| FEI Company Patent applications |
| Patent application number | Title | Published |
|---|
| 20160141147 | AUTOMATED TEM SAMPLE PREPARATION - Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition. | 05-19-2016 |
| 20160133437 | CHARGED PARTICLE MICROSCOPE WITH BAROMETRIC PRESSURE CORRECTION - A method of mitigating the effects of environmental pressure variation while using a charged particle microscope is described. The charged particle microscope equipped with a barometric pressure sensor and an automatic controller configured to use the signal from the barometric sensor as an input to a control procedure to compensate for a relative positional error between the charged particle beam and the specimen holder. | 05-12-2016 |
| 20160133436 | CONTACTLESS TEMPERATURE MEASUREMENT IN A CHARGED PARTICLE MICROSCOPE - Disclosed is a method of using a charged particle microscope for inspecting a sample mounted on a sample holder. The microscope is equipped with a solid state detector for detecting secondary particles emanating from the sample in response to irradiation of the sample with the primary beam, with the solid state detector in direct optical view of the sample. In some embodiments, the sample is mounted on a heater with a fast thermal response time. The method comprises contactless measurement of the temperature of the sample and/or sample holder using the solid state detector. | 05-12-2016 |
| 20160126059 | METHOD FOR COINCIDENT ALIGNMENT OF A LASER BEAM AND A CHARGED PARTICLE BEAM - A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system. | 05-05-2016 |
| 20160118219 | COMPOSITE SCAN PATH IN A CHARGED PARTICLE MICROSCOPE - The invention relates to a scanning-type charged particle microscope and a method for operation of such a microscope. Disclosed is a novel scanning strategy to the raster scan or serpentine scan. In some embodiment, the beam scanning motion is separated into short-stroke and long-stroke movements, to be assigned to associate short-stroke and long-stroke scanning devices, which may be beam deflectors or stage actuators. The scan strategy which is less susceptible to effects such as overshoot, settling/resynchronization, and “backlash” effects. | 04-28-2016 |
| 20160111247 | CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE - A Charged Particle Microscope, comprising: includes
| 04-21-2016 |
| 20160104599 | MULTI SPECIES ION SOURCE - A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly. | 04-14-2016 |
| 20160093470 | Chicane Blanker Assemblies for Charged Particle Beam Systems and Methods of Using the Same - A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector. | 03-31-2016 |
| 20160086762 | SPECTROSCOPY IN A TRANSMISSION CHARGED-PARTICLE MICROSCOPE - A Transmission Charged-Particle Microscope includes
| 03-24-2016 |
| 20160079035 | AutoSlice and View Undercut Method - A method is provided for slice and view processing of samples with dual beam systems. The slice and view processing includes providing a location for particles and material resulting from the slice and view process to collect without obscuring the sample face to be viewed and imaged. This location is formed as an undercut located beneath or in front of the sample face. | 03-17-2016 |
| 20160071689 | Method of performing spectroscopy in a Transmission Charged-Particle Microscope - A method of performing spectroscopy in a Transmission Charged-Particle Microscope comprising:
| 03-10-2016 |
| 20160063749 | BLEND MODES FOR MINERALOGY IMAGES - Optimized blending mode for mineralogy images. A luminosity value is determined for a pixel in a base layer or top layer mineralogy image. An image weighting value is determined from the luminosity value and an optional mixing parameter. A multiply value is determined by multiplying the base and top layer pixel values. An overlay value is determined from twice the multiply value if the value of one of the base layer or top layer pixel values is over a threshold, otherwise it is determined by inverting twice the product of the inverted top layer pixel value with the inverted base layer pixel value. A blended image pixel value is determined by adding the multiply value weighted with the image weighting value and the overlay value weighted with the inverted image weighting value. | 03-03-2016 |
| 20160056015 | Radiation Sensor, and its Application in a Charged-Particle Microscope - A pixelated CMOS radiation sensor (e.g. in a 4T pinned photodiode device) that comprises a layered structure including:
| 02-25-2016 |
| 20160054240 | METHOD OF ACQUIRING EBSP PATTERNS - The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of:
| 02-25-2016 |
| 20160032281 | FUNCTIONALIZED GRIDS FOR LOCATING AND IMAGING BIOLOGICAL SPECIMENS AND METHODS OF USING THE SAME - A functionalized specimen support for use in charged particle microscopy is provided that includes a specimen support surface configured to support specimens during an interrogation of the specimens with a charged particle microscope, the specimen support surface having functionalized sites, each functionalized site configured to maintain position of a portion of one of the specimens at the functionalized site by way of attachment, attraction, or a combination thereof. | 02-04-2016 |
| 20160027607 | INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BEAM COLUMN WITH SELECTABLE IONS - An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another. | 01-28-2016 |
| 20160020069 | TEM SAMPLE PREPARATION - An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range. | 01-21-2016 |
| 20160020065 | TEM SAMPLE MOUNTING GEOMETRY - A system and method for transmission electron microscopy is provided. The sample can be examined from multiple directions using an electron beam in a transmission electron microscope. The sample has at least three observation faces that are not parallel to each other with the thickness of the sample orthogonal to each of the observation faces being less than 200 nm. The sample is mounted on a needle that is needle rotatable about more than one axis so the needle can orient at least three of the observation faces to be normal to the electron beam of the electron microscope for observation. | 01-21-2016 |
| 20160020062 | Charged-Particle Lens that Transmits Emissions from Sample - A transmissive lens in a charged particle beam column for detecting X-rays and light is provided. The final lens may include elements that are transmissive for X-rays for EDS imaging and analysis or elements that are transmissive for light for cathodoluminescent (CL) imaging and analysis. The final lens may be constructed and arranged to include elements that are transmissive for both X-rays and light for combined EDS and CL imaging and analysis. | 01-21-2016 |
| 20150380205 | INTEGRATED LIGHT OPTICS AND GAS DELIVERY IN A CHARGED PARTICLE LENS - A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position. | 12-31-2015 |
| 20150371815 | MATHEMATICAL IMAGE ASSEMBLY IN A SCANNING-TYPE MICROSCOPE - A method of accumulating an image of a specimen using a scanning-type microscope, comprising the following steps:
| 12-24-2015 |
| 20150369710 | Method and System of Creating a Symmetrical FIB Deposition - A system is provided to produce symmetric depositions using a charged-particle beam deposition with an angled beam. In the past, the use of an FIB with non-orthogonal incidence angles produced depositions that grew toward the FIB beam path making it difficult to produce uniformity of the deposit. With the current invention, a symmetrical deposition is made even with the use of a non-orthogonal FIB. | 12-24-2015 |
| 20150357166 | METHOD FOR ATTACHMENT OF AN ELECTRODE INTO AN INDUCTIVELY-COUPLED PLASMA - An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible. | 12-10-2015 |
| 20150357159 | Fiducial Design for Tilted or Glancing Mill Operations with a Charged Particle Beam - A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented. | 12-10-2015 |
| 20150348752 | Ion Implantation to Alter Etch Rate - Implanting a material in a pattern hardens the material in the pattern for subsequent etching. When the region is etched, by ion beam sputtering, chemically enhanced charged particle beam etching, or chemical etching, a thicker structure remains because of the reduced etch rate of the hardened pattern. The invention is particularly useful for the preparation of thin lamella for viewing on a transmission electron microscope. | 12-03-2015 |
