Patents - stay tuned to the technology

Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


SHIN-ETSU CHEMICAL CO., LTD.

SHIN-ETSU CHEMICAL CO., LTD. Patent applications
Patent application numberTitlePublished
20160141438SUBSTRATE FOR SOLAR CELL, AND SOLAR CELL - Provided is a substrate for a solar cell, wherein a flat chamfered portion is formed on one corner of a silicon substrate having a square shape in a planar view, or a notch is formed on the corner or close to the corner. This invention makes it possible to easily check the position of the substrate and determine the direction of the substrate in a solar cell manufacturing step, and suppresses failures generated due to the direction of the substrate.05-19-2016
20160139512PATTERN FORMING PROCESS AND SHRINK AGENT - A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a polymer comprising recurring units capable of forming lactone under the action of acid in a C05-19-2016
20160137878WATER/OIL-REPELLENT TREATMENT AGENT HAVING HEAT RESISTANCE, METHOD OF PREPARATION, AND TREATED ARTICLE - A water/oil repellent treatment agent which includes a specific polymer-modified silane having a fluorooxyalkylene structure on the main chain and a hydrolyzable group at the end of the molecular chain, and/or a partial (co)hydrolyzate/condensate thereof, has a percent weight loss following one hour of exposure at 250° C. of 10% or less. The treatment forms a layer having excellent water and oil repellency, scuff resistance and mold release properties even when heated to 250° C. or more.05-19-2016
20160131972NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS - Sulfonium and iodonium salts of a carboxylate having an aromatic ring to which a nitrogen-containing alkyl or cyclic structure is attached are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.05-12-2016
20160124313PATTERN FORMING PROCESS AND SHRINK AGENT - A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a polymer comprising recurring units having an acid labile group-substituted hydroxyl and/or carboxyl group in a C05-05-2016
20160124312PATTERN FORMING PROCESS AND SHRINK AGENT - A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a polymer comprising recurring units capable of forming lactam under the action of acid in a C05-05-2016
20160122633METHOD FOR TREATING MN-ACTIVATED COMPLEX FLUORIDE PHOSPHOR - A method for treating a Mn-activated complex fluoride phosphor is provided wherein a preliminarily-prepared red phosphor of a Mn-activated complex fluoride represented by the following formula (1):05-05-2016
20160122632RED PHOSPHOR - A red phosphor has a peak of emission spectra of 600 and 650 nm, a peak width of up to 10 nm, and a fluorescence lifetime of at least five milliseconds at room temperature and is made of a Mn-activated complex fluoride phosphor represented by the following formula (1):05-05-2016
20160122611SILICONE RUBBER COMPOSITION FOR THERMALLY CONDUCTIVE SILICONE-RUBBER DEVELOPMENT MEMBER, AND THERMALLY CONDUCTIVE SILICONE-RUBBER DEVELOPMENT MEMBER - A silicone rubber composition for thermally conductive silicone-rubber development members which comprises (A) 100 parts by mass of an organopolysiloxane having, in the molecule, at least two alkenyl groups each bonded to a silicon atom, (B) 40-400 parts by mass of a thermally conductive powder that has an average primary-particle diameter of 30 μm or smaller and a thermal conductivity of 10 W/m·K or greater, (C) 1-50 parts by mass of carbon black, and (D) a hardener in an amount capable of curing the component (A) and which gives a cured silicone rubber having a thermal conductivity of 0.28 W/m·K or greater. With the silicone rubber composition for thermally conductive silicone-rubber development members, it is possible to provide a thermally conductive silicone-rubber development member (roll, belt, etc.) which comprises a silicone rubber layer formed by curing the silicone rubber composition and which is excellent in terms of image characteristics and has the feature of high thermal conductivity.05-05-2016
20160122586SILICONE RESIN, RESIN COMPOSITION, RESIN FILM, SEMICONDUCTOR DEVICE, AND MAKING METHOD - A silicone resin comprising constitutional units represented by formula (1) and having a Mw of 3,000-500,000 contains 10-50 wt % of (A-1) a first silicone resin having a silicone content of 10-40 wt % and (A-2) a second silicone resin having a silicone content of 50-80 wt %. A resin composition comprising the silicone resin can be formed in film form, and it possesses satisfactory covering or encapsulating performance to large size/thin wafers. The resin composition or resin film ensures satisfactory adhesion, low warpage, and wafer protection. The resin film is useful in wafer-level packages.05-05-2016
20160116837EVALUATION METHOD OF DEFECT SIZE OF PHOTOMASK BLANK, SELECTION METHOD, AND MANUFACTURING METHOD - The defect size of a photomask blank is evaluated. An inspection-target photomask blank is irradiated with inspection light and reflected light of the region of the inspection-target photomask blank irradiated with the inspection light is collected through an objective lens of an inspection optical system as a magnified image of the region. Then, an intensity change part in the light intensity distribution profile of the magnified image is identified. Next, a difference in the light intensity of the intensity change part is obtained and the width of the intensity change part is obtained as the apparent width of the defect. Then, the width of the defect is calculated on the basis of a predetermined conversion expression showing the relationship among the difference in the light intensity, the apparent width of the defect, and the actual width of the defect, and the width of the defect is estimated.04-28-2016
20160116423METHOD FOR EVALUATING CRYSTALLINITY OF POLYCRYSTALLINE SILICON - The method for evaluating crystallinity of polycrystalline silicon includes: disposing a collected plate sample (04-28-2016
20160113860OIL-BASED THICKENING AGENT, OIL-BASED THICKENING COMPOSITION, AND COSMETIC PREPARATION - Provided are: an oil-based thickening agent which is capable of providing an oil-based composition that has a high thickening effect on an oil component such as a silicone oil, while achieving excellent feeling of use; an oil-based thickening composition which contains this oil-based thickening agent and a liquid oil component; and a cosmetic preparation in which this oil-based thickening agent or oil-based thickening composition is blended. An oil-based thickening agent which is composed of a silicone-modified polysaccharide compound represented by formula (1) and a silicone emulsifying agent.04-28-2016
20160111559SOLAR CELL DEGRADATION CONTROL-COATING LIQUID AND THIN FILM AND SOLAR CELL DEGRADATION CONTROL METHOD - Provided is a solar cell degradation control-cover glass having a thin film that is formed by applying to a cover glass back surface a coating liquid comprising either an aqueous solution of a water-soluble compound of at least one metal selected from silicon, aluminum, zirconium, tin and zinc or a fine particle dispersion liquid of an oxide of such metal.04-21-2016
20160109803PATTERNING PROCESS AND CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION - A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units having a carboxyl and/or hydroxyl group optionally substituted with an acid labile group and an acid generator capable of generating fluorinated tetraphenylborate onto a substrate, prebaking, exposing, baking, and developing in an organic solvent so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high sensitivity and high dissolution contrast during organic solvent development and forms a fine hole or trench pattern via positive/negative reversal.04-21-2016
20160108258ACTIVATION ENERGY RADIATION-CURABLE SILICONE COATING COMPOSITION AND COATED ARTICLE - A silicone coating composition is provided comprising (A) a water dispersion of core/shell type tetragonal titanium oxide solid-solution particles, (B) a polycarbonate and/or polyester-based urethane-modified vinyl polymer, (C) a hydrolytic condensate obtained from (co)hydrolytic condensation of a sulfur-free alkoxysilane, (D) a photo-polymerization initiator, (E) a solvent, (F) optional colloidal silica, and (G) another polymerizable vinyl compound. The composition can be coated to a polycarbonate substrate, without a primer, and cured into a film which has transparency, controlled interference fringe, and mar resistance as well as long-term adhesion, weathering resistance and oxidation resistance.04-21-2016
20160108240SILICONE RESIN COMPOSITION FOR SEALING OPTICAL SEMICONDUCTOR ELEMENT AND OPTICAL SEMICONDUCTOR DEVICE - A silicone resin composition for sealing an optical semiconductor element includes (A) (A-1) an organopolysiloxane having a resin structure which contains at least two alkenyl groups in one molecule, the alkenyl groups being present at 10 to 70 mol % of the total substituent groups bonded to silicon atoms, (B) an organopolysiloxane oligomer having at least two alkenyl groups in one molecule and 2 to 5 silicon atoms, (C) an organohydrogenpolysiloxane which contains at least one hydrosilyl group and may have an alkoxy group or hydroxyl group in one molecule, and (D) an addition reaction catalyst, and is capable of providing a transparent cured product.04-21-2016
20160108066SILICONE COMPOUND HAVING A RADICAL-POLYMERIZABLE GROUP AND A METHOD FOR THE PREPARATION THEREOF - The present invention provides a radical-polymerizable group-containing silicone compound which is liquid at room temperature and has good handling properties, has excellent reactivity and provides a cured product having an excellent oxygen permeability.04-21-2016
20160102111CYCLIC AMINOORGANOXYSILANE COMPOUND AND ITS PRODUCTION METHOD - A method for producing a cyclic aminoorganoxysilane compound is provided. The method comprises the step of conducting dehydrochlorination coupling of a chloroalkylalkoxysilane compound represented by the formula:04-14-2016
20160097974CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM - A chemically amplified negative resist composition comprising a silicone structure-bearing polymer forms a film which can be readily patterned. The patterned film is tightly adherent to various substrates and suited as protective film on electric/electronic parts because of improved alkali resistance and reliability.04-07-2016
20160097973SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE - The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.04-07-2016
20160096984THERMALLY CONDUCTIVE SILICONE COMPOSITION AND A CURED PRODUCT OF SAME - A thermally conductive silicone composition is provided, a cured material from which does not impose stress to IC packages, even left at a high temperature.04-07-2016
20160096959CURABLE SILICONE EMULSION COMPOSITION - Provided is a curable silicone emulsion composition which has comparable curability without using an organotin compound curing catalyst, and for which the post-curing film properties thereof can obtain a comparable hardness, tensile strength, and elongation. A curable silicone emulsion composition characterized by including: (A) 100 parts by mass of an organopolysiloxane which includes a hydroxyl group bonded to at least two silicon atoms per molecule; (B) 0.01-5 parts by mass of an organohydrogenpolysiloxane which includes at least two silicon atom-bonded hydrogen atoms per molecule; (C) 1-10 parts by mass of the reaction product of an amino group-containing organoalkoxysilane and an acid anhydride; (D) 0.1-10 parts by mass of an epoxy group-containing organoalkoxysilane and/or a partial hydrolysis condensation product thereof; (E) 0.5-50 parts by mass of a colloidal silica; (F) 0.1-10 parts by mass of a bismuth compound; and (G) 50-500 parts by mass of water.04-07-2016
