| Taiwan Semiconductor Manufacturing Company, Ltd. Patent applications |
| Patent application number | Title | Published |
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| 20160141366 | Field Effect Transistors and Methods of Forming Same - Semiconductor devices and methods of forming the same are provided. A first gate stack is formed over a substrate, wherein the first gate stack comprises a first ferroelectric layer. A source/channel/drain stack is formed over the first gate stack, wherein the source/channel/drain stack comprises one or more 2D material layers. A second gate stack is formed over the source/channel/drain stack, wherein the second gate stack comprises a second ferroelectric layer. | 05-19-2016 |
| 20160064438 | SEMICONDUCTOR DEVICE HAVING RECESS FILLED WITH CONDUCTIVE MATERIAL AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a first semiconductor chip comprising a first metallic structure and a second semiconductor chip comprising a second metallic structure. The second semiconductor chip is bonded with the first semiconductor chip by a conductive material filled in a through via. The through via connects the first metallic structure and the second metallic structure, wherein a portion of the through via is inside the first semiconductor chip and the second semiconductor chip. | 03-03-2016 |
| 20150349762 | DELAY CONTROLLING CIRCUIT FOR DRIVING CIRCUIT, DRIVING CIRCUIT HAVING DELAY CONTROLLING CIRCUIT, AND METHOD OF OPERATING DRIVING CIRCUIT - A driving circuit includes first and second switches coupled in series, a delay generating circuit and a delay controlling circuit. The delay generating circuit and the delay controlling circuit are coupled to first and second control terminals of the first and second switches. The delay generating circuit is configured to alternately turn ON the first switch and the second switch in accordance with an input signal and with a delay between successive ON times of the first switch and the second switch. The delay controlling circuit is configured to store a setting of the delay, and control the delay generating circuit to generate the delay in accordance with the stored setting, a first voltage on the first control terminal and a second voltage on the second control terminal. | 12-03-2015 |
| 20150349757 | Hysteresis Circuit - A hysteresis circuit includes a current comparator arranged to receive an input current signal. A reference current source is coupled to the current comparator and arranged to provide a reference current. A hysteresis current source is arranged to provide a hysteresis current. A switch is coupled between the reference current source and the hysteresis current source. At least one buffer is coupled to the current comparator and arranged to provide an output voltage signal. The output voltage signal has a first voltage if the input current signal is greater than a sum of the reference current and the hysteresis current and the output voltage signal has a second voltage if the input current signal is less than the reference current. | 12-03-2015 |
| 20150349005 | INTEGRATED CIRCUIT HAVING A LEVEL SHIFTER - An integrated circuit comprises a photodiode having a photodiode output, and a column line electrically coupled to the photodiode. A transfer transistor is electrically coupled to the photodiode and to the column line. A first reset transistor is electrically coupled to the photodiode and to the column line at a first node. The first node is between the transfer transistor and the column line. A second reset transistor is electrically coupled to the photodiode and to the column line at a second node. The second node is between the first node and the column line. A source follower transistor is electrically coupled to the photodiode and to the column line. The source follower transistor is between the second node and the column line. A level shifter is electrically coupled to the photodiode and to the column line. The level shifter is between the first node and the second node. | 12-03-2015 |
| 20150349001 | SEMICONDUCTOR ISOLATION STRUCTURE AND MANUFACTURING METHOD THEREOF - The present disclosure provides a method for manufacturing a semiconductor isolation structure, including providing a substrate with a top surface; forming a patterned mask over the top surface; forming a trench through the patterned mask in the substrate by a directional etch comprising nitrogen-containing substance, wherein an aspect ratio of the trench is formed to be greater than about 18, and a ratio of a width of a narrowest portion and a width of a widest portion of the isolation region is formed to be greater than about 0.7; and filling the trench with insulating materials. The present disclosure also provides an image sensing device, including a radiation sensing region with a first isolation region separating adjacent radiation detecting units and a peripheral region, wherein an aspect ratio of the first isolation region is greater than about 18. | 12-03-2015 |
| 20150348927 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure includes a substrate including a front side, a conductive bump disposed over the front side, and an opaque molding disposed over the front side and around a periphery portion of an outer surface of the conductive bump, wherein the opaque molding includes a recessed portion disposed above a portion of the front side adjacent to a corner of the substrate and extended through the opaque molding to expose the portion of the front side and an alignment feature disposed within the portion of the front side. | 12-03-2015 |
| 20150348923 | SEMICONDUCTOR DEVICE HAVING TRENCH ADJACENT TO RECEIVING AREA AND METHOD OF FORMING THE SAME - In some embodiments in accordance with the present disclosure, a semiconductor device including a semiconductor substrate is received. An interconnect structure is provided over the semiconductor substrate, and a passivation is provided over the interconnect structure. The passivation includes an opening such that a portion of the interconnect structure is exposed. Moreover, a dielectric is provided over the passivation, and a post-passivation interconnect (PPI) is provided over the dielectric. The PPI is configured to connect with the exposed portion of the interconnect structure through an opening in the dielectric. Furthermore, the PPI includes a receiving area for receiving a conductor, and a trench adjacent to the receiving area. In certain embodiments, the receiving area is defined by the trench. | 12-03-2015 |
| 20150348872 | Dummy Structure for Chip-on-Wafer-on-Substrate - Apparatus, and methods of manufacture thereof, in which metal is deposited into openings, thus forming a plurality of metal pads, a plurality of through-silicon-vias (TSVs), a plurality of metal lines, a plurality of first dummy structures, and a plurality of second dummy structures. Ones of the plurality of first dummy structures each have a first width that is at least about three times greater than a second width of each of the plurality of metal lines, and ones of the plurality of second dummy structures each have a third width that is at least about five times greater than the second width of each of the plurality of metal lines. | 12-03-2015 |
| 20150348845 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - Semiconductor devices and methods of manufacture thereof are disclosed. In some embodiments, a method of manufacturing a semiconductor device includes: providing a workpiece having a recess and a dielectric layer lining the recess; forming a conductive structure within the recess, wherein the conductive structure partially fills the recess; and recessing the dielectric layer, wherein, after the recessing, a top surface of the recessed dielectric layer is disposed within the recess. | 12-03-2015 |
| 20150348598 | STATIC RANDOM ACCESS MEMORY AND METHOD OF CONTROLLING THE SAME - A static random access memory (SRAM) that includes a memory cell comprising at least two p-type pass gates. The SRAM also includes a first data line connected to the memory cell, a second data line connected to the memory cell and a voltage control unit connected to the first data line, wherein the voltage control unit is configured to control the memory cell. | 12-03-2015 |
| 20150347664 | SYSTEM FOR AND METHOD OF SEMICONDUCTOR FAULT DETECTION - A method of detecting one or more faults in a semiconductor device that includes generating a first test pattern set from a primary node list and a fault list. The primary node list includes one or more nodes and the fault list identifies one or more faults. The method also includes generating one or more secondary node lists from the primary node list and generating a second test pattern set from at least the first test pattern set and the secondary node list. Each node of the one or more nodes of the primary node list is associated with a corresponding secondary node list of the one or more secondary node lists. | 12-03-2015 |
| 20150340473 | III-V Multi-Channel FinFETs - A device includes insulation regions over portions of a semiconductor substrate, and a III-V compound semiconductor region over top surfaces of the insulation regions, wherein the III-V compound semiconductor region overlaps a region between opposite sidewalls of the insulation regions. The III-V compound semiconductor region includes a first and a second III-V compound semiconductor layer formed of a first III-V compound semiconductor material having a first band gap, and a third III-V compound semiconductor layer formed of a second III-V compound semiconductor material between the first and the second III-V compound semiconductor layers. The second III-V compound semiconductor material has a second band gap lower than the first band gap. A gate dielectric is formed on a sidewall and a top surface of the III-V compound semiconductor region. A gate electrode is formed over the gate dielectric. | 11-26-2015 |
| 20150340469 | Method For Non-Resist Nanolithography - A method for forming a semiconductor device is provided. A first patterned mask is formed on the substrate, the first patterned mask having a first opening therein. A second patterned mask is formed on the substrate in the first opening, the first patterned mask and the second patterned mask forming a combined patterned mask. The combined patterned mask is formed having one or more second openings, wherein one or more unmasked portions of the substrate are exposed. Trenches that correspond to the one or more unmasked portions of the substrate are formed in the substrate in the one or more second openings. | 11-26-2015 |
| 20150340329 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME - In some embodiments in accordance with the present disclosure, a semiconductor device having a semiconductor substrate is provided. A metal structure is disposed over the semiconductor substrate, and a post-passivation interconnect (PPI) is disposed over the metal structure. In addition, the upper surface of the PPI is configured to receive a bump thereon. In certain embodiments, the upper surface of the PPI for receiving the bump is substantially flat. A positioning member is formed over the PPI and configured to accommodate the bump. In some embodiments, the positioning member is configured to limit bump movement after the bump is disposed over the PPI so as to retain the bump at a predetermined position. | 11-26-2015 |
| 20150338747 | Wafer Stage Temperature Control - A method includes loading a wafer onto a wafer stage of a lithography system, the wafer stage comprising a heating component and a temperature sensing component. The method further includes controlling the heating component such that a temperature of the wafer stage approaches a desired point. The controlling step comprises use of a characterization curve associated with the heating component. | 11-26-2015 |
| 20150334331 | PIXEL UNIT CELL HAVING CONVERSION CIRCUIT - A circuit includes a signal line and a pixel unit cell. The pixel unit cell includes one or more light sensing elements, a conversion circuit, and a selection switch between the conversion circuit and the signal line. In the pixel unit cell, the conversion circuit is configured to convert charge carriers from the one or more light sensing elements to a voltage signal at an output node of the conversion circuit. | 11-19-2015 |
| 20150334324 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME - In some embodiments in accordance with the present disclosure, an image sensor is provided. The image sensor includes a substrate having a body. The body includes a first surface and a second surface opposite to the first surface. A through via is configured to extend from the first surface to the second surface. An intermediate layer is disposed over the body and configured to cover the through via. An image sensing device is disposed over the intermediate layer. In addition, a lens structure is disposed over the substrate, the intermediate layer and the image sensing device. In certain embodiments, the image sensing device is curved. In some embodiments, the image sensing device includes a semiconductor chip having a CMOS image sensing array. | 11-19-2015 |
| 20150333763 | READOUT CIRCUIT AND METHOD OF USING THE SAME - A readout circuit includes a first analog circuit for receiving an output of a first sub-array of a pixel array, wherein the first analog circuit is configured to output a first analog signal. The readout circuit further includes a second analog circuit for receiving an output of a second sub-array of the pixel array, wherein the second sub-array comprises at least one pixel on a same row of the pixel array as at least one pixel of the first sub-array, and the second analog circuit is configured to output a second analog signal. The readout circuit further includes a first digital circuit for receiving the first analog signal and to convert the first analog signal to a first digital signal, wherein the first digital circuit is further configured to receive the second analog signal and to convert the second analog signal to a second digital signal. | 11-19-2015 |
| 20150333753 | IO AND PVT CALIBRATION USING BULK INPUT TECHNIQUE - The present invention discloses an efficient way to match the impedance between a pull-up path and a pull-down path of an IO cell without using stacked devices on the output stage of the IO cell to save area and to achieve higher speed; back-gate (bulk or body) voltages of a pull-up transistor and a pull-down transistor of the IO cell can be respectively adjusted to a value to achieve the desired impedance values of the pull-up and pull-down paths. A central calibration unit can generate an impedance calibration code and distribute them to a local adjustable bias generator in each IO cell groups, wherein the local adjustable bias generator, which is embedded in a power or a ground pad, receives the impedance calibration code and generates bias voltages to the back-gates of the pull-up and pull-down transistors for setting impedance values of the pull-up and pull-down paths, respectively. | 11-19-2015 |
| 20150333012 | METHOD OF FORMING A COPPER LAYER USING PHYSICAL VAPOR DEPOSITION - A method of forming a semiconductor structure includes the steps: providing a substrate; forming a dielectric over the substrate; forming an opening recessed under a top surface of the dielectric; forming a barrier layer on a sidewall of the opening; performing a physical vapor deposition (PVD) to form a copper layer over the barrier layer, a corner of the opening intersecting with the top surface and the top surface with a predetermined resputter ratio so that the ratio of the thickness of the copper layer on the barrier layer and the thickness of the copper layer over the top surface is substantially greater than 1. | 11-19-2015 |
| 20150333011 | SEMICONDUCTOR DEVICE HAVING AIR GAP STRUCTURES AND METHOD OF FABRICATING THEREOF - One method includes forming a conductive feature in a dielectric layer on a substrate. A first hard mask layer and an underlying second hard mask layer are formed on the substrate. The second hard mask layer has a higher etch selectivity to a plasma etch process than the first hard mask layer. The second hard mask layer may protect the dielectric layer during the formation of a masking element. The method continues to include performing plasma etch process to form a trench in the dielectric layer, which may also remove the first hard mask layer. A cap is then formed over the trench to form an air gap structure adjacent the conductive feature. | 11-19-2015 |
| 20150332999 | SEMICONDUCTOR INTERCONNECT STRUCTURE AND MANUFACTURING METHOD THEREOF - The present disclosure provides an interconnect structure, including a low k dielectric layer with an air gap region and a non-air gap region. A first conductive line is positioned in the air gap region, and a second conductive line is positioned in the non-air gap region of the low k dielectric layer. A height of the first conductive line is different from a height of the second conductive line. The present disclosure also provides a method for manufacturing a semiconductor interconnect structure, including forming a photoresist layer over a hard mask layer with openings exposing a low k dielectric layer; treating the low k dielectric layer to be more hydrophilic through the openings of the hard mask layer; and removing the treated low k dielectric region to form an air gap in the air gap region. | 11-19-2015 |
| 20150332962 | Structure and Method for Semiconductor Device - Provided is a semiconductor device and methods of forming the same. The semiconductor device includes a substrate having source/drain regions and a channel region between the source/drain regions; a gate structure over the substrate and adjacent to the channel region; source/drain contacts over the source/drain regions and electrically connecting to the source/drain regions; and a contact protection layer over the source/drain contacts. The gate structure includes a gate stack and a spacer. A top surface of the source/drain contacts is lower than a top surface of the spacer, which is substantially co-planar with a top surface of the contact protection layer. The contact protection layer prevents accidental shorts between the gate stack and the source/drain regions when gate vias are formed over the gate stack. Therefore, gate vias may be formed over any portion of the gate stack, even in areas that overlap the channel region from a top view. | 11-19-2015 |
