| MKS Instruments, Inc. Patent applications |
| Patent application number | Title | Published |
|---|
| 20150323512 | Computer-Implemented Systems and Methods for Generating Generalized Fractional Designs - A method and system for creating a design plan to test a product characteristic are described. One or more factors, level corresponding to the factors, and partitions for testing the product characteristic are determined. For each partition, an active matrix is generated. The product characteristic can be tested at each partition using the levels for the factors specified by the corresponding active matrix. | 11-12-2015 |
| 20150318148 | MICROWAVE PLASMA APPLICATOR WITH IMPROVED POWER UNIFORMITY - An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube. | 11-05-2015 |
| 20150312963 | STREAMLINED HEATER ASSEMBLY WITH FRONT AND INTERMEDIATE DAISY CHAIN POWER INJECTION, SHIELDING, AND WATER RESISTANT FEATURES - Heater modules are configured for streamlined daisy chain connectivity that includes front end and intermediate daisy chain power injection, water resistant heater assemblies, and shielding. A power injection device is configured with connectivity for insertion of power into heater modules that are in front and intermediate daisy chain positions while enabling data communications between heater modules positioned on opposite sides of the power injection locations. | 10-29-2015 |
| 20150279626 | MICROWAVE PLASMA APPLICATOR WITH IMPROVED POWER UNIFORMITY - An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube. | 10-01-2015 |
| 20150276536 | Micro-Pirani Vacuum Gauges - Micro-Pirani gauge vacuum gauges are described that use low-thermal conductivity support elements. A micro-Pirani gauge or vacuum sensor can include a heating element operative to heat a gas and to produce a signal corresponding to the pressure of the gas; a platform configured to receive the heating element, with the platform having a first coefficient of thermal conductivity; and a support element connected to a substrate and configured to support the platform with the heating element within an aperture disposed in the substrate, with the support element having a second coefficient of thermal conductivity, where the second coefficient of thermal conductivity is less than the first coefficient of thermal conductivity. Multimode pressure sensing including a micro-Pirani gauge are also described. | 10-01-2015 |
| 20150247586 | Pilot Valve Structures and Mass Flow Controllers - Pilot valve structures are described as including a main valve having a main flow body and having an inlet and outlet, and a diaphragm, with a perimeter, a moveable portion, and first and second sides. A main flow orifice is located in the flow body between the inlet and outlet. A main valve plug is attached to and/or disposed in the moveable portion of the diaphragm and opens and closes the flow orifice when the moveable portion of the diaphragm is in first and second positions. The pilot valve also includes a pilot valve inlet that is connected to the flow path of the main flow body. A pilot valve outlet/orifice is disposed within and co-located with the main valve plug. The pilot valve includes a pilot valve plug, which is moveable to open and close the pilot valve orifice. Related mass flow controllers with such pilot valve structures are further described. | 09-03-2015 |
| 20150232333 | Method and Apparatus for a Directly Electrically Heated Flow-Through Chemical Reactor - A system and method for facilitating a chemical reaction is provided. The system can have an electrically conductive member. The electrically conductive member is capable of holding a chemical mixture. The electrically conductive member is directly coupled to a power source and is heated when the power source is on. When a chemical mixture is within the electrically conductive member and the power source is on, the chemical mixture is heated such that a chemical reaction can occur. | 08-20-2015 |
| 20150160126 | Use of One or More Retro-reflectors in a Gas Analyzer System - Methods and systems are provided for monitoring at least one gas in a sample gas. An exemplary system includes a source used for generating a beam of radiation, at least one retro-reflector configured to receive the beam of radiation from the source in an incident direction and reflect the beam of radiation toward the source in alignment with the incident direction, and a motor configured to move the at least one retro-reflector with respect to the source in a direction collinear with the incident direction. The system also includes a sample cell storing a sample gas comprising at least one gas. The sample cell is configured to allow at least a portion of an extracted beam of radiation from a cavity, defined by the source and the at least one retro-reflector, to propagate therethrough. | 06-11-2015 |
| 20150129047 | POWDER AND DEPOSITION CONTROL IN THROTTLE VALVES - Powder and deposition control in a throttle valve includes nozzle inserts in the valve body that form annular plenums and annular nozzles for injecting annular flows of cleaning gas adjacent to the inside wall surface of the valve body for cleaning powders and depositions off surfaces in the valve body and off the closure member of the throttle valve. The annular flows of cleaning gas can be in intermittent, periodic, or in pulsed bursts or at a steady-state flow rates to dislodge powder particles stuck to the inside surface of the throttle valve, to etch or reactively clean solid deposits, or to prevent or minimize build-up of powder particles or solid deposits in the throttle valve. | 05-14-2015 |
| 20140326909 | PRESSURE-BALANCED CONTROL VALVES - Embodiments of the present disclosure are directed to pressure balanced solenoid control valve for high flow and/or high pressure control applications. An all-sealed integrally formed element functions as both the bellows and spring and is used as a replacement for the combination of both the individual bellows and spring found in existing pressure balanced control valves. The single bellows spring provides a spring force on the movable valve plug and separates opposite sides of the valve plug, wherein a gas passageway is provided between opposite sides of the valve plug so that gas provided at the inlet will flow to opposite sides of the valve plug so as to cancel any pressure forces provided on opposite sides of the valve plug by the pressure of the inlet gas. | 11-06-2014 |
| 20140320013 | Multiple Radio Frequency Power Supply Control of Frequency and Phase - A system has a first RF generator and a second RF generator. The first RF generator controls the frequency of the second RF generator. The first RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit scales the frequency of the first RF generator to control the frequency of the second RF generator. | 10-30-2014 |
| 20140318656 | MEMS PRESSURE SENSORS WITH INTEGRATED BAFFLES - A pressure sensor system may sense the pressure of a gas or liquid. The system may include a housing that has an entry port for the gas or liquid; a pressure sensor within the housing; and a baffle positioned between the entry port and the pressure sensor. The baffle may have one or more inlets oriented to receive gas or liquid that enters the entry port; one or more outlets oriented to deliver the received gas or liquid to the pressure sensor; and one or more sealed flow channels that prevent the gas or liquid from escaping from the baffle, other than through the one or more outlets. At least one of the outlets may be located within no more than one millimeter of a location on the pressure sensor. The pressure sensor and baffle may be made at the same time during a process of depositing, pattering, etching, wafer bonding, and/or wafer thinning a series of layers using microelectromechanical systems (MEMS) technology. | 10-30-2014 |
| 20140306742 | Method and System for Controlling Radio Frequency Power - A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse. | 10-16-2014 |
| 20140298884 | SELF-CALIBRATING PRESSURE SENSOR SYSTEM WITH PRESSURE SENSOR AND REFERENCE SENSOR THAT SHARE COMMON SEALED CHAMBER - A self-calibrating pressure sensor system may measure the pressure of a gas or liquid. The system may include a pressure sensor, a reference sensor, and a drift compensation system. The pressure sensor may include a pressure-sensing flexible diaphragm with one side exposed to the gas or liquid and another side forming a wall of a sealed chamber. The reference sensor may include a reference flexible diaphragm that has two sides that are both within or exposed to the same sealed chamber. The drift compensation system may produce information that is indicative of the pressure of the gas or liquid based on the signal from the pressure sensor, and compensate for drift in this signal based on changes in the signal from the reference sensor. The pressure-sensing flexible diaphragm and the reference flexible diaphragm may be made at substantially the same time by depositing or growing a single layer of material in a single continuous step. | 10-09-2014 |
| 20140266492 | Virtual RF Sensor - A radio frequency (RF) generation system includes an impedance determination module that receives an RF voltage and an RF current. The impedance determination module further determines an RF generator impedance based on the RF voltage and the RF current. The RF generation system also includes a control module that determines a plurality of electrical values based on the RF generator impedance. The matching module further matches an impedance of a load based on the RF generator impedance and the plurality of electrical components. The matching module also determines a 2 port transfer function based on the plurality of electrical values. The RF generation system also includes a virtual sensor module that estimates a load voltage, a load current, and a load impedance based on the RF voltage, the RF generator, the RF generator impedance, and the 2 port transfer function. | 09-18-2014 |
| 20140262746 | Toroidal plasma Abatement Apparatus and Method - An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated. | 09-18-2014 |