20160090511SILICONE COATING COMPOSITION AND COATED ARTICLE - Provided are: a silicone coating composition that can be applied to the surface of a substrate without a primer, that has weather resistance and oxidation resistance, and that can be used to obtain a cured coating that has excellent adhesion, weather-resistant adhesion, interference pattern suppression, scratch resistance, and transparency; and an article that is coated with the silicone coating composition. The silicone coating composition comprises: an aqueous dispersion (A) of a core shell-type tetragonal titanium oxide solid solution that has a core of fine tetragonal titanium oxide particles in which tin and manganese are present in a solid solution and that comprises a shell of silicon oxide on the outside of the core; a polycarbonate and/or polyester urethane-modified vinyl polymer (B); a hydrolysis condensate (C) that is obtained through (co-)hydrolysis and condensation of an alkoxysilane that does not contain sulfur atoms and/or a partial hydrolysis condensate thereof; a curing catalyst (D); a solvent (E); and colloidal silica (F) as necessary. The solid content of the component (B) is 1-30 mass % with respect to the solid content of the entire composition.03-31-2016
20160090355SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS - A sulfonium salt of formula (0-1) is provided wherein W is alkylene or arylene, R03-31-2016
20160087270NEGATIVE ELECTRODE MATERIAL FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERIES, AND SECONDARY BATTERY - The present invention relates to a negative electrode material for nonaqueous electrolyte secondary batteries, which is composed of a silicon composite body that has a structure wherein microcrystals or fine particles of silicon are dispersed in a substance having a composition different from that of the microcrystals or fine particles, said silicon composite body having a crystallite size of the microcrystals or fine particles of 8.0 nm or less as calculated using Scherrer's equation on the basis of the half width of the diffraction peak belonging to Si(220) in an X-ray diffraction. The present invention is able to provide a negative electrode material for nonaqueous electrolyte secondary batteries, which has excellent coulombic efficiency, and a nonaqueous electrolyte secondary battery.03-24-2016
20160085149RESIST COMPOSITION AND PATTERNING PROCESS - A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units having a carboxyl and/or hydroxyl group optionally substituted with an acid labile group, an oxirane or oxetane compound having a hydrophilic group, and an acid generator onto a substrate, prebaking, exposing, baking, and developing in an organic solvent so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high sensitivity and high dissolution contrast during organic solvent development and forms a fine hole or trench pattern via positive/negative reversal.03-24-2016
20160085147PELLICLE FRAME AND A PELLICLE - A pellicle is proposed in which the frame is formed with an external horizontal slit for the purpose of receiving a pressing means, which can urge the pellicle to be adhered to a photomask, in which the slit forms a vertically protruding part of a thickness of 5-30% of the width of a pellicle frame main body and a horizontally protruding part of a thickness of 0.3-1 mm; also the method of adhering the pellicle to the photomask is proposed.03-24-2016
20160083524ALUMINUM CHELATE COMPOUND AND ROOM TEMPERATURE-CURABLE RESIN COMPOSITION CONTAINING SAME - Provided are an aluminum chelate compound useful as, for example, a curing catalyst for a room temperature-curable resin; and a room temperature-curable resin composition containing such aluminum chelate compound.03-24-2016
20160081904OIL-BASED COSMETIC - Provided is an oil-based cosmetic comprising a siliconized polysaccharide compound, silicone emulsifier, organic modified clay mineral, carbonic acid ester, and wax. According to the present invention, a spinnable oil-based composition having exceedingly excellent adherability can be obtained by using a specific siliconized polysaccharide compound, silicone emulsifier, organic modified clay mineral, carbon dioxide ester, and wax, and if this composition is used in an eyelash cosmetic material, it is possible to obtain an eyelash cosmetic material that has excellent adherability, has an excellent long-lash effect without adding fibers, and is capable of imparting a natural finished look.03-24-2016
20160079466SOLAR CELL AND SOLAR-CELL MODULE - A solar cell wherein: an emitter layer is formed on a light-receiving-surface side of a crystalline silicon substrate, with a dopant of the opposite conductivity type from the silicon substrate added to said emitter layer; a passivation film is formed on the surface of the silicon substrate; and an extraction electrode and a collector electrode are formed. Said extraction electrode extracts photogenerated charge from the silicon substrate, and said collector electrode contacts the extraction electrode at least partially and collects the charge collected at the extraction electrode. The extraction electrode contains a first electrode that consists of a sintered conductive paste containing a dopant that makes silicon conductive. Said first electrode, at least, is formed so as to pass through the abovementioned passivation layer. The collection electrode contains a second electrode that has a higher conductivity than the aforementioned first electrode. This invention reduces contact-resistance losses between the silicon and the electrodes, resistance losses due to electrode resistance, and optical and electrical losses in the emitter layer, thereby greatly improving the characteristics of the solar cell.03-17-2016
20160077425PHOTOMASK BLANK - A photomask blank includes a chromium-based material film as a hard mask film containing at least one selected from the group consisting of nitrogen, oxygen, carbon and hydrogen, wherein a ratio (A/B) of etching rates per unit film thickness is in a range from 0.7 to 0.9, and the chromium-based material film has a tensile stress or compressive stress corresponding to an amount of warp of up to 70 nm. The present invention provides a photomask blank having a thin film of chromium-based material which is enhanced in etch resistance and lowered in film stress. This enables high-accuracy patterning of a chromium-based material film.03-17-2016
20160077424PHOTOMASK BLANK - A photomask blank includes a chromium-based material film as a light-shielding film, wherein the chromium-based material film has an optical density per unit thickness at a wavelength of 193 nm of at least 0.050/nm, and the chromium-based material film has a tensile stress or compressive stress corresponding to an amount of warp of up to 50 nm. The present invention provides a photomask blank having a thin film of chromium-based material which is lowered in film stress while retaining a high optical density per unit film thickness. This enables high-accuracy patterning of a chromium-based material film.03-17-2016
20160075869UV-Curable Organopolysiloxane Composition, Silicone Gel Cured Product, and Pressure Sensor - A UV curable organopolysiloxane composition includes: 03-17-2016
20160075853Fluorosilicone Rubber Compound and Rubber Part for Use Near Cargo Plane Engines - A fluorosilicone rubber composition is provided. This composition comprises (A) 100 parts by weight of a fluorosilicone rubber compound, (B) 0.1 to 10 parts by weight of an activated carbon at a pH of up to 9, and (C) a catalytic amount of a curing catalyst. The fluorosilicone rubber composition of the invention can be used in producing a fluorosilicone rubber molded article (cured article) which is less likely to experience loss of its physical properties when brought in contact with an amine antiaging agent. Such fluorosilicone rubber molded article is suitable for use in applications such as rubber parts used near cargo plane engines.03-17-2016
20160071761METHOD FOR PRODUCING HYBRID SUBSTRATE, AND HYBRID SUBSTRATE - A hybrid substrate has an SOI structure having a good silicon active layer, without defects such as partial separation of the silicon active layer is obtained without trimming the outer periphery of the substrate. An SOI substrate is obtained by sequentially laminating a first silicon oxide film and a silicon active layer in this order on a silicon substrate. A terrace portion that does not have the silicon active layer is formed in the outer peripheral portion of the silicon substrate surface. A second silicon oxide film is formed on the silicon active layer surface of the SOI substrate The bonding surfaces of the SOI substrate and a supporting substrate that has a thermal expansion coefficient different from that of the SOI substrate is subjected to an activation treatment. The SOI substrate and the supporting substrate are bonded with the second silicon oxide film being interposed therebetween.03-10-2016
20160070170CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE - A chemically amplified positive resist dry film to be formed on a support film contains 5-40 wt % of a component having a boiling point of 55-250° C. under atmospheric pressure. The resist dry film having flexibility and dimensional stability can be prepared through simple steps. The resist dry film can be efficiently and briefly laid on an article and processed to form a pattern.03-10-2016
20160068930EXTRACTION/SEPARATION METHOD - The inventive extraction/separation method involves the step of contacting an organic phase containing a dialkyldiglycol amic acid extractant: R03-10-2016
20160068732SILICONE COMPOSITION - Provided is a silicone composition exhibiting a favorable adhesiveness even when containing a large amount of a thermal conductive filler. The silicone composition contains specific amounts of 03-10-2016
20160067843ELECTRONIC GRADE GLASS SUBSTRATE AND MAKING METHOD - An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.03-10-2016
20160060462HEAT-CONDUCTIVE SILICONE COMPOSITION - A silicone composition that contains (A) an organopolysiloxane having at least two aliphatic unsaturated hydrocarbon groups per molecule, (B) a filler containing an aluminum powder and a zinc oxide powder, (C) an organohydrogenpolysiloxane having two or more silicon-bonded hydrogen atoms per molecule, and (D) a platinum group metal catalyst, in which a cured product of the silicone composition exhibits a ratio of a storage elastic modulus after 3,600 seconds from the start of measurement to a storage elastic modulus after 7,200 seconds from the start of measurement of 0.7 or less, the storage elastic modulus G′ being measured by constructing a program for holding a sample at 150° C. for 7,200 seconds after the sample is heated from 25° C. to 125° C. at a temperature increase rate of 10° C./min, from 125° C. to 145° C. at a temperature increase rate of 2° C./min, and from 145° C. to 150° C. at a temperature increase rate of 0.5° C./min.03-03-2016
20160060433AQUEOUS SILANE COUPLING AGENT COMPOSITION, MAKING METHOD, AND SURFACE TREATING AGENT - An aqueous silane coupling agent composition is obtained from cohydrolytic reaction of (i) a succinic anhydride-containing silane coupling agent and (ii) a mercapto-containing silane coupling agent in a molar ratio of 99:1 to 1:1. The composition has improved storage stability under high-temperature conditions and is effective as modifier.03-03-2016
20160056047Method for Producing a Composition for Forming an Organic Film - The present invention provides a method for producing a composition for forming an organic film, the composition being used in a process of manufacturing a semiconductor apparatus, the method including the steps of (1) washing a compound having an aromatic skeleton by an acid, (2) preparing a composition solution containing the washed compound, (3) filtering the prepared composition solution through a filter, and (4) putting the filtered composition solution into a container made of an organic resin. There can be provided a method for producing a composition for forming an organic film that can form an organic film in which defects after dry etching are reduced.02-25-2016
20160054652CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified resist composition comprising a base polymer, an acid generator, and a specific oxime compound has a high contrast of alkaline dissolution rate before and after exposure and high resolution and forms a pattern of satisfactory profile with minimal roughness and wide focus margin.02-25-2016