| 20150332939 | MULTIPLE SWIVEL ARM DESIGN IN HYBRID BONDER - An apparatus for cleaning a wafer includes a wafer station configured to hold the wafer, and a first and a second dispensing system. The first dispensing system includes a first swivel arm, and a first nozzle on the first swivel arm, wherein the first swivel arm is configured to move the first nozzle over and aside of the wafer. The first dispensing system includes first storage tank connected to the first nozzle, with the first nozzle configured to dispense a solution in the first storage tank. The second dispensing system includes a second swivel arm, and a second nozzle on the second swivel arm, wherein the second swivel arm is configured to move the second nozzle over and aside of the wafer. The second dispensing system includes a second storage tank connected to the second nozzle, with the second nozzle configured to dispense a solution in the second storage tank. | 11-19-2015 |
| 20150332922 | Semiconductor Integrated Circuit Fabrication With Pattern-Reversing Process - A method of fabricating a semiconductor integrated circuit (IC) is disclosed. An inverse mask is provided. A sacrificial layer is deposited over a substrate. A patterned photoresist layer is formed over the sacrificial layer using the inverse mask. The sacrificial layer is then etched through the patterned photoresist layer to form a patterned sacrificial layer. A hard mask layer is deposited over the patterned sacrificial layer. The patterned sacrificial layer is then removed to form a second pattern on the hard mask layer. | 11-19-2015 |
| 20150329351 | Vacuum Sealed MEMS and CMOS Package - A vacuum sealed MEMS and CMOS package and a process for making the same may include a capping wafer having a surface with a plurality of first cavities, a first device having a first surface with a second plurality of second cavities, a hermetic seal between the first surface of the first device and the surface of the capping wafer, and a second device having a first surface bonded to a second surface of the first device. The second device is a CMOS device with conductive through vias connecting the first device to a second surface of the second device, and conductive bumps on the second surface of the second device. Conductive bumps connect to the conductive through vias and wherein a plurality of conductive bumps connect to the second device. The hermetic seal forms a plurality of micro chambers between the capping wafer and the first device. | 11-19-2015 |
| 20150325522 | INTERCONNECT STRUCTURE AND MANUFACTURING METHOD THEREOF - A method for manufacturing a semiconductor comprises: providing a substrate; forming an opening in a dielectric layer disposed over the substrate; providing a target with a first type atoms; ionizing the first type atoms provided from the target; providing a bias to the substrate for controlling the moving paths of the ionized first type atoms thereby directing the ionized first type atoms in the opening; and forming a first conductive structure from bottom of the opening with the ionized first type atoms under a pre-determined frequency and a pre-determined pressure. | 11-12-2015 |
| 20150325497 | 3D CHIP-ON-WAFER-ON-SUBSTRATE STRUCTURE WITH VIA LAST PROCESS - Disclosed herein is a package having a first redistribution layer (RDL) disposed on a first semiconductor substrate and a second RDL disposed on a second semiconductor substrate. The first RDL is bonded to the second RDL. The package further includes an insulating film disposed over the second RDL and around the first RDL and the first semiconductor substrate. A conductive element is disposed in the first RDL. A via extends from a top surface of the insulating film, through the first semiconductor substrate to the conductive element, and a spacer is disposed between the first semiconductor substrate and the via. The spacer extends through the first semiconductor substrate. | 11-12-2015 |
| 20150325484 | METAL-SEMICONDUCTOR CONTACT STRUCTURE WITH DOPED INTERLAYER - Disclosed herein is a method of forming a metal-to-semiconductor contact with a doped metal oxide interlayer. An insulating layer is formed on a top surface of a semiconductor substrate with target region at the top surface of the semiconductor substrate. An opening is etched through the insulating layer with the opening exposing a top surface of a portion of the target region. A doped metal oxide interlayer is formed in the opening and contacts the top surface of the target region. The remainder of the opening is filled with a metal plug, the doped metal oxide interlayer disposed between the metal plug and the substrate. The doped metal oxide interlayer is formed from one of tin oxide, titanium oxide or zinc oxide and is doped with fluorine. | 11-12-2015 |
| 20150325417 | METHODS FOR REMOVING PARTICLES FROM ETCHING CHAMBER - A method includes forming a coating layer in a dry etching chamber, placing a wafer into the dry etching chamber, etching a metal-containing layer of the wafer, and moving the wafer out of the dry etching chamber. After the wafer is moved out of the dry etching chamber, the coating layer is removed. | 11-12-2015 |
| 20150323862 | PARTICLE REMOVAL SYSTEM AND METHOD THEREOF - A method of removing particles from a surface of a reticle is disclosed. The reticle is placed in a carrier, a source gas is flowed into the carrier, and a plasma is generated within the carrier. Particles are then removed from a surface of the reticle using the generated plasma. A system of removing particles from a surface includes a carrier configured to house a reticle, a reticle stocker including the carrier, a power supply configured to apply a potential between an inner cover and an inner baseplate of the carrier, and a gas source configured to flow a gas into the carrier. A plasma may be generated within the carrier, and particles can be removed from a surface of the reticle using the generated plasma. An acoustic energy source configured to agitate at least one of the source gas and the generated plasma may be provided to facilitate particle removal using an agitated plasma. | 11-12-2015 |
| 20150318381 | Method for FinFET Device - Provided is a method of forming a fin field effect transistor (FinFET). The method includes forming a fin on a substrate, the fin having a channel region therein. The method further includes forming a gate structure engaging the fin adjacent to the channel region and forming a spacer on sidewalls of the gate structure. The method further includes forming two recesses in the fin adjacent to the spacer and on opposite sides of the gate structure and epitaxially growing a solid phase diffusion (SPD) layer in the two recesses, the SPD layer containing a high concentration of a dopant. The method further includes performing an annealing process thereby diffusing the dopant into the fin underneath the spacer and forming lightly doped source/drain (LDD) regions therein. The LDD regions have substantially uniform dopant concentration on top and sidewalls of the fin. | 11-05-2015 |
| 20150318209 | Self-Aligned Semiconductor Fabrication With Fosse Features - The present disclosure describes methods for transferring a desired layout into a target layer on a semiconductor substrate. An embodiment of the methods includes forming a first desired layout feature as a first line over the target layer; forming a spacer around the first line; depositing a spacer-surrounding material layer; removing the spacer to form a fosse pattern trench surrounding the first line; and transferring the fosse pattern trench into the target layer to form a fosse feature trench in the target layer, wherein the fosse feature trench surrounds a first portion of the target layer that is underneath a protection layer. In some embodiments, the method further includes patterning a second desired layout feature of the desired layout into the target layer wherein the fosse feature trench and the protection layer serve to self-align the second desired layout feature with the first portion of the target layer. | 11-05-2015 |
| 20150318173 | Method of Semiconductor Integrated Circuit Fabrication - A method of fabricating a semiconductor integrated circuit (IC) is disclosed. A dielectric layer is formed over a substrate. An interlayer is formed over the dielectric layer. A first photoresist layer with a first opening is formed over the interlayer and a second photoresist layer having a second opening is formed over the first photoresist layer. Spacers are formed along sidewalls of the first opening and the second opening. A first trench is formed in the interlayer by using the spacer along the first opening as an etch mask. A second trench is formed in the interlayer by using the spacer along the second opening as an etch mask. The first trench and the second trench are extended down into the dielectric layer as a lower portion and an upper portion, respectively, of a dielectric trench. | 11-05-2015 |
| 20150311342 | FINFET WITH ESD PROTECTION - In some embodiments, a field effect transistor structure includes a substrate, a fin structure and a gate structure. The fin structure is formed over the substrate. The fin structure includes a first channel region, a first source or drain region and a second source or drain region. The first source or drain region and the second source or drain region are formed on opposite ends of the first channel region, respectively. The well region is formed of the same conductivity type as the second source or drain region, connected to the second source or drain region, and extended to the substrate. The first gate structure wraps around the first channel region in the fin structure. | 10-29-2015 |
| 20150311335 | STRUCTURE AND METHOD FOR FINFET DEVICE - The present disclosure provides a fin-like field-effect transistor (FinFET) device. The device includes a substrate having a first region, a second region and a third region. The first region includes a first fin structure, a first high-k (HK)/metal gate (MG) stack wrapping over an upper portion of the first fin structure and a first source/drain features, separated by the first HK/MG stack, over the recessed first fin structure. The second region includes a second fin structure, the first source/drain features over a portion of the recessed second fin structure. The third region includes a dummy gate stack over the second fin structure and the two first regions are separated by the second region, or by the third region. | 10-29-2015 |
| 20150311212 | Structure and Method for SRAM FinFET Device - The present disclosure provides an embodiment of a fin-like field-effect transistor (FinFET) device. The device includes a substrate having an n-type FinFET (NFET) region and a p-type FinFET (PFET) region. The device also includes a first and a second fin structures over the substrate in the NFET region and a third fin structure over the substrate in the PFET region. The device also includes a first high-k (HK)/metal gate (MG) stack in the NFET region, including wrapping over a portion of the first fin structure, a first subset of the first source/drain (S/D) features, adjacent to the first HK/MG stack, over the recessed first fin structure and a second subset of the first S/D features partially over the recessed second fin structure and partially over the recessed first fin structure. | 10-29-2015 |
| 20150311150 | Metal Contact Structure and Method of Forming the Same - A semiconductor device and method of formation are provided. The semiconductor device comprises a silicide layer over a substrate, a metal plug in an opening defined by a dielectric layer over the substrate, a first metal layer between the metal plug and the dielectric layer and between the metal plug and the silicide layer, a second metal layer over the first metal layer, and an amorphous layer between the first metal layer and the second metal layer. | 10-29-2015 |
| 20150311114 | SEMICONDUCTOR STRUCTURE AND METHOD OF MAKING THE SAME - The present disclosure provides a method for forming a semiconductor structure. In accordance with some embodiments, the method includes providing a substrate and a conductive feature formed over the substrate; forming a low-k dielectric layer over the conductive feature; forming a contact trench aligned with the conductive feature; and selectively growing a sealing layer which is a monolayer formed on sidewalls of the contact trench. | 10-29-2015 |
| 20150311094 | ASSEMBLY STRUCTURE FOR CONNECTING MULTIPLE DIES INTO A SYSTEM-IN-PACKAGE CHIP AND THE METHOD THEREOF - A method for assembling multiple integrated circuit dies into a system-in-package chip is disclosed, the method comprising: providing a plurality of integrated circuit dies; disposing at least one redistribution layer on at least one of the plurality of integrated circuit dies for making wire connections among the plurality of integrated circuit dies without using a substrate underneath the plurality of integrated circuit dies; establishing wire connections among the plurality of integrated circuit dies and verifying the plurality of wire connections; and packaging the plurality of integrated circuit dies and the verified wire connections into a system-in-package chip. | 10-29-2015 |
| 20150311086 | Systems and Methods for a Sequential Spacer Scheme - The present disclosure describes methods for transferring a desired layout into a target layer. The method includes a step of forming a spacer, having a second width, around a first and a second desired layout feature pattern of the desired layout over a semiconductor substrate. The first desired layout feature pattern is formed using a first sub-layout and the second desired layout feature pattern is formed using a second sub-layout. The first and second desired layout feature patterns are separated by a first width. The method further includes forming a third desired layout feature pattern according to a third sub-layout. The third desired layout feature pattern is shaped in part by the spacer. The method further includes removing the spacer from around the first and second desired layout feature pattern and etching the target layer using the first, second, and third layout feature patterns as masking features. | 10-29-2015 |
| 20150311075 | Method for Integrated Circuit Patterning - Provided is a method of patterning a substrate. The method includes forming a resist layer over the substrate, wherein a layer of resist scum forms in between a first portion of the resist layer and the substrate. The method further includes patterning the resist layer to form a plurality of trenches in the first portion, wherein the layer of resist scum provides a floor for the plurality of trenches. The method further includes forming a first material layer in the plurality of trenches, wherein the first material layer has a higher etch resistance than the resist layer and the layer of resist scum. The method further includes etching the first material layer, the resist layer, and the layer of resist scum, thereby forming a patterned first material layer over a patterned layer of resist scum over the substrate. | 10-29-2015 |
| 20150311063 | Methods for Integrated Circuit Design and Fabrication - The present disclosure provides a method of patterning a target material layer over a semiconductor substrate. The method includes steps of: forming a plurality of first features over the target material layer using a first sub-layout, with each first feature having sidewalls; forming a plurality of spacer features, with each spacer feature conforming to the sidewalls of one of the first features and having a spacer width; and forming a plurality of second features over the target material layer using a second sub-layout. The method further includes steps of removing the plurality of spacer features from around each first feature and patterning the target material layer using the plurality of first features and the plurality of second features. Other methods and associated patterned semiconductor wafers are also provided herein. | 10-29-2015 |
| 20150310158 | Method for Integrated Circuit Manufacturing - Provided is an integrated circuit (IC) manufacturing method. The method includes receiving a design layout of an IC, wherein the design layout includes a plurality of non-overlapping IC regions and each of the IC regions includes a same initial IC pattern. The method further includes dividing the IC regions into a plurality of groups based on a location effect analysis such that all IC regions in a respective one of the groups are to have substantially same location effect. The method further includes performing a correction to one IC region in each of the groups using a correction model that includes location effect; and copying the corrected IC region to other IC regions in the respective group. The method further includes storing the corrected IC design layout in a tangible computer-readable medium for use by a further IC process stage. | 10-29-2015 |
| 20150310156 | METHOD AND APPARATUS FOR OPTICAL PROXIMITY CORRECTION - Some embodiments of the present disclosure provide an integrated circuit (IC) design method. The method includes (1) receiving a first layout comprising stripe patterns with a first separation and a first width; (2) receiving a second layout comprising stripe patterns with a second width narrower than the first separation, each stripe on the second layout is configured to situate between two adjacent stripes on the first layout when overlaying the first layout and the second layout; (3) performing a separation check by identifying a spacing between a stripe on the second layout and one of the two adjacent stripes on the first layout; and (4) adjusting the spacing between the stripe on the second layout and one of the two adjacent stripes on the first layout when the separation check determining the spacing is greater than a predetermined value. | 10-29-2015 |
