XTREME TECHNOLOGIES GMBH Patent applications |
Patent application number | Title | Published |
20140103807 | DEVICE FOR GENERATING SHORT-WAVELENGTH ELECTROMAGNETIC RADIATION BASED ON A GAS DISCHARGE PLASMA - A device for generating short-wavelength electromagnetic radiation based on a gas discharge plasma calls for suppressing droplet formation of liquid coating material that is applied to disk electrodes rotated at high rotational frequencies and ensuring a uniform layer thickness. The device has two rotating disk electrodes, each having two lateral surfaces and a circumferential surface, provided with a reservoir with liquid coating material and a wiper for removing excess coating material. The wiper, which has a U-shaped form comprising two legs parallel to the lateral surfaces of the disk electrode and a crosspiece transversely over the circumferential surface, is at least axially movably supported and has impingement elements at the legs so that it is automatically axially adjustable by means of the coating material which is transported on the lateral surfaces and pressed into the gap during the rotation of the disk electrode. | 04-17-2014 |
20120248327 | Method and Arrangement for the Adjustment of Characteristics of a Beam Bundle of High-Energy Radiation Emitted from a Plasma - The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics. | 10-04-2012 |
20120153829 | Method and Apparatus for the Generation of Short-Wavelength Radiation by Means of a Gas Discharge-Based High-Frequency, High-Current Discharge - The invention is related to a gas discharge-based radiation source which emits short-wavelength radiation, wherein an emitter is ionized and compressed by pulse-shaped currents between two electrodes arranged in a vacuum chamber and is excited to form an emitting plasma. According to the invention, the plasma is preserved by means of a high-frequency sequence of pulse-shaped currents the pulse repetition period of which is adjusted so as to be shorter than a lifetime of the plasma so that the plasma is kept periodically alternating between a high-energy state of an emitting compressed plasma and a low-energy state of a relaxing plasma. For exciting the relaxing plasma to the compressed plasma, excitation energy is coupled into the relaxing plasma by making use of pulse-shaped currents with repetition frequencies between 50 kHz and 4 MHz and pulse widths equal to the pulse repetition period. | 06-21-2012 |
20120138805 | Method for the Spatially Resolved Measurement of Parameters in a Cross Section of a Beam Bundle of High-Energy Radiation of High Intensity - The invention is directed to methods and arrangements for spatial acquisition of measurement data over the cross section of a bundle of high-energy, high-intensity radiation. The object of finding a novel possibility for radiation measurement within the cross section of a beam bundle of high intensity which acquires highly spatially resolved measurement data without impairment of the measuring accuracy through saturation or degradation of the detectors is met according to the invention in that the entire cross section of the beam bundle is imaged on a shading element, the cross section is separated successively into partial beam bundles having reduced cross section and reduced intensity through movement of at least one opening, and measurement values of the partial beam bundles passing the opening are acquired so as to be associated temporally and spatially with the positions of the opening and are stored. | 06-07-2012 |
20120112101 | Method and Arrangement for the Stabilization of the Source Location of the Generation of Extreme Ultraviolet (EUV) Radiation Based on a Discharge Plasma - The invention is directed to a method and an apparatus for stabilizing the source location during the generation of EUV radiation based on a discharge plasma. The object of finding a novel possibility for stabilizing the source location during the generation of EUV radiation which allows changes in position of the source location to be compensated in a simple manner during the operation of the radiation source is met according to the invention in that a first beam aligning unit ( | 05-10-2012 |
20120080619 | Method and Apparatus for the Generation of EUV Radiation from a Gas Discharge Plasma - The invention relates to a method and an apparatus for generating EUV radiation from a gas discharge plasma. The object of the invention, to generate EUV radiation from a gas discharge plasma by with is optimized conversion efficiency of the EUV emission while locally limiting the electric discharge channel, is met in that a channel-generating beam of pulsed high-energy radiation is supplied in at least two partial beams which are focused in a pulse-synchronized manner into a superposition region along a spacing axis between the electrodes, and an electrically conductive discharge channel is generated along the superposition region due to an ionization at least of a buffer gas present in the discharge space, wherein the pulsed high-energy radiation of the channel-generating beam is triggered in such a way that the discharge channel is generated before a discharge current pulse has reached its maximum value. | 04-05-2012 |
20100282987 | ARRANGEMENT FOR THE CONTINUOUS GENERATION OF LIQUID TIN AS EMITTER MATERIAL IN EUV RADIATION SOURCES - The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material ( | 11-11-2010 |
20100078578 | METHOD AND ARRANGEMENT FOR THE OPERATION OF PLASMA-BASED SHORT-WAVELENGTH RADIATION SOURCES - The invention is directed to a method for operating plasma-based short-wavelength radiation sources, particularly EUV radiation sources, having a long lifetime and to an arrangement for generating plasma-based short-wavelength radiation. It is the object of the invention to find a novel possibility for operating plasma-based short-wavelength radiation sources with a long lifetime which permits extensive debris mitigation without the main process of radiation generation being severely impaired through the use of buffer gas and without the need for substantial additional expenditure for generating partial pressure in a spatially narrowly limited manner. According to the invention, this object is met in that hydrogen gas as buffer gas ( | 04-01-2010 |
20090101850 | ARRANGEMENT FOR GENERATING EUV RADIATION - The invention is directed to an arrangement for generating EUV radiation particularly for source modules in exposure installations for EUV lithography for semiconductor chip fabrication. The object of the invention, to find a novel possibility for realizing an EUV source module which appreciably improves the ratio of resources to results in the transfer of radiation from the primary source location (plasma | 04-23-2009 |