| JSR Corporation Patent applications |
| Patent application number | Title | Published |
|---|
| 20160136638 | MICROFLUIDIC DEVICE, PROCESS FOR PRODUCING THE SAME, AND CHANNEL-FORMING PHOTOSENSITIVE RESIN COMPOSITION - The invention is a microfluidic devices having a channel that is microscopic but is free from the risk of the attachment of substrates. A microfluidic device includes a channel in a body, and the channel has a patterned resin composition layer formed from a photosensitive resin composition including an oxiranyl group-containing compound, an oxetanyl group-containing compound and a photoacid generator. | 05-19-2016 |
| 20160131978 | PATTERN FORMING METHOD - A pattern-forming method includes applying an inorganic film-forming composition on an upper face side of a substrate to provide an inorganic film, forming a resist pattern on an upper face side of the inorganic film; and dry-etching once or several times using the resist pattern as a mask such that the substrate has a pattern The inorganic film-forming composition includes a polyacid or a salt thereof, and an organic solvent. The step for forming a resist pattern may include the steps of: applying a resist composition on an upper face side of the inorganic film to provide a resist film; exposing the resist film; and developing the resist film exposed. | 05-12-2016 |
| 20160109801 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD - A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R | 04-21-2016 |
| 20160104893 | COMPOSITION FOR ELECTRICITY STORAGE DEVICES, SLURRY FOR ELECTRICITY STORAGE DEVICES, ELECTRODE FOR ELECTRICITY STORAGE DEVICES, SEPARATOR FOR ELECTRICITY STORAGE DEVICES, AND ELECTRICITY STORAGE DEVICE - An electrical storage device composition can produce an electrode and a separator that exhibit excellent blocking resistance, and can effectively prevent displacement (i.e., achieves moderate blocking) when stacking an electrode and a separator. The electrical storage device composition includes a binder, an anti-blocking agent, and a liquid medium, the content (M1 parts by mass) of the binder and the content (M2 parts by mass) of the anti-blocking agent in the electrical storage device composition satisfying the relationship “1| 04-14-2016 | |
| 20160102213 | SURFACE TREATMENT AGENT FOR SURFACE CONFIGURED FROM INORGANIC MATERIAL, TOOL AND DEVICE HAVING MODIFIED SURFACE, AND METHOD FOR MANUFACTURING TOOL AND DEVICE - A surface treatment method for treating a surface formed of an inorganic material by using a polymer is provided. The polymer contains a repeating unit (A) having a cationic group with a particular structure in a side chain thereof and a repeating unit (B) having a group of a particular structure in a side chain thereof. Also provided are a tool and a device having a modified surface, and a method for producing the tool and the device. | 04-14-2016 |
| 20160097978 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 04-07-2016 |
| 20160085152 | COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PATTERN-FORMING METHOD AND COMPOUND - A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R | 03-24-2016 |
| 20160081189 | COMPOSITION FOR FORMING A CONDUCTIVE FILM, A CONDUCTIVE FILM, A METHOD FOR PRODUCING A PLATING FILM, A PLATING FILM, AND AN ELECTRONIC DEVICE - A composition for forming a conductive film includes at least one of a metal salt (A1) and a metal particle (A2) as component (A) that serves as a metal source of the conductive film, and a metalloxane compound (B). The metal salt (A1) and the metal particle (A2) contain one or more metals selected from the group consisting of Ni, Pd, Pt, Cu, Ag, and Au. The metalloxane compound (B) has at least one metal atom selected from the group consisting of Ti, Zr, Sn, Si, and Al in its main chain. Preferably, the metal salt (A1) is a carboxylate containing a metal selected from the group consisting of Cu, Ag, and Ni. Preferably, the metal particle (A2) has an average particle diameter of 5 nm to 100 nm and comprises a metal selected from the group consisting of Cu, Ag, and Ni. | 03-17-2016 |
| 20160079007 | BINDER COMPOSITION FOR POWER STORAGE DEVICES - A binder composition for power storage devices comprising a polymer which contains at least 3 to 40 mass % of a first recurring unit derived from an unsaturated carboxylic acid ester having an alicyclic hydrocarbon group and 1 to 40 mass % of a second recurring unit derived from an α,β-unsaturated nitrile compound based on 100 mass % of the total of all recurring units. | 03-17-2016 |
| 20160064280 | METHOD FOR FORMING THREE-DIMENSIONAL INTERCONNECTION, CIRCUIT ARRANGEMENT COMPRISING THREE-DIMENSIONAL INTERCONNECTION, AND METAL FILM-FORMING COMPOSITION FOR THREE-DIMENSIONAL INTERCONNECTION - In a method for forming a three-dimensional interconnection, a contact plug is formed within a through hole provided in a substrate and an upper wire formed on an upper side of the substrate and a lower wire formed on a lower side are electrically connected to one another by the contact plug. A coating film is formed on an upper surface of the substrate and inner surface of the through hole by applying a metal film-forming composition containing at least one salt of and a particle of a metal to the substrate provided with the through hole. A metal film is formed by heating the coating film, and plated by filling up the through hole by depositing a conductor on the metal film by a plating process using the metal film as a seed layer. An excess conductor deposited in the plating is removed by a chemical mechanical polishing process. | 03-03-2016 |
| 20160062242 | METHOD FOR MANUFACTURING SUBSTRATE HAVING CONCAVE PATTERN, COMPOSITION, METHOD FOR FORMING CONDUCTIVE FILM, ELECTRONIC CIRCUIT AND ELECTRONIC DEVICE - Provided is a method for manufacturing a substrate having a concave pattern to be used for forming a high-definition pattern while suppressing wet-spreading and bleeding of a film-forming ink, provided is a composition to be used for manufacturing the substrate, and provided are a method for forming a conductive film, an electronic circuit, and an electronic device. | 03-03-2016 |
| 20160062237 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E). | 03-03-2016 |
| 20160057866 | METAL FILM FORMING METHOD AND CONDUCTIVE INK USED IN SAID METHOD - An object of the invention is to provide a simple method capable of easily forming a metal film on a surface of a perforated substrate that is adjacent to the hole in the substrate. The metal film forming method includes a step of heating a perforated substrate having a hole while a surface of the substrate adjacent to the hole is in contact with a conductive ink containing a metal salt and a reducing agent. | 02-25-2016 |
| 20160054616 | ARRAY SUBSTRATE, LIQUID CRYSTAL DISPLAY ELEMENT, AND RADIATION-SENSITIVE RESIN COMPOSITION - An array substrate with an insulation film which can easily be formed and the dielectric properties of which can be controlled, a liquid crystal display element including the array substrate, and a radiation-sensitive resin composition for forming the insulation film are provided. The insulation film is formed on a substrate in which an active element is formed, and then a common electrode, an interlayer insulation film, and a comb-shaped pixel electrode are provided on the insulation film to produce the array substrate. To form the interlayer insulation film, the radiation-sensitive resin composition including [X] an alkali-soluble resin; [Y] oxide particles of at least one metal selected from the group consisting of aluminum, zirconium, titanium, zinc, indium, tin, antimony, and cerium; [Z] a polyfunctional acrylate; [V] a chain transfer agent; and [W] a radiation-sensitive polymerization initiator, is used. The liquid crystal display element includes the array substrate. | 02-25-2016 |
| 20160049324 | STACK, METHOD FOR TREATING SUBSTRATE MATERIAL, TEMPORARY FIXING COMPOSITION, AND SEMICONDUCTOR DEVICE - A stack includes a substrate material that has a circuit surface and that is temporarily fixed on a support via a temporary fixing material. The temporary fixing material includes a temporary fixing material layer (I) that is in contact with the circuit surface of the substrate material and a temporary fixing material layer (II) that is formed on the support-facing surface of the layer (I). The temporary fixing material layer (I) is formed of a temporary fixing composition (i) that includes a thermoplastic resin (Ai), a polyfunctional (meth)acrylate compound (Bi), and a radical polymerization initiator (Ci), and the temporary fixing material layer (II) is formed of a temporary fixing composition (ii) that includes a thermoplastic resin (Aii) and a release agent (Dii). | 02-18-2016 |
| 20160032227 | CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD - A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. The cleaning composition preferably further contains an organic acid which is a non-polymeric acid. The organic acid is preferably a polyhydric carboxylic acid. The acid dissociation constant of the polymer is preferably less than that of the organic acid. The solubility of the organic acid in water at 25° C. is preferably no less than 5% by mass. The organic acid is preferably a solid at 25° C. | 02-04-2016 |
| 20160006034 | ELECTRODE ACTIVE MATERIAL, ELECTRODE AND ELECTRICAL STORAGE DEVICE - The present invention relates to an electrode active material, an electrode and an electrical storage device. The electrode active material includes a carbon material and has not less than 0.020 mmol/g of basic functional groups. | 01-07-2016 |
| 20150368387 | METHOD FOR PRODUCING HYDROGENATED CONJUGATED DIENE POLYMER | 12-24-2015 |
| 20150364332 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD - An inorganic film-forming composition for multilayer resist processes includes a complex that includes: metal atoms; at least one bridging ligand; and a ligand which is other than the at least one bridging ligand and which is derived from a hydroxy acid ester, a β-diketone, a β-keto ester, a β-dicarboxylic acid ester or a combination thereof. The at least one bridging ligand includes a first bridging ligand derived from a compound represented by formula (1). An amount of the first bridging ligand is no less than 50 mol % with respect to a total of the bridging ligand. In the formula (1), R | 12-17-2015 |
| 20150361210 | TIRE MEMBER, HYDROGENATED CONJUGATED DIENE POLYMER, AND POLYMER COMPOSITION - Provided is a tire member which is satisfactory in low fuel consumption performance and exhibits higher strength and more excellent abrasion resistance as compared with conventional ones. The tire member is a tire member obtained by subjecting a composition containing a hydrogenated conjugated diene polymer and a crosslinking agent to a crosslinking treatment, wherein the hydrogenated conjugated diene polymer is a hydrogenated product of a conjugated diene polymer that has a structural unit derived from butadiene and has a functional group at one end or both ends and the functional group is one or more groups selected from the group consisting of an amino group, an imino group, a pyridyl group, a phosphino group, a thiol group, and a hydrocarbyloxysilyl group. | 12-17-2015 |
