VISHAY-SILICONIX Patent applications |
Patent application number | Title | Published |
20150162401 | DUAL TRENCH STRUCTURE - A method for fabricating a dual trench structure. The method includes providing a wafer comprising a semiconductor layer including a top surface. The method includes providing charge compensation trenches and termination trenches open to the top surface that are formed in a single etch step but with different final shield oxide thicknesses. A first shield oxide layer of a first thickness is formed on the plurality of charge compensation surfaces and the termination trench surface, wherein the first thickness of the first shield oxide layer is sufficient to allow formation of voids through the charge compensation trenches. Poly-silicon is deposited to form the electrodes in the charge compensation trenches. An isolated poly-silicon etch and clean etch is performed in the termination trenches to expose the first shield oxide layer. A second shield oxide layer is deposited on the first shield oxide layer in the termination trenches. | 06-11-2015 |
20150108568 | SEMICONDUCTOR STRUCTURE WITH HIGH ENERGY DOPANT IMPLANTATION - A semiconductor device has an epitaxial layer grown over a substrate, each having a first dopant type. A structure disposed within the epitaxial layer has multiple trenches, each of which has a gate and a source electrode disposed within a shield oxide matrix. Multiple mesas each isolate a pair of the trenches from each other. A body region with a second dopant type is disposed above the epitaxial layer and bridges each of the mesas. A region of elevated concentration of the first dopant type is implanted at a high energy level between the epitaxial layer and the body region, which reduces resistance spreading into a channel of the device. A source region having the first dopant type is disposed above the body region. | 04-23-2015 |
20140273344 | METHOD FOR FABRICATING STACK DIE PACKAGE - In one embodiment, a method can include coupling a gate and a source of a first die to a lead frame. The first die can include the gate and the source that are located on a first surface of the first die and a drain that is located on a second surface of the first die that is opposite the first surface. In addition, the method can include coupling a source of a second die to the drain of the first die. The second die can include a gate and a drain that are located on a first surface of the second die and the source that is located on a second surface of the second die that is opposite the first surface. | 09-18-2014 |
20140264804 | STACK DIE PACKAGE - In one embodiment, a stack die package can include a lead frame and a first die including a gate and a source that are located on a first surface of the first die and a drain that is located on a second surface of the first die that is opposite the first surface. The gate and source are flip chip coupled to the lead frame. The stack die package can include a second die including a gate and a drain that are located on a first surface of the second die and a source that is located on a second surface of the second die that is opposite the first surface. The source of the second die is facing the drain of the first die. | 09-18-2014 |
20140235023 | TRENCH METAL OXIDE SEMICONDUCTOR WITH RECESSED TRENCH MATERIAL AND REMOTE CONTACTS - Remote contacts to the polysilicon regions of a trench metal oxide semiconductor (MOS) barrier Schottky (TMBS) device, as well as to the polysilicon regions of a MOS field effect transistor (MOSFET) section and of a TMBS section in a monolithically integrated TMBS and MOSFET (SKYFET) device, are employed. The polysilicon is recessed relative to adjacent mesas. Contact of the source metal to the polysilicon regions of the TMBS section is made through an extension of the polysilicon to outside the active region of the TMBS section. This change in the device architecture relieves the need to remove all of the oxides from both the polysilicon and silicon mesa regions of the TMBS section prior to the contact step. As a consequence, encroachment of contact metal into the sidewalls of the trenches in a TMBS device, or in a SKYFET device, is avoided. | 08-21-2014 |
