| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 073100580 | Vacuum | 6 |
| 20090064756 | VACUUM GAUGE CALIBRATION APPARATUS CAPABLE OF CALIBRATING AND TESTING WITHOUT DISPLACEMENT AND OPERATING METHOD THEREOF - The present invention provides a vacuum gauge calibration apparatus capable of calibrating and testing a vacuum gauge without displacement or separation of the vacuum gauge, the vacuum gauge being attached to a vacuum device under operation together with developing a movable vacuum gauge calibration device, and an operating method thereof. According to the present invention, there is provided an apparatus for calibrating and testing a vacuum gauge to be calibrated without displacement, the vacuum gauge being connected to a vacuum device, the apparatus comprising: a vacuum shut-off valve for opening and closing a piping for connecting the vacuum device to the to-be-calibrated vacuum gauge; and a movable vacuum gauge calibration device connected to the to-be-calibrated vacuum gauge, wherein the movable vacuum gauge calibration device includes: a reference vacuum gauge, a vacuum connection valve, a vacuum chamber, a gate valve, and an exhaust device which are connected to the to-be-calibrated vacuum gauge side in series; a gas supply source connected to the vacuum chamber for generating pressure in the vacuum chamber; a leak valve for controlling gas flow in the gas supply source and supplying the gas the vacuum chamber; and a vacuum gauge for the vacuum chamber for measuring vacuum pressure in the vacuum chamber. | 03-12-2009 |
| 20090173136 | METHOD AND APPARATUS FOR THE DETECTION OF LEAKS - Disclosed is a method for detecting a leak gas in a flushing device ( | 07-09-2009 |
| 20100107723 | Calibration Utility for Non-Linear Measurement System - Methods and apparatuses are provided for calibrating a vacuum component of a phacoemulsification system at different elevations. The design comprises running a vacuum component to be calibrated at an elevation; determining a maximum vacuum pressure available at the elevation; determining a range of vacuum pressure available from running the vacuum component at the elevation; calibrating the vacuum component based at least in part on a the maximum vacuum pressure available and the range of vacuum pressure available. The design also comprises a to be calibrated vacuum component; a pressure delivery device; an altimeter configured to determine the elevation of the vacuum component; component reading hardware configured to read at least one measured value from the pressure sensing components of the vacuum component when exposed to at least one pressure value from the pressure delivery device; and a computer configured to correlate a plurality of measured values to the elevation. | 05-06-2010 |
| 20110252861 | MACHINE FOR PLASMA TREATMENT OF CONTAINERS COMPRISING AN INTEGRATED VACUUM CIRCUIT - A machine for plasma treatment of containers, including a chamber for receiving a container to be treated, the chamber connected to a primary vacuum circuit. A pressure sensor is connected to the chamber. There is a first mechanism for communicating the pressure sensor with the chamber; a secondary vacuum circuit dependent on the first circuit and connected to the pressure sensor; and second mechanism for communicating the pressure sensor with the secondary vacuum circuit. | 10-20-2011 |
| 20150323408 | REFERENCE LEAK GENERATING DEVICE AND ULTRA-FINE LEAK TESTING DEVICE USING SAME - There is provided a reference leak generating device capable of precisely generating an ultra-fine reference leak. The reference leak generating device adapted to be connected to an upstream side of a measurement chamber includes a chamber connected to the measurement chamber through an orifice or a porous plug having a molecular flow conductance C and a pressure to establish molecular flow conditions which are known in advance, and is characterized in that a pressure p | 11-12-2015 |
| 20160116361 | SYSTEM FOR WAFER-LEVEL TESTING OF MEMS PRESSURE SENSORS - A system for testing pressure sensors on a device wafer includes a tray for holding the device wafer. The tray includes a base having a surface, a spacer extending from the surface, and a tacky material disposed on the surface. The spacer holds the device wafer spaced apart from the surface of the base to form a chamber between the surface and the device wafer. A wafer chuck retains the tray and the device wafer under vacuum. The system further includes a nozzle and a seal element in fixed engagement with the nozzle. The seal element surrounds the outlet of the nozzle and is adapted for mechanical contact with the device wafer. An actuator is configured to place the nozzle and a diaphragm of one of the pressure sensors in proximity to one another, wherein a pneumatic pressure stimulus is applied to the diaphragm via an outlet of the nozzle. | 04-28-2016 |
