MOLECULAR IMPRINTS, INC. Patent applications |
Patent application number | Title | Published |
20140319727 | PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES - Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles. | 10-30-2014 |
20140314897 | NANO IMPRINTING WITH REUSABLE POLYMER TEMPLATE WITH METALLIC OR OXIDE COATING - Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput. | 10-23-2014 |
20140312532 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween. | 10-23-2014 |
20140212534 | Fabrication of High-Throughput Nano-Imprint Lithography Templates - An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρ | 07-31-2014 |
20140117574 | Strain and Kinetics Control During Separation Phase of Imprint Process - Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process. | 05-01-2014 |
20140100346 | NANOIMPRINT LITHOGRAPHY PROCESSES FOR FORMING NANOPARTICLES - A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles. | 04-10-2014 |
20140034229 | Method for Adhering Materials Together - The present invention provides a method for adhering a layer to a substrate that features defining first and second interfaces by having a composition present between the layer and the substrate that forms covalent bonds to the layer and adheres to the substrate employing one or more of covalent bonds, ionic bonds and Van der Waals forces. In this manner, the strength of the adhering force of the layer to the composition is assured to be stronger than the adhering force of the layer to the composition formed from a predetermined adhering mechanism, i.e., an adhering mechanism that does not include covalent bonding. | 02-06-2014 |
20140021167 | Large Area Patterning of Nano-Sized Shapes - Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process. | 01-23-2014 |
20130241109 | EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY - Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified. | 09-19-2013 |
20130214452 | LARGE AREA IMPRINT LITHOGRAPHY - Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate. | 08-22-2013 |
20130153534 | FABRICATION OF SEAMLESS LARGE AREA MASTER TEMPLATES FOR IMPRINT LITHOGRAPHY USING STEP AND REPEAT TOOLS - Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices. | 06-20-2013 |
20120288686 | REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS - A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition. | 11-15-2012 |
20120269972 | Optically Absorptive Material for Alignment Marks - Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features. | 10-25-2012 |
20120214066 | High Aspect Ratio Patterning of Silicon - A silicon nanowire array including a multiplicity of silicon nanowires extending from a silicon substrate. Cross-sectional shape of the silicon nanowires and spacing between the silicon nanowires can be selected to maximize the ratio of the surface area of the silicon nanowires to the volume of the nanowire array. Methods of forming the silicon nanowire array include a nanoimprint lithography process to form a template for the silicon nanowire array and an electroless etching process to etch the template formed by the nanoimprint lithography process. | 08-23-2012 |
20120201969 | PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES - An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance. | 08-09-2012 |
20120189780 | Controlling Thickness of Residual Layer - Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm. | 07-26-2012 |
20120187085 | CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION - Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer. | 07-26-2012 |
20120114559 | NANOIMPRINT LITHOGRAPHY FORMATION OF FUNCTIONAL NANOPARTICLES USING DUAL RELEASE LAYERS - Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers. | 05-10-2012 |
20120112385 | PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES - Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles. | 05-10-2012 |
20120111832 | Template Pillar Formation - Methods for forming an imprint lithography template are provided. Materials for forming the imprint lithography template may be etched at different rates based on physical properties of the layers. Additionally, reflectance of the materials may be monitored to provide substantially uniform erosion of the materials. | 05-10-2012 |
20120073462 | High Contrast Alignment Marks Through Multiple Stage Imprinting - Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template. | 03-29-2012 |
20120070572 | Vapor Delivery System For Use in Imprint Lithography - Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process. | 03-22-2012 |
20120058258 | METHODS OF CLEANING HARD DRIVE DISK SUBSTRATES FOR NANOIMPRINT LITHOGRAPHY - Post sputter cleaning of hard disk substrates for use in an imprint lithography processes. The cleaning removes contaminants including organic contaminants that otherwise may cause repeating void (non-fill) defects in the imprinted pattern. | 03-08-2012 |
20120009413 | ENHANCED DENSIFICATION OF SILICON OXIDE LAYERS - Densifying a multi-layer substrate includes providing a substrate with a first dielectric layer on a surface of the substrate. The first dielectric layer includes a multiplicity of pores. Water is introduced into the pores of the first dielectric layer to form a water-containing dielectric layer. A second dielectric layer is provided on the surface of the water-containing first dielectric layer. The first and second dielectric layers are annealed at temperature of 600° C. or less. In an example, the multi-layer substrate is a nanoimprint lithography template. The second dielectric layer may have a density and therefore an etch rate similar to that of thermal oxide, yet may still be porous enough to allow more rapid diffusion of helium than a thermal oxide layer. | 01-12-2012 |