| 20140238498 | System for and Method of Multiple Channel Fast Pulse Gas Delivery - A system and method are configured to deliver pulses of desired mass of gases. The system delivers a plurality of sequences of pulses of a desired mass of gas through at least two flow channels. The system comprises: a multi-channel fast pulse gas delivery system including (a) a plurality of flow channels, each channel comprising a flow sensor and a control valve, and (b) a dedicated controller configured and arranged to receive a recipe of one or more sequences of steps for opening and closing at least some of the control valves so as to deliver as a sequence of pulses of at least one gas through each of the corresponding channels as a function of the recipe. The method comprises: receiving at a dedicated controller from a host computer the prescribed recipe of one or more sequences of steps of pulses of one or more gases to be delivered through the plurality of flow channels; and using the sequence of steps to control each flow channel including a flow sensor and a control valve by opening and closing the control valve of each flow channel in accordance with the sequence of steps of the recipe. | 08-28-2014 |
| 20140238103 | PRESSURE SENSOR WITH INTEGRATED HEALTH MONITORING AND COMPENSATION - A pressure sensor may measure gas or liquid pressure. A chamber may have an inlet that receives the gas or liquid. A flexible diaphragm may be within the chamber that has a surface exposed to the gas or liquid after it flows through the inlet. A pressure sensor system may sense changes in the flexible diaphragm caused by changes in the pressure of the gas or liquid. A pressure-insensitive sensor system may sense changes in the flexible diaphragm that are not caused by changes in the pressure of the gas or liquid. The pressure-insensitive sensor system may be insensitive to changes in the flexible diaphragm caused by changes in the pressure of the gas or liquid. | 08-28-2014 |
| 20140220913 | Distortion Correction Based Feedforward Control Systems and Methods For Radio Frequency Power Sources - A distortion module includes a first module, at least one module and a correction module. The first module is configured to (i) receive radio frequency signals from radio frequency sensors of a power amplifier, and (ii) generate a distortion signal indicating distortion values for the radio frequency signals. The radio frequency signals are indicative of radio frequency power out of the power amplifier and received by a transmission line. At least one module is configured to estimate a phase of the distortion signal. The phase of the distortion signal is indicative of a phase of the transmission line. The correction module is configured to generate a distortion correction signal based on the phase to correct at least one of the distortion values of the radio frequency signals. | 08-07-2014 |
| 20140218076 | Synchronization of RF Pulsing With RF Metrology, Processing, and Control - A radio frequency (RF) system is disclosed. The RF system includes an RF sensor, an analog to digital converter (ADC) module, a processing module, and a synchronization module. The RF sensor measures a parameter of an RF output and generates an RF signal based on the parameter. The ADC module converts samples of the RF signal into digital values. The processing module generates processed values based on the digital values. The synchronization module outputs one of the processed values in response to a transition in the RF output. | 08-07-2014 |
| 20140190579 | System for and Method of Monitoring Flow Through Mass Flow Controllers in Real Time - A mass flow controller comprises: a first flow meter constructed and arranged to measured flow rate of mass through the mass flow controller; a second flow meter constructed and arranged to measure flow rate of mass through the mass flow controller; a control valve constructed and arranged so as to control the flow rate of mass through the mass flow controller in response to a control signal generated as a function of the flow rate as measured by one of the flow meters; and a system controller constructed and arranged to generate the control signal, and to provide an indication when a difference between the flow rate of mass as measured by the first flow meter and the flow rate of mass as measured by the second flow meter exceeds a threshold. | 07-10-2014 |
| 20140190571 | System for and Method of Fast Pulse Gas Delivery - A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the mass flow controller includes an input configured to receive an input signal; an output configured to provide an output signal; a communication port configured to receive program instructions; memory configured and arranged to receive programming data determining the programmed configuration of the mass flow controller as either a digital or analog configuration; and a processor/controller for operating the mass flow controller in accordance with the programmed configuration. | 07-10-2014 |
| 20140158211 | System for and Method of Providing Pressure Insensitive Self Verifying Mass Flow Controller - A mass flow controller comprises: a pressure-based flow meter, a thermal-based flow meter, a control valve, and a system controller. The pressure-based flow meter and thermal-based flow meter each measure flow rate of mass through the mass flow controller. The control valve controls the flow rate in response to a control signal generated as a function of the flow rate as measured by thermal-based flow meter when the measured flow rate is relatively low, and as a function of the flow rate as measured by the pressure-based flow meter when the flow rate is relatively high. A comparison of the flow measurements of the two flow meters can be used to (a) sense pressure disturbances at low flow rates, and (b) sense when the thermal-based flow meter is out of calibration so that a zero offset signal can be applied to the thermal-based flow meter. | 06-12-2014 |
| 20140136146 | MULTIVARIATE PREDICTION OF A BATCH MANUFACTURING PROCESS - A method and system for predicting prospective behavior of a manufacturing process are described. Measured values of multiple variables, including at least one dependent variable, are received. A partial least squares (PLS) regression approach is used to estimate an unknown future value of the at least one dependent variable at a future point in time in a current batch run. | 05-15-2014 |
| 20140130876 | METHOD OF TWO-STAGE FLOW CONTROL - A valve has a major valve closure member with a valve stem for opening and closing a major port in a valve chamber. An alternate flow path extends through the major valve closing member. Flow is controlled through the alternate flow path by directing a minor valve actuating fluid through the valve stem to apply pressure on a minor valve piston in the major valve closure member to move a minor valve closure member in the major valve closure member between a closed mode in which the minor valve closure member closes the alternate flow path and an opened mode in which the minor valve closure member opens the alternate flow path. The minor valve actuating fluid is sealed from the alternate flow path by a flexible diaphragm positioned between the minor valve actuating fluid and the minor valve piston, so the pressure of the minor valve actuating fluid is applied to the minor valve piston via the flexible diaphragm. | 05-15-2014 |
| 20140118031 | RF Pulse Edge Shaping - A radio frequency (RF) generation module includes a power control module that receives first and second desired amplitudes of an output of the RF generation module in first and second respective states, and that outputs, based on the first and second desired amplitudes, input power setpoints corresponding to a transition from the first state to the second state. A frequency control module receives the input power setpoints and outputs frequency setpoints corresponding to the input power setpoints. A pulse shaping module receives the input power setpoints, the frequency setpoints, and an indication of when to transition from the first state to the second state, and transitions the output of the RF generation module from the first state to the second state based on the input power setpoints, the frequency setpoints, and the indication. | 05-01-2014 |
| 20140109973 | CORROSION AND DEPOSITION PROTECTED VALVE APPARATUS AND METHOD - An expandable and contractible shield around a bellows in a valve protects the bellows from corrosive gases and solid particles in the valve chamber. In a manifold valve assembly with multiple outlet ports and multiple valves in a common valve chamber, a respective expandable and contractible shield around each respective bellows of each respective valve in the assembly separates each bellows from corrosive gases and solid particles in the common valve chamber regardless of whether one or all of the valves in the assembly is opened or closed. | 04-24-2014 |
| 20140097908 | System and Methods of Bimodal Automatic Power and Frequency Tuning of RF Generators - A radio frequency generator includes a power control module, a frequency control module and a pulse generating module. The power control module is configured to generate a power signal indicating power levels for target states of a power amplifier. The frequency control module is configured to generate a frequency signal indicating frequencies for the target states of the power amplifier. The pulse generating module is configured to (i) supply an output signal to the power amplifier, (ii) recall at least one of a latest power level or a latest frequency for one of the target states of the power amplifier, and (iii) adjust a current power level and a current frequency of the output signal from a first state to a second state based on the power signal, the frequency signal, and at least one of the latest power level and the latest frequency of the power amplifier. | 04-10-2014 |
| 20140083514 | Method and Apparatus for Self Verification of Pressured Based Mass Flow Controllers - A mass flow control system can be self verified for its accuracy when controlling a flow to a process. The system comprises: a control valve for controlling the flow of fluid through the system as a function of a control signal; a controller for generating the control signal as a function of measured flow of fluid through the system and a targeted flow set point; a pressure sensor for measuring the controlling fluid pressure for use in measuring and verifying the flow rate; and a source of fluid for providing a known volume of fluid for use in verifying the system accuracy anytime between steps of the flow control process. | 03-27-2014 |
