Shanghai Micro Electronics Equipment Co., Ltd. Patent applications |
Patent application number | Title | Published |
20150369331 | NEGATIVE STIFFNESS SYSTEM FOR GRAVITY COMPENSATION OF MICROPOSITIONER - A negative stiffness system for gravity compensation of a micropositioner of wafer table in lithography machine, characterized in that, the negative stiffness system includes at least three sets of quasi-zero stiffness units, each of the sets of quasi-zero stiffness units comprises a pair of negative stiffness springs and a positive stiffness spring, the positive stiffness spring is vertically positioned, the pair of negative stiffness springs are obliquely and symmetrically positioned at two sides of the positive stiffness spring, upper ends | 12-24-2015 |
20150357217 | WARPED SILICON-CHIP ADSORPTION DEVICE AND ADSORPTION METHOD THEREOF - An apparatus and method for adsorbing a wafer are disclosed. The apparatus includes a chuck ( | 12-10-2015 |
20150340931 | MAGNETIC ALIGNMENT SYSTEM AND ALIGNMENT METHOD THEREFOR - A magnetic alignment system is disclosed, including a magnet array ( | 11-26-2015 |
20150261098 | Off-Axis Alignment System and Alignment Method - An off-axis alignment system includes, sequentially along a transmission path of a light beam, an illumination module ( | 09-17-2015 |
20140176925 | INTERFERENCE EXPOSURE DEVICE AND METHOD - An interference exposure device, including: a light source ( | 06-26-2014 |
20140160489 | FOUR-AXIS FOUR-SUBDIVIDING INTERFEROMETER - Four-axis four-subdividing interferometer comprising a four-axis light splitting module and an interference module which are sequentially arranged along the incident direction of polarization orthogonal double-frequency laser. The four-axis light splitting system comprises three 50% plane beam splitters and three 45-degree plane reflecting mirrors. The invention comprises a four-axis four-subdividing plane mirror interferometer and a four-axis four-subdividing differential interferometer. In the differential interferometer, an adjustable 45-degree reflecting minor is used to guide the reference light to a reference reflecting minor which is arranged in the same direction as a measurement minor and fixed on the moving object. | 06-12-2014 |
20140125989 | SIX-AXIS FOUR-SUBDIVIDING INTERFEROMETER - Six-axis four-subdividing interferometer comprising a six-axis light splitting system and an interference module which are sequentially arranged along the incident direction of polarization orthogonal double-frequency laser, wherein the six-axis light splitting system comprises five 45-degree plane beam splitters and four 45-degree full-reflecting minors. | 05-08-2014 |
20140074428 | METHOD FOR MEASURING AND CALIBRATING CENTROID OF COARSE STAGE OF PHOTOLITHOGRAPHY TOOL - A method for measuring and calibrating a centroid of a coarse stage of a photolithography tool by means of measuring an offset of the centroid relative to a midpoint of the coarse stage is disclosed. The method includes: individually performing closed-loop controls on parameters of the three degrees of freedom X, Y, and Rz of the coarse stage and converting the parameters into coordinates in a coordinate system of the coarse stage ( | 03-13-2014 |
20140016886 | SPLIT TYPE AEROSTATIC BEARING - A split-type aerostatic bearing for supporting a moving table to move frictionlessly on a platform ( | 01-16-2014 |
20130293859 | LARGE FIELD PROJECTION OBJECTIVE FOR LITHOGRAPHY - A lithography projection objective ( | 11-07-2013 |
20130250434 | PROJECTION OBJECTIVE LENS SYSTEM - A projection objective lens system includes from an object plane to an image plane: a first lens group (S | 09-26-2013 |
20100177294 | METHOD FOR IN-SITU ABERRATION MEASUREMENT OF OPTICAL IMAGING SYSTEM IN LITHOGRAPHIC TOOLS - The present invention has disclosed a method for in-situ aberration measurement in an optical imaging system of lithographic tools, which comprises the steps of: imaging the reticle pattern by the beams transmitting through the reticle via the optical imaging system; using particular tools to measure plural groups of linewidths by modifying the intensity distribution at the exit pupil plane of the optical imaging system; calculating the asymmetry and ununiformity of the linewidths and calculating the aberrations of the optical imaging system. The present method for aberration measurement can simplify the process of measurement; increase the measurement accuracy of the parameters of image quality; and reduce the time of measurement. | 07-15-2010 |
20090273765 | IMMERSION FLOW FIELD MAINTENANCE SYSTEM FOR AN IMMERSION LITHOGRAPHY MACHINE - The present invention provides an immersion flow field maintenance system for an immersion lithography machine, the lithography machine including a projection objective lens, at least a wafer stage for supporting the wafer, and an immersion supplying system distributed around the projection objective lens for producing an immersion flow field under the projection objective lens. The immersion maintenance system includes a horizontal guideway, a flat board connected with the horizontal guideway through the cantilever, and plural drivers for driving the flat board to move. When the wafer is unloading and the wafer stage is moving out of the exposure area under the projection objective lens, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the wafer stage to above the flat board. When the wafer is loaded and the wafer stage is moving into the exposure area, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the flat board to above the wafer stage. The system of the present invention eliminates the removing and establishing processes of the flow field when the wafer stage leaves and enters the exposal position, thus saving much time and improving the throughput of the lithography machine. | 11-05-2009 |
20090219503 | PRECISE POSITIONING SYSTEM FOR DUAL STAGE SWITCHING EXPOSURE - The present invention discloses a precise positioning system for dual stage switching exposure, which comprises at least a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units comprises at least a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation of the system both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other. The advantage of the present invention is that the switching paths of the wafer stages are short; the guide bars are equally forced; the size of the wafer stages are hardly restricted, thereby greatly improving the switching speed, operation accuracy and flexibility of the system. Besides, the present invention does not need to adopt additional collision-preventing apparatus, thus simplifying the system, reducing the cost, and effectively increasing the reliability. | 09-03-2009 |
20090185290 | LARGE-FIELD UNIT-MAGNIFICATION PROJECTION OPTICAL SYSTEM - The present invention discloses a large-field unit-magnification projection optical system. The optical system includes an optical axis, a spherical concave reflection mirror; a lens group with positive refracting power arranged adjacent the mirror with an air space therebetween. The lens group includes a first plano-convex lens, a negative meniscus lens adjacent the plano-convex lens, a positive lens adjacent the negative meniscus lens, a negative double-convex lens spaced apart far from the positive lens, and a second plano-convex lens. The optical system further includes a pair of prisms each having respective first and second surface. The second surfaces are arranged adjacent the flat surface of the plano-convex lens element on opposite sides of the optical axis and the first surfaces are arranged adjacent object planes and image planes, respectively. Each lens in the lens group and the pair of prisms provide chromatic aberration correction in a spectral region that contains at least g, h and i-line wavelengths. In this projection optical system, the object plane is parallel to the image plane. | 07-23-2009 |