20120006703 | CONTAMINATE DETECTION AND SUBSTRATE CLEANING - Detection of periodically repeating nanovoids is indicative of levels of substrate contamination and may aid in reduction of contaminants on substrates. Systems and methods for detecting nanovoids, in addition to, systems and methods for cleaning and/or maintaining cleanliness of substrates are described. | 01-12-2012 |
20110319516 | RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY - Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography. | 12-29-2011 |
20110277833 | BACKSIDE CONTACT SOLAR CELL - Variations of interdigitated backside contact (IBC) solar cells having patterned areas formed using nano imprint lithography are described. | 11-17-2011 |
20110277827 | NANOSTRUCTURED SOLAR CELL - Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE. | 11-17-2011 |
20110260361 | SAFE DEPARATION FOR NANO IMPRINTING - Control of lateral strain and lateral strain ratio (d | 10-27-2011 |
20110256355 | LOW-K DIELECTRIC FUNCTIONAL IMPRINTING MATERIALS - A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO | 10-20-2011 |
20110221095 | Step and Repeat Imprint Lithography Process - The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process. | 09-15-2011 |
20110215503 | Reducing Adhesion between a Conformable Region and a Mold - Improved preferential adhesion and release characteristics are described with respect to a substrate and a mold having imprinting material disposed therebetween, in the absence of an a priori release layer on the mold. The imprinting material is a polymerizable material including a fluorinated surfactant and a photoinitiator. The surfactant includes —CH | 09-08-2011 |
20110212263 | Imprinting of Partial Fields at the Edge of the Wafer - Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate. | 09-01-2011 |
20110193251 | Process Gas Confinement for Nano-Imprinting - Gas confinement systems and methods are described. In particular, systems and methods are described that include a barrier that confines purging gas and restricts flow of purging gas to other elements within a nano-lithography system. The barrier can be adjusted to accommodate and/or control desired pressure variations between working and external environments. | 08-11-2011 |
20110192302 | Templates Having High Contrast Alignment Marks - Described are systems and methods for formation of templates having alignment marks with high contrast material. High contrast material may be positioned within recesses of alignment marks. | 08-11-2011 |
20110190463 | NANOIMPRINT LITHOGRAPHY PROCESSES FOR FORMING NANOPARTICLES - A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles. | 08-04-2011 |
20110189329 | Ultra-Compliant Nanoimprint Lithography Template - An ultra-compliant nanoimprint lithography template having a backing layer and a nanopatterned layer adhered to the backing layer. The nanopatterned layer includes nanoscale features formed by solidifying a polymerizable material in contact with a mold. The polymerizable material includes a fluoroelastomer and a photoinitiator. The backing layer has a higher elastic modulus than the nanopatterned layer. The ultra-compliant nanoimprint lithography template can be used to form multiple high fidelity imprints. | 08-04-2011 |
20110183521 | METHODS AND SYSTEMS OF MATERIAL REMOVAL AND PATTERN TRANSFER - Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting. | 07-28-2011 |
20110183070 | ROLL-TO-ROLL IMPRINT LITHOGRAPHY AND PURGING SYSTEM - Droplets of polymerizable material may be patterned on a film sheet using a roll-to-roll system. The droplets of polymerizable material may be dispensed on the film sheet such that a substantially continuous patterned layer may be formed on the film sheet. A contact system provides for smooth fluid front progression the polymerizable material during imprinting. A gas purging system may be positioned during imprinting. Gas purging systems may provide for purging in parallel as fluid front of polymerizable material moves through roll-to-roll system. | 07-28-2011 |
20110183027 | Micro-Conformal Templates for Nanoimprint Lithography - A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity. | 07-28-2011 |
20110180964 | SYSTEMS AND METHODS FOR SUBSTRATE FORMATION - Templates for patterning large area substrates are provided. Generally, templates include a body and a plurality of molds positioned on the body. Each mold has a first length and each mold may be separated by an open space having a distance therebetween. The length of the mold may be substantially similar to the distance between the open space or the length of the mold may be substantially greater than the distance between the open space. Additionally, purging techniques that incorporate features of the template are described. | 07-28-2011 |
20110180127 | SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHY - Fabricating a solar cell stack includes forming a nanopatterned polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopatterned polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopatterned first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopatterned first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopatterned first surface. Electron donor material is deposited on the nanopatterned first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer. | 07-28-2011 |
20110171340 | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template - A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region. | 07-14-2011 |
20110165412 | ADHESION LAYERS IN NANOIMPRINT LITHOGRAHY - Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template. | 07-07-2011 |
20110140306 | Composition for an Etching Mask Comprising a Silicon-Containing Material - The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile. | 06-16-2011 |
