROCESSING SYSTEM HAVING IMPROVED SUBSTRATE TRANSPORT SYSTEM - A substrate processing system includes a first load lock, a process chamber having a first opening to allow an exchange of a substrate between the first load lock and the first process chamber, first rollers in the process chamber; and second rollers in the first load lock, wherein the first rollers and the second rollers are configured to transport a substrate thereon through the first opening between the first load lock and the process chamber. At least some of the first rollers and the second rollers are idler rollers. | 12-16-2010 |
| 20100319615 | LIQUID PROCESSING APPARATUS - There is provided a liquid processing apparatus capable of preventing an atmospheric air of a lower surface side of a substrate, to which a processing liquid is supplied, from circulating and being introduced into an upper surface side of the substrate, to which the processing liquid is not supplied, and capable of decreasing a fuzzy gas consumption supplied to separate the atmospheres between the lower and upper surface sides from each other. An upper plate | 12-23-2010 |
| 20110000426 | SUBSTRATE PROCESSING APPARATUS WITH HEATER ELEMENT HELD BY VACUUM - A substrate processing apparatus for heating a substrate is provided. The substrate processing apparatus can include a top and bottom planar member. A heater layer can be disposed between the top and the bottom planar member and held in place by evacuating a region between the two planar members. The heater layer can be made of alternating insulating and conducting layers with heater elements formed on the conducting layers in predetermined pattern. | 01-06-2011 |
| 20110088614 | POWDER PAINTING CABIN - A powder painting cabin ( | 04-21-2011 |
| 20110146567 | Device for Treating Wafers on Assembly Carriers - A device for treating wafers on assembly carriers is disclosed. A wafer to be treated can be fixed on a liquid film that is located between the front side of the wafer and the assembly carrier by freezing of the film. | 06-23-2011 |
| 20110192344 | FILM FORMING APPARATUS - The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided. | 08-11-2011 |
| 20110226178 | FILM DEPOSITION SYSTEM - A film deposition system which a cycle of alternately supplying a first reactive gas and a second reactive gas and exhausting them is repeated twice or more in a vacuum vessel to cause reaction between the two gases, thereby depositing thin films on substrate surfaces, the film deposition system includes: a plurality of lower members having substrate-placing areas on which substrates will be placed; a plurality of upper members so placed that they face the lower members to form processing spaces together with the substrate-placing areas; a first reactive gas supply unit and a second reactive gas supply unit for supplying a first reactive gas and a second reactive gas, respectively, to the processing spaces; a purge gas supply unit for supplying a purge gas in the period between a first reactive gas supply period and a second reactive gas supply period; exhaust openings, situated along circumferences of the processing spaces, for communicating the inside of the processing spaces with the atmosphere in the vacuum vessel that is outside of the processing spaces; and an evacuating unit for evacuating the processing spaces via the atmosphere in the exhaust openings and the vacuum vessel. | 09-22-2011 |
| 20110253036 | WET-COATING APPARATUS - A wet-coating apparatus includes a main body, a cleaning agent bin, a coating agent storage bin, a hot-air injector, a heater, and a transport. The main body defines a coating chamber. The coating chamber includes a first sub-chamber, a second sub-chamber, and a third sub-chamber located between the first and second sub-chambers. The cleaning agent storage bin is received in the first sub-chamber. The coating agent storage bin is received in the first sub-chamber and located adjacent to the third sub-chamber. The hot-air injector is received in the third sub-chamber. The heater is received in the second sub-chamber. The transport is located over the cleaning agent storage bin and the coating agent storage bin, and configured to transport a substrate from the first sub-chamber to the second sub-chamber. | 10-20-2011 |
| 20110253037 | VACUUM HEATING AND COOLING APPARATUS - The vacuum heating and cooling apparatus can rapidly heat and cool only the substrate after film-forming treatment while maintaining high vacuum. The temperature rise of members in the chamber with time caused by accumulation of heat is suppressed, and the variation of temperature between substrates is decreased. In an embodiment, the heating and cooling apparatus for heating and cooling a substrate in a vacuum, includes: a vacuum chamber; a radiation energy source positioned at the vacuum chamber on an atmosphere side for emitting a heating light; an incidence part for causing the heating light from the radiation energy source to enter the vacuum chamber; a substrate-holding member for holding the substrate; and a substrate-transfer mechanism for transferring the substrate held by the substrate-holding member in a heating state to a heating position proximal to the radiation energy source, and transferring the substrate and the substrate-holding member in a non-heating state to a non-heating position distant from the radiation energy source, wherein the substrate-holding member has a plate shape for placing the substrate thereon and has an outer shape larger than that of the incidence part for causing the heating light to enter the vacuum chamber. | 10-20-2011 |