| 20150355550 | PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION METHOD - A method for producing a semiconductor element includes applying a photoresist composition on a surface of an inorganic substrate to provide a resist film. The photoresist composition includes a polymer comprising an acid-labile group, and an acid generator. The resist film is exposed. The exposed resist film is developed with a developer solution containing an organic solvent to form a negative resist pattern. Ions are implanted into the inorganic substrate using the negative resist pattern as a mask. The photoresist composition preferably further contains a compound including a carboxy group, a sulfo group, a group represented by formula (i), a group capable of generating the carboxy group, the sulfo group or the group represented by the formula (i) by an action of an acid, a lactonic carbonyloxy group or a combination thereof, and having a molecular weight of no greater than 1,000. | 12-10-2015 |
| 20150355546 | COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND - A composition for silicon-containing film formation includes a polysiloxane compound and a solvent. The polysiloxane compound includes a structure represented by formula (Q2), a structure represented by formula (Q3) and a structure represented by formula (Q4). A value of q calculated according to formula (I) is no greater than 0.25, wherein q1 to q4 represent integrated intensities of | 12-10-2015 |
| 20150355539 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND - A radiation-sensitive resin composition includes a polymer including a structural unit that includes an acid-labile group; and a compound represented by formula (1). R | 12-10-2015 |
| 20150344739 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD - A chemical mechanical polishing aqueous dispersion includes colloidal silica (A), an anionic water-soluble polymer (B), and at least one type of an alkanolamine salt (C) selected from the group consisting of an alkyl sulfate and an alkyl ether sulfate, the chemical mechanical polishing aqueous dispersion having a pH of 1 to 4. | 12-03-2015 |
| 20150337245 | CLEANING COMPOSITION AND CLEANING METHOD - A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof, (B) an organic acid, (C) a water-soluble amine, (D) a water-soluble polymer, and an aqueous medium, the cleaning composition having a pH of 9 or more. | 11-26-2015 |
| 20150331165 | RED PIXEL, GREEN PIXEL AND COLOR FILTER AND DISPLAY DEVICE - A red pixel has a chromaticity coordinate in the CIE colorimetric system in use by a light emitting element containing quantum dots as a light source, satisfying 0.670≦x≦0.680, and a film thickness of 3.0 μm or less. A green pixel has a chromaticity coordinate in the CIE colorimetric system in use by the light emitting element as a light source, satisfying 0.690≦x≦0.710, and a film thickness of 3.0 μm or less. The color filter has at least one of the red pixel and the green pixel. A display device comprises a color filter having at least one of the red pixel and the green pixel, and the light emitting element containing quantum dots. | 11-19-2015 |
| 20150323870 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R′ represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer. | 11-12-2015 |
| 20150323866 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND - A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), R | 11-12-2015 |
| 20150322578 | METHOD FOR MANUFACTURING MEMBRANE-ELECTRODE ASSEMBLY, MEMBRANE-ELECTRODE ASSEMBLY, LAMINATE FOR FORMING MEMBRANE-ELECTRODE ASSEMBLY, POLYMER ELECTROLYTE FUEL CELL AND WATER-ELECTROLYSIS DEVICE - Laminates (A) that each have a catalyst layer and an electrolyte membrane are obtained either by disposing catalyst layers on one surface of each of a plurality of the electrolyte membranes, or by coating the catalyst layers with an electrolyte membrane forming composition. A membrane electrode assembly is then obtained either by layering the laminates (A) together with the electrode membrane sides facing each other, or by layering a laminate (A) and an electrolyte membrane (a) together such that one side of the electrolyte membrane (a) is in contact with the electrolyte membrane of the laminate (A) and then disposing a catalyst layer on the other side of the electrolyte membrane (a). | 11-12-2015 |
| 20150309406 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND - A photoresist composition containing: a polymer including an acid-labile group; a radiation-sensitive acid generator; and an acid diffusion control agent that contains a compound represented by a formula (1). In the formula (1), R | 10-29-2015 |
| 20150301445 | COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD - A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. | 10-22-2015 |
| 20150291441 | CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION - A container containing a cobalt carbonyl complex and a gas that contains carbon monoxide, and a cobalt carbonyl complex composition comprising a cobalt carbonyl complex and a solvent, wherein the concentration of carbon monoxide dissolved in the solvent is 0.001 to 1 wt %. | 10-15-2015 |
| 20150285971 | SOLID-STATE IMAGE CAPTURE ELEMENT OPTICAL FILTER AND APPLICATION THEREOF - An object of the present invention is to provide a solid-state image capture element optical filter having excellent visible light transmission characteristics with reduced incidence angle dependence even in the near-ultraviolet wavelength region, in which the defects of conventional optical filters such as near-infrared cut filters are improved; and a device comprising the optical filter. The solid-state image capture element optical filter of the present invention comprises: a transparent resin substrate comprising a compound (X) having an absorption maximum in a wavelength range of 300 to 420 nm and a compound (Y) having an absorption maximum in a wavelength range of 600 to 800 nm; and a near infrared-reflecting film on at least one side of the substrate. | 10-08-2015 |
| 20150284539 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD - A composition for film formation includes a hydrolysis compound and a solvent composition. The hydrolysis compound is a hydrolysis product of a metal compound including a hydrolyzable group, a hydrolytic condensation product of the metal compound, a condensation product of the metal compound and a compound represented by formula (1), or a combination thereof. The metal compound includes a metal element from group 3, 4, 5, 6, 7, 8, 9, 10, 11, 12 or 13, or a combination thereof. The solvent composition includes an alcohol organic solvent, and a non-alcohol organic solvent that does not include an alcoholic hydroxyl group and that include a group including a hetero atom. | 10-08-2015 |
| 20150277223 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed. | 10-01-2015 |
| 20150267046 | COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM, AND FORMING METHOD OF RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD - A composition for film formation includes a compound represented by formula (1), and a solvent. R | 09-24-2015 |
| 20150259452 | FUNCTIONALIZED HIGH CIS-1,4-POLYBUTADIENE PREPARED USING NOVEL FUNCTIONALIZING AGENTS - In general the present invention provides a functionalized polymer prepared by a process comprising the steps of preparing a pseudo-living polymer by polymerizing conjugated monomer with a lanthanide-based catalyst, and reacting the pseudo-living polymer with a functionalizing agent defined by the formula (I) | 09-17-2015 |
| 20150253671 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes a crosslinkable group in a side chain thereof. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure. | 09-10-2015 |
| 20150253670 | PATTERN-FORMING METHOD AND COMPOSITION - A pattern-forming method includes forming a prepattern that is insoluble or hardly soluble in an organic solvent. A resin layer is provided on at least a lateral face of the prepattern. The prepattern and the resin layer are heated such that an adjacent portion of the resin layer to the prepattern is made insoluble or hardly soluble in the organic solvent, without being accompanied by an increase of a molecular weight of the prepattern and the resin layer. A portion of the resin layer other than the adjacent portion of the resin layer is removed. The resin layer is formed from a first composition including a first polymer and an organic solvent. Solubility of the first polymer in the organic solvent does not substantially change due to an action of an acid. A weight average molecular weight of the first polymer is 15,000-150,000. | 09-10-2015 |
| 20150253663 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers, and an acid generator. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes an acid-labile group in a side chain thereof. The acid generator generates an acid upon application of energy. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure. | 09-10-2015 |
| 20150252216 | PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION - A pattern-forming method includes providing a coating film using a composition that includes: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film. Phase separation is caused in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed. | 09-10-2015 |
| 20150252133 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER, POLYMER COMPOSITION, CROSSLINKED POLYMER AND TIRE - A modified conjugated diene polymer obtained by modifying a conjugated diene polymer that is obtained by polymerizing a conjugated diene compound or polymerizing a conjugated diene compound and an aromatic vinyl compound is produced by a production method comprising a first modification step wherein an unsaturated binding site at least either in the skeleton or at the side chain of the conjugated diene polymer is reacted with a first compound having a group 4 or 13 element of the periodic table. | 09-10-2015 |
| 20150240039 | COMPOSITION FOR PRODUCING PROTECTIVE FILM, PROTECTIVE FILM, AND ELECTRICAL STORAGE DEVICE - A composition for forming a protective film that is placed between a positive electrode and a negative electrode of an electrical storage device, includes polymer particles (A1), polymer particles (A2), and a liquid medium, the polymer particles (A1) including a repeating unit derived from a compound that includes two or more polymerizable unsaturated groups in an amount of less than 15 parts by mass based on 100 parts by mass of the polymer particles (A1), and the polymer particles (A2) including a repeating unit derived from a compound that includes two or more polymerizable unsaturated groups in an amount of 20 to 100 parts by mass based on 100 parts by mass of the polymer particles (A2). | 08-27-2015 |
| 20150225601 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a block copolymer and a solvent. The block copolymer is capable of forming a phase separation structure through directed self-assembly. The block copolymer includes a first block and a second block. The first block includes a first repeating unit which includes at least two silicon atoms. The second block includes a second repeating unit which does not include a silicon atom. A sum of the atomic weight of atoms constituting the first repeating unit is no greater than 700. | 08-13-2015 |