20110140304 | IMPRINT LITHOGRAPHY TEMPLATE - Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate. | 06-16-2011 |
20110140302 | Capillary Imprinting Technique - The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, capillary filling of the volume between the mold and the substrate occurs. | 06-16-2011 |
20110084417 | LARGE AREA LINEAR ARRAY NANOIMPRINTING - Systems and methods for imprinting and aligning an imprint lithography template with a field on a substrate are described. The field of the substrate may include an elongated side, and alignment sensitivity on the elongated side may be intentionally minimized. | 04-14-2011 |
20110056911 | Positive Tone Bi-Layer Method - Methods of imprint lithography are described. Generally, the methods include imprinting, via a patterned mold, a pattern into a polymerizable fluid composition on a substrate to form a patterned imprinting layer. A conformal layer is overlayed on the patterned imprinting layer. A portion of the conformal layer is used as a hard mask for subsequent processing. The imprinted pattern may be transferred to the substrate by a plurality of etches. | 03-10-2011 |
20110049096 | Functional Nanoparticles - Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles. | 03-03-2011 |
20110048518 | Nanostructured thin film inorganic solar cells - Inorganic solar cells having a nano-patterned p-n or p-i-n junction to reduce electron and hole travel distance to the separation interface to be less than the magnitude of the drift length or diffusion length, and meanwhile to maintain adequate active material to absorb photons. Formation of the inorganic solar cells may include one or more nano-lithography steps. | 03-03-2011 |
20110048160 | Method and System to Control Movement of a Body for Nano-Scale Manufacturing - Systems to control movement of a template during an imprint lithography process are described. The systems include an orientation stage having an inner frame, and outer frame, and a plurality of actuators coupled between the inner frame and the outer frame to vary translational motion and impart angular motion about a plurality of axes. | 03-03-2011 |
20110031651 | DESIRABLE WETTING AND RELEASE BETWEEN AN IMPRINT LITHOGRAPHY MOLD AND A POLYMERIZABLE COMPOSITION - Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween. | 02-10-2011 |
20110031650 | Adjacent Field Alignment - Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate. | 02-10-2011 |
20110030770 | NANOSTRUCTURED ORGANIC SOLAR CELLS - Solar cells having at least one N-type material layer and at least one P-type material layer forming a patterned p-n junction are described. A conducting layer may provide electrical communication between the p-n junction and an electrode layer. | 02-10-2011 |
20110026039 | Alignment System and Method for a Substrate in a Nano-Imprint Process - Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck. | 02-03-2011 |
20110014314 | Chucking System for Nano-Manufacturing - Chucking mechanisms may include a plurality of chucking sections respectively connecting to a pressure control device to generate individual chucking forces. The individual chucking forces of the chucking sections may be varied by the pressure control device such that a magnitude of separation force is reduced for an imprint lithography system. | 01-20-2011 |
20110001954 | CHUCKING SYSTEM WITH RECESSED SUPPORT FEATURE - In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process. | 01-06-2011 |
20100323490 | Self-Aligned Cross-Point Memory Fabrication - Fabricating a cross-point memory structure using two lithography steps with a top conductor and connector or memory element and a bottom conductor orthogonal to the top connector. A first lithography step followed by a series of depositions and etching steps patterns a first channel having a bottom conductor. A second lithography step followed by a series of depositions and etching steps patterns a second channel orthogonal to the first channel and having a memory element connecting the an upper conductor and the lower conductor at their overlaid intersections. | 12-23-2010 |
20100320645 | DUAL ZONE TEMPLATE CHUCK - A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle. | 12-23-2010 |
20100314803 | Chucking System for Nano-Manufacturing - A chucking system may include a plurality of discrete vacuum sections. The size of at least one vacuum section may be configured to be substantially similar to size of a strained region of the substrate. The strained region of the substrate is a localized deformation in the substrate due to separation force applied during a nano-imprint lithography process. | 12-16-2010 |
20100291257 | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template - A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region. | 11-18-2010 |
20100286811 | Residual Layer Thickness Measurement and Correction - In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern. | 11-11-2010 |
20100278955 | Imprint Alignment Method, System and Template - Imprint lithography templates for patterning substrates are described. The templates include a section having a mold, a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional sections may include a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern. | 11-04-2010 |
20100278954 | Method of Concurrently Patterning a Substrate Having a Plurality of Fields and a Plurality of Alignment Marks - Imprint lithography templates for patterning substrates are described. The templates include a section having a mold a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional section may include the first pattern of a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern. | 11-04-2010 |