| 20150348751 | METHOD AND APPARATUS FOR SLICE AND VIEW SAMPLE IMAGING - Methods, apparatuses, and systems for slice and view processing of samples with dual beam systems. The slice and view processing includes exposing a vertical wall of a trench formed in a sample surface; capturing a first image of the wall by interrogating the wall with an interrogating beam while the wall is at a first orientation relative to the beam; capturing a second image of the wall by interrogating the wall with the beam while the wall is at a second orientation relative to the beam, wherein first distances in the first image between a reference point and surface points on the wall are different than second distances in the second image between the reference point and the surface points; determining elevations of the surface points using the first distances and the second distances; and fitting a curve to topography of the wall using the elevations. | 12-03-2015 |
| 20150332891 | USER INTERFACE FOR AN ELECTRON MICROSCOPE - A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively. | 11-19-2015 |
| 20150330877 | METHOD FOR PREPARING SAMPLES FOR IMAGING - A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples. | 11-19-2015 |
| 20150325403 | FOCUSED ION BEAM LOW KV ENHANCEMENT - The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size. | 11-12-2015 |
| 20150318140 | Multi-Source Plasma Focused Ion Beam System - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 11-05-2015 |
| 20150303021 | HIGH ASPECT RATIO X-RAY TARGETS AND USES OF SAME - An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure. | 10-22-2015 |
| 20150294834 | High Capacity TEM Grid - A TEM grid provides posts having steps, the steps increasing the number of samples that can be attached to the grid. In some embodiments, each post includes a one sided stair step configuration. A method of extracting multiple samples includes extracting samples and attaching the samples to the different stair steps on the posts. | 10-15-2015 |
| 20150279615 | Imaging a Sample with Multiple Beams and Multiple Detectors - A multi-beam apparatus for inspecting or processing a sample with a multitude of focused beams uses a multitude of detectors for detecting secondary radiation emitted by the sample when is irradiated by the multitude of beams. Each detector signal comprises information caused by multiple beams, the apparatus equipped with a programmable controller for processing the multitude of detector signals to a multitude of output signals, using weight factors so that each output signal represents information caused by a single beam. The weight factors are dynamic weight factors depending on the scan position of the beams with respect to the detectors and the distance between sample and detectors. | 10-01-2015 |
| 20150276567 | Method and System for Reducing Curtaining in Charged Particle Beam Sample Preparation - A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure. | 10-01-2015 |
| 20150262400 | Blend Modes for Mineralogy Images - Optimized blending mode for mineralogy images. A luminosity value is determined for a pixel in a base layer or top layer mineralogy image. An image weighting value is determined from the luminosity value and an optional mixing parameter. A multiply value is determined by multiplying the base and top layer pixel values. An overlay value is determined from twice the multiply value if the value of one of the base layer or top layer pixel values is over a threshold, otherwise it is determined by inverting twice the product of the inverted top layer pixel value with the inverted base layer pixel value. A blended image pixel value is determined by adding the multiply value weighted with the image weighting value and the overlay value weighted with the inverted image weighting value. | 09-17-2015 |
| 20150260784 | Multidimensional Structural Access - Multiple planes within the sample are exposed from a single perspective for contact by an electrical probe. The sample can be milled at a non-orthogonal angle to expose different layers as sloped surfaces. The sloped edges of multiple, parallel conductor planes provide access to the multiple levels from above. The planes can be accessed, for example, for contacting with an electrical probe for applying or sensing a voltage. The level of an exposed layer to be contacted can be identified, for example, by counting down the exposed layers from the sample surface, since the non-orthogonal mill makes all layers visible from above. Alternatively, the sample can be milled orthogonally to the surface, and then tilted and/or rotated to provide access to multiple levels of the device. The milling is preferably performed away from the region of interest, to provide electrical access to the region while minimizing damage to the region. | 09-17-2015 |
| 20150253353 | Fabrication of a Malleable Lamella for Correlative Atomic-Resolution Tomographic Analyses - A method of forming a sample and performing correlative S/TEM and APM analysis is provided wherein a sample containing a region of interest is cut from a bulk of sample material and formed into an ultra-thin lamella. The lamella is then analyzed with an S/TEM to form an image. The lamella sample and mount may then go through a cleaning process to remove any contamination. The lamella containing the ROI is then embedded within a selected material and is formed into a needle-shaped sample. The needle-shaped sample is then analyzed with the APM and the resulting data is merged and correlated with the S/TEM data. | 09-10-2015 |
| 20150243478 | High Aspect Ratio Structure Analysis - Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining. | 08-27-2015 |
| 20150243477 | Bulk Deposition for Tilted Mill Protection - To reduce artifacts in a surface exposed by a focused ion beam for viewing, a trench is milled next to the region of interest, and the trench is filled to create a bulkhead. The ion beam is directed through the bulkhead to expose a portion of the region of interest for viewing. The trench is filled, for example, by charged particle beam-induced deposition. The trench is typically milled and filled from the top down, and then the ion beam is angled with respect to the sample surface to expose the region of interest. | 08-27-2015 |
| 20150243474 | METHOD OF EXAMINING A SAMPLE IN A CHARGED-PARTICLE MICROSCOPE - Examining a sample in a charged-particle microscope of a scanning transmission type includes:
| 08-27-2015 |
| 20150214124 | Surface Delayering with a Programmed Manipulator - A method and apparatus for use in surface delayering for fault isolation and defect localization of a sample work piece is provided. More particularly, a method and apparatus for mechanically peeling of one or more layers from the sample in a rapid, controlled, and accurate manner is provided. A programmable actuator includes a delayering probe tip with a cutting edge that is shaped to quickly and accurately peel away a layer of material from a sample. The cutting face of the delayering probe tip is configured so that each peeling step peels away an area of material having a linear dimension substantially equal to the linear dimension of the delayering probe tip cutting face. The surface delayering may take place inside a vacuum chamber so that the target area of the sample can be observed in-situ with FIB/SEM imaging. | 07-30-2015 |
| 20150214001 | CORRELATIVE OPTICAL AND CHARGED PARTICLE MICROSCOPE - A Correlative Light and Electron Microscope (CLEM) is equipped with a TEM column and a light microscope fitted between the pole shoes of the objective lens of the TEM. To enlarge the acceptance solid angle for enhanced sensitivity a truncated lens is used. It is noted that this does not imply that the lens shows astigmatism (it is not a cylindrical lens). | 07-30-2015 |
| 20150179402 | METHOD FOR PREPARING SAMPLES FOR IMAGING - A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples. | 06-25-2015 |
| 20150155131 | CHARGED-PARTICLE MICROSCOPY WITH ENHANCED ELECTRON DETECTION - A method of investigating a flux of output electrons emanating from a sample in a charged-particle microscope, which flux is produced in response to irradiation of the sample by a beam of input charged particles, the method comprising the following steps:
| 06-04-2015 |
| 20150151972 | METHOD OF PRODUCING A FREESTANDING THIN FILM OF NANO-CRYSTALLINE GRAPHITE - A freestanding thin film of nano-crystalline graphite is described, as well as a method of producing a freestanding thin film of nano-crystalline graphite including:
| 06-04-2015 |
| 20150136977 | Differential Imaging with Pattern Recognition for Process Automation of Cross Sectioning Applications - A method for using differential imaging for applications involving TEM samples by allowing operators to take multiple images during a procedure involving a focused ion beam procedure and overlaying the multiple images to create a differential image that clearly shows the differences between milling steps. The methods also involve generating real-time images of the area being milled and using the overlays of the differential images to show small changes in each image, and thus highlight the ion beam milling location. The methods also involve automating the process of creating differential images and using them to automatically mill subsequent slices. | 05-21-2015 |