20160054598FARADAY ROTATOR AND OPTICAL ISOLATOR BASED ON THIS FARADAY ROTATOR - To provide a faraday rotator using a TGG ceramic sintered compact and a light isolator using the faraday rotator such that the influence of scattered light can be relatively reduced and overall characteristics degradation for the entire light isolator is minimized so that a high extinction ratio of at least 38 dB or greater is achieved.02-25-2016
20160053148SOLVENT-FREE SILICONE ADHESIVE AGENT COMPOSITION AND ADHESIVE ARTICLE - Provided is a solvent-free silicone adhesive agent composition comprising: (A) an organopolysiloxane which has at least two alkenyl-group-containing organic group per molecule in an amount of 40 to 95 parts by mass; (B) an organopolysiloxane which is composed of a R02-25-2016
20160052193RECTANGULAR SUBSTRATE FOR IMPRINT LITHOGRAPHY AND MAKING METHOD - A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.02-25-2016
20160048076POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition is provided comprising a polymer having an acid labile group and an acid generator bound to its backbone, in admixture with an onium salt having a specific cation structure capable of generating sulfonic acid having a molecular weight of at least 540. The composition is effective for suppressing acid diffusion, has high resolution, and forms a pattern of satisfactory profile and minimal edge roughness after exposure and development.02-18-2016
20160045405SILICONE COMPOSITE PARTICLE AND A METHOD FOR PREPARING THE SAME - A silicone composite particle composed of a silicone rubber particle and a polyorganosilsesquioxane, wherein the silicone rubber particle has plural dents on its surface and the polyorganosilsesquioxane adheres to the surface of the silicone rubber particle. Also, a method for preparing the silicone composite particle, which includes steps of subjecting organotrialkoxysilane to a hydrolysis and subsequent condensation in the presence of water, an alkaline substance and a silicone rubber particle containing therein a liquid to thereby have a resultant polyorganosilsesquioxane adhered to the surface of the silicone rubber particle, and subsequently removing the liquid.02-18-2016
20160040048LIQUID EPOXY RESIN COMPOSITION AND ADHESIVE AGENT FOR HEATSINK AND STIFFENER - Provided is a highly reliable adhesive agent for heatsink or stiffener, obtained by improving a conventional epoxy resin composition. The invention is a liquid epoxy resin composition exhibiting a viscosity of 50 to 1,000 Pa·s when measured by an E-type viscometer at 25° C., and including a liquid epoxy resin exhibiting a viscosity of 0.1 to 1,000 Pa·s when measured as above; a liquid phenol-based curing agent without siloxane bond and exhibiting a viscosity of 0.1 to 100 Pa·s when measured as above; a curing accelerator selected from tetraphenylphosphine, imidazole and tertiary amine; an inorganic filler treated with a silane coupling agent and exhibiting an average particle diameter of 0.1 μm or larger; thermoplastic resin particles being solid at 25° C.; and a silica treated with a silane coupling agent having a nonreactive functional group, and exhibiting an average particle diameter of not smaller than 0.005 μm but smaller than 0.1 μm.02-11-2016
20160040039FLUOROCHEMICAL SURFACE TREATING AGENT AND ARTICLE TREATED THEREWITH - A fluorochemical surface treating agent comprising a hydrolyzable group-containing silane modified with a fluorooxyalkylene-containing polymer and/or a partial hydrolytic condensate thereof forms a water/oil repellent layer having chemical resistance and mar resistance.02-11-2016
20160039849ORGANOSILICON COMPOUND, ADHESIVE COMPOSITION AND ARTICLE - An organosilicon compound having a hydrolyzable silyl group and a catechol group in the molecule is novel. When modified by surface treatment with an adhesive composition comprising the organosilicon compound, various inorganic materials such as glass and metals become tightly adherent to epoxy and other resins.02-11-2016
20160039848SYMMETRIC HYPERBRANCHED TYPE SILICONE-MODIFIED POLYMERIZABLE COMPOUND, AND ITS MODULARIZED PREPARATION METHOD - A symmetric hyperbranched type silicone-modified polymerizable compound contains a compound represented by the following general formula (1). A hyperbranched type silicone-modified polymerizable compound has flexibility at the branched skeleton itself than the conventional ones, and reactivity of a polymerizable functional group is good and it is positionally and sterically symmetric, while it has a highly branched structure having siloxane chains.02-11-2016
20160033865SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM - A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.02-04-2016
20160033859DESIGNING OF PHOTOMASK BLANK AND PHOTOMASK BLANK - A method for designing a photomask blank comprising a transparent substrate and an optical film thereon is provided. The photomask blank is processed into a transmissive photomask having a pattern of optical film such that the film pattern may be transferred when exposure light is transmitted by the photomask. The optical film is selected using a specific reflectance, which is equal to the reflectance divided by the film thickness, as an index.02-04-2016
20160033858HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD - A halftone phase shift photomask blank comprising a transparent substrate and a halftone phase shift film consisting of silicon, nitrogen and optional oxygen, and providing a phase shift of 150°-200° relative to light of wavelength up to 200 nm. The phase shift film includes at least one layer meeting the formula: 2×O/Si+3×N/Si≧3.5 wherein Si is a silicon content (at %), N is a nitrogen content (at %), and O is an oxygen content (at %). The phase shift film exhibits satisfactory in-plane uniformity of transmittance.02-04-2016
20160027653COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS - The invention provides a compound for forming an organic film having a partial structure represented by the following formula (ii),01-28-2016
20160024294HEAT-CURABLE EPOXY RESIN COMPOSITION FOR ENCAPSULATING OPTICAL SEMICONDUCTOR ELEMENT AND OPTICAL SEMICONDUCTOR DEVICE USING SAME - Provided is a heat-curable epoxy resin composition for encapsulating an optical semiconductor element. The resin composition exhibits a high strength and elastic modulus even in a high-temperature environment, hardly turns yellow due to an uneven hardening that occurs immediately after molding, and is solid under a room temperature such that the resin composition can be handled easily. The resin composition includes: a prepolymer obtained through a reaction of (A) a triazine derivative epoxy resin, (B) at least one epoxy resin selected from a group of (B-1) a bisphenol A-type epoxy resin, (B-2) a bisphenol F-type epoxy resin, (B-3) a hydrogenated bisphenol A-type epoxy resin and (B-4) an alicyclic epoxy resin and (C) an acid anhydride curing agent, at an epoxy group equivalent/acid anhydride group equivalent ratio of 0.6 to 2.0; and (D) a curing accelerator, such resin composition capable of being pressure molded under a room temperature before thermally cured.01-28-2016
20160023197MONONUCLEAR RUTHENIUM COMPLEX AND ORGANIC SYNTHESIS REACTION USING SAME - Provided is a mononuclear ruthenium complex that comprises a ruthenium-silicon bond that is represented by formula (1) and that exhibits excellent catalyst activity in each of a hydrosilylation reaction, a hydrogenation reaction, and reduction of a carbonyl compound.01-28-2016
20160023196MONONUCLEAR IRON COMPLEX AND ORGANIC SYNTHESIS REACTION USING SAME - Provided is a mononuclear iron complex that comprises an iron-silicon bond that is represented by formula (1) and that exhibits excellent catalyst activity in each of a hydrosilylation reaction, a hydrogenation reaction, and reduction of a carbonyl compound.01-28-2016
20160018729BINARY PHOTOMASK BLANK, PREPARATION THEREOF, AND PREPARATION OF BINARY PHOTOMASK - A binary photomask blank has a light-shielding film on a transparent substrate, the light-shielding film composed mainly of transition metal M and Si, or M, Si and N, and having an optical density of at least 3.0. The light-shielding film includes a layer containing M, Si and N so as to meet the formula: B≦0.68×A+0.23 wherein A is an atomic ratio M/Si and B is an atomic ratio N/Si, and has a thickness of up to 47 nm. The binary photomask blank has a thin light-shielding film capable of fully shielding exposure light.01-21-2016
20160003440RED LAMP AND LIGHTING SYSTEM FOR VEHICLE - This red lamp including a blue LED as a light source for emitting blue light, and a red light-emitting member illuminated by blue light. The red light-emitting member of the red lamp includes a resin, and a complex fluoride phosphor which is a complex fluoride salt activated by manganese, that absorbs blue light and emits light containing a red component. This high-efficiency red lamp has intense light emission, providing good visibility at both the lamp front surface and the sides of the lamp, and is suitable as a lighting system for vehicle, such as a red taillight, red brake light, or the like.01-07-2016
20160002528WAVELENGTH CONVERSION MEMBER AND LIGHT-EMITTING DEVICE - Disclosed is a wavelength conversion member which is a resin-molded article having dispersed therein a complex fluoride fluorophore that absorbs light with a blue wavelength component and emits light including a red wavelength component and that is represented by A01-07-2016
20160002052METHOD FOR PRODUCING TRICHLOROSILANE - In order to produce high-purity trichlorosilane by removing methyldichlorosilane from a mixture (S) containing methyldichlorosilane (CH01-07-2016
20150380726SILICON-CONTAINING PARTICLE, NEGATIVE-ELECTRODE MATERIAL FOR USE IN NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - A silicon-containing particle is provided for use as a negative-electrode active material of a non-aqueous electrolyte secondary battery, wherein a crystal grain size is 300 nm or less, the crystal grain size being obtained by a Scherrer method from a full width at half maximum of a diffraction line attributable to Si and near 2θ=28.4° in an x-ray diffraction pattern analysis, and a true density is more than 2.320 g/cm12-31-2015
20150378259POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - A positive resist composition comprising an organosiloxane-modified novolak resin, a photosensitive agent, and an organic solvent is provided, the resin comprising structural units having formula (1) wherein R12-31-2015
20150376023LIGHT TRANSMITTING METAL OXIDE SINTERED BODY MANUFACTURING METHOD AND LIGHT TRANSMITTING METAL OXIDE SINTERED BODY - Provided is a light transmitting metal oxide sintered body manufacturing method for obtaining a light transmitting sintered body, the main component of which is metal oxide, by carrying out hot isostatic pressing at a HIP heat processing temperature (T) set in a temperature range of 1000-2000° C. The light transmitting metal oxide sintered body manufacturing method, by which light transmitting properties can be improved, is characterized by the following: in the temperature elevating step of the hot isostatic pressing, a temperature range (S) from room temperature to the HIP heat processing temperature (T) is divided into a plurality of stages; for each divided stage the temperature elevation rate is controlled; and the temperature elevation rate of a final stage (14) that includes at least the HIP heat processing temperature (T) is 10° C./h to 180° C./h.12-31-2015
20150368474PHOTO-CURABLE COATING COMPOSITION AND COATED ARTICLE - A photo-curable coating composition comprising (1) a polyfunctional (meth)acrylic monomer, (2) a photopolymerization initiator, and (3) a specific hydroxyphenyltriazine base UV absorber has high mar resistance and long-term weather resistance.12-24-2015
