PERSTORP SPECIALTY CHEMICALS AB Patent applications |
Patent application number | Title | Published |
20140100149 | LOW POUR POINT LUBRICANT BASE STOCK - Disclosed is a lubricant base stock, exhibiting a combination of high flash point, low evaporation loss, high viscosity and unexpectedly exceptionally low pour point and high viscosity index value. Said lubricant base stock comprises at least one ester between 2-propylheptanoic acid and at least one 2,2-substituted 1,3-propanediol and/or at least one dimer, trimer or polymer thereof and/or at least one alkoxylated species of a said 2,2-substituted 1,3-propanediol or a said dimer, trimer or polymer thereof. | 04-10-2014 |
20110247578 | LOW POUR POINT LUBRICANT BASE STOCK - Disclosed is a lubricant base stock, exhibiting a combination of high flash point, low evaporation loss, high viscosity and unexpectedly exceptionally low pour point and high viscosity index value. Said lubricant base stock comprises at least one ester between 2-propylheptanoic acid and at least one 2,2-substituted 1,3-propanediol and/or at least one dimer, trimer or polymer thereof and/or at least one alkoxylated species of a said 2,2-substituted 1,3-propanediol or a said dimer, trimer or polymer thereof. | 10-13-2011 |
20100222448 | AQUEOUS POLYURETHANE DISPERSION - Disclosed is an aqueous polyurethane dispersion obtained by dispersing in water a reaction product obtained by reacting a reaction mixture comprising at least one organic, aliphatic, cycloaliphatic or aromatic di, tri or poryisocyanate, at least one isocyanate reactive polycarbonate diol, triol or polyol, at least one compound comprising at least one isocyanate reactive group and at least one free radically polymerisable unsaturated group, and at least one compound comprising at least one isocyanate reactive group and at least one at least dispersing active group, and optionally at least one compound comprising at least two isocyanate reactive groups and having a molecular weight of less than 1000 g/mol. | 09-02-2010 |
20100087678 | PROCESS FOR PRODUCING POTASSIUM FORMATE - The present invention relates to a process for producing potassium formate. Formaldehyde, potassium hydroxide and isobutyraldehyde are reacted in water, at a molar ratio of 1.0:1.0:1.0 to 3.0:2.0:1.0 and at a temperature of 0-1000 C, preferably 30-700 C. The obtained reaction solution is neutralised to pH 4-6 and evaporated in a first step, whereby two phases are obtained, one organic phase and one aqueous phase, the latter comprising the main part of the potassium formate. The organic phase is subsequently separated from the aqueous phase, where after a final evaporation of the aqueous phase takes place at a pressure of 0.0-1.0 bar and a temperature of 160-2500 C, to obtain a melt of potassium formate. Water is added followed by filtration resulting in a solution having a content of >99% by weight of potassium formate, calculated on a water free basis. | 04-08-2010 |
20090062575 | PROCESS FOR PRODUCING MONOPENTAERYTHRITOL OF HIGH PURITY AND MONOPENTAERYTHRITOL PRODUCED BY THE PROCESS - The invention relates to a process for producing monopentaerythritol of high purity and monopentaerythritol produced by the process. Formaldehyde is reacted with acetaldehyde in an aqueous solution in the presence of a strongly basic hydroxide in a conventional way. The obtained reaction mixture is evaporated to a dryness of 50-70% by weight and is thereafter cooled. Crystals of pentaerythritol thereby formed are separated off. The crystals are dissolved in water or in a water-containing mother liquor containing pentaerythritol to a dryness of 35-55% by weight. The solution is treated in a purification step whereupon monopentaerythritol of high purity is crystallized at a temperature of 40-90° C. and separated from the remaining mother liquor which is recirculated to the above mentioned step. | 03-05-2009 |
20090039310 | Deicing Composition and Use Thereof - Disclosed is a novel deicing composition having improved corrosion inhibition and being obtained by mixing 89-99.98% by weight of an alkali metal formate 0.01-6% by weight of an alkali metal silicate and 0.01-5% by weight of a C | 02-12-2009 |