Entries |
Document | Title | Date |
20080216414 | LASER CUT ABRASIVE ARTICLE, AND METHODS - Abrasive articles, and methods of making abrasive articles by using a laser to convert (e.g., cut) at least a portion of the abrasive coating to form the abrasive article. The method includes laser propagation impinging on the abrasive back side (opposite the abrasive coating) and progressing through to the abrasive side. Such a process inhibits ridging effects around cut regions (e.g., openings) on the front side. | 09-11-2008 |
20080216415 | POST-CMP TREATING LIQUID AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME - Post-CMP treating liquids are provided, one of which includes water, an amphoteric surfactant, an anionic surfactant, a complexing agent, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Another includes water, polyphenol, an anionic surfactant, ethylene diamine tetraacetic acid, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Both of the treating liquids have a pH ranging from 4 to 9, and exhibit a polishing rate both of an insulating film and a conductive film at a rate of 10 nm/min or less. | 09-11-2008 |
20080222965 | BONDED ABRASIVE ARTICLE AND METHOD OF MAKING - A bonded abrasive article is provided which includes abrasive grains made of cubic boron nitride within a bond matrix including a silicate. The bonded abrasive further includes a reaction product at the interface between the abrasive grains and bond matrix comprising a transition metal nitride. | 09-18-2008 |
20080236050 | Cerium oxide powder, method for preparing the same, and CMP slurry comprising the same - Disclosed is cerium oxide powder for a CMP abrasive, which can improve polishing selectivity of a silicon oxide layer to a silicon nitride layer and/or within-wafer non-uniformity (WIWNU) during chemical mechanical polishing in a semiconductor fabricating process. More particularly, the cerium oxide powder is obtained by using cerium carbonate having a hexagonal crystal structure as a precursor. Also, CMP slurry comprising the cerium oxide powder as an abrasive, and a shallow trench isolation method for a semiconductor device using the CMP slurry as polishing slurry are disclosed. | 10-02-2008 |
20080250723 | Process and Apparatus For Treating Exhausted Abrasive Slurries For the Recovery of Their Reusable Components - Process for completely recovering the reusable components of an abrasive slurry used in slicing crystalline materials of silicon, quartz or ceramics when it becomes exhausted and enriched with undesired waste matter. The process consists of an initial centrifuge separation of the exhausted slurry as such and of a wet size-sorting treatment of the fraction containing the abrasive grains obtained from the centrifuge, carried out in a battery of hydrocyclones or centrifuges connected in series. The section for the recovery and purification of the abrasive grains comprises a multifunctional apparatus that performs all the required operations within a single pressure vessel. | 10-16-2008 |
20080271381 | Method for manufacturing stabilized polyacetal resin, stabilized polyacetal resin, stabilized polyacetal resin composition, and molded article of stabilized polyacetal resin - The present invention provides an agent to decompose instable terminal group, which is effective in a small adding amount, which sufficiently decreases the quantity of residual instable terminal group, and which generates very little limitation on the treatment method, the apparatus, and the use amount of the agent. Specifically, it provides a method for manufacturing stabilized polyacetal resin having the step of applying heat treatment to a polyacetal resin having an instable terminal group in the presence of an agent to decompose the instable terminal group, which agent is composed of a heterocyclic quaternary ammonium salt, thus decreasing the quantity of the instable terminal group. | 11-06-2008 |
20080271382 | Method of fabricating abrasive having sliding and grinding effects - An abrasive is fabricated to obtain sliding and grinding effects. In the abrasive, grinding particles are wrapped by a wrapping material. Various sizes and shapes of molds and micro components can be finely polished to obtain mirror-grade surfaces. | 11-06-2008 |
20080271383 | ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE - To polish polishing target surfaces of SiO | 11-06-2008 |
20080276543 | Alkaline barrier polishing slurry - The aqueous slurry is useful for chemical mechanical polishing a semiconductor substrate having a tantalum-containing barrier layer and copper interconnects. The slurry includes by weight percent, 0 to 5 oxidizing agent, 0.1 to 25 silica particles, 0.001 to 3 polyvinyl pyrrolidone, 0.02 to 5 weight percent imine barrier removal agent selected from at least one of formamidine, formamidine salts, formamidine derivatives, guanidine, guanidine derivatives, guanidine salts and a mixture thereof, 0.02 to 5 weight percent carbonate, 0.01 to 10 inhibitor for decreasing static etch of the copper interconnects, 0.001 to 10 complexing agent and balance water; and the aqueous slurry having a pH of 9 to 11. | 11-13-2008 |
20080289260 | IMPROVING GRINDING IN A ALUMINA EXTRACTION PROCESS - The present disclosure pertains to a method of improving the grinding of a bauxite containing slurry during the grinding stage of an alumina extraction process. Specifically, an effective amount of one or more non-ionic surfactants, polyglycols, polyglycol ethers, anionic surfactants, anionic polymers, or a combination thereof are added to said bauxite containing slurry during the grinding stage of an alumina extraction process to achieve an improved effect. | 11-27-2008 |
20080313967 | POLISHING PAD AND PRODUCTION METHOD THEREOF - There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as β-cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4′-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix. | 12-25-2008 |
20090019781 | Mixture article for cleaning superficially-adhered substances - A mixture article for cleaning superficially-adhered substances consists of colloid material (25 wt %˜60 wt %), resin (10 wt %˜20 wt %), abrasive powders (15 wt %˜30 wt %), stabilizer, fibers, and natural turpentine that are bonded together to form a mixture article having high density and high binding, cohesive and adhesive capacities as well wherein the natural turpentine has the property that can greatly reduce the manufacturing temperature in the processing of the mixture article and lower the emission of exhaust to fit to environmental protection benefit thereby. The abrasive powders are utilized to boost the suction power between the mixture article and a working surface so as to shovel up substances adhered onto the working surface thereon. Besides, the colloid material and the resin are equipped with the adhesion property to viscously grip the substances bonded onto the working surface so as to remove them there-from for cleaning purpose. | 01-22-2009 |
20090031636 | Polymeric barrier removal polishing slurry - The aqueous slurry is useful for chemical mechanical polishing a semiconductor substrate having copper interconnects. The slurry contains by weight percent, 0 to 25 oxidizing agent, 0.1 to 50 abrasive particles, 0.001 to 5 polyvinyl pyrrolidone, 0.00002 to 5 multi-component surfactant, the multi-component surfactant having a hydrophobic tail, a nonionic hydrophilic portion and an anionic hydrophilic portion, the hydrophobic tail having 6 to 30 carbon atoms and the nonionic hydrophilic portion having 10 to 300 carbon atoms, 0.001 to 10 inhibitor for decreasing static etch of the copper interconnects, 0 to 5 phosphorus-containing compound for increasing removal rate of the copper interconnects, 0.001 to 10 complexing agent formed during polishing and balance water. | 02-05-2009 |
20090056231 | Copper CMP composition containing ionic polyelectrolyte and method - The CMP compositions of the invention comprise not more than about 1 percent by weight of a particulate abrasive, a polyelectrolyte, which preferably has a weight average molecular weight of at least about 10,000 grams-per-mole (g/mol), a copper-complexing agent, and an aqueous carrier therefor. The polyelectrolyte can be an anionic polymer (e.g., an acrylate polymer or copolymer) or a cationic polymer (e.g., poly(2-[(methacryloyloxy)ethyl] trimethyl-ammonium halide). When an anionic polyelectrolyte is utilized, the copper-complexing agent preferably comprises an amino polycarboxylate compound (e.g., iminodiacetic acid or a salt thereof). When a cationic polyelectrolyte is utilized, the copper-complexing agent preferably comprises an amino acid (e.g., glycine). Preferably, the particulate abrasive comprises metal oxide such as titanium dioxide or silicon dioxide. Methods of polishing copper-containing substrates with the compositions are also disclosed. | 03-05-2009 |
20090064597 | Polishing Slurry and Polishing Material Using Same - Disclosed is a polishing slurry which enables to suppress damages to an under layer while securing an adequate polishing rate. The polishing slurry contains a resin (A) having an amide group and an organic resin (B). | 03-12-2009 |
