| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 118688000 | Responsive to condition of coating material | 31 |
| 20090241832 | COATING MECHANISM AND DROPLET JETTING DEVICE - A coating mechanism is provided with a supply roller that rotates in contact with, and applies treatment liquid to, conveyed paper. A control section controls the rotational velocity of the supply roller such that the rotational velocity when applying the treatment liquid to a first sheet of paper after commencement of application of the treatment liquid is slower than the rotational velocity when applying the treatment liquid to a second sheet of paper. An increase in the coating amount caused by an initialization operation is offset by a reduction in the amount of treatment liquid supplied caused by decreasing the rotational velocity of the supply roller, thereby inhibiting the occurrence of a disparity between the coating amount of treatment liquid applied to the first sheet of paper after commencement of treatment liquid application and the coating amount of treatment liquid applied to the second sheet of paper. | 10-01-2009 |
| 20100116204 | Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices - A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: | 05-13-2010 |
| 20100180818 | Dynamic Film Thickness Control System/Method and its Utilization - A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device, enabling the mask plate to mask film zones on the said substrate to achieve the film thickness of a design objective. When the required zones of deposition are masked, the deposition of a particular film layer is completed. | 07-22-2010 |
| 20110000430 | VACUUM VAPOR DEPOSITION APPARATUS - A vacuum vapor deposition apparatus includes a vaporization container which has a plurality of equally-diametered release holes arranged linearly and in which the release holes are arranged densely on both end portion sides of the vaporization container. The vaporization container includes therein a current plate having a plurality of equally-diametered passage holes through which vapor of a vaporization material passes. The passage holes are arranged densely on both end portion sides in such a manner that, as conductance per unit length in the arrangement direction of the release holes, conductance by the passage holes is proportional to conductance by the release holes. | 01-06-2011 |
| 20110162578 | FLIP-CHIP MOUNTING METHOD AND BUMP FORMATION METHOD - [Problem] To provide a flip-chip mounting method and a bump formation method applicable to flip-chip mounting of a next generation LSI and having high productivity and high reliability. | 07-07-2011 |
| 20130206061 | GLOSS PROCESSING APPARATUS - A sheet of paper is set on a paper-supplying portion of a top surface gloss processing apparatus while its top surface is faced upward. A gloss level sensor measures gloss level of the top surface of the sheet of paper. Data of this measurement is compared with a previously set threshold value. Based on this comparison, it is determined whether or not the gloss processing has been performed on the top surface thereof. When determining that the gloss processing has been already performed, a warning message such that the gloss processing has been already performed on the top surface of the sheet, of paper is displayed on a screen. On the other hand, when determining that the gloss processing has not performed, the top surface gloss processing apparatus performs the gloss processing on the top surface thereof. | 08-15-2013 |
| 20130291794 | PLASMA GENERATOR, AND CLEANING AND PURIFYING APPARATUS AND SMALL-SIZED ELECTRICAL APPLIANCE USING PLASMA GENERATOR - A plasma generator | 11-07-2013 |
| 20130327271 | VAPOR DEPOSITION PROCESS AND APPARATUS THEREFOR - An apparatus for depositing a ceramic coating on a component. The apparatus is configured to make use of an evaporation source containing multiple different oxide compounds, in which at least one of the oxide compounds has a vapor pressure that is higher than the remaining oxide compounds. The apparatus is operable to introduce the evaporation source into a coating chamber, suspend the component near the evaporation source, and project a high-energy beam on the evaporation source to melt and form a vapor cloud having a composition comprising the oxide compounds of the evaporation source. The apparatus includes a feature that prevents the vapor cloud from contacting and condensing on the component during an initial phase of operation, and subsequently permit and then again prevent the vapor cloud from contacting and condensing on the component during subsequent phases of operation in response to changes in the composition of the vapor cloud. | 12-12-2013 |