20140206165 | Self-Aligned Trench MOSFET and Method of Manufacture - A trench metal-oxide-semiconductor field effect transistor (MOSFET), in accordance with one embodiment, includes a drain region, a plurality of gate regions disposed above the drain region, a plurality of gate insulator regions each disposed about a periphery of a respective one of the plurality of gate regions, a plurality of source regions disposed in recessed mesas between the plurality of gate insulator regions, a plurality of body regions disposed in recessed mesas between the plurality of gate insulator regions and between the plurality of source regions and the drain region. The MOSFET also includes a plurality of body contact regions disposed in the each body region adjacent the plurality of source regions, a plurality of source/body contact spacers disposed between the plurality of gate insulator regions above the recessed mesas, a source/body contact disposed above the source/body contact spacers, and a plurality of source/body contact, plugs disposed between the source/body contact spacers and coupling the source/body contact to the plurality of body contact regions and the plurality of source regions. | 07-24-2014 |
20140183624 | Adaptive Charge Balanced MOSFET Techniques - An adaptive charge balanced MOSFET device includes a field plate stacks, a gate structure, a source region, a drift region and a body region. The gate structure includes a gate region surrounded by a gate insulator region. The field plate stack includes a plurality of field plate insulator regions, a plurality of field plate regions, and a field ring region. The plurality of field plates are separated from each other by respective field plate insulators. The body region is disposed between the gate structure, the source region, the drift region and the field ring region. Each of two or more field plates are coupled to the field ring. | 07-03-2014 |
20140099765 | TRANSISTOR STRUCTURE WITH FEED-THROUGH SOURCE-TO-SUBSTRATE CONTACT - An LDMOS (laterally diffused metal oxide semiconductor) structure connects the source to a substrate and also the gate shield while utilizing a reduced area for such contacts. The structure includes an electrically conductive substrate layer, a source, and a drain contact; the drain contact is separated from the substrate layer by at least one intervening layer. An electrically conductive trench-like feed-through element passes through the intervening layer and contacts the substrate and the source to electrically connect the drain contact and the substrate layer. | 04-10-2014 |
20140077287 | BREAKDOWN VOLTAGE BLOCKING DEVICE - In one embodiment, a breakdown voltage blocking device can include an epitaxial region located above a substrate and a plurality of source trenches formed in the epitaxial region. Each source trench can include a dielectric layer surrounding a conductive region. The breakdown voltage blocking device can also include a contact region located in an upper surface of the epitaxial region along with a gate trench formed in the epitaxial region. The gate trench can include a dielectric layer that lines the sidewalls and bottom of the gate trench and a conductive region located between the dielectric layer. The breakdown voltage blocking device can include source metal located above the plurality of source trenches and the contact region. The breakdown voltage blocking device can include gate metal located above the gate trench. | 03-20-2014 |
20140035657 | PREVENTING REVERSE CONDUCTION - In one embodiment, a circuit includes a resistance including first and second terminals. The first terminal of the resistance is coupled to ground. The circuit also includes a first switching element including first, second, and third terminals. The first terminal of the first switching element is coupled to an output of an integrated circuit and the second terminal of the first switching element is coupled to a voltage supply of the integrated circuit. Additionally, the circuit includes a second switching element including first, second, and third terminals. The first terminal of the second switching element is coupled to an enable input of the integrated circuit. Furthermore, the second terminal of the second switching element is coupled to the third terminal of the first switching element and to the second terminal of the resistance. Moreover, the third terminal of the second switching element is coupled to the ground. | 02-06-2014 |
20130320462 | ADAPTIVE CHARGE BALANCED EDGE TERMINATION - In one embodiment, a semiconductor device can include a substrate including a first type dopant. The semiconductor device can also include an epitaxial layer located above the substrate and including a lower concentration of the first type dopant than the substrate. In addition, the semiconductor device can include a junction extension region located within the epitaxial layer and including a second type dopant. Furthermore, the semiconductor device can include a set of field rings in physical contact with the junction extension region and including a higher concentration of the second type dopant than the junction extension region. Moreover, the semiconductor device can include an edge termination structure in physical contact with the set of field rings. | 12-05-2013 |