| 20150136172 | PHASE PLATE FOR A TRANSMISSION ELECTRON MICROSCOPE - The present invention relates to a method for cleaning a phase plate ( | 05-21-2015 |
| 20150130348 | Magnetically Enhanced, Inductively coupled Plasma Source For a Focused Ion Beam System - The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source. | 05-14-2015 |
| 20150129759 | INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BEAM COLUMN WITH SELECTABLE IONS - An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another. | 05-14-2015 |
| 20150122992 | Sub-pixel Analysis and Display of Fine Grained Mineral Samples - Method and apparatus for analysis and display of fine grained mineral samples. A portion of the sample is illuminated with a charged particle beam. Emitted radiation is detected, and a sample emission spectrum is generated and fit with a plurality of standard emission spectra of minerals in a candidate mineral composition. A mineral composition whose emission spectrum best fits the sample emission spectrum is selected from a plurality of candidate mineral compositions. An assigned color is received for each mineral in the selected mineral composition, and the assigned colors are blended according to the proportion of each mineral in the selected mineral composition. An image pixel corresponding to the portion of the sample is rendered for display. | 05-07-2015 |
| 20150114193 | Integrated Lamellae Extraction Station - An integrated station for extracting specimens suitable for viewing by a transmission electron microscope from a patterned semiconductor wafer, including a wafer cassette holder; a wafer transfer device; a nanomachining device, including a scanning electron microscope and a focused ion beam, a vacuum load lock and an operator control device, and wherein the operator control device notes locations of created lamellae; a plucker device; a control computer, adapted to control the wafer transfer device and the plucker device, commanding the plucker device to remover lamellae at the locations noted by the operator control device; and a user monitor and data input device, communicatively coupled to the computer. The wafer transfer device can transfer wafers from the wafer cassette holder to the vacuum load lock; from the vacuum load lock to the plucker device and from the plucker device to the wafer cassette holder. | 04-30-2015 |
| 20150102230 | High Voltage Isolation of an Inductively Coupled Plasma Ion Source with a Liquid that is not Actively Pumped - An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment. | 04-16-2015 |
| 20150102009 | METHOD FOR PREPARING THIN SAMPLES FOR TEM IMAGING - A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face. | 04-16-2015 |
| 20150099071 | METHOD OF DEPOSITING MATERIAL - Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated. | 04-09-2015 |
| 20150090878 | Preparation of Cryogenic Sample for Charged-Particle Microscopy - A method of preparing a sample for a charged-particle microscope includes:
| 04-02-2015 |
| 20150083929 | FOCUSED ION BEAM LOW KV ENHANCEMENT - The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size. | 03-26-2015 |
| 20150079796 | Charged-Particle-Beam Processing Using a Cluster Source - A cluster source is used to assist charged particle beam processing. For example, a protective layer is applied using a cluster source and a precursor gas. The large mass of the cluster and the low energy per atom or molecule in the cluster restricts damage to within a few nanometers of the surface. Fullerenes or clusters of fullerenes, bismuth, gold or Xe can be used with a precursor gas to deposit material onto a surface, or can be used with an etchant gas to etch the surface. Clusters can also be used to deposit material directly onto the surface to form a protective layer for charged particle beam processing or to provide energy to activate an etchant gas. | 03-19-2015 |
| 20150075972 | Detaching Probe from TEM Sample during Sample Preparation - An improved method of preparing a TEM sample. A sample is extracted from a work piece and attached to a probe for transport to a sample holder. The sample is attached to the sample holder using charged particle beam deposition, and mechanically separated from probe by moving the probe and the sample holder relative to each other, without severing the connection using a charged particle beam. | 03-19-2015 |
| 20150069231 | Method for Electron Tomography - The invention relates to an improved method of electron tomography. Electron tomography is a time consuming process, as a large number of images, typically between 50-100 images, must be acquired to form one tomogram. The invention teaches a method to shorten the time needed to acquire this amount images much more quickly by tilting the sample continuously, instead of step-by-step. Hereby the time needed to reduce vibrations between steps is eliminated. | 03-12-2015 |
| 20150060660 | METHOD FOR COINCIDENT ALIGNMENT OF A LASER BEAM AND A CHARGED PARTICLE BEAM - A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system. | 03-05-2015 |
| 20150053548 | TEM SAMPLE PREPARATION - An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range. | 02-26-2015 |
| 20150048815 | Circuit Probe for Charged Particle Beam System - A probe assembly can be connected and disconnected from its electrical harness within a vacuum chamber so that the probe assembly with the work piece mounted can be rotated and tilted without interference from a cable, and can then be reconnected without opening the vacuum chamber. Also described is a means of grounding a sample and probes when the probe assembly is disconnected from its electrical harness and a means of preventing damage to the probe mechanism and the probe itself by ensuring that the probes are not sticking up too far during operations. | 02-19-2015 |
| 20150041647 | METHOD OF USING AN ENVIRONMENTAL TRANSMISSION ELECTRON MICROSCOPE - An environmental transmission electron microscope (ETEM) suffers from gas-induced resolution deterioration. Inventors conclude that the deterioration is due to ionization of gas in the sample chamber of the ETEM, and propose to use an electric field in the sample chamber to remove the ionized gas, thereby diminishing the gas-induced resolution deterioration. The electric field need not be a strong field, and can be caused by, for example, biasing the sample with respect to the sample chamber. A bias voltage of 100 V applied via voltage source is sufficient for a marked improvement the gas-induced resolution deterioration. Alternatively an electric field perpendicular to the optical axis can be used, for example by placing an electrically biased wire or gauze off-axis in the sample chamber. | 02-12-2015 |
| 20150021476 | MAGNETIC LENS FOR FOCUSING A BEAM OF CHARGED PARTICLES - A magnetic lens for focusing a beam of charged particles traveling along an optical axis includes
| 01-22-2015 |
| 20150021475 | AUTOMATED SLICE MILLING FOR VIEWING A FEATURE - A method and apparatus for performing a slice and view technique with a dual beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis of data gathered by the machine vision at least in part. A determined milling area may be represented as a bounding box around a feature, which dimensions can be changed in accordance with the analysis step. The FIB is then adjusted accordingly to slice and mill a new face in the subsequent slice and view iteration, and the SEM images the new face. Because the present invention accurately locates the feature and determines an appropriate size of area to mill and image, efficiency is increased by preventing the unnecessary milling of substrate that does not contain the feature of interest. | 01-22-2015 |
| 20150016677 | HIGH ACCURACY BEAM PLACEMENT FOR LOCAL AREA NAVIGATION - An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. Preferred embodiments of the present invention can also be used to rapidly navigate to one single bit cell in a memory array or similar structure, for example to characterize or correct a defect in that individual bit cell. High-resolution scanning is used to scan only a “strip” of cells on the one edge of the array (along either the X axis and the Y axis) to locate a row containing the desired cell followed by a similar high-speed scan along the located row (in the remaining direction) until the desired cell location is reached. This allows pattern-recognition tools to be used to automatically “count” the cells necessary to navigate to the desired cell, without the large expenditure of time required to image the entire array. | 01-15-2015 |