20090077899 | Polishing Pad Containing Interpenetrating Liquified Vinyl Monomer Network With Polyurethane Matrix Therein - Provided is a polyurethane polishing pad. More specifically, the present invention provides a polyurethane polishing pad having an interpenetrating network structure of a vinyl polymer with a polyurethane matrix via radical polymerization and having no pores and gas bubbles. The polyurethane polishing pad having an interpenetrating network structure of a vinyl polymer exhibits uniform dispersibility and reduced changes in hardness of the urethane pad due to heat and slurry, thereby resulting in no deterioration of polishing efficiency due to abrasion heat and solubility in the slurry upon polishing, and also enables a high-temperature polishing operation. Further, according to the present invention, the interpenetrating network structure leads to an improved polishing rate and abrasion performance, thereby significantly increasing the service life of the polishing pad. | 03-26-2009 |
20090094900 | METHOD OF FORMING A POLYUREA POLYURETHANE ELASTOMER CONTAINING CHEMICAL MECHANICAL POLISHING PAD - A method of forming a chemical mechanical polishing pad includes providing a first reactant including an isocyanate functional polyurethane prepolymer at a temperature above about 60° C., providing a second reactant including a diamine at a temperature above about 100° C., impingement mixing the first reactant and the second reactant within an impingement mixer to begin formation of a polyurea polyurethane elastomer, wherein the mixing is at a ratio of the first reactant to the second reactant of about 3:1 to about 6:1, casting the polyurea polyurethane elastomer that is formed from the mixed first and second reactants; and forming the polyurea polyurethane elastomer into chemical mechanical polishing pad dimensions. The polyurea polyurethane elastomer may further be provided with surface grooves and can be used as a single layer pad or formed into various stacked pad arrangements. | 04-16-2009 |
20090100764 | Composition for removing photoresist layer and method for using it - A composition for removing a photoresist layer and a method for using it are disclosed. The composition comprises a chemical portion which includes water and chemical constituents dissolving or softening the photoresist layer and a mechanical portion which is abrasive particles. Using the composition and the method according to the present invention can decrease the conventional two steps of removing a photoresist layer process to one step, thereby simplifying the procedure, shortening the removing time and reducing the cost. The chemical constituents in the composition according to the present invention are of low toxicity and flammability and the amount used is small, which makes it more friendly with the environment and decreases the expense of disposing the waste. | 04-23-2009 |
20090133336 | POLISHING SLURRY, METHOD OF PRODUCING SAME, AND METHOD OF POLISHING SUBSTRATE - Disclosed is a polishing slurry, particularly, a slurry for chemical mechanical polishing, which is used in a chemical mechanical polishing process for flattening a semiconductor laminate. More particularly, the present invention provides a method of producing a slurry which has high removal selectivity to a nitride layer used as a barrier film in a shallow trench isolation CMP process needed to fabricate ultra highly integrated semiconductors of 256 mega D-RAM or more (Design rule of 0.13 μm or less) and which decreases the occurrence of scratches on a flattened surface, and a method of polishing a substrate using the same. | 05-28-2009 |
20090139149 | Abrasive Grain Based on Melted Spherical Corundum - An abrasive grain made from melted spherical corundum where the abrasive grain consists of a spherical corundum core, coated with an encircling layer of a binder and fine-grained abrasive solid particles. | 06-04-2009 |
20090145044 | ABRASIVE ARTICLES AND METHODS FOR MAKING SAME - The disclosure is directed to an abrasive article. The abrasive article includes a backing having a major surface and a make layer. The make layer is disposed over the major surface of the backing. The make layer includes abrasive grains and a photoinitiator that increases the depth of ultraviolet cure of the make layer by at least about 50% compared to bis(2,4,6-trimethyl benzoyl) phenyl phosphine oxide. The disclosure is also directed to a method for forming the abrasive article. | 06-11-2009 |
20090260298 | Cryogenic Treatment Systems and Processes for Grinding Wheels and Bonded Abrasive Tools - Embodiments of the invention can provide systems and methods for treating grinding wheels and bonded abrasive tools. A process in accordance with an embodiment of this invention is a cryogenic thermal cycling process for grinding wheels and bonded abrasive tools. Grinding wheels and bonded abrasive tools treated by cryogenic thermal cycling processes in accordance with embodiments of this invention can exhibit improved performance and service life during comparison testing against untreated tools. | 10-22-2009 |
20090266002 | POLISHING PAD AND METHOD OF USE - Polishing pads of varying compositions for use in chemical mechanical planarization (CMP) and methods of manufacturing and using such pads. Examples of such polishing pads include two phases, one of which may be a high modulus, low wear material that maintains a stable texture when subject to a conditioning process (e.g., polyoxymethylene, Delrin, polyamide-imide (Torlon), polyetheretherketone (PEEK), and/or polysulfone), and the other of which may be a material having a polishing ability (e.g., a polyurethane material). | 10-29-2009 |
20090307986 | Polishing composition and making method thereof for polishing a substrate - A polishing composition and making method thereof is provided, in which a plurality of abrasive particles, organic resins, and an initiator are mixed and stirred into slurry. These abrasive particles are dispersed uniformly in the slurry. Then, the slurry is poured into a mold with a predefined shape. The slurry is formed into the polishing composition in the corresponding predefined shape. Thus, the polishing composition contains higher concentration of abrasive particles which can quickly polish a substrate, and the surface of the substrate will not easily be scratched from the polishing composition. | 12-17-2009 |
20090320379 | Chemical Mechanical Polishing Pads Comprising Liquid Organic Material Encapsulated in Polymer Shell and Methods For Producing The Same - There is provided a chemical mechanical polishing (CMP) pad including a core of a polymer shell encapsulating a liquid organic material having one of a boiling point and a decomposition point of 130° C. or more in a polymer matrix, the CMP pad having open pores formed by the core on a polishing surface thereof, and a method of producing the CMP pad. The CMP pad having a high hardness and a high density improves polishing efficiency and flatness of a wafer and maintains a uniform size of the core, thereby producing pads having high polishing efficiency and stable polishing performance. | 12-31-2009 |
20100037530 | SYNTHETIC GRINDING STONE - Disclosed is a synthetic grinding stone used for polishing of silicon wafer, which is composed of a structure comprising cerium oxide fine particles as abrasive grain, a resin as a binder, a salt as a filler and a nano diamond as an additive. This synthetic grinding stone is characterized in that the purity of the cerium oxide is not less than 60% by weight, the content of the salt as a filler is not less than 1% but not more than 20%, the volume content of the nano diamond as an additive is not less than 0.1% but less than 20% relative to the total volume of the structure, and the porosity as the volume fraction relative to the total volume of the structure is less than 30%. | 02-18-2010 |
20100043301 | Water-based cutting fluid having ceramic powder - A water-based cutting fluid includes a water-soluble polymer dissolved in water and ceramic powder dispersed in the water. The cutting fluid further includes water glass. Further, the water-soluble polymer is one selected from a group consisting of polyvinyl alcohol (PVA), cellulose, methyl cellulose, carboxymethyl cellulose (CMC), starch, or a combination thereof. | 02-25-2010 |
20100107508 | ACID-RESISTANT FILAMENTS FOR INDUSTRIAL APPLICATION AND BRUSH WITH SAME - The present invention relates to a brush filament for industrial applications and a brush made with the same. The brush filament comprises a matrix resin, a hydrolytic stabilizer and/or an acid-absorbing agent, and an antioxidant. The brush filament of the invention is suitable for industrial applications, in particular, for grinding, polishing and cleaning of marbles and/or metals after they have been cut. | 05-06-2010 |
20100107509 | Coated abrasive article for polishing or lapping applications and system and method for producing the same. - An abrasive slurry, abrasive article, and method is provided for forming an abrasive coating on a surface of a backing. The abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the continuous liquid phase, and a second discontinuous phase of binder precursor particles dispersed in the continuous liquid phase, so that the continuous liquid phase carries the first and second discontinuous phases. A coated abrasive article is formed by coating the abrasive slurry onto the surface of the backing, and then removing the continuous phase. | 05-06-2010 |
20100146864 | Nodular Silica Sol and Method of Producing the Same - A novel nodular silica sol adapted to use as a polishing material for polishing, for instance, CMP. | 06-17-2010 |
20100154316 | ABRASIVE ARTICLE WITH IMPROVED PACKING DENSITY AND MECHANICAL PROPERTIES AND METHOD OF MAKING - An abrasive article with improved packing density and mechanical properties and method of making are disclosed. A method of making an abrasive mix with improved processability facilitates improved packing density, resulting in abrasive articles with improved mechanical properties. | 06-24-2010 |