20130279057 | CURRENT LIMITING SYSTEMS AND METHODS - Presented systems and methods can facilitate efficient switching and protection in electronic systems. A system can comprise: an input operable to receive a signal; an adjustable component configurable to operate in a first mode which includes a low resistance and the component configurable to operate in a second mode which includes a current limiting operation in which the second mode enables continued operation in conditions that are unsafe for operation in the first mode; and an output operable to forward a signal. The adjustable component can be configurable to turn off if unsafe to operate in either the first mode or second mode. The first mode can include a relatively large component configuration with a relatively low drain to source on resistance. Utilizing a small component configuration in the second mode can include a relatively increased gate to source voltage compared to a large component configuration in the second mode. | 10-24-2013 |
20130207227 | MOSFET TERMINATION TRENCH - A method, in one embodiment, can include forming a core trench and a termination trench in a substrate. The termination trench is wider than the core trench. In addition, a first oxide can be deposited that fills the core trench and lines the sidewalls and bottom of the termination trench. A first polysilicon can be deposited into the termination trench. A second oxide can be deposited above the first polysilicon. A mask can be deposited above the second oxide and the termination trench. The first oxide can be removed from the core trench. A third oxide can be deposited that lines the sidewalls and bottom of the core trench. The first oxide within the termination trench is thicker than the third oxide within the core trench. | 08-15-2013 |
20130169243 | CURRENT MODE BOOST CONVERTER USING SLOPE COMPENSATION - A boost converter circuit that includes a power supply, an inductor coupled to the power supply to receive current from the power supply, a diode coupled to receive current from the inductor and coupled to provide current to a load as an output, an inductor switch coupled to a node between the inductor and the diode for selectively switching current from the inductor anyway from the diode, and a ramp circuit. The ramp circuit is coupled to the node between the inductor and the diode, and is configured to selectively sample a voltage at the node between the inductor and the diode via a sampling switch and use the sampled signal to produce a stabilization ramp to stabilize the output. | 07-04-2013 |
20130140633 | EDGE TERMINATION FOR SUPER JUNCTION MOSFET DEVICES - In one embodiment, a Super Junction metal oxide semiconductor field effect transistor (MOSFET) device can include a substrate and a charge compensation region located above the substrate. The charge compensation region can include a plurality of columns of P type dopant within an N type dopant region. In addition, the Super Junction MOSFET can include a termination region located above the charge compensation region and the termination region can include an N− type dopant. Furthermore, the Super Junction MOSFET can include an edge termination structure. The termination region includes a portion of the edge termination structure. | 06-06-2013 |
20130040457 | POWER MOSFET CONTACT METALLIZATION - A structure includes a semiconductor device formed in a substrate; an insulator adjacent to the semiconductor device; an electrical contact electrically coupled to the semiconductor device, wherein the electrical contact includes tungsten; and an electrical connector coupled to the electrical contact, wherein the electrical connector includes aluminum. A surface of the insulator and a surface of the electrical contact form a substantially even surface. | 02-14-2013 |
20120292696 | SEMICONDUCTOR DEVICE HAVING REDUCED GATE CHARGES AND SUPERIOR FIGURE OF MERIT - A semiconductor device includes a first group of trench-like structures and a second group of trench-like structures. Each trench-like structure in the first group includes a gate electrode contacted to gate metal and a source electrode contacted to source metal. Each of the trench-like structures in the second group is disabled. The second group of disabled trench-like structures is interleaved with the first group of trench-like structures. | 11-22-2012 |
