| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 034418000 | Diverse types of drying operations | 15 |
| 20080216346 | Method of Drying Pasty Materials and/or Apparatus for Drying Pasty Materials - The invention comprises method of and apparatus for drying pasty materials. The pasty materials are subjected to a first drying stage ( | 09-11-2008 |
| 20080222911 | SYSTEM AND METHOD TO REMOVE MOISTURE FROM WOOD - A system and process is provided to deplete or remove moisture from wood coring in boats. The system and process does not require the destruction, removal, or reconstruction of the wood coring. The present invention comprises piercing of the wood coring to create bores therethrough. Next, blowing ultra dry air through the bores, this removes moisture from the coring. And finally sealing the holes with a sealant. | 09-18-2008 |
| 20090119942 | Hand dryer - A dryer uses a high-speed blower producing high velocity air, a heater and a compound directional nozzle containing multiple tubular, cylindrical air sub-outlets to generate both suitable force and temperature in the sub-jets of air to dry the user's hands. The air outlets are sized and shaped to maintain direction of airflow at the location of the hands. The multiple tubular sub-nozzles reduce the air turbulence noise from the fast airflow sub-jets striking the hands by providing spaces between the adjacent sub-nozzles and air sub-jets so that the turbulence and hand impact noise is reduced and so that the water evaporated from the water film has a shorter escape distance. An ion source provides ions in the output air from the compound directional nozzle to enhance evaporation. | 05-14-2009 |
| 20110154683 | DRYING APPARATUS AND DRYING METHOD FOR SOLAR MODULES - The present disclosure relates to an apparatus and a method of drying the interior of solar modules. The apparatus and the method are particularly suitable for use with concentrator photovoltaic (CPV) modules. The drying apparatus comprises an absorber for drying and a heating device for heating a gas flowing therethrough and is connected to a solar cell via a connection, so that the dried gas is conducted into the solar cell. | 06-30-2011 |
| 20120090193 | MVD METHOD AND DEVICE FOR DRYING AND BUFFERING ORGANIC MOIST PRODUCTS - A method of drying and buffering organic moist products, particularly food items. Introducing the product into a first chamber, bringing the first chamber to a first reduced ambient pressure, feeding microwave energy from a microwave source so as to increase the temperature and buffer the moist product, and increasing the reduced ambient pressure to a less reduced second ambient pressure multiple times and subsequently reducing the ambient pressure to the first reduced ambient pressure. Wherein the increase of the ambient pressure is carried out faster than the reduction thereof, followed by a final drying of the product in a second chamber while feeding infrared radiation at a third (reduced) ambient pressure. Subsequently, the product is cooled and discharged into the atmosphere. Thus, increased product quality, in particular a more consistent and more stable product is obtained. | 04-19-2012 |
| 20160097590 | SYSTEMS AND METHODS FOR DRYING HIGH ASPECT RATIO STRUCTURES WITHOUT COLLAPSE USING SACRIFICIAL BRACING MATERIAL THAT IS REMOVED USING HYDROGEN-RICH PLASMA - Systems and methods for drying a substrate including a plurality of high aspect ratio (HAR) structures are performed after at least one of wet etching and/or wet cleaning the substrate using at least one of wet etching solution and/or wet cleaning solution, respectively, and without drying the substrate. Fluid between the plurality of HAR structures is displaced using a solvent including a bracing material. After the solvent evaporates, the bracing material precipitates out of solution and at least partially fills the plurality of HAR structures. The substrate is exposed to plasma generated using a plasma gas chemistry that is hydrogen rich to remove the bracing material thereby drying the substrate including the HAR structures without damaging the plurality of HAR structures. | 04-07-2016 |
| 034419000 | Sheet, web, or strand | 2 |
| 20080263892 | Sweep air system for membrane air dryer - A membrane air dryer is located inside a compressed air reservoir. A sweep air system includes a sweep control valve upstream of the dryer, and a sweep vent that is open to atmosphere. | 10-30-2008 |
| 20140298673 | METHOD AND AN APPARATUS FOR MANUFACTURING A THREE-DIMENSIONAL SURFACE STRUCTURE WEB - Method for manufacturing a fiber web, in which water is driven out of the fiber web. The method includes displacement dewatering using a clothing arrangement. The clothing arrangement, in the direction of a displacement fluid flow, includes: a membrane; an imprinting fabric, followed by the fiber web; and an anti-rewet fabric. The clothing arrangement is, in the direction of the displacement fluid flow, followed by a roll. | 10-09-2014 |