| 20150213968 | ELECTRICAL STORAGE DEVICE ELECTRODE BINDER COMPOSITION, ELECTRICAL STORAGE DEVICE ELECTRODE SLURRY, ELECTRICAL STORAGE DEVICE ELECTRODE, AND ELECTRICAL STORAGE DEVICE - An electrode binder composition that is used to produce an electrode used for an electrical storage device, includes (A) a polymer, (B) a carboxylic acid or a salt thereof, and (C) a liquid medium, and has a concentration of the carboxylic acid or a salt thereof (B) of 20 to 1000 ppm. | 07-30-2015 |
| 20150203734 | HEAT STORAGE MATERIAL COMPOSITION - A heat storage material composition comprising:
| 07-23-2015 |
| 20150198882 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar | 07-16-2015 |
| 20150197664 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A composition for forming a resist underlayer film includes (A) a compound. The compound (A) includes a group represented by formula (1). R represents a monovalent organic group having 1 to 30 carbon atoms. The monovalent organic group represented by R does not include an oxygen atom at an end of the side adjacent the sulfur atom. * represents a bonding hand. The compound (A) preferably includes a ring which is an aromatic ring, a heteroaromatic ring, or a combination thereof. The bonding hand denoted by * in the group represented by the formula (1) is preferably linked directly or via an oxygen atom to the ring. | 07-16-2015 |
| 20150197041 | LIGHT IRRADIATION MOLDING APPARATUS AND LIGHT IRRADIATION MOLDING METHOD - A light irradiation molding apparatus | 07-16-2015 |
| 20150191829 | PATTERN-FORMING METHOD - A pattern-forming method includes providing a metal-containing film directly or indirectly on a substrate. A directed self-assembling film is provided directly or indirectly on the metal-containing film such that a plurality of phases of the directed self-assembling film is formed. At least a part of the plurality of phases of the directed self-assembling film is removed such that a pattern of the directed self-assembling film is formed. The metal-containing film and the substrate are sequentially etched using the pattern of the directed self-assembling film as a mask. | 07-09-2015 |
| 20150187581 | BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD - A base film-forming composition includes a compound including a group capable of reacting with Si—OH or Si—H, and a solvent. The base film-forming composition is for forming a base film provided between a layer including a silicon atom and a directed self-assembling film in a directed self-assembly lithography process. The receding contact angle of the base film for pure water is no less than 70° and no greater than 90°. The compound is preferably represented by formula (1). In the formula (1), A represents a linking group having a valency of (m+n); D represents a monovalent organic group having at least 10 carbon atoms; E represents the group capable of reacting with Si—OH or Si—H; and m and n are each independently an integer of 1 to 200. | 07-02-2015 |
| 20150187516 | BINDER COMPOSITION FOR ELECTRICAL STORAGE DEVICE ELECTRODES, SLURRY FOR ELECTRICAL STORAGE DEVICE ELECTRODES, ELECTRICAL STORAGE DEVICE ELECTRODE, AND ELECTRICAL STORAGE DEVICE - An electrical storage device electrode binder composition includes a polymer (A) and a liquid medium (B), the polymer (A) including a repeating unit (A4) derived from an unsaturated carboxylic acid in an amount of 5 to 40 parts by mass based on 100 parts by mass of the total repeating units included in the polymer (A), the polymer (A) being polymer particles, and the polymer particles having a surface acid content of more than 1 mmol/g and 6 mmol/g or less. | 07-02-2015 |
| 20150185613 | COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1. | 07-02-2015 |
| 20150185604 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R | 07-02-2015 |
| 20150183914 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER, MODIFIED CONJUGATED DIENE POLYMER, POLYMER COMPOSITION, CROSSLINKED POLYMER, AND TIRE - A modified conjugated diene-based polymer is produced that is a modified product of a conjugated diene-based polymer obtained by polymerizing a conjugated diene compound, or polymerizing a conjugated diene compound and an aromatic vinyl compound, in the presence of an alkali metal compound or an alkaline-earth metal compound. The modified conjugated diene-based polymer is produced by a production method that includes a main chain modification step that reacts at least either an unsaturated bond or a functional group that is included in a terminal-modified polymer and is not situated at a terminal of the terminal-modified polymer, with a specific compound that includes a functional group that interacts with silica, the terminal-modified polymer being obtained by introducing a functional group that interacts with silica into at least one terminal of the conjugated diene-based polymer. | 07-02-2015 |
| 20150177616 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION - A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A | 06-25-2015 |
| 20150174795 | MOLDING APPARATUS AND THERMOPLASTIC MOLDED PRODUCT MANUFACTURING METHOD - A light-irradiation molding apparatus includes: a pair of rubber mold portions each including rubber material having a property of transmitting light and forming a cavity on respective opposing sides that are fitted together; and a light irradiation mechanism providing light irradiation to particulate thermoplastic resin placed in the cavity, through a surface of the pair of rubber mold portions. The light-irradiation molding apparatus is configured to bring the pair of rubber mold portions close to each other while melting the thermoplastic resin placed in the cavity by the light irradiation provided by the light irradiation mechanism to mold a molded product of the thermoplastic resin in the cavity with a reduced volume. | 06-25-2015 |
| 20150160556 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 06-11-2015 |
| 20150093704 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST-PATTERNING METHOD, AND BLOCK COPOLYMER - A radiation-sensitive resin composition includes (A) a block copolymer, and (B) an acid-generating agent. The block copolymer (A) includes a polymer block (I), a polymer block (II), and a moiety contained in the polymer block (I), the polymer block ( | 04-02-2015 |
| 20150093703 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD - The present invention relates to a radiation-sensitive resin composition that contains: a compound that has a structure represented by the following formula (1); a first polymer that includes a fluorine atom; and a solvent. In the following formula (1), X represents a carbonyl group, a sulfonyl group or a single bond. Y | 04-02-2015 |
| 20150093508 | COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD - A composition for pattern formation includes a block copolymer that includes a block represented by formula (I) and a block represented by formula (II). R | 04-02-2015 |
| 20150086925 | SULFONIC ACID ESTER CONTAINING POLYMERS FOR ORGANIC SOLVENT BASED DUAL-TONE PHOTORESISTS - Provided are chemically amplified resist compositions that include acid-labile sulfonate-ester photoresist polymers that are developable in an organic solvent. The chemically amplified resists produce high resolution positive tone development (PTD) and negative tone development (NTD) images depending on the selection of organic development solvent. Furthermore, the dissolution contrast of the traditional chemically amplified resists may be optimized for dual tone imaging through the addition of a photoresist polymer comprising an acid-labile sulfonate-ester moiety. | 03-26-2015 |
| 20150079520 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD - An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R | 03-19-2015 |
| 20150050600 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 02-19-2015 |
| 20150050205 | CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION - A container containing a cobalt carbonyl complex and a gas that contains carbon monoxide, and a cobalt carbonyl complex composition comprising a cobalt carbonyl complex and a solvent, wherein the concentration of carbon monoxide dissolved in the solvent is 0.001 to 1 wt %. | 02-19-2015 |
| 20150048273 | PRODUCTION PROCESS FOR ELECTRODE MATERIAL, ELECTRODE AND ELECTRIC STORAGE DEVICE - The present invention relates to a production process for an electrode material, an electrode and an electric storage device, and the production process for an electrode material comprises a step of heating a polymer having a silicon-containing unit and a silicon-non-containing unit. | 02-19-2015 |
| 20150048051 | RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION - A resist pattern-forming method is provided, including: providing a resist film using a photoresist composition; exposing the resist film; and developing the resist film exposed, the photoresist composition containing a polymer having a weight average molecular weight of no less than 1,000 and no greater than 7,500 and having a structural unit that includes an acid-labile group that is dissociated by an action of an acid, a radiation-sensitive acid generator and a solvent composition, and the photoresist composition having a content of solids of no less than 20% by mass and no greater than 60% by mass. The photoresist composition preferably has a viscosity of no less than 50 mPa·s and no greater than 150 mPa·s at 25° C. | 02-19-2015 |
| 20150048046 | METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION - A pattern-forming method in which processibility of a silicon-containing film in etching with a fluorine gas and resistance against etching with an oxygen gas can be together improved in a multilayer resist process to form a finer pattern. Provided is a pattern-forming method that includes the steps of (1) providing a silicon-containing film on the upper face side of a substrate to be processed using a polysiloxane composition; (2) forming a resist pattern on the silicon-containing film; (3) dry-etching the silicon-containing film using the resist pattern as a mask to form a silicon-containing pattern; and (4) dry-etching the substrate to be processed using the silicon-containing pattern as a mask to form a pattern, in which the polysiloxane composition includes (A) a polysiloxane containing a fluorine atom, and (B) a crosslinking accelerator. | 02-19-2015 |
| 20150045470 | ANTIBODY PURIFICATION METHOD, AND CARRIER FOR USE IN PURIFICATION OF ANTIBODY - An antibody purification method includes: bringing a solution that includes an antibody and has a pH of 3.0 or more and less than 5.6 into contact with a carrier that includes a 2,3-dihydroxypropyl group to adsorb the antibody on the carrier; and bringing the carrier that has been brought into contact with the solution, into contact with an eluent having a pH of 5.6 or more and less than 10 to elute the antibody from the carrier. | 02-12-2015 |
| 20150010866 | RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION - A resist pattern-forming method includes forming a resist film using a photoresist composition. The resist film is exposed. The exposed resist film is developed. The photoresist composition includes an acid generator and a polymer. The acid generator generates a protonic acid upon application of exposure light. The protonic acid generates a proton. The polymer includes a first structural unit which includes a first group. The first group and the proton form a cationic group. The polymer substantially does not include a structural unit which includes an acid-labile group. | 01-08-2015 |