| 20140020625 | COATING APPARATUS AND INKJET RECORDING APPARATUS - A coating apparatus includes: a transport unit configured to transport an object to be coated; a coating liquid pan configured to store a coating liquid; a roller configured to be partially immersed in the coating liquid, rotate around an axis to draw up the coating liquid, and coat the coating liquid on the object; a support unit configured to detachably support the coating liquid pan and slidably supports the coating liquid pan; a positioning unit configured to position the coating liquid pan attached to the support unit at an attachment position; and a relative movement unit configured to relatively moves the support unit and the roller. When the support unit is located at an immersion position, a part of the roller is immersed in the coating liquid. When the support unit is located at a retraction position, the coating liquid pan is slidably supported without contact with the roller. | 01-23-2014 |
| 20140345522 | HIGH-ENERGY ION IMPLANTER - A high-energy ion implanter includes: a beam generation unit that includes an ion source and a mass spectrometer; a radio frequency multi-stage linear acceleration unit; a deflection unit that includes a magnetic field type energy analysis device for filtering ions by a momentum; a beam transportation line unit; and a substrate processing/supplying unit. In this apparatus, an electric field type final energy filter that deflects a high-energy scan beam in the vertical direction by an electric field is inserted between the electric field type beam collimator and the wafer in addition to the magnetic field type mass spectrometer and the magnetic field type energy analysis device as momentum filters and the radio frequency multi-stage linear acceleration unit as a velocity filter. | 11-27-2014 |
| 20150144059 | MICROFLUIDIC SURFACE PROCESSING DEVICE AND METHOD - The present invention is notably directed to a microfluidic surface processing device including a microfluidic probe head with at least one aperture, on a face, including at least an outlet aperture; and a surface processing structure extending outward and perpendicular with respect to the face, the processing structure being further dimensioned and located with respect to the outlet aperture such that it can intercept a flowpath of liquid dispensed via the outlet aperture. The present invention is further directed to related apparatuses and methods. | 05-28-2015 |
| 118689000 | Concentration of coating material in carrier medium | 3 |
| 20120272898 | METHOD AND APPARATUS FOR GAS DELIVERY - Methods and apparatus for gas delivery are disclosed herein. In some embodiments, a gas delivery system includes an ampoule for storing a precursor in solid or liquid form, a first conduit coupled to the ampoule and having a first end coupled to a first gas source to draw a vapor of the precursor from the ampoule into the first conduit, a second conduit coupled to the first conduit at a first junction located downstream of the ampoule and having a first end coupled to a second gas source and a second end coupled to a process chamber, and a heat source configured to heat the ampoule and at least a first portion of the first conduit from the ampoule to the second conduit and to heat only a second portion of the second conduit, wherein the second portion of the second conduit includes the first junction. | 11-01-2012 |
| 118690000 | During application | 1 |
| 20120073499 | COATING DEVICE - A coating device includes a reaction device, a mixing device, a deposition device, a first switching device and a second switching device. The reaction device defines a reaction chamber. The mixing device is connected to the reaction device and defines a mixing chamber that communicates with the reaction chamber. The deposition device is connected to the mixing device and defines a deposition chamber that communicates with the mixing chamber. The first switching device is configured to communicate the reaction chamber and the mixing chamber and separate the reaction chamber from the mixing chamber. The second switching device is configured to communicate the mixing chamber and the deposition chamber and separate the mixing chamber from the deposition chamber. | 03-29-2012 |
| 118691000 | Photoelectric sensor | 1 |
| 20140137799 | DEPOSITION APPARATUS AND METHOD OF FORMING THIN FILM - A deposition apparatus and a method of forming a thin film are provided. The deposition apparatus includes a reaction gas supply unit supplying a reaction gas, a buffer unit temporarily storing the reaction gas supplied from the reaction gas supply unit, and a deposition unit forming a thin film by using the reaction gas supplied from the buffer unit. | 05-22-2014 |
| 118692000 | Pressure responsive | 8 |
| 20080230005 | Enclosures for and Installations Comprising Curing Means - An openable enclosure for use in association with an enclosed work-area defining a workspace provided with application means for applying a curable composition such as a UV curable composition to a workpiece, the enclosure comprising an openable cover which is operable between open and closed conditions respectively to open and close the enclosure to an interior of the work-area, the enclosure defining a space within which a radiation source is removably stowed, and the cover having locking means to permit of locking the cover in the closed condition. | 09-25-2008 |
