| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 118706000 | Cyclic operation of singular element | 9 |
| 20080295770 | Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method - In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance. | 12-04-2008 |
| 20090095217 | Plasma treatment system and cleaning method of the same - A plasma treatment apparatus has a reaction vessel ( | 04-16-2009 |
| 20110100295 | SYSTEM AND METHOD FOR FORMING AN INTEGRATED BARRIER LAYER - An apparatus for processing a substrate is provided. The apparatus includes a process chamber, and a dual-mode gas distribution plate disposed within the process chamber. The dual-mode gas distribution plate comprises a first gas distribution zone disposed in a center of the gas distribution plate, and a second gas distribution zone surrounding the first gas distribution zone, the second gas distribution zone being fluidly isolated from the first gas distribution zone, wherein the first gas distribution zone is coupled to a valve system to deliver sequential pulses of a first gas to the first gas distribution zone to perform a cyclical deposition process, and the second gas distribution zone is in communication with a flow controller to deliver a second gas to perform a chemical vapor deposition process. | 05-05-2011 |
| 20110114020 | LID ASSEMBLY FOR A PROCESSING SYSTEM TO FACILITATE SEQUENTIAL DEPOSITION TECHNIQUES - Embodiments of the invention generally relate to apparatuses for processing substrates. In one embodiment, a substrate processing system for sequential deposition or atomic layer deposition (ALD) is provided and includes a lid assembly coupled with a chamber housing, wherein the lid assembly contains a lid having a plurality of controllable flow channels extending from an upper lid surface, through the lid, and to a lower lid surface, a gas manifold disposed on the lid, and at least one valve coupled with the gas manifold and adapted to control a gas flow through one of the controllable flow channels. The substrate processing system further contains a gas reservoir disposed between a first gas line and a second gas line, and the gas reservoir is fluidly connected to the gas manifold by the second gas line. | 05-19-2011 |
| 20110239938 | Automated Method And System For Making Painted Vehicle Body Panel Skins And Vehicle Body Panels, Such As Instrument Panels, Utilizing Same - An automated method and system for making painted vehicle body panel skins and vehicle body panels, such as instrument panels, are provided wherein throughput and equipment utilization are greatly improved at a relatively low cost. The method includes transferring a mold having a mold surface from an entrance station to a paint station within a dispensing area. The method further includes applying paint on the mold surface to form a layer of paint on the mold surface at the paint station. The method still further includes spraying curable polyurethane elastomer on the painted surface at a spray station within the dispensing area. The paint and spray stations may be coincident. The method still further includes, after the step of spraying and while the polyurethane elastomer is uncured, transferring the mold with the paint and the uncured polyurethane elastomer from the spray station to at least one accumulator station in a curing area to allow the polyurethane elastomer to completely cure in the mold and form the skin. | 10-06-2011 |
| 20120199066 | ADHESIVE APPLICATION APPARATUS AND CONTROL METHOD OF THE SAME - An adhesive application apparatus sets a dot pattern such that an amount of paste applied to an area on the reverse side of an area on which an image is formed and an amount of paste applied to an area on the reverse side of an area on which the image is not formed are different from each other, and controls a paste discharge head so that the dot pattern having been set is formed on an adhesion surface of paper. Through this, the amount of paste applied to paper can be changed between an area where an image is formed and an area where the image is not formed, thereby making it possible to apply the paste to paper more appropriately in accordance with the state of image formation. | 08-09-2012 |
| 20130032090 | ADHESIVE APPLYING DEVICE - An adhesive applying device includes a robot including a robot arm; a rotor set jig for setting thereat a rotor; a gun including a holder to which a cartridge containing the adhesive is mountable, the gun discharging the adhesive in the cartridge mounted to the holder and being mountable to an end of the robot arm; an electromagnetic valve that performs on/off switching control of supply of compressed air at a predetermined pressure into the cartridge mounted to the holder of the gun; a robot controller that controls an operation of the robot; and an upper-order controller that coordinates and controls the on/off switching control performed by the electromagnetic valve and the control of the operation of the robot performed by the robot controller. | 02-07-2013 |
| 20130199444 | APPARATUS FOR PRODUCING THREE-DIMENSIONAL MODELS BY MEANS OF A LAYER BUILD UP TECHNIQUE - The present invention relates to a device for producing three-dimensional models by a layering technique, at least one print head ( | 08-08-2013 |
| 20140318451 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus capable of forming an oxide film on a substrate by forming a layer on the substrate by supplying a source gas into a process vessel accommodating the substrate via the first nozzle, and simultaneously supplying an oxygen-containing gas through a second nozzle and a hydrogen-containing gas through a first nozzle into the process vessel having an inside pressure thereof lower than atmospheric pressure; mixing and reacting the oxygen-containing gas with the hydrogen-containing gas in a non-plasma atmosphere within the process vessel to generate atomic oxygen; and oxidizing the layer with the atomic oxygen to change the layer into an oxide layer is disclosed. | 10-30-2014 |