| 20140377707 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND - A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R | 12-25-2014 |
| 20140371466 | PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid. | 12-18-2014 |
| 20140363773 | PATTERN-FORMING METHOD - A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R | 12-11-2014 |
| 20140363769 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE - A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R | 12-11-2014 |
| 20140357784 | MODIFIED CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING SAME - A modified conjugated diene polymer, which can be used as a raw material of a cross-linked polymer for automobile tires, is prepared by a method including a step of polymerizing a monomer having a conjugated diene compound etc. in the presence of a compound of formula (1) or (2) and an alkali metal compound to obtain a conjugated diene polymer, and a step of reacting the polymer and a compound of formula (3). | 12-04-2014 |
| 20140357759 | RUBBER COMPOSITION, RUBBER ELASTOMER, TIRE AND BLOCK COPOLYMER - A rubber composition by which a rubber elastic body having both of excellent low rolling resistance and wet skid resistance and also having excellent mechanical strength and wear resistance can be obtained, a rubber elastic body, a tire, and a block copolymer are provided. The rubber composition of the present invention comprises a block copolymer (A) comprising a block (a-1) of a conjugate diene and an aromatic vinyl and a block (a-2) of a conjugate diene or the diene and an aromatic vinyl, a specific polymer (B) other than the copolymer, and a filler (C), wherein the block copolymer (A) has a specific functional group; the block copolymer (A) has two glass transition temperatures separated from each other by 5° C. or more within a range of −100 to 20° C. in measurement in accordance with ASTM D3418; and the ratio of the block copolymer (A) is 10% by mass or more when the sum of the block copolymer (A) and the polymer (B) is taken as 100% by mass. | 12-04-2014 |
| 20140350146 | NEAR-INFRARED CUT FILTER AND DEVICE INCLUDING NEAR-INFRARED CUT FILTER - The present invention provides a near-infrared cut filter comprises a resin substrate (I) which comprises a resin and a light absorber (A) having a structure derived from a compound represented by the following Formula (I), wherein the light absorber (A) is contained in the resin substrate (I) in an amount of 0.001 to 0.01 parts by weight with respect to 100 parts by weight of the resin. | 11-27-2014 |
| 20140342288 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND - The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO | 11-20-2014 |
| 20140309363 | METHOD FOR PRODUCING DENATURED CONJUGATED DIENE POLYMER - A method for producing a conjugated diene polymer usable as a raw material of a crosslinked polymer which is used for use in tires of automobiles and can enhance low fuel consumption performance of automobiles is provided. | 10-16-2014 |
| 20140302438 | RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, AND RESIST SOLVENT - A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate. | 10-09-2014 |
| 20140275422 | METHOD FOR PRODUCING MODIFIED POLYMER AND HYDROGENATED PRODUCT THEREOF - A method for producing a modified polymer or a hydrogenated product thereof, includes polymerizing a monomer in a polymerization solvent which includes a hydrocarbon-based solvent, using a polymerization initiator to obtain a reaction solution. A functional group is introduced into the modified polymer or the hydrogenated product thereof, using a compound having the functional group protected with a silyl group. The reaction solution is separated into a solvent fraction including the hydrocarbon-based solvent, and a solid fraction including the modified polymer or the hydrogenated product thereof. The solvent fraction separated from the reaction solution is distilled to obtain a low-boiling fraction including the hydrocarbon-based solvent and a silanol compound. At least part of the silanol compound is removed from the low-boiling fraction by liquid-liquid extraction. At least part of a raffinate of the low-boiling fraction is recycled as a polymerization solvent. | 09-18-2014 |
| 20140272722 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar | 09-18-2014 |
| 20140272523 | PROTECTIVE FILM AND COMPOSITION FOR PREPARING THE SAME, SLURRY, AND ELECTRICAL STORAGE DEVICE - An electrical storage device includes a cathode, an anode, a protective film that is provided between the cathode and the anode, and an electrolyte solution, the protective film including a polymer that includes a repeating unit derived from a fluorine-containing monomer, and a repeating unit derived from an unsaturated carboxylic acid. | 09-18-2014 |
| 20140264202 | OPTICAL FILTER, AND SOLID-STATE IMAGE PICKUP DEVICE AND CAMERA MODULE USING THE OPTICAL FILTER - The problem of the present invention is to overcome drawbacks of conventional optical filters such as near-infrared cut filters and to provide an optical filter which generates little scatted light even during light absorption and has excellent transmittance property. The optical filter of the present invention is characterized by containing a squarylium-based compound and a compound which absorbs or quenches fluorescence of the squarylium-based compound. The optical filter of the present invention preferably contains a near-infrared absorbing dye containing a squarylium compound (A) and at least one compound (B) selected from the group consisting of a phthalocyanine-based compound (B-1) and a cyanine-based compound (B-2). | 09-18-2014 |
| 20140255854 | PATTERN-FORMING METHOD - A pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The resist film is exposed. The exposed resist film is developed using a developer having an organic solvent content of 80 mass % or more. The photoresist composition includes a first polymer, a second polymer, and an acid generator. The first polymer is a base polymer and includes a first structural unit that includes an acid-labile group. The second polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content of the first polymer. The second structural unit is represented by a formula (1) or a formula (2). | 09-11-2014 |
| 20140248563 | COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER - A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R | 09-04-2014 |
| 20140242526 | POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST - Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties. | 08-28-2014 |
| 20140238956 | DIRECTED SELF-ASSEMBLING COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A directed self-assembling composition for pattern formation includes a block copolymer. The block copolymer includes a polystyrene block having a styrene unit, and a polyalkyl (meth)acrylate block having an alkyl (meth)acrylate unit. The block copolymer has a group that is bound to at least one end of a main chain of the block copolymer and that includes a hetero atom. | 08-28-2014 |
| 20140234777 | PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THEREOF, AND ELECTRONIC PART - It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive composition includes a resin (A) having a phenolic hydroxyl group, a crosslinking agent (B1) having at least two oxazoline groups and a crosslinking agent (B2) having at least two groups represented by —CH | 08-21-2014 |
| 20140221563 | METHOD FOR PRODUCING DENATURED CONJUGATED DIENE POLYMER - A method for producing a modified conjugated diene polymer usable as a raw material of a crosslinked polymer which is used for use in tires and the like of automobiles and can enhance low fuel consumption performance of automobiles and the like is provided. | 08-07-2014 |
| 20140220783 | PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION - A pattern-forming method includes providing a resist underlayer film on a substrate using a resist underlayer film-forming composition. The resist underlayer film-forming composition includes a first polymer having a glass transition temperature of 0 to 180° C. A silicon-based oxide film is provided on a surface of the resist underlayer film. A resist pattern is provided on a surface of the silicon-based oxide film using a resist composition. The silicon-based oxide film and the resist underlayer film are sequentially dry-etched using the resist pattern as a mask. The substrate is dry-etched using the dry-etched resist underlayer film as a mask. | 08-07-2014 |
| 20140217322 | LITHIUM ION CAPACITOR - A lithium-ion capacitor includes a non-aqueous electrolyte solution that includes (A) a compound represented by the following general formula (1), (B) a cyclic carbonate ester that includes at least one carbon-carbon unsaturated bond, and (C) a carboxylic ester, the non-aqueous electrolyte solution having a ratio (M | 08-07-2014 |
| 20140212813 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND - A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R | 07-31-2014 |
| 20140194557 | NEW POLYMER, SURFACE HYDROPHILIZING AGENT CONTAINING SAID POLYMER, AND MANUFACTURING METHOD FOR SUBSTRATE HAVING HYDROPHILIC SURFACE - To provide a novel polymer having an excellent non-specific adsorption inhibitory effect, a surface-hydrophilizing agent comprising the polymer, and a method for producing a substrate having a hydrophilic surface. | 07-10-2014 |
| 20140186771 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND - A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R | 07-03-2014 |
| 20140178825 | DEVELOPER - A developer includes an organic solvent and a nitrogen-containing compound. The developer is configured to develop a resist film to form a negative resist pattern. The resist film is formed using a photoresist composition. The photoresist composition includes a polymer and a radiation-sensitive acid generator. The polymer includes a structural unit including an acid-labile group. | 06-26-2014 |
| 20140173893 | METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY, LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DEVICE - A method for producing a liquid crystal display includes providing a first substrate having a first electrode and a second electrode on a surface of the first substrate. The first and the second electrodes are made of conductive films. A liquid crystal aligning agent is applied to the surface of the first substrate to form an alignment film on the first substrate. The liquid crystal aligning agent includes at least one of: a polymer that includes a photoalignment structure and a polymerizable carbon-carbon double bond; a polymer that includes a photoalignment structure, and a component that includes a polymerizable carbon-carbon double bond; or a polymer that includes a photoalignment structure and a polymerizable carbon-carbon double bond, and a component that includes a polymerizable carbon-carbon double bond. The second substrate is provided to form a liquid crystal cell. Light is applied to the liquid crystal cell. | 06-26-2014 |
| 20140162190 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70° or more. | 06-12-2014 |