| 20110265711 | VACUUM CHAMBER FOR COATING INSTALLATIONS AND METHOD FOR PRODUCING A VACUUM CHAMBER FOR COATING INSTALLATIONS - A vacuum chamber ( | 11-03-2011 |
| 20110271902 | System For Encapsulation Of Semiconductor Dies - The present invention describes two systems ( | 11-10-2011 |
| 20110283934 | HIGHLY PRODUCTIVE APPARATUS FOR VACUUM COATING ROLL SUBSTRATES - Highly productive apparatus ( | 11-24-2011 |
| 20110283935 | MANUFACTURING APPARATUS OF GAS DIFFUSION LAYER - A gas diffusion layer, a manufacturing apparatus and a manufacturing method thereof are provided. The gas diffusion layer having different hydrophilic/hydrophobic structure and channel therein can be manufactured quickly and easily by using a coating mask. The gas diffusion layer is used in various fuel cells to enhance the ability of water management and to solve the problem of flooding at the cathode, the problem of water deficit at the anode, and the problem of gas transfer. The gas diffusion layer includes a gas diffusion medium having a first property and a micro porous layer having a second property. The micro porous layer is formed on one surface of the gas diffusion medium. The micro porous layer has a plurality of channel layers penetrating the gas diffusion medium. One of the first property and the second property is hydrophilic, and the other is hydrophobic. | 11-24-2011 |
| 20110297077 | IN-LINE VACUUM COATING SYSTEM - An in-line vacuum coating system includes a vacuum chamber, a coating source and a substrate carrier for holding tubular substrates, the carrier being displaceable using the vacuum chamber. A sure method of simply and securely coupling a fixed rotational drive unit to a carrier that can be displaced at a constant rate of speed in an in-line vacuum coating system is accomplished by a fixed splined shaft rotatably installed and connectable to a rotational drive unit, and a gearwheel that can be engaged with the splined shaft and that is rotatably mounted on the carrier. The gearwheel is longitudinally displaceable to a predefined extent in spring-loaded fashion in a direction opposite to the direction of travel of the carrier. | 12-08-2011 |
| 20120006256 | APPARATUS FOR MANUFACTURING CERAMIC GREEN SHEET - Disclosed herein is an apparatus for manufacturing a ceramic green sheet, including: an applying unit that applies slurry to a film; a drying unit that dries the slurry applied to the film and forms the ceramic green sheet; and a pollution preventing unit having the drying unit therein to prevent pollution materials from moving between the drying unit and the outside environment. | 01-12-2012 |
| 20120006257 | SUBSTRATE HOLDER STOCKER DEVICE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE HOLDER MOVING METHOD USING THE SUBSTRATE HOLDER STOCKER DEVICE - A substrate holder stocker device capable of reducing foot print is provided. The device includes: a movable table A which holds a plurality of substrate holders side by side in a plate thickness direction thereof and moves back and forth; a movable table B which is provided parallel to the movable table A and holds a plurality of the substrate holders side by side in a plate thickness direction thereof, and which moves back and forth; and an inter-table transfer mechanism for allowing the substrate holder which is held by one of the movable tables A and B stopped at predetermined positions to be held by the other of the movable tables A and B. | 01-12-2012 |
| 20120067277 | Barrier Coating Corrosion Control Methods and Systems for Interior Piping Systems - Methods and process steps for mapping, cleaning and providing barrier coatings to interior walls of piping systems. An entire piping system can be cleaned in one single pass by dry particulates forced by air and the piping system coated in one single pass. Pipes can be protected from water corrosion, erosion and electrolysis. Pipes having diameters of approximately ⅜″ up to approximately 6″ are treatable. Piping systems such as potable water lines, natural gas lines, HVAC, drains, and fire sprinkler systems in homes, apartments, high-rise hotel/resorts, office towers, high-rise apartment and condominiums and schools, can be treated. The coating forms an approximately 4 mils or greater covering inside the pipes. Buildings can return to service within approximately 24 to approximately 96 hours. | 03-22-2012 |
