Lasertec Corporation Patent applications |
Patent application number | Title | Published |
20150304616 | MEASURING APPARATUS AND MEASURING METHOD - Provided is a phase shift amount measuring apparatus and method capable of measuring a phase shift amount and a transmittance of a phase shift mask in one measurement step by using a miniaturized monitor pattern. The phase shift amount and transmittance of the monitor pattern are simultaneously measured using a shearing interferometer. The phase shift amount is obtained from a phase difference of interference light between light passing through the monitor pattern and light passing through a non-pattern area. The transmittance of the monitor pattern is obtained using an amplitude of interference light between light passing through the monitor pattern and light passing through the non-pattern area and an amplitude of interference light between light beams passing through the non-pattern area. The use of common interference images in measuring the phase shift amount and transmittance enables measurement of both the phase shift amount and the transmittance in one measurement operation. | 10-22-2015 |
20150293460 | PELLICLE INSPECTION APPARATUS - Provided with a pellicle inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography. The pellicle inspection apparatus includes: an illumination optical system that projects a converging illuminating beam toward the pellicle film; | 10-15-2015 |
20150144769 | INSPECTION APPARATUS AND INSPECTION METHOD - An inspection apparatus and an inspection method capable of performing an inspection more accurately are provided. An inspection apparatus according to the present invention includes a light source | 05-28-2015 |
20140333921 | INSPECTION METHOD AND INSPECTION APPARATUS - The field of view of an objective lens is divided into two areas, and a transmission image of a photomask and a composite image obtained by optically synthesizing a transmission image and a reflection image of the photomask are picked up in parallel. A drop image generated at an edge portion of a pattern portion in the composite image is deleted by limiter processing or masking processing, or is deleted by using primary-differentiated signals of a composite image signal and a transmission image signal. | 11-13-2014 |
20140189998 | CHUCKING DEVICE AND CHUCKING METHOD - Provided are a chucking device having low dusting characteristics and high detergent properties and capable of vacuum-sucking even a substrate having a large warpage, and a chucking method using the same. A chucking device according to an aspect of the present invention vacuum-sucks and holds a wafer. The chucking device includes: a perforated plate having a plurality of through-holes and being mounted with a wafer, the through-holes penetrating through both sides of the perforated plate; a porous plate that supports a surface other than a mounting surface of the perforated plate, on which the wafer is mounted, transmits a vacuum state to the wafer through the plurality of through-holes, and has a pore to limit a flow rate; and a vacuum pump that exhausts an air through the pore of the porous plate. | 07-10-2014 |
20140136132 | ANALYSIS APPARATUS AND ANALYSIS METHOD - Provided are an analysis apparatus and an analysis method which are capable of recognizing a local state change of an internal structure of a secondary battery. The analysis apparatus includes: an observation cell that houses a secondary battery; a charging and discharging controller that controls charging and discharging of the secondary battery; an image pickup device that captures color images of the secondary battery at a predetermined time interval; and a charging and discharging data detection unit that acquires charging and discharging data on the secondary battery during charging and discharging. Color image signals output from the image pickup device and charging and discharging data signals output from the charging and discharging data detection unit are supplied to a signal processing device. The signal processing device outputs a unit that temporally links time-series color image signals and time-series charging and discharging data signals, and designated analysis data. | 05-15-2014 |
20130322735 | DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, AND DEFECT INSPECTION PROGRAM - A defect inspection device according to one aspect of the present invention includes a light source, a detector that receives light from an illuminated region of a sample, a stage that changes a relative position between light from the light source and the sample in order to sequentially inspect a plurality of unit inspection regions, a comparator that compares a detection signal output from the detector with a threshold according to scanning in the stage, a mask position setting unit that sets a common position of the plurality of unit inspection regions as a mask position in order to mask the common position when the plurality of unit inspection regions are sequentially inspected, and a defect detection unit that detects a defect based on a comparison result in the comparison unit in another region than the mask position. | 12-05-2013 |