| 20150008213 | INTERNAL SPLIT FARADAY SHIELD FOR AN INDUCTIVELY COUPLED PLASMA SOURCE - An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber. | 01-08-2015 |
| 20140374593 | DETECTION METHOD FOR USE IN CHARGED-PARTICLE MICROSCOPY - A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux. | 12-25-2014 |
| 20140367571 | METHOD OF WELDING A FROZEN AQUEOUS SAMPLE TO A MICROPROBE - The invention relates to a method of welding a vitreous biological sample at a temperature below the glass transition temperature of approximately −137° C. to a micromanipulator, also kept at a temperature below the glass transition temperature. Where prior art methods used IBID with, for example, propane, or a heated needle (heated resistively or by e/g/laser), the invention uses a vibrating needle to locally melt the sample. By stopping the vibration, the sample freezes to the micromanipulator. The heat capacity of the heated parts is small, and the amount of material that stays in a vitreous condition thus large. | 12-18-2014 |
| 20140361165 | METHOD FOR IMAGING A SAMPLE IN A CHARGED PARTICLE APPARATUS - The invention relates to a dual beam apparatus equipped with an ion beam column and an electron beam column having an electrostatic immersion lens. When tilting the sample, the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as traverse chromatic aberration and beam displacement. Also in-column detectors, detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample. | 12-11-2014 |
| 20140357088 | Precursor for Planar Deprocessing of Semiconductor Devices using a Focused Ion Beam - A method and system for improved planar deprocessing of semiconductor devices using a focused ion beam system. The method comprises defining a target area to be removed, the target area including at least a portion of a mixed copper and dielectric layer of a semiconductor device; directing a precursor gas toward the target area; and directing a focused ion beam toward the target area in the presence of the precursor gas, thereby removing at least a portion of a first mixed copper and dielectric layer and producing a uniformly smooth floor in the milled target area. The precursor gas causes the focused ion beam to mill the copper at substantially the same rate as the dielectric. In a preferred embodiment, the precursor gas comprises methyl nitroacetate. In alternative embodiments, the precursor gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride. | 12-04-2014 |
| 20140326878 | PHASE SHIFT METHOD FOR A TEM - A method of electron microcopy passes an electron beam through a phase plate, specifically a Zernike type phase plate, comprising a central hole, and a thin film causing a phase shift of the electrons passing through said film. This phase shift causes the Contrast Transfer Function (CTF) to change from a sine-like function to a cosine-like function. The phase plate is equipped with a film in the form of an annulus, carried by a much thinner film. As a result only in a small spatial frequency range (for low frequencies) the phase is changed (and thus the CTF), and for other spatial frequencies the phase shift is negligible, and thus the CTF remains unchanged. Due to the much smaller thickness of the carrier film the scattering of electrons is negligible as well. | 11-06-2014 |
| 20140326877 | Source for Selectively Providing Positively or Negatively Charged Particles for a Focusing Column - A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis. | 11-06-2014 |
| 20140326876 | METHOD OF USING A PHASE PLATE IN A TRANSMISSION ELECTRON MICROSCOPE - The invention relates to a method of using a phase plate, having a thin film, in a transmission electron microscope (TEM), comprising: introducing the phase plate in the TEM; preparing the phase plate by irradiating the film with a focused electron beam; introducing a sample in the TEM; and forming an image of the sample using the prepared phase plate, wherein preparing the phase plate involves locally building up a vacuum potential resulting from a change in the electronic structure of the thin film by irradiating the phase plate with a focused beam of electrons, the vacuum potential leading to an absolute phase shift | 11-06-2014 |
| 20140319344 | MULTIPLE IMAGE METROLOGY - Metrology is performed using multiple registered images derived from one or more charged particle beams. Measurements combine features from one image that may not be visible in a second image to determine relationships that cannot be determined from a single image. In one embodiment, measurements use features from different element maps to determine a relationship between features, such as a distance or angle between two features in the first image at a location determined by a distance from a feature on the second image. | 10-30-2014 |
| 20140313576 | Microscope Device - A microscope has an objective, a light source illuminating a sample over an illumination beam path, an arrangement producing a flat illumination pattern which is structured in both spatial directions on the sample, a surface detector detecting light coming over one picture beam path, an arrangement shifting the illumination pattern on the sample in one displacement direction, and a control unit taking one picture at a time of the light which was detected by the detector as phase picture in different positions of the pattern along the displacement direction and to computationally reconstruct from these phase pictures an overall picture of the illuminated sample region. The displacement direction is oblique to the main axes of symmetry of the illumination pattern and depending on the illumination pattern is chosen such that the number of phase pictures which is necessary for the picture reconstruction corresponds to the theoretically minimally required value. | 10-23-2014 |
| 20140312245 | MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 10-23-2014 |
| 20140312226 | CHARGED-PARTICLE MICROSCOPE PROVIDING DEPTH-RESOLVED IMAGERY - A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output O | 10-23-2014 |
| 20140306607 | Methods and Structures for Rapid Switching Between Different Process Gases in an Inductively-Coupled Plasma (ICP) Ion Source - An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source. | 10-16-2014 |
| 20140302252 | Low Energy Ion Milling or Deposition - Samples to be imaged in a Transmission Electron Microscope must be thinned to form a lamella with a thickness of, for example, 20 nm. This is commonly done by sputtering with ions in a charged particle apparatus equipped with a Scanning Electron Microscope (SEM) column, a Focused Ion Beam (FIB) column, and one or more Gas Injection Systems (GISses). A problem that occurs is that a large part of the lamella becomes amorphous due to bombardment by ions, and that ions get implanted in the sample. The invention provides a solution by applying a voltage difference between the capillary of the GIS and the sample, and directing a beam of ions or electrons to the jet of gas. The beam ionizes gas that is accelerated to the sample, where (when using a low voltage between sample and GIS) low energy milling occurs, and thus little sample thickness becomes amorphous. | 10-09-2014 |
| 20140248649 | Method of Studying a Cryogenic Sample in an Optical Microscope - The present invention relates to a method of studying a sample using an optical microscope, comprising providing the sample in a sample holder with means to maintain the sample at a temperature below 273 K; providing a microscope objective lens, in a thermally insulating jacket, having an extremal lens element proximal to the sample holder; bringing the lens into a focus position proximal to the sample, which separates the extremal lens element and sample by an intervening space, providing a transparent window in said intervening space, with a gap between the window and the extremal lens element; providing a flow of substantially dry gas in said gap; and tailoring the geometry and velocity of said flow so that, at least in said gap, the flow is non-laminar; and does not excite substantial acoustic vibration in a structure proximal the gap. | 09-04-2014 |
| 20140239175 | Focused Ion Beam Low kV Enhancement - The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size. | 08-28-2014 |