| 20140062305 | Secondary Plasma Detection Systems and Methods - A system includes a control module, a detection module, and a reaction module. The control module is configured to receive a sensor signal indicating a power characteristic of an output power provided from a power generator to a load. The load is separate from the control module and the power generator. The detection module is configured to (i) detect a shift parameter of the power characteristic based on the sensor signal, (ii) compare the shift parameter to a first threshold, and (iii) indicate whether the shift parameter has exceeded the first threshold and not a second threshold. The reaction module is configured to indicate that a low-level abnormality exists in the load in response to the shift parameter exceeding the first threshold and not the second threshold. | 03-06-2014 |
| 20140062285 | Method and Apparatus for a Large Area Inductive Plasma Source - A plasma source for providing dissociated gas to semiconductor process chamber is provided. The plasma chamber can have at least one gas inlet and at least one chamber wall for containing the gas, a plurality of magnetic cores disposed relative to the plasma chamber such that the plasma chamber passes through each of the plurality of magnetic cores. A primary winding can be coupled to the plurality of magnetic cores. The plasma chamber can generate a toroidal plasma along a plane extending through the plasma chamber and which is at least substantially parallel to a top surface of a sample holder disposed within the semiconductor process chamber. | 03-06-2014 |
| 20140055034 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 02-27-2014 |
| 20140049250 | On The Enhancements of Planar Based RF Sensor Technology - A radio frequency sensor system includes a printed circuit board (PCB). The PCB includes a first exterior layer, a second exterior layer, a first interior layer, a second interior layer, and an inner perimeter that defines an aperture through the PCB. The PCB also includes a first loop. The first loop includes a first plurality of sensor pads coupled to a first plurality of vias by a first plurality of traces. The first plurality of sensor pads is arranged on the inner perimeter. The PCB also includes a second loop. The second loop includes a second plurality of sensor pads coupled to a second plurality of vias by a second plurality of traces. The second plurality of sensor pads is arranged on the inner perimeter. A core ring is embedded within the first interior layer proximal to the first plurality of sensor pads, the first plurality of vias, and the first plurality of traces. A center conductor, for carrying RF current, extends through the aperture. The first and second loops generate an electrical signal based on the first and second plurality of sensor pads, the first and second plurality of vias, the first and second plurality of traces, and the core ring. | 02-20-2014 |
| 20140028398 | Wideband AFT Power Amplifier Systems With Frequency-Based Output Transformer Impedance Balancing - A radio frequency system includes a first power splitter, a first push-pull power amplifier and a second push-pull power amplifier. The first power splitter is configured to receive a first radio frequency signal and generate a first output signal and a second output signal. The first push-pull power amplifier is configured to amplify the first output signal. The first push-pull power amplifier comprises a first set of transistors including at least two radio frequency power transistors and a first output transformer. The second push-pull power amplifier is configured to amplify the second output signal. The second push-pull power amplifier includes a second set of transistors including at least two radio frequency power transistors and a second output transformer. An output of the first transformer is galvanically and directly connected to an output of the second output transformer. | 01-30-2014 |
| 20140028389 | Power Distortion-Based Servo Control Systems for Frequency Tuning RF Power Sources - A radio frequency system includes a power amplifier that outputs a radio frequency signal to a matching network via a transmission line between the power amplifier and the matching network. A sensor monitors the radio frequency signal and generates first sensor signals based on the radio frequency signal. A distortion module determines a first distortion value according to at least one of (i) a sinusoidal function of the first sensor signals and (ii) a cross-correlation function of the first sensor signals. A first correction circuit (i) generates a first impedance tuning value based on the first distortion value and a first predetermined value, and (ii) provides feedforward control of impedance matching performed within the matching network including outputting the first impedance tuning value to one of the power amplifier and the matching network. | 01-30-2014 |
| 20130268238 | Multivariate Monitoring of a Batch Manufacturing Process - A method, controller, and system for monitoring a manufacturing process are described. Measured values of multiple variables, including dependent variables, manipulated variables, or both, are received. Future values of the manipulated variables, future values of the dependent variables, or both, are predicted. A multivariate analysis is performed on a combination of (1) the measured values of the variables and (2) the future values of the manipulated variables, the future values of the dependent variables, or both, to generate multivariate statistics. | 10-10-2013 |
| 20130257311 | VERSATILE ZERO-VOLTAGE SWITCH RESONANT INVERTER FOR INDUSTRIAL DIELECTRIC BARRIER DISCHARGE GENERATOR APPLICATIONS - A power system for a dielectric barrier discharge system, such as used for generating ozone, can include a full bridge inverter stage and parallel resonant tank outputting a signal for powering a dielectric barrier discharge cell stack. The inverter stage is controlled using a combination of pulse width modulation (PWM) and frequency modulation (FM) to enable soft switching through all load conditions—from full load to light load. A current control loop error amplifier compensator can provide a duty cycle adjustment signal to a phase shift PWM controller chip that generates the switching signals for the inverter stage. A feedback signal is also used to adjust a clock frequency time constant of the PWM controller chip to provide the FM. In one embodiment, the feedback signal is an output of an inverting amplifier connected at an output of the current control loop error amplifier compensator. | 10-03-2013 |
| 20130257301 | COMPACT, CONFIGURABLE POWER SUPPLY FOR ENERGIZING OZONE-PRODUCING CELLS - Improvements in the supply of high-frequency electrical power to ozone-producing cells can be accomplished using the systems and techniques described herein. Application of a DC-DC converter operating at a switching frequency substantially greater than a load frequency, supports generation of a high-voltage AC for powering such cells, while allowing for reductions in component size and reductions in a quality factor of a load tuning circuit. Controllable power inverters used in obtaining one or more of the switching and load frequencies can be controlled using feedback techniques to provide stable, high-quality power to ozone-producing cells under variations in one or more of externally supplied power and load conditions. An inrush protection circuit can also be provided to selectively introduce a current-limiting resistance until an input DC bus has been sufficiently initialized as determined by measurements obtained from the DC bus. The current limiting resistance can be a positive-temperature coefficient thermistor. | 10-03-2013 |
| 20130222055 | Feedback Control And Coherency Of Multiple Power Supplies In Radio Frequency Power Delivery Systems For Pulsed Mode Schemes in Thin Film Processing - A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies. | 08-29-2013 |
| 20130218529 | METHODS AND APPARATUS FOR AUTOMATED PREDICTIVE DESIGN SPACE ESTIMATION - Described are computer-implemented methods and apparatuses, including computer program products, for estimating an optimal value for each input factor of a design space. The design space is defined by the input factors and output responses for a physical process. The optimal values for the input factors represent a starting point for estimating the design space. Data is received for the input factors, the output responses and criteria. An initial design space is estimated based on the received data. The optimal values for the input factors are determined from the initial design space. | 08-22-2013 |
| 20130203180 | Chemical Ionization Reaction or Proton Transfer Reaction Mass Spectrometry - A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system. | 08-08-2013 |
| 20130193325 | Method And Apparatus For Siloxane Measurements In A Biogas - A method is provided for monitoring one or more silicon-containing compounds present in a biogas. The method includes generating a first absorption spectrum based on a ratio of a first spectral measurement and a second spectral measurement. The first spectral measurement is from a non-absorptive gas having substantially no infrared absorptions in a specified wavelength range of interest and the second spectral measurement is from a sample gas comprising the biogas. The method includes generating at least one surrogate absorption spectrum based on, at least, individual absorption spectrum for each of a subset of one or more silicon-containing compounds selected from a larger set of known silicon-containing compounds with known concentrations. A total concentration of the one or more silicon-containing compounds in the biogas can be calculated based on the first absorption spectrum and the at least one surrogate absorption spectrum. | 08-01-2013 |
| 20130189160 | PRESSURE SENSOR - One or more reactive gases are introduced to a capacitance manometer at a particular area or areas between the inner and outer capacitive electrodes so the error-inducing measurement effects of positive and negative bending is neutralized or minimized. Additionally, a guard structure may be used for the electrode structure of the capacitance manometer. The guard structure presents an area that is relatively insensitive to the diffusion of the gas into the diaphragm and the resulting changing surface tension, curvature and deflection, thus providing increased or optimal stability of the zero reading and pressure reading of the manometer. The guard may also provide electrostatic isolation of the electrodes. | 07-25-2013 |