20100266965 | Etch-Enhanced Technique for Lift-Off Patterning - An enhanced process forming a material pattern on a substrate deposits the material anisotropically on resist material patterned to correspond to an image of the material pattern. The material is etched isotropically to remove a thickness of the material on sidewalls of the resist pattern while leaving the material on a top surface of the resist pattern and portions of the surface of the substrate. The resist pattern is removed by dissolution thereby lifting-off the material on the top surface of the resist pattern while leaving the material on the substrate surface as the material pattern. Alternately, a first material layer is deposited on the resist pattern and a second material layer is deposited and planarized. The second material layer is etched exposing the first material while leaving the second material in features of the resist pattern. The first material and the resist are removed leaving the first material pattern. | 10-21-2010 |
20100259745 | METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES - The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero. | 10-14-2010 |
20100201042 | Step and Repeat Imprint Lithography Processes - Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate. | 08-12-2010 |
20100181289 | Forming a Layer on a Substrate - The present invention is directed to a method of forming an imprinting layer on a substrate including high resolution features, and transferring the features into a solidified region of the substrate. Desired thickness of the residual layer may be minimized in addition to visco-elastic behavior of the material. | 07-22-2010 |
20100173034 | Conforming Template for Patterning Liquids Disposed on Substrates - The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted to a fluid chamber having an inlet and a throughway. The template may be connected to the throughway and the inlet is connected to a fluid source. | 07-08-2010 |
20100143521 | Method for Expelling Gas Positioned Between a Substrate and a Mold - The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween. | 06-10-2010 |
20100140841 | Capillary Imprinting Technique - The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs. | 06-10-2010 |
20100140218 | Positive Tone Bi-Layer Method - Methods of patterning a substrate including creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions are described. A polymerizable material composition is dispense on the patterned layer defining a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions. | 06-10-2010 |
20100129486 | Method and System for Double-Sided Patterning of Substrates - A system of patterning first and second opposed sides of a substrate is described. The system may employ a mold assembly and obtaining a desired spatial relationship between the first and second opposed sides of the substrate and the mold assembly. In a further embodiment, the method and system may employ a first and a second mold assembly. | 05-27-2010 |
20100120251 | Large Area Patterning of Nano-Sized Shapes - Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process. | 05-13-2010 |
20100119637 | Method to Control an Atmosphere Between a Body and a Substrate - Systems to control an atmosphere about a substrate are described. The systems include a wall coupled to the substrate to create a resistance of the flow between different regions of the substrate. | 05-13-2010 |
20100112310 | Substrate Patterning - Systems and methods for providing identification patterns on substrates are described. | 05-06-2010 |
20100112236 | Facilitating Adhesion Between Substrate and Patterned Layer - Systems and methods for adhering a substrate to a patterned layer are described. Included are in situ cleaning and conditioning of the substrate, and the application of an adhesion layer between the substrate and the patterned layer, as well as forming an intermediate layer between adhesion materials and the substrate. | 05-06-2010 |
20100112220 | DISPENSE SYSTEM SET-UP AND CHARACTERIZATION - The present application describes methods and systems for setting up and characterizing fluid dispensing systems. The methods and systems characterize the fluid dispensing systems and associate the characterizations with the corresponding fluid dispensing systems. | 05-06-2010 |
20100112116 | Double-Sided Nano-Imprint Lithography System - A nano-imprint lithography system is described for patterning first and second substrates, the system includes a translation stage constructed to alternatively place substrate chucks in position with respect to a nano-imprint mold assembly such that the nano-imprint mold assembly may imprint a pattern on one of the substrates, while concurrently obtaining a desired spatial relationship for the remaining substrate. | 05-06-2010 |
20100110434 | Alignment for Edge Field Nano-Imprinting - Systems and methods for alignment of template and substrate at the edge of substrate are described. | 05-06-2010 |
20100110409 | Separation in an Imprint Lithography Process - Systems, methods, and processes for separating a template from a substrate retained on an air cavity chuck during an imprint lithography process. Generally, vacuum level provided by air cavity chuck may be controlled during conforming of polymerizable material between the template and the substrate and during separation of the template and the substrate. | 05-06-2010 |
20100109205 | PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES - An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance. | 05-06-2010 |
20100109202 | Substrate Alignment - Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate. | 05-06-2010 |