| 20150309074 | PROBE CARD - In some embodiments, a probe card includes a PCB, a substrate, a pair of probes, a capacitive device and a first part. The PCB includes a pair of conductive paths through a first surface and a second surface of the PCB. The substrate includes a pair of conductive paths through a first surface and a second surface of the substrate. The conductive paths of the substrate and the corresponding conductive paths of the PCB are coupled between the first surface of the substrate and the second surface of the PCB. The probes and the corresponding conductive paths of the substrate are coupled beyond the second surface of the substrate. The capacitive device is coupled between a first conductive path and a second conductive path through the PCB, the substrate and the probes. The first part is configured beyond the second surface of the PCB, and holds the capacitive device. | 10-29-2015 |
| 20150307747 | CMP SLURRY SOLUTION FOR HARDENED FLUID MATERIAL - A method for performing a Chemical Mechanical Polishing (CMP) process includes applying a CMP slurry solution to a surface of a hardened fluid material on a substrate, the solution comprising an additive to change a bonding structure on the surface of the hardened fluid material. The method further includes polishing the surface of the hardened fluid material with a polishing head. | 10-29-2015 |
| 20150303305 | FinFET Device with High-K Metal Gate Stack - The present disclosure provides a semiconductor device that includes a substrate, a first fin structure over the substrate. The first fin structure includes a first semiconductor material layer, having a semiconductor oxide layer as its outer layer, as a lower portion of the first fin structure. The first semiconductor has a first width. The first fin structure also includes a second semiconductor material layer as an upper portion of the first fin structure. The second semiconductor material layer has a third width, which is substantially smaller than the first width. The semiconductor structure also includes a gate region formed over a portion of the first fin and a high-k (HK)/metal gate (MG) stack on the substrate including wrapping over a portion of the first fin structure in the gate region. | 10-22-2015 |
| 20150303299 | 3D UTB TRANSISTOR USING 2D MATERIAL CHANNELS - A semiconductor device and a method of manufacture are provided. A substrate has a dielectric layer formed thereon. A three-dimensional feature, such as a trench or a fin, is formed in the dielectric layer. A two-dimensional layer, such as a layer (or multilayer) of graphene, transition metal dichalcogenides (TMDs), or boron nitride (BN), is formed over sidewalls of the feature. The two-dimensional layer may also extend along horizontal surfaces, such as along a bottom of the trench or along horizontal surfaces of the dielectric layer extending away from the three-dimensional feature. A gate dielectric layer is formed over the two-dimensional layer and a gate electrode is formed over the gate dielectric layer. Source/drain contacts are electrically coupled to the two-dimensional layer on opposing sides of the gate electrode. | 10-22-2015 |
| 20150303198 | METHOD AND STRUCTURE FOR FINFET DEVICE - The present disclosure provides a method for fabricating a fin-like field-effect transistor (FinFET). The method includes forming a first fin structures over a substrate, forming a patterned oxidation-hard-mask (OHM) over the substrate to expose the first fin structure in a first gate region of a n-type FET region, forming a semiconductor oxide feature in a middle portion of the first fin structure in the first gate region, forming a second fin structure in a PFET region, forming dummy gates, forming source/drain (S/D) features, replacing the dummy gates by a first high-k/metal gate (HK/MG) in the NFET region and a second HK/MG in the PFET region. | 10-22-2015 |
| 20150303163 | UNDERFILL DISPENSING WITH CONTROLLED FILLET PROFILE - A method includes placing an underfill-shaping cover on a package component of a package, with a device die of the package extending into an opening of the underfill-shaping cover. An underfill is dispensed into the opening of the underfill-shaping cover. The underfill fills a gap between the device die and the package component through capillary. The method further includes, with the underfill-shaping cover on the package component, curing the underfill. After the curing the underfill, the underfill-shaping cover is removed from the package. | 10-22-2015 |
| 20150303118 | Wrap-Around Contact - Fin structures are formed on a substrate. An isolation region is between the fin structures. The fin structures comprise epitaxial regions extending above the isolation region. Each of the epitaxial regions has a widest mid-region between an upper-surface and an under-surface. A dual-layer etch stop is formed over the fin structures and comprises a first sub-layer and a second sub-layer. The first sub-layer is along the upper- and under-surfaces and the isolation region. The second sub-layer is over the first sub-layer and along the upper-surfaces, and the second sub-layer merges together proximate the widest mid-regions of the epitaxial regions. Portions of the dual-layer etch stop are removed from the upper- and under-surfaces. A dielectric layer is formed on the upper- and under-surfaces. A metal layer is formed on the dielectric layer on the upper-surfaces. A barrier layer is formed on the metal layer and along the under-surfaces. | 10-22-2015 |
| 20150302938 | DETECTING WRITE DISTURB IN MULTI-PORT MEMORIES - A circuit comprises a memory cell, a first circuit, and a second circuit. The memory cell has a first control line and a second control line. The first control line carries a first control signal. The second control line carries a second control signal. The first circuit is coupled with the first control line, the second control line, and a node. The second circuit is coupled to the node and is configured to receive a first clock signal and a second clock signal. The first circuit and the second circuit, based on the first control signal, the second control signal, the first clock signal and the second clock signal, are configured to generate a node signal on the node. A logical value of the node signal indicates a write disturb condition of the memory cell. | 10-22-2015 |
| 20150302128 | ELECTROMIGRATION-AWARE LAYOUT GENERATION - In some embodiments, in a method, placement of a design layout is performed. The design layout includes a power rail segment, several upper-level power lines and several cells. The upper-level power lines cross over and bound the power rail segment at where the upper-level power lines intersect with the power rail segment. The cells are powered through the power rail segment. For each cell, a respective current through the power rail segment during a respective SW of the cell is obtained. One or more groups of cells with overlapped SWs are determined. One or more EM usages of the power rail segment by the one or more groups of cells using the respective currents of each group of cells are obtained. The design layout is adjusted when any of the one or more EM usages of the power rail segment causes an EM susceptibility of the power rail segment. | 10-22-2015 |
| 20150295089 | FINFETS WITH CONTACT-ALL-AROUND - An integrated circuit structure includes a semiconductor substrate, a semiconductor fin over the semiconductor substrate, a gate stack on a top surface and a sidewall of the semiconductor fin, a source/drain region on a side of the gate stack, and a contact plug encircling a portion of the source/drain region. | 10-15-2015 |
| 20150294955 | Stacked Semiconductor Structure and Method - A method for forming a stacked semiconductor structure comprises providing a first chip comprising a plurality of first active circuits and a first aluminum connection pad, depositing a first dielectric layer on a first side of the first chip, forming a first copper bonding pad on the first aluminum connection pad, providing a second chip comprising a plurality of second active circuits, depositing a second dielectric layer on a first side of the second chip, forming a second copper bonding pad in the second dielectric layer, stacking the first chip on the second chip, wherein the first copper bonding pad is in direct contact with the second copper bonding pad and bonding the first chip and the second chip to form a uniform bonded feature. | 10-15-2015 |
| 20150294939 | Packages and Packaging Methods for Semiconductor Devices, and Packaged Semiconductor Devices - Packages and packaging methods for semiconductor devices, and packaged semiconductor devices are disclosed. In some embodiments, a package for a semiconductor device includes a molding compound and a plurality of through-vias disposed in the molding compound. The package includes an interconnect structure disposed over the plurality of through-vias and the molding compound. The interconnect structure includes a metallization layer. The metallization layer includes a plurality of contact pads and a fuse. | 10-15-2015 |
| 20150294937 | INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME - An interconnect structure and a method of forming an interconnect structure are disclosed. The interconnect structure includes a low-k (LK) dielectric layer over a substrate; a first conductive feature in the LK dielectric layer, wherein the first conductive feature has a first sidewall, a second sidewall facing the first sidewall, and a first bottom surface contacting the LK dielectric layer; a first dielectric feature along an upper portion of the first sidewall, wherein a length of the first dielectric feature is at least 10 percent less than a length of the first sidewall; and a second dielectric feature along an upper portion of the second sidewall. The interconnect structure may also include a second conductive feature adjacent to the first conductive feature in the LK dielectric layer. | 10-15-2015 |
| 20150294881 | Microwave Anneal (MWA) for Defect Recovery - The embodiments of processes and structures described above provide mechanisms for annealing defects by microwave anneal (MWA). MWA causes ionic/atomic (ionic and/or atomic) polarization, electronic polarization, and/or interfacial polarization in a substrate with dopants, damages, and interfaces in crystalline structures. The polarizations make the local temperatures higher than the substrate temperature. As a result, MWA can remove damages at a relatively low substrate temperature than other anneal mechanisms and is able to prevent undesirable dopant diffusion. The relatively low substrate temperature also makes MWA compatible with advanced processing technologies which demands lower substrate temperatures during front-end processing. MWA used in annealing defects (or damages) created in forming source and drain regions improves NMOS transistor performance. | 10-15-2015 |
| 20150294865 | SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING THE SAME - Semiconductor devices and methods for manufacturing the same are disclosed. In an embodiment, a method of manufacturing a semiconductor device may include providing a substrate having a recess; epitaxially forming a first layer including a doped semiconductor material within the recess; and epitaxially forming a second layer including an undoped semiconductor material over at least a portion of the recess. | 10-15-2015 |
| 20150294862 | Developing Unit With Multi-Switch Exhaust Control For Defect Reduction - The present disclosure provides a developing unit that includes a wafer stage designed to secure a semiconductor wafer; an exhaust mechanism configured around the wafer stage and designed to exhaust a fluid from the semiconductor wafer; and a multi-switch integrated with the exhaust mechanism and designed to control the exhaust mechanism at various open states. | 10-15-2015 |
| 20150294057 | Method of Fabricating an Integrated Circuit with Block Dummy for Optimized Pattern Density Uniformity - The present disclosure provides one embodiment of an IC method that includes receiving an IC design layout including a plurality of main features; choosing isolation distances to the IC design layout; oversizing the main features according to each of the isolation distances; generating a space block layer for the each of the isolation distances by a Boolean operation according to oversized main features; choosing an optimized space block layer and an optimized block dummy density ratio of the IC design layout according to pattern density variation; generating dummy features in the optimized space block layer according to the optimized block dummy density ratio; and forming a tape-out data of the IC design layout including the main features and the dummy features, for IC fabrication. | 10-15-2015 |
| 20150294056 | Method of Fabricating an Integrated Circuit with Optimized Pattern Density Uniformity - The present disclosure provides an IC method that includes receiving an IC design layout having main features; generating a plurality of space block layers to the IC design layout, each of the space block layers being associated with an isolation distance and a plurality of space blocks; calculating main pattern density PD | 10-15-2015 |
| 20150287834 | MOS Devices with Ultra-High Dielectric Constants and Methods of Forming the Same - An integrated circuit structure includes a semiconductor substrate, and a gate stack over the semiconductor substrate. The gate stack includes a high-k gate dielectric over the semiconductor substrate, and a magnetic compound over and in contact with the high-k gate dielectric. A source region and a drain region are on opposite sides of the gate stack. The gate stack, the source region, and the drain region are portions of a Metal-Oxide-Semiconductor (MOS) device. | 10-08-2015 |
| 20150287802 | TUNNEL MOSFET WITH FERROELECTRIC GATE STACK - A Tunnel Field-Effect Transistor (TFET) includes a source region in a semiconductor substrate, and a drain region in the semiconductor substrate. The source region and the drain region are of opposite conductivity types. The TFET further includes a gate stack over the semiconductor substrate, with the source region and the drain region extending to opposite sides of the gate stack. The gate stack includes a gate dielectric over the semiconductor substrate, and a ferroelectric layer over the gate dielectric. | 10-08-2015 |
| 20150287798 | Device Having Sloped Gate Profile and Method of Manufacture - A semiconductor device having an open profile gate electrode, and a method of manufacture, are provided. A funnel-shaped opening is formed in a dielectric layer and a gate electrode is formed in the funnel-shaped opening, thereby providing a gate electrode having an open profile. In some embodiments, first and second gate spacers are formed alongside a dummy gate electrode. The dummy gate electrode is removed and upper portions of the first and second gate spacers are removed. The first and second gate spacers may be formed of different materials having different etch rates. | 10-08-2015 |
| 20150287700 | PACKAGES WITH METAL LINE CRACK PREVENTION DESIGN - A package includes a corner, a device die, a plurality of redistribution lines underlying the device die, and a plurality of metal pads electrically coupled to the plurality of redistribution lines. The plurality of metal pads includes a corner metal pad closest to the corner, wherein the corner metal pad is a center-facing pad having a bird-beak direction substantially pointing to a center of the package. The plurality of metal pads further includes a metal pad farther away from the corner than the corner metal pad, wherein the metal pad is a non-center-facing pad having a bird-beak direction pointing away from the center of the package. | 10-08-2015 |
| 20150287697 | Semiconductor Device and Method - In accordance with an embodiment a first semiconductor die and a second semiconductor die are bonded to a first substrate. A protective cap is formed over and between the first semiconductor die and the second semiconductor die. An encapsulant is placed over the protective layer and portions of the encapsulant are removed in order to expose the protective cap or, alternatively, to expose the first semiconductor device and the second semiconductor device. The first substrate may then be bonded to a second substrate. | 10-08-2015 |
| 20150286146 | Systems and Methods for Improving Pattern Transfer - Provided herein is a method of improving a transference of a mask pattern into a material layer on a semiconductor wafer. The method includes steps of receiving a semiconductor mask made from a desired design layout and of patterning the material layer present on a plurality of semiconductor wafers with the mask having the mask pattern and an illumination pattern. The method further includes steps of identifying defects and/or defect patterns in the transference of the mask pattern on the plurality of semiconductor wafers, determining an illumination modification, and applying the illumination modification to the illumination pattern to create a modified illumination pattern. Additional methods and associated systems are also provided. | 10-08-2015 |
| 20150279894 | CMOS Image Sensor with Epitaxial Passivation Layer - The present disclosure provides a complimentary metal-oxide-semiconductor (CMOS) image sensor (CIS) device. In accordance with some embodiments, the device includes a semiconductor region having a front surface and a back surface; a light-sensing region extending from the front surface towards the back surface within the semiconductor region; a gate stack formed over the semiconductor region; and at least one epitaxial passivation layer disposed at least one of over and below the light-sensing region. In some embodiments, the at least one epitaxial passivation layer includes a p-type doped silicon (Si) layer. | 10-01-2015 |