20120220092 | METHOD OF FORMING A HYBRID SPLIT GATE SIMICONDUCTOR - Method of forming a Hybrid Split Gate Semiconductor. In accordance with a method embodiment of the present invention, a plurality of first trenches is formed in a semiconductor substrate to a first depth. A plurality of second trenches is formed in the semiconductor substrate to a second depth. The first plurality of trenches are parallel with the second plurality of trenches. The trenches of the plurality of first trenches alternate with and are adjacent to trenches of the plurality of second trenches. | 08-30-2012 |
20120211828 | HYBRID SPLIT GATE SEMICONDUCTOR - In an embodiment in accordance with the present invention, a semiconductor device includes a vertical channel region, a gate at a first depth on a first side of the vertical channel region, a shield electrode at a second depth on the first side of the vertical channel region, and a hybrid gate at the first depth on a second side of the vertical channel region. The region below the hybrid gate on the second side of the vertical channel region is free of any electrodes. | 08-23-2012 |
20120068178 | TRENCH POLYSILICON DIODE - Embodiments of the present invention include a method of manufacturing a trench transistor. The method includes forming a substrate of a first conductivity type and implanting a dopant of a second conductivity type, forming a body region of the substrate. The method further includes forming a trench in the body region and depositing an insulating layer in the trench and over the body region wherein the insulating layer lines the trench. The method further includes filling the trench with polysilicon forming a top surface of the trench and forming a diode in the body region wherein a portion of the diode is lower than the top surface of the trench. | 03-22-2012 |
20110266620 | TRANSISTOR STRUCTURE WITH FEED-THROUGH SOURCE-TO-SUBSTRATE CONTACT - An LDMOS (laterally diffused metal oxide semiconductor) structure connects the source to a substrate and also the gate shield while utilizing a reduced area for such contacts. The structure includes an electrically conductive substrate layer, a source, and a drain contact; the drain contact is separated from the substrate layer by at least one intervening layer. An electrically conductive trench-like feed-through element passes through the intervening layer and contacts the substrate and the source to electrically connect the drain contact and the substrate layer. | 11-03-2011 |
20110254084 | STRUCTURES AND METHODS OF FABRICATING DUAL GATE DEVICES - First polysilicon (poly-1) is deposited into deep trenches that have been formed in a substrate. A first polysilicon polishing process is performed to planarize the exposed surfaces of the poly-1 so that the surfaces are flush with adjacent surfaces. Then, shallow trenches are formed in the substrate between the deep trenches, and second polysilicon (poly-2) is deposited into the shallow trenches. A second polysilicon polishing process is performed to planarize the exposed surface of the poly-2 so that the surface is flush with adjacent surfaces. Metal contacts to the poly-1 and the poly-2 are then formed. | 10-20-2011 |
20110210406 | STRUCTURES OF AND METHODS OF FABRICATING SPLIT GATE MIS DEVICES - A split gate field effect transistor device. The device includes a split gate structure having a trench, a gate electrode and a source electrode. A first poly layer is disposed within the trench and is connected to the gate electrode. A second poly layer connected to the source electrode, wherein the first poly layer and the second poly layer are independent. | 09-01-2011 |
20110198704 | POWER SWITCH WITH ACTIVE SNUBBER - A power switch with active snubber. In accordance with a first embodiment, an electronic circuit includes a first power semiconductor device and a second power semiconductor device coupled to the first power semiconductor device. The second power semiconductor device is configured to oppose ringing of the first power semiconductor device. | 08-18-2011 |
20110175217 | Semiconductor Packages Including Die and L-Shaped Lead and Method of Manufacture - The present technology is directed toward semiconductors packaged by electrically coupling a plurality of die to an upper and lower lead frame. The opposite edges of each corresponding set of leads in the upper lead frame are bent. The leads in the upper lead frame are electrically coupled between respective contacts on respective die and respective lower portion of the leads in the lower lead frame. The bent opposite edges of each corresponding set of leads of the upper lead frame support the upper lead frame before encapsulation, for achieving a desired position of the plurality of die between the leads of the upper and lower lead frames in the packaged semiconductor. After the encapsulated die are separated, the upper leads have an L-shape and electrically couple die contacts on upper side of the die to leads on the lower side of the die so that the package contacts are on the same side of the semiconductor package. | 07-21-2011 |