20100109201 | Nano-Imprint Lithography Template with Ordered Pore Structure - A nano-imprint lithography template includes a non-porous base layer, a cap layer, and a porous layer between the base layer and the cap layer. The porous layer defines a multiplicity of pores and has an ordered pore structure. The cap layer is permeable to helium, and the pores in the porous layer are configured to accept gas passing through the cap layer during an imprint lithography process. The porous layer provides high porosity with a Young's modulus and hardness that are advantageous for imprint lithography processes. | 05-06-2010 |
20100109195 | RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY - Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography. | 05-06-2010 |
20100109194 | Master Template Replication - Systems and methods for providing multiple replicas from a master template are described. Replicas may be formed having a mesa. In one embodiment, a dummy fill region may be included on master template and/or replicas. | 05-06-2010 |
20100104852 | Fabrication of High-Throughput Nano-Imprint Lithography Templates - An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (p | 04-29-2010 |
20100104747 | Drop Deposition Control - A dispense controller and a tool controller may aid in providing a drop pattern of fluid on a substrate. The dispense controller may provide dispense coordinates to a fluid dispense system based on the drop pattern. The tool controller may control movement of a stage and also provide synchronization pulses to the fluid dispense system. The fluid dispense system may provide the drop pattern of fluid on the substrate using the dispense coordinates and the synchronization pulses. | 04-29-2010 |
20100102487 | Optical System for Use in Stage Control - Imprint lithography benefits from precise alignment between a template and a substrate during imprinting. A moiré signal resulting from indicia on the template and the substrate are acquired by a system comprising a line-scan camera and a digital micromirror device (DMD) which provides a high bandwidth, low-latency signal. Once acquired, the moiré signal may be used directly to align the template and the substrate without need for discrete position/angle encoders. | 04-29-2010 |
20100102471 | FLUID TRANSPORT AND DISPENSING - Imprint lithography systems and methods for transporting and dispensing polymerizable material on a substrate are described. In one implementation, the transport system utilizes a dispense head, dispense guard, and a shielding block when dispensing the polymerizable material. In another implementation, the transport system comprises one or more filters positioned in an inline manifold for particle reduction or ion reduction. | 04-29-2010 |
20100102470 | Misalignment Management - A method of determining overlay error between a template and a substrate using placement of template features and placement of substrate features in one or more images. Estimated distortion of the template and/or substrate may be determined using the overlay error. One or more forces acting on the template and/or substrate may be varied based on the estimated distortion for subsequent nano-lithography imprinting. Additionally, bias may be introduced in subsequent imprinting steps based on overlay performance. | 04-29-2010 |
20100102469 | Strain and Kinetics Control During Separation Phase of Imprint Process - Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process. | 04-29-2010 |
20100102029 | Imprint Lithography Template - Systems, methods, and processes for forming imprint lithography templates from a multi-layer substrate are described. The multi-layer substrate may include a block copolymer layer positioned on a substrate layer. The block copolymer layer may include two or more domains. At least one domain may have a different composition sensitivity than another domain such that the domains have different reactions to a specific process. Reaction of the domains to the specific process may provide a pattern in the block copolymer layer. The pattern may be transferred into the substrate layer to form the imprint lithography template. | 04-29-2010 |
20100101493 | Dispense System - Systems and methods for locating and eliminating and/or minimizing non-functional nozzles of dispense systems are described. | 04-29-2010 |
20100099047 | MANUFACTURE OF DROP DISPENSE APPARATUS - A drop dispense apparatus may be manufactured utilizing an imprint lithography process. Exemplary methods for manufacturing a drop dispense apparatus are described. | 04-22-2010 |
20100098940 | Nano-Imprint Lithography Stack with Enhanced Adhesion Between Silicon-Containing and Non-Silicon Containing Layers - A nano-imprint lithography stack includes a nano-imprint lithography substrate, a non-silicon-containing layer solidified from a first polymerizable, non-silicon-containing composition, and a silicon-containing layer solidified from a polymerizable silicon-containing composition adhered to a surface of the non-silicon-containing layer. The non-silicon-containing layer is adhered directly or through one or more intervening layers to the nano-imprint lithography substrate. The silicon-containing layer includes a silsesquioxane with a general formula (R′ | 04-22-2010 |
20100098859 | Drop Pattern Generation with Edge Weighting - Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be generated using edge weighting through one or more modified Lloyd's method iterations to result in surface features being substantially filled with the fluid during imprint. | 04-22-2010 |
20100098858 | Fluid Dispense System Coating - A fluid dispense system having a coating layer applied to the fluid flow path and the external surfaces is described. The coating layer is chemically resistant to the working fluids of the fluid dispense system and prevents the leaching of a plurality of ions from the fluid dispense system. | 04-22-2010 |
