| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 015077000 | Sheet, bar, and plate cleaners | 19 |
| 20080263793 | SUBSTRATE TREATMENT APPARATUS - The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with respect to a longitudinal axis thereof extending perpendicularly to a front surface of the substrate held by the substrate holding mechanism, brush moving mechanism which moves the brush along the longitudinal axis and along a lateral axis orthogonal to the longitudinal axis, load detecting unit which detects a load applied along the longitudinal axis to the brush, and first judging unit which judges, based on an output of the load detecting unit, whether or not the brush is located at a reference position serving as a reference for guiding the brush to a treatment position at which the brush is located in the cleaning process. | 10-30-2008 |
| 20090000044 | APPARATUSES AND METHODS FOR CLEANING A SUBSTRATE - An apparatus for use in processing a substrate includes a brush enclosure extending over a length. The brush enclosure is configured to be disposed over a surface of the substrate and has an open region that is configured to be disposed in proximity to the substrate. The open region extends over the length of the brush enclosure and enables foam from within the brush enclosure to contact the surface of the substrate. A substrate cleaning system and method for cleaning a substrate are also described. | 01-01-2009 |
| 20090031511 | WAFER EDGE CLEANING - In a first aspect, an apparatus for cleaning a thin disk is provided. The apparatus includes a support roller for supporting a rotating wafer within a wafer cleaner. The support roller comprises a guide portion, for receiving an edge of a wafer, having an inclined surface comprising a low-friction material and adapted to allow the wafer edge to slide thereagainst; and an edge-trap portion for retaining the edge of the wafer and having a transverse surface comprising a high-friction material and adapted, when in communication with the edge of the wafer, to resist sliding thereagainst. Numerous other aspects are provided. | 02-05-2009 |
| 20090031512 | POST CMP SCRUBBING OF SUBSTRATES - A cleaning method is provided for brush cleaning a surface of a substrate. The method comprises scrubbing a first surface of the substrate with a brush having a first surface geometry; and then scrubbing the first surface of the substrate with a brush having a second surface geometry, wherein the first and the second surface geometries are different. Numerous other aspects are provided. | 02-05-2009 |
| 20090276970 | DUST REMOVER - A dust remover includes a rotary brush which removes dust attached to a workpiece, a workpiece carrying section which carries the workpiece in a direction crossing the axial direction of the rotary brush, a brush rotating section which rotates the rotary brush around the axial center of the rotary brush, and a brush back-and-forth movement section which moves the rotary brush back and forth in the axial direction of the rotary brush. The dust remover also includes a motor which is a common driving source for both the brush rotating section and the brush back-and-forth movement section. The brush rotating section has a power transmitting section which transmits the power of the motor to the rotary brush as a rotation of the rotary brush, and the brush back-and-forth movement section has a power transmitting section which converts the power of the motor into a back-and-forth movement of the rotary brush to transmit the back-and-forth movement to the rotary brush. | 11-12-2009 |
| 20100043158 | APPARATUS FOR DEBURRING BOARDS - An apparatus for deburring boards includes a platform, on which first and second guiding rail units perpendicular to each other are fixed, a deburring unit mounted on the first guiding rail unit, a carrying unit adapted for carrying the boards and mounted movably on the second guiding rail unit perpendicular to the first guiding rail unit, and a driving unit disposed on the platform and operable to drive the carrying unit to move between a loading/unloading zone, where the carrying unit is spaced apart from the deburring unit, and a processing zone, where the carrying unit is disposed between opposite deburring members of the deburring unit so that opposite deburred edges of each board contact respectively the deburring members. The driving unit further drives the carrying unit to move back and forth within the processing zone a predetermined number of times, thereby deburring the boards. | 02-25-2010 |
| 20100186180 | SUPPORT STRUCTURE FOR MULTIPLE WORKPIECE SUPPORT ROLLERS - Apparatuses for supporting a workpiece are disclosed. In one example, the apparatus includes a plurality of shaft supports. The apparatus further includes a shaft defined between the shaft supports, the shaft extending through an aperture defined in each of the plurality of shaft supports. Further included in the apparatus is a plurality of rollers defined to rotate about the shaft, the rollers defined between the plurality of shaft supports. | 07-29-2010 |
| 20110138553 | Cleaning apparatus and cleaning method for wafer - A wafer on which a CMP processing is completed is rotated. A front surface cleaning brush and a rear surface cleaning brush are made contact both surfaces of the wafer while being rotated. After the front surface cleaning brush and the rear surface cleaning brush are made to contact the wafer, both end portions of the front surface cleaning brush and the rear surface cleaning brush are deformed by means of pressurizing both ends of the front surface cleaning brush and the rear surface cleaning brush by pressure portions. That is, the both end portions of the front surface cleaning brush and the rear surface cleaning brush are compressed to enlarge diameters in the both end portions. As a consequence, the entire front surface of the wafer is made to contact the front surface cleaning brush substantially evenly, even if the wafer is warped into a shape of a mound. Therefore, a cleaning efficiency of the outer peripheral portion of the wafer improves. | 06-16-2011 |