| 034423000 | Sequential drying treatments | 5 |
| 20090249641 | Systems and Methods for Processing Municipal Wastewater Treatment Sewage Sludge - The present invention relates generally to systems and methods for drying and gasifying substances using the calorific value contained in the substances, and it more specifically relates to apparatus and methods for processing wet, pasty, sticky substances, such as municipal wastewater treatment sewage sludge, into a workable, powdered product. | 10-08-2009 |
| 20100325913 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A substrate processing method dose not use or only use the least possible amount of an organic solvent, and can quickly and completely remove a liquid from a wet substrate surface without allowing the liquid to remain on the substrate surface. The substrate processing method for drying a substrate surface which is wet with a liquid, includes: removing the liquid from the substrate surface and sucking the liquid together with its surrounding gas into a gas/liquid suction nozzle, disposed opposite the substrate surface, while relatively moving the gas/liquid suction nozzle and the substrate parallel to each other; and blowing a dry gas from a dry gas supply nozzle, disposed opposite the substrate surface, toward that area of the substrate surface from which the liquid has been removed while relatively moving the dry gas supply nozzle and the substrate parallel to each other. | 12-30-2010 |
| 034424000 | Of slurry or suspension | 2 |
| 20090300937 | Indirect drying method using two temperature zones - A method of drying material uses two different temperature zones within a single chamber. The material enters the first temperature zone where it is indirectly heated by structures heated to a first temperature. The material then moves to the second temperature zone where it is indirectly heated by structures heated to a second temperature different from the first temperature. The second temperature may be greater than or less than the first temperature. The method is particularly useful for drying materials that have a tendency to foul the heated structures of a dryer, such as wastewater treatment sludges. | 12-10-2009 |
| 20100192401 | Process and plant for treatment of wet material - The invention relates to a process for processing wet material, in particular sewage sludge, having a plurality of drying stages. At least one high-temperature drying stage | 08-05-2010 |
| 034425000 | Using rotating drum | 1 |
| 20090272005 | Thermal roll, and drying apparatus and method - A drying apparatus includes a thermal roll for contacting and heating aluminum web in a continuous sheet form. The thermal roll includes a roll surface, having a static friction coefficient μ defined by contact with the web. The static friction coefficient μ satisfies a condition of: | 11-05-2009 |
| 034426000 | Plural treatments at same location | 2 |
| 20130219740 | SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PROGRAM - A substrate drying apparatus includes a drying gas nozzle configured so that, assuming that a surface WA of the substrate W is a projection plane, regarding the drying gas flow Gf in the nozzle moving direction Dr, a collision position Gfw with the substrate W is located downstream of a projected discharge position Gfv′, the projected discharge position Gfv′ being a discharge position from the drying gas nozzle projected on the projection plane. In a three-dimensional space, the drying gas flow Gf is inclined, such that an angle α formed by an axis Ga of the drying gas flow Gf and a vertical line Wp of the substrate W is in a range from a half contact angle θ/2 to an angle determined by deducting the half contact angle θ/2 from 90°, the half contact angle θ/2 being a half of the contact angle θ. | 08-29-2013 |
| 20150294883 | METHOD FOR DRYING WAFER SUBSTRATES AND WAFER HOLDER FOR CONDUCTION OF THE METHOD - A method for drying wafer substrates immersed into a liquid, and wafer holder for conduction of the method. The method involves holding substrates on a wedge-shaped edge of an elongated wafer holder, the substrates being upright on the wafer holder; transferring the substrates and the wedge-shaped edge of the wafer holder from the liquid to a gas space with a vapor which does not condense on the substrates and which lowers surface tension of liquid residues adhering to the substrates, wherein the removal of liquid residues between the wafer substrates and the wafer holder through a slot in the middle of the wedge-shaped edge of the wafer holder. | 10-15-2015 |