20100098848 | Fluid Dispense Device Calibration - Systems and methods for calibrating a dispense head to provide substantially uniform droplets on a substrate are described. | 04-22-2010 |
20100098847 | Drop Deposition Materials for Imprint Lithography - A fluid for dispensation on a substrate. In one implementation, the fluid comprises a set of fluid parameters to facilitate dispensation of the fluid from the system. In another implementation, the fluid comprises a set of fluid parameters specific to a polymerizable material. | 04-22-2010 |
20100097590 | ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPHY WHICH ARE TOLERANT OF VARIATIONS IN DROP VOLUME AND DROP PLACEMENT - Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be generated using a stochastic process such as a Monte Carlo or structured experiment over the expected range of process variability for drop locations and drop volumes. Thus, variability in drop placement, volume, or both may be compensated for, resulting in surface features being substantially filled with the fluid during imprint. | 04-22-2010 |
20100096776 | Reduction of Stress During Template Separation - Separation of an imprint lithography template and a patterned layer in an imprint lithography process may result in stress to features of the template and/or features of the patterned layer. Such stress may be reduced by minimizing open areas on the template, including dummy features within the open areas, and/or selective positioning of features on the template. | 04-22-2010 |
20100096766 | Imprint Lithography System and Method - A loading unit, surface scanning module, and an imprint module may be integrated into a single tool. Template may be loaded on loading unit and positioned within imprint module. Substrate may then be loaded on loading unit and scanned defects using surface scanning module. If substrate passes inspection by surface scanning module, substrate may be positioned imprint module where formable material may be dispensed thereon and imprinted. The imprinted substrate may then be unloaded from imprinting module. | 04-22-2010 |
20100096764 | Gas Environment for Imprint Lithography - Non-uniformity may be minimized by reducing or eliminating non-uniform evaporation of a viscous liquid disposed on the surface of a substrate. At least one gas source component and one vacuum component may provide a mass flow rate of gas across the surface of the substrate to reduce or eliminate non-uniform evaporation. | 04-22-2010 |
20100096470 | DROP VOLUME REDUCTION - Droplet volume on a substrate may be controlled using a capillary liquid bridge. Generally, droplets may be dispensed in a drop pattern on the substrate. A DV-substrate may be positioned in contact with the droplets and at a distance from the substrate forming a capillary liquid bridge. Separation of the DV-substrate disrupts the capillary liquid bridge with at least a portion of the droplet volume being transferred to the DV-substrate. | 04-22-2010 |
20100095862 | Double Sidewall Angle Nano-Imprint Template - The present application describes a template with feature profiles that have multiple sidewall angles. The multiple sidewall angles facilitate control over critical dimensions and reduce issues related to template release. | 04-22-2010 |
20100092599 | Complementary Alignment Marks for Imprint Lithography - Systems and methods for minimizing overlay error during alignment of a template with a substrate are described. Templates generally include two distinct types of alignment marks: buried alignment marks and complementary alignment marks. Buried marks may be fabricated separately from the patterning surface, and the complementary marks may be fabricated in the same step as the patterning surface. | 04-15-2010 |
20100090341 | NANO-PATTERNED ACTIVE LAYERS FORMED BY NANO-IMPRINT LITHOGRAPHY - Patterned active layers formed by nano-imprint lithography for use in devices such as photovoltaic cells and hybrid solar cells. One such photovoltaic cell includes a first electrode and a first electrically conductive layer electrically coupled to the first electrode. The first conductive layer has a multiplicity of protrusions and recesses formed by a nano-imprint lithography process. A second electrically conductive layer substantially fills the recesses and covers the protrusions of the first conductive layer, and a second electrode is electrically coupled to the second conductive layer. A circuit electrically connects the first electrode and the second electrode. | 04-15-2010 |
20100090130 | Energy Sources for Curing in an Imprint Lithography System - Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an imaging unit monitoring elements of the imprint lithography system. Each energy source is configured to provide energy along a path to solidify polymerizable material on a substrate. | 04-15-2010 |
20100085555 | In-Situ Cleaning of an Imprint Lithography Tool - Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate. | 04-08-2010 |
20100084376 | NANO-IMPRINT LITHOGRAPHY TEMPLATES - Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes. | 04-08-2010 |
20100078846 | Particle Mitigation for Imprint Lithography - Particles may be present on substrates and/or templates during nano-lithographic imprinting. Particles may be mitigated and/or removed using localized removal techniques and/or imprinting techniques as described. | 04-01-2010 |
