| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 118695000 | INTERFACING CONTROL OF PLURAL OPERATIONS | 18 |
| 20080230006 | LENS COATING SYSTEM - A shaft assembly of a lens coating system includes a first portion reversibly engagable with a second portion. A reciprocating drive disengages and subsequently re-engages the shaft first and second portions. A lens holder is coupled to an arm, which is coupled to the shaft first portion. Another drive, coupled to the shaft second portion, rotates the arm about an axis of the shaft assembly, when the first and second portions are engaged, such that the lens holder travels along a pathway surrounding the assembly. The system includes a plurality of stations, each station having an opening along the pathway, so that the rotating drive may transfer the lens holder into proximity with each station, when the shaft first and second portions are engaged, and the reciprocating drive may transfer a lens, held by the lens holder, into and out from each station through the opening thereof. | 09-25-2008 |
| 20080308038 | APPARATUS FOR PROCESSING A SUBSTRATE - In a substrate-processing apparatus for performing coating, baking and developing processes on a semiconductor substrate, a first processing block performs a coating process and a developing process. A second processing block is disposed opposite to the first processing block to heat-treat substrates. A main transfer block is disposed between the first and second processing blocks to transfer the substrates. A third processing block is disposed on one side of the main transfer block in a direction perpendicular to an arrangement direction of the first and second processing blocks to adjust a temperature of the substrates. An auxiliary transfer block is disposed adjacent to the second and third processing blocks to transfer the substrates between the second and third processing blocks. Thus, an overload of the main transfer block may be reduced. | 12-18-2008 |
| 20080308039 | APPARATUS FOR PROCESSING A SUBSTRATE - In a substrate-processing apparatus for performing coating, baking and developing processes on a semiconductor substrate, a first processing block performs a coating process and a developing process on substrates. A second processing block is disposed opposite to the first processing block to heat-treat the substrates. The first processing block includes upper, middle and lower unit blocks. The upper and lower blocks include at least one coating unit for forming a layer on the substrates and at least one developing unit for developing a photoresist layer on the substrates, respectively. The middle unit block is detachably disposed between the upper and lower unit blocks and includes at least one of coating units and developing units. The configuration of the middle unit block may vary according to a process recipe to improve the throughput of the substrate-processing apparatus. | 12-18-2008 |
| 20090031952 | ON-DEMAND CUSTOMIZED MOIST TISSUE DISPENSER - A sheet material dispenser for dispensing portions of sheet material to which a liquid composition has been applied includes a feed mechanism for holding and advancing the sheet material, and a drive mechanism which displaces a carriage along a path of motion. An applicator assembly, deployed on the carriage, includes at least one container containing a composition to be applied to the sheet material and at least one applicator for directing a quantity of the composition towards a surface of the sheet material. In preferred cases, each container and a corresponding applicator are combined as an interchangeable prefilled dispensing container to facilitate user replacement. A controller actuates the applicator assembly to apply a quantity of the composition to the surface of the sheet material while the drive mechanism carries the applicator assembly along the path of motion. | 02-05-2009 |
| 20090044747 | SUBSTRATE TREATING SYSTEM - A substrate treating system includes a coating apparatus having a resist coating unit, an exposing apparatus having an exposing machine and a heat-treating unit, and a controller for controlling the resist coating unit, exposing machine and heat-treating unit. The controller coordinates schedules of treatment in the coating apparatus and exposing apparatus, such that the coating apparatus can operate efficiently despite an increase in the processing time of the exposing machine. | 02-19-2009 |
| 20090165712 | SUBSTRATE TREATING APPARATUS WITH PARALLEL SUBSTRATE TREATMENT LINES - A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates. | 07-02-2009 |
| 20090272321 | MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE AND PATTERN-FORMING METHOD - The present invention provides a manufacturing apparatus of a semiconductor device, having a pattern-forming apparatus using a droplet-discharging method that is suitable for a large substrate in mass production. A plurality of pattern-forming apparatuses using a droplet-discharging method and a plurality of heat-treatment chambers are provided, and each of which is connected to one transfer chamber, which is a multi-chamber system. Discharging and baking are conducted efficiently to improve productivity. A gas is blown in the same direction as the scanning direction (or a scanning direction of a discharging head) on a substrate just after a droplet is landed, by providing a blowing means in the pattern-forming apparatus, and a heater is provided in a gas-flow path for local baking. | 11-05-2009 |
| 20100043705 | METHOD FOR PRODUCING A COLOR FILTER, APPARATUS FOR MANUFACTURING A COLOR FILTER, ELECTROOPTIC APPARATUS, AND ELECTRONIC DEVICE - An apparatus for manufacturing a color filter includes a stage on which a base having a target discharge area is adapted to be placed, a plurality of discharge heads having a first discharge head filled with a functional material, and a second discharge head filled with a liquid, and a control unit operatively coupled to the stage and the plurality of discharge heads. The control unit controls the stage and the plurality of discharge heads such that the stage and the plurality of discharge heads move relative to each other and a droplet of the functional material from the first discharge head and a droplet of the liquid from the second discharge head are discharged in the same target discharge area. The surface tension or viscosity is lower than that of the functional material. | 02-25-2010 |
| 20110197811 | DEVICE FOR INTRODUCING CATALYST INTO ATOMIZED COATING COMPOSITION - The present invention is directed to a delivery device and a system for introducing a second component into an atomized composition. The present invention is particularly directed to a delivery device and a system for introducing a catalyst into an atomized coating composition. | 08-18-2011 |