| 20130169359 | Power Distortion-Based Servo Control Systems For Frequency Tuning RF Power Sources - A radio frequency system includes a power amplifier that outputs a radio frequency signal to a matching network via a transmission line between the power amplifier and the matching network. A sensor monitors the radio frequency signal and generates first sensor signals based on the radio frequency signal. A distortion module determines a first distortion value according to at least one of (i) a sinusoidal function of the first sensor signals and (ii) a cross-correlation function of the first sensor signals. A first correction circuit (i) generates a first impedance tuning value based on the first distortion value and a first predetermined value, and (ii) provides feedforward control of impedance matching performed within the matching network including outputting the first impedance tuning value to one of the power amplifier and the matching network. | 07-04-2013 |
| 20130156648 | Power Supply Including Transformer-Less High Voltage Power Oscillators for Ozone Generation - A transformer-less power supply is provided for ozone generation. The power supply advantageously reduces costs and increases reliability of ozone generators. The power supply provides a first AC voltage from a power source to a resonant circuit and the resonant circuit provides a second AC voltage to the ozone generating unit, the second AC voltage being greater than the first AC voltage. A controller for the power supply that adapts to the resonance of the circuit to provide control with a wide tolerance for the high Q circuit component values of the circuit. | 06-20-2013 |
| 20130146225 | GAS INJECTOR APPARATUS FOR PLASMA APPLICATOR - A plasma chamber for use with a reactive gas source that includes a first conduit comprising a wall, an inlet, an outlet, an inner and outer surface, and a plurality of openings through the wall, the inlet receives a first gas for generating a reactive gas in the first conduit with a plasma formed in the first conduit. The plasma chamber also includes a second conduit that includes a wall, an inlet, and an inner surface. The first conduit is disposed in the second conduit defining a channel between the outer surface of the first conduit and the inner surface of the second conduit. A second gas provided to the inlet of the second conduit flows along the channel and through the plurality of openings of the wall of the first conduit into the first conduit to surround the reactive gas and plasma in the first conduit. | 06-13-2013 |
| 20130118589 | Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel - An assembly for adjusting gas flow patterns and gas-plasma interactions including a toroidal plasma chamber. The toroidal plasma chamber has an injection member, an output member, a first side member and a second side member that are all connected. The first side member has a first inner cross-sectional area in at least a portion of the first side member and a second inner cross-sectional area in at least another portion of the first side member, where the first inner cross-sectional area and the second inner-cross-sectional area being different. The second side member has a third inner cross-sectional area in at least a portion of the second side member and a fourth inner cross-sectional area in at least another portion of the second side member, where the third inner cross-sectional area and the fourth inner-cross-sectional area being different. | 05-16-2013 |
| 20130085618 | Method of and Apparatus for Multiple Channel Flow Ratio Controller System - A four channel gas delivery system comprising: an inlet channel; four outlet channels; four flow sensors; four control valves, each valve being arranged so as to control the flow from the inlet channel through a corresponding one of the outlet channels; a flow ratio control system configured so as to control the flow from the inlet channel through the corresponding outlet channels so that the following flow ratios are controlled: (a) a first ratio of flows between the outlet channels of a first pair; (b) a second ratio of flows between the outlet channels of a second pair; and (c) a third ratio of flows between the first pair of outlet channels relative to the second pair of outlet channels; wherein the third ratio is controlled by generating at least one bias signal respectively applied to at least one pair of valves, the bias signal being a function of a predetermined set point of the third ratio and measured values of the third ratio. | 04-04-2013 |
| 20130073241 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 03-21-2013 |
| 20130043854 | ADJUSTABLE RESONANT BUCK CONVERTER - A power converter includes first and second circuit modules, a first capacitor, a second diode and a control module. The first circuit module includes a switching element in parallel with a first diode. The second circuit module includes a first inductor and the first circuit module. The inductor is in series with the first circuit module. The first capacitor is in parallel with the second circuit module. The second diode includes a first terminal and a second terminal, where the first terminal is in series with the second circuit module and the first capacitor, and the second terminal is coupled to a second power terminal. The control module varies one or more of the first capacitor and the first inductor based on at least one of a current of a load circuit or an input voltage. A resonating waveform is generated by a resonant circuit of the second circuit and is used by the control module to turn off the switching element under zero-current and zero-voltage conditions. | 02-21-2013 |
| 20120313004 | Mass Spectrometry for a Gas Analysis with a Two-Stage Charged Particle Deflector Lens Between a Charged Particle Source and a Charged Particle Analyzer both Offset from a Central Axis of the Deflector Lens - Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens. | 12-13-2012 |
| 20120312984 | Mass Spectrometry for Gas Analysis with a One-Stage Charged Particle Deflector Lens Between a Charged Particle Source and a Charged Particle Analyzer Both Offset from a Central Axis of the Deflector Lens - Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens. | 12-13-2012 |
| 20120312978 | Mass Spectrometry for Gas Analysis in Which both a Charged Particle Source and a Charged Particle Analyzer are Offset from an Axis of a Deflector Lens, Resulting in Reduced Baseline Signal Offsets - Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens. | 12-13-2012 |
| 20120308440 | OZONE GENERATOR - Ozone generator cells that include two thermally conductive plates that maintain contact between various layers of the cells in the absence of a bonding agent. The cells lack aluminum-containing materials in the discharge region of the cell. | 12-06-2012 |
| 20120303142 | AUTOMATED MODEL BUILDING AND MODEL UPDATING - A system and computer-implemented method for creating a new model or updating a previously-created model based on a template are described. A template is generated from a previously-created model. The previously-created model specifies a set of parameters associated with a manufacturing process, a process tool or chamber. Variables associated with the manufacturing process are acquired, monitored, and analyzed. A statistical analysis (or multivariate statistical analysis) is employed to analyze the monitored variables and the set of parameters. When any of the monitored variables satisfy a threshold condition, a new model is created or the parameters of the previously-created model are updated, adjusted, or modified based on the template and the monitored variables. A user interface facilitating communication between a user and the systems and display of information is also described. | 11-29-2012 |
| 20120287545 | METHOD AND SYSTEM FOR SHOOT-THROUGH PROTECTION - A switching apparatus includes a first transistor, a second transistor, a first circuit module, a first current sensor and a control circuit. The first transistor includes first, second and third terminals. The first terminal of the first transistor is coupled to a first power terminal. The third terminal of the first transistor includes a gate or base of the first transistor. The second transistor includes first, second and third terminals. The first terminal of the second transistor is coupled to a second power terminal. The second terminal of the second transistor is coupled to the second terminal of the first transistor. The third terminal of the second transistor includes a gate or base of the second transistor. The first circuit module includes an inductor in parallel with a diode. The first circuit module is connected between the first terminal of the second transistor and the second power terminal. | 11-15-2012 |
| 20120279396 | System to remove Dissolved Gases Selectively from Liquids - A system to purge dissolved gases selectively from liquids can include a first contactor having two first contactor inlets and two first contactor outlets. The first contactor can receive liquid from a liquid source at a first inlet of the first contactor and an inert gas source at a second inlet of the first contactor, the inert gas can purge a first portion of gas from the liquid source. The first portion of purged gas exits the first contactor at a first outlet of the first contactor. The second contactor can receive input from the second outlet of the first contactor and the inert gas, the inert gas purges a second portion of the gas from the liquid source. The second portion of purged gas can exit the second contactor at a first outlet of the second contactor. | 11-08-2012 |
| 20120262064 | Radio Frequency Power Delivery System - A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system. | 10-18-2012 |
| 20120227043 | Optimization of Data Processing Parameters - Described are computer-based methods and apparatuses, including computer program products, for optimizing data processing parameters. A data set is received that represents a plurality of samples. The data set is processed using a data processing algorithm that includes one or more processing stages, each stage using a respective first set of data processing parameters to generate processed data. A design of experiment model is generated for the data processing algorithm based on the processed data and a set of response values. For each stage of the data processing algorithm, a second set of data processing parameters is calculated based on at least the design of experiment model. | 09-06-2012 |
| 20120216888 | System for and Method of Fast Pulse Gas Delivery - A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the dedicated controller is configured and arranged to delivery pulses of gas in accordance with anyone of three different types of pulse gas delivery processes: a time based pulse delivery process, a mole based pulse delivery process and a profile based pulse delivery process. | 08-30-2012 |