20150361540RARE EARTH ELEMENT OXYFLOURIDE POWDER SPRAY MATERIAL AND SPRAYED ARTICLE - A spray material comprising rare earth element oxyfluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 μm, and a bulk density of 0.8-2 g/cm12-17-2015
20150361114Silicone Compound and a Use Thereof - The purpose is to provide a silicone compound which is well compatible with polymerizable silicone monomers and other polymerizable monomers to provide a polymer having high oxygen permeability, excellent hydrophilicity and anti-staining property, excellent dimension stability, and enough durability of mechanical strength not to deteriorate in a phosphate buffer solution. The other purpose is to provide a silicone compound having a high blocked terminal ratio and a high ratio of one specific structure and a method for preparing the silicone compound. The invention provides a compound represented by the following formula (1).12-17-2015
20150360997METHOD FOR PREPARING SYNTHETIC QUARTZ GLASS SUBSTRATE - A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating an arbitrary surface and an opposite surface of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring the birefringence of the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable or unacceptable group, based on the measured birefringence value.12-17-2015
20150360959METHOD OF PRODUCING SILICON CARBIDE AND SILICON CARBIDE - The present invention provides a method of producing silicon carbide, comprising: providing a silicon-crystal producing apparatus with a carbon heater; forming a silicon carbide by-product on a surface of the carbon heater when a silicon crystal is produced from a silicon melt contained in a container heated by the carbon heater under a non-oxidizing atmosphere; and collecting the silicon carbide by-product to produce the silicon carbide. A method that can produce silicon carbide with low energy at low cost is thereby provided.12-17-2015
20150359042CARBON BODY COATED WITH PYROLYTIC BORON NITRIDE, AND A CARBON HEATER INCLUDING THIS CARBON BODY - A PBN-coated carbon heater is disclosed in which the carbon base body is anisotropic with respect to thermal expansion coefficient such that the maximum-to-minimum coefficient ratio is 1.02 through 1.50 for temperatures between 50 and 800 degree C.; preferably the carbon base body is also anisotropic with respect to electric resistivity such that the maximum-to-minimum resistivity ratio is greater than 1.04 but not greater than 1.51, and the direction in which the resistivity is maximum coincides the direction of the heater pattern in which the electricity runs the longest distance.12-10-2015
20150357528LIGHT EMITTING DEVICE - A blue-light emitting device, or a pseudo-white-light emitting device, including an LED light source that includes, as a light emission component, blue light having a wavelength of from 420 to 490 nm. A color-renderability improvement member including a complex fluoride fluorophore that absorbs blue light and emits red light and that is represented by A12-10-2015
20150357261HEAT CONDUCTIVE SILICONE COMPOSITION, HEAT CONDUCTIVE LAYER, AND SEMICONDUCTOR DEVICE - Provided is a heat conductive silicone composition disposed between a heat generating electronic component and a member for dispersing heat, wherein the heat conductive silicone composition contains (A) an organopolysiloxane having at least two alkenyl groups in one molecule and having a dynamic viscosity at 25° C. of 10 to 100,000 mm12-10-2015
20150355544CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS - A resist composition is provided comprising (A) a carboxylic acid sulfonium salt whose anion moiety has a bulky structure of arenecarboxylate in which secondary or tertiary carbon atoms bond at both ortho-positions relative to the carbon atom in bond with carboxylate, as an acid diffusion regulator and (B) a polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. When processed by EB or EUV lithography, the resist composition exhibits a very high resolution and forms a pattern with minimal LER.12-10-2015
20150355543CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified positive resist composition is provided comprising a substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, a poly(meth)acrylate polymer having Mw of 1,000-500,000, and an acid generator in a solvent. The composition forms on a substrate a resist film of 5-100 μm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.12-10-2015
20150354783ADJUSTMENT COMPONENT AND LIGHT-EMITTING DEVICE - Disclosed is an adjustment component that: includes a complex fluoride fluorophore represented by A12-10-2015
20150353733WHITE THERMOSETTING SILICONE RESIN COMPOSITION FOR A LIGHT-EMITTING SEMICONDUCTOR DEVICE AND A CASE FOR INSTALLING A LIGHT-EMITTING SEMICONDUCTOR ELEMENT - The present invention provides a case for installing semiconductor element for use in LED etc. formed from a white thermosetting silicone resin composition and a cured material thereof that have low light transmittance rate, excellent moldability and are difficult to cause a burr to occur in molding. Provided is a white thermosetting silicone resin composition for a light-emitting semiconductor device, comprising: (A) a resin organopolysiloxane having a hydroxy group, and exhibiting a weight-average molecular weight of 500 to 20,000 based on polystyrene conversion, (B) an organopolysiloxane having a straight-chain diorganopolysiloxane residue, (C) a white pigment, (D) an inorganic filler other than (C), (E) a silane coupling agent in which a refractive index difference from the resin organopolysiloxane (A) is higher than or equal to 0.02 and a boiling point at atmospheric pressure is higher than or equal to 200° C., and (F) a curing catalyst.12-10-2015
20150353731HEAT-CURABLE RESIN COMPOSITION - The present invention can provide a heat-curable resin composition which is excellent in insulation property, heat resistance, and preservation stability. The heat-curable resin composition includes (A) cyanate ester compound having at least two cyanate groups in a molecule, (B) phenol curing agent including a resorcinol type phenol resin represented by the formula (1),12-10-2015
20150346600RESIST COMPOSITION AND PATTERNING PROCESS - A pattern is formed by coating a resist composition comprising a resin component comprising recurring units of formula (1) and a photoacid generator of formula (2) onto a substrate, baking, exposure, PEB and developing in an organic solvent. In formulae (1) and (2), R12-03-2015
20150345862METHOD FOR CLEANING BELL JAR, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, AND APPARATUS FOR DRYING BELL JAR - A bell jar includes a metallic bell jar (12-03-2015
20150342849SILICONE ELASTOMER PARTICLE AND AN AQUEOUS DISPERSION COMPRISING THE SAME - One of the purposes of the present invention is to provide a silicone elastomer particle and an aqueous dispersion of the silicone elastomer particles, which prevent generation of odor from oxygenation of nonionic surfactants. The present invention provides a silicone elastomer particle having a crosslinking structure formed by an addition reaction of a monovalent aliphatic unsaturated group bonded to a silicon atom and a hydrogen atom bonded to another silicon atom, wherein the silicone elastomer particle contains an antioxidant. Further, present invention provides an aqueous dispersion comprising the silicone elastomer particles, a nonionic surfactant and water.12-03-2015
20150338744PATTERN FORMING PROCESS AND SHRINK AGENT - A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a polymer comprising recurring units having a tertiary amino group in a C11-26-2015
20150338034WAVELENGTH CONVERSION MEMBER AND REMOTE PHOSPHOR TYPE LIGHT EMITTING APPARATUS - A wavelength conversion member including a light emitting member being a molding of a mixture containing a transparent or translucent polymer material and a phosphor, and a reflection layer laminated on part of a surface of the light emitting member. In the wavelength conversion member which converts light from a light source by the phosphor and radiates the converted light in a desired direction, light emitted from the phosphor in the wavelength conversion member which is emitted in other directions than desired radiating direction can be efficiently utilized without loss.11-26-2015
20150331180OPTICAL FIBER AND OPTICAL FIBER SILICA GLASS BASE MATERIAL - An optical fiber silica glass base material comprising a core formed of silica glass doped with a positive dopant that increases a refractive index; an intermediate layer adjacent to the core and surrounding the core on a radial outside thereof; a trench layer adjacent to the intermediate layer, surrounding the intermediate layer on a radial outside thereof, and formed of silica glass doped with a negative dopant that decreases a refractive index; and a cladding layer adjacent to the trench layer, surrounding the trench layer on a radial outside thereof, and formed of silica glass. Thickness of the intermediate layer in a radial direction is greater than thickness of the trench layer, and a region of the intermediate layer nearer the core is more heavily doped with the positive dopant and/or a region of the intermediate layer nearer the trench layer is more heavily doped with the negative dopant.11-19-2015
20150329770PHOSPHOR SURFACE TREATMENT METHOD - A red phosphor in the form of a Mn-activated complex fluoride having the formula: A11-19-2015
20150329678HYDROPHILIZED SILICONE PARTICLES AND MAKING METHOD - Surfaces of silicone particles are hydrophilized by plasma treatment. The hydrophilized silicone particles are readily dispersible in aqueous materials without a need for dispersants, typically surfactants. In aqueous cosmetic applications externally applied to the skin such as skin care cosmetics, make-up cosmetics, antiperspirant cosmetics, and UV care cosmetics, for example, products free of skin irritation concern can be formulated because formulation is possible without a need for surfactants.11-19-2015
20150323865MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - A polymer for resist use is obtainable from a monomer having formula (1) wherein R11-12-2015
20150322273COMPOSITION FOR ANTISTATIC RELEASE AGENT AND ANTISTATIC RELEASE FILM - The invention relates to a composition for an antistatic release agent comprising: a release component, a conductive component, an organic solvent, and water, wherein the release component contains a condensation-type organopolysiloxane, the conductive component contains a complex with a π-conjugated electrically conductive polymer and a polyanion having a molecular weight of 20,000 to 900,000, an amount of the conductive component is 1 to 300 parts by mass, relative to 100 parts by mass of the release component, at least one amine compound selected from the group consisting of a secondary amine, a tertiary amine or a quaternary ammonium salt is coordinated to or bonded to portion of anion groups in the polyanion as an ion pair, and the water content is 5% by mass or less, relative to a total amount of the composition for an antistatic release agent. The present invention can provide a composition for an antistatic release agent containing a release component, which can be sufficiently cured, and having superior antistatic properties and release properties.11-12-2015
20150322027MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.11-12-2015
20150315084LIGHT-TRANSMITTING BISMUTH-SUBSTITUTED RARE-EARTH IRON GARNET-TYPE CALCINED MATERIAL, AND MAGNETO-OPTICAL DEVICE - A light-transmitting bismuth-substituted rare-earth iron garnet-type calcined body expressed by R11-05-2015
20150315080CONCRETE COMPOSITION - A concrete composition is provided comprising a nonionic water-soluble cellulose ether, water, cement, a fine aggregate, and a coarse aggregate. The nonionic water-soluble cellulose ether has a 2 wt % aqueous solution viscosity of 3-1,000 mPa·s at 20° C. The concrete composition has a static slump/remix slump ratio of at least 0.50.11-05-2015