| 20140154610 | AROMATIC COPOLYMER HAVING PROTON CONDUCTIVE GROUP AND USES THEREOF - An aromatic copolymer comprises a hydrophilic segment (A) and a hydrophobic segment (B), wherein the hydrophilic segment (A) comprises a structural unit (1) having a proton conductive group, and the hydrophobic segment (B) comprises at least one structural unit selected from the group consisting of a structural unit (2) and a structural unit (3), wherein the structural unit (2) is a divalent structural unit having an aromatic ring and no proton conductive groups and having two bonding sites at the para-position of one ring included in the aromatic ring, and the structural unit (3) is a divalent structural unit having a benzene ring and is a structural unit different from the structural unit (2), the hydrophobic segment (B) in its entirety contained in the aromatic copolymer including both the structural unit (2) and the structural unit (3). | 06-05-2014 |
| 20140147794 | METHOD OF FORMING PHOTORESIST PATTERN - A method of forming a photoresist pattern includes providing a photoresist film on a substrate. An upper layer film is provided on the photoresist film using an upper layer film-forming composition. Radiation is applied to the upper layer film and the photoresist film through a mask having a given pattern via an immersion medium. The upper layer film and the photoresist film are developed using a developer to form a photoresist pattern. The upper layer film-forming composition includes a resin soluble in the developer and a solvent component. The solvent component includes a first solvent, a second solvent shown by a general formula (2), and a third solvent shown by a general formula (3). The first solvent is diethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol diethyl ether, γ-butyrolactone, methyl propylene diglycol, methyl propylene triglycol or a mixture thereof. | 05-29-2014 |
| 20140145126 | PHOTOSENSITIVE COMPOSITION, COLORANT DISPERSION SOLUTION, LIGHT FILTER AND LIGHT SENSOR - A photosensitive composition, suitable for a hardened film capable of sufficiently blocking light in the visible range and sufficiently transmitting light in the near infrared region, is provided. The photosensitive composition contains a colorant, a compound having an ethylenic unsaturated group, a photopolymerization initiator and a solvent. The colorant contains (A1) to (A3); | 05-29-2014 |
| 20140134544 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 05-15-2014 |
| 20140134331 | METHOD FOR PRODUCING SUBSTRATE WITH METAL BODY - Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium. | 05-15-2014 |
| 20140100339 | FUNCTIONALIZED HIGH CIS-1,4-POLYBUTADIENE PREPARED USING NOVEL FUNCTIONALIZING AGENTS - In general the present invention provides a functionalized polymer prepared by a process comprising the steps of preparing a pseudo-living polymer by polymerizing conjugated monomer with a lanthanide-based catalyst, and reacting the pseudo-living polymer with a functionalizing agent defined by the formula (I) | 04-10-2014 |
| 20140093826 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND - A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R | 04-03-2014 |
| 20140080066 | DOUBLE PATTERNING METHOD - A double patterning method includes providing a first resist film on a substrate using a first photoresist composition. The first resist film is exposed. The exposed first resist film is developed using a first developer to form a first resist pattern. A second resist film is provided in at least space areas of the first resist pattern using a second photoresist composition. The second resist film is exposed. The exposed second resist film is developed using a second developer that includes an organic solvent to form a second resist pattern. The first resist pattern is insoluble or scarcely soluble in the second developer. | 03-20-2014 |
| 20140051799 | MODIFIED CONJUGATED DIENE RUBBER, METHOD FOR PRODUCING SAME, AND RUBBER COMPOSITION - A method containing a step of reacting a conjugated diene polymer having an alkali metal or alkaline earth metal active end with a hydrocarbyloxysilane compound having one or more of each of the following functional groups I and II in its molecule to obtain a modified conjugated diene polymer containing a functional group II, and a step of mixing the modified conjugated diene polymer and a compound such as organic acid. A modified conjugated diene rubber which can be used as a raw material of a cross-linked rubber which can be used in tire treads and the like and can enhance low fuel consumption performance is provided. The functional group I is a hydrocarbyloxysilyl group. The functional group II is a nitrogen-containing group in which both of two hydrogen atoms of a primary amino group are substituted with protective groups. | 02-20-2014 |
| 20140048512 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. R | 02-20-2014 |
| 20140038041 | ELECTRODE FOR ELECTRICITY STORAGE DEVICE, SLURRY FOR ELECTRODE, BINDER COMPOSITION FOR ELECTRODE, AND ELECTRICITY STORAGE DEVICE - An electrical storage device electrode includes a collector, and an active material layer that is formed on a surface of the collector, the active material layer including at least a polymer and an active material, and the active material layer having a polymer distribution coefficient of 0.6 to 1.0 and a density of 1.3 to 1.8 g/cm | 02-06-2014 |
| 20140031522 | NOVEL ALKALI-RESISTANT VARIANTS OF PROTEIN A AND THEIR USE IN AFFINITY CHROMATOGRAPHY - The present invention relates to immunoglobulin (Ig)-binding proteins with alkali-resistance properties. In one embodiment, the present invention provides for a variant of an Ig-binding protein, the variant comprising the Ig-binding protein having at least one asparagine residue substituted with a histidine, a serine, an aspartic acid or a threonine residue. The at least one substitution may confer to the variant Ig-binding protein an increased stability in alkaline solutions when compared to the wild-type Ig-binding. The present invention relates also to matrices for affinity separation of immunoglobulins comprising the Ig-binding proteins of the present invention, and to methods of using the Ig-binding proteins of the present invention to separate immunoglobulins from mixture compositions. | 01-30-2014 |
| 20140030660 | MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RESIST PROCESS INORGANIC FILM-FORMING COMPOSITION - A multilayer resist process pattern-forming method includes providing an inorganic film over a substrate. A protective film is provided on the inorganic film. A resist pattern is provided on the protective film. A pattern is provided on the substrate by etching that utilizes the resist pattern as a mask. A multilayer resist process inorganic film-forming composition includes a compound, an organic solvent, and a crosslinking accelerator. The compound includes a metal compound that includes a hydrolyzable group, a hydrolysate of a metal compound that includes a hydrolyzable group, a hydrolysis-condensation product of a metal compound that includes a hydrolyzable group, or a combination thereof. The compound includes at least one metal element belonging to Group 6, Group 12, or Group 13 of the Periodic Table of the Elements. | 01-30-2014 |
| 20140030592 | ELECTRODE BINDER COMPOSITION, ELECTRODE SLURRY, ELECTRODE, AND ELECTRICAL STORAGE DEVICE - An electrode binder composition is used to produce an electrode used for an electrical storage device, and includes (A) a polymer, (B) a compound represented by the following general formula (1), and (C) a liquid medium, the polymer (A) being fluorine-containing polymer particles or diene polymer particles, and a concentration of the compound (B) in the electrode binder composition being 5 to 500 ppm. | 01-30-2014 |
| 20140023968 | RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM - A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film | 01-23-2014 |
| 20140018479 | RUBBER COMPOSITION AND MANUFACTURING PROCESS THEREFOR, AND TIRE - A rubber composition that can obtain a rubber elastic body having small rolling resistance and excellent impact resilience and a method for producing the same, and a tire having small rolling resistance and excellent impact resilience are provided. | 01-16-2014 |
| 20140014928 | ORGANIC EL ELEMENT, RADIATION-SENSITIVE RESIN COMPOSITION, AND CURED FILM - The organic EL display element is constituted by having a substrate, a TFT disposed on the substrate, a protective film covering the TFT, an anode disposed on the protective film, an organic luminescent layer disposed on the anode, a bank that defines an arranging area for the organic luminescent layer, and a cathode disposed on the organic luminescent layer. At least one of the protective film and bank is constituted as a cured film that is formed by using a radiation-sensitive resin composition containing a resin and a compound having a quinonediazide structure, contains a resin and at least one of a compound having a quinonediazide structure and a compound having an indenecarboxylic acid structure, and has an excellent patterning property. | 01-16-2014 |
| 20140014620 | RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD - A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NR | 01-16-2014 |
| 20140011360 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD FOR SEMICONDUCTOR DEVICE - A chemical mechanical polishing aqueous dispersion of the invention includes (A) a first water-soluble polymer having a weight average molecular weight of 500,000 to 2,000,000 and including a heterocyclic ring in its molecule, (B) a second water-soluble polymer or its salt having a weight average molecular weight of 1000 to 10,000 and including one group selected from a carboxyl group and a sulfonic group, (C) an oxidizing agent, and (D) abrasive grains, and has a pH of 7 to 12. | 01-09-2014 |
| 20140004463 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | 01-02-2014 |
| 20130345335 | RUBBER COMPOSITION, METHOD FOR PRODUCING SAME, AND TIRE - A rubber composition that can obtain a rubber elastic body having small rolling resistance and excellent impact resilience and a method for producing the same, and a tire having small rolling resistance and excellent impact resilience are provided. The rubber composition of the present invention is obtained by kneading a conjugated diene polymer having a functional group bondable to silica, an acylate compound containing metal and silica. In the present invention, a polymer having no functional group bondable to silica is preferably kneaded as a rubber component other than the conjugated diene polymer, together with the conjugated diene polymer having a functional group bondable to silica, the acylate compound containing metal and the silica. | 12-26-2013 |
| 20130341304 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM - A resist underlayer film-forming composition includes a polymer having a glass transition temperature (Tg) of 0 to 180° C. The resist underlayer film-forming composition is used for a multilayer resist process. The multilayer resist process includes forming a silicon-based oxide film on a surface of a resist underlayer film, and subjecting the silicon-based oxide film to wet etching. | 12-26-2013 |
| 20130337385 | NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION - A negative pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The photoresist composition includes a first polymer and an organic solvent. The first polymer includes a first structural unit having an acid-generating capability. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 12-19-2013 |