20100162632 | BONDED ABRASIVE TOOL AND METHOD OF FORMING - A bonded abrasive tool includes a bonded abrasive body having a bond matrix material comprising an organic bond material, abrasive grains contained within the bond matrix material, and chopped fiber bundles within the bond matrix material. The tool further has a porosity within the bonded abrasive body, wherein a majority of the porosity comprises pores surrounding the chopped fiber bundles. | 07-01-2010 |
20100180512 | GLASS FIBER STRUCTURE DESIGNED TO REINFORCE BONDED ABRASIVE ARTICLES - The invention relates to a structure based on glass fiber coated with a resin composition designed to reinforce bonded abrasive articles, the resin composition being characterized in that it comprises the following constituents in the proportions indicated, expressed in percentage by weight of solid matter:
| 07-22-2010 |
20100180513 | METHOD FOR IMPROVING MECHANICAL PROPERTIES OF POLYMER PARTICLES AND ITS APPLICATIONS - A method for improving the mechanical hardness of polymer particles is provided, the method comprising subjecting the polymer particles to a thermal cycle of heating and subsequently cooling. The method is applicable for use with combinations of preferably three monomers, the monomers having hydrophilic and hydrophobic groups in their polymer chain in order to achieve preferential orientation of the polymer chains in a polar solvent after applying the heating cycles of the invention (for example, but not limited to, polymethylmethacrylate and polystyrene based terpolymers and copolymers). Polymeric abrasives used in slurry compositions for polishing copper and their use in a chemical mechanical polishing method are also provided. | 07-22-2010 |
20100192472 | ABRASIVE COMPOUNDS FOR SEMICONDUCTOR PLANARIZATION - A polishing slurry for semiconductor planarization containing cerium oxide particles and water, wherein the content of the cerium oxide particles having a diameter of 3 μm or more is 500 ppm or less (weight ratio) in a solid, preferably 100 ppm or less and it is more preferable that D99 (99% by volume of the whole particles in polishing slurry) of the cerium oxide particles is 1 μm or less. The polishing slurry can reduce the generation of scratches, and can polish a surface of the semiconductor substrate in the wiring formation process of semiconductor device precisely at a high speed. | 08-05-2010 |
20100242374 | Polishing Composition and Polishing Method - In a polishing composition, the concentration of one of either sodium ions or acetate ions is 10 ppb or less, or the concentrations of sodium ions and acetate ions are 10 ppb or less. The polishing composition preferably contains a water soluble polymer such as hydroxyethylcellulose, an alkali such as ammonia, and abrasive grains such as colloidal silica. The polishing composition is mainly used in polishing of the surfaces of semiconductor wafers such as silicon wafers, especially used in finish polishing of the surfaces of such wafers. | 09-30-2010 |
20100251624 | PLASTIC SOFT COMPOSITION FOR POLISHING AND FOR SURFACE PROTECTIVE MATERIAL APPLICATION - A plastic soft composition is formed of soft base material constantly provided with plasticity, porous fine particles for polishing contained in the base material, and the like, and a polishing process and a coating process are performed to a painted surface and the like using the plastic soft composition. The fine particles for polishing are impregnated with a coating agent (a surface protective agent) added with an activator which is emulsified by contact with water, and the coating agent is held in concave portions formed in the fine particles. Both polishing work and coating work are achieved by sliding the plastic soft composition on a painted surface by a palm pressure of a user. | 10-07-2010 |
20100251625 | ABRASIVE ARTICLES INCLUDING FUSED ZIRCONIA ALUMINA GRAIN HAVING AN IMPROVED SHAPE - A coated abrasive article includes a backing and fused alumina-zirconia abrasive grains attached to the backing with a binder. The fused alumina-zirconia abrasive grains include between about 35 wt % and about 45.5 wt % ZrO | 10-07-2010 |
20100269416 | Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects - A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized. | 10-28-2010 |
20100269417 | TREATMENT OF POLISHING PAD WINDOW - A window of solid light-transmissive polymer is formed in a polishing pad, and at least one surface of the window is treated to increase the smoothness of the at least one surface. | 10-28-2010 |
20110005142 | PROCESS FOR PRODUCING GEL-LIKE ABRASIVE MATERIAL AND GEL-LIKE ABRASIVE MATERIAL - An abrasive that can impart a mirror finish, glossiness, or the like to a surface of a workpiece by blasting is provided. A crosslinked polyrotaxane compound having a network structure where crosslinking points are circular molecules of polyrotaxane and also having abrasive grains dispersedly mixed therein is obtained by causing chemical bonding between the circular molecules of the polyrotaxane in a state where the abrasive grains and the polyrotaxane are mixed. Then, the crosslinked polyrotaxane compound is granulated to a predetermined grain diameter to obtain a gel-like abrasive where a part of the dispersedly mixed abrasive grain is exposed at the surface. By using the thus-obtained gel-like abrasive in blasting by projecting the abrasive at an angle tilted with respect to a surface of a workpiece, mirror finishing or the like is possible without making the surface of the workpiece pearskin-like. | 01-13-2011 |
20110011007 | POLISHING MATERIAL HAVING POLISHING PARTICLES AND METHOD FOR MAKING THE SAME - The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces. | 01-20-2011 |
20110061309 | Abrasive rotary cutting string manufacture and use - A method of producing an abrasive cutting string provides for coating a plastomeric string with a solution of a solvent and the plastomeric material of the string, applying an abrasive and removing the solvent to thereby provide a cutting string with excellent abrasive bind and string coverage, that can be manufactured at high speeds, and then used on a spool in the rotary cutting assembly of a string trimmer to incrementally feed at least one extremity of the abrasive string for rotation through a cutting swath. | 03-17-2011 |
20110113699 | AQUEOUS CUTTING FLUID AND SLURRY - An aqueous slicing fluid comprising (A) 0.01-20 wt % of a modified silicone is combined with abrasive grains to form an aqueous slicing slurry which has advantages of dispersion stability of abrasive grains, viscosity stability, and a higher machining accuracy. | 05-19-2011 |
20110113700 | FORMALDEHYDE-FREE ABRASIVE ARTICLE - An abrasive article which is made from a liquid resin composition containing no formaldehyde, which replaces the resol or urea-formaldehyde resin used as an adhesive in coated abrasives and the resol used as an impregnation resin in bonded abrasives. The liquid resin composition comprises a product that results from the oxidative cleavage of an unsaturated plant or animal oil, chosen from aldehydes, peroxides and mixtures of these compounds. The liquid resin composition can be used for the manufacture of coated and bonded abrasive articles. | 05-19-2011 |
20110162286 | COATED ABRASIVE BACKINGS WITH CLOTH TREATED WITH COLLOIDAL SILICON OXIDE - A cloth backing for an abrasive article is treated by combining a phenolic resin, a latex and a colloidal silicon oxide composition to prepare a colloidal formulation, which is then applied to the cloth backing and cured. Coated abrasive articles are formed by applying a make coat formulation to the treated cloth backing, applying an abrasive and then curing the make coat formulation. | 07-07-2011 |
20110162287 | DURABLE COATED ABRASIVE ARTICLE - An abrasive article comprising abrasive grains bonded with a binder comprising a matrix polymer and an amphiphilic block copolymer dispersed in the matrix polymer. The abrasive article can be a coated abrasive article, such as an engineered abrasive article, including a backing. The binder can bind the abrasive grains to the backing. | 07-07-2011 |
20110192093 | METHOD FOR PRODUCING SINTERED CUBIC BORON NITRIDE COMPACT - A method for producing a highly uniform and highly dense sintered cubic boron nitride compact having high hardness by sintering at a milder condition without a binder, is provided. The method includes deflocculating secondary particles in cubic boron nitride starting powders by dispersing the starting powders in a solution of a deflocculant; molding the green compact after removing the solution of the deflocculant from the starting powders; and then sintering the green compact in the presence of a supercritical fluid source in a supercritical state by pressing and heating the green compact together with the supercritical fluid source. The supercritical fluid source can be one or more selected from a group consisted of polyvinylidene chloride, polyvinyl chloride, polyethylene, polypropylene, polystyrene, a polyester and an ABS resin. In the sintering, the pressure is 5 GPa or higher, and the temperature is 1400° C. or higher. According to the method, a highly uniform and highly dense sintered cubic boron nitride sintered compact having high hardness, can be obtained. | 08-11-2011 |