20110159675 | PROCESS FOR FORMING SCHOTTKY RECTIFIER WITH PtNi SILICIDE SCHOTTKY BARRIER - A process for forming a Schottky barrier to silicon to a bather height selected at a value between 640 meV and 840 meV employs the deposition of a platinum or nickel film atop the silicon surface followed by the deposition of the other of a platinum or nickel film atop the first film. The two films are then exposed to anneal steps at suitable temperatures to cause their interdiffusion and a ultimate formation of Ni | 06-30-2011 |
20110101525 | SEMICONDUCTOR DEVICE WITH TRENCH-LIKE FEED-THROUGHS - A semiconductor device (e.g., a flip chip) includes a substrate layer that is separated from a drain contact by an intervening layer. Trench-like feed-through elements that pass through the intervening layer are used to electrically connect the drain contact and the substrate layer when the device is operated. | 05-05-2011 |
20110095359 | Field Boosted Metal-Oxide-Semiconductor Field Effect Transistor - A trench metal-oxide-semiconductor field effect transistor (TMOSFET) includes a plurality of mesas disposed between a plurality of gate regions. Each mesa includes a drift region and a body region. The width of the mesa is in the order of quantum well dimension at the interface between the gate insulator regions and the body regions The TMOSFET also includes a plurality of gate insulator regions disposed between the gate regions and the body regions, drift regions, and drain region. The thickness of the gate insulator regions between the gate regions and the drain region results in a gate-to-drain electric field in an OFF-state that is substantially lateral aiding to deplete the charge in the drift regions. | 04-28-2011 |
20110089486 | SUPER-HIGH DENSITY TRENCH MOSFET - A method, in one embodiment, can include forming a plurality of trenches in a body region for a vertical metal-oxide semiconductor field-effect transistor (MOSFET). In addition, the method can include angle implanting source regions into the body region. Furthermore, dielectric material can be grown within the plurality of trenches. Gate polysilicon can be deposited within the plurality of trenches. Moreover, the method can include chemical mechanical polishing the gate polysilicon. The method can also include etching back the gate polysilicon within the plurality of trenches. | 04-21-2011 |
20110089485 | SPLIT GATE SEMICONDUCTOR DEVICE WITH CURVED GATE OXIDE PROFILE - A split gate semiconductor device includes a trench gate having a first electrode region and a second electrode region that are separated from each other by a gate oxide layer and an adjacent dielectric layer. The boundary of the gate oxide layer and the dielectric layer is curved to avoid a sharp corner where the gate oxide layer meets the sidewalls of the trench. | 04-21-2011 |
20110053326 | SUPER JUNCTION TRENCH POWER MOSFET DEVICE FABRICATION - Methods of fabricating a super junction trench power MOSFET (metal oxide semiconductor field effect transistor) device are described. A column of p-type dopant in the super junction is separated from a first column of n-type dopant by a first column of oxide and from a second column of n-type dopant by a second column of oxide. In an n-channel device, a gate element for the FET is advantageously situated over the column of p-type dopant; and in a p-channel device, a gate element for the FET is advantageously situated over the column of n-type dopant. | 03-03-2011 |
20110049682 | SYSTEM AND METHOD FOR SUBSTRATE WAFER BACK SIDE AND EDGE CROSS SECTION SEALS - Systems and methods for substrate wafer back side and edge cross section seals. In accordance with a first method embodiment, a silicon wafer of a first conductivity type is accessed. An epitaxial layer of the first conductivity type is grown on a front surface of the silicon wafer. The epitaxial layer is implanted to form a region of an opposite conductivity type. The growing and implanting are repeated to form a vertical column of the opposite conductivity type. The wafer may also be implanted to form a region of the opposite conductivity type vertically aligned with the vertical column. | 03-03-2011 |