| 20120202408 | PRESSURE REGULATION IN REMOTE ZONES - A pressure control system remotely controls pressure within one or more remote zones, each respectively connected to an enclosure through a conduit, by controlling flow of a fluid into and out of each enclosure. The pressure of the fluid is measured within each enclosure. An estimated pressure within each zone is computed, as a function of the measured pressure in the enclosure and known characteristics of the conduit and the zone. For each zone, an inlet proportional valve and an outlet proportional valve of each enclosure is operated so as to control the input flow rate of the fluid into the respective enclosure and the output flow rate of the fluid out of the enclosure as a function of a pressure set point and the estimated pressure, thereby regulating pressure within the zone in accordance with the pressure set point. | 08-09-2012 |
| 20120174992 | Apparatus and Method for Pressure Fluctuation Insensitive Mass Flow Control - A mass flow controller includes a thermal mass flow sensor in combination with a pressure sensor to provide a mass flow controller that is relatively insensitive to fluctuations in input pressure. The pressure sensor and thermal sensor respectively provide signals to an electronic controller indicating the measured inlet flow rate and the pressure within the dead volume. The electronic controller employs the measured pressure to compensate the measured inlet flow rate and to thereby produce a compensated measure of the outlet flow rate, which may be used to operate a mass flow controller control valve. | 07-12-2012 |
| 20120171092 | HIGH-EFFICIENCY, HOT TRAP APPARATUS AND METHOD - A hot trap for removing a reactive constituent gas from a gas stream via chemical reaction and/or thermal disassociation includes a trap chamber with a heater assembly and a trap medium in its core inner portion and annular pre-heating and counterflow heating ducts in its outer and intermediate portions surrounding the core inner portion for heating an inflowing gas stream and conservation of heat energy in the trap as well as to maintain lower temperatures on external surfaces. | 07-05-2012 |
| 20120160059 | Method and Apparatus for Processing Metal Bearing Gases - A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material. | 06-28-2012 |
| 20120153193 | TWO-STAGE, SLOW-START VALVE APPARATUS AND METHOD - A two-stage, slow-start valve includes a minor valve assembly inside a major valve closure member of a major valve closure assembly so that fluid can flow through the valve at a higher rate by opening the major valve assembly or at a lower rate by opening the minor valve assembly while the major valve closure assembly is closed in order to allow fluid to flow in an alternate flow path through the major valve closure member. The example minor valve closure assembly has a minor valve closure member that is actuated to open by a minor valve piston on which minor valve actuating fluid is applied to the minor piston via a diaphragm seal positioned between the minor piston and the minor valve actuating fluid. Both the major valve closure assembly and the minor valve closure assembly can be pneumatically actuated to open. | 06-21-2012 |
| 20120150508 | Methods and Apparatus for Automated Predictive Design Space Estimation - Described are computer-based methods and apparatuses, including computer program products, for automated predictive design space estimation. A design space of input factors and output responses is estimated for a physical process. Data is received for one or more input factors for a physical process, one or more output responses for the process, and criteria. For each of the one or more input factors, a calculated range of input values within the corresponding experimented range of input values is calculated. A modified range of input values is calculated for each of the one or more input factors. A design space estimate is predicted based at least on the modified ranges of input values, wherein the modified ranges of input values each comprise a largest region of variability for one or more of the input factors where the criteria are fulfilled. | 06-14-2012 |
| 20120146508 | MEASURING AND CONTROLLING PARAMETERS OF A PLASMA GENERATOR - Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both. | 06-14-2012 |
| 20120123583 | Controlling a Discrete-Type Manufacturing Process with a Multivariate Model - Described are methods, systems, and a computer-readable storage medium for controlling a discrete-type manufacturing process (e.g., an injection molding process) with a multivariate model. Data representing process parameters, operating parameters, or both of the manufacturing process are received. The received data is compared with a multivariate model that approximates the manufacturing process to provide a result. Upon the result of the comparing satisfying a condition, one or more values for a set of operating parameters for the manufacturing process are determined. When the one or more determined values for the set of operating parameters satisfies a criterion, at least one operating parameter of the manufacturing process is updated. | 05-17-2012 |
| 20120118067 | Capacitive Pressure Sensor with Improved Electrode Structure - An improved capacitive manometer comprises a diaphragm that is constrained relative to an electrode structure spaced from the diaphragm. An electrode support structure is arranged to support the electrode structure and comprises a compliant ring including at least three flexures integrally formed in the ring and angularly spaced around the alignment axis. The electrode support is clamped in place relative to the diaphragm at the locations of the compliant ring flexures. | 05-17-2012 |
| 20120099684 | Frequency Interference Detection And Correction - A system for detecting and correcting for spurious frequencies that may coincide in a bandwidth of interest in an RF metrology system. The system can (1) utilize a deterministic scheme to detect an interference by a spurious frequency and correct the distortion effect or (2) utilize a mixed signal processing architecture to avoid the occurrence of spurious frequency contamination. A detection scheme identifies the event of distortion and triggers either (a) a shift in the analog to digital convert sample rate or (b) a mathematical vector manipulation. The shift of the analog to digital convert sample rate moves an aliased image of the spurious frequency outside of the frequency of interest. The mathematical vector correction removes the distortion and restores the signal of interest. | 04-26-2012 |
| 20120086434 | WIDE-DYNAMIC RANGE ELECTROMETER WITH A FAST RESPONSE - A method and apparatus for measuring current includes sensing a first voltage at the output of an amplifier and computing a current based on the first voltage and the resistance of a first resistive element, which is electrically coupled between an inverting input of the amplifier and the output of the amplifier, if the first voltage is below a predetermined level. The method also includes sensing a second voltage at the output of a buffer and computing a current based on the first and second voltages and the resistances of the first resistive element and a second resistive element, which is electrically coupled between the inverting input of the amplifier and an input of the buffer and is also electrically coupled to the output of the amplifier through a at least one diode, if the voltage output from the amplifier is above the predetermined level. | 04-12-2012 |
| 20120081132 | Measuring Minority Carrier Lifetime - An apparatus includes a member including a ferromagnetic material, an inductance-capacitance resonant circuit, a substrate disposed relative to the member, and a plurality of radiation sources. The member includes a post disposed at its center and a surface extending to an outer wall. The member defines a gap between the post and the outer wall. The inductance-capacitance resonant circuit is configured to resonate at a measurement frequency. The circuit includes an inductor disposed relative to the post. The substrate is disposed relative to the member. The substrate is electromagnetically coupled to the inductor. The plurality of radiation sources is disposed radially outward from and circumferentially around the post of the member. The apparatus can be used to simultaneously measure conductance (inverse sheet resistance), steady state photoconductance, true steady state minority carrier lifetime, photoconductance build-up and photoconductance decay lifetime. | 04-05-2012 |
| 20120065948 | Monitoring, Detecting and Quantifying Chemical Compounds in a Sample - Described are computer-based methods and apparatuses, including computer program products, for monitoring, detecting, and quantifying chemical compounds in a sample. A sample measurement comprising a digitized spectroscopic profile is received. A multivariate multistage background model comprising a first model that models a first time effect, a second model that models a second time effect that is different than the first time effect, or both is calculated. A background corrected sample measurement based on the sample measurement and the multivariate multistage background model is generated. A multivariate multistage library search, fault detection, and quantification algorithm is executed to identify one or more primary chemicals in the background corrected sample measurement. The search, detection, and quantification algorithm includes identifying one or more candidate chemicals in the background corrected sample measurement based on a multivariate statistical process control and identifying and quantifying a first primary chemical based on a focused chemical evaluation of the one or more candidate chemicals. | 03-15-2012 |
| 20120062322 | Power Amplifier With Transistor Input Mismatching - A power amplifier includes an input module. The input module includes a transformer and is configured to receive a radio frequency signal and generate output signals. Impedance transformation modules each of which having an output impedance and configured to receive a respective one of the output signals from the transformer. Switch modules each of which comprising a transistor and connected to an output of one of the impedance transformation modules. The transistor has an input impedance and outputs an amplified signal. Each of the output impedances is mismatched relative to a respective one of the input impedances. | 03-15-2012 |