| 20120085280 | SILVER THIN-FILM SPEAD APPARATUS BY MEANS OF DEPOSITION OF NANO METALLIC SILVER - Disclosed is a silver thin film spread apparatus by means of deposition of nano metallic silver, the apparatus comprising: a treatment booth formed at one side with an inlet for inputting a substrate, and formed at the other side with an outlet for discharging the substrate; a transfer device formed at a lower side of the treatment booth for transferring the substrate; a spray device formed at an upper side of the treatment booth for spraying silver solution on a surface of the substrate; a moving device for linearly reciprocating the spray device; and a rotation device formed at the lower side of the treatment booth for rotating the substrate, whereby reflectivity can be enhanced by increasing film compactness and coating uniformity of thin film, where the substrate is rotated at a predetermined constant speed to allow the spray guns to linearly reciprocate and to allow the nano silver thin film to be uniformly spread and deposited on the surface of the substrate at a predetermined constant frequency. | 04-12-2012 |
| 20120090539 | LIQUID INFUSION DEVICE AND METHOD - A device for infusing liquid into material samples includes a container assembly configured to contain multiple material samples submerged in liquid. The material samples have pores containing air or gas. A pressure source and a vacuum source are both operatively connectable to the container assembly and alternately communicable with the container assembly to force the liquid to at least substantially fill the pores. The samples are thus ready for further processing, testing or use. A method of filling pores in material samples with liquid includes supporting multiple material samples within liquid in an airtight container assembly. The method further includes alternately applying a vacuum source and a pressure source to the container assembly, thereby replacing air with liquid in the pores of the material samples. | 04-19-2012 |
| 20120097093 | LOAD LOCK CHAMBER, SUBSTRATE PROCESSING SYSTEM AND METHOD FOR VENTING - A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided. | 04-26-2012 |
| 20120118229 | VACUUM PROCESSING APPARATUS AND ASSEMBLY METHOD THEREOF - The disclosure provides an assembly method of a vacuum processing apparatus having a reaction vessel and an exhaust port that are made of quartz and airtightly connected to each other, in order to prevent breakage of the vessel. The method includes (a) mounting an attachment member on one end portion of the reaction vessel, (b) connecting and fixing at least a flange portion of an exhaust pipe to the exhaust port, (c) fixing the attachment member to a portion of the exhaust pipe including at least the flange portion connected and fixed to the exhaust port by using fixing members after (a) and (b), (d) fixing the attachment member to a support portion after (a), and (e) fixing the exhaust pipe to an exhaust pipe fixing portion different from the attachment member at a lower position than a fixing position of the attachment member after completing (a) to (d). | 05-17-2012 |
| 20120272893 | TOOLS AND METHODS FOR PROCESSING MICROELECTRONIC WORKPIECES USING PROCESS CHAMBER DESIGNS THAT EASILY TRANSITION BETWEEN OPEN AND CLOSED MODES OF OPERATION - Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into th | 11-01-2012 |
| 20120298033 | CONTINUOUS PROCESSING SYSTEM WITH PINCH VALVE - A pinch valve assembly includes a valve body having a slot which is configured to allow a web of substrate material to pass therethrough. The valve body has a sealing surface which includes a first curved portion with a first radius of curvature. A dynamic seal element is configured to engage the valve body and includes a second curved portion having a second radius of curvature which is larger than the first radius of curvature. An actuator is operable to selectively bias the dynamic seal element into and out of engagement with the valve body so that when it is biased into engagement with the valve body the web of substrate material is engaged between the sealing surfaces of the dynamic seal element and the valve body. Also disclosed are deposition systems which include these pinch valves. | 11-29-2012 |
| 20120304920 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus including a holder for rotatably holding a substrate; a coating solution supply nozzle for supplying a coating solution onto a front surface of the substrate to be processed held by the holder; a treatment chamber housing the holder and the coating solution supply nozzle; a cooling device which cools the substrate before the coating solution is supplied to the substrate, to a predetermined temperature; a heating devices which heats the substrate coated with the coating solution to a predetermined temperature; and a transferer that transfers the substrate between the treatment chamber, the cooling device and the heating device, wherein the treatment chamber, the cooling device and the heating device are partitioned from ambient air, and wherein at least the treatment chamber is connected to a gas supply mechanism having a supply source of a gas having a kinematic viscosity coefficient higher than that of air. | 12-06-2012 |