20110049614 | SUPER JUNCTION TRENCH POWER MOSFET DEVICES - In a super junction trench power MOSFET (metal oxide semiconductor field effect transistor) device, a column of p-type dopant in the super junction is separated from a first column of n-type dopant by a first column of oxide and from a second column of n-type dopant by a second column of oxide. In an n-channel device, a gate element for the FET is advantageously situated over the column of p-type dopant; and in a p-channel device, a gate element for the FET is advantageously situated over the column of n-type dopant. | 03-03-2011 |
20110042742 | STRUCTURES OF AND METHODS OF FABRICATING TRENCH-GATED MIS DEVICES - In a trench-gated MIS device contact is made to the gate within the trench, thereby eliminating the need to have the gate material, typically polysilicon, extend outside of the trench. This avoids the problem of stress at the upper corners of the trench. Contact between the gate metal and the polysilicon is normally made in a gate metal region that is outside the active region of the device. Various configurations for making the contact between the gate metal and the polysilicon are described, including embodiments wherein the trench is widened in the area of contact. Since the polysilicon is etched back below the top surface of the silicon throughout the device, there is normally no need for a polysilicon mask, thereby saving fabrication costs. | 02-24-2011 |
20100019751 | ADAPTIVE FREQUENCY COMPENSATION FOR DC-to-DC CONVERTER - One embodiment of the invention is a compensation circuit that includes a comparator that is coupled to receive a reference voltage. The compensation circuit can also include a capacitance coupled to receive a feedback voltage associated with an output voltage of a converter. Furthermore, the compensation circuit can include an adjustable resistance that is coupled to the capacitance and to the comparator. | 01-28-2010 |
20090278179 | CHIP SCALE SURFACE MOUNT PACKAGE FOR SEMICONDUCTOR DEVICE AND PROCESS OF FABRICATING THE SAME - A semiconductor package has contacts on both sides of the dice on a wafer scale. The back side of the wafer is attached to a metal plate. The scribe lines separating the dice expose the metal plate without extending through the metal plate. A metal layer may be formed on the front side of the dice, covering the exposed portions of the metal plate and extending to side edges of the dice. The metal layer may cover connection pads on the front side of the dice. A second set of scribe lines are made coincident with the first set. Therefore, the metal layer remains on the side edges of the dice coupling the front and the back. As a result, the package is rugged and provides a low-resistance electrical connection between the back and front sides of the dice. | 11-12-2009 |
20090278176 | HIGH CURRENT DENSITY POWER FIELD EFFECT TRANSISTOR - An ultra-short channel hybrid power field effect transistor (FET) device lets current flow from bulk silicon without npn parasitic. This device does not have body but still have body diode with low forward voltage at high current rating. The device includes a JFET component, a first accumulation MOSFET disposed adjacent to the JFET component, and a second accumulation MOSFET disposed adjacent to the JFET component at the bottom of the trench end, or a MOSFET with an isolated gate connecting the source. | 11-12-2009 |
20090256246 | SEMICONDUCTOR PACKAGING TECHNIQUES - A semiconductor package includes a leadframe which is cup-shaped and holds a semiconductor die. The leadframe is in electrical contact with a terminal on one side of the die, and the leads of the leadframe are bent in such a way that portions of the leads are coplanar with the other side of the die, which also contains one or more terminals. A plastic capsule is formed around the leadframe and die. | 10-15-2009 |
20090200578 | SELF-REPAIRING FIELD EFFECT TRANSISITOR - A self repairing field effect transistor (FET) device, in accordance with one embodiment, includes a plurality of FET cells each having a fuse link. The fuse links are adapted to blow during a high current event in a corresponding cell. | 08-13-2009 |
20090174055 | Leadless Semiconductor Packages - An encapsulation technique for leadless semiconductor packages entails: (a) attaching a plurality of dice ( | 07-09-2009 |