| 20150279889 | Uniform-Size Bonding Patterns - A semiconductor device, and a method of fabrication, is introduced. In an embodiment, one or more passivation layers are formed over a first substrate. Recesses are formed in the passivation layers and a first plurality of bonding pads and a second plurality of bonding pads are formed in the recesses. In an embodiment, the first plurality of bonding pads have a first width and a first pitch, and the second plurality of bonding pads have the first width and are grouped into clusters. The first plurality of bonding pads and the second plurality of bonding pads in the first substrate are aligned to a third plurality of bonding pads in a second substrate and are bonded using a direct bonding method. | 10-01-2015 |
| 20150279888 | HYBRID BONDING WITH UNIFORM PATTERN DENSITY - A chip includes a semiconductor substrate, integrated circuits with at least portions in the semiconductor substrate, and a surface dielectric layer over the integrated circuits. A plurality of metal pads is distributed substantially uniformly throughout substantially an entirety of a surface of the chip. The plurality of metal pads has top surfaces level with a top surface of the surface dielectric layer. The plurality of metal pads includes active metal pads and dummy metal pads. The active metal pads are electrically coupled to the integrated circuits. The dummy metal pads are electrically decoupled from the integrated circuits. | 10-01-2015 |
| 20150279880 | BACKSIDE ILLUMINATED IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME - A backside illuminated (BSI) image sensor device includes: a substrate including a front side and a back side; a multilayer structure over the back side; and a radiation-sensing region in the substrate. The radiation-sensing region is configured to receive a radiation wave entering from the back side and transmitting through the multilayer structure. The multilayer structure includes a first high-k dielectric layer, a metal silicide layer and a second high-k dielectric layer. The first high-k dielectric layer is located over the back side. The metal silicide layer is sandwiched between the first high-k dielectric layer and the second high-k dielectric layer. | 10-01-2015 |
| 20150279840 | FINFETS WITH LOW SOURCE/DRAIN CONTACT RESISTANCE - An integrated circuit structure includes a semiconductor substrate, insulation regions extending into the semiconductor substrate, with the insulation regions including first top surfaces and second top surfaces lower than the first top surfaces, a semiconductor fin over the first top surfaces of the insulation regions, a gate stack on a top surface and sidewalls of the semiconductor fin, and a source/drain region on a side of the gate stack. The source/drain region includes a first portion having opposite sidewalls that are substantially parallel to each other, with the first portion being lower than the first top surfaces and higher than the second top surfaces of the insulation regions, and a second portion over the first portion, with the second portion being wider than the first portion. | 10-01-2015 |
| 20150279837 | Semiconductor Device Fabrication Method and Structure - A semiconductor device, and a method of fabrication, is introduced. In an embodiment, a dummy gate stack is formed on a substrate. Lightly-doped source/drain regions and highly-doped source/drain regions are formed in the substrate on either sides of the dummy gate stack. An inter-layer dielectric (ILD) layer is formed over the substrate. Subsequently, the dummy gate stack is removed and a gate stack is formed in an opening in the ILD layer. The gate stack is formed by forming an interfacial layer in the opening of the ILD layer, forming a gate dielectric layer over the interfacial layer, forming a work function metal layer over the gate dielectric layer, and forming one or more gate electrode layers over the work function metal layer. Contacts are formed in the ILD layer and one or more metallization layers are formed over the ILD layer. | 10-01-2015 |
| 20150279816 | Bonding Structure for Stacked Semiconductor Devices - A semiconductor device, and a method of fabrication, is introduced. In an embodiment, one or more passivation layers are formed over a first substrate. Recesses are formed in the passivation layers and a first bonding pad, a second bonding pad, and a first via are formed in the recesses. In some embodiment, the first via may have electrical contact with the first bonding pad and may provide an electrical pathway to a first plurality of metallization layers. The first bonding pad and the second bonding pad in the first substrate are aligned to a third bonding pad and the fourth bonding pad in a second substrate and may be bonded using a direct bonding method. A bond between the first bonding pad and the third bonding pad may provide an electrical pathway between devices on the first substrate and devices on the second substrate. | 10-01-2015 |
| 20150279793 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure includes a substrate, a conductive interconnection exposed from the substrate, a passivation covering the substrate and a portion of the conductive interconnection, an under bump metallurgy (UBM) pad disposed over the passivation and contacted with an exposed portion of the conductive interconnection, and a conductor disposed over the UBM pad, wherein the conductor includes a top surface, a first sloped outer surface extended from the top surface and including a first gradient, and a second sloped outer surface extended from an end of the first sloped outer surface to the UBM pad and including a second gradient substantially smaller than the first gradient. | 10-01-2015 |
| 20150279769 | CHIP PACKAGE, USE AND METHOD OF MAKING THEREO - A method of forming a chip package portion having a reduced loading effect between various metal lines during a leveling process comprises forming a first layer, a passivation layer over the first layer, a second layer over the passivation layer, and a third layer over the second layer. The method also comprises forming a patterned opening having multiple depths by removing portions of the first layer, the passivation layer, the second layer, and the third layer by way of one or more removal processes that remove portions of the first layer, the passivation layer, the second layer, and the third layer in accordance with one or more patterned photoresist depositions. The method further comprises depositing a material into the patterned opening, and leveling the material deposited into the patterned opening | 10-01-2015 |
| 20150279685 | Systems and Methods for In Situ Maintenance of a Thin Hardmask During an Etch Process - Methods of patterning a target material layer are provided herein. The method includes steps of positioning a semiconductor wafer having the target material layer thereon in an etch chamber and of providing a flow of etch gases into the etch chamber, the flow of etch gases etchant gas comprising a plurality of gases. The semiconductor wafer has a patterned hardmask feature formed from a compound on the target material layer. The method also includes steps of etching the target material layer using the patterned hardmask feature as a mask feature, wherein one of the gases chemically alters the patterned hardmask feature and at least one of the gases chemically repairs the patterned hardmask feature so that the patterned hardmask feature retains its dimensions during the etching. Associated semiconductor wafer are also provided herein. | 10-01-2015 |
| 20150279632 | DEVICE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR STRUCTURE - A device includes a pedestal. The pedestal includes a ground electrode, a central portion, and a peripheral portion. The ground electrode includes a top surface from which the peripheral portion is projected, thereby having a height difference between the central portion and the peripheral portion. | 10-01-2015 |
| 20150278429 | System and Method for Integrated Circuit Manufacturing - Provided is an integrated circuit (IC) manufacturing method. The method includes receiving a design layout of an IC, the design layout having a main feature; performing a process correction to the main feature thereby generating a modified main feature; using a computer, generating a simulated contour of the modified main feature, the simulated contour having a plurality of points; generating a plurality of assistant data in computer readable format, wherein each assistant data includes at least one process performance factor associated with one of the points; and keeping the simulated contour and the assistant data for use by a further process stage, such as mask making, mask inspection, mask repairing, wafer direct writing, wafer inspection, and wafer repairing. | 10-01-2015 |
| 20150278427 | METHOD OF DESIGNING A CIRCUIT AND SYSTEM FOR IMPLEMENTING THE METHOD - A method of designing a circuit includes receiving a circuit design, and determining a temperature change of at least on back end of line (BEOL) element of the circuit design. The method further includes identifying at least one isothermal region within the circuit design; and determining, using a processor, a temperature increase of at least one front end of line (FEOL) device within the at least one isothermal region. The method further includes combining the temperature change of the at least one BEOL element with the temperature change of the at least one FEOL device, and comparing the combined temperature change with a threshold value. | 10-01-2015 |
| 20150270401 | Combination FinFET and Methods of Forming Same - An embodiment fin field effect transistor (finFET) includes a fin extending upwards from a semiconductor substrate and a gate stack. The fin includes a channel region. The gate stack is disposed over and covers sidewalls of the channel region. The channel region includes at least two different semiconductor materials. | 09-24-2015 |
| 20150270342 | Formation of Dislocations in Source and Drain Regions of FinFET Devices - Embodiments of mechanisms for forming dislocations in source and drain regions of finFET devices are provided. The mechanisms involve recessing fins and removing the dielectric material in the isolation structures neighboring fins to increase epitaxial regions for dislocation formation. The mechanisms also involve performing a pre-amorphous implantation (PAI) process either before or after the epitaxial growth in the recessed source and drain regions. An anneal process after the PAI process enables consistent growth of the dislocations in the source and drain regions. The dislocations in the source and drain regions (or stressor regions) can form consistently to produce targeted strain in the source and drain regions to improve carrier mobility and device performance for NMOS devices. | 09-24-2015 |
| 20150270232 | SEMICONDUCTOR PACKAGES AND METHODS OF FORMING THE SAME - Embodiments of the present disclosure include semiconductor packages and methods of forming the same. An embodiment is a semiconductor package including a first package including one or more dies, and a redistribution layer coupled to the one or more dies at a first side of the first package with a first set of bonding joints. The redistribution layer including more than one metal layer disposed in more than one passivation layer, the first set of bonding joints being directly coupled to at least one of the one or more metal layers, and a first set of connectors coupled to a second side of the redistribution layer, the second side being opposite the first side. | 09-24-2015 |
| 20150270225 | INTERCONNECT STRUCTURE AND MANUFACTURING METHOD THEREOF - The present disclosure provides an interconnect structure, including a substrate, a first conductive feature over the substrate, a second conductive feature over the first conductive feature, and a dielectric layer surrounding the first conductive feature and the second conductive feature. A width of the first conductive feature and a width of the second conductive feature are between 10 nm and 50 nm. The present disclosure also provides a method for manufacturing an interconnect structure, including (1) forming a via opening and a line trench in a dielectric layer, (2) forming a 1-dimensional conductive feature in the via opening, (3) forming a conformal catalyst layer over a sidewall of the line trench, a bottom of the line trench, and a top of the 1-dimensional conductive feature, and (4) removing the conformal catalyst layer from the bottom of the line trench and the top of the 1-dimensional conductive feature. | 09-24-2015 |
| 20150270214 | METHOD FOR LAYOUT DESIGN AND STRUCTURE WITH INTER-LAYER VIAS - A computer implemented layout method for an integrated circuit (IC) structure and IC structure are provided. The layout method can include placing a circuit cell and an inter-layer via together in a first device layer of the IC structure, and placing a metal pattern in a second device layer of the IC structure. The inter-layer via and the metal pattern may be configured to form a direct connection channel for the circuit cell and the metal pattern. | 09-24-2015 |
| 20150270156 | SEMICONDUCTOR STRUCTURE AND METHOD MAKING THE SAME - The present disclosure provides a method for forming a semiconductor structure. In accordance with some embodiments, the method includes providing a substrate and a conductive feature formed over the substrate; forming a first etch stop layer over the conductive feature; forming a low-k dielectric layer over the first etch stop layer; etching the low-k dielectric layer to form a contact trench aligned with the conductive feature; performing a sputtering process to the first etch stop layer exposed in the contact trench; and forming a sealing oxide layer on the low-k dielectric layer. In some embodiments, the sealing oxide layer is self-aligned and conformed to surfaces of the low-k dielectric layer exposed in the contact trench. | 09-24-2015 |
| 20150269991 | MEMORY UNIT AND METHOD OF TESTING THE SAME - A memory unit that includes a tracking unit, a scan chain and a scan chain control unit. The tracking unit includes a tracking bit line, wherein the tracking unit is configured to receive a tracking control signal, selectively charge or discharge a voltage on the tracking bit line in response to the tracking control signal and generate a sense amplifier signal. The scan chain includes one or more logic devices, wherein the scan chain is configured to receive at least a first control signal. The scan chain control unit is connected to the scan chain and the tracking unit. The scan chain control unit is configured to receive the sense amplifier signal and generate the first scan chain control signal. | 09-24-2015 |
| 20150269974 | SOURCE LINE VOLTAGE REGULATION SCHEME FOR LEAKAGE REDUCTION - An integrated circuit that includes a generator unit connected to one or more pull-up units, one or more pull-up units connected to one or more source lines and an array of memory cells connected to the one or more source lines. The generator unit is configured to set a first voltage signal of each pull-up unit of the one or more pull-up units. Each pull-up unit of the one or more pull-up units is connected with the corresponding source line of the one or more source lines and is configured to set a current of the corresponding source line of the one or more source lines. The array of memory cells is electrically connected to the one or more source lines and one or more bit lines. | 09-24-2015 |
| 20150269305 | INTEGRATED CIRCUIT DESIGN METHOD AND APPARATUS - An integrated circuit design method comprises extracting parallel-connected parameters associated with circuit components of an integrated circuit (IC) based on a determination that the circuit components are connected in parallel. The method also comprises generating a parallel netlist that describes the circuit components, the parallel netlist comprising the parallel-connected parameters. The parallel-connected parameters are taken into consideration by a simulation that determines the performance capabilities of the IC. | 09-24-2015 |
| 20150269302 | ELECTROMIGRATION-AWARE LAYOUT GENERATION - In some embodiments, in a method, cell layouts of a plurality of cells are received. For each cell, a respective constraint that affects a geometry of an interconnect to be coupled to an output pin of the cell in a design layout is determined based on a geometry of the output pin of the cell in the cell layout. | 09-24-2015 |
| 20150268633 | SYSTEM AND METHOD FOR A TIME-TO-DIGITAL CONVERTER - According to various embodiments described herein, a device includes a control circuit, a time-to-digital converter circuit coupled having a first output coupled to a first input of the control circuit, and a gating circuit having a first input coupled to a first signal, a second input coupled to a second signal, and an output coupled to a first input of the time-to-digital converter circuit, an output of the control circuit coupled to a second input of the time-to-digital converter circuit and to a third input of the gating circuit. | 09-24-2015 |
| 20150268561 | Method of Fabricating an Integrated Circuit with Enhanced Defect Repairability - The present disclosure provides one embodiment of a method for extreme ultraviolet lithography (EUVL) process. The method includes loading a mask to a lithography system. The mask includes defect-repaired regions and defines an integrated circuit (IC) pattern thereon. The method also includes setting an illuminator of the lithography system in an illumination mode according to the IC pattern, configuring a pupil filter in the lithography system according to the illumination mode and performing a lithography exposure process to a target with the mask and the pupil filter by the lithography system in the illumination mode. | 09-24-2015 |