| 20120325140 | TRANSFER CHAMBER WITH VACUUM EXTENSION FOR SHUTTER DISKS - The present invention relates to a cluster tool for processing semiconductor substrates. One embodiment of the present invention provides a mainframe for a cluster tool comprising a transfer chamber having a substrate transferring robot disposed therein. The substrate transferring robot is configured to shuttle substrates among one or more processing chambers directly or indirectly connected to the transfer chamber. The mainframe further comprises a shutter disk shelf configured to store one or more shutter disks to be used by the one or more processing chambers, wherein the shutter disk shelf is accessible to the substrate transferring robot so that the substrate transferring robot can transfer the one or more shutter disks between the shutter disk shelf and the one or more processing chambers directly or indirectly connected to the transfer chamber. | 12-27-2012 |
| 20130019797 | IMPURITY-DOPED LAYER FORMATION APPARATUS AND ELECTROSTATIC CHUCK PROTECTION METHOD - An electrostatic chuck protection method includes providing an exposed chuck surface with a protective surface for preventing adherence of foreign materials including a substance exhibiting volatility in a vacuum environment, and removing the protective surface in order to perform a process of forming a substrate electrostatically held on the chuck surface with a surface layer including a substance having volatility in a vacuum chamber. The protective surface may be provided when a low vacuum pumping mode of operation is performed in a vacuum environment surrounding the chuck surface. | 01-24-2013 |
| 20130025532 | FORMATION OF PHOTOVOLTAIC ABSORBER LAYERS ON FOIL SUBSTRATES - An absorber layer of a photovoltaic device may be formed on an aluminum or metallized polymer foil substrate. A nascent absorber layer containing one or more elements of group IB and one or more elements of group IIIA is formed on the substrate. The nascent absorber layer and/or substrate is then rapidly heated from an ambient temperature to an average plateau temperature range of between about 200° C. and about 600° C. and maintained in the average plateau temperature range 1 to 30 minutes after which the temperature is reduced. | 01-31-2013 |
| 20130074763 | Film Formation Apparatus, Film Formation Method, Manufacturing Apparatus, and Method for Manufacturing Light-Emitting Device - An object is to improve use efficiency of an evaporation material, to reduce manufacturing cost of a light-emitting device, and to reduce manufacturing time needed for a light-emitting device including a layer containing an organic compound. The pressure of a film formation chamber is reduced, a plate is rapidly heated by heat conduction or heat radiation by using a heat source, a material layer on a plate is vaporized in a short time to be evaporated to a substrate on which the material layer is to be formed (formation substrate), and then the material layer is formed on the formation substrate. The area of the plate that is heated rapidly is set to have the same size as the formation substrate and film formation on the formation substrate is completed by one application of heat. | 03-28-2013 |
| 20130087095 | SELF-GETTERING DIFFERENTIAL PUMP - A self-gettering differential pump for a molecular beam epitaxy system has a collimator with a length greater than its diameter mounted in front of a source in extended port geometry, wherein the reactant delivered by the source also serves as a gettering agent. | 04-11-2013 |
| 20130125811 | SUPPORT MECHANISM AND VACUUMM COATING MACHINE USING THE SAME - A support mechanism includes a base plate, a plurality of mounting members and a plurality of adjusting members. The base plate defines a plurality of receiving holes, and each mounting member is received in one receiving hole. The adjusting members adjustably engage with the mounting members and resist on the base plate, and the plurality of adjusting members are capable of adjusting the height and tilt angle of the mounting members. The present invention further discloses a vacuum coating machine using the support mechanism. | 05-23-2013 |
| 20130133570 | VACUUM DEPOSITION DEVICE - A vacuum deposition device includes a coating chamber. The coating chamber defines a top wall and a bottom wall. A cooling device is defined in the top or bottom wall. The cooling device includes a cooling runner formed in the top or bottom wall defining the cooling device. | 05-30-2013 |
| 20130133571 | FILM FORMING APPARATUS - The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided. | 05-30-2013 |