| 20120061369 | MULTIPLE HEATER CONTROL SYSTEM WITH EXPANDABLE MODULAR FUNCTIONALITY - A multiple heater control system includes cables, connectors, and junction boxes for user-friendly daisy chain connections of heater controllers and heaters in various configurations or combinations of individually controlled heater series and/or master and slave heater series. The heater controllers include process control of AC power to the heaters and upper-limit safety shutoff that is substantially independent from the process control. The heater controllers also have variable levels of control, adjustment, display, and communications functionality in a base module that is expandable to various levels with expansion modules that are attachable to and detachable from the base module. Connector, cable, and junction configurations, adapters, and latch features enhance user friendliness. | 03-15-2012 |
| 20120056658 | LCL High Power Combiner - A combiner includes N coaxial cables each configured to connect to a respective output of N radio frequency power amplifiers, where N is an integer greater than one. Each of the N coaxial cables is configured to receive an amplified radio frequency signal from a respective one of the N radio frequency power amplifiers. A board includes capacitances and is configured to connect to each of the N coaxial cables and combine the radio frequency signals. The N coaxial cables and the capacitances provide N inductance and capacitance combinations. A connector is configured to connect an output of the board to a load. | 03-08-2012 |
| 20120035755 | PROCESS CONTROL USING PROCESS DATA AND YIELD DATA - A method for monitoring a manufacturing tool features acquiring metrology data (“Step a”). Data is acquired for process variables for a first process step performed by the manufacturing tool (“Step b”). A mathematical model of the first process step based on the metrology data and the acquired data is created (“Step c”). Steps b and c are repeated for at least a second process step (“Step d”). An nth mathematical model is created based on the metrology data and the data for the process variables for each of the n process steps (“Step e”). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (“Step f”). A multivariate metric is calculated based on the top level model of step f and data from subsequent runs of the manufacturing tool. Service is performed if the metric satisfies a condition. | 02-09-2012 |
| 20120031190 | CAPACITIVE PRESSURE SENSOR - An improved capacitive manometer, the manometer comprises: a diaphragm including (a) a common electrode and (b) an electrode structure including a center electrode and ring electrode, wherein the diaphragm is movable between (i) a zero position when the pressure on each side of the diaphragm is the same and (ii) a maximum differential position when the maximum measurable differential pressure is applied to the diaphragm, and a support structure arranged so as to support the diaphragm so that the diaphragm is constrained relative to the electrode structure, and the common electrode is spaced from and axially aligned with the center and ring electrodes relative to an alignment axis of the manometer: wherein the electrode structure is secured relative to the diaphragm at at least three clamping locations angularly spaced around the alignment axis; and wherein the angle defined within each right plane containing a point of constraint of the diaphragm and the point of each clamping location relative to the plane of the diaphragm in the zero position is between 60° and 90° so as to reduce changes in electrode disk support height, enable smaller gaps and improved stability between the diaphragm and electrode structure. An additional improvement is provided by including a spacer ring including a plurality of tabs; and a clamp arranged to clamp the electrode structure to the spacer ring at the location of each of the tabs so as to define a plurality of equiangularly spaced, clamped locations around the alignment axis, so as to eliminate the possibility of an occasional spacer induced radial shear force and subsequent potential stick slip condition that could impact repeatability and stability. | 02-09-2012 |
| 20120013352 | Multipoint Voltage And Current Probe System - A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors. | 01-19-2012 |
| 20120013253 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 01-19-2012 |
| 20120003748 | Chemical Ionization Reaction or Proton Transfer Reaction Mass Spectrometry - A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system. | 01-05-2012 |
| 20110297319 | Reduction of Copper or Trace Metal Contaminants in Plasma Electrolytic Oxidation Coatings - A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer. | 12-08-2011 |
| 20110241781 | Variable Class Characteristic Amplifier - A power amplifier (PA) adjustably operable between two classes of operation. The range of operation lies in a range of operation between a conventional, linear, conjugately matched Class AB characteristic amplifier and a higher efficiency switching Class E characteristic amplifier. A circuit topology having a push-pull configuration that allows a Class E characteristic of operation. | 10-06-2011 |
| 20110241773 | Multi-Channel Radio Frequency Generator - A multi-channel radio frequency (RF) generator module includes N power amplifiers, M drivers, a power supply module, and a control module. The N power amplifiers generate N RF outputs, respectively. The M drivers drive the N power amplifiers based on M driver control signals, respectively. The power supply module receives alternating current (AC) input power and applies L rail voltages to the N power amplifiers based on L rail voltage setpoints, respectively. The control module sets the L rail voltage setpoints and the M driver control signals. N is an integer greater than one, L and M are integers greater than zero, and M and L are less than or equal to N. | 10-06-2011 |
| 20110228274 | Ozone Concentration Sensor - An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute. | 09-22-2011 |
| 20110169520 | APPARATUS FOR MEASURING MINORITY CARRIER LIFETIME AND METHOD FOR USING THE SAME - An apparatus for measuring minority carrier lifetime is provided. The apparatus includes a resonant circuit having an inductor and a capacitor and configured to resonate at a measurement frequency. The apparatus also includes a ferromagnetic core having a first portion and a second portion. The first portion defines a gap and can be configured to direct therealong a magnetic field established by the inductor, such that lateral spreading of the magnetic field outside of the first portion is inhibited, and to direct the magnetic field generally uniformly across the gap. The second portion can be configured to direct the magnetic field therealong and, in conjunction with the first portion, into a closed loop. A radiation source can be configured to irradiate an area proximal to the gap defined by the first portion of the ferromagnetic core. | 07-14-2011 |
| 20110134716 | DEVICES, SYSTEMS, AND METHODS FOR CARBONATION OF DEIONIZED WATER - Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided. | 06-09-2011 |
| 20110012588 | Wide-Dynamic Range Electrometer with a Fast Response - A method and apparatus for measuring current includes sensing a first voltage at the output of an amplifier and computing a current based on the first voltage and the resistance of a first resistive element, which is electrically coupled between an inverting input of the amplifier and the output of the amplifier, if the first voltage is below a predetermined level. The method also includes sensing a second voltage at the output of a buffer and computing a current based on the first and second voltages and the resistances of the first resistive element and a second resistive element, which is electrically coupled between the inverting input of the amplifier and an input of the buffer and is also electrically coupled to the output of the amplifier through a at least one diode, if the voltage output from the amplifier is above the predetermined level. | 01-20-2011 |
| 20110005922 | Methods and Apparatus for Protecting Plasma Chamber Surfaces - A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas. | 01-13-2011 |
| 20100327927 | METHOD AND SYSTEM FOR CONTROLLING RADIO FREQUENCY POWER - A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse. | 12-30-2010 |
| 20100292812 | METHODS AND APPARATUS FOR AUTOMATED PREDICTIVE DESIGN SPACE ESTIMATION - Described are computer-based methods and apparatuses, including computer program products, for automated predictive design space estimation. A design space of input factors and output responses is estimated for a physical process. Data is received for one or more input factors for a physical process, one or more output responses for the process, and criteria. For each of the one or more input factors, a calculated range of input values within the corresponding experimented range of input values is calculated. A modified range of input values is calculated for each of the one or more input factors. A design space estimate is predicted based at least on the modified ranges of input values, wherein the modified ranges of input values each comprise a largest region of variability for one or more of the input factors where the criteria are fulfilled. | 11-18-2010 |
| 20100235690 | BITMAP CLUSTER ANALYSIS OF DEFECTS IN INTEGRATED CIRCUITS - A system and method for defect analysis are disclosed wherein a defect data set is input into the system. A radius value is selected by a user, which is the maximum number of bits that bit failures can be separated from one another to be considered a bit cluster. When a defect data set is received, the system and method start with a fail bit and search for neighboring fail bits. The specified radius is used to qualify the found fail bits to be part of the bit cluster or not. If a minimum count of fail bits is not met, the system and method will stop searching and move to the next fail bit. If a minimum count of fail bits is met, the search continues for the next fail bit until the maximum fail bit count specified by the user is reached. Aggregation is provided such that once bit clusters have been classified, the number of clusters that have the exact match or partial match to each other is counted. The user may set the partial match as a threshold count to establish a match. | 09-16-2010 |
| 20100231296 | Radio Frequency Power Delivery System - A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system. | 09-16-2010 |