20100072671 | NANO-IMPRINT LITHOGRAPHY TEMPLATE FABRICATION AND TREATMENT - A nano-imprint lithography template includes a rigid support layer, a cap layer, and a flexible cushion layer positioned between the support layer and the cap layer. Treating an imprint lithography template includes heating the template to desorb gases from the template. Heating the template includes radiating the template at a selected wavelength with, for example, infrared radiation. The selected wavelength may correspond to a wavelength at which the template material is strongly absorbing. | 03-25-2010 |
20100072652 | IMPRINT LITHOGRAPHY SYSTEM AND METHOD - System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process. | 03-25-2010 |
20100059914 | Chucking System Comprising an Array of Fluid Chambers - The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array of fluid chambers. | 03-11-2010 |
20100053578 | Apparatus for imprint lithography using an electric field - A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves the use of a template that is formed of non-conductive and electrically conductive portions. The template is brought into close proximity to the activating light curable liquid on the substrate. An external electric field is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the activating light curable liquid to be attracted to the raised portions of the template. Activating light is applied to the curable liquid while an electric field is applied to the template to create a patterned layer on the substrate. | 03-04-2010 |
20100040718 | Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film - An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith. | 02-18-2010 |
20100038827 | Interferometric Analysis Method for the Manufacture of Nano-Scale Devices - The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape. | 02-18-2010 |
20100015270 | INNER CAVITY SYSTEM FOR NANO-IMPRINT LITHOGRAPHY - A nano-imprint lithography template system having a support layer with at least one port, and a patterned surface layer coupled to the support layer. Coupling of the patterned surface layer to the support layer forms a cavity. Pressure within the cavity is controlled through the port of the support layer. | 01-21-2010 |
20090283934 | Imprinting of Partial Fields at the Edge of the Wafer - Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate. | 11-19-2009 |
20090272875 | Composition to Reduce Adhesion Between a Conformable Region and a Mold - An imprint lithography mold assembly includes a mold having a surface, a substrate having a surface, and a polymerizable composition disposed between the surface of the mold and the surface of the substrate. The polymerizable composition includes a bulk material and a non-ionic surfactant having a first end and a second end. The first end of the non-ionic surfactant has an affinity for the bulk material, and the second end of the non-ionic surfactant is fluorinated. | 11-05-2009 |
20090256289 | Preserving Filled Features When Vacuum Wiping - A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features. | 10-15-2009 |
20090250840 | Template Having Alignment Marks Formed of Contrast Material - Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described. | 10-08-2009 |
20090243153 | Large Area Roll-To-Roll Imprint Lithography - Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature. | 10-01-2009 |
20090214761 | REAL TIME IMPRINT PROCESS DIAGNOSTICS FOR DEFECTS - Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template. | 08-27-2009 |
20090214686 | Formation of Conductive Templates Employing Indium Tin Oxide - The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material. | 08-27-2009 |
20090212012 | CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION - Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer. | 08-27-2009 |
20090200710 | EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY - Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified. | 08-13-2009 |
20090200709 | Full-Wafer or Large Area Imprinting with Multiple Separated Sub-Fields for High Throughput Lithography - A layer on a substrate is formed using an imprint lithography system. The layer is formed by providing a plurality of flowable regions on the substrate, spreading material in the flowable regions, and contacting the regions with a plurality of imprint lithography molds that are disposed on a template. | 08-13-2009 |
20090200266 | Template Pillar Formation - Materials for forming an imprint lithography template may be etched at different rates based on physical properties of the layers. Additionally, reflectance of the materials may be monitored to provide substantially uniform erosion of the materials. | 08-13-2009 |
20090197057 | Controlling Template Surface Composition in Nano-Imprint Lithography - A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer. | 08-06-2009 |
20090169662 | Enhanced Multi Channel Alignment - An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other. | 07-02-2009 |
20090166933 | Template Pattern Density Doubling - A sub-master template is patterned to provide at least double the density of features of a master template. The sub-master template and master template may employ the use of alignment marks during the patterning process. | 07-02-2009 |
20090155583 | Ultra-thin Polymeric Adhesion Layer - An imprint lithography imprinting stack includes a substrate and a polymeric adhesion layer adhered to the substrate. The polymeric adhesion layer includes polymeric components with an extended backbone length of at least about 2 nm. The backbones of the polymeric components may be substantially aligned in a planar configuration on the surface of the substrate, such that a thickness of the polymeric adhesion layer is less than about 2 nm. | 06-18-2009 |
20090148619 | Controlling Thickness of Residual Layer - Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm. | 06-11-2009 |