20110203185 | PAINTED SURFACE TREATING COMPOSITION, A PAINTED SURFACE TREATING METHOD AND A PAINTED SURFACE PATCHING METHOD - This invention provides a painted surface treating composition which includes a dispersion medium and an abrasive dispersing in the dispersion medium, and said abrasive has an average particle diameter of 12-55 μm and a Mohs' hardness of 5.5-6. A painted surface treating method and a painted surface patching method using this painted surface treating composition are also provided. | 08-25-2011 |
20110203186 | POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE - The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and a method for manufacturing a magnetic disk substrate using the polishing composition. The polishing composition for a magnetic disk substrate includes colloidal silica having a Δ CV value of 0 to 10% and water. The Δ CV value is a difference (Δ CV=CV30−CV90) between a value (CV30) obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 30° according to a dynamic light scattering method by an average particle size based on the scattering intensity distribution and multiplying the result by 100 and a value (CV90) obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 90° according to the dynamic light scattering method by an average particle size based on the scattering intensity distribution and multiplying the result by 100. | 08-25-2011 |
20110252711 | METHOD OF PREPARING POLYCRYSTALLINE DIAMOND FROM DERIVATIZED NANODIAMOND - A method of forming a polycrystalline diamond comprises derivatizing a nanodiamond to form functional groups, and combining the derivatized nanodiamond with a microdiamond having an average particle size greater than that of the derivatized nanodiamond, and a metal solvent-catalyst. A polycrystalline diamond compact is prepared by adhering the polycrystalline diamond to a support, and an article such as a cutting tool may be prepared from the polycrystalline diamond compact. | 10-20-2011 |
20110252712 | METHOD OF MAKING A DIAMOND PARTICLE SUSPENSION AND METHOD OF MAKING A POLYCRYSTALLINE DIAMOND ARTICLE THEREFROM - A method of forming a substantially homogeneous suspension of nanodiamond particles and microdiamond particles is disclosed The method includes disposing a first functional group on a plurality of nanodiamond particles to form derivatized nanodiamond particles, and combining the derivatized nanodiamond particles with a plurality of microdiamond particles and a solvent to form a substantially homogeneous suspension of the derivatized nanodiamond particles and microdiamond particles in the solvent. A method of making an article is also disclosed. The method includes forming a superabrasive polycrystalline diamond compact by combining: a plurality of derivatized nanodiamond particles, a plurality of derivatized microdiamond particles having an average particle size greater than that of the derivatized nanodiamond particles, and a metal solvent-catalyst. The method also includes combining the polycrystalline diamond with a substrate comprising a ceramic. The method further includes removing a portion of a metal solvent-catalyst from the polycrystalline diamond compact by leaching. | 10-20-2011 |
20110252713 | DIAMOND PARTICLE MIXTURE - A substantially homogeneous particle mixture is disclosed. The mixture includes a plurality of derivatized nanodiamond particles comprising a plurality of first functional groups. The mixture also includes a plurality of microdiamond particles, wherein the derivatized nanodiamond particles and microdiamond particles comprise a substantially homogeneous particle mixture. The mixture may also include a plurality of third particles comprising nanoparticles not identical to the derivatized nanodiamond particles, or a plurality of microparticles not identical to the microdiamond particles, or a combination thereof, and the derivatized nanodiamond particles, derivatized microdiamond particles and third particles comprise the substantially homogeneous particle mixture. | 10-20-2011 |
20110296767 | BONDED ABRASIVE ARTICLE - A bonded abrasive article includes, on a total weight basis: 30 to 37 percent of ceramic-coated blue fused aluminum oxide particles; 30 to 37 percent of non-seeded sol-gel alumina-based abrasive particles, wherein the non-seeded sol-gel alumina-based abrasive particles are composed of crystallites of alpha alumina, magnesium alumina spinel, and rare earth hexagonal aluminate; a phenolic binder that comprises a reaction product of 8 to 12 percent by weight of curable novolac phenolic resin and 2.1 to 5.1 percent by weight of curable resole phenolic resin; 3 to 6 percent by weight of metal fibers having a length of 5 millimeters or less; 8 to 11 percent by weight of cryolite; and 0.1 to 0.3 percent by weight of electrically conductive particles. Methods of making and using the bonded abrasive article are also disclosed. | 12-08-2011 |
20120036789 | Abrasive Article for Use in Grinding of Superabrasive Workpieces - An abrasive article including a bonded abrasive having a body formed of abrasive grains contained within a bond material, wherein the body grinds a superabrasive workpiece having an average Vickers hardness of at least about 5 GPa at an average specific grinding energy (SGE) of not greater than about 350 J/mm | 02-16-2012 |
20120055096 | NON-ABRASIVE BACK COAT FOR COATED ABRASIVES - An abrasive article includes a backing including first and second major surfaces, an abrasive layer disposed over the first major surface, and a back coat layer disposed over the second major surface. The back coat layer includes a polymeric material and a fabric. | 03-08-2012 |
20120066980 | Hydrophilic and Hydrophobic Silane Surface Modification of Abrasive Grains - A surface-modified abrasive grain includes an abrasive grain as a substrate, and a film on the abrasive grain that includes a relatively hydrophilic silane component and a relatively hydrophobic silane component. The film can be a single film layer or multiple film layers, wherein a film layer most proximal to the abrasive grain has a predominately hydrophilic silane component, and a film layer more distal to the abrasive grain includes predominately a relatively hydrophobic silane component. Coated abrasive products and bonded abrasive products include the surface-modified abrasive grains. | 03-22-2012 |
20120117888 | Hollow Polymeric-Silicate Composite - The invention provides a plurality of polymeric particles embedded with silicate that include gas-filled polymeric microelements. The gas-filled polymeric microelements have a shell and a density of 5 g/liter to 200 g/liter. The shell having an outer surface and a diameter of 5 μm to 200 μm with silicate particles embedded in the polymer. The silicate particles have an average particle size of 0.01 to 3 μm. The silicate-containing regions are spaced to coat less than 50 percent of the outer surface of the polymeric microelements; and less than 0.1 weight percent total of the polymeric microelements is associated with i) silicate particles having a particle size of greater than 5 μm; ii) silicate-containing regions covering greater than 50 percent of the outer surface of the polymeric microelements; and iii) polymeric micro elements agglomerated with silicate particles to an average cluster size of greater than 120 μm. | 05-17-2012 |
20120167479 | Materials Processing Medium and Method - An abrasive element consisting substantially of a glass material that is at least partially devitrified. | 07-05-2012 |
20120174493 | ROBUST BINDER BONDED GRINDING WHEEL - An abrasive tool includes a matrix material and an abrasive grain contained within the matrix material. The matrix material includes a binder and an block copolymer. The block copolymer including a binder miscible block and a binder immiscible block. The binder immiscible block of the block copolymer can form toughening domains within the matrix material. A method of forming an abrasive tool includes blending a binder powder, an block copolymer powder, and an abrasive grain to form a blended powder, shaping the blended powder, and curing the blended powder. | 07-12-2012 |
20120227331 | ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE - To polish polishing target surfaces of SiO | 09-13-2012 |
20120279139 | Resin Bonded Abrasive - A superabrasive resin product includes a superabrasive grain component, an oxide component, and a continuous phase defining a network of interconnected pores. The oxide component consists of an oxide of a lanthanoid, and the continuous phase includes a thermoplastic polymer component. The superabrasive grain component and the oxide component are distributed in the continuous phase. | 11-08-2012 |
20120297692 | ABRASIVE ARTICLE FOR HIGH-SPEED GRINDING OPERATIONS - An abrasive article can include a bonded abrasive body having abrasive particles comprising microcrystalline alumina (MCA) contained within a bond material. In an embodiment, the bonded abrasive body has a porosity of at least about 42 vol % of the total volume of the bonded abrasive body. Additionally, in an embodiment, the bonded abrasive body is capable of grinding a workpiece comprising metal at a speed of at least about 60 m/s at a material removal rate of at least about 0.4 in | 11-29-2012 |
20120297693 | BONDED ABRASIVE TOOL AND METHOD OF FORMING - A bonded abrasive tool includes a bonded abrasive body having a bond matrix material comprising an organic bond material, abrasive grains contained within the bond matrix material, and chopped fiber bundles within the bond matrix material. The tool further has a porosity within the bonded abrasive body, wherein a majority of the porosity comprises pores surrounding the chopped fiber bundles. | 11-29-2012 |