| 20140233691 | COMPUTED TOMOGRAPHY IMAGING PROCESS AND SYSTEM - A computed tomography imaging process, including: acquiring projection images of an object by detecting radiation that has passed through the object for respective different relative orientations of the object and the radiation; and processing the projection images to generate a tomogram of the object; wherein the radiation passes through the object in the form of a diverging beam, and the different acquire set of projection images for a relative orientations of the object and the beam of radiation define two or more complete trajectories of the beam along the object, the complete trajectories being mutually offset to reduce the degradation of spatial resolution in portions of the generated tomogram due to the divergence of the beam through the object. | 08-21-2014 |
| 20140231644 | In Situ Reactivation of Fluorescence Marker - Vapor is provided locally at a sample surface to allow fluorescence of the fluorescent markers in a vacuum chamber. For example, a nanocapillary can dispense a liquid near a region of interest, the liquid evaporating to increase the vapor pressure near the fluorescent markers. The increase in vapor pressure at the fluorescent marker is preferably sufficiently great to prevent deactivation or to reactivate the fluorescent marker, while the overall pressure in the vacuum chamber is preferably sufficiently low to permit charged particle beam operation with little or no additional evacuation pumping. | 08-21-2014 |
| 20140217283 | TEM Sample Preparation - An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range. | 08-07-2014 |
| 20140203191 | Method of Observing Samples with a Fluorescent Microscope - The invention relates to a method of inspecting parts of a sample on a TEM grid with a fluorescence microscope, as arises when performing correlative microscopy, more specifically for samples on a holey carbon grid. A problem occurs when imaging vitrified ice with sample material when the ice is heated by the light used. The invention is based on the insight that the absorption in the carbon support film is responsible for the heating, as ice hardly absorbs light. By localizing the illumination of the fluorescent microscope to the parts of the sample that are above a hole in the carbon, heating of the ice is lowered. The localization can be achieved by, for example, passing the light through a LCD type Spatial Light Modulator. | 07-24-2014 |
| 20140197311 | Sample Carrier for an Electron Microscope - The invention relates to a sample carrier for a transmission electron microscope. When using state of the art sample carriers, such as half-moon grids in combination with detectors detecting, for example, X rays emitted at a large emittance angle, shadowing is a problem. Similar problems occur when performing tomography, in which the sample is rotated over a large angle. | 07-17-2014 |
| 20140191125 | Sample Block Holder - A sample holder assembly includes a sample tray, a base plate, a stage mount, and a calibration standard mounted onto the stage mount. Three mating structures on the bottom of the base plate mate with corresponding structures on a stage mount that is attached to the sample stage of the SEM. An optional contacting conductor provides electrical contact between the stage mount and the base plate so that charge generated on the sample by the electron beam can leave the sample through the sample conductive layer to the sample tray, to the base plate, to the stage mount, and through the grounded stage. | 07-10-2014 |
| 20140166879 | Backscatter Reduction in Thin Electron Detectors - In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor. | 06-19-2014 |
| 20140160265 | Switchable microscope arrangement with multiple detectors - The invention relates to a microscope arrangement provided with: a microscope ( | 06-12-2014 |
| 20140147832 | SIGNAL BASED SAMPLE PREPARATION - Described is a system and method for detecting whether a biological event has occurred in a cellular sample, and then activating a fluidics system to fix the cell at the point in time with the event occurred. In one example, a sample preparation system includes a camera linked to a confocal microscope that is interrogating a cellular sample. Once a detectable event, such as a binding event, has occurred, the sample preparation system releases a fixative to fix the cell at the point in time when the event was detected. | 05-29-2014 |
| 20140146160 | Method of Sampling a Sample and Displaying Obtained Information - The invention relates to a method of sampling and displaying information comprising | 05-29-2014 |
| 20140145077 | METHOD OF PERFORMING TOMOGRAPHIC IMAGING OF A SAMPLE IN A CHARGED-PARTICLE MICROSCOPE - The invention relates to a method of performing tomographic imaging of a sample comprising providing a beam of charged particles; providing the sample on a sample holder that can be tilted; in an imaging step, directing the beam through the sample to image the sample; repeating this procedure at each of a series of sample tilts to acquire a set of images; in a reconstruction step, mathematically processing images from said set to construct a composite image, whereby in said imaging step, for a given sample tilt, a sequence of component images is captured at a corresponding sequence of focus settings; and in said reconstruction step, for at least one member of said series of sample tilts, multiple members of said sequence of component images are used in said mathematical image processing. This renders a 3D imaging cube rather than a 2D imaging sheet at a given sample tilt. | 05-29-2014 |
| 20140131573 | SYSTEM AND METHOD FOR SIMULTANEOUS DETECTION OF SECONDARY ELECTRONS AND LIGHT IN A CHARGED PARTICLE BEAM SYSTEM - A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels. | 05-15-2014 |
| 20140131195 | Dual Laser Beam System Used With an Electron Microscope and FIB - The present invention discloses an electron microscope and FIB system for processing and imaging of a variety of materials using two separate laser beams of different characteristics. The first laser beam is used for large bulk material removal and deep trench etching of a workpiece. The second laser beam is used for finer precision work, such as micromachining of the workpiece, small spot processing, or the production of small heat affected zones. The first laser beam and the second laser beam can come from the same laser source or come from separate laser sources. Having one laser source has the additional benefits of making the system cheaper and being able to create separate external and internal station such that the debris generated from bulk material removal from the first laser beam will not interfere with vacuum or components inside the particle beam chamber. | 05-15-2014 |
| 20140117233 | Retarding Field Analyzer Integral with Particle Beam Column - A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer. | 05-01-2014 |
| 20140117229 | MINERAL IDENTIFICATION USING SEQUENTIAL DECOMPOSITION INTO ELEMENTS FROM MINERAL DEFINITIONS - Mineral definitions each include a list of elements, each of the elements having a corresponding standard spectrum. To determine the composition of an unknown mineral sample, the acquired spectrum of the sample is sequentially decomposed into the standard spectra of the elements from the element list of each of the mineral definitions, and a similarity metric computed for each mineral definition. The unknown mineral is identified as the mineral having the best similarity metric. | 05-01-2014 |
| 20140116873 | METHOD FOR CREATING S/TEM SAMPLE AND SAMPLE STRUCTURE - An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. A novel sample structure and a novel use of a milling pattern allow the creation of S/TEM samples as thin as 50 nm without significant bowing or warping. Preferred embodiments of the present invention provide methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis. | 05-01-2014 |
| 20140110903 | COATED O-RING - The invention relates to a coated O-ring ( | 04-24-2014 |
| 20140110597 | Configurable Charged-Particle Apparatus - The invention relates to a charged-particle apparatus having
| 04-24-2014 |
| 20140103225 | BEAM PULSING DEVICE FOR USE IN CHARGED-PARTICLE MICROSCOPY - The invention relates to a charged-particle microscope comprising
| 04-17-2014 |
| 20140097341 | IN-COLUMN DETECTOR FOR PARTICLE-OPTICAL COLUMN - The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator. | 04-10-2014 |
| 20140084157 | System and Method for Ex Situ Analysis of a Substrate - A method and system for creating an asymmetrical lamella for use in an ex situ TEM, SEM, or STEM procedure is disclosed. The shape of the lamella provides for easy orientation such that a region of interest in the lamella can be placed over a hole in a carbon film providing minimal optical and spectral interference from the carbon film during TEM, SEM, or STEM procedure of chemical analysis. | 03-27-2014 |
| 20140077080 | X-ray Detector for Electron Microscope - Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt. | 03-20-2014 |