20150301449PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS - An onium salt having an anion moiety of a specific bis-sulfonate structure is an effective photoacid generator. A resist composition comprising the PAG forms a pattern with a good balance of sensitivity and MEF, and minimal defects and offers a precise micropatterning resist material.10-22-2015
20150299417ORGANIC SOLVENT DISPERSION OF TITANIUM OXIDE SOLID-SOLUTION PARTICLES, MAKING METHOD, AND COATING COMPOSITION - Core/shell type tetragonal titanium oxide solid-solution particles each consisting of a core of tetragonal titanium oxide having tin and manganese incorporated in solid solution and a shell of silicon oxide are dispersed in an organic solvent. The core/shell type particles have a diameter D10-22-2015
20150294864METHOD FOR SUPPLYING SOURCE GAS FOR PRODUCING POLYCRYSTALLINE SILICON AND POLYCRYSTALLINE SILICON - In a method according to the present invention, an occurrence ratio of popcorn is suppressed by adjusting kinetic energy of a source gas supplied to a reaction furnace for producing polycrystalline silicon with a Siemens method (flow velocity and a supply amount of the source gas in source gas supply nozzle ejection ports). Specifically, in performing deposition reaction of the polycrystalline silicon under a reaction pressure of 0.25 MPa to 0.9 MPa, when flow velocity of the source gas in gas supply ports of the source gas supply nozzles (10-15-2015
20150294788METHOD FOR PREPARING RARE EARTH SINTERED MAGNET - A rare earth sintered magnet is prepared from a corresponding alloy powder, using a mold comprising a die, an upper punch, and a lower punch which is divided into a plurality of punch segments which are independently movable within the die. The method comprises the steps of filling the mold cavity with the alloy powder when one or more selected punch segments are moved to a higher position than the remaining punch segments; moving the selected punch segments down to the position where the selected and remaining punch segments assume the normal shape of the lower punch during the compression step; compressing the alloy powder between the upper and lower punches under a magnetic field while the normal shape of the lower punch is maintained, for thereby molding a compact; and heat treating the compact.10-15-2015
20150293447SILICONE STRUCTURE-BEARING POLYMER, RESIN COMPOSITION, AND PHOTO-CURABLE DRY FILM - A silicone structure-bearing polymer having a crosslinking group within the molecule, containing an isocyanurate structure bonded within the molecule, and having a Mw of 3,000-500,000 is provided. The polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.10-15-2015
20150292176OUTDOOR TANK WATERPROOFING SHEET AND OUTDOOR TANK WATERPROOFING METHOD - The present invention relates to an outdoor tank waterproofing sheet for covering the boundary region between the bottom of an outdoor tank, which is disposed on a base, and said base in a light-tight manner by spanning and adhering from the outdoor tank to the base, the sheet being characterized in being obtained from a single flexible elastomer layer. The present invention provides an outdoor tank waterproofing sheet and outdoor tank waterproofing method effective for preventing the infiltration of rainwater into the boundary region between the bottom of an outdoor tank, particularly a large tank that is often placed mainly at oil refineries, etc., and a base.10-15-2015
20150291790METHOD FOR PREPARING A COMPOSITION COMPRISING PERFLUOROPOLYETHER HAVING A HYDROXYL GROUP AT ONE TERMINAL - An object of the present invention is to provide a method for efficiently and highly selectively preparing a composition comprising perfluoropolyether having a hydroxyl group at one terminal at a higher ratio. The present invention provides a method for increasing a ratio of perfluoropolyether having a hydroxyl group at one terminal, relative to a total amount of the perfluoropolyether having a hydroxyl group at one terminal and perfluoropolyether having hydroxyl groups at both terminals in a composition comprising these perfluoropolyethers, wherein the method comprises a step of subjecting the composition to chromatography in which a moving phase is supercritical or subcritical state carbon dioxide of the specific temperature and the specific pressure, and a stationary phase is silica gel to thereby collect a fraction containing the perfluoropolyether having a hydroxyl group at one terminal at a higher ratio. Further, present invention provides for increasing a ratio of perfluoropolyether having a hydroxyl group at one terminal, relative to a total amount of the perfluoropolyether having a hydroxyl group at one terminal, perfluoropolyether having hydroxyl groups at both terminals and perfluoropolyether having no hydroxyl group at any terminal perfluoropolyether, in a composition comprising these perfluoropolyethers, wherein the method comprises a step of subjecting the composition to chromatography in which a moving phase is supercritical or subcritical state carbon dioxide of the specific temperature and the specific pressure, and a stationary phase is silica gel to thereby collect a fraction containing the perfluoropolyether having a hydroxyl group at one terminal at a higher ratio.10-15-2015
20150290091COSMETIC PREPARATION - Provided is a cosmetic preparation superior in stability and feel. The cosmetic preparation contains an (a) organopolysiloxane emulsion in an amount of not smaller than 0.1% by mass. This organopolysiloxane emulsion is obtained through emulsion polymerization and contains octamethylcyclotetrasiloxane in an amount of not larger than 1,000 ppm by mass.10-15-2015
20150287860SOLAR CELL ENCAPSULANT SILICONE COMPOSITION AND SOLAR CELL MODULE - A solar cell module is constructed from light-receiving surface and back surface panels, a solar cell matrix comprising a plurality of solar cells sandwiched between the panels, and a silicone encapsulant layer for encapsulating the solar cell matrix. A silicone encapsulant composition is to form the silicone encapsulant layer that has a storage elastic modulus of 1-300 MPa in a temperature range of −40° C. to 85° C.10-08-2015
20150287851SOLAR CELL AND SOLAR CELL MODULE - A solar cell includes: a semiconductor substrate on which at least pn junctions are formed; a multiplicity of finger electrodes that are formed in a comb-like shape on at least one surface of the semiconductor substrate; and a plurality of bus bar electrodes that are arranged so as to be orthogonal to the lengthwise direction of the finger electrodes and are connected with the finger electrodes. This solar cell is configured so that the finger electrodes connected with one of the bus bar electrodes are separated from the finger electrodes connected with another bus bar electrode that is arranged so as to be parallel to this one of the bus bar electrodes, and ends in the lengthwise direction of adjacent two or more of the finger electrodes connected with each bus bar electrode are electrically connected with one another by auxiliary electrodes.10-08-2015
20150286134AGGLUTINANT FOR PELLICLE AND A PELLICLE INCLUDING THE SAME - There is provided a pellicle 10-08-2015
20150286133PELLICLE FOR LITHOGRAPHY - There is provided a pellicle having a frame 10-08-2015
20150284872METHOD AND APPARATUS FOR EXTRACTING AND REMOVING RARE EARTH METAL IONS FROM PLATING SOLUTION - In an extraction tank, a plating solution containing rare earth metal ions is treated with an extracting solution of an extractant in a water-insoluble organic solvent. Extraction treatment is carried out by atomizing the extracting solution through a lower nozzle into the plating solution in the tank lower zone, and atomizing the plating solution through an upper nozzle into the extracting solution in the tank upper zone, for thereby bringing the plating solution in contact with the extracting solution to extract rare earth metal ions from the plating solution into the extractant for removal.10-08-2015
20150284414PREPARATION OF SILAZANE COMPOUND - A silazane compound useful as synthesis intermediates for paint additives, polymer modifiers, pharmaceuticals and agricultural chemicals is efficiently prepared by reaction of a halosilane compound with an amino-containing compound in a solvent which is the same silazane compound as the target product.10-08-2015
20150275437COATING EMULSION COMPOSITION, AND WATER/OIL-REPELLENT PAPER AND MAKING METHOD - An organopolysiloxane containing at least two silicon-bonded hydroxyl groups, the reaction product of an amino-containing organoalkoxysilane with a dicarboxylic anhydride, and an organopolysiloxane containing long-chain alkyl and alkoxy groups, but free of hydroxyl groups are emulsified and dispersed in water in the presence of a surfactant to form a coating emulsion composition.10-01-2015
20150275060SILICONE ADHESIVE COMPOSITION, A METHOD FOR THE PREPARATION THEREOF AND AN ADHESIVE FILM - One of the purposes of the present invention is to provide an silicone adhesive composition which comprises no antioxidant, has sufficient adhesive, tack properties and excellent heat resistance, and provides a silicone adhesive composition which has no adhesive residue in a test described below. The other purpose of the present invention is to provide an adhesive film and an adhesive tape having a cured layer obtained from the composition. The present invention provides an addition curable or peroxide curable silicone adhesive composition, wherein10-01-2015
20150275046FLUOROCHEMICAL COATING COMPOSITION AND ARTICLE TREATED THEREWITH - A fluorochemical coating composition is provided comprising (A) a hydrolyzable group-containing silane modified with a fluoropolyether-containing polymer and (B) a hydrolyzable group-containing silane modified with a fluoropolyether-polysiloxane copolymer in a weight ratio (A)/(B) of 40/60 to 95/5. The composition forms on a substrate a water/oil repellent layer which does not detract from the visibility of the substrate.10-01-2015
20150275035FLUOROCHEMICAL COATING COMPOSITION AND ARTICLE TREATED THEREWITH - A fluorochemical coating composition is provided comprising (A) a hydrolyzable group-containing silane modified with a fluorooxyalkylene-containing polymer and (B) a fluorooxyalkylene-containing polymer having an average molecular weight not higher than the average molecular weight of component (A) in a weight ratio (A)/(B) of 40/60 to 95/5. The composition forms on a substrate a water/oil repellent layer which does not detract from the visibility of the substrate.10-01-2015
20150274960CURABLE PERFLUOROPOLYETHER BASED GEL COMPOSITION AND GEL PRODUCT USING CURED COMPOSITION - A curable perfluoropolyether based gel composition is provided comprising (A) a linear fluorinated polymer containing at least two alkenyl groups, (B) a polyfluoromonoalkenyl compound containing one alkenyl group and having a perfluoropolyether structure in its backbone, (C) a cyclic organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms and at least one perfluoroalkyl group or perfluoropolyether structure-containing group, and (D) a hydrosilylation reaction catalyst. The composition cures into a gel having improved acid resistance as well as heat resistance, solvent resistance, chemical resistance, weatherability, parting property, and water/oil repellency.10-01-2015
20150274889FLUOROPOLYETHER-CONTAINING POLYMER-MODIFIED SILANE, SURFACE TREATING AGENT, AND ARTICLE - A fluoropolyether-containing polymer-modified silane having (1) is provided wherein Rf is a fluorooxyalkyl or fluorooxyalkylene-containing polymer residue, Y is a divalent to hexavalent hydrocarbon group, R is C10-01-2015
20150274888FLUOROPOLYETHER-CONTAINING POLYMER - A fluoropolyether-containing polymer of formula (1) is novel wherein Rf is a polymer residue containing a monovalent fluorooxyalkyl or divalent fluorooxyalkylene group, Z is a divalent hydrocarbon group, and α is 1 or 2. The polymer may be converted into a fluoropolyether-containing polymer-modified silane, which forms a water/oil repellent coating having weatherability.10-01-2015