20130245971 | DEFECT COORDINATES MEASUREMENT DEVICE, DEFECT COORDINATES MEASUREMENT METHOD, MASK MANUFACTURING METHOD, AND REFERENCE MASK - A defect coordinates measurement method includes a step of detecting detected coordinates of a fiducial mark and a defect of a mask blank placed on support pins, a step of detecting detected coordinates of the alignment mark of a reference mask placed on the support pins, a step of extracting a reference mark near the detected coordinates of the defect among the plurality of reference marks based on the detected coordinates of the defect of the mask blank and the alignment mark of the reference mask, a step of detecting detected coordinates of the extracted reference mark, and a step of calculating coordinates of the defect based on the detected coordinates of the reference mark and the detected coordinates of the defect. | 09-19-2013 |
20130234597 | PLASMA SHIELD DEVICE AND PLASMA SOURCE APPARATUS - The plasma shield device ( | 09-12-2013 |
20130188251 | MICROSCOPE AND INSPECTION APPARATUS - A system including a microscope and an inspection apparatus in which an objective lens having a large numerical aperture is used for detecting a defect existing inside a sample. A light source apparatus produces linearly polarized light. The polarization maintaining fibers optically coupled to the light source apparatus project the linearly polarized light onto the sample surface as an illumination beam of P-polarized light at an incidence angle substantially equal to the Brewster's angle of the sample. The scattered light generated by the defect existing in the sample is emitted from the sample and is collected by the objective lens whose optical axis is perpendicular to the sample surface. Since the illumination beam of P-polarized light is projected at the incidence angle equal to the Brewster's angle of the sample, no surface reflection occurs and it is possible to use the objective lens having a large numerical aperture. | 07-25-2013 |
20120287424 | SUBSTRATE INSPECTION APPARATUS AND MASK INSPECTION APPARATUS - Substrate inspection apparatus, in which the acquisition of the inspection data for a defect and the acquisition of the focus data of the objective lens are performed in parallel, includes an autofocus apparatus for controlling position of the objective lens along its optical axis. The autofocus apparatus includes a focus error detection unit and a focus control signal generation unit for generating a focus control signal for controlling the position of the objective lens for each scan line using a focus data signal composed of an objective position signal or the objective position signal to which a focus error signal is added. When “i” is assumed as a positive integer and “m” is as a natural number, the focus data signal which was acquired during the scanning period of i-th scan line is used to produce the focus control signal used to scan the (i+2m)-th scan line. | 11-15-2012 |
20120026578 | RADIATION SOURCE APPARATUS AND DUV BEAM GENERATION METHOD - The present invention provides a radiation source apparatus which can generate a DUV radiation beam having a wavelength of 193.4 nm efficiently. The radiation source apparatus according to the invention has first wavelength conversion means arranged to receive a first laser beam of a first fundamental wavelength and to generate a fourth-harmonic wavelength of the first fundamental wavelength, second wavelength conversion means arranged to receive the beam of the fourth-harmonic wavelength of the first fundamental wavelength (266 nm) and a second laser beam of a second fundamental wavelength and to sum-frequency mix the fourth-harmonic with the second fundamental wavelength radiation to generate a beam of second DUV radiation having a wavelength between approximately 232 nm and 237 nm, and third wavelength conversion means arranged to receive the beam of second DUV radiation and the third laser beam of a third fundamental wavelength and to sum-frequency mix the second DUV radiation with the third fundamental wavelength radiation to generate third DUV radiation having a wavelength between approximately 192.5 nm and 194.5 nm. | 02-02-2012 |
20110242312 | INSPECTION SYSTEM AND INSPECTION METHOD - According to the invention, the surface of the Sic substrate or the epitaxial layer formed on the Sic substrate using the optical apparatus including the differential interference optical system. The reflected light from the surface of the Sic substrate or the epitaxial layer is received by the line sensor ( | 10-06-2011 |
20110220815 | LIGHT SOURCE APPARATUS - The invention is directed to the provision of a wavelength conversion-type ultraviolet light source apparatus that can obtain a stable output. A light source apparatus according to one mode of the invention includes: a laser light source | 09-15-2011 |
20110134944 | EFFICIENT PULSE LASER LIGHT GENERATION AND DEVICES USING THE SAME - A time delay is introduced in the optical path of the light pulse at fundamental wavelength relative to that for the fourth harmonic light pulse in a set up for generating the 5 | 06-09-2011 |
20090187378 | Depth measurement apparatus and depth measurement method - A depth measurement apparatus and a method capable of measuring a via hole having a high aspect ratio with a high resolution is provided. The depth measurement apparatus in accordance with the present invention is provided with means ( | 07-23-2009 |