| 20100223015 | METHOD AND APPARATUS FOR SILOXANE MEASUREMENTS IN A BIOGAS - A method for monitoring of siloxane compounds in a biogas includes the step of generating a first absorption spectrum based on a ratio of a first spectral measurement and a second spectral measurement. The first spectral measurement is from a non-absorptive gas having substantially no infrared absorptions in a specified wavelength range of interest and the second spectral measurement is from a sample gas comprising the biogas. The method also includes the step of calculating a concentration of at least one siloxane compound in the biogas using a second absorption spectrum based on, at least, a first individual absorption spectrum for a known concentration of the at least one siloxane compound. | 09-02-2010 |
| 20100201371 | Harmonic Derived Arc Detector - An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber. | 08-12-2010 |
| 20100201370 | Arc Detection - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-12-2010 |
| 20100194195 | Radio Frequency Power Control System - A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1. | 08-05-2010 |
| 20100191361 | Controlling a Manufacturing Process with a Multivariate Model - A method, controller, and system for controlling a manufacturing process (batch-type or continuous-type) with a multivariate model are described. Dependent variable data and manipulated variable data are received. Dependent variable data represents values of uncontrolled process parameters from a plurality of sensors. Manipulated variable data represents controlled or setpoint values of controllable process parameters of a plurality of process tools. A predicted operational value, multivariate statistic, or both are determined based on the received data, and operating parameters of the manufacturing process are determined based on the predicted score, multivariate statistic, or both. | 07-29-2010 |
| 20100176858 | Signal oversampling for improved S:N in reflector movement system - Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships. | 07-15-2010 |
| 20100166630 | REACTIVE CHEMICAL CONTAINMENT SYSTEM - A small scale, but effective, reactive chemical containment system includes apparatus and methods for reaction of process gases exhausted from reaction furnaces with a reactant gas in a non-combustible manner to produce and contain particulate or powder byproducts, thereby removing the process gas from the exhaust gas flow. The apparatus provides process gas inlet, treatment reactive gas diffusion, process gas and treatment reactive gas pre-mixing, primary containment, secondary containment, and outlet zones. | 07-01-2010 |
| 20100148874 | METHODS AND SYSTEMS FOR STABILIZING AN AMPLIFIER - The invention generally relates to stabilizing an MRI power delivery system. In one aspect, a stabilization module that is in electrical communication with the MRI power delivery system is provided. The stabilization module includes a closed loop control system. The closed loop control system is used to modify the at least one characteristic of the input signal. The modified input signal is provided to the MRI power delivery system. | 06-17-2010 |
| 20100125424 | Dual-Mode Mass Flow Verification and Mass Flow Delivery System and Method - A system performs mass flow delivery of a fluid, and also performs mass flow verification of the fluid. The system includes an inlet valve that controls flow of the fluid into a chamber, an outlet valve that controls flow of the fluid out of the chamber, a pressure transducer that measures the pressure of the fluid within the chamber, a temperature sensor that measures the temperature of the fluid within the chamber, and a controller. The controller is configured to control opening and closing of the inlet and outlet valves, using the measurements of the pressure and the temperature change within the chamber, so as to verify, when in a first mode, a measurement of the flow rate of the fluid by a device, and so as to deliver, when in a second mode, a desired amount of the fluid from the chamber into a processing facility. | 05-20-2010 |
| 20100100223 | PROCESS CONTROL USING PROCESS DATA AND YIELD DATA - A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process (“Step a”). Data is acquired for a plurality of process variables for a first process step for manufacturing semiconductor wafers (“Step b”). A first mathematical model of the first process step is created based on the metrology data and the acquired data for the plurality of process variables for the first process step (“Step c”). Steps b and c are repeated for at least a second process step for manufacturing the semiconductor wafers (“Step d”). An nth mathematical model is created based on the metrology data and the data for the plurality of process variables for each of the n process steps ('Step e“). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (”Step f'). The top level mathematical model of Step f is based on those process variables that have a substantial effect on the metrology data. | 04-22-2010 |
| 20100079764 | Multigas Monitoring and Detection System - A spectroscopic detection system is described for monitoring ambient air for toxic chemical substances. The system can be a compact, portable multiple gas analyzer capable of detecting and discriminating a broad range of chemical constituents including various nerve and blister agents as well as toxic industrial chemicals at low or sub part per billion (ppb) levels. The system minimizes false alarms (e.g., false positives or negatives), features high specificity, and can operate with response times on the order of a few seconds to a few minutes, depending on the application. The system can be an entirely self-contained analyzer, with a Fourier Transform Infrared (FTIR) spectrometer, a gas sample cell, a detector, an embedded processor, a display, power supplies, an air pump, heating elements, and other components onboard the unit with an air intake to collect a sample and an electronic communications port to interface with external devices. | 04-01-2010 |
| 20100073104 | Tune Range Limiter - An impedance matching network includes a first input port that receives radio frequency (RF) power and includes an input impedance, an output port that provides the RF power and includes an output impedance, and a variable capacitance module that varies the output impedance. The variable capacitance module includes a first variable capacitor, a second variable capacitor, a first motor, and a second motor that adjusts a capacitance of the second variable capacitor. A relationship between a desired value of the capacitance and an actual value of the capacitance is dependent on a capacitance of the first variable capacitor. | 03-25-2010 |
| 20100063614 | VERSATILE SEMICONDUCTOR MANUFACTURING CONTROLLER WITH STATISTICALLY REPEATABLE RESPONSE TIMES - The present invention relates to process I/O controllers for semiconductor manufacturing to which a tool host can delegate data collection, monitoring and control tasks. In particular, it relates to process I/O controllers that can perform more than one of data collection, monitoring, control and response to commands from a tool host with statistically repeatable performance and precision. Embodiments described use prioritized real time operating systems to control of semiconductor manufacturing tools and data collection from tool associated with the sensors. Statistically repeatable responsiveness to selected commands and to sensor inputs during selected recipe steps effectively reduces jitter. | 03-11-2010 |
| 20100057237 | AUTOMATED MODEL BUILDING AND BATCH MODEL BUILDING FOR A MANUFACTURING PROCESS, PROCESS MONITORING, AND FAULT DETECTION - A method for creating a new model of a manufacturing process according to a multivariate analysis including selecting a set of data representative of multidimensional data measured during a step or phase of a manufacturing process. The method also includes determining a set of model generation conditions based on the set of data and generating the new model specifying intervals for the multidimensional data measured during a future manufacturing process based on the set of model generation conditions. | 03-04-2010 |
| 20100027017 | Ozone Concentration Sensor - An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute. | 02-04-2010 |
| 20100012482 | SPUTTERING SYSTEM AND METHOD INCLUDING AN ARC DETECTION - A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma. | 01-21-2010 |
| 20100001796 | Radio Frequency (RF) Envelope Pulsing Using Phase Switching of Switch-Mode Power Amplifiers - A radio frequency (RF) power generator includes a first switch-mode amplifier that generates a first RF signal in accordance with a first control signal and a second switch-mode amplifier that generates a second RF signal in accordance with a second control signal. The first and second control signals determine a phase difference between the first and second RF signals. An output signal envelope is based on the first and second RF signals and the phase difference. The first control and second control signals alternate phases of the first and second RF signals. | 01-07-2010 |
| 20090320677 | PARTICLE TRAP FOR A PLASMA SOURCE - A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel. | 12-31-2009 |
| 20090315463 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 12-24-2009 |
| 20090288772 | Method and Apparatus for Processing Metal Bearing Gases - A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material. | 11-26-2009 |
| 20090256580 | ORTHOGONAL RADIO FREQUENCY VOLTAGE/CURRENT SENSOR WITH HIGH DYNAMIC RANGE - A radio frequency (RF) sensor that measures RF current includes a substrate that has an inner perimeter that defines an aperture. A conductor extends through the aperture. Sensor pads are arranged on the aperture and are connected to form two sensor loops. The loops generate an electrical signal that represents RF current flow through the center conductor. Additionally, a plurality of circular conductive rings may be included in the RF sensor to generate a signal representing the voltage of the conductor. | 10-15-2009 |