20120311935 | ABRASIVE ARTICLES, METHOD FOR THEIR PREPARATION AND METHOD OF THEIR USE - Abrasive articles containing solid abrasive particles (A) selected from the group consisting of inorganic particles, organic particles and inorganic-organic hybrid particles (a1) having an average primary particle size of from 1 to 500 nm as determined by laser light diffraction and having electron donor groups (a | 12-13-2012 |
20130000209 | FUNCTIONALIZED MICROSCALE DIAMOND PARTICLES AND RELATED STRUCTURES AND METHODS - Methods of treating a plurality of particles comprise functionalizing a plurality of microscale diamond particles by covalently bonding one or more molecular groups selected from the group consisting of —OH functional groups, —COOH functional groups, —R—COOH functional groups, wherein R comprises alkyls, —Ph—COOH functional groups, wherein Ph comprises phenolics, polymers, oligomers, monomers, glycols, sugars, ionic functional groups, metallic functional groups, and organo-metallic functional groups to outer surfaces of at least some particles of the plurality of microscale diamond particles. A stability of the functionalized plurality of microscale diamond particles in dispersion is increased as compared to a plurality of microscale diamond particles that has not been functionalized. | 01-03-2013 |
20130000210 | ABRASIVE SEGMENT COMPRISING ABRASIVE AGGREGATES INCLUDING SILICON CARBIDE PARTICLES - An abrasive article can include an abrasive segment. The abrasive segment can have a body that includes a plurality of abrasive aggregates. In addition, the abrasive aggregates can include a plurality of silicon carbide particles bonded together by a binder material phase. The abrasive aggregates can be contained within a bond material that includes a magnesia-based cement. In an embodiment, the binder material phase can include a vitreous phase material and a crystalline phase material. In particular instances, the binder material phase can include a certain porosity. In another embodiment, the abrasive segment can be formed from a mixture of abrasive aggregates including silicon carbide and a magnesia-based bond material. | 01-03-2013 |
20130000211 | ABRASIVE ARTICLE AND METHOD OF MAKING - An abrasive article includes a bonded abrasive having a body made of abrasive grains contained within a composite bond material. The composite bond material can include an organic material and a metal material. The body can also include a filler material made of a superabrasive material. In an embodiment, the filler material can have an average particle size at least about 10 times less than an average particle size of the abrasive grains. | 01-03-2013 |
20130000212 | LIQUID PHASE SINTERED SILICON CARBIDE ABRASIVE PARTICLES - An abrasive article includes a bonded abrasive body having abrasive particles contained within a bond material. The abrasive particles include silicon carbide and are essentially free of carbon-based and boron-based sintering aid materials. In an embodiment, the bond material can include a phenolic resin. In another embodiment, the bonded abrasive body can include an oxide phase disposed interstitially between the silicon carbide abrasive particles. In an additional embodiment, the abrasive particles can consist essentially of silicon carbide and aluminum oxide in a ratio of silicon carbide to alumina of at least about 8:1. | 01-03-2013 |
20130008092 | Aggregate abrasives for abrading or cutting tools production - Aggregate abrasive grains ( | 01-10-2013 |
20130014445 | COATED ABRASIVE AGGREGATES AND PRODUCTS CONTAING SAME - Abrasive aggregates and fixed abrasive articles comprising formaldehyde-free polymer binder and a plurality of abrasive grains are provided that are particularly suitable for machining operations, in which abrasion is carried out to remove material and improve surface quality. Certain embodiments combine an abrasive grain, which can be in the form of microparticles, and a formaldehyde-free polymer binder, which can be in the form of a polymer resin and cross-linking agent. Optionally, the abrasive aggregate can contain a secondary cross-linking agent, or a functional filler, such as a grinding aid. | 01-17-2013 |
20130042536 | Method of manufacturing chemical mechanical polishing layers - A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of density defects in the polishing layers is minimized. | 02-21-2013 |
20130091778 | LIQUID RESIN COMPOSITION FOR ABRASIVE ARTICLES - The invention relates to a thermally curable liquid resin composition intended for manufacturing abrasives that comprises at least one epoxy resin comprising at least two epoxy groups and at least one reactive diluent, said composition having a viscosity, at 25° C., less than or equal to 7000 mPa·s. | 04-18-2013 |
20130111823 | COMPOSITE MATERIAL FOR FURTHER PROCESSING INTO SHEET-LIKE ABRASIVE PRODUCTS AND PROCESS FOR THE PRODUCTION THEREOF - The invention relates to an elastically deformable composite material suitable to be processed further into sheet-like abrasive products, comprising a sheet-like supporting base coated or impregnated with a prepolymer material which obtains thermosetting properties when thermally post-cured, or consisting of a coated or impregnated supporting base, characterized in that the supporting base comprises at least one layer of bonded fibers selected among inorganic fibers and organic synthetic fibers, if necessary mixed with natural fibers. Moreover, it relates to a method for the manufacture of the composite material. | 05-09-2013 |
20130125474 | Backingless Abrasive Article - An abrasive article includes an abrasive layer having an array of protrusions. The abrasive layer has a thickness not greater than about 500 mils. The abrasive article is free of a backing layer. | 05-23-2013 |
20130167447 | Near-Net Cutting Tool Insert - A method of making a near-net superhard material body includes preparing granules from a mixture of superhard powder, binders, and fluids, compacting the granules to form a soft green complex-shaped body, heating the soft green body in a furnace to form a hard green body free from residual binders, embedding one or more of the hard green bodies in a containment powder or a containment means and forming a pressure cell, sintering the cell at high pressure and high temperature, and removing the containment powder from the cell or removing the inserts from the containment means to reveal one or more near-net bodies. | 07-04-2013 |
20130219800 | Methods for Producing a Coated Abrasive Article for Polishing or Lapping Applications - Methods are provided for forming an abrasive coating on a surface of a backing. An abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the continuous liquid phase, and a second discontinuous phase of binder precursor particles dispersed in the continuous liquid phase, so that the continuous liquid phase carries the first and second discontinuous phases. A coated abrasive article is formed by coating the abrasive slurry onto the surface of the backing, and then removing the continuous phase. | 08-29-2013 |
20130232884 | LOW FREE FORMALDEHYDE PHENOLIC RESINS FOR ABRASIVE PRODUCTS - The present invention provides process for the manufacture of an aqueous resin composition comprising a phenolic formaldehyde (PF) resin, which process comprises the steps of: providing a formaldehyde and phenolic compound, reacting said compounds in a condensation reaction in the presence of a catalyst, after completion of the condensation reaction to react with free formaldehyde, determining the free formaldehyde content of the resin composition, adding a pre-calculated substantially stoichiometric amount of modifying compound containing a primary amine group to reduce the amount of free formaldehyde in the resin composition to less than 0.1 wt % (relative to the total weight of the aqueous resin composition), and optionally distillation of the reaction product. | 09-12-2013 |
20130247476 | Method Of Manufacturing Chemical Mechanical Polishing Layers - A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized. | 09-26-2013 |
20130247477 | Method Of Manufacturing Chemical Mechanical Polishing Layers Having a Window - A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized. | 09-26-2013 |
20130263520 | AQUEOUS RESIN COMPOSITION FOR ABRASIVE ARTICLES AND RESULTING ARTICLES - An aqueous polymer binder composition adapted for the manufacture of abrasive articles, such as coated abrasive articles, comprising at least one resin containing at least two azetidinium groups and at least one saccharide. The aqueous composition is formaldehyde-free and can further comprise proteins, starch grafted acrylic styrene, co-cross-linking agents, rheology modifiers, fillers, and hydrophobizing agents. | 10-10-2013 |
20130283702 | ABRASIVE PRODUCTS AND METHODS FOR FINE POLISHING OF OPHTHALMIC LENSES - A coated abrasive product including green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles and a nanoparticle binder, wherein the abrasive aggregates are dispersed within a polymer resin coating, and wherein the coated abrasive product is capable of polishing an optical component, including ophthalmic lenses without the need to apply an abrasive slurry. | 10-31-2013 |
20130298472 | Forming Alkaline-Earth Metal Oxide Polishing Pad - The invention involves a method of preparing an alkaline-earth metal oxide-containing polishing pad useful for polishing at least one of semiconductor, magnetic and optical substrates. The method includes introducing a feed stream of gas-filled polymeric micro elements into a gas jet, the polymeric microelements having varied density, varied wall thickness and varied particle size. The method passes the polymeric microelements in the gas jet adjacent a Coanda block, the Coanda block having a curved wall for separating the polymeric microelements with Coanda effect, inertia and gas flow resistance. Then it separates various alkaline earth metal oxide constituents from the curved wall of the Coanda block to clean the polymeric microelements. | 11-14-2013 |