| 20130324667 | RUBBER COMPOSITION, PRODUCTION METHOD THEREFOR AND TIRE - Objects of the present invention are to provide a rubber composition that can obtain a rubber elastic body having small rolling resistance and excellent impact resilience and a method for producing the same, and to provide a tire having small rolling resistance and excellent impact resilience. The rubber composition of the present invention is obtained by kneading a conjugated diene polymer (A) having a group with bonding reactivity to silica only at one site of one molecule of the polymer, a polymer (B) having groups with bonding reactivity to silica at a plurality of sites of one molecule of the polymer, and a filler (C) containing silica. | 12-05-2013 |
| 20130324659 | RUBBER COMPOSITION, METHOD FOR PRODUCING SAME, AND TIRE - A rubber composition which can obtain a rubber elastic body having small rolling resistance and excellent impact resilience and a method for producing the same, and a tire having small rolling resistance and excellent impact resilience are provided. | 12-05-2013 |
| 20130324657 | RUBBER COMPOSITION, METHOD FOR PRODUCING SAME, AND TIRE - Objects of the present invention are to provide a rubber composition that can obtain a rubber elastic body having small rolling resistance and excellent impact resilience and a method for producing the same, and to provide a tire having small rolling resistance and excellent impact resilience. | 12-05-2013 |
| 20130323653 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a radiation-sensitive resin composition on a substrate to form a resist film. The radiation-sensitive resin composition includes an acid-labile group-containing polymer and a photoacid generator. The resist film is exposed. The resist film is developed using a developer including an organic solvent in an amount of no less than 80% by mass to a total amount of the developer. The radiation-sensitive resin composition has a contrast value γ of from 5.0 to 30.0. The contrast value γ is calculated from a resist dissolution contrast curve obtained by changing only a dose of a light used for exposing the resist film. | 12-05-2013 |
| 20130323588 | ELECTRODE BINDER COMPOSITION, ELECTRODE SLURRY, ELECTRODE, ELECTROCHEMICAL DEVICE, METHOD FOR PRODUCING ELECTRODE BINDER COMPOSITION, AND METHOD FOR STORING ELECTRODE BINDER COMPOSITION - An electrode binder composition includes polymer particles. The polymer particles include 5 to 40 parts by mass of a constituent unit (A) derived from an alpha,beta-unsaturated nitrile compound, and 0.3 to 10 parts by mass of a constituent unit (B) derived from an unsaturated carboxylic acid, and have a number average particle size of 50 to 400 nm. The electrode binder composition has a gel content of 90 to 99% and an electrolyte solution swelling ratio of 110 to 400%. | 12-05-2013 |
| 20130316892 | METHOD FOR PRODUCING POLYMER PARTICLES, AND POLYMER PARTICLES - Provided are polymer particles which can be used at a high flow rate when used as a filler for chromatography, that is, has excellent resistance flow rate appropriate for processing in large quantities, and also has a high binding capacity for target molecules such as proteins when an appropriate ligand is contained in the particles, and a method for producing the polymer particles; specifically, crosslinked polymer particles and a method for producing the crosslinked polymer particles, polysaccharide composite particles and a method for producing the polysaccharide composite particles, a filler for chromatography using the polymer particles, and an adsorbent for antibody purification. Disclosed are: A. a method for producing polysaccharide composite particles, the method including the following steps (1) to (3): (1) a step of preparing a polysaccharide solution, in which two or more kinds of polysaccharides are dissolved in an ionic liquid; (2) a step of preparing a droplet dispersion liquid of the polysaccharide solution, in which liquid droplets of the polysaccharide solution are dispersed in an organic solvent having low compatibility with the ionic liquid; and (3) a coagulation step in which a composite of the polysaccharides are coagulated to obtain the polysaccharide composite particles; and B. a method for producing a crosslinked polymer particle, the method including a step of allowing a polymer dissolved in an ionic liquid, to react with a crosslinking agent while the polymer is subjected to droplet dispersion in an organic solvent having low compatibility with the ionic liquid. | 11-28-2013 |
| 20130316621 | CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME - A chemical mechanical polishing pad includes a polishing layer that is formed of a composition that includes a polyurethane, the polishing layer having a specific gravity of 1.1 to 1.3 and a thermal conductivity of 0.2 W/m·K or more. | 11-28-2013 |
| 20130316287 | PHOTORESIST COMPOSITION - A photoresist composition includes a base polymer, a polymer and an acid generator. The base polymer includes a first structural unit that includes an acid-labile group. The polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content of the base polymer. The photoresist composition is developed using an organic solvent. The second structural unit is represented by a formula (1) or a formula (2). R | 11-28-2013 |
| 20130316154 | STEREOLITHOGRAPHY RESIN COMPOSITIONS AND THREE-DIMENSIONAL OBJECTS MADE THEREFROM - A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group. | 11-28-2013 |
| 20130310514 | RESIST UNDERLAYER FILM-FORMING COMPOSITION - A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R | 11-21-2013 |
| 20130296481 | MODIFIED CONJUGATED DIENE RUBBER, METHOD FOR PRODUCING SAME, AND RUBBER COMPOSITION - According to a method for producing a modified conjugated diene rubber, the method involves a step of obtaining a modified conjugated diene rubber by reacting a conjugated diene compound or a conjugated diene polymer which is obtained by polymerizing a conjugated diene compound and an aromatic vinyl compound and has an alkali metal or alkaline-earth metal active end, with a first hydrocarbyloxysilane compound having an alkyl polyether group and a group convertible into an onium, and a conjugated diene rubber which can be used as a starting material for a crosslinked rubber that is used in applications such as a tire tread and is capable of improving the low fuel consumption performance is provided. | 11-07-2013 |
| 20130286545 | ELECTRICAL STORAGE DEVICE, LITHIUM ION CAPACITOR AND NEGATIVE ELECTRODE FOR LITHIUM ION CAPACITOR - An electrical storage device includes a positive electrode, and a negative electrode having a negative electrode active material layer containing a fluorine-containing acrylic binder, the negative electrode active material layer having a density of not less than 0.75 g/cc and not more than 1.10 g/cc. | 10-31-2013 |
| 20130285217 | SUBSTRATE TREATING METHOD, TEMPORARY FIXING COMPOSITION AND SEMICONDUCTOR DEVICE - The invention provides a substrate treating method which can favorably prevent damages to a substrate when the substrate is separated from a support, thus achieving a high yield. The substrate treating method includes, in the sequence set forth, a step | 10-31-2013 |
| 20130280658 | RADIATION-SENSITIVE COMPOSITION, AND COMPOUND - A radiation-sensitive composition includes a compound represented by a formula (1), and a polymer having a structural unit that includes an acid-labile group. In the formula (1), R | 10-24-2013 |
| 20130260241 | BINDER COMPOSITION FOR BATTERIES, SLURRY FOR BATTERY ELECTRODES, SOLID ELECTROLYTE COMPOSITION, ELECTRODE, AND ALL-SOLID-STATE BATTERY - A binder composition for batteries, including (A) a polymer that has at least one structural unit selected from the group consisting of structural units represented by the following formulae (a1) to (a5), respectively, and (f) a functional group containing a nitrogen atom, an oxygen atom, a silicon atom, a germanium atom, a tin atom or a combination thereof; and (B) a liquid medium, the polymer (A) having a solubility of no less than 5 g in 100 g of cyclohexane at 25° C. and 1 atom. | 10-03-2013 |
| 20130256264 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polysiloxane, and a solvent composition. The solvent composition includes an organic solvent which includes a compound represented by the following formula (1) or a carbonate compound and which has a standard boiling point of no less than 150.0° C. R | 10-03-2013 |
| 20130245192 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE RUBBER, MODIFIED CONJUGATED DIENE RUBBER, AND RUBBER COMPOSITION - This invention relates to a method for producing a modified conjugated diene rubber wherein the method involves: (a) a step in which a conjugated diene polymer having an alkali metal or alkaline earth metal active end and obtained by polymerizing a conjugated diene compound or by polymerizing a conjugated diene compound with an aromatic vinyl compounds is reacted with a first alkoxysilane compound which has an alkoxysilyl group having two or more alkoxy groups and has a group protected by a protecting group wherein deprotection is possible to obtain a modified conjugated-diene polymer having an alkoxysilyl group; and (b) a step in which the modified conjugated-diene polymer is reacted with a second alkoxysilane compound which has an alkoxysilyl group. | 09-19-2013 |
| 20130245167 | RESIN COMPOSITION, INSULATING FILM, FILM FORMING METHOD, AND ELECTRONIC PART - A resin composition containing: a polymer having at least one structural unit (i) selected from a group consisting of a structural unit represented by formula (1) and a structural unit represented by formula (2); and at least one organic solvent selected from a group consisting of ether solvents, ketone solvents, ester solvents and amide solvents. | 09-19-2013 |
| 20130244185 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT - A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R | 09-19-2013 |
| 20130233826 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polysiloxane, and an organic solvent composition. The organic solvent composition includes an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C., and an organic solvent having a standard boiling point of no less than 150.0° C. In the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass. | 09-12-2013 |
| 20130233825 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polysiloxane and a solvent. The solvent includes an organic solvent having a standard boiling point of no less than 150.0° C., and water. A content of the organic solvent is no less than 1% by mass and no greater than 50% by mass with respect to a total amount of the solvent. A content of water is no less than 1% by mass and no greater than 30% by mass with respect to the total amount of the solvent. | 09-12-2013 |
| 20130230804 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION - A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A | 09-05-2013 |