| 20110239936 | PRODUCING METHOD OF SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - A process for producing a semiconductor device, comprising the steps of conducting film formation on substrate ( | 10-06-2011 |
| 20110297085 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM - A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier. | 12-08-2011 |
| 20120037071 | LIQUID-EJECTING APPARATUS - A liquid-ejecting apparatus includes a liquid container that contains a liquid containing a substance that can settles, and a vessel that is connected to the liquid container with a tube and receives the liquid from the liquid container. An ejecting head is connected to the vessel. The ejecting head receives the liquid from the vessel and ejects the liquid. The liquid-ejecting apparatus includes also an agitation unit that agitates the liquid in the vessel, and a control unit that controls a first operation that ejects the liquid from the ejecting head and a second operation that causes the agitation unit to agitate the liquid after the first operation. | 02-16-2012 |
| 20120037072 | Analytic Substrate Coating Method - An apparatus and method for producing a coated analytic substrate using a compact and portable automated instrument located in the laboratory setting at the point of use which can consistently produce one or a plurality of coated analytic substrates “on demand” for using the analytic substrate immediately after coating, preferably without a step of rinsing the coated analytic substrate before use. The apparatus preferably uses applicator cartridges having a reservoir containing the coating compositions used to form the coatings. Preferably the cartridges are removable and interchangeable to facilitate the production of individual analytic substrates having different coatings or different coating patterns. These coated analytic substrates have superior specimen adhesion characteristics due to the improved quality of the coatings applied by the coating apparatus and due to the quickness with which the coated analytic substrates can be used in the lab after production. | 02-16-2012 |
| 20120167823 | ELECTRODE CONFIGURATIONS FOR PIEZOELECTRIC ACTUATORS - Fluid ejection apparatuses and processes for making the same are disclosed. An apparatus for ejecting fluid droplets includes a substrate having a plurality of flow paths formed therein, each flow path including a respective pumping chamber and a respective nozzle, and the respective nozzle being configured to eject fluid droplets through a first surface of the substrate in response to actuation of the respective pumping chamber; and an actuation assembly including a drive electrode layer over a second surface of the substrate opposite to the first surface, a piezoelectric layer over the drive electrode layer, and a reference electrode layer over the piezoelectric layer, the drive electrode layer being patterned to define an individually controllable drive electrode over each of two or more pumping chambers in the substrate, and the reference electrode layer including a continuous reference electrode spanning the two or more pumping chambers in the substrate. | 07-05-2012 |
| 20130025536 | APPARATUS FOR PRECURSOR DELIVERY SYSTEM FOR IRRADIATION BEAM INSTRUMENTS - A precursor delivery system for an irradiation beam instrument includes an injection tube for injecting gasses into the instrument vacuum chamber and a main gas line having an inlet and an outlet. The outlet is connected to the injection tube, and the inlet is connected to a sequential pair of valves connected to a carrier gas source. A crucible for holding precursor material is selectively connected to the main gas line at a location between the pair of valves and the injection tube. The source of carrier gas may be selectively connected to the inlet by sequential operation of the pair of carrier gas valves, so that pulses of carrier gas assist the flow of precursor material to the injection tube. Rapid purging of the system between precursors is enabled by a valve selectively connecting the main line to an envelope in communication with the instrument vacuum. | 01-31-2013 |
| 20140245952 | Automated Stent Coating Apparatus and Method - An automated apparatus and method for coating medical devices such as an intravascular stent, are disclosed in the method, a 2-D image of a stent is processed to determine (1) paths along the stent skeletal elements by which a stent secured to a rotating support element can be traversed by a dispenser head whose relative motion with respect to the support element is along the support-element axis, such that some or all of the stent skeletal elements will be traversed (2) the relative speeds of the dispenser head and support element as the dispenser head travels along the paths, and (3), and positions of the dispenser head with respect to a centerline of the stent elements as the dispenser head travels along such paths The rotational speed of the support and relative linear speed of the dispenser are controlled to achieve the desired coating thickness and coating coverage on the upper surfaces, and optionally, the side surfaces, of the stem elements | 09-04-2014 |
| 20140331928 | METHOD OF FORMING A GERMANIUM THIN FILM - A method of forming a germanium thin film on an underlying film includes forming a germanium seed layer by absorbing a germanium on a surface of the underlying film using an aminogermane-based gas, and forming a germanium thin film on the germanium seed layer using a germane-based gas. | 11-13-2014 |
| 20150290665 | DECORATION LINE FOR CERAMIC PRODUCTS AND PROCESS FOR DECORATING ON CERAMIC PRODUCTS - A decoration line including a conveyor of the products on which to apply the enamel, at least a first enamelling machine of the spray type actuated by piezoelectric-driven nozzles suitable for applying, on the products transiting on the conveyor, at least one first substantially full layer of enamel of the vitreous type in suspension in liquid suspending agent suitable for being processed in a digital decorative system for creating base or a covering layer on the products and at least a second enamelling machine, positioned downstream of said first machine, of the spray type actuated by piezoelectric-driven nozzles suitable for applying, on the products transiting on the conveyor, at least a second substantially discontinuous layer of enamel of the vitreous or pigmented type in suspension in liquid suspending agent suitable for being processed in a digital decorative system for creating decoration or finishing effects on the products. | 10-15-2015 |