20130298473 | Hollow Polymeric-Alkaline Earth Metal Oxide Composite - The invention provides a plurality of polymeric particles embedded with alkaline-earth metal oxide. The gas-filled polymeric microelements have a shell and a density of 5 g/liter to 200 g/liter. The shell has an outer surface and a diameter of 5 μm to 200 μm with the outer surface of the shell of the gas-filled polymeric particles having alkaline-earth metal oxide-containing particles embedded in the polymer. The alkaline-earth metal oxide-containing particles have an average particle size of 0.01 to 3 μm distributed within each of the polymeric microelements to coat less than 50 percent of the outer surface of the polymeric microelements. | 11-14-2013 |
20130305614 | ABRASIVE PRODUCTS HAVING FIBRILLATED FIBERS - An engineered coated abrasive product having a backing, a frontfill coat, a make coat, and/or a size coat, wherein at least one of the coats includes fibrillated fibers. The coated abrasive product is capable of improved inter-layer adhesion, retention of abrasive grains, and/or maintenance of abrasive grains in a more desirable orientation for grinding. | 11-21-2013 |
20130318883 | CUTTING TOOLS MADE FROM STRESS FREE CBN COMPOSITE MATERIAL AND METHOD OF PRODUCTION - An insert for a cutting tool and a method of making an insert are provided. The insert for a cutting tool may comprise a body and a substrate carrier. The body may have a top, a bottom, and a plurality of side walls connected to the top and the bottom. The body may comprise superhard particles in absence of a support. The substrate carrier may have a recess. The bottom and the sidewall of the body may be adapted to be affixed to the recess of the substrate carrier. | 12-05-2013 |
20140007513 | ABRASIVE ARTICLE AND METHOD OF FORMING - An abrasive article includes a substrate comprising an elongated body, a tacking layer comprising tin overlying the substrate, and a first type of abrasive particle comprising an agglomerated particle overlying the tacking layer. | 01-09-2014 |
20140020304 | Bonded Abrasive Tool and Method of Forming - A bonded abrasive tool includes a bonded abrasive body having a bond matrix material comprising an organic bond material, abrasive grains contained within the bond matrix material, and chopped fiber bundles within the bond matrix material. The tool further has a porosity within the bonded abrasive body, wherein a majority of the porosity comprises pores surrounding the chopped fiber bundles. | 01-23-2014 |
20140083018 | Method of manufacturing grooved chemical mechanical polishing layers - A method of manufacturing grooved polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of defects in the polishing layers are minimized. | 03-27-2014 |
20140090306 | SILICIC ESTER MODIFIED PHENOL/FORMALDEHYDE NOVOLAKS AND THEIR USE FOR THE PRODUCTION OF RESIN COATED SUBSTRATES - This invention relates to a resin preparable by reaction of a phenol/formaldehyde novolak with tetraethyl orthosilicate in a mass ratio above 28:1, wherein the phenol of the phenol/formaldehyde novolak is substituted or unsubstituted hydroxybenzene or a mixture of two or more such phenols, and to a particulate material coated with said resin. Said particles can be used e.g. in the shell molding process for the production of shell molds and shell cores; and as proppants for use in the hydraulic fracturing process. | 04-03-2014 |
20140182213 | ABRASIVE ARTICLES INCLUDING A BLEND OF ABRASIVE GRAINS AND METHOD OF FORMING SAME - An abrasive article comprising a backing material and an abrasive layer disposed on the backing material, wherein the abrasive layer comprises a blend of abrasive particles comprising a first plurality of abrasive particles and a second plurality of abrasive particles. | 07-03-2014 |
20140237905 | METHOD OF FORMING POLISHING SHEET - A chemical mechanical polishing article can be a single contiguous layer having a polishing surface, the layer being an elongated substantially rectangular sheet having a width and a length at least four times greater than the width. Forming a polishing article can include depositing a liquid precursor on a moving belt, at least partially curing the liquid precursor while on the moving belt to form a polishing layer, and detaching the polishing layer from the belt. | 08-28-2014 |
20140259960 | NONWOVEN PADS - A nonwoven, fibrous, article including a plurality of entangled fibers is provided. The fibers can have at least one of an anti-microbial agent or a plurality of abrasive particles. A binder material may bond the fibers to each other at points of crossing and contact between the fibers. The fibers may be made from post-consumer materials, post-industrial materials, heavy denier fibers, biodegradable materials, or heat resistant. | 09-18-2014 |
20140259961 | ELECTROSTATIC ABRASIVE PARTICLE COATING APPARATUS AND METHOD - A method of applying particles to a backing having a make layer on one of the backing's opposed major surfaces. The method including the steps of: supporting the particles on a feeding member having a feeding surface such that the particles settle into one or more layers on the feeding surface; the feeding surface and the backing being arranged in a non-parallel manner; and translating the particles from the feeding surface to the backing and attaching the particles to the make layer by an electrostatic force. | 09-18-2014 |
20140290147 | Abrasive Particles having Particular Shapes and Methods of Forming such Particles - A coated abrasive article comprising a backing, an adhesive layer disposed in a discontinuous distribution on at least a portion of the backing, wherein the discontinuous distribution comprises a plurality of adhesive contact regions having at least one of a lateral spacing or a longitudinal spacing between each of the adhesive contact regions; and at least one abrasive particle disposed on each adhesive contact region, the abrasive particle having a tip, and there being at least one of a lateral spacing or a longitudinal spacing between each of the abrasive particles, and wherein at least 65% of the at least one of a lateral spacing and a longitudinal spacing between the tips of the abrasive particles is within 2.5 standard deviations of the mean. | 10-02-2014 |
20140290148 | METHOD FOR MANUFACTURING ABRASIVE PAD - A method for manufacturing an abrasive pad may include steps of forming composite materials using solvent, resin and abrasive materials; forming a plurality of strips including said composite materials through an extruder, so that the abrasive materials protrude on a surface of each stripe; disposing said strips in a container to form an abrasive pad with a predetermined thickness before the strips are solidified; and pressing said abrasive pad to a desired thickness with a pressing device. different abrasive materials can be mixed in the resin and when the abrasive material is extruded to form the strips, a plurality of gaps are formed to generate better ventilation to avoid bacteria growth. Also, the abrasive pad in the present invention can be used in for either family or industry and the manufacturing method in the present invention can extend the lives of the abrasive pad. | 10-02-2014 |
20140298728 | CEMENTED CARBIDE COMPOSITE FOR A DOWNHOLE TOOL - A carbide composite for a downhole tool may be formed by depositing a first layer on a substrate, and a second layer at least partially adjacent to the first layer. The first and second layers may each include carbides, metal binders, organic binders, or a combination thereof. The first and second carbide layers may have a different particle size, particle shape, carbide concentration, metal binder concentration, or organic binder concentration from one another. | 10-09-2014 |
20140311044 | POLISHING FILM - The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO | 10-23-2014 |
20140318025 | HIGH-PERFORMANCE RESIN FOR ABRASIVE PRODUCTS - An abrasive product includes a plurality of abrasive particles and a resin cured with a polythiol group. A method of preparing the abrasive product includes contacting the plurality of abrasive particles with a curable composition that includes a resin and a polythiol group, and curing the curable composition to produce the abrasive product. A method of abrading a work surface includes applying an abrasive product to a work surface in an abrading motion to remove a portion of the work surface. A curable composition includes a formaldehyde resin and a polythiol group. A formaldehyde resin is crosslinked by a polythiol group. A method of crosslinking the formaldehyde resin includes reacting the polythiol group with the formaldehyde resin. | 10-30-2014 |
20140331567 | Abrasive Material Regeneration Method And Regenerated Abrasive Material - Abrasive material regeneration method regenerates a cerium oxide abrasive material from a used abrasive material slurry containing the cerium oxide abrasive material and resulting from grinding a grinding subject having silicon as the primary component, characterized by regenerating the abrasive material containing cerium oxide through: a slurry recovery step (A) for recovering an abrasive material slurry discharged from a grinder; an isolation/concentration step (B) for adding a magnesium salt as an inorganic salt to the recovered abrasive material slurry, aggregating the abrasive material under the condition that the pH value of the mother liquor converted to 25 DEG C is at least 6.5 and less than 10.0, and thus isolating and concentrating the abrasive material from the mother liquor; and an abrasive material recovery step (C) for recovering the isolated and concentrated abrasive material. | 11-13-2014 |