| 20150268297 | CIRCUIT AND METHOD FOR MEASURING THE GAIN OF AN OPERATIONAL AMPLIFIER - A circuit for measuring the gain of an operational amplifier is provided. The circuit comprises a first operational amplifier, a first resistive device and a second resistive device. The first operational amplifier has an original gain and includes a first input terminal and a second input terminal. The first resistive device is coupled between the first input terminal and the second input terminal of the first operational amplifier. The second resistive device is coupled to the second input terminal of the first operational amplifier. The first resistive device and the second resistive device are configured to reduce a predetermined amount of gain from the original gain of the first operational amplifier. | 09-24-2015 |
| 20150263618 | VOLTAGE SUPPLY UNIT AND METHOD FOR OPERATING THE SAME - A voltage supply unit including a regulator unit, a voltage divider and a first current mirror. The regulator unit is configured to receive a first voltage signal and a second voltage signal, and is configured to generate a third voltage signal. The voltage divider is connected between the first current mirror and the regulator unit, and controls the second voltage signal. The first current mirror is connected to the regulator unit, an input voltage supply and the voltage divider. The first current mirror is configured to generate a first current signal and a second current signal, the second current signal is mirrored from the first current signal, the first current signal is controlled by the third voltage signal and the second current signal controls an output voltage supply signal. | 09-17-2015 |
| 20150263168 | Structure and Method for Semiconductor Device - A semiconductor device and a method of forming the same are disclosed. The semiconductor device includes a substrate, and a source region and a drain region formed in the substrate. The semiconductor device further includes an impurity diffusion stop layer formed in a recess of the substrate between the source region and the drain region, wherein the impurity diffusion stop layer covers bottom and sidewalls of the recess. The semiconductor device further includes a channel layer formed over the impurity diffusion stop layer and in the recess, and a gate stack formed over the channel layer. The impurity diffusion stop layer substantially prevents impurities of the substrate and the source and drain regions from diffusing into the channel layer. | 09-17-2015 |
| 20150263159 | FINFET Structure and Method for Fabricating the Same - A device comprises a substrate comprising silicon, a fin structure comprising a lower portion formed of silicon and enclosed by an isolation region, a middle portion formed of silicon-germanium-carbon, wherein the middle portion is enclosed by an oxide layer, an upper portion formed of silicon, wherein the upper portion comprises a channel and a silicon-carbon layer formed between the middle portion and the upper portion, a first source/drain region comprising a first silicon-phosphorus region and a first silicon-carbon layer formed underlying the first silicon-phosphorus region and a second source/drain region comprising a second silicon-phosphorus region and a second silicon-carbon layer formed underlying the second silicon-phosphorus region. | 09-17-2015 |
| 20150262912 | Via Corner Engineering in Trench-First Dual Damascene Process - An integrated circuit structure includes a first dielectric layer, an etch stop layer over the first dielectric layer, and a second dielectric layer over the etch stop layer. A via is disposed in the first dielectric layer and the etch stop layer. A metal line is disposed in the second dielectric layer, wherein the metal line is connected to the via. The etch stop layer includes a first portion having an edge contacting an edge of the via, wherein the first portion has a first chemical composition, and a second portion in contact with the first portion. The second portion is spaced apart from the via by the first portion, and wherein the second portion has a second chemical composition different from the first composition. | 09-17-2015 |
| 20150262909 | PACKAGES WITH THROUGH-VIAS HAVING TAPERED ENDS - A package includes a device die, a molding material molding the device die therein, a through-via substantially penetrating through the molding material, wherein the through-via has an end. The end of the through-via is tapered and has rounded sidewall surfaces. The package further includes a redistribution line electrically coupled to the through-via. | 09-17-2015 |
| 20150262895 | Pillar Structure having Cavities - An apparatus comprises a pillar formed on a top surface of a semiconductor substrate, wherein the pillar comprises a first pillar region, a second pillar region and a first cavity formed between the first pillar region and the second pillar region, and wherein the first cavity is configured to accommodate a probe pin. | 09-17-2015 |
| 20150262873 | Semiconductor Device and Method - A method of forming a semiconductor device is provided. Metallic interconnects are formed in a dielectric layer of the semiconductor device. A hard mask is used to avoid usual problems faced by manufacturers, such as possibility of bridging different conductive elements and via patterning problems when there are overlays between vias and trenches. The hard mask is etched multiple times to extend via landing windows, while keeping distance between the conductive elements to avoid the bridging problem. | 09-17-2015 |
| 20150262870 | Barrier Structure for Copper Interconnect - A method for forming an interconnect structure includes forming a dielectric layer overlying a substrate, forming an opening in the dielectric layer, forming a metal-containing layer overlying the opening in the dielectric layer, forming a conformal protective layer overlying the metal-containing layer, filling a conductive layer in the opening, and performing a thermal process to form a metal oxide layer barrier layer underlying the metal-containing layer. | 09-17-2015 |
| 20150262868 | Contact Plug without Seam Hole and Methods of Forming the Same - A method includes forming a metallic layer over a Metal-Oxide-Semiconductor (MOS) device, forming reverse memory posts over the metallic layer, and etching the metallic layer using the reverse memory posts as an etching mask. The remaining portions of the metallic layer include a gate contact plug and a source/drain contact plug. The reverse memory posts are then removed. After the gate contact plug and the source/drain contact plug are formed, an Inter-Level Dielectric (ILD) is formed to surround the gate contact plug and the source/drain contact plug. | 09-17-2015 |
| 20150262860 | Method of Semiconductor Integrated Circuit Fabrication - A method of fabricating a semiconductor integrated circuit (IC) is disclosed. A conductive feature over a substrate is provided. A first dielectric layer is deposited over the conductive feature and the substrate. A via-forming-trench (VFT) is formed in the first dielectric layer to expose the conductive feature and the substrate around the conductive feature. The VFT is filled in by a sacrificial layer. A via-opening is formed in the sacrificial layer to expose the conductive feature. A metal plug is formed in the via-opening to connect to the conductive feature. The sacrificial layer is removed to form a surrounding-vacancy around metal plug and the conductive feature. A second dielectric layer is deposited over the substrate to seal a portion of the surrounding-vacancy to form an enclosure-air-gap all around the metal plug and the conductive feature. | 09-17-2015 |
| 20150262836 | Method for Integrated Circuit Patterning - Provided is a method of forming a pattern for an integrated circuit. The method includes forming a first layer over a substrate, wherein the first layer's etch rate is sensitive to a radiation, such as an extreme ultraviolet (EUV) radiation or an electron beam (e-beam). The method further includes forming a resist layer over the first layer and exposing the resist layer to the radiation for patterning. During the exposure, various portions of the first layer change their etch rate in response to an energy dose of the radiation received therein. The method further includes developing the resist layer, etching the first layer, and etching the substrate to form a pattern. The radiation-sensitivity of the first layer serves to reduce critical dimension variance of the pattern. | 09-17-2015 |
| 20150262830 | MECHANISMS FOR FORMING PATTERNS USING MULTIPLE LITHOGRAPHY PROCESSES - The present disclosure provides a method for forming patterns in a semiconductor device. In accordance with some embodiments, the method includes providing a substrate, a patterning-target layer over the substrate, and a hard mask layer over the patterning-target layer; forming a first pattern in the hard mask layer; removing a trim portion from the first pattern in the hard mask layer to form a trimmed first pattern; forming a first resist layer over the hard mask layer; forming a main pattern in the first resist layer; and etching the patterning-target layer using the main pattern and the trimmed first pattern as etching mask elements to form a final pattern in the patterning-target layer. In some embodiments, the final pattern includes the main pattern subtracting a first overlapping portion between the main pattern and the trimmed first pattern. | 09-17-2015 |
| 20150262815 | Method of Fabricating Semiconductor Integrated Circuit - A method of fabricating a semiconductor integrated circuit (IC) is disclosed. A first layer is deposited over a substrate. A plurality of mandrels is formed over the first layer. Guiding-spacers are formed along sidewalls of the mandrels. Then the mandrels are removed. A neutral layer (NL) and a block copolymer (BCP) layer are deposited over the first layer and the guiding-spacers. A anneal is applied to the BCP layer to form a first polymer nanostructure between the guiding-spacers and being surrounded by a second polymer nanostructure. The first polymer nanostructures locate at a same distance from the first layer. Polymer nano-blocks are formed by selectively etching the second polymer nanostructure and the NL. By using the polymer nano-blocks and the guiding spacer as etch masks, the first layer is etched to form openings. The substrate is etched through the openings to form substrate trench and substrate fin. | 09-17-2015 |
| 20150261094 | Collector in an Extreme Ultraviolet Lithography System with Optimal Air Curtain Protection - The present disclosure provides an extreme ultraviolet (EUV) radiation source module. The EUV radiation source module includes a collector designed to collect and reflect EUV light; a solid cover integrated with the collector and configured to have a supply gap between the collector and the solid cover; and a gas pipeline integrated with the collector. The supply gap provides a path for gas flow to the radiation source at edge of the collector. The gas pipeline includes an inward entrance and an outward entrance. | 09-17-2015 |
| 20150255602 | SEMICONDUCTOR INTEGRATED CIRCUIT WITH DISLOCATIONS - A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes proving a substrate. The substrate includes a gate stack over the substrate and source/drain regions separated by the gate stack. A first dislocation with a first pinch-point is formed within the source/drain region with a first depth. A second dislocation with a second pinch-point is formed within the source/drain region at a second depth. The second depth is substantial smaller than the first depth. | 09-10-2015 |
| 20150255601 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - The present disclosure provides a semiconductor structure includes a substrate and an epitaxy region that is partially disposed in the substrate. A doping concentration of the epitaxy region increases from a bottom portion to a top portion of the epitaxy region. The present disclosure also provides a method for manufacturing the semiconductor structure, including forming a recess in a substrate; forming an epitaxy region in the recess; and in situ doping the epitaxy region to form a doping concentration profile increasing from a bottom portion to a top portion of the epitaxy region. | 09-10-2015 |
| 20150255593 | Finfet Seal Ring - A semiconductor device includes a first front-end-of-line (FEOL) seal ring on a substrate, the seal ring comprising ring-shaped fin-like structures, integrated circuitry formed on the substrate, the integrated circuitry being circumscribed by the first seal ring, an isolation zone between the seal ring and the integrated circuitry, the isolation zone comprising a set of fin structures, each fin structure facing a same direction. | 09-10-2015 |
| 20150255581 | Semiconductor Devices and Methods of Manufacture Thereof - Semiconductor devices and methods of manufacture thereof are disclosed. In some embodiments, a method of manufacturing a semiconductor device includes providing a substrate, the substrate includes a first fin, a second fin, and an isolation region disposed between the first fin and the second fin. The second fin includes a different material than a material of the substrate. The method includes forming an oxide over the first fin, the second fin, and a top surface of the isolation region at a temperature of about 400 degrees C. or less, and post-treating the oxide at a temperature of about 600 degrees C. or less. | 09-10-2015 |
| 20150255578 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a gate structure located on a substrate and a raised source/drain region adjacent to the gate structure. The raised source/drain region includes: a first epitaxial-grown doped layer of the raised source/drain region in contact with the substrate; a second epitaxial-grown doped layer on the first epitaxial-grown doped layer and including a same dopant species as the first epitaxial-grown doped layer, wherein the second epitaxial-grown doped layer includes a higher dopant concentration than the first epitaxial-grown doped layer and interfacing the gate structure by using a predetermined distance; and a third epitaxial-grown doped layer on the second epitaxial-grown doped layer and including the same dopant species as the first epitaxial-grown doped layer, wherein the third epitaxial-grown doped layer includes a higher dopant concentration than the second epitaxial-grown doped layer. | 09-10-2015 |
| 20150255548 | Methods of Forming Semiconductor Devices and FinFETs - Methods of forming semiconductor devices and fin field effect transistors (FinFETs) are disclosed. In some embodiments, a method of forming a semiconductor device includes forming a group III material over a substrate, the group III material comprising a thickness of about 2 monolayers or less. The method includes forming a group III-V material over the group III material. | 09-10-2015 |
| 20150255545 | Methods of Forming Semiconductor Devices and FinFET Devices, and FinFET Devices - Methods of forming semiconductor devices and fin field effect transistors (FinFETs), and FinFET devices, are disclosed. In some embodiments, a method of forming a semiconductor device includes forming a barrier material comprising AlInAsSb over a substrate, and forming a channel material of a transistor over the barrier layer. | 09-10-2015 |
| 20150255431 | Semiconductor Package and Method - A first package is bonded to a second package with a structural member located between the first package and the second package for structural support. In an embodiment the structural member is a plate or one or more conductive balls. Once the structural member is in place, the first package is bonded to the second package. | 09-10-2015 |
| 20150255406 | SOLDER BALL PROTECTION IN PACKAGES - An integrated circuit structure includes a substrate, a metal pad over the substrate, a passivation layer having a portion over the metal pad, and a polymer layer over the passivation layer. A Post-Passivation Interconnect (PPI) has a portion over the polymer layer, wherein the PPI is electrically coupled to the metal pad. The integrated circuit structure further includes a first solder region over and electrically coupled to a portion of the PPI, a second solder region neighboring the first solder region, a first coating material on a surface of the first solder region, and a second coating material on a surface of the second solder region. The first coating material and the second coating material encircle the first solder region and the second solder region, respectively. The first coating material is spaced apart from the second coating material. | 09-10-2015 |
| 20150255400 | Method for Forming Alignment Marks and Structure of Same - A method of fabrication of alignment marks for a non-STI CMOS image sensor is introduced. In some embodiments, zero layer alignment marks and active are alignment marks may be simultaneously formed on a wafer. A substrate of the wafer may be patterned to form one or more recesses in the substrate. The recesses may be filled with a dielectric material using, for example, a field oxidation method and/or suitable deposition methods. Structures formed by the above process may correspond to elements of the zero layer alignment marks and/or to elements the active area alignment marks. | 09-10-2015 |
| 20150255275 | High Performance Self Aligned Contacts and Method of Forming Same - A method embodiment includes forming a protective liner over the substrate and forming an inter-layer dielectric over the protective liner. The protective liner covers a sidewall of a gate spacer. The method further includes patterning a contact opening in the first ILD to expose a portion of the protective liner. The portion of the protective liner in the contact opening is removed to expose an active region at a top surface of the semiconductor substrate. A contact is formed in the contact opening. The contact is electrically connected to the active region. | 09-10-2015 |
| 20150255273 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure includes a die including a first surface, a recess extended from an aperture disposed on the first surface and including a sidewall disposed within the die, and a polymeric member configured for filling and sealing the recess and including a first outer surface and a second outer surface, wherein the first outer surface is interfaced with the sidewall of the recess. | 09-10-2015 |