| 20110154590 | WAFER EDGE CLEANING - In a first aspect, an apparatus for cleaning a thin disk is provided. The apparatus includes a support roller for supporting a rotating wafer within a wafer cleaner. The support roller comprises a guide portion, for receiving an edge of a wafer, having an inclined surface comprising a low-friction material and adapted to allow the wafer edge to slide thereagainst; and an edge-trap portion for retaining the edge of the wafer and having a transverse surface comprising a high-friction material and adapted, when in communication with the edge of the wafer, to resist sliding thereagainst. Numerous other aspects are provided. | 06-30-2011 |
| 20120030888 | MAT WASHING MACHINE - Mat washing device, method of using the mat washing device, and method of washing mats. The mat washing device includes a system that may be transported on a flat bed trailer from one location to another. The mat washing device includes conveying systems, brush systems, rails systems and control mechanisms. The mat washing device may be used by placing mat, on edge, on a conveying system and conveying the mat to a first brushing system and a second brushing system. In one aspect the first brushing system includes a cable brush having a bolt secured at the end of a cable in order to beat or brush material from the mat when the cable brush is spun. | 02-09-2012 |
| 20120137455 | DUSTING EQUIPMENT - A dusting equipment ( | 06-07-2012 |
| 20120260443 | Aquaculture cage screen and cleaning apparatus - The device includes a screen cleaning brush with multiple fibers or cleaning fingers made from a flexible material with a hook and barb shape. The hook is designed to trap the screen strand as it passes and rotates on a flexible arm to clean the adjacent and opposite side of the strand and then flexes to release the strand. The instant invention has a unique propulsion system and navigation system that enables automatic navigation of the cleaning apparatus on the screen of the aquaculture cage. Alternative the screen cleaning can be performed with a frame having fins to assist in the directional placement of the cleaning fingers against a submersed screen. | 10-18-2012 |
| 20130061409 | ERASING DEVICE - An erasing device of one embodiment includes a conveyance unit that conveys a sheet; a pair of rotating brushes is provided corresponding to both side portions in a width direction perpendicular to a sheet conveyance direction of the sheet conveyed by the conveyance unit, the rotating brushes being provided to oppose to each other, nipping the conveyed sheet, the rotating brushes rotating in the same direction as the sheet conveyance direction such that a circumferential speed of the brush tip has a higher speed than a conveyance speed of the sheet, the rotating brushes rolling and correcting a corner fold portion which occurs on the sheet conveyed by the brush tip portion while rotating; and an erasing unit is provided downstream in the sheet conveyance direction than the rotating brush, the erasing unit erasing an image which is formed on the sheet. | 03-14-2013 |
| 20130086761 | SUN TRACKING MECHANISM WITH AUTOMATED CLEANING ARRANGEMENT FOR SOLAR PANEL - A solar panel | 04-11-2013 |
| 20130111678 | BRUSH BOX MODULE FOR CHEMICAL MECHANICAL POLISHING CLEANER - Embodiments of the invention generally relate to a method and apparatus for cleaning a substrate. Particularly, embodiments of the invention relate to an apparatus and method for cleaning a substrate using a scrub brush. One embodiment provides a brush box assembly for cleaning a substrate. The assembly comprises a chamber body having a cleaning chamber disposed therein, a rotatable chuck disposed in the cleaning chamber, and an edge cleaner module positioned adjacent the chuck. | 05-09-2013 |
| 20130239343 | VEHICLE FOR CLEANING MIRRORS IN INSTALLATIONS FOR COLLECTING SOLAR THERMAL ENERGY - A vehicle for cleaning collector mirrors in solar thermal energy installations, includes an operating cab ( | 09-19-2013 |
| 20140075690 | SUBSTRATE CLEANING APPARATUS - A substrate cleaning apparatus is provided. The substrate cleaning apparatus includes a plurality of transfer rollers for transferring a substrate; a liquid chemical feeder supplying a liquid chemical to a first surface of the substrate; wherein the liquid chemical feeder comprises a first housing and a first cleaning roller rotatably installed within the housing and having an upper portion configured to contact with the substrate. | 03-20-2014 |
| 20140165314 | Apparatus for dry cleaning layer pads - An improved dry cleaning system for cleaning used layer pads comprising a pallet in-feed assembly, a dry cleaning assembly, and an out-feed station, said dry cleaning assembly having a vision inspection system mounted to a conveyor for taking image/information of upper and lower surfaces of the cleaned layer pad exiting a cleaning station and a programmable means for assessing the image/info against predetermined acceptable cleaning criteria, wherein when these criteria are satisfied the programmable means actuates a guide means to direct the layer pad to a designated receptable for collection and re-use. | 06-19-2014 |
| 20160375468 | SELF-SERVE CLEANING DEVICE - Examples of self-serve cleaning device for automatically cleaning mats are disclosed. The mats can be cleaned easily and quickly within few minutes. The cleaning device comprises a compact insert washing module that comprises all of the washing and driving components that can easily and quickly be removed after a number of washing cycles and replaced with a new insert for refreshing and/or maintenance purposes. | 12-29-2016 |