20150274759ORGANOSILICON COMPOUND, ADHESIVE COMPOSITION AND ARTICLE - An organosilicon compound having a hydrolyzable silyl group and a catechol group in the molecule is novel. When modified by surface treatment with an adhesive composition comprising the organosilicon compound, various inorganic materials such as glass and metals become tightly adherent to epoxy and other resins.10-01-2015
20150273440VISIBLE LIGHT-RESPONSIVE PHOTOCATALYTIC NANOPARTICLE DISPERSION LIQUID, METHOD FOR PRODUCING SAME, AND MEMBER HAVING PHOTOCATALYTIC THIN FILM ON SURFACE - It is possible to obtain a visible light-responsive photocatalytic nanoparticle dispersion liquid containing copper-containing titanium oxide nanoparticles by subjecting an aqueous peroxotitanic acid solution containing a copper compound to hydrothermal reaction for crystallizing the aqueous solution by means of heat under high pressure. The visible light-responsive photocatalytic nanoparticle dispersion liquid thus obtained exhibits excellent dispersion stability of titanium oxide nanoparticles within a water-based dispersion medium even when left in a cold and dark indoor area for a long period of time, expresses photocatalytic activity even in visible light (400 to 800 nm) alone, and can easily create a photocatalytic thin film which is extremely transparent and exhibits excellent durability, and in which the state of copper coordination when exposed to heat or ultraviolet rays is stable and cannot be easily modified.10-01-2015
20150267399WATERPROOF SHEET FOR OUTDOOR TANK AND METHOD FOR APPLYING SAME - Provided is a waterproof sheet such that an adhesive layer is formed on a substrate rubber layer and characterized by the substrate rubber layer comprising a silicone rubber having a JIS-A hardness of 15-90, a tensile strength of at least 3 MPa, an elongation of 100-800%, and a crescent tear strength of at least 3 kN/m. The waterproof sheet can be used without a long-term decrease in material properties, and is waterproof in the long-term. In particular, the present invention can be a waterproof sheet able to withstand long-term use by means of stipulating the material properties of the substrate rubber. By means of a method for applying waterproofing to an outdoor tank, it is possible to reliably waterproof the bottom side of the outdoor tank by means of a simple application method.09-24-2015
20150262862METHOD FOR PRODUCING NANOCARBON FILM AND NANOCARBON FILM - The present invention relates to a method for producing a nanocarbon film using a hybrid substrate with which a nanocarbon film free from defects can be produced at low cost. This method is characterized in forming an ion implantation region by implanting ion into a single crystal silicon carbide substrate from a surface thereof and after bonding together the surface of the silicon carbide substrate implanted with ion and a surface of a base substrate, releasing the silicon carbide substrate at the ion implanted region to produce a hybrid substrate in which a thin film that includes the single crystal silicon carbide is transferred onto the base substrate, and then heating the hybrid substrate to sublime silicon atoms from the thin film that includes the single crystal silicon carbide so as to obtain the nanocarbon film.09-17-2015
20150260877METHODS FOR WORKING AND SENSING SYNTHETIC QUARTZ GLASS SUBSTRATE - A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.09-17-2015
20150259532FLUOROSILICONE RUBBER COMPOSITION - A fluorosilicone rubber composition comprising (A) an alkenyl-rich fluorosilicone gum, (B) an alkenyl-poor fluorosilicone gum, (C) reinforcing silica, and (D) a curing catalyst cures into a product which experiences little change of physical strength even after immersion in alcohol-containing fuel oil.09-17-2015
20150253666POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of 4-pyrone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.09-10-2015
20150253665POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of 2-pyrone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.09-10-2015
20150247239CARBON ELECTRODE AND APPARATUS FOR MANUFACTURING POLYCRYSTALLINE SILICON ROD - The upper electrode 09-03-2015
20150240141SILICONE PRESSURE-SENSITIVE ADHESIVE COMPOSITION HAVING IMPROVED SUBSTRATE ADHESION AND PRESSURE-SENSITIVE ADHESIVE ARTICLE - A silicone pressure-sensitive adhesive composition is provided comprising (A) an organopolysiloxane having at least two alkenyl-containing organic groups, (B) a polyorganosiloxane comprising R08-27-2015
20150239914NOVEL ORGANOSILICON COMPOUNDS, MAKING METHODS, AND ADHESION IMPROVER - Mercapto-containing organosilicon compounds of specific structure are low volatile and serve to enhance the adhesion of resins to inorganic substrates.08-27-2015
20150239913NOVEL ORGANOSILICON COMPOUNDS, MAKING METHODS, AND ADHESION IMPROVER - Mercapto-containing organosilicon compounds of specific structure are low volatile and serve to enhance the adhesion of resins to inorganic substrates.08-27-2015
20150239766HEAT TREATMENT METHOD OF SYNTHETIC QUARTZ GLASS - A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (ΔOH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060° C. for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of −7° C./hr to −30° C./hr, second heat treatment of holding at 1,030-950° C. for a time of 5-20 hours, and annealing at a rate of −25° C./hr to −85° C./hr. Two stages of heat treatment ensures that the glass has a low birefringence.08-27-2015
20150238616SOLID PREPARATION COMPRISING ENTERIC SOLID DISPERSION - Provided are a solid preparation comprising an enteric solid dispersion that allows a drug in the preparation to be rapidly dissolved without impairing the dissolution of the solid preparation, and a method for producing the same. More specifically, provided are a solid preparation comprising a poorly soluble drug, an enteric polymer, an excipient and a disintegrator, a mixed powder comprising at least the excipient and the disintegrator is partly or entirely covered with a solid dispersion comprising the poorly soluble dug and the enteric polymer; and a method for producing a solid preparation, comprising steps of: spraying an enteric polymer solution in which a poorly soluble drug has been dispersed or dissolved, on a mixed powder comprising an excipient and a disintegrator; and granulating and drying a resultant.08-27-2015
20150233082WATERPROOFING METHOD FOR OUTDOOR TANK - The present invention relates to a waterproofing method for an outdoor tank, the waterproofing method being characterized in that the boundary portion between the bottom of the outdoor tank installed on a foundation and the foundation is covered in a liquid tight manner by a waterproof sheet adhered so as to extend from the outdoor tank to the foundation. The present invention can provide a waterproofing method which is effective to prevent the entry of rain water into the boundary portions between the bottoms of outdoor tanks and the foundations, most of the outdoor tanks being large tanks mainly installed in oil refineries or the like. This waterproofing method for an outdoor tank can more reliably waterproof the bottom side of the outdoor tank using the simple method.08-20-2015
20150233007ELECTRODEPOSITING APPARATUS AND PREPARATION OF RARE EARTH PERMANENT MAGNET - An electrodepositing apparatus is provided comprising an inner tank (08-20-2015
20150233006PREPARATION OF RARE EARTH PERMANENT MAGNET - A rare earth permanent magnet is prepared by immersing a portion of a sintered magnet body of R08-20-2015
20150228841SOLAR CELL MANUFACTURING METHOD - The present invention relates to a method for manufacturing a solar cell having excellent long-term reliability and high efficiency, said method including: a step (08-13-2015
20150225832RARE EARTH FLUORIDE SPRAY POWDER AND RARE EARTH FLUORIDE-SPRAYED ARTICLE - A powder comprising rare earth element fluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 μm, a bulk density of 0.8-1.5 g/cm08-13-2015
20150218311METHOD FOR PREPARING A COMPOSITION COMPRISING PERFLUOROPOLYETHER HAVING A CARBOXYL GROUP AT ONE TERMINAL - An object of the present invention is to provide a method for efficiently and highly selectively preparing a composition comprising a perfluoropolyether having a carboxyl group at one terminal at a higher ratio. The present invention provides a method for increasing a ratio of a perfluoropolyether having a carboxyl group at one terminal, relative to a total amount of the perfluoropolyether having a carboxyl group at one terminal and a perfluoropolyether having carboxyl groups at both terminals in a composition comprising these perfluoropolyethers, wherein the method comprises a step of subjecting the composition to chromatography in which a moving phase is supercritical or subcritical state carbon dioxide of the specific temperature and the specific pressure, and a stationary phase is silica gel to thereby collect a fraction containing the perfluoropolyether having a carboxyl group at one terminal at a higher ratio. Further, present invention provides for increasing a ratio of a perfluoropolyether having a carboxyl group at one terminal, relative to a total amount of the perfluoropolyether having a carboxyl group at one terminal, a perfluoropolyether having carboxyl groups at both terminals and a perfluoropolyether having no carboxyl group at any terminal perfluoropolyether, in a composition comprising these perfluoropolyethers, wherein the method comprises a step of subjecting the composition to chromatography in which a moving phase is supercritical or subcritical state carbon dioxide of the specific temperature and the specific pressure, and a stationary phase is silica gel to thereby collect a fraction containing the perfluoropolyether having a carboxyl group at one terminal at a higher ratio.08-06-2015
20150212417POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of caramel furanone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.07-30-2015
20150212416POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of isosorbide nitrate ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.07-30-2015
20150212415POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of furaneol ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.07-30-2015
20150211139PRODUCTION METHOD FOR RARE EARTH PERMANENT MAGNET - A production method for a rare earth permanent magnet, wherein: a sintered magnet body comprising an R07-30-2015
20150211138PRODUCTION METHOD FOR RARE EARTH PERMANENT MAGNET - A production method for a rare earth permanent magnet, wherein: a sintered magnet body comprising an R07-30-2015
20150210721SILANE COUPLING AGENT, MAKING METHOD, PRIMER COMPOSITION, AND COATING COMPOSITION - A silane coupling agent is obtained from high-temperature heat distillation reaction of a silane coupling agent having a customary amic acid structure group. Dealcoholization reaction takes place between the carboxylic acid group and the alkoxysilyl group in the structure to induce intramolecular crosslinking. The crosslinked polymer component exerts a remarkable adhesion promoting effect.07-30-2015
20150206990SOLAR CELL PRODUCTION METHOD, AND SOLAR CELL PRODUCED BY SAME PRODUCTION METHOD - This solar cell production method involves productively forming an antireflection film comprising silicon nitride, said antireflection film having an excellent passivation effect. In an embodiment, a remote plasma CVD is used to form a first silicon nitride film on a semiconductor substrate (07-23-2015
20150206745SYSTEM FOR PRODUCING POLYCRYSTALLINE SILICON, APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON, AND PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON - The present invention provides a technique by which heat can be efficiently recovered from a coolant used to cool a reactor, and contamination with dopant impurities from an inner wall of a reactor when polycrystalline silicon is deposited within the reactor can be reduced to produce high-purity polycrystalline silicon. With the use of hot water 07-23-2015
20150206653PRODUCTION METHOD FOR RARE EARTH PERMANENT MAGNET - A production method for a rare earth permanent magnet, wherein: a sintered magnet body comprising an R07-23-2015