| 20090255342 | Capacitance Manometers and Methods of Making Same - A capacitance manometer comprises: a flexible diaphragm including a first electrode structure; an electrode structure including second and third spaced-apart electrode structures secured relative to the diaphragm so as to establish a capacitance between the first electrode structure and the second electrode structure and a capacitance between the first electrode structure and the third spaced-apart electrode structure, wherein the capacitances between the first electrode structure and each of the second and third electrode structures change with changes in differential pressure placed on opposite sides of the flexible diaphragm; and a thick film dielectric material disposed between the first electrode and each of the second and third spaced-apart electrode structures so as to increase the gain in capacitance of the manometer without decreasing the distance between the first electrode structure and each of the second and third electrode structures and without increasing the stroke of the flexible diaphragm, while preventing the first electrode structure from shorting with either the second or third electrode structure in response to over pressurization conditions. | 10-15-2009 |
| 20090210086 | SYSTEMS AND METHODS FOR SORTING IRREGULAR OBJECTS - A system and method is provided for computerized sorting irregular objects. The method includes receiving a representative set of irregular objects comprising at least two types of user-specified qualities. The method also includes receiving at least two types of measured data for the representative set of irregular objects. The method also includes generating at least one of a PCA model or a PLS model based on at least two user-specified qualities of the irregular objects and the at least two types of measured data for the representative set of irregular objects, and sorting a second set of irregular objects based on the at least one of the PCA model or the PLS model. | 08-20-2009 |
| 20090207537 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-20-2009 |
| 20090206822 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-20-2009 |
| 20090137192 | MULTI-ZONE PRESSURE CONTROL SYSTEM - A pressure control system that controls the pressure of a fluid in a plurality of zones includes a distribution manifold, at least one main manifold connected to the distribution manifold, and at least one disposable manifold connected to the distribution manifold and the main manifold. The disposable manifold is adapted to be replaced independent of the distribution manifold and the main manifold, and is connected to each zone and to at least one vacuum source. The distribution manifold distributes the fluid to the plurality of zones, so as to cause flow of the fluid into and out of a measurement chamber located within each zone. The main manifold includes, for each zone, a pressure sensor configured to measure pressure in the measurement chamber in that zone, and a control valve configured to regulate the flow of the fluid through that zone. | 05-28-2009 |
| 20090095902 | CHEMICAL IONIZATION REACTION OR PROTON TRANSFER REACTION MASS SPECTROMETRY WITH A TIME-OF-FLIGHT MASS SPECTROMETER - A system, components thereof, and methods are described for time-of-flight mass spectrometry. A microwave or high-frequency RF energy source is used to ionize a reagent vapor to form reagent ions. The reagent ions enter a chamber and interact with a fluid sample to form product ions. The reagent ions and product ions are directed to a time-of-flight mass spectrometer module for detection and determination of a mass value for the ions. The time-of-flight mass spectrometer module can include an optical system and an ion beam adjuster for focusing, interrupting, or altering a flow of reagent and product ions according to a specified pattern. The time-of-flight mass spectrometer module can include signal processing techniques to collect and analyze an acquired signal, for example, using statistical signal processing, such as maximum likelihood signal processing. | 04-16-2009 |
| 20090095901 | CHEMICAL IONIZATION REACTION OR PROTON TRANSFER REACTION MASS SPECTROMETRY WITH A QUADRUPOLE MASS SPECTROMETER - A system and methods are described for generating reagent ions and product ions for use in a quadrupole mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadrupole mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system. | 04-16-2009 |
| 20090055140 | MULTIVARIATE MULTIPLE MATRIX ANALYSIS OF ANALYTICAL AND SENSORY DATA - A system and method is provided for predicting consumer behavior for selected products. The method includes providing a first matrix associated with N products evaluated by a plurality of consumers, providing a second matrix associated with the N products characterized by at least one of an analytical profile or an evaluation by a plurality of experts and correlating the first matrix to the second or/and the third matrix to produce a relationship model. | 02-26-2009 |
| 20090039934 | Signal Oversampling for Improved S:N in Reflector Movement System - Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships. | 02-12-2009 |
| 20090037013 | Automated Model Building and Model Updating - A system and computer-implemented method for creating a new model or updating a previously-created model based on a template are described. A template is generated from a previously-created model. The previously-created model specifies a set of parameters associated with a manufacturing process, a process tool or chamber. Variables associated with the manufacturing process are acquired, monitored, and analyzed. A statistical analysis (or multivariate statistical analysis) is employed to analyze the monitored variables and the set of parameters. When any of the monitored variables satisfy a threshold condition, a new model is created or the parameters of the previously-created model are updated, adjusted, or modified based on the template and the monitored variables. A user interface facilitating communication between a user and the systems and display of information is also described. | 02-05-2009 |
| 20080316773 | High Voltage Power Supply for Static Neutralizers - A high voltage power supply for a static neutralizer is disclosed. The high voltage power supply includes a resonant converter and a load with an emitter module having an emitter, reference electrode, and a capacitance value. The resonant converter is disposed to have a resonant frequency and an output coupled to the load. The resonant converter generates an output waveform with an amplitude sufficient for generating to ions by corona discharge when the load receives the output waveform. The load is predominantly capacitive when the resonant converter is operating at the resonant frequency. | 12-25-2008 |
| 20080302652 | Particle Reduction Through Gas and Plasma Source Control - A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber. | 12-11-2008 |
| 20080257738 | Devices, Systems, and Methods for Carbonation of Deionized Water - Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided. | 10-23-2008 |
| 20080251727 | Multigas Monitoring and Detection System - A spectroscopic detection system is described for monitoring ambient air for toxic chemical substances. The system can be a compact, portable multiple gas analyzer capable of detecting and discriminating a broad range of chemical constituents including various nerve and blister agents as well as toxic industrial chemicals at low or sub part per billion (ppb) levels. The system minimizes false alarms (e.g., false positives or negatives), features high specificity, and can operate with response times on the order of a few seconds to a few minutes, depending on the application. The system can be an entirely self-contained analyzer, with a Fourier Transform Infrared (FTIR) spectrometer, a gas sample cell, a detector, an embedded processor, a display, power supplies, an air pump, heating elements, and other components onboard the unit with an air intake to collect a sample and an electronic communications port to interface with external devices. | 10-16-2008 |
| 20080232021 | Low Maintenance AC Gas Flow Driven Static Neutralizer and Method - A low maintenance AC gas-flow driven static neutralizer, comprising at least one emitter and at least one reference electrode; a power supply having an output electrically coupled to the emitter(s) and a reference terminal electrically coupled to the reference electrode(s) with the power supply disposed to produce an output waveform that creates ions by corona discharge and to produce an electrical field when this output waveform is applied to the emitter(s); a gas flow source disposed to produce a gas flow across a first region that includes these generated ions and the emitter(s), the gas flow including a flow velocity; and wherein, during a first time duration, the output waveform decreases an electrical force created by the electrical field, enabling the gas flow to carry away from the emitter(s) a contamination particle that may be located within a second region surrounding the emitter(s), and to minimize a likelihood of the contamination particle from accumulating on the emitter(s). The first region may include the second region. | 09-25-2008 |
| 20080227420 | Multipoint Voltage and Current Probe System - A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors. | 09-18-2008 |
| 20080221720 | Manufacturing Process End Point Detection - A method for identifying a predetermined state of a manufacturing process by monitoring the process which involves, monitoring a plurality of variables that vary in value during the manufacturing process. The method also involves mapping as points in a hyperspace the values of each variable at a plurality of times, where the hyperspace has a number of dimensions equal to the number of variables and the number of points is equal to the plurality of times. The method also involves identifying that a manufacturing process has reached the predetermined state when one of the points reaches a closed volume in the hyperspace that is located within a predefined distance from a predefined location in the hyperspace. | 09-11-2008 |
| 20080216901 | Pressure control for vacuum processing system - A pressure control system includes a digital communication network between a pressure sensor and a pressure controller. The digital communication network is configured to communicate signals between the pressure sensor and the pressure controller. The pressure sensor is configured to measure pressure within a vacuum chamber in a processing tool. The pressure controller is responsive to pressure measurements made by the pressure sensor and communicated to the pressure controller through the digital communication network, to control the pressure within the vacuum chamber so as to maintain the pressure in the vacuum chamber at a pressure set point received from the tool. | 09-11-2008 |
| 20080197854 | Harmonic Derived Arc Detector - An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber. | 08-21-2008 |