20090104751 | NARROW SEMICONDUCTOR TRENCH STRUCTURE - Systems and methods for narrow semiconductor trench structures. In a first method embodiment, a method for forming a narrow trench comprises forming a first layer of insulating material on a substrate and creating a trench through the first layer of insulating material and into the substrate. A second insulating material is formed on the first layer and on exposed portions of the trench and the second insulating material is removed from the first layer of insulating material and the bottom of the trench. The trench is filled with an epitaxial material and the first layer of insulating material is removed. A narrow trench is formed by the removal of remaining portions of the second insulating material. | 04-23-2009 |
20090090967 | MOSFET ACTIVE AREA AND EDGE TERMINATION AREA CHARGE BALANCE - A method for fabricating a MOSFET having an active area and an edge termination area is disclosed. The method includes forming a first plurality of implants at the bottom of trenches located in the active area and in the edge termination area. A second plurality of implants is formed at the bottom of the trenches located in the active area. The second plurality of implants formed at the bottom of the trenches located in the active area causes the implants formed at the bottom of the trenches located in the active area to reach a predetermined concentration. In so doing, the breakdown voltage of both the active and edge termination areas can be made similar and thereby optimized while maintaining advantageous RDson. | 04-09-2009 |
20090050960 | Stacked Trench Metal-Oxide-Semiconductor Field Effect Transistor Device - Embodiments of the present invention are directed toward a trench metal-oxide-semiconductor field effect transistor (TMOSFET) device. The TMOSFET device includes a source-side-gate TMOSFET coupled to a drain-side-gate TMOSFET | 02-26-2009 |
20080258212 | TRENCH METAL OXIDE SEMICONDUCTOR WITH RECESSED TRENCH MATERIAL AND REMOTE CONTACTS - Remote contacts to the polysilicon regions of a trench metal oxide semiconductor (MOS) barrier Schottky (TMBS) device, as well as to the polysilicon regions of a MOS field effect transistor (MOSFET) section and of a TMBS section in a monolithically integrated TMBS and MOSFET (SKYFET) device, are employed. The polysilicon is recessed relative to adjacent mesas. Contact of the source metal to the polysilicon regions of the TMBS section is made through an extension of the polysilicon to outside the active region of the TMBS section. This change in the device architecture relieves the need to remove all of the oxides from both the polysilicon and silicon mesa regions of the TMBS section prior to the contact step. As a consequence, encroachment of contact metal into the sidewalls of the trenches in a TMBS device, or in a SKYFET device, is avoided. | 10-23-2008 |
20080246081 | Self-Aligned Trench MOSFET and Method of Manufacture - A trench metal-oxide-semiconductor field effect transistor (MOSFET), in accordance with one embodiment, includes a drain region, a plurality of gate regions disposed above the drain region, a plurality of gate insulator regions each disposed about a periphery of a respective one of the plurality of gate regions, a plurality of source regions disposed in recessed mesas between the plurality of gate insulator regions, a plurality of body regions disposed in recessed mesas between the plurality of gate insulator regions and between the plurality of source regions and the drain region. The MOSFET also includes a plurality of body contact regions disposed in the each body region adjacent the plurality of source regions, a plurality of source/body contact spacers disposed between the plurality of gate insulator regions above the recessed mesas, a source/body contact disposed above the source/body contact spacers, and a plurality of source/body contact plugs disposed between the source/body contact spacers and coupling the source/body contact to the plurality of body contact regions and the plurality of source regions. | 10-09-2008 |
20080220571 | HIGH MOBILITY POWER METAL-OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTORS - High mobility P-channel power metal oxide semiconductor field effect transistors. In accordance with an embodiment of the present invention, a power MOSFET is fabricated such that the holes flow in an inversion/accumulation channel, which is along the (110) crystalline plane, or equivalents, and the current flow is in the [110] direction, or equivalents, when a negative potential is applied to the gate with respect to the source. The enhanced channel mobility of holes leads to a reduction of the channel portion of the on-state resistance, thereby advantageously reducing total “on” resistance of the device. | 09-11-2008 |