| 20140072964 | Cooperating Capillary and Cap for Use in a High-Pressure Freezer - The invention relates to an assembly of a cooperating capillary and cap for containing an aqueous solution in an inner volume of the capillary. The assembly is used in a high pressure freezer in which the aqueous solution is frozen at a high pressure to form an amorphous frozen sample at a cryogenic temperature. The cap forms a closure at one end of the capillary, and the part of the cap that is in contact with the inner volume of the capillary has an indent; as a result of which the cap, after freezing the aqueous solution, can be removed from the capillary and a free standing pillar of frozen aqueous material extends from the capillary. | 03-13-2014 |
| 20140070113 | Automated Method for Coincident Alignment of a Laser Beam and a Charged Particle Beam - A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system. | 03-13-2014 |
| 20140070098 | Method of Using a Compound Particle-Optical Lens - The invention relates to a compound objective lens for a Scanning Electron Microscope having a conventional magnetic lens excited by a first lens coil, an immersion magnetic lens excited by a second lens coil, and an immersion electrostatic lens excited by the voltage difference between the sample and the electrostatic lens electrode. For a predetermined excitation of the lens, the electron beam can be focused on the sample using combinations of excitations of the two lens coils. More BSE information can be obtained when the detector distinguishes between BSE's ( | 03-13-2014 |
| 20140070095 | Method of Performing Tomographic Imaging of a Sample in a Charged-Particle Microscope - The invention relates to a method of performing tomographic imaging involving repeatedly directing a charged particle beam through a sample for a series of sample tilts to acquire a corresponding set of images and mathematically combining the images to construct a composite image. The latter of which consists of, at each of a second series of sample tilts, using a spectral detector to accrue a spectral map of said sample, thus acquiring a collection of spectral maps; analyzing said spectral maps to derive compositional data of the sample; and employing said compositional data in constructing said composite image. | 03-13-2014 |
| 20140065319 | Seed Layer Laser-Induced Deposition - A method of creating a layer of a target deposit-material, in a first target pattern, on a substrate surface. The substrate surface is placed in a vacuum and exposed to a first chemical vapor, having precursor molecules for a seed deposit-material, thereby forming a first substrate surface area that has adsorbed the precursor molecules. Then, a charged particle beam is applied to the first substrate surface area in a second target pattern, largely identical to the first target pattern thereby forming a seed layer in a third target pattern. The seed layer is exposed to a second chemical vapor, having target deposit-material precursor molecules, which are adsorbed onto the seed layer. Finally, a laser beam is applied to the seed layer and neighboring area, thereby forming a target deposit-material layer over and about the seed layer, where exposed to the laser beam. | 03-06-2014 |
| 20140061464 | Method of Investigating and Correcting Aberrations in a Charged-Particle Lens System - A system of investigating aberrations in a charged-particle lens system, which lens system has an object space comprising an object plane and an image space comprising an image plane, includes:
| 03-06-2014 |
| 20140061463 | IMAGING A SAMPLE IN A TEM EQUIPPED WITH A PHASE PLATE - The invention relates to a method of forming an image of a sample in a transmission electron microscope equipped with a phase plate. Prior art use of such a phase plate can introduce artifacts in the form of ringing and a halo. These artifacts are caused by the abrupt changes in the Fourier domain due to the sharp edges of the phase plate in the diffraction plane. By moving the phase plate with respect to the non-diffraction beam (the diffraction pattern) while recording an image the sudden transition in the Fourier domain is changed to a more gradual transition, resulting in less artifacts. | 03-06-2014 |
| 20140061032 | Dose-Based End-Pointing for Low-KV FIB Milling TEM Sample Preparation - A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer to produce the finished sample lamella including at least a portion of the feature of interest. | 03-06-2014 |
| 20140054267 | GAS-ASSISTED LASER ABLATION - An improved method for laser processing that prevents material redeposition during laser ablation but allows material to be removed at a high rate. In a preferred embodiment, laser ablation is performed in a chamber filled with high pressure precursor (etchant) gas so that sample particles ejected during laser ablation will react with the precursor gas in the gas atmosphere of the sample chamber. When the ejected particles collide with precursor gas particles, the precursor is dissociated, forming a reactive component that binds the ablated material. In turn, the reaction between the reactive dissociation by-product and the ablated material forms a new, volatile compound that can be pumped away in a gaseous state rather than redepositing onto the sample. | 02-27-2014 |
| 20140048972 | Automated Sample Preparation - Mineral samples for use in analytical instruments are created by a system that greatly reduces the sample preparation time and facilitates automation. For example, in some implementations, rather than grinding to expose the interior of mineral particles in sample plug containing mineral particles in an epoxy compound, the sample plug is sliced with a saw, which more rapidly provides in many applications a sufficiently smooth surface on the exposed particle surfaces for observation. Rather than slowly mixing a slow curing epoxy to avoid introducing bubbles into the sample plug, some implementations use a fast settle fixative and a mechanical mixture that avoid bubbles. | 02-20-2014 |
| 20140037185 | Sequencer For Combining Automated And Manual-Assistance Jobs In A Charged Particle Beam Device - A device for imaging and processing a workpiece having nanometric features through the use of at least one charged particle beam, by both fully automated procedures and manual assistance procedures. The device includes a user interface, including a schedule input entry device and a human operator ready input that can be placed in a first state or a second state and a procedure scheduler, accepting a schedule of procedures, including fully automated procedures and manual assistance procedures, from the schedule input entry device. Additionally, a procedure sequencer that, when the human operator ready input is in the second state, sequences through fully automated procedures until the human operator ready input is placed into the first state, at which time the sequencer begins sequencing the manual assistance procedures, after reaching a safe termination point for the fully automated procedures being performed. | 02-06-2014 |
| 20140034830 | Environmental SEM Gas Injection System - A gas injection system provides a local region at the sample surface that has sufficient gas concentration to be ionized by secondary electrons to neutralize charged on the sample surface. In some embodiments, a gas concentration structure concentrates the gas near the surface. An optional hole in the gas concentration structure allows the charged particle beam to impact the interior of a shrouded region. In some embodiments, an anode near the surface increases the number of ions that return to the work piece surface for charge neutralization, the anode in some embodiments being a part of the gas injection system and in some embodiments being a separate structure. | 02-06-2014 |
| 20140032131 | Automated EDS Standards Calibration - This invention relates to a method and system for determining the composition of an unknown sample. The present invention comprises a method of calibrating an x-ray spectrometer that does not require measuring all possible elements under the operating conditions used to measure the unknown sample to be analyzed. According to a preferred embodiment, the local instrument can be calibrated from an x-ray spectrum of a single elemental standard. The instrument will have a stored library containing high quality spectra for all elements being analyzed. The analysis of the single element is compared to the library spectra for that element to define a transformation that is used to create a calibrated spectra library that includes a calibrated spectrum for each spectrum in the original library. As a result, the spectra generated by the local instrument can be compared to the calibrated library spectra to determine the elements in an unknown mineral. | 01-30-2014 |