| 20130139750 | MODULAR-CONSTRUCTION VACUUM-COATING SYSTEM - A modular-construction vacuum-coating system includes a plurality of functional chambers arranged one behind the other along a longitudinal extent in which substrates are moved through the chambers in a substrate-transporting region. To lower the production-related and installation-related outlay involved in supplying media, a functional chamber, as a first sub-module, is arranged in a first module and provided with an outer interface which is the same for at least a second module. | 06-06-2013 |
| 20130139751 | Method to Impregnate a Porous Bone Replacement Material - A method to impregnate a porous bone replacement material ( | 06-06-2013 |
| 20140014032 | DEVICE FOR PRODUCING STOICHIOMETRY GRADIENTS AND LAYER SYSTEMS - A process and a device for coating substrates with a stoichiometric gradient in an in-line coating system include at least two evaporation devices, each with an evaporator tube. The evaporator tubes are implemented so as to be tiltable independently of one another, whereby the transition area of the two vapor lobes can be adapted to the requirements of the gradient profile. Furthermore, the spacing of the evaporator tubes from the substrate and each other can be set. | 01-16-2014 |
| 20140060423 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber. | 03-06-2014 |
| 20140144374 | DEVICE FOR MANUFACTURING A FILM USED FOR A SOLAR CELL - A film forming device for a solar cell according to an exemplary embodiment of the present invention includes a chamber configured to receive a substrate and including a body having a hollow portion, a heating device in the hollow portion, and an insulating member configured to enclose the substrate and the heating device. | 05-29-2014 |
| 20140216332 | VACUUM TREATMENT DEVICE - Provided is a vacuum treatment device, when a lifting pin inserted to a through hole is moved up, a substrate on a placement table is placed on a lid member which is connected to an upper end of a lifting pin and is separated from a placement surface of the placement table. Additionally, when the lifting pin is moved down, the substrate comes into contact with the placement surface so as to be placed thereon. An annular seal member surrounding a periphery of an opening of the through hole is provided in a portion which faces the lid member in a bottom surface of a depression provided in the placement surface of the placement table. The lid member annularly comes into contact with the seal member when the lifting pin is moved down, and a space inside the through hole and a space outside the through hole are separate by the seal member, thereby preventing gas from flowing into the through hole. | 08-07-2014 |
| 20140261161 | SUBSTRATE HOLDER APPARATUS AND VACUUM PROCESSING APPARATUS - A substrate holder apparatus includes a substrate holder configured to hold a substrate in a vacuum processing space in a chamber, a support column coupled to the substrate holder, a first rotating support unit which rotatably supports the support column, a second rotating support unit which rotatably supports the support column at a position spaced apart from a position where the first rotating support unit supports the support column, a housing configured to support the first rotating support unit and the rotating support unit, and a conductive member configured to electrically connect the support column to the housing. | 09-18-2014 |
| 20140290568 | NOZZLE AND HONEYCOMB FILTER PRODUCTION APPARATUS USING THE SAME - A nozzle is mounted on an end of an ejector for ejecting an aerosol on an ejection side in a honeycomb filter production apparatus. The nozzle is formed into a shape having a longitudinal direction. A single introduction port is formed at an end surface of the nozzle on one side in the longitudinal direction, and a plurality of discharge ports are formed at an end surface of the nozzle on the other side in the longitudinal direction. A single introduction passage extends linearly from the single introduction port in the longitudinal direction. A plurality of discharge passages are each branched from an end portion of the introduction passage on a side opposite to the introduction port and extend to corresponding one of the discharge ports in a direction tilted from the longitudinal direction. | 10-02-2014 |
| 20140290569 | METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT AND DEPOSITION APPARATUS - An object of the present invention is to provide an apparatus for successive deposition used for manufacturing a semiconductor element including an oxide semiconductor in which impurities are not included. By using the deposition apparatus capable of successive deposition of the present invention that keeps its inside in high vacuum state, and thus allows films to be deposited without being exposed to the air, the entry of impurities such as hydrogen into the oxide semiconductor layer and the layer being in contact with the oxide semiconductor layer can be prevented; as a result, a semiconductor element including a high-purity oxide semiconductor layer in which hydrogen concentration is sufficiently reduced can be manufactured. In such a semiconductor element, off-state current is low, and a semiconductor device with low power consumption can be realized. | 10-02-2014 |