| 20150254389 | INTEGRATED CIRCUIT DESIGN SYSTEM WITH COLOR-CODED COMPONENT LOADING ESTIMATE DISPLAY - A method comprises generating a schematic of an integrated circuit (IC), the IC having a circuit component. The method also comprises searching a database having one or more configurations of the circuit component, each of the one or more configurations of the circuit component having a corresponding estimated resistance capacitance (RC) value and an assigned color scheme based on the estimated RC value. The method further comprises displaying the circuit component in the schematic as a symbol representing the circuit component, the symbol representing the circuit component being displayed having the assigned color scheme of a selected circuit component configuration. The method additionally comprises displaying a layout of the IC based on a determination that the schematic passed a design rule check, the displayed layout of the IC including the selected configuration of the circuit component, the selected configuration being displayed in the layout having the assigned color scheme. | 09-10-2015 |
| 20150249109 | METHOD OF FABRICATING A METAL GRID FOR SEMICONDUCTOR DEVICE - A method for manufacturing the image sensor device is provided. The method includes depositing a first dielectric layer over a back surface of a substrate, forming a ridge over the first dielectric layer, depositing a second dielectric layer over the first dielectric layer, including filling in a space between two adjacent ridges. The method also includes removing the ridge to form a trench in the second dielectric layer and forming a metal grid in the trench. | 09-03-2015 |
| 20150249062 | Reflow Process and Tool - Reflow processes and apparatuses are disclosed. A process includes enclosing a package workpiece in an enclosed environment of a chamber of a reflow tool; causing an oxygen content of the enclosed environment of the chamber to be less than 40 ppm; and performing a reflow process in the enclosed environment of the chamber while the oxygen content is less than 40 ppm. An apparatus includes a reflow chamber, a door to the reflow chamber, an energy source in the reflow chamber, and gas supply equipment coupled to the chamber. The door is operable to enclose an environment in the reflow chamber. The energy source is operable to increase a temperature in the environment in the reflow chamber. The gas supply equipment is operable to provide a gas to the reflow chamber. | 09-03-2015 |
| 20150248928 | BOOST SYSTEM FOR DUAL-PORT SRAM - A boost system for dual-port SRAM includes a comparator and a boost circuit. The comparator is configured to compare a first row address of a first port and a second row address of a second port, and output a first enable signal. The boost circuit is configured to boost a voltage difference between a first voltage source and a second voltage source according to the first enable signal. | 09-03-2015 |
| 20150248927 | MULTI-PORT MEMORY CELL - A circuit includes a first data line, a second data line, a reference node, and a memory cell. The reference node is configured to have a reference voltage level corresponding to a first logical value. The memory cell includes a data node, a first transistor and a second transistor connected in series between the first data line and the reference node, and a third transistor between the data node and the second data line. A gate of the first transistor is coupled to the data node, and the first transistor is configured to be turned off when the gate of the first transistor has a voltage level corresponding to the first logical value. The third transistor is configured to be turned off when a gate of the third transistor has a voltage level corresponding to a second logical value different from the first logical value. | 09-03-2015 |
| 20150248923 | MEMORY READING CIRCUIT, MEMORY DEVICE AND METHOD OF OPERATING MEMORY DEVICE - A circuit for reading a memory device includes a sense amplifier (SA) and a controller. The SA has an input, an output and an enabling terminal. The controller has a first input coupled to the output of the SA, a second input configured to receive a control signal, and an output coupled to the enabling terminal of the SA to send an SA enabling (SAE) signal from the controller to the SA. The controller is configured to start the SAE signal, in response to the control signal, to enable the SA, and to terminate the SAE signal, in response to an SA output signal at the output of the SA, to disable the SA. | 09-03-2015 |
| 20150248068 | Method and Structure for Lithography Processes with Focus Monitoring and Control - A method for lithography exposing process is provided. The method includes performing a first lithography exposing process to a resist layer using a mask having a focus-sensitive pattern and an energy-sensitive pattern; measuring critical dimensions (CDs) of transferred focus-sensitive pattern and transferred energy-sensitive pattern on the resist layer; extracting Bossung curves from the CDs; and determining slops of the Bossung curves. | 09-03-2015 |
| 20150244360 | INPUT/OUTPUT CIRCUIT - A circuit includes a first power node configured to carry a voltage K·V | 08-27-2015 |
| 20150244357 | DELAY LINE CIRCUIT WITH VARIABLE DELAY LINE UNIT - A delay line circuit comprises a plurality of delay units configured to receive an input signal and modify the input signal to produce a first output signal. The delay line circuit also comprises a variable delay line unit that comprises an input end configured to receive the first output signal; an output end configured to output a second output signal; a first line between the input end and the output end, the first line comprising, in series, a first inverter, a second inverter, a first speed control unit, and a third inverter; a second line between the input end and the output end, the second line comprising, in series, a fourth inverter, a second speed control unit, a fifth inverter, and a sixth inverter. The delay line circuit is also configured to selectively transmit the received first output signal through one of the first line or the second line. | 08-27-2015 |
| 20150244258 | CHARGE PUMP INITIALIZATION DEVICE, INTEGRATED CIRCUIT HAVING CHARGE PUMP INITIALIZATION DEVICE, AND METHOD OF OPERATION - In an initialization phase of a charge pump, an input signal is supplied to an input electrode of a capacitor of the charge pump and to an initialization device of the charge pump. An initialization signal is supplied to the initialization device of the charge pump. The initialization device supplies an output signal to an output electrode of the capacitor. The output signal has a high level and a low level corresponding to a high level and a low level of the input signal, the input signal and the output signal causing a charge to be accumulated in the capacitor. In a pumping operation phase following the initialization phase, the initialization signal is removed from the initialization device to place the output electrode of the capacitor in a floating state, and a pumping action is performed with the charge accumulated in the capacitor. | 08-27-2015 |
| 20150243751 | Contact Etch Stop Layers of a Field Effect Transistor - The disclosure relates to a field effect transistor. An exemplary structure for a field effect transistor comprises a substrate; a source region and a drain region disposed in the substrate; a gate structure over the substrate comprising sidewalls and a top surface, wherein the gate structure interposes the source region and the drain region; a contact etch stop layer (CESL) over at least a portion of the top surface of the gate structure; an interlayer dielectric layer over the CESL; a gate contact extending through the interlayer dielectric layer; and a source contact and a drain contact extending through the interlayer dielectric layer, wherein a first distance between an edge of the source contact and a first corresponding edge of the CESL is about 1 nm to about 10 nm. | 08-27-2015 |
| 20150243739 | Doping for FinFET - First and second fins are formed extending from a substrate. A first layer is formed over the first fin. The first layer comprises a first dopant. A portion of the first layer is removed from a tip portion of the first fin. A second layer is formed over the second fin. The second layer comprises a second dopant. One of the first and second dopants is a p-type dopant, and the other of the first and second dopants is an n-type dopant. A portion of the second layer is removed from a tip portion of the second fin. A solid phase diffusion process is performed to diffuse the first dopant into a non-tip portion of the first fin, and to diffuse the second dopant into a non-tip portion of the second fin. | 08-27-2015 |
| 20150243667 | Structure and Method for FinFET SRAM - Provided is an embedded FinFET SRAM structure and methods of making the same. The embedded FinFET SRAM structure includes an array of SRAM cells. The SRAM cells have a first pitch in a first direction and a second pitch in a second direction orthogonal to the first direction. The first and second pitches are configured so as to align fin active lines and gate features of the SRAM cells with those of peripheral logic circuits. A layout of the SRAM structure includes three layers, wherein a first layer defines mandrel patterns for forming fins, a second layer defines a first cut pattern for removing dummy fins, and a third layer defines a second cut pattern for shortening fin ends. The three layers collectively define fin active lines of the SRAM structure. | 08-27-2015 |
| 20150243633 | LASER MARKING IN PACKAGES - A package includes a device die, a first plurality of redistribution lines underlying the device die, a second plurality of redistribution lines overlying the device die, and a metal pad in a same metal layer as the second plurality of redistribution lines. A laser mark is in a dielectric layer that is overlying the metal pad. The laser mark overlaps the metal pad. | 08-27-2015 |
| 20150243616 | PACKAGES WITH SOLDER BALL REVEALED THROUGH LASER - An integrated circuit structure includes a substrate, a PPI over the substrate, a solder region over and electrically coupled to a portion of the PPI, and a molding compound molding a lower portion of the solder region therein. A top surface of the molding compound is level with or lower than a maximum-diameter plane, wherein the maximum-diameter plane is parallel to a major surface of the substrate, and the maximum-diameter of the solder region is in the maximum-diameter plane. | 08-27-2015 |
| 20150243573 | WAFER LEVEL CHIP SCALE PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor structure includes a die including a top surface and a sidewall, and a molding surrounding the die and including a top surface, a sidewall interfacing with the sidewall of the die, and a curved surface including a curvature greater than zero and coupling the sidewall of the molding with the top surface of the molding. | 08-27-2015 |
| 20150243547 | SEMICONDUCTOR LINE FEATURE AND MANUFACTURING METHOD THEREOF - Some embodiments of the present disclosure provide a semiconductor structure with a reduced line feature. The semiconductor structure includes a substrate, a first active region in the substrate and having a first sidewall, a second active region in the substrate and having a second sidewall, an isolation region contacting the first sidewall and the second sidewall. The above-mentioned semiconductor structure possesses a width of a top surface of the isolation region less than 50 nm and a width of a bottom surface of the isolation region more than 20 nm. Some embodiments provide a method for controlling a semiconductor line feature in a wafer, including patterning a hard mask exposing a line feature with a line width narrower than 50 nm on a wafer, forming a trench on the wafer correlated to the line feature by performing a plasma dry etch over the wafer, and filling the trench with isolation materials. | 08-27-2015 |
| 20150243531 | Via Structure For Packaging And A Method Of Forming - A via or pillar structure, and a method of forming, is provided. In an embodiment, a polymer layer is formed having openings exposing portions of an underlying conductive pad. A conductive layer is formed over the polymer layer, filling the openings. The dies are covered with a molding material and a planarization process is performed to form pillars in the openings. In another embodiment, pillars are formed and then a polymer layer is formed over the pillars. The dies are covered with a molding material and a planarization process is performed to expose the pillars. In yet another embodiment, pillars are formed and a molding material is formed directly over the pillars. A planarization process is performed to expose the pillars. In still yet another embodiment, bumps are formed and a molding material is formed directly over the bumps. A planarization process is performed to expose the bumps. | 08-27-2015 |
| 20150243479 | DIGITAL PATTERN GENERATOR (DPG) FOR E-BEAM LITHOGRAPHY - A method of lithography including providing a first mirror array and a second mirror array of a digital pattern generator (DPG); the second mirror array is offset from the first mirror array in a first direction. A first data piece and a second data piece associated with an IC device, are received by the DPG. The first and second data piece each defines a state of a pixel of the DPG. The first data piece is provided to a first pixel of the DPG. The second data piece is also provided to the first pixel of the DPG. A first point on a photosensitive layer on a target substrate is exposed. The first point is defined by the first data piece and the second data piece. The target substrate moved in a second direction, perpendicular to the first direction to expose a second point. | 08-27-2015 |
| 20150241776 | Method for Lithography Patterning - A method of reducing resist outgassing for EUV lithography is disclosed. The method includes forming a material layer over a substrate wherein a top surface of the material layer contains a certain concentration of a quencher or a base. The method further includes forming a resist layer over the top surface of the material layer and exposing the resist layer to a EUV radiation for patterning. The quencher or the base underneath the resist layer acts to suppress resist outgassing during the EUV exposure. The material layer itself may serve as a hard mask layer or an anti-reflection layer for the patterning process, in addition to being the carrier of the quencher or the base. The method can be used in other types of lithography, such as e-beam lithography, for reducing resist outgassing. | 08-27-2015 |
| 20150241768 | Three-Direction Alignment Mark - A semiconductor device includes a first material formed on a substrate. The first material includes a first alignment mark. The first alignment mark includes alignment lines in at least three directions. The semiconductor device further includes a second material comprising a second alignment mark. The second alignment mark corresponds to the first alignment mark such that when the second alignment mark is aligned with the first alignment mark, the second material is aligned with the first material. | 08-27-2015 |
| 20150236149 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING - A semiconductor device includes a gate structure, and a source region and a drain region on opposite sides of the gate structure. The source region comprises a first region of a first conductivity type, and a second region of a second conductivity type, the second conductivity type opposite to the first conductivity type. The first region is arranged between the second region and the gate structure. The second region comprises at least one projection protruding into the first region and toward the gate structure. | 08-20-2015 |
| 20150236146 | HIGH ELECTRON MOBILITY TRANSISTOR (HEMT) HAVING AN INDIUM-CONTAINING LAYER AND METHOD OF MANUFACTURING THE SAME - A high electron mobility transistor (HEMT) includes a substrate, and a channel layer over the substrate, wherein and at least one of the channel layer or the active layer comprises indium. The HEMT further includes an active layer over the channel layer. The active layer has a band gap discontinuity with the channel layer. | 08-20-2015 |
| 20150236124 | EPITAXY IN SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure including a semiconductor substrate is provided. The semiconductor substrate includes a surface. A gate structure is provided on the surface. An interface lower than the surface is provided. An epitaxial regrowth region adjacent the gate structure is disposed on the interface. In addition, the epitaxial regrowth region extends over the surface and includes a bottom layer and a cap layer. The activation of the cap layer is lower than that of the bottom layer. Moreover, the bottom layer is lower than the surface and the gate structure. Furthermore, the bottom layer includes a first downwardly-curved edge and a second downwardly-curved edge over the first one. The first downwardly-curved edge is connected with the second downwardly-curved edge at two endpoints. The two endpoints are in contact with the surface of the semiconductor substrate. | 08-20-2015 |
| 20150236123 | GATE STRUCTURE OF FIELD EFFECT TRANSISTOR WITH FOOTING - In some embodiments, an field effect transistor structure includes a first semiconductor structure and a gate structure. The first semiconductor structure includes a channel region, and a source region and a drain region. The source region and the drain region are formed on opposite ends of the channel region, respectively. The gate structure includes a central region and footing regions. The central region is formed over the first semiconductor structure. The footing regions are formed on opposite sides of the central region and along where the central region is adjacent to the first semiconductor structure. | 08-20-2015 |