| 20130230803 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed with a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a base polymer, a fluorine-atom-containing polymer, a radiation-sensitive acid generator, a solvent, and a compound. The base polymer has an acid-labile group. The fluorine-atom-containing polymer has a content of fluorine atoms higher than a content of fluorine atoms of the base polymer. The compound has a relative permittivity greater than a relative permittivity of the solvent by at least 15. A content of the compound is no less than 10 parts by mass and no greater than 200 parts by mass with respect to 100 parts by mass of the base polymer. | 09-05-2013 |
| 20130230666 | COMPOSITION FOR FORMING ALUMINUM-CONTAINING FILM, AND METHOD FOR FORMING ALUMINUM-CONTAINING FILM - A composition for forming an aluminum-containing film includes an organic solvent, and an organic aluminum compound. The organic aluminum compound has a structure represented by a general formula (1). In the general formula (1), each of R | 09-05-2013 |
| 20130224889 | CHARGED PARTICLE BEAM APPARATUS, THIN FILM FORMING METHOD, DEFECT CORRECTION METHOD AND DEVICE FORMING METHOD - A charged particle beam apparatus is provided that enables faster semiconductor film deposition than the conventional deposition that uses silicon hydrides and halides as source gases. The charged particle beam apparatus includes a charged particle source | 08-29-2013 |
| 20130224666 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed using a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer and a radiation-sensitive acid generator. The polymer has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and includes a first structural unit that includes an acid-labile group. The polymer includes less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group. | 08-29-2013 |
| 20130224661 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid. | 08-29-2013 |
| 20130220930 | CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE - A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid. | 08-29-2013 |
| 20130217850 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER - An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1). | 08-22-2013 |
| 20130216961 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN - A composition for forming an upper layer film includes a solvent and a resin component including a first resin having a first repeating unit and a second repeating unit. The first repeating unit is a repeating unit represented by a formula (1-1), a repeating unit represented by a formula (1-2), a repeating unit represented by a formula (1-3), or a combination thereof. The second repeating unit is a repeating unit represented by a formula (2-1), a repeating unit represented by a formula (2-2), or both thereof. The composition is to be used for forming the upper layer film in liquid immersion lithography. | 08-22-2013 |
| 20130216951 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND - A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R | 08-22-2013 |
| 20130216948 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD - A radiation-sensitive resin composition for forming a resist film includes a polymer including a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). The first structural unit and the second structural unit are included in an identical polymer molecule or different polymer molecules. R | 08-22-2013 |
| 20130213894 | CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE - A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid. | 08-22-2013 |
| 20130209875 | ELECTRODE BINDER COMPOSITION, ELECTRODE SLURRY, ELECTRODE, AND ELECTRICAL STORAGE DEVICE - An electrode binder composition is used to produce an electrode used for an electrical storage device, and includes (A) a polymer, (B) a compound represented by the following general formula (1), and (C) a liquid medium, the polymer (A) being fluorine-containing polymer particles or diene polymer particles, and a concentration of the compound (B) in the electrode binder composition being 5 to 500 ppm. | 08-15-2013 |
| 20130206727 | PATTERN-FORMING METHOD - A pattern-forming method includes forming a prepattern on a substrate. A space other than a space in which the prepattern is formed on the substrate is filled with a resin composition containing a compound which is diffusible into the prepattern. The compound is diffused into a part of the prepattern. Portions in which the compound is undiffused in the prepattern are removed using a removing liquid. | 08-15-2013 |
| 20130203000 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD - A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R | 08-08-2013 |
| 20130189907 | CHEMICAL-MECHANICAL POLISHING PAD AND CHEMICAL-MECHANICAL POLISHING METHOD - A chemical mechanical polishing pad includes a polishing layer, a recess being formed in a polishing surface of the polishing layer, the polishing layer including a surface layer that forms at least an inner side of the recess, and a ratio (D1/D2) of an average opening ratio D1(%) to an average opening ratio D2(%) being 0.01 to 0.5, the average opening ratio D1 being an average opening ratio of the inner side of the recess when the polishing layer has been immersed in water at 23° C. for 1 hour, and the average opening ratio D2 being an average opening ratio of a cross section of the polishing layer that does not intersect the surface layer when the cross section has been immersed in water at 23° C. for 1 hour. | 07-25-2013 |
| 20130189621 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND - A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R | 07-25-2013 |
| 20130183624 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R | 07-18-2013 |
| 20130172481 | RUBBER COMPOSITION AND PROCESS FOR PRODUCTION THEREOF, AND TIRE - A rubber composition that can be used in applications such as automotive tires and can improve the fuel efficiency performance and driving stability of automobiles and the like, a method for producing a rubber composition, and a tire using the same are provided. | 07-04-2013 |
| 20130164695 | METHOD FOR FORMING PATTERN - A method for forming a pattern includes providing a first positive-working radiation-sensitive resin composition on a substrate to form a first resist layer. The first positive-working radiation-sensitive resin composition includes a crosslinking agent, a polymer containing an acid-unstable group and not containing a crosslinking group, a radiation-sensitive acid generator, and a solvent. The first resist layer is exposed selectively to radiation, and developed to form a first resist pattern. The first resist pattern is made inactive to radiation, or insolubilized in an alkaline developer or in a second positive-working radiation-sensitive resin composition. The second positive-working radiation-sensitive resin composition is provided on the substrate to form a second resist layer. The second resist layer is exposed selectively to radiation, and developed to form a second resist pattern in the space area of the first resist pattern. | 06-27-2013 |
| 20130153535 | RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD - A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NR | 06-20-2013 |
| 20130149644 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND - A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each R | 06-13-2013 |
| 20130149538 | CARRIER POLYMER PARTICLE, PROCESS FOR PRODUCING THE SAME, MAGNETIC PARTICLE FOR SPECIFIC TRAPPING, AND PROCESS FOR PRODUCING THE SAME - A process for producing carrier polymer particles comprising covering the surface of organic polymer particles having a particle diameter of 0.1 to 20 micrometers with a saccharide by chemically bonding the organic polymers and the saccharide. | 06-13-2013 |
| 20130143160 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND - A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator. | 06-06-2013 |
| 20130130179 | POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD - A polysiloxane composition includes a polysiloxane, and a first compound. The first compound includes a nitrogen-containing heterocyclic ring structure, and a polar group, an ester group or a combination thereof. A pattern-forming method includes coating the polysiloxane composition on a substrate to be processed to provide a silicon-containing film. A resist composition is coated on the silicon-containing film to provide a resist coating film. The resist coating film is selectively irradiated with a radioactive ray through a photomask to expose the resist coating film. The exposed resist coating film is developed to form a resist pattern. The silicon-containing film and the substrate to be processed are sequentially dry etched using the resist pattern as a mask. | 05-23-2013 |
| 20130130012 | NOVEL POLYMER, METHOD FOR MANUFACTURING THE SAME, AND FILM - A polymer comprising: at least one structural unit (i) selected from the group consisting of a structural unit represented by formula (1) below and a structural unit represented by formula (2) below, wherein a terminal structure of said polymer is independently a structural unit represented by formula (5) below or a structural unit represented by formula (6) below. | 05-23-2013 |
| 20130128361 | OPTICAL FILTER AND IMAGING DEVICE COMPRISING THE SAME - An optical filter comprising a substrate and a dielectric multilayer film formed on at least one surface of the substrate, wherein the substrate comprises an aromatic polyether-based polymer having a glass transition temperature (Tg), measured via differential scanning calorimetry (DSC, heating rate: 20° C./min), of from 230 to 350° C. | 05-23-2013 |
| 20130122426 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND - A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator. | 05-16-2013 |
| 20130108965 | RADIATION-SENSITIVE COMPOSITION | 05-02-2013 |
| 20130108962 | RADIATION-SENSITIVE COMPOSITION | 05-02-2013 |
| 20130107235 | PATTERN-FORMING METHOD | 05-02-2013 |
| 20130101942 | METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A resist pattern-forming method capable of forming a resist pattern excellent in pattern collapse resistance in the case of development with the organic solvent in multilayer resist processes. The method has the steps of: (1) providing a resist underlayer film on a substrate using a composition for forming a resist underlayer film; (2) providing a resist film on the resist underlayer film using a photoresist composition; (3) exposing the resist film; and (4) developing the exposed resist film using a developer solution containing no less than 80% by mass of an organic solvent, in which the composition for forming a resist underlayer film contains (A) a component that includes a polysiloxane chain and that has a carboxyl group, a group that can generate a carboxyl group by an action of an acid, an acid anhydride group or a combination thereof. | 04-25-2013 |
| 20130098870 | METHOD FOR FORMING PATTERN - A method for forming a pattern includes providing a composition to form a resist underlayer film on a surface of a substrate to be processed. The composition contains a calixarene based compound having a group represented by a following formula (i) bound to at least a part of an aromatic ring or at least a part of a heteroaromatic ring of the calixarene based compound. The resist underlayer film on the surface of the substrate is treated with heat or an acid. A resist pattern is formed on a surface of the resist underlayer film. The resist underlayer film and the substrate are etched using the resist pattern as a mask to form the pattern on the substrate. The dry-etched resist underlayer film is removed from the substrate with a basic solution. | 04-25-2013 |