20150205193PELLICLE FOR EUV, AND AN ASSEMBLY INCLUDING THE PELLICLE, AND A METHOD FOR ASSEMBLING THE SAME - Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the shadow contrast, in terms of a contrast ratio, of the mesh structure; the angle of the rotation is 30 degrees or smaller, and the resultant contrast ratio should be 25% or lower.07-23-2015
20150203750LONG-LASTING PHOSPHOR CERAMICS AND MANUFACTURING METHOD THEREOF - A method for manufacturing MAl07-23-2015
20150202731METHOD OF PREPARING SYNTHETIC QUARTZ GLASS SUBSTRATE - A synthetic quartz glass substrate is prepared by immersing a starting substrate in an aqueous solution of a nonionic surfactant and precision polishing the substrate with a colloidal silica water dispersion. A synthetic quartz glass substrate having a few defects and low surface roughness is obtained while the polishing rate is improved and the polishing time is reduced.07-23-2015
20150200129METHOD FOR PRODUCING HYBRID SUBSTRATES, AND HYBRID SUBSTRATE - A method for producing hybrid substrates which can be incorporated into a semiconductor production line involves: forming an ion-injection region (07-16-2015
20150200053METHOD OF PRODUCING A CYLINDRICAL MAGNETIC CIRCUIT - A method of making a cylindrical magnetic circuit which is able to prevent deformation of a cylindrical yoke for holding two or more magnets without increasing the thickness of the yoke more than required, A method of producing a cylindrical magnetic circuit (07-16-2015
20150197625ORGANOSILICONE EMULSION COMPOSITION - An organosilicone emulsion composition comprising (A) 100 parts by weight of an organopolysiloxane having a viscosity of at least 500 Pa·s at 25° C., (B) 1-50 parts by weight of a polyether-containing organosiloxysilicate, (C) 1-50 parts by weight of a nonionic surfactant, and (D) 10-1,000 parts by weight of water is stable.07-16-2015
20150192849PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-CONTAINING MATERIAL FILM - In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.07-09-2015
20150191629SURFACE MODIFIER AND ARTICLE - A surface modifier comprising an organosilicon-containing fluoropolymer having formula (1), partial hydrolyzate or hydrolytic condensate thereof is provided. In formula (1), Rf is perfluoroalkyl, OA is OCF07-09-2015
20150185510OPTICAL ISOLATOR - An optical isolator for use with a wavelength band of 970-990 nm is improved in that it has a Faraday rotator made of an oxide material, which contains by 99% or more an oxide (Tb07-02-2015
20150185167METHOD FOR EVALUATING DEGREE OF CRYSTALLINE ORIENTATION OF POLYCRYSTALLINE SILICON, METHOD FOR SELECTING POLYCRYSTALLINE SILICON ROD, POLYCRYSTALLINE SILICON ROD, POLYCRYSTALLINE SILICON INGOT, AND METHOD FOR MANUFACTURING MONOCRYSTALLINE SILICON - When the degree of crystalline orientation of polycrystalline silicon is evaluated by an X-ray diffraction method, each obtained disc-like sample 07-02-2015
20150179506METHOD FOR PRODUCING SOS SUBSTRATES, AND SOS SUBSTRATE - A method for producing SOS substrates which can be incorporated into a semiconductor production line, and is capable of producing SOS substrates which have few defects and no variation in defects, and in a highly reproducible manner, or in other words, a method for producing SOS substrates by: forming an ion-injection region (06-25-2015
20150179337METHOD AND APPARATUS FOR PREPARING RARE EARTH SINTERED MAGNET - A mold comprising a die, an upper punch, and a lower punch, the pressure surface of one or both of the upper and lower punches being shaped non-planar, a cavity being defined between the die and the lower punch, is combined with a feeder including a shooter provided with a main sieve at its lower end port, the main sieve having a sifting surface of substantially the same non-planar shape as the pressure surface. A rare earth sintered magnet is prepared by feeding an alloy powder into the cavity through the shooter and sieve while applying weak vibration to the shooter, applying a uniaxial pressure to the alloy powder fill in the cavity under a magnetic field to form a precursor, and heat treating the precursor.06-25-2015
20150179336METHOD AND APPARATUS FOR PREPARING RARE EARTH SINTERED MAGNET - A mold comprising a die, an upper punch, and a lower punch, the pressure surface of one or both of the upper and lower punches being shaped non-planar, a cavity being defined between the die and the lower punch, is combined with a feeder including a shooter provided with a main sieve at its lower end port, the main sieve having a sifting surface of substantially the same non-planar shape as the pressure surface. A rare earth sintered magnet is prepared by feeding an alloy powder into the cavity through the shooter and sieve while applying weak vibration and vertical reciprocation to the shooter, applying a uniaxial pressure to the alloy powder fill in the cavity under a magnetic field to form a precursor, and heat treating the precursor.06-25-2015
20150160549PHOTOMASK BLANK - A photomask blank comprising a transparent substrate and a chromium-containing film deposited thereon is provided. The chromium-containing film comprises at least one CrC compound layer comprising up to 50 at % of Cr, at least 25 at % of O and/or N, and at least 5 at % of C. From the blank, a photomask having a photomask pattern formed on the substrate is produced, the photomask being used in photolithography of forming a resist pattern with a line width of up to 0.1 μm, using exposure light having a wavelength of up to 250 nm.06-11-2015
20150159299METHOD FOR GROWING SILICON CARBIDE CRYSTAL - In the present invention, a crucible formed of SiC as a main component is used as a container for a Si—C solution. The SiC crucible is heated such that, for example, an isothermal line representing a temperature distribution within the crucible draws an inverted convex shape; and Si and C, which are derived from a main component SiC of the crucible, are eluted from a high-temperature surface region of the crucible in contact with the Si—C solution, into the Si—C solution, thereby suppressing precipitation of a SiC polycrystal on a surface of the crucible in contact with the Si—C solution. To the Si—C solution of this state, a SiC seed crystal is moved down from the upper portion of the crucible closer to the Si—C solution and brought into contact with the Si—C solution to grow a SiC single crystal on the SiC seed crystal.06-11-2015
20150159297METHOD FOR GROWING SILICON CARBIDE CRYSTAL - In the present invention, a crucible formed of SiC as a main component is used as a container for a Si—C solution. A metal element M (M is at least one metal element selected from at least one of a first group consisting of La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho and Lu, a second group consisting of Ti, V, Cr, Mn, Fe, Co, Ni and Cu and a third group consisting of Al, Ga, Ge, Sn, Pb and Zn) is added to the Si—C solution and the crucible is heated to elute Si and C, which are derived from a main component SiC of the crucible, from a high-temperature surface region of the crucible in contact with the Si—C solution, into the Si—C solution. In this way, precipitation of a SiC polycrystal on a surface of the crucible in contact with the Si—C solution is suppressed.06-11-2015
20150159264SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOMASK BLANK, AND PHOTOMASK BLANK - A film is sputter deposited on a substrate by providing a vacuum chamber (06-11-2015
20150148273THERMALLY-CURABLE HEAT-CONDUCTIVE SILICONE GREASE COMPOSITION - Provided is a thermally-curable heat-conductive silicone grease composition which has a high shape-retaining property in an early stage even when the viscosity of the composition is low (i.e., the composition is easy to apply) in the early stage, and which becomes soft (has low hardness) after being cured. A thermally-curable heat-conductive silicone grease composition comprising, as essential components: 05-28-2015
20150147698NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R05-28-2015
20150147697RESIST COMPOSITION AND PATTERN FORMING PROCESS - A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R05-28-2015
20150140345REFINISH COATING SYSTEM AND REPAIRING METHOD FOR AUTOMOTIVE RESIN GLAZING - A refinish coating system comprising (I) an intermediate coating composition and (II) a topcoat coating composition is useful for repairing a damage area of a silicone hard coat layer on an automotive resin glazing substrate. The intermediate coating composition (I) comprises (A) a reactive siloxane compound and (B) silica. The topcoat coating composition (II) comprises (C) an alkoxysilane having a UV-absorbing functional group, (D) a multifunctional alkoxysilane, (E) a reactive siloxane compound, (F) colloidal silica, and (G) phosphoric acid. The system forms a coating having the same appearance and physical properties as the underlying silicone hard coat layer.05-21-2015
20150135996COMPOSITION CONTAINING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND AND METHOD FOR MAKING THE SAME - A composition consisting essentially of 90-99 parts by weight of a nitrogen-containing organoxysilane compound and 1-10 parts by weight of an isomer affords an appropriate cure behavior and is useful as paint additive, adhesive, silane coupling agent, textile treating agent, and surface treating agent.05-21-2015
20150133619SILICONE COMPOUND AND A USE THEREOF - One of the purposes of the present invention is to provide a silicone compound which has a specific number of silicon atoms, is well compatible with (meth)acryl monomers, is suitable as an ophthalmic monomer and provides a polymer having excellent durability of mechanical strength in a buffered phosphate solution. Another purpose of the present invention is to provide a silicone compound which functions well as a crosslinking agent for a polymerizable monomer. Further, another purpose is to provide a method for preparing the silicone compound, in particular the silicone compound having one specific structure at a high ratio. In the first aspect, the present invention provides a compound represented by the following formula (1-1):05-14-2015
20150133594HEAVY RELEASE ADDITIVE FOR RELEASE SHEET, POLYORGANOSILOXANE COMPOSITION FOR RELEASE SHEET, AND RELEASE SHEET - A heavy release additive for a release sheet comprises a condensation reaction product of dehydrative condensation reaction between (A) a polydiorganosiloxane of average polymerization degree of 500 to 10,000 and has at least one hydroxy or hydrolysable group per molecule and (B) a polyorganosiloxane resin composed of a (SiO05-14-2015
20150131149TRANSLUCENT SINTERED BODY, A FARADAY ROTATOR MADE OF THIS SINTERED BODY, AND AN OPTICAL ISOLATOR - A translucent sintered body having the following basic composition:05-14-2015
20150129103METHOD FOR BONDING A PELLICLE, AND A BONDING APPARATUS USED IN THIS METHOD - Here is proposed a method for bonding a pellicle to a stencil such as mask plate, which is characteristic in that the stencil-bonding agglutinant layer of the pellicle is warmed under load while the pellicle is being bonded to the stencil, preferably at a temperature in a range of 35 through 80 degrees C., and the load is increased stepwise and with intermittent removal of the load.05-14-2015
20150125794RESIST COMPOSITION AND PATTERNING PROCESS - A photoresist film containing a sulfonium or iodonium salt of carboxylic acid having an amino group has a high dissolution contrast and offers improved resolution, wide focus margin and minimal LWR when used as a positive resist film adapted for alkaline development and a negative resist film adapted for organic solvent development.05-07-2015
20150125785HALFTONE PHASE SHIFT PHOTOMASK BLANK, HALFTONE PHASE SHIFT PHOTOMASK AND PATTERN EXPOSURE METHOD - A halftone phase shift photomask blank comprising a transparent substrate and a halftone phase shift film is provided. The phase shift film consists of Si and N, or Si, N and O, and is free of transition metals. The phase shift film has a thickness of 40-70 nm, offers a transmittance of 10-40% and a phase shift of 150-200° relative to light of wavelength up to 200 nm, and is resistant to cleaning chemicals.05-07-2015