| 20150236121 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME - A semiconductor device comprising a substrate, a channel layer over the substrate, an active layer over the channel layer and a laminate layer in contact with the active layer. The active layer has a band gap discontinuity with the channel layer. | 08-20-2015 |
| 20150236107 | ULTRA HIGH VOLTAGE SEMICONDUCTOR DEVICE WITH ELECTROSTATIC DISCHARGE CAPABILITIES - A semiconductor device comprises a semiconductor substrate, a first layer over the semiconductor substrate, and a drain region in the first layer. The drain region comprises a drain rectangular portion having a first end and a second end, a first drain end portion contiguous with the drain rectangular portion and extending from the first end of the drain rectangular portion away from a center of the drain region, and a second drain end portion contiguous with the drain rectangular portion and extending from the second end of the drain rectangular portion away from the center of the drain region. The semiconductor device also comprises a source region free from contact with and surrounding the drain region in the first layer. The first drain end portion and the second drain end portion have a same doping type and a different doping concentration than the drain rectangular portion. | 08-20-2015 |
| 20150236101 | HIGH ELECTRON MOBILITY TRANSISTOR WITH INDIUM NITRIDE LAYER - A method comprises depositing a first layer comprising aluminum nitride over a substrate. The method further comprises depositing a second layer comprising aluminum gallium nitride over the first layer. The method also comprises depositing a third layer comprising indium gallium nitride over the second layer. The method additionally comprises removing some of the third layer leaving a first portion of the third layer and a second portion of the third layer. The method further comprises reducing an aluminum content of at least the first layer by drawing aluminum atoms from the first layer into at least the second layer beneath the first portion and the second portion of the third layer. The method also comprises depositing a source contact over the first portion of the third layer and a drain contact over the second portion of the third layer. | 08-20-2015 |
| 20150236095 | Semiconductor Device - A semiconductor device and a method of making the same. The device includes a semiconductor substrate having an AlGaN layer on a GaN layer. The device also includes first contact and a second contact. The average thickness of the AlGaN layer varies between the first contact and the second contact, for modulating the density of an electron gas in the GaN layer between the first contact and the second contact. | 08-20-2015 |
| 20150235977 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a substrate includes a first layer and a second layer over the first layer, a bump disposed over the second layer, a molding disposed over the second layer and surrounding the bump, and a retainer disposed over the second layer, wherein the retainer is disposed between the molding and a periphery of the substrate. Further, a method of manufacturing a semiconductor device includes providing a substrate, disposing several bumps on the substrate, disposing a retainer on the substrate and surrounding the bumps, and disposing a molding between the bumps and the retainer. | 08-20-2015 |
| 20150235954 | Barrier Layer and Structure Method - A method for forming a multilayer barrier comprises forming a conductive line over a substrate, depositing a dielectric layer over the conductive line, forming a plug opening in the dielectric layer, forming a multilayer barrier through a plurality of deposition processes and corresponding plasma treatment processes. | 08-20-2015 |
| 20150235922 | Through Via Structure Extending to Metallization Layer - The integrated circuit device disclosed herein includes a substrate, an interlevel dielectric layer disposed over the substrate, an intermetal dielectric layer disposed over the interlevel dielectric layer, an interconnect structure extending through the intermetal dielectric layer, and a through via (TV) extending through the intermetal dielectric layer and at least a portion of the substrate, the through via having a top surface co-planar with a top surface of the interconnect structure. In some embodiments, the through via is formed before the interconnect structure. In other embodiments, the interconnect structure is formed before the through via. In an embodiment, a fin field effect transistor (FinFET) is formed over the substrate. | 08-20-2015 |
| 20150235902 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes providing a wafer, grinding a backside of the wafer, disposing a backside film on the backside of the wafer, cutting the wafer to singulate a plurality of dies from the wafer, and forming a mark on the backside film disposed on each of the plurality of dies by a laser operation. | 08-20-2015 |
| 20150235883 | Semiconductor Wafer Transportation - A wafer transportation pod includes a body, a main compartment enclosed by the body, the main compartment to provide a controlled environment, a holding device within the main compartment, the holding device to hold a plurality of semiconductor wafers, a top latching mechanism configured to connect to another pod or a carrier mechanism of an overhead hoist transfer (OHT) system, a bottom latching mechanism configured to connect to another pod, the bottom latching mechanism being similar to the latching mechanism on the carrier. | 08-20-2015 |
| 20150235874 | METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE - A method includes followings operations. A substrate including a first surface and a second surface is provided. The substrate and a transparent film are heated to attach the transparent film on the first surface. A first coefficient of a thermal expansion (CTE) mismatch is between the substrate and the transparent film. The substrate and the transparent film are cooled. A polymeric material is disposed on the second surface. A second CTE mismatch is between the substrate and the polymeric material. The second CTE mismatch is counteracted by the first CTE mismatch. | 08-20-2015 |
| 20150235675 | CIRCUITS IN STRAP CELL REGIONS - A circuit comprises a first transistor and a second transistor in a strap cell region between a first memory array and a second memory array of a memory device. The first transistor includes a first node connected to a first data line, and a second node connected to a second data line. The first node and the second node of the first transistor are complementary to each other in voltage level. Further, the second transistor includes a first node connected to the second data line, and a second node connected to the first data line. The first node and the second node of the second transistor are complementary to each other in voltage level. | 08-20-2015 |
| 20150234964 | PATTERN DENSITY-DEPENDENT MISMATCH MODELING FLOW - In some embodiments, in a method, a layout of a circuit is received. A netlist with indicated pattern density (PD)-dependent mismatch elements associated with different PDs, respectively, is generated using the layout. A simulation on the netlist is performed such that when the PD-dependent mismatch elements are modeled in the simulation, corresponding model parameters of the PD-dependent mismatch elements are generated using variation distributions with different spreads. | 08-20-2015 |
| 20150234413 | FLIPPED GATE VOLTAGE REFERENCE AND METHOD OF USING - A voltage reference includes a flipped gate transistor configured to receive a first current. The voltage reference further includes a first transistor configured to receive a second current, the first transistor having a first leakage current, wherein the first transistor is connected with the flipped gate transistor in a Vgs subtractive arrangement. The voltage reference further includes an output node configured to output a reference voltage, the output node connected to the first transistor. The voltage reference further includes a second transistor connected to the output node, the second transistor having a second leakage current, wherein the first leakage current is substantially equal to the second leakage current. | 08-20-2015 |
| 20150233698 | APPARATUS AND METHOD FOR VERIFICATION OF BONDING ALIGNMENT - Presented herein is a device comprising a common node disposed in a first wafer a test node disposed in a first wafer and having a plurality of test pads exposed at a first surface of the first wafer. The test node also has test node lines connected to the test pads and that are separated by a first spacing and extend to a second surface of the first wafer. A comb is disposed in a second wafer and has a plurality of comb lines having a second spacing different from the first spacing. Each of the comb lines has a first surface exposed at a first side of the second wafer. The comb lines provide an indication of an alignment of the first wafer and second wafer by a number or arrangement of connections made by the plurality of comb lines between the test node lines and the common node. | 08-20-2015 |
| 20150231657 | NOZZLE HAVING REAL TIME INSPECTION FUNCTIONS - A nozzle for emitting a fluid comprises a channel, a light source and a light sensor. The channel is configured to flow the fluid. The light source is configured to emit light towards a surface on which the fluid is applied and the light sensor is configured to receive reflected light from the surface. | 08-20-2015 |
| 20150229323 | MULTI-STAGE DIGITAL-TO-ANALOG CONVERTER - A circuit includes a first digital filter H(z), a second digital filter | 08-13-2015 |
| 20150228793 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure includes a substrate and a metal gate. The metal gate includes a metallic filling layer and disposed over the substrate. The semiconductor structure further includes a dielectric material over the metallic filling layer and separating the metallic filling layer from a conductive trace. The conductive trace is over the dielectric material. The semiconductor structure further includes a conductive plug extending longitudinally through the dielectric material and ending with a lateral encroachment inside the metallic filling layer along a direction. The lateral direction is substantially perpendicular to the longitudinal direction of the conductive plug. | 08-13-2015 |
| 20150228782 | FIELD EFFECT TRANSISTOR WITH HETEROSTRUCTURE CHANNEL - In some embodiments, an FET structure comprises a heterostructure, and a gate structure. The heterostructure comprises a first section, a barrier section and a second section such that a portion of the first section, the barrier section, and a portion of the second section form a channel region, and portions of the first section and the second section on opposite sides of the channel region form at least portions of source and drain regions, respectively. When the channel region is p type, the barrier section has a positive valence band offset with respect to each of the first section and the second section, or when the channel region is n type, the barrier section has a positive conduction band offset with respect to each of the first section and the second section. A gate structure is configured over the channel region. | 08-13-2015 |
| 20150228766 | Formation of High Quality Fin in 3D Structure by Way of Two-Step Implantation - The present disclosure discloses a method of fabricating a semiconductor device. A fin structure is formed over a substrate. The fin structure contains a semiconductor material. A first implantation process is performed to a region of the fin structure to form a fin seed within the region of the fin structure. The fin seed has a crystal structure. The first implantation process is performed at a process temperature above about 100 degrees Celsius. A second implantation process is performed to the region of the fin structure to cause the region of the fin structure outside the fin seed to become amorphous. The second implantation process is performed at a process temperature below about 0 degrees Celsius. Thereafter, an annealing process is performed to recrystallize the region of the fin structure via the fin seed. | 08-13-2015 |
| 20150228740 | Semiconductor Structure For Flash Memory Cells And Method Of Making Same - Semiconductor structures are presented. An exemplary semiconductor structure comprises a common source region having a sawtooth profile, and a flat erase gate disposed above the common source region. Methods of making semiconductor structures are also presented. An exemplary method comprises forming a plurality of trenches in a substrate thereby forming a plurality of active regions; forming a common source region in the substrate in a direction perpendicular to the active regions. The exemplary method further comprises, after forming the common source region, forming a dielectric feature on the substrate thereby filling the trenches and forming a plurality of shallow trench isolation features, and forming an erase gate on the dielectric feature. | 08-13-2015 |
| 20150228725 | Buried-Channel FinFET Device and Method - A fin field effect transistor (FinFET), and a method of fabrication, is introduced. In an embodiment, trenches are formed in a substrate, wherein a region between adjacent trenches defines a fin. A dielectric material is formed in the trenches. The fins are doped to form source, drain and buried channel regions. A gate stack is formed over the buried channel regions. Contacts are formed to provide electrical contacts to the source/drain regions and the gate. | 08-13-2015 |
| 20150228720 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure includes a wafer including a first surface and a periphery, a plurality of protrusions protruded from the first surface and a plurality of recesses spaced from each other by the plurality of protrusions, and each of the plurality of recesses is extended from the periphery of the wafer and is elongated across the first surface of the wafer. | 08-13-2015 |
| 20150228647 | INDENTED GATE END OF NON-PLANAR TRANSISTOR - In some embodiments, a semiconductor structure includes a substrate, a dielectric region, a non-planar structure and a gate stack. The dielectric region is formed on the substrate, and has a top surface. The non-planar structure protrudes from the top surface, and includes a channel region, and source and drain regions formed on opposite sides of the channel region. The gate stack is formed on the top surface, wraps around the channel region, and includes a gate top surface, and a gate side wall that does not intersect the non-planar structure. The gate side wall has a first distance from a vertical plane at a level of the top surface, and a second distance from the vertical plane at a level of the gate top surface. The vertical plane is vertical with respect to the top surface, and intersects the non-planar structure. The first distance is shorter than the second distance. | 08-13-2015 |
| 20150228645 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING - A semiconductor device includes a semiconductor substrate, and first and second transistors over the semiconductor substrate. Both the first and second transistors are p-type transistors or both the first and second transistors are n-type transistors. The first and second transistors have the same nominal operating voltage. The first transistor has a higher threshold voltage than the second transistor. The second transistor has at least one of a source region or a drain region with higher charge carrier mobility than at least one of a source region or a drain region of the first transistor. | 08-13-2015 |
| 20150228632 | Packaged Semiconductor Devices and Methods of Packaging Semiconductor Devices - Packaged semiconductor devices and methods of packaging semiconductor devices are disclosed. In some embodiments, a packaged semiconductor device includes an integrated circuit die, a molding compound disposed around the integrated circuit die, and an interconnect structure disposed over the integrated circuit die and the molding compound. The molding compound is thicker than the integrated circuit die. | 08-13-2015 |
| 20150228606 | SEMICONDUCTOR DEVICE INCLUDING AN EMBEDDED SURFACE MOUNT DEVICE AND METHOD OF FORMING THE SAME - Embodiments of the present disclosure include devices and methods of forming the same. An embodiment is a device including a solder resist coating over a first side of a substrate, an active surface of a die bonded to the first side of the substrate by a first connector, and a surface mount device mounted to the die by a second set of connectors, the surface mount device being between the die and the first side of the substrate, the surface mount device being spaced from the solder resist coating. | 08-13-2015 |
| 20150228605 | Interconnect Structure and Method of Forming the Same - An interconnect structure and a method of forming an interconnect structure are disclosed. The interconnect structure includes a conductive plug over a substrate; a conductive feature over the conductive plug, wherein the conductive feature has a first sidewall, a second sidewall facing the first sidewall, and a bottom surface; and a carbon-containing barrier layer having a first portion along the first sidewall of the conductive feature, a second portion along the second sidewall of the conductive feature, and a third portion along the bottom surface of the conductive feature. | 08-13-2015 |
| 20150228600 | PACKAGES WITH STRESS-REDUCING STRUCTURES AND METHODS OF FORMING SAME - A chip includes a semiconductor substrate, an electrical connector over the semiconductor substrate, and a molding compound molding a lower part of the electrical connector therein. A top surface of the molding compound is lower than a top end of the electrical connector. A recess extends from the top surface of the molding compound into the molding compound. | 08-13-2015 |