| 20140021346 | Spectroscopy Technique Using Merged Spectral Data - A method of examining a sample comprises | 01-23-2014 |
| 20140001372 | Multi Species Ion Source | 01-02-2014 |
| 20140001357 | On-Axis Detector for Charged Particle Beam System | 01-02-2014 |
| 20140001356 | CLUSTER ANALYSIS OF UNKNOWNS IN SEM-EDS DATASET | 01-02-2014 |
| 20130344292 | Three Dimensional Fiducial - A method and system for forming and using a fiducial on a sample to locate an area of interest on the sample, the method comprising forming a fiducial by depositing a block of material on a sample proximal to an area of interest on the sample, the block of material extending from the surface of the sample to a detectable extent above the surface of the sample; and milling, using a charged particle beam, a predetermined pattern into at least two exposed faces of the block of material; subsequent to forming the fiducial, detecting the location of the area of interest by detecting the location of the fiducial; and subsequent to detecting the location of the area of interest, imaging or milling the area of interest with a charged particle beam. | 12-26-2013 |
| 20130341505 | METHOD FOR S/TEM SAMPLE ANALYSIS - An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. Preferred embodiments of the present invention also provide an in-line process for S/TEM based metrology on objects such as integrated circuits or other structures fabricated on semiconductor wafer by providing methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis. | 12-26-2013 |
| 20130328246 | Lamella creation method and device using fixed-angle beam and rotating sample stage - A system for creating a substantially planar face in a substrate, the system including directing one or more beams at a first surface of a substrate to remove material from a first location, the beam being offset from a normal to the first surface by a curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate about an axis other than an axis normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the curtaining angle; and scanning the one or more beams in across the second surface to mill one or more finishing cuts. | 12-12-2013 |
| 20130327952 | Focused Charged Particle Column for Operation at Different Beam Energies at a Target - A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low beam energies at a target, with differing focus voltage configurations for different beam energies. By changing the voltages applied to the four electrodes of the objective lens, different focusing conditions may be rapidly configured, enabling rapid toggling between optimized imaging and optimized processing of a target. | 12-12-2013 |
| 20130320229 | IMAGING AND PROCESSING FOR PLASMA ION SOURCE - Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas. | 12-05-2013 |
| 20130319849 | PREPARATION OF LAMELLAE FOR TEM VIEWING - A method and apparatus for producing thin lamella for TEM observation. The steps of the method are robust and can be used to produce lamella in an automated process. In some embodiments, a protective coating have a sputtering rate matched to the sputtering rate of the work piece is deposited before forming the lamella. In some embodiments, the bottom of the lamella slopes away from the feature of interest, which keeps the lamella stable and reduces movement during thinning. In some embodiments, a fiducial is used to position the beam for the final thinning, instead of using an edge of the lamella. In some embodiments, the tabs are completed after high ion energy final thinning to keep the lamella more stable. In some embodiments, a defocused low ion energy and pattern refresh delay is used for the final cut to reduce deformation of the lamella. | 12-05-2013 |
| 20130316365 | Method of Preparing a Biological Sample for Inspection with Electron Microscopy and Fluorescent Light Microscopy - The invention relates to a method of forming sections for inspection in an electron microscope and a fluorescent light microscope. Conventionally these sections are made by for example the Tokuyama method, which involves freeze substitution and fixing at cryogenic temperatures. A problem is the time that it takes to come from a sample to sections, as the diffusion speed of the chemicals (organic solvents and fixatives) is extremely low. The invention comprises the sectioning of the sample at cryogenic temperature and fixing afterwards. As the sections are much thinner (e.g. 100 nm or less) than the sample (often >1 μm), the total time it takes to come from a sample to a section ready for inspection is less than 8 hours. This makes it possible to achieve results relevant for health care within one workday. | 11-28-2013 |
| 20130313783 | High-Vacuum Seal - The invention relates to an improved O-ring seal for use as a high vacuum seal. A limitation of standard O-rig seals is the permeation of water through the O-ring. Especially for instruments in which parts are kept at a cryogenic temperature, such as a cryogenic electron microscope, the presence of water in the vacuum is a problem, as this results in ice growth on the cryogenic parts. As a solution often a double O-ring seal is used, or a metal seal. Both of these solutions have severe draw-backs. | 11-28-2013 |
| 20130313428 | Phase Plate for a TEM - A phase plate, specifically a Zernike type phase plate, for use in an electron microscope, comprises a central hole, and a thin film causing a phase shift of the electrons passing through said film. This phase shift causes the Contrast Transfer Function (CTF) to change from a sine-like function to a cosine-like function. | 11-28-2013 |
| 20130309421 | MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 11-21-2013 |
| 20130307960 | Image-Enhancing Spotlight Mode for Digital Microscopy - An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region. | 11-21-2013 |
| 20130307957 | Scanning Microscope Having an Adaptive Scan - A method of using a scanning microscope to rapidly form a digital image of an area. The method includes performing an initial set of scans to form a guide pixel set for the area and using the guide pixel set to identify regions representing structures of interest in the area. Then, performing additional scans of the regions representing structures of interest, to gather further data to further evaluate pixels in the regions, and not scanning elsewhere in the area. | 11-21-2013 |
| 20130306862 | AUTOMATED SLICE MILLING FOR VIEWING A FEATURE - A method and apparatus for performing a slice and view technique with a dual beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis of data gathered by the machine vision at least in part. A determined milling area may be represented as a bounding box around a feature, which dimensions can be changed in accordance with the analysis step. The FIB is then adjusted accordingly to slice and mill a new face in the subsequent slice and view iteration, and the SEM images the new face. Because the present invention accurately locates the feature and determines an appropriate size of area to mill and image, efficiency is increased by preventing the unnecessary milling of substrate that does not contain the feature of interest. | 11-21-2013 |
| 20130277555 | Method for Analyzing an EDS Signal - The invention relates to a method for analyzing the output signal of a silicon drift detector (SDD). A SDD is used for detecting X-rays emitted by a sample as a result of impinging radiation. | 10-24-2013 |
| 20130266240 | METHOD FOR DETERMINING DISTORTIONS IN A PARTICLE-OPTICAL APPARATUS - The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields ( | 10-10-2013 |
| 20130256553 | Automated Ion Beam Idle - An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected. | 10-03-2013 |
| 20130250293 | Method and Apparatus for Actively Monitoring an Inductively-Coupled Plasma Ion Source using an Optical Spectrometer - A method and apparatus for actively monitoring conditions of a plasma source for adjustment and control of the source and to detect the presence of unwanted contaminant species in a plasma reaction chamber. Preferred embodiments include a spectrometer used to quantify components of the plasma. A system controller is provided that uses feedback loops based on spectral analysis of the plasma to regulate the ion composition of the plasma source. The system also provides endpointing means based on spectral analysis to determine when cleaning of the plasma source is completed. | 09-26-2013 |
| 20130248490 | Multiple Gas Injection System - A multi-positional valve is used to control the destination of gas flows from multiple gas sources. In one valve position the gases flow to an isolated vacuum system where the flow rate and mixture can be adjusted prior to introduction into a sample vacuum chamber. In another valve position the pre-mixed gases flow from the isolated vacuum chamber and through a needle into the sample vacuum chamber. | 09-26-2013 |