20140345202 | Microfiber Reinforcement for Abrasive Tools - A composition that can be used for abrasive processing is disclosed. The composition includes an organic bond material, an abrasive material dispersed in the organic bond material, and a plurality of microfibers uniformly dispersed in the organic bond material. The microfibers are individual filaments having an average length of less than about 1000 μm. Abrasive articles made with the composition exhibit improved strength and impact resistance relative to non-reinforced abrasive tools, and improved wheel wear rate and G-ratio relative to conventional reinforced tools. Active fillers that interact with microfibers may be used to further abrasive process benefits. | 11-27-2014 |
20150027062 | ABRASIVE ARTICLE AND METHOD OF MAKING - An abrasive article includes a bonded abrasive having a body made of abrasive grains contained within a composite bond material. The composite bond material can include an organic material and a metal material. The body can also include a filler material made of a superabrasive material. In an embodiment, the filler material can have an average particle size at least about 10 times less than an average particle size of the abrasive grains. | 01-29-2015 |
20150027063 | METHOD FOR FABRICATING PAD CONDITIONING TOOL - A method for fabricating a pad conditioning tool includes the steps: preparing a sapphire substrate with a specific orientation plane, wherein the specific orientation plane is selected from a group consisting of a-plane, c-plane, r-plane, m-plane, n-plane and v-plane; utilizing screen printing technique and a screen plate in order to transfer an image pattern such that upon solidifying one side surface of the sapphire substrate is imprinted with the image pattern; and performing an etching process on the side surface of the sapphire substrate such that the side surface is formed with a plurality of micro particles of specific structures. | 01-29-2015 |
20150027064 | Aqueous Resin Composition for Abrasive Articles and Resulting Articles - An aqueous polymer binder composition adapted for the manufacture of abrasive articles, such as coated abrasive articles, comprising at least one saccharide, at least one polycarboxylic organic acid, and at least one crosslinking catalyst. The aqueous composition is formaldehyde-free and can further comprise rheology modifiers, fillers, and hydrophobizing agents. | 01-29-2015 |
20150033636 | ABRASIVE ARTICLE AND METHOD OF FORMING SAME - An abrasive article may be configured to work titanium and may comprise a body including a bond material comprising an organic material. A first type of abrasive particles may be contained within the bond material and comprise fused alumina. The body may comprise a burnout modulus of rupture (MOR) of at least about 1.6 MPa. | 02-05-2015 |
20150052822 | LAPPING SLURRY HAVING A CATIONIC SURFACTANT - A lapping slurry and method of making the lapping slurry are provided. The lapping slurry comprises abrasive grains dispersed in a carrier. The carrier comprises water, ethylene glycol and between about 0.5 wt % to about 60 wt % surfactant. Abrasive particles are positively charged when dispersed in ethylene glycol having a pH in a range of from 5 to 9, as evidenced by zeta potentials. | 02-26-2015 |
20150059254 | POLYURETHANE POLISHING PAD - The invention provides a polishing pad suitable for planarizing semiconductor, optical and magnetic substrates. The polishing pad includes a cast polyurethane polymeric material formed from a prepolymer reaction of a polypropylene glycol and a toluene diisocyanate to form an isocyanate-terminated reaction product. The toluene diisocyanate has less than 5 weight percent aliphatic isocyanate; and the isocyanate-terminated reaction product having 5.55 to 5.85 weight percent unreacted NCO. The isocyanate-terminated reaction product being cured with a 4,4′-methylene-bis(3-chloro-2,6-diethylaniline) curative agent. The non-porous cured product having a tan delta of 0.04 to 0.10, a Young's modulus of 140 to 240 MPa and a Shore D hardness of 44 to 56. | 03-05-2015 |
20150101255 | METHOD OF MANUFACTURING ALUMINA-BASED ABRASIVE GRAIN AND ALUMINA-BASED ABRASIVE GRAIN MANUFACTURED THEREBY - Provided are a method of manufacturing an alumina-based abrasive grain, which includes preparing boehmite powder and activated alumina powder as starting materials, forming a sol by wet-blending and crushing the boehmite powder, the activated alumina powder, a solvent and a deflocculant, heating the sol at a first temperature which is higher than a room temperature and lower than a boiling point of the solvent and stirring the sol so as not to generate a precipitate, forming a gel by heating the sol at a second temperature higher than the first temperature at which a viscosity of the sol is increased and the sol becomes a paste, blending the gel with an organic solvent and performing wet crushing on the resulting mixture, preparing a powder by drying the wet-crushed gel, blending a binder and a solvent with the dried product, which is the powder, and molding the resulting mixture, calcining the molded product, performing dry crushing on the calcined product, and sintering the dry-crushed product to transform activated alumina and boehmite contained therein to an α-Al | 04-16-2015 |
20150101256 | Amino Resin Treated Backing Material, Coated Abrasive Articles Incorporating Same And Process Of Making The Same - This invention relates an amino resin treated backing material comprising a backing material impregnated with an amino resin comprising an alkylated trimethylol melamine obtained by reaction of trimethylol melamine with alkanol, coated abrasive article comprising the same, and methods of making and using said amino resin composition and coated abrasive articles. The claimed processes and systems related to use and manufacturing of coated abrasive articles are improved and cost effective. | 04-16-2015 |
20150107163 | POLYCRYSTALLINE DIAMOND COMPACT FABRICATED FROM SURFACE FUNCTIONALIZED DIAMOND PARTICLES - A superabrasive compact and a method of making the superabrasive compact are disclosed. A superabrasive compact may comprise a plurality of polycrystalline superabrasive particles made of surface functionalized superabrasive particle The surface functionalized superabrasive particles may have halogens or organic moiety instead of hydrogen. | 04-23-2015 |
20150121769 | Abrasive Regeneration Method - Technique to provide an abrasive regeneration method which, from a used abrasive slurry, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method uses an abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia and zirconium oxide. The abrasive regeneration involves a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, and an abrasive recovery step (C) for recovering the separated and concentrated abrasive. | 05-07-2015 |
20150128504 | COMPOSITIONS OF DIAMOND PARTICLES HAVING ORGANIC COMPOUNDS ATTACHED THERETO - A substance includes diamond particles having a maximum linear dimension of less than about 1 μm and an organic compound attached to surfaces of the diamond particles. The organic compound may include a surfactant or a polymer. A method of forming a substance includes exposing diamond particles to an organic compound, and exposing the diamond particles in the presence of the organic compound to ultrasonic energy. The diamond particles may have a maximum linear dimension of less than about 1 μm. A composition includes a liquid, a plurality of diamond nanoparticles dispersed within the liquid, and an organic compound attached to surfaces of the diamond nanoparticles. A method includes mixing a plurality of diamond particles with a solution comprising a liquid solvent and an organic compound, and exposing the mixture including the plurality of diamond nanoparticles and the solution to ultrasonic energy. | 05-14-2015 |
20150135602 | Abrasive Agent Manufacturing Method - Provided is a method for manufacturing an abrasive agent including a dispersant and also including cerium oxide as a main abrasive material component. The method involves: a step for recovering an abrasive agent component by salting out a spent abrasive material slurry by using a cation of an element of the first Group or second Group with an ionic radius of 80 pm to 160 pm in six-coordinate conversion, and solid-liquid separating the cerium oxide by coagulation and sedimentation; and a step for adding a dispersant including an anionic polymer to the abrasive agent component after the recovery. | 05-21-2015 |
20150143755 | METHOD OF MAKING A DIAMOND PARTICLE SUSPENSION AND METHOD OF MAKING A POLYCRYSTALLINE DIAMOND ARTICLE THEREFROM - A method of forming a polycrystalline diamond compact from_a substantially homogeneous suspension of nanodiamond particles and microdiamond particles is disclosed The method includes disposing a first functional group on a plurality of nanodiamond particles to form derivatized nanodiamond particles, and combining the derivatized nanodiamond particles with a plurality of microdiamond particles, metal solvent-catalyst particles and a solvent to form a substantially homogeneous suspension of these particles in the solvent. A method of making an article is also disclosed. The method includes forming a superabrasive polycrystalline diamond compact by combining: a plurality of derivatized nanodiamond particles, a plurality of derivatized microdiamond particles having an average particle size greater than that of the derivatized nanodiamond particles, and a metal solvent-catalyst. | 05-28-2015 |