| 20150228584 | MULTI-VIA INTERCONNECT STRUCTURE AND METHOD OF MANUFACTURE - An interconnect structure and a method of forming the interconnect structure are provided. Two wafers (and/or dies) are bonded together. A multi-via interconnect structure is formed extending from a backside of a first substrate to interconnect structures in the metallization layers on the first integrated circuit and the second integrated circuit. The multi-via interconnect structure may be formed by thinning a first substrate of a first wafer and forming a first opening through the first substrate. A second opening extends from the first opening to a first interconnect structure on the first wafer, and a third opening extends from the first interconnect structure on the first wafer to a second interconnect structure on the second wafer. The first, second, and third openings are filled with a conductive material, thereby forming a multi-via interconnect structure. | 08-13-2015 |
| 20150228580 | SEMICONDUCTOR PACKAGE INCLUDING AN EMBEDDED SURFACE MOUNT DEVICE AND METHOD OF FORMING THE SAME - Embodiments of the present disclosure include semiconductor packages and methods of forming the same. An embodiment is a semiconductor package including a first package including one or more dies, and a package substrate bonded to a first side of the first package with by a first set of connectors. The semiconductor package further includes a surface mount device mounted to the first side of the first package, the surface mount device consisting essentially of one or more passive devices. | 08-13-2015 |
| 20150228516 | APPARATUS AND OPERATION METHOD THEREOF - An apparatus includes a body and a surface for receiving a semiconductor wafer carrier is provided. A nozzle and a venting hole are provided on the surface. The semiconductor wafer carrier has at least one selectively closable capped opening at a bottom, top and/or side surface thereof. The capped opening is configured to couple to, and be accessible by, the nozzle and receive gas output from the nozzle so as to create a substantially oxygen free environment within the semiconductor wafer carrier. The vent hole is configured to allow gas to flow out of the semiconductor wafer carrier. In addition, the apparatus includes a sensor and a controller. The sensor is configured to monitor an ambient condition in the semiconductor wafer carrier, and the controller is configured to adjust a control valve based on the ambient condition so as to control the gas flow or output from the nozzle. | 08-13-2015 |
| 20150228333 | Memory Circuit and Related Method - A device includes a memory bit cell, a first current source, and a current comparator electrically connected to the memory bit cell and the first current source. A first transistor has a first terminal electrically connected to a first voltage supply node, a control terminal electrically connected to a controller, and a second terminal electrically connected to the memory bit cell and the current comparator. A sense amplifier is electrically connected to the current comparator and a reference current generator. | 08-13-2015 |
| 20150228331 | CLAMPING CIRCUIT FOR MULTIPLE-PORT MEMORY CELL - A circuit includes a memory cell, a first data line, a second data line, and a clamping unit. The memory cell includes a data node, a first pass gate, and a second pass gate. The first pass gate is between the first data line and the data node. The second pass gate is between the second data line and the data node. The clamping unit is electrically coupled to the first data line and configured to pull a voltage level of the first data line toward a clamped voltage level when the clamping unit is enabled, and to function as an open circuit to the first data line when the clamping unit is disabled. The clamping unit is disabled when a first control signal indicates that a voltage level of the second data line is pulled toward a reference voltage level. | 08-13-2015 |
| 20150227672 | SEMICONDUCTOR DEVICE DESIGN SYSTEM AND USE THERE OF A METHOD FOR PERFORMING THE SAME - A system and method of designing a semiconductor device comprising loading a design rule manual (DRM) and a design rule check (DRC) into an electronic design tool, wherein the DRM comprises one or more design rules and the DRC comprises one or more design rule checks. Each design rule check is both associated with a corresponding design rule and configured to verify compliance with the corresponding design rule. The method further includes receiving a relevant information, wherein the relevant information comprises a layer number or a selected feature of the semiconductor device, creating, by a processor, a condensed DRM from the DRM, a condensed DRC from the DRC and displaying at least the condensed DRM or condensed DRC by a user interface. The condensed DRM is a portion of the DRM and the condensed DRC is a portion of the DRC. | 08-13-2015 |
| 20150227671 | Method For Integrated Circuit Mask Patterning - Provided is a method of transforming an integrated circuit (IC) pattern into one or more patterns suitable for subsequent processing, such as mask fabrication. The method includes receiving an IC pattern that has an arbitrary shape, and using a computer, deriving an approximation IC pattern, wherein the approximation IC pattern is in a shape that is a user-defined fabrication-friendly shape, such as a rectangle or an ellipse. The method further includes calculating a pattern approximation error between the IC pattern and the approximation IC pattern. The method further includes checking whether the pattern approximation error is less than a user-defined threshold. If it is, the method further includes outputting the approximation IC pattern for subsequent fabrication. Otherwise, the method further includes splitting the IC pattern into a plurality of subparts, and recursively transforming each of the plurality of subparts. | 08-13-2015 |
| 20150227037 | Structure and Method of Photomask with Reduction of Electron-Beam Scatterring - The present disclosure provides a structure of a photomask. The photomask includes a substrate; and a conductive material layer dispose over the substrate and patterned to include a plurality of openings and a recess structure surrounding the plurality of openings. | 08-13-2015 |
| 20150222229 | Oscillator Circuit and Related Method - A device includes a first pin configured to connect to a first terminal of a resonator, a second pin configured to connect to a second terminal of a resonator, a gain stage having a first terminal electrically connected to the first pin, and a voltage drop circuit. The voltage drop circuit includes a first transistor having an input terminal electrically connected to a second terminal of the gain stage, and a second transistor having an input terminal electrically connected to an output terminal of the first transistor, and an output terminal electrically connected to the second pin. | 08-06-2015 |
| 20150221611 | Methods of Packaging Semiconductor Devices and Packaged Semiconductor Devices - Methods of packaging semiconductor devices and packaged semiconductor devices are disclosed. In some embodiments, a method of packaging semiconductor devices includes coupling integrated circuit dies to a substrate, and disposing a molding material around the integrated circuit dies. A cap layer is disposed over the molding material and the plurality of integrated circuit dies. | 08-06-2015 |
| 20150221509 | IN-SITU STRAINING EPITAXIAL PROCESS - A method includes forming a recess in a semiconductor substrate, the recess being adjacent to a gate stack, performing an epitaxial growth process within the recess to form a straining region, and forming a defect within the straining region in-situ with the epitaxial growth process. | 08-06-2015 |
| 20150214368 | EMBEDDED SOURCE OR DRAIN REGION OF TRANSISTOR WITH LATERALLY EXTENDED PORTION - In some embodiments, in a method, a body structure with a gate structure configured thereon is provided. The gate structure comprises a gate side wall traversing the body structure. A spacer is formed over the gate side wall. A first recess is formed in the body structure. The first recess is formed beside the spacer and extending laterally under the spacer. A recess extension is formed under the first recess to extend a vertical depth of the first recess. Stressor material with a lattice constant different from that of the body structure is grown such that the extended first recess is filled. | 07-30-2015 |
| 20150214367 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - The present disclosure provides a semiconductor structure having a semiconductor layer; a gate with a conductive portion and a sidewall spacer; an interlayer dielectric (ILD) surrounding the sidewall spacer; and a nitrogen-containing protection layer, positioning at least on the top surface of the conductive portion of the gate. A top surface of the conductive portion and a top surface of the sidewall spacer are substantially coplanar. The nitrogen-containing protection layer is not covering the sidewall surface of the sidewall spacer. The present disclosure provides a method for manufacturing a semiconductor structure. The method includes forming a metal gate structure having a conductive portion and a sidewall spacer surrounded by a first ILD; forming a protection layer over the metal gate structure, and the protection layer is formed to cover at least the conductive portion of the metal gate structure; and forming a second ILD over the metal gate structure. | 07-30-2015 |
| 20150214319 | METAL GATE AND MANUFACTURING PROCESS THEREOF - The present disclosure provides a semiconductor structure, including a substrate, a metal gate, a dielectric layer, and an etch stop layer. The metal gate is positioned on the substrate and possesses a first surface. The dielectric layer surrounds the metal gate and possesses a second surface. The etch stop layer is in contact with both the first surface and the second surface. The first surface is higher than the second surface. The present disclosure also provides a method for manufacturing a semiconductor structure, including forming a dummy gate on a substrate; forming a second etch stop layer over the dummy gate; forming a dielectric layer over the dummy gate; replacing the dummy gate with a metal gate; etching back the dielectric layer to form a second surface of the dielectric layer lower than a first surface of the metal gate; and forming a first etch stop layer over the metal gate and the dielectric layer. | 07-30-2015 |
| 20150214272 | Metal Shield Structure and Methods for BSI Image Sensors - A backside illumination image sensor structure comprises an image sensor formed adjacent to a first side of a semiconductor substrate, wherein an interconnect layer is formed over the first side of the semiconductor substrate, a backside illumination film formed over a second side of the semiconductor substrate, a metal shielding layer formed over the backside illumination film and a via embedded in the backside illumination film and coupled between the metal shielding layer and the semiconductor substrate. | 07-30-2015 |
| 20150214237 | LOGIC COMPATIBLE FLASH MEMORY AND METHODS OF FORMING THE SAME - A method includes forming a first pad oxide layer and a second pad oxide layer over a first active region and a second active region, respectively, of a semiconductor substrate, forming a dielectric protection layer overlapping the first pad oxide layer, removing the second pad oxide layer, and forming a floating gate dielectric over the second active region. A floating gate layer is then formed to include a first portion over the dielectric protection layer, and a second portion over the floating gate dielectric. A planarization is performed on the first portion and the second portion of the floating gate layer. A blocking layer, a control gate layer, and a hard mask layer are formed over the second portion of the floating gate layer. The hard mask layer, the control gate layer, and the blocking layer are patterned to form a gate stack for a flash memory cell. | 07-30-2015 |
| 20150214226 | METHOD AND STRUCTURE FOR GAP FILLING IMPROVEMENT - The present disclosure provides a method for forming a semiconductor structure. The method includes providing a substrate including a plurality of fin structures on the substrate; coating a first solution on the substrate to form a first dielectric layer; and coating a second solution on the first dielectric layer to form a second dielectric layer to cover the fin structures. The first solution has a first viscosity. The second solution has a second viscosity. In some embodiments, the second viscosity is greater than the first viscosity. | 07-30-2015 |
| 20150214211 | THREE-DIMENSIONAL INTEGRATED CIRCUIT HAVING ESD PROTECTION CIRCUIT - An integrated circuit includes two or more substrates stacked one over another and a first set of electrical components on one or more of the two or more substrates. The two or more substrates include a first substrate having a first predetermined doping type and a second substrate having the first predetermined doping type. The first set of electrical components is configured to form a first circuit. The integrated circuit further includes a first ground reference rail electrically connected to the first circuit, a first common ground reference rail, and a first ESD conduction element electrically connected between the first ground reference rail and the first common ground reference rail. The first ESD conduction element includes a first diode on the first substrate and a second diode on the second substrate. The first diode and the second diode are electrically connected in parallel and have opposite polarities. | 07-30-2015 |
| 20150214191 | Packages with Stacked Dies and Methods of Forming the Same - A method includes bonding a first plurality of device dies onto a wafer, wherein the wafer includes a second plurality of device dies, with each of the first plurality of device dies bonded to one of the second plurality of device dies. The wafer is then sawed to form a die stack, wherein the die stack includes a first device die from the first plurality of device dies and a second device die from the second plurality of device dies. The method further includes bonding the die stack over a package substrate. | 07-30-2015 |
| 20150214145 | Interconnect Structure and Method of Fabricating Same - An interconnect structure and a method of fabrication of the same are introduced. In an embodiment, a post passivation interconnect (PPI) structure is formed over a passivation layer of a substrate. A bump is formed over the PPI structure. A molding layer is formed over the PPI structure. A film is applied over the molding layer and the bump using a roller. The film is removed from over the molding layer and the bump, and the remaining material of the film on the molding layer forms the protective layer. A plasma cleaning is preformed to remove the remaining material of the film on the bump. | 07-30-2015 |
| 20150214143 | Semiconductor Integrated Circuit With Nano Gap - A method of fabricating a semiconductor integrated circuit (IC) is disclosed. A substrate having a dielectric layer over it is provided. A block co-polymer (BCP) layer is deposited over the dielectric layer. The BCP layer is then annealed to form a first polymer nanostructures surrounded by a second polymer nanostructures over the dielectric layer. The second polymer nanostructure is selectively etched using the first polymer nanostructure as an etch mask to form a nano-block. The dielectric layer is selectively etched using the nano-block as an etch mask to form a nano-trench. The nano-trenched is sealed to form a nano-air-gap. | 07-30-2015 |
| 20150214128 | System and Method for Bonding Package Lid - Disclosed herein is a device having a shaped seal ring comprising a workpiece, the workpiece comprising at least one dielectric layer disposed on a first side of a substrate, a seal ring disposed in the at least one dielectric layer, and at least one groove in the seal ring. A lid is disposed over the workpiece, the workpiece extending into a recess in the lid and a first thermal interface material (TIM) contacts the seal ring and the lid, with the first TIM extending into the at least one groove. The workpiece is mounted to the package carrier. A die is mounted over a first side of workpiece and disposed in the recess. A first underfill a disposed under the die and a second underfill is disposed between the workpiece and the package carrier. The first TIM is disposed between the first underfill and the second underfill. | 07-30-2015 |
| 20150214082 | Wafer Processing Method and Apparatus - An apparatus for and a method of bonding a first substrate and a second substrate are provided. In an embodiment a first wafer chuck has a first curved surface and a second wafer chuck has a second curved surface. A first wafer is placed on the first wafer chuck and a second wafer is placed on a second wafer chuck, such that both the first wafer and the second wafer are pre-warped prior to bonding. Once the first wafer and the second wafer have been pre-warped, the first wafer and the second wafer are bonded together. | 07-30-2015 |
| 20150213880 | WRITING DATA TO A MEMORY CELL - A circuit comprises a first transistor, a capacitive component, a second transistor, and a data line. The first transistor has a threshold voltage value. A first terminal of the first transistor is coupled with a first terminal of the capacitive component and a second terminal of the second transistor. A second terminal of the first transistor is configured to receive a second-terminal voltage value. A third terminal of the first transistor is configured to receive a third-terminal voltage value. A first terminal of the second transistor is coupled with the data line. A third terminal of the second transistor is configured to receive a second-transistor control signal. The first transistor is configured to be on and off to maintain the data line at a data line voltage value. | 07-30-2015 |
| 20150213858 | READING DATA FROM A MEMORY CELL - In response to a write operation to a memory cell that causes a data line of the memory cell to have a first voltage direction, causing the data line to have a second voltage direction opposite the first voltage direction. | 07-30-2015 |