| 20100012027 | Device for injecting liquid precursors into a chamber in pulsed mode with measurement and control of the flowrate - A device for injecting into a chamber at least one precursor comprises at least one tank containing the precursor, means for keeping the tank at a higher pressure than that of the chamber, and at least one injector connected to the tank. It also comprises a device for measuring the mean flowrate, arranged between the tank and the injector and a mechanical low-pass filter arranged between the device for measuring the flowrate and the injector. The control circuit comprises outputs respectively connected to the tank and to the injector for controlling said pressure and/or the injection time and/or the injection frequency, in such a way as to periodically inject droplets of precursor into the chamber. The control circuit also comprises a regulation input connected to the output of the device for measuring the mean flowrate, in such a way as to control said pressure and/or the injection time and/or the injection frequency in order to keep the mean flowrate at a predetermined set-point. | 01-21-2010 |
| 20100083898 | Substrate processing apparatus - There are provided an inner tube in which a substrate is stored; an outer tube surrounding the inner tube; a gas nozzle disposed in the inner tube; a gas ejection hole opened on the gas nozzle; a gas supply unit supplying gas into the inner tube through the gas nozzle; a gas exhausts hole opened on the side wall of the inner tube; and an exhaust unit exhausting a space between the outer tube and the inner tube and generating a gas flow in the inner tube toward the gas exhaust hole from the gas ejection hole, wherein the side wall of the inner tube is constituted, so that a distance between an outer edge of the substrate and the gas exhaust hole is set to be longer than a distance between the outer edge of the substrate and the gas ejection hole. | 04-08-2010 |
| 20100162952 | Substrate processing apparatus - Disclosed is a substrate processing apparatus, including a reaction tube to process a substrate therein, wherein the reaction tube includes an outer tube, an inner tube disposed inside the outer tube, and a support section to support the inner tube, the inner tube and the support section are made of quartz or silicon carbide, and a shock-absorbing member is provided between the support section and the inner tube. | 07-01-2010 |
| 20100192854 | GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES - A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero. | 08-05-2010 |
| 20110030616 | PRESSURE-ACTUATED MEMBER, IN PARTICULAR PAINT PRESSURE CONTROLLER OR COATING AGENT VALVE - A pressure-actuated member, for example a paint pressure controller or a coating agent valve, for influencing a mean coating agent pressure of a coating agent to be applied in a painting system, is disclosed. An exemplary pressure-actuated member may comprise a component, which is subjected directly to the coating agent during operation and is mobile and/or can be deformed to influence the pressure. Examplary components subjected to the coating agent may at least partially comprise a ceramic material in order to achieve a longer service life. | 02-10-2011 |
| 20120085282 | SUBSTRATE COATING DEVICE - A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater. | 04-12-2012 |
| 20140283745 | ION IMPLANTATION APPARATUS AND METHOD OF CLEANING ION IMPLANTATION APPARATUS - An ion implantation apparatus in which a fluorine compound gas is used as a source gas of an ion source, includes a vacuum chamber into which the source gas is introduced; an introduction passage connected to the vacuum chamber and configured to introduce into the vacuum chamber a cleaning gas containing a component that reacts with the fluorine compound deposited inside the vacuum chamber so as to generate a reactant gas; a delivery device configured to forcibly introduce the cleaning gas into the introduction passage; a first adjustment device configured to adjust an amount of gas flow in the introduction passage; an exhausting passage connected to the vacuum chamber and configured to forcibly exhaust the reactant gas along with the cleaning gas; and a second adjustment device configured to adjust an amount of gas flow in the exhausting passage. | 09-25-2014 |
| 118693000 | Means to raise coating material to a predetermined level inside an enclosed container | 1 |
| 20090288598 | Doctor blade supply system with intelligent viscosity logic - A supply system for a chambered doctor blade assembly makes possible the sequential use of water-based and non-water-based coating materials through automated functions programmed in a PLC that controls the system. A pair of pneumatically driven diaphragm pumps serve as supply pump and return pump between the doctor blade chamber and a coating reservoir A PLC controls the pulse rate of pneumatic pressure to the pumps to control the rate of flow of the coating material into, and out of the doctor blade chamber. An ultrasonic sensor mounted detects the liquid level in the trough collection area. The PLC is programmed to modify the pulse rate of the supply pump and return pump to maintain the liquid level in the trough collection area above the drain thereof and below the maximum tolerance. | 11-26-2009 |
