HUETTINGER ELEKTRONIK GMBH + CO. KG Patent applications |
Patent application number | Title | Published |
20140125315 | DETERMINING HIGH FREQUENCY OPERATING PARAMETERS IN A PLASMA SYSTEM - Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90° with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter. | 05-08-2014 |
20130214680 | Plasma Supply Device - A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite. | 08-22-2013 |
20130187545 | Ignition Circuit for Igniting a Plasma fed with Alternating Power - In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element. | 07-25-2013 |
20130134890 | Arc Extinction Arrangement and Method for Extinguishing Arcs - In a method for extinguishing an arc in a gas discharge chamber in which power is supplied to a gas discharge chamber and in which both with a current flow in a first direction and with a current flow in a second inverse direction there is produced a gas discharge, when an arc is identified, the power supply to the gas discharge chamber is interrupted, and residual energy which is in a supply line to the gas discharge chamber and/or in the gas discharge chamber is supplied to an energy store. | 05-30-2013 |
20130038226 | Plasma Supply Arrangement Having Quadrature Coupler - A plasma supply arrangement for supplying power to a plasma load has a quadrature coupler which has at least one capacitance and at least one inductivity and which is suitable for coupling together two HF power signals of the same frequency which are phase-shifted relative to each other by 90°, an HF power signal being supplied respectively at a first useful signal connection and at a second useful signal connection of the quadrature coupler as a useful signal, to form a coupled HF power which can be output as a useful signal at a third useful signal connection, at least one useful signal connection being configured for a first impedance. The quadrature coupler has a fourth useful signal connection which is configured for a second impedance which is higher than the first impedance, or has only three useful signal connections. | 02-14-2013 |
20120306564 | MANAGING A TEMPERATURE OF A SEMICONDUCTOR SWITCHING ELEMENT - In a method for operating a plasma installation, an induction heating installation or a laser excitation installation in a pulsed power output operation, includes controlling at least one semiconductor switching element to produce a power loss in the at least one semiconductor switching element during a pulse pause time period in a pulse pause operation during which no power suitable for the ignition or the operation of the plasma process, the induction heating process, or the laser excitation process is produced at a power output of a power generator by the at least one semiconductor switching element of the power generator, and such that a reduction of a temperature of the at least one semiconductor switching element by more than a predetermined value is prevented. | 12-06-2012 |
20120101642 | Plasma and Induction Heating Power Supply Systems and Related Methods - In some aspects, a power supply system for a plasma application and/or an induction heating system includes at least two controllable power generators of different types. Each controllable power generator includes an associated identifier, and at least one operating unit for controlling at least one of the power generators, the operating unit includes an operating application to import the respective identifiers from the power generators that are connected to the operating application, and based on generator-specific configuration data that are stored for each power generator and the identifiers, the operating application constructs a graphic user interface on a display device of the operating unit. | 04-26-2012 |
20120097666 | Systems for Operating Multiple Plasma and/or Induction Heating Systems and Related Methods - In some aspects of the invention, a system for operating a plurality of plasma and/or induction heating processing systems includes an operating unit that has a display device on which a graphic user interface can be displayed, at least two power generators that supply power to a plasma process or an induction heating process, and a network that connects the operating unit to the power generators to transmit signals between the operating unit and the power generators. The graphic user interface includes a static region and a dynamic region, and a selection device for selecting information to be displayed in the dynamic region. | 04-26-2012 |
20110279121 | Method of Detecting Arc Discharge in a Plasma Process - An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal. | 11-17-2011 |
20100327749 | Controlled Plasma Power Supply - A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter. | 12-30-2010 |
20100225411 | Impedance Matching - In an impedance matching circuit selectively operable in a normal matching mode and a protection mode, the impedance matching circuit includes a set of reactances in a first reactance arrangement configured to transform an impedance of a load to an impedance within a range of a nominal impedance of an HF generator in the normal matching mode, and a PIN diode switch having a first invariable switching state in the normal matching mode and a second switchomg state that reconfigures the set of reactances into a second reactance arrangement in the protection mode, such that the second reactance arrangement is configured to transform the impedance of the load to prevent damage to the HF generator or to transmission circuitry arranged between the HF generator and the load. | 09-09-2010 |
20100194280 | Plasma Supply Device - A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite. | 08-05-2010 |
20100171428 | DRIVING SWITCHES OF A PLASMA LOAD POWER SUUPLY - Operation of a plasma supply device having at least one switching bridge with at least two switching elements, and configured to deliver a high frequency output signal having a power of >500 W and a substantially constant fundamental frequency>3 MHz to a plasma load is accomplished by determining at least one operating parameter, at least one environmental parameter of at least one switching element and/or a switching bridge parameter, determining individual drive signals for the switching elements taking into account the at least one operating parameter, the at least one environmental parameter and/or the switching bridge parameter, and individually driving the switching elements with a respective drive signal. | 07-08-2010 |