| 20140345518 | METHOD FOR MANUFACTURING WORKPIECES AND APPARATUS - For vacuum treatment of workpieces by a multitude of distinct processing stations (P | 11-27-2014 |
| 20140373776 | APPARATUS FOR SUBSTRATE DOUBLE-SURFACE HOLE-FILLING - The present invention provides a substrate double-surface hole-filling apparatus for carrying out a hole-filling operation on a substrate which has a first surface and a second surface, comprises a first feeding device, a first scraping device, a first drying device, a second feeding device, a second scraping device, a second drying device and a turnover device. The substrate double-surface hole-filling apparatus has a turnover device turning over the substrate which needs to be carried out with hole-filling operation. Therefore, the substrate double-surface hole-filling apparatus can automatically carry out the hole-filling operation on two surfaces of the substrate without manual turnover of the substrate, thus improving production efficiency. | 12-25-2014 |
| 20150047558 | DEVICE FOR APPLYING A COATING TO AN EXTENDED ARTICLE - The unit coat application by immersion elongate components into the molten metal comprises a tank for molten metal and a coating chamber equipped with appliances for internal creation of reduced pressure and positive pressure respectively. Moreover, inlet and outlet channels of the coating chamber are made vertical and situated at its bottom and top respectively to ensure vertical movement of the elongate component from bottom upwards. The coating chamber is located aside from the tank with molten metal, the intake channel is inclined, and the tank with molten metal is equipped with a supplying channel to load molten or solid metal that expands at its upper part facing the upper part of the tank with molten metal. | 02-19-2015 |
| 20150068448 | SYSTEM FOR APPLYING A COATING TO A WORKPIECE - An applicator head for a vacuum coating system includes two applicator manifolds. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. First and second face plates are disposed over the leading edges of the applicator manifolds, and each face plate includes a beveled edge disposed over each of the applicator ports. | 03-12-2015 |
| 20150068449 | SYSTEM FOR APPLYING A COATING TO A WORKPIECE - An applicator head for a vacuum coating system includes two applicator manifolds. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. One of the applicator channels includes a flow channel, which directs more of the liquid through a portion of the respective applicator port. First and second face plates are disposed over the leading edges of the applicator manifolds. | 03-12-2015 |
| 20150144057 | SUSCEPTOR - The invention relates to a susceptor which is for the processing chamber of protective gas and vacuum high-temperature processing installations and consists of graphite or CFC, has a tunnel-like design, and can be closed by a cover at both its ends. The invention should allow the provision of a flexibly and modularly extendable susceptor that has a material-saving design and, in particular, uniform thermal expansion. This is achieved by virtue of the fact that said susceptor ( | 05-28-2015 |
| 20150336120 | DEPOSITION CLOUD TOWER WITH ADJUSTABLE FIELD - A cloud tower ( | 11-26-2015 |
| 20160111689 | ORGANIC LAYER DEPOSITION APPARATUS, METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY DEVICE USING THE APPARATUS, AND ORGANIC LIGHT EMITTING DISPLAY DEVICE MANUFACTURED USING THE METHOD - An organic layer deposition apparatus, a method of manufacturing an organic light-emitting display device by using the same, and an organic light-emitting display device manufactured using the method, and in particular, an organic layer deposition apparatus that is suitable for use in the mass production of a large substrate and enables high-definition patterning, a method of manufacturing an organic light-emitting display device by using the same, and an organic light-emitting display device manufactured using the method. | 04-21-2016 |
| 20160158792 | PAINTING APPARATUS COMPRISING AN AIR BAG - The subject matter discloses a painting apparatus comprising a paint bag containing paint; a paint port through which paint flows from the paint bag; an air bag to receive gas configured to apply pressure to the paint bag as it receives air; an air port through which the gas enters the air bag; wherein the air bag and the paint bag are located within the painting apparatus, such that expansion of the air bag by pumping of the gas into the air bag forces the paint from the paint bag via the paint port. | 06-09-2016 |
| 20160199871 | PRESSURIZATION COATING SYSTEMS, METHODS AND APPARATUSES | 07-14-2016 |