20150306730 | CHEMICAL MECHANICAL POLISHING PAD WITH CLEAR ENDPOINT DETECTION WINDOW - A chemical mechanical polishing pad is provided containing a polishing layer having a polishing surface; and, an endpoint detection window; wherein the endpoint detection window comprises a reaction product of ingredients, comprising: an isocyanate terminated urethane prepolymer having 5.5 to 9.5 wt % unreacted NCO groups, wherein the isocyanate terminated urethane prepolymer is a reaction product of ingredients comprising: an aliphatic polyfunctional isocyanate; and, a prepolymer polyol; and, a curative system, comprising: 0 to 99 wt % of a difunctional curative; and, 1 to 100 wt % of an amine initiated polyol curative having at least one nitrogen atom per molecule and an average of at least three hydroxyl groups per molecule. Also provide are methods of making and using the chemical mechanical polishing pad. | 10-29-2015 |
20150306731 | CHEMICAL MECHANICAL POLISHING PAD - A chemical mechanical polishing pad is provided containing a polishing layer having a polishing surface, wherein the polishing layer comprises a reaction product of ingredients, including: an isocyanate terminated urethane prepolymer; and, a curative system, containing a high molecular weight polyol curative; and, a difunctional curative. | 10-29-2015 |
20150360346 | Resin Bonded Abrasive - A superabrasive resin product includes a superabrasive grain component, an oxide component, and a continuous phase defining a network of interconnected pores. The oxide component consists of an oxide of a lanthanoid, and the continuous phase includes a thermoplastic polymer component. The superabrasive grain component and the oxide component are distributed in the continuous phase. | 12-17-2015 |
20160068730 | METHOD FOR PRODUCTION OF PHOTOVOLTAIC WAFERS AND ABRASIVE SLURRY - The present invention relates to a method for production of photovoltaic wafers and abrasive slurries for multi-wire sawing of wafers for photovoltaic applications, and more specific to abrasive slurries which are easy to remove from the wafers after sawing, where the abrasive slurry comprises one part recycled abrasive slurry, an alkali in sufficient amount to provide a pH in the abrasive slurry mixture in the range from 6.0 to 9.0, and one part novel abrasive slurry in an amount sufficient to provide an ion content in the abrasive slurry mixture to provide an electric conductivity of less than 50 μS/cm. | 03-10-2016 |
20160107287 | POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS - Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. | 04-21-2016 |
20160107295 | POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS - Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. | 04-21-2016 |
20160114458 | POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS - Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. | 04-28-2016 |
20160136787 | ADVANCED POLISHING PAD MATERIALS AND FORMULATIONS - Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. | 05-19-2016 |
20160151888 | FLEXIBLE ABRASIVE FOR POLISHING SURFACES | 06-02-2016 |
20160184969 | ABRASIVE ARTICLE AND METHOD FOR MAKING SAME - An abrasive article includes a non-rigid carrier and a plurality of abrasive particles disposed in the carrier, the carrier is made of resin or rubber, a mass ratio of abrasive particles to carrier is about 1:1 to about 5:1. A method for making the abrasive articles includes providing a plurality of abrasive particles and a resin, mixing the rubber and the abrasive particles, heating the mixture to a fluid state, and pressing the mixture into a desired shape. After the mixed is cooled, the mixture is cut into small pellets, forming the abrasive articles. | 06-30-2016 |
20160184970 | COATED ABRASIVES HAVING A SUPERSIZE LAYER INCLUDING AN ACTIVE FILLER - The present invention relates generally to coated abrasive articles that include active filler particles in a supersize coat, a make coat, or combinations thereof, as well as methods of making and using said coated abrasive articles. | 06-30-2016 |
20160184977 | MANUFACTURING METHOD FOR GRINDING WHEEL - A method for manufacturing a grinding wheel which is formed by fitting a cylindrical grindstone chip including abrasive grains to a base metal formed to be of a columnar shape, comprises an adhesive agent applying step, a linear guide member arranging step for arranging and attaching a plurality of linear guide members on at least one of the outer peripheral surface of the base metal and the inner peripheral surface of the cylindrical grindstone chip, in parallel with a rotation axis of the base metal and with an equal distance separated in a circumferential direction from one another and a base metal and grindstone chip fitting step for fitting the base metal and the cylindrical grindstone chip to each other by relatively moving the base metal and the cylindrical grindstone chip, interposing therebetween the plurality of linear guide members arranged and attached with the equal distance separated from one another. | 06-30-2016 |
20160193716 | COMPRESSED POLYMER IMPREGNATED BACKING MATERIAL, ABRASIVE ARTICLES INCORPORATING SAME, AND PROCESSES OF MAKING AND USING | 07-07-2016 |
20160375552 | METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD - A method of forming a chemical mechanical polishing pad composite polishing layer is provided, including: providing a first polishing layer component of a first continuous non-fugitive polymeric phase having a plurality of periodic recesses; discharging a combination toward the first polishing layer component at a velocity of 10 to 300 msec, filling the plurality of periodic recesses with the combination; allowing the combination to solidify in the plurality of periodic recesses forming a second non-fugitive polymeric phase giving a composite structure; and, deriving the chemical mechanical polishing pad composite polishing layer from the composite structure, wherein the chemical mechanical polishing pad composite polishing layer has a polishing surface on the polishing side of the first polishing layer component; and wherein the polishing surface is adapted for polishing a substrate. | 12-29-2016 |
20160375553 | METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD - A method of forming a chemical mechanical polishing pad polishing layer is provided, including: providing a mold having a base with a negative of a groove pattern; providing a poly side (P) liquid component; providing an iso side (I) liquid component; providing a pressurized gas; providing an axial mixing device; introducing the poly side (P) liquid component, the iso side (I) liquid component and the pressurized gas to the axial mixing device to form a combination; discharging the combination from the axial mixing device at a velocity of 10 to 300 m/sec toward the base; allowing the combination to solidify into a cake; deriving the chemical mechanical polishing pad polishing layer from the cake; wherein the chemical mechanical polishing pad polishing layer has a polishing surface with the groove pattern formed into the polishing surface; and wherein the polishing surface is adapted for polishing a substrate. | 12-29-2016 |
20160375554 | METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD - A method of forming a chemical mechanical polishing pad composite polishing layer is provided, including: providing a first polishing layer component of a first continuous non-fugitive polymeric phase having a plurality of periodic recesses; discharging a combination toward the first polishing layer component at a velocity of 5 to 1,000 m/sec, filling the plurality of periodic recesses with the combination; allowing the combination to solidify in the plurality of periodic recesses forming a second non-fugitive polymeric phase giving a composite structure; and, deriving the chemical mechanical polishing pad composite polishing layer from the composite structure, wherein the chemical mechanical polishing pad composite polishing layer has a polishing surface on the polishing side of the first polishing layer component; and wherein the polishing surface is adapted for polishing a substrate. | 12-29-2016 |
20160375555 | METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD - A method of forming a chemical mechanical polishing pad polishing layer is provided, including: providing a mold having a base with a negative of a groove pattern; providing a poly side (P) liquid component; providing an iso side (I) liquid component; providing a pressurized gas; providing an axial mixing device; introducing the poly side (P) liquid component, the iso side (I) liquid component and the pressurized gas to the axial mixing device to form a combination; discharging the combination from the axial mixing device at a velocity of 5 to 1,000 m/sec toward the base; allowing the combination to solidify into a cake; deriving the chemical mechanical polishing pad polishing layer from the cake; wherein the chemical mechanical polishing pad polishing layer has a polishing surface with the groove pattern formed into the polishing surface; and wherein the polishing surface is adapted for polishing a substrate. | 12-29-2016 |