20100171427 | Protecting High-Frequency Amplifers - In one aspect, protecting high frequency (HF) amplifiers of a plasma supply device configured to deliver >500 W at a substantially constant fundamental frequency >3 MHz is accomplished by: driving two HF amplifiers with two drive signals having a common frequency and a predetermined phase shift with respect to one another; generating two HF source signals using the HF amplifiers, the HF source signals coupled in a coupler to form a HF output signal; transmitting the HF output signal to the plasma load; measuring electrical variables related to the load impedances seen by the two HF amplifiers; determining whether the load impedance seen by one of the HF amplifiers lies outside a predetermined range; and adjusting the phase shift of the two drive signals, wherein neither of the load impedances seen by the HF amplifiers lies outside the predetermined range. | 07-08-2010 |
20100170640 | DETERMINING HIGH FREQUENCY OPERATING PARAMETERS IN A PLASMA SYSTEM - Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90° with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter. | 07-08-2010 |
20100026415 | Measuring Power - One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation | 02-04-2010 |
20090289034 | Operating a Plasma Process - A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps:
| 11-26-2009 |
20090219075 | Full Bridge Arrangement - A full bridge that produces an alternating output signal can be driven by operating switching elements of the full bridge in each period in a switching sequence that determines the order of the activation and deactivation of the switching elements. The switching elements are switched in at least two different switching sequences, a first switching sequence is repeated n times before a second switching sequence is carried out, with n>1, or the switching elements are switched in at least three different switching sequences. | 09-03-2009 |
20090140722 | MEASUREMENT SIGNAL PROCESSING - In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi | 06-04-2009 |
20090117288 | VACUUM PLASMA GENERATOR - Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler. | 05-07-2009 |
20090027937 | High frequency power supply - A high frequency power supply, in particular a plasma supply device, for generating an output power greater than 1 kW at a basic frequency of at least 3 MHz with at least one switch bridge, which has two series connected switching elements, wherein one of the switching elements is connected to a reference potential varying in operation, and is activated by a driver, and wherein the driver has a differential input with two signal inputs and is connected to the reference potential varying in operation. | 01-29-2009 |
20090027936 | RF POWER SUPPLY - An RF power supply, in particular a plasma supply device, for generating an output power greater than 500 W at an output frequency of at least 3 MHz includes at least one inverter connectable to a DC power supply, which inverter comprises at least one switching element and an output network. An accompanying line connects an electrical component to the inverter by a lead-in of the output network. | 01-29-2009 |
20090026968 | PLASMA SUPPLY DEVICE - A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately. | 01-29-2009 |
20090026964 | High Frequency Power Supply - For determining a wave running time between a RF source in a plasma power supply device and a load connected to the plasma power supply device, an RF pulse is transmitted forwards from the RF source to the load. The pulses are reflected by the load and transmitted backwards to the power source. A return time measured on arrival of the pulse(s) at the inverter is used to determine a wave running time. | 01-29-2009 |
20090026181 | RADIO FREQUENCY POWER SUPPLY - A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply. | 01-29-2009 |
20090015314 | HIGH FREQUENCY EXCITATION SYSTEM - A power module is adapted to be connected to a voltage source and to supply power to a load. The power module includes a power transistor; and a gate controller for driving the power transistor. The gate controller includes a gate transformer, and an impulse generator that extends a negative drive phase of a gate voltage to the power transistor relative to a positive drive phase of the gate voltage to the power transistor. | 01-15-2009 |
20080284344 | POWER SUPPLY UNIT FOR GAS DISCHARGE PROCESSES - A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process. | 11-20-2008 |
20080257869 | RESPONDING TO ARC DISCHARGES - For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. After completion of the first countermeasure, a delay time period is allowed to elapse before the parameter is rechecked. In the event that after conclusion of the variable delay time period an arc discharge is detected, a second countermeasure for the suppression of arc discharges is executed. | 10-23-2008 |
20080218923 | SUPPRESSING ARC DISCHARGES - For suppressing arc discharges in a plasma process, a method includes monitoring of at least one parameter of the plasma process, determining a temporal feature of a first countermeasure and performing the first countermeasure. The temporal feature is determined as a function of, for example, at least one of an interval in time from at least one previous countermeasure, a development of the at least one parameter since a relevant time of introduction of the countermeasure, or since a variable period of time ahead of the relevant time of introduction of the countermeasure, and a differentiation as to whether a previous countermeasure was triggered based on the behavior of the at least one parameter, or based on the interval in time from at least one previous countermeasure. | 09-11-2008 |
20080216960 | Flexible Inductor for the Inductive Sealing of Packages - A sealing device for inductive sealing of containers is provided. The sealing device includes at least one induction coil made from an at least partially flexible conductor. The induction coil has two coil halves arranged at a distance (d) apart between which the containers can be moved, in which the conductor in each case extends essentially parallel to a direction of motion (B) of the containers. The coil halves are connected to the induction coil via at least one flexible conductor loop, which extends perpendicular to the direction of motion (B) of the containers. | 09-11-2008 |