20090148032 | Alignment Using Moire Patterns - Methods of determining relative spatial parameters between two substrates in a process of alignment are described. Generally, multiple alignment data may be collected from phase information using a pair of alignment marks. | 06-11-2009 |
20090147237 | Spatial Phase Feature Location - Methods for locating an alignment mark on a substrate are described. Generally, the substrate includes one or more locator marks adjacent to a substrate alignment mark. Locator marks provide the relative location of the substrate alignment mark such that the substrate alignment mark may be used in aligning a substrate with a template within a lithographic system with a reduced magnitude of relative displacement. | 06-11-2009 |
20090140458 | POROUS TEMPLATE AND IMPRINTING STACK FOR NANO-IMPRINT LITHOGRAPHY - An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template. | 06-04-2009 |
20090136654 | Contact Angle Attenuations on Multiple Surfaces - A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region. | 05-28-2009 |
20090133751 | Nanostructured Organic Solar Cells - Solar cells having at least one electron acceptor layer and at least one electron donor layer forming a patterned p-n junction are described. Electron acceptor layer may be formed by patterning formable N-type material between a template and an electrode layer, and solidifying the formable N-type material. | 05-28-2009 |
20090130598 | Method of Creating a Template Employing a Lift-Off Process - A method of forming a lithographic template, the method including, inter alia, creating a multi-layered structure, by forming, on a body, a conducting layer, and forming on the conducting layer, a patterned layer having protrusions and recessions, the recessions exposing portions of the conducting layer; depositing a hard mask material anisotropically on the multi-layered structure covering a top surface of the patterned layer and the portions of the conducting layer; removing the patterned layer by a lift-off process, with the hard mask material remaining on the portions of the conducting layer; positioning a resist pattern on the multi-layered structure to define a region of the multi-layered structure; and selectively removing portions of the multi-layered structure in superimposition with the region using the hard mask material as an etching mask. | 05-21-2009 |
20090115110 | Drop Pattern Generation for Imprint Lithography - Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process. | 05-07-2009 |
20090053535 | Reduced Residual Formation in Etched Multi-Layer Stacks - A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition. | 02-26-2009 |
20090037004 | Method and System to Control Movement of a Body for Nano-Scale Manufacturing - The present invention is directed towards a method and system of controlling movement of a body coupled to an actuation system that features translating movement of the body in a plane extending by imparting angular motion in the actuation system with respect to two spaced-apart axes. Specifically, rotational motion is generated in two spaced-apart planes, one of which extends parallel to the plane in which the body translates. This facilitates proper orientation of the body with respect to a surface spaced-apart therefrom. | 02-05-2009 |
20090035934 | Self-Aligned Cross-Point Memory Fabrication - Fabricating a cross-point memory structure using two lithography steps with a top conductor and connector or memory element and a bottom conductor orthogonal to the top connector. A first lithography step followed by a series of depositions and etching steps patterns a first channel having a bottom conductor. A second lithography step followed by a series of depositions and etching steps patterns a second channel orthogonal to the first channel and having a memory element connecting the an upper conductor and the lower conductor at their overlaid intersections. | 02-05-2009 |
20090026657 | Alignment System and Method for a Substrate in a Nano-Imprint Process - A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates. | 01-29-2009 |
20090014917 | Drop Pattern Generation for Imprint Lithography - Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate. The fluid drop pattern is generated through one or more modified Lloyd's method iterations. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process. | 01-15-2009 |
20090011139 | Method for Concurrently Employing Differing Materials to Form a Layer on a Substrate - The present invention is directed to a method of forming a layer on a substrate, comprising forming a plurality of flowable regions on the substrate, with a first subset of the plurality of flowable regions comprising a first composition and a second subset of the plurality of flowable regions including a second composition differing from the first composition. A surface of the first and second subsets is provided with a desired shape and/or each of the areas of the substrate covered by the flowable regions may be provided with a desired shape. Thereafter, the desired shaped is recorded by solidifying the first and second subsets of the plurality of flowable regions. | 01-08-2009 |
20090004319 | Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film - An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c | 01-01-2009 |
20080308971 | Solvent-Assisted Layer Formation for Imprint Lithography - A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids. | 12-18-2008 |
20080303187 | Imprint Fluid Control - An imprint lithography template with an active area arranged to receive imprinting material during an imprint lithography process and a non-active area adjacent the active area is described. At least a portion of the non-active area is treated to inhibit flow of the imprinting material from the active area to the non-active area during the imprint lithography process. | 12-11-2008 |