| 20130095428 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a compound represented by a following formula (1) and a base polymer. In the formula (1), R | 04-18-2013 |
| 20130089817 | PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD - A photoresist composition includes a polymer that includes a first structural unit shown by a formula (1), and an acid generator. R | 04-11-2013 |
| 20130085236 | POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF - A polyarylene block copolymer can provide a solid polymer electrolyte and proton conductive membrane having high proton conductivity, high dimensional stability, and high mechanical strength. The polyarylene block copolymer also has reduced swelling in hot water and reduced shrinkage in drying. The polyarylene block copolymer includes a polymer segment having a sulfonic acid group, and a polymer segment having substantially no sulfonic acid group. | 04-04-2013 |
| 20130085228 | MODIFIED CONJUGATED DIENE RUBBER, METHOD FOR PRODUCING SAME, AND RUBBER COMPOSITION - By a method comprising a process including (a) producing a modified conjugated diene polymer through reaction of a conjugated diene polymer having an alkali metal or alkaline-earth metal active terminal with a first alkoxysilane compound which has both an alkoxysilyl group and at least one group convertible into an onium, and (b) mixing the modified conjugated diene polymer, an agent for producing onium, a second alkoxysilane compound having an alkoxysilyl group and at least one group convertible into an onium and a condensation catalyst containing metal element(s) for alkoxysilane compounds, conjugated diene rubber usable as a starting material of cross-linked rubber which is used for a tire tread or the like and allows enhancement of low fuel consumption property can be obtained. | 04-04-2013 |
| 20130085199 | FILLER FOR AFFINITY CHROMATOGRAPHY - Provided is a filler for affinity chromatography having a high dynamic binding capacity for proteins and having excellent alkali resistance and storage stability. The filler for affinity chromatography of the present invention comprises a porous particle consisting of a copolymer of 40 parts to 99.5 parts by mass of (M-1) a methacryloyl group-containing vinyl monomer that contains a hydroxyl group and does not contain an epoxy group, 0.5 parts to 30 parts by mass of (M-2) an epoxy group-containing vinyl monomer, 0 parts to 59.5 parts by mass of (M-3) a methacryloyl group-containing vinyl monomer which is other than the monomers (M-1) and (M-2), and 0 parts to 25 parts by mass of (M-4) a vinyl monomer other than the monomers (M-1), (M-2) and (M-3) (with the proviso that the total amount of the contents of (M-1), (M-2), (M-3) and (M-4) is 100 parts by mass); ring-opened epoxy group obtainable by ring-opening of epoxy group that is contained in the copolymer; and ligand that is bound to the porous particle. | 04-04-2013 |
| 20130084705 | METHOD FOR FORMING PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A method for forming a pattern includes providing a resist underlayer film on a substrate using a first composition for forming a resist underlayer film. The first composition includes a polymer having a structural unit represented by a following formula (1). In the formula (1), Ar | 04-04-2013 |
| 20130084524 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM AND METHOD FOR FORMING RESIST PATTERN - A composition for forming a liquid immersion upper layer film, includes a first polymer, a second polymer and a solvent. The first polymer includes a first structural unit having a group represented by a following formula (i). In the formula (i), n is an integer of 1 to 3, and R | 04-04-2013 |
| 20130084394 | INSULATION PATTERN-FORMING METHOD AND INSULATION PATTERN-FORMING MATERIAL - An insulation pattern-forming method includes forming an organic pattern on a substrate. A space defined by the organic pattern is filled with an insulating material. The organic pattern is removed to obtain an inverted pattern formed of the insulating material. The inverted pattern is cured. An insulation pattern-forming method includes forming a first organic pattern on the substrate. A space defined by the first organic pattern is filled with an insulating material. An upper surface of the first organic pattern is exposed. A second organic pattern that comes in contact with the upper surface of the first organic pattern is formed. A space defined by the second organic pattern is filled with the insulating material. The first organic pattern and the second organic pattern are removed to obtain an inverted pattern formed of the insulating material. The inverted pattern is cured. | 04-04-2013 |
| 20130078579 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND - A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R | 03-28-2013 |
| 20130078571 | PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN - A photoresist composition includes a first polymer, a second polymer and a third polymer. The first polymer has a fluorine atom and a first structural unit that includes a hydrophilic group. The second polymer has a fluorine atom a second structural unit that includes an alkali-dissociable group. The third polymer has an acid-dissociable group. The first polymer, the second polymer and the third polymer are different with one another. It is preferred that the first structural unit is represented by a following formula, and the second structural unit is represented by a following formula (2). | 03-28-2013 |
| 20130065186 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT - A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R | 03-14-2013 |
| 20130059252 | METHOD FOR FORMING RESIST PATTERN AND COMPOSITION FOR FORMING PROTECTIVE FILM - A method for forming a resist pattern includes providing a resist film. A protective film is provided on the resist film using a composition for forming the protective film. The composition includes a polymer and an organic solvent. The resist film on which the protective film is provided is exposed to irradiation with EUV light or an electron beam. The exposed resist film is developed. | 03-07-2013 |
| 20130053526 | POLYMER - A polymer includes a repeating unit shown by a following general formula (1). R | 02-28-2013 |
| 20130052530 | ELECTRICAL STORAGE DEVICE ELECTRODE BINDER COMPOSITION, ELECTRICAL STORAGE DEVICE ELECTRODE SLURRY, ELECTRICAL STORAGE DEVICE ELECTRODE, AND ELECTRICAL STORAGE DEVICE - An electrode binder composition that is used to produce an electrode used for an electrical storage device, includes (A) a polymer, (B) a carboxylic acid or a salt thereof, and (C) a liquid medium, and has a concentration of the carboxylic acid or a salt thereof (B) of 20 to 1000 ppm. | 02-28-2013 |
| 20130045446 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND - A radiation-sensitive resin composition includes a sulfonium compound represented by a general formula (1), and a first polymer that serves as a base resin. R represents a group represented by a general formula (2). n | 02-21-2013 |
| 20130041135 | FILLER FOR AFFINITY CHROMATOGRAPHY AND METHOD FOR ISOLATING IMMUNOGLOBULIN - Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier. | 02-14-2013 |
| 20130037957 | FLUX COMPOSITION, PROCESS FOR PRODUCING ELECTRICALLY CONNECTED STRUCTURES, ELECTRICALLY CONNECTED STRUCTURE, AND SEMICONDUCTOR DEVICE - A flux composition includes an alditol (A) and a polymer (B) which has a repeating structural unit represented by Formula (1): | 02-14-2013 |
| 20130030116 | FILM, RESIN COMPOSITION AND POLYMER - Provided is a film comprising a polymer that comprises a structural unit represented by the following formula (1), wherein at least part of the terminal structure of the polymer is at least one structure selected from the group consisting of structural units represented by the following formula (2) and structural units represented by the following formula (3). | 01-31-2013 |
| 20130023650 | FILLER FOR AFFINITY CHROMATOGRAPHY - Provided is a filler for affinity chromatography which is useful for protein purification and contains porous particles that have a high dynamic binding capacity for proteins and excellent pressure characteristics. The filler for affinity chromatography of the present invention is characterized in that it includes a porous particle consisting of a polymer of vinyl monomer including a cross-linkable vinyl monomer that contains hydroxyl group but does not contain epoxy group and an epoxy group-containing non-cross-linkable vinyl monomer, or a cross-linkable vinyl monomer that contains hydroxyl group and epoxy group, ligands bound to the porous particle, and ring-opened epoxy groups. | 01-24-2013 |
| 20130023623 | PROCESS FOR PRODUCTION OF MODIFIED CONJUGATED DIENE RUBBER, MODIFIED CONJUGATED DIENE RUBBER, AND RUBBER COMPOSITION - To provide a producing method of conjugated diene rubber which can be used as a starting material of cross-linked rubber which is used for such as tire tread and can enhance low fuel consumption performance. | 01-24-2013 |
| 20130022926 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the polymer being 50 mol % or more based on total structural units included in the polymer. The first structural unit is preferably a structural unit shown by a formula (a1-1). | 01-24-2013 |
| 20130022912 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND - A radiation-sensitive resin composition includes a first polymer having a structural unit represented by a following formula (1), and a radiation-sensitive acid generator. R | 01-24-2013 |
| 20130017402 | COPOLYMER LATEX AND COMPOSITION CONTAINING THE SAME AND APPLICATION PRODUCT THEROFAANM Kobayashi; KunihikoAACI Minato-kuAACO JPAAGP Kobayashi; Kunihiko Minato-ku JPAANM Sakata; KatsuhikoAACI Minato-kuAACO JPAAGP Sakata; Katsuhiko Minato-ku JPAANM Iwamoto; TsukasaAACI Minato-kuAACO JPAAGP Iwamoto; Tsukasa Minato-ku JPAANM Matsuda; NobuhiroAACI Minato-kuAACO JPAAGP Matsuda; Nobuhiro Minato-ku JPAANM Ishikawa; OsamuAACI Minato-kuAACO JPAAGP Ishikawa; Osamu Minato-ku JP - To provide a copolymer latex having a small particle size, which has a sufficient adhesion strength as a binder and a low viscosity and excellent handling properties in a composition containing a filler and the like, a composition for coating paper using the copolymer latex, and a coated paper having a coating layer formed by the composition. | 01-17-2013 |
| 20130012618 | RESIN COMPOSITION, POLYMER, CURED FILM AND ELECTRONIC PART - Provided are a resin composition capable of forming a cured film excellent in elongation properties; a polymer suitable as a component contained in the composition; a cured film formed from the composition; and an electronic part including the cured film. The resin composition includes (A) a polymer containing a structural unit represented by the formula (a1) and a structural unit represented by the formula (a2); and (F) a solvent, | 01-10-2013 |
| 20130005219 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME - A chemical mechanical polishing aqueous dispersion includes (A) silica particles that include at least one functional group selected from the group consisting of a sulfo group or salts thereof, and (B) an acidic compound. | 01-03-2013 |