20150125707TITANIA-CONTAINING COATING COMPOSITION AND COATED ARTICLE - A coating composition is provided comprising (A) 1-50 parts by weight of surface-treated titanium oxide comprising core/shell type microparticles each consisting of a titanium oxide core and a silicon oxide shell, which are treated with two surface treating components having formula (I): R05-07-2015
20150124338UV-CURABLE ADHESIVE ORGANOPOLYSILOXANE COMPOSITION - A UV-curable adhesive organopolysiloxane composition is provided comprising (A) (A-1) an alkenyl-containing linear organopolysiloxane and (A-2) a three-dimensionai network alkenyl-containing organopolysiloxane resin comprising R05-07-2015
20150123387SILICONE RUBBER SHEET AND AIRBAG DEVICE - An airbag device including an inflator, an airbag and a silicone rubber sheet. The silicone rubber sheet is used for a flow passage to feed gas from an inflator to an airbag and is produced by stacking 0.5 mm or more of silicone composition comprising: 100 parts by weight of organopolysiloxane which is represented by the following average composition formula R05-07-2015
20150119518EMULSION-BASED HIGH RELEASE ADDITIVE FOR RELEASE SHEET, EMULSION COMPOSITION FOR RELEASE SHEET, AND MOLD RELEASE SHEET - The present invention relates to an emulsion-based high release additive for a release sheet, the additive being characterized by being obtained by dispersing in water a condensation product (A) obtained by subjecting the following to a dehydration condensation reaction: (A-1) a polydiorganosiloxane which has an average degree of polymerization of 100-300,000 and which has one or more hydroxyl groups or hydrolyzable groups per molecule; and (A-2) a polyorganosiloxane resin, which contains (SiO04-30-2015
20150118483PHOTOCURABLE COATING COMPOSITION, LAMINATE, AND AUTOMOTIVE HEADLAMP COVERING SHEET - A photocurable coating composition is provided comprising (1) surface-treated titanium oxide comprising core/shell type microparticles each consisting of a titanium oxide core and a silicon oxide shell, which are treated with two surface treating components having formula (I): R04-30-2015
20150118320AQUEOUS DISPERSION COMPRISING SILICONE ELASTOMER PARTICLES, A SILICONE ELASTOMER PARTICLE AND A COSMETIC - One of the purposes of the present invention is to provide an aqueous dispersion of silicone elastomer particles to provide a stable emulsion and the silicone elastomer particle, wherein a polyoxyethylene alkyl ether which has an alkyl group having a large number of carbon atoms is used as a surfactant. Further, another purpose is to provide a cosmetic comprising said aqueous dispersion or said silicone elastomer particles and giving a good feeling in the use. The present invention provides an aqueous dispersion comprising (A) silicone elastomer particles having a 90% volume cumulative diameter (D90) of 0.3 to 20 μm in an amount of 5 to 80 mass %, based on a total mass of the aqueous dispersion, (B) at least one polyoxyethylene alkyl ether having an alkyl group having 18 carbon atoms in an amount of 0.01 to 15 mass %, based on a total mass of the aqueous dispersion, wherein a hydrophile-lipophile balance (HLB) of the polyoxyethylene alkyl ether is 12.8 to 15.1, and (C) water in an amount of 19 to 94 mass %, based on a total mass of the aqueous dispersion. Further, the present invention provides a material comprising the aforesaid components (A) and (B), a method for preparing the material and a cosmetic comprising the aqueous dispersion or the material.04-30-2015
20150115206PREDOPING METHOD FOR LITHIUM, LITHIUM-PREDOPED ELECTRODE, AND ELECTRICITY STORAGE DEVICE - A predoping method for lithium, which is characterized by mixing and kneading, in the presence of a solvent, lithium metal with (a) silicon and a composite dispersion of silicon and silicon dioxide, (b) particles represented by SiOx (wherein 0.5≦x<1.6) and having a fine structure wherein fine silicon particles are dispersed in a silicon-based compound, and (c) an Si-based material that is a mixture of one or more oxides selected from among the lower oxides of silicon represented by the above-mentioned formula and that is capable of absorbing and desorbing lithium ions; a lithium-predoped electrode which uses the predoping method for lithium; and an electricity storage device.04-30-2015
20150108502HEAT DISSIPATION SUBSTRATE AND METHOD FOR PRODUCING SAME - The present invention relates to a heat dissipation substrate, which is a composite substrate composed of two layers, and which is characterized in that a surface layer (first layer) (04-23-2015
20150099414ORGANOSILICON COMPOUND, MAKING METHOD, ADHESIVE COMPOSITION, AND ARTICLE - An organosilicon compound having a hydrolyzable silyl group and pyridine ring in the molecule is provided. A composition comprising a polymer having an isocyanate, epoxy or acid anhydride in admixture with the organosilicon compound is shelf stable.04-09-2015
20150099228RESIST COMPOSITION AND PATTERNING PROCESS - A resist composition comprises a metal compound obtained from reaction of a starting metal compound having formula (A-1) or a (partial) hydrolyzate or condensate or (partial) hydrolytic condensate thereof, with a di- or trihydric alcohol having formula (A-2).04-09-2015
20150099075SPRAYED ARTICLE AND MAKING METHOD - A sprayed article is prepared by thermally spraying ceramic particles of rare earth oxide or fluoride or metal particles of W, Mo or Ta onto an outer or inner surface of a cylindrical carbon substrate to form a sprayed coating, and burning out the carbon substrate, thus leaving the ceramic or metal-base sprayed coating of cylindrical shape having a wall thickness of 0.5-5 mm.04-09-2015
20150093501RARE EARTH MAGNET AND ITS PREPARATION - A rare earth magnet is prepared by disposing a R04-02-2015
20150087792MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION - A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt % of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt % of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.03-26-2015
20150086929PATTERN FORMING PROCESS AND SHRINK AGENT - A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a copolymer comprising recurring units having an α-trifluoromethylhydroxy or fluoroalkylsulfonamide group and recurring units having an acid labile group-substituted amino group in a C03-26-2015
20150086926SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS - A carboxylic acid sulfonium salt having formula (1) is provided wherein R03-26-2015
20150085467RED LAMP AND VEHICLE LIGHTING FIXTURE - A red lamp is provided comprising a blue LED array and a red emissive member. The red emissive member is made of a resin having dispersed therein a phosphor capable of absorbing blue light and emitting red light, the phosphor being selected from among silicate, SiAlON, silicon nitride, sulfide, and garnet structure phosphors. The red lamp offers high efficiency, high light intensity, and improved visibility both in front and lateral directions and is thus suited for use in vehicle lighting fixtures such as red rear position lamps and red stop lamps.03-26-2015
20150085265PELLICLE - There is provided a pellicle having a frame, a membrane and an agglutinant layer (adhesive to bond the pellicle on a photo mask) in which the release liner (detachable sheet) laid to the agglutinant layer for protection thereof is controlled to have a surface roughness of 5-30 micrometers on the side of the liner which is attached to the agglutinant layer, with a result that the releasability of the liner is improved suitably.03-26-2015
20150083304WATERPROOF SHEET FOR USE IN BRIDGE PIER REPAIR AND WATERPROOF WORKING METHOD USING THE SAME - When a bridge pier is reinforced or repaired by wrapping a reinforcement around the pier, a waterproof sheet having a sufficient flexibility to attach to and cover the interface between the pier and the reinforcement in a liquid-tight manner is useful. The waterproof sheet is attached to the interface between the pier and the reinforcement to prevent water from penetrating into the interface for thereby preventing the reinforcement from deterioration.03-26-2015
20150064831MANUFACTURE OF SOLAR CELL MODULE - A solar cell module is manufactured by encapsulating a solar cell matrix comprising a plurality of electrically connected solar cell components between a transparent panel and a backsheet with a resin. The method involves (i) embossing opposite surfaces of a green silicone rubber sheet, (ii) arranging a transparent panel (03-05-2015
20150064626POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.03-05-2015
20150060919COMPOSITE PARTICLE, METHOD OF PRODUCING SAME, RESIN COMPOSITION CONTAINING THE PARTICLE, REFLECTOR FORMED FROM THE COMPOSITION, AND LIGHT-EMITTING SEMICONDUCTOR DEVICE USING THE REFLECTOR - A composite particle comprises inorganic compound particles that are derived from inorganic particle and are uniformly dispersed and sintered in a matrix phase composed of silica, or comprises silica particles that are uniformly dispersed and sintered in a matrix phase composed of said inorganic compound particles. The composite particle is prepared by sintering a mixture of (1) finely powdered silica having a BET specific surface area of 50 m03-05-2015
20150060918COMPOSITE PARTICLE, METHOD OF PRODUCING SAME, RESIN COMPOSITION CONTAINING THE PARTICLE, REFLECTOR FORMED FROM THE COMPOSITION, AND LIGHT-EMITTING SEMICONDUCTOR DEVICE USING THE REFLECTOR - A composite oxide particle prepared from raw materials comprising: (1) a finely powdered silica having a BET specific surface area of 50 m03-05-2015
20150057416ORGANOSILOXANE-MODIFIED NOVOLAK RESIN AND MAKING METHOD - An organosiloxane-modified novolak resin comprising structural units having formula (1) wherein R02-26-2015
20150053667THREE-DIMENSIONAL CERAMIC HEATER - A three-dimensional ceramic heater, such as a cylindrical ceramic heater, is proposed in which the conductive ceramic heating element is multi-furcated into lanes at least in the folded-back sections so that the electric current tends to flow in a more uniform and hence laminar manner with the effect that the localized over heating is suppressed greatly.02-26-2015
20150050498WATER-ABSORBABLE SILICONE RUBBER PARTICLES AND METHOD FOR PRODUCING SAME - Water-absorbable silicone rubber particles which are particles of a silicone rubber, each of which has a particle diameter ranging from 0.1 to 1,000 μm and is elastic, wherein the silicone rubber is an organopolysiloxane having a polyoxyalkylene group, contains an oxyethylene unit represented by the formula —OCH02-19-2015
20150047554METHOD FOR EVALUATING DEGREE OF CRYSTAL ORIENTATION IN POLYCRYSTALLINE SILICON, SELECTION METHOD FOR POLYCRYSTALLINE SILICON RODS, AND PRODUCTION METHOD FOR SINGLE-CRYSTAL SILICON - When a plate-like sample 02-19-2015
20150040616OPTICAL FIBER GLASS BASE MATERIAL MANUFACTURING METHOD AND OPTICAL FIBER GLASS BASE MATERIAL - Provided is an optical fiber glass base material manufacturing method that includes flame polishing an outside of a starting base material that includes a core and a first cladding with an oxyhydrogen flame and then arranging a glass fine particle synthesis burner facing the starting base material, which rotates, moving the starting base material and the burner back and forth relative to each other along the starting base material, and depositing glass fine particles produced by hydrolysis of glass raw material in the oxyhydrogen flame as a porous glass layer of a second cladding, the method comprising synthesizing and depositing the glass fine particles under conditions in which a hydrogen flow rate during a first back and forth deposition pass performed immediately after supply of raw material is started is greater than a normal hydrogen flow rate.02-12-2015
20150037516POLYCRYSTALLINE SILICON ROD MANUFACTURING METHOD - Switches (S02-05-2015
20150021292POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE - Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.01-22-2015

Patent applications by SHIN-ETSU CHEMICAL CO., LTD.

Website © 2016 Advameg, Inc.