HELMHOLTZ-ZENTRUM DRESDEN-ROSSENDORF E.V. Patent applications |
Patent application number | Title | Published |
20150259338 | PRECURSOR COMPOUNDS FOR THE RADIOSYNTHESIS OF [18F] NORCHLORO-FLUOROHOMOEPIBATIDINE - The invention relates to a compound of formula Ia or Ib wherein R | 09-17-2015 |
20140246370 | EXTRACTION OF NOBLE METAL (IONS) BY MEANS OF IONIC LIQUIDS - The present invention relates to a process for the extraction of metals from an aqueous phase by means of specific ionic liquids. | 09-04-2014 |
20130258319 | NEEDLE PROBE FOR ANALYSIS OF MULTIPHASE FLOWS, PRODUCTION AND USE OF NEEDLE PROBE - A triaxial constructed needle probe for reliable differentiation of multiphase media, comprises a probe body having a central light conductor having a metallic surface and a distal end of which is to be inserted in the medium, a first electrically insulating sheath disposed around the optical fiber, a hollow cylindrical shield electrode arranged around the first insulating sheath, a second electrically insulating sheath arranged around the shield electrode, and a hollow cylindrical reference electrode arranged around the second insulating sheath, as well as a measuring circuit for measuring the optical refractive index and electrical conductivity of the medium. | 10-03-2013 |
20130148203 | GENERATION OF SHORT-WAVE ULTRASHORT LIGHT PULSES AND USE THEREOF - Extremely ultrashort and short-wave light pulses are generated with the aid of the traveling-wave Thomson scattering process. Dispersive elements are arranged between an electron, particle, or radiation source, which is synchronized with a laser system, and an optical element that focuses in a direction. The device is used to superpose a pulse-front tilted light pulse of high power with an ultrashort pulse of relativistic electrons in a laser-line focus. By varying the laser pulse-front tilt, narrow-band radiation pulses in a wide wavelength range from EUV to X-ray wavelengths and having a high number of protons are obtained, and the bandwidth and coherence properties can also be modified. The system can be used, among other things, in EUV lithography, in the planning and optimal design of laser systems and electron sources, in material analysis by phase contrast imaging, and in superconductor research. The assembly is smaller and cheaper than current comparables. | 06-13-2013 |