| 118694000 | Level of supply | 8 |
| 20100018461 | SYSTEM FOR COATING A PRINTING MATERIAL WITH A FLUID - A system for coating a printing material with a fluid includes a printing press. The printing press includes a metering apparatus for metering the fluid, which is disposed within the printing press, an intermediate storage container for the intermediate storage of the fluid, which is disposed within the printing press, and a first delivery pump for delivering the fluid from the intermediate storage container to the metering apparatus, which first delivery pump is disposed within the printing press. The metering apparatus, the intermediate storage container and the first delivery pump together form a circuit. A supply storage container stores the fluid and a second delivery pump delivers the fluid from the supply storage container to the intermediate storage container. | 01-28-2010 |
| 20100212589 | POWDER SPRAYCOATING CONTROL SYSTEM AND ITS COMBINATION WITH POWDER FEEDING DEVICE OR WITH POWDER SPRAYCOATING DEVICE - A powder spraycoating control system and its combination with a powder pump or with a powder spraycoating unit. The control system contains an controller programmed to alternatingly operate a powder spraycoating unit in turn containing an injector serving as the powder pump or a powder spraycoating unit containing a dense phase powder pump serving as the powder pump. | 08-26-2010 |
| 20100300354 | LIQUID CRYSTAL DISPENSING SYSTEM AND METHOD OF DISPENSING LIQUID CRYSTAL MATERIAL USING SAME - A liquid crystal dispensing system includes a container to contain liquid crystal to be dispensed, a discharge pump to receive the liquid crystal from the container and to discharge the liquid crystal, a nozzle to dispense the liquid crystal discharged from the discharge pump onto a substrate, and a control unit to control a dispensing amount of liquid crystal discharged from the discharge pump and to compensate the dispensing amount when the dispensing amount of liquid crystal exceeds a limitation value. | 12-02-2010 |
| 20110000431 | INDUSTRIAL VAPOUR GENERATOR FOR THE DEPOSITION OF AN ALLOY COATING ONTO A METAL STRIP - The invention relates to a vapour generator for the deposition of a metal coating onto a substrate ( | 01-06-2011 |
| 20110011337 | IMAGE FORMING APPARATUS - An image forming apparatus including a medium feeding unit to supply a print medium, a medium coating assembly to coat the print medium with a coating liquid, and an image forming unit to form an image on the coated print medium, the medium coating assembly including a container to store the coating liquid, a coating unit to coat the print medium with the coating liquid, a channel to guide the coating liquid to move between the container and the coating unit, and a controller to selectively control the coating liquid to be supplied from the container to the coating unit and to be recovered from the coating unit to the container through the same channel. | 01-20-2011 |
| 20110107965 | Device For Imparting Gradations Of Tint Density On A Plastic Ophthalmic Lens - A device for imparting a gradation of tint density on an ophthalmic or optical lens is described. This gradient-tinting device utilizes both vertical movement and rotation about the vertical axis of the lens as it moves into a tinting solution. | 05-12-2011 |
| 20110107966 | ELECTROSTATIC COATING APPARATUS - A current sensor for detecting a full return current is connected to a high voltage generator. A leakage current detector including current sensors for detecting a leakage current is provided at the surface of the cover of a coating machine, air passages and a paint passage. Based on current detection values obtained by the current sensors, a high voltage control unit controls a power supply voltage control unit and a high voltage to be output from the high voltage generator can be raised or dropped. By employing the current detection values, the high voltage control unit can identify and provide notification of a location where the leakage current is increased and the insulation is deteriorated, and can request an operator to perform maintenance for the pertinent location. Further, upon occurrence of the insulation being deteriorated, the high voltage control unit can stop the high voltage supply. | 05-12-2011 |
| 20110315078 | COATING SYSTEM - A coating system includes a housing, a coating umbrella, a lift driver, a target material source, and a control device. The housing includes a ceiling and a floor. The coating umbrella is configured for receiving a number of workpieces and is suspended from the ceiling. The lift driver is positioned on the floor of the housing and includes a cylinder and a supporting board connected to the cylinder. The cylinder capable of raising or lowering the supporting board in the housing. The target material source is supported on the supporting board and includes a crucible for receiving a target material. The control device is received in the housing and is electrically connected to the lift driver to control the movement of the lift driver to maintain the distance between the coating umbrella and the target material unchanged. | 12-29-2011 |