| 20130240751 | Charged Particle Extraction Device and Method of Design There for - The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes. | 09-19-2013 |
| 20130240731 | X-RAY DETECTOR FOR ELECTRON MICROSCOPE - Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt. | 09-19-2013 |
| 20130228683 | Charged-Particle Microscope Providing Depth-Resolved Imagery - A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output O | 09-05-2013 |
| 20130214156 | CHARGED PARTICLE DETECTOR - A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field. | 08-22-2013 |
| 20130213439 | Holder Assembly for Cooperating with an Environmental Cell and an Electron Microscope - A holder assembly comprises a first and a separable second part, the first part detachable from the second part, the first part comprising a tube and an environmental cell interface and the second part comprising an electron microscope interface, as a result of which the first part can be cleaned at high temperatures without exposing the second part to said high temperature. | 08-22-2013 |
| 20130205808 | Forming a Vitrified Sample for Electron Microscopy - The invention relates to a method of forming a vitrified sample on a sample holder for inspection in an electron microscope. It is known to spray a solution on a grid and then immerse the grid in a cryogenic liquid, such as ethane or liquid nitrogen. The invention proposes to spray small droplets of the liquid on a cryogenic surface, such as a grid or a sample holder in vacuum. The liquid forms vitrified sample material when hitting the surface due to the low temperature of the grid or sample holder. | 08-15-2013 |
| 20130200270 | DRIFT CONTROL IN A CHARGED PARTICLE BEAM SYSTEM - A method and apparatus for reducing drift in a charged particle beam system. The method includes providing a charged particle beam column including a charged particle beam, a lens system, and a sample chamber; disposing a temperature-controlled device between the lens system and the sample chamber to control heat transfer between the lens system and the sample chamber; and controlling the temperature of the temperature-controlled device to reduce or eliminate the thermal drift of the position of a sample within the sample chamber relative to the position of the charged particle beam. | 08-08-2013 |
| 20130192758 | High Resolution Plasma Etch - An apparatus for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process. | 08-01-2013 |
| 20130187058 | Determination of Emission Parameters from Field Emission Sources - The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters. | 07-25-2013 |
| 20130186747 | Glancing Angle Mill - A method and system for forming a planar cross-section view for an electron microscope. The method comprises directing an ion beam from an ion source toward a first surface of a sample to mill at least a portion of the sample; milling the first surface, using the ion beam, to expose a second surface in which the end of the second surface distal to the ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to the ion source; directing an electron beam from an electron source to the second surface; and forming an image of the second surface by detecting the interaction of the electron beam with the second surface. Embodiments also include planarzing the first surface of the sample prior to forming a cross-section. | 07-25-2013 |
| 20130181140 | Charged Particle Beam System Aperture - An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate. | 07-18-2013 |
| 20130153785 | METHOD AND APPARATUS FOR SAMPLE EXTRACTION AND HANDLING - An improved method and apparatus for extracting and handling samples for S/TEM analysis. Preferred embodiments of the present invention make use of a micromanipulator and a hollow microprobe probe using vacuum pressure to adhere the microprobe tip to the sample. By applying a small vacuum pressure to the lamella through the microprobe tip, the lamella can be held more securely and its placement controlled more accurately than by using electrostatic force alone. By using a probe having a beveled tip and which can also be rotated around its long axis, the extracted sample can be placed down flat on a sample holder. This allows sample placement and orientation to be precisely controlled, thus greatly increasing predictability of analysis and throughput. | 06-20-2013 |
| 20130143412 | METHODS FOR PREPARING THIN SAMPLES FOR TEM IMAGING - A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face. | 06-06-2013 |
| 20130140450 | Inductively-Coupled Plasma Ion Source for Use with a Focused Ion Beam Column with Selectable Ions - An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another. | 06-06-2013 |
| 20130134855 | System for Attachment of an Electrode into an Inductively Coupled Plasma Source - An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible. | 05-30-2013 |
| 20130134307 | Inductively Coupled Plasma Source as an Electron Beam Source for Spectroscopic Analysis - A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis. | 05-30-2013 |
| 20130112890 | CHARGED PARTICLE ENERGY FILTER - A multi-element electrostatic chicane energy filter, with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements. A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam. | 05-09-2013 |
| 20130105689 | METHOD FOR ADJUSTING A STEM EQUIPPED WITH AN ABERRATION CORRECTOR | 05-02-2013 |
| 20130105677 | Sample Block Holder | 05-02-2013 |
| 20130099114 | DETECTOR FOR USE IN A CHARGED PARTICLE APPARATUS - A detector with a Silicon Diode and an amplifier, and a feedback element in the form of, for example, a resistor or a diode, switchably connected to the output of the amplifier. When the feedback element is selected via a switch, the detector operates in a Current Measurement Mode for determining electron current, and when the element is not selected the detector operates in its well-known Pulse Height Measurement Mode for determining the energy of X-ray quanta. | 04-25-2013 |
| 20130098871 | Internal Split Faraday Shield for an Inductively Coupled Plasma Source - An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber. | 04-25-2013 |
| 20130093931 | METHOD FOR ACQUIRING DATA WITH AN IMAGE SENSOR - To avoid reset noise in a CMOS chip for direct particle counting, it is known to use Correlative Double Sampling: for each signal value, the pixel is sampled twice: once directly after reset and once after an integration time. The signal is then determined by subtracting the reset value from the later acquired value, and the pixel is reset again. In some embodiments of the invention, the pixel is reset only after a large number of read-outs. Applicants realized that typically a large number of events, typically approximately 10, are needed to cause a full pixel. By either resetting after a large number of images, or when one pixel of the image shows a signal above a predetermined value (for example 0.8×the full-well capacity), the image speed can be almost doubled compared to the prior art method, using a reset after acquiring a signal. | 04-18-2013 |
| 20130068611 | Localized, In-Vacuum Modification of Small Structures - A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber. | 03-21-2013 |
| 20130062520 | Distortion Free Stigmation of a TEM - A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. | 03-14-2013 |
| 20130056634 | Charged Particle Detector System Comprising a Conversion Electrode - The invention relates to a charged particle detector system comprising a conversion plate ( | 03-07-2013 |
| 20130040400 | METHOD OF STUDYING A SAMPLE IN AN ETEM - A method and apparatus is provided for studying the reaction (chemical or physical) of a sample with a gas in the active atmosphere of an instrument such as an Environmental Transmission Electron Microscope (ETEM), optical microscope, X-ray microscope or scanning probe microscope. The sample is exposed to inert gas at a desired temperature before exchanging the inert gas to the active gas to reduce to avoid, or at least minimize, sample drift during image acquisition. | 02-14-2013 |
| 20130037715 | CHARGED-PARTICLE MICROSCOPE PROVIDING DEPTH-RESOLVED IMAGERY - A method of examining a sample using a charged-particle microscope, comprising the following steps:
| 02-14-2013 |
| 20130037714 | Charged-Particle Microscopy Imaging Method - Charged-particle microscopy includes
| 02-14-2013 |
| 20130015765 | Methods and Structures for Rapid Switching Between Different Process Gases in an Inductively-Coupled Plasma (ICP) Ion SourceAANM Graupera; AnthonyAACI HillsboroAAST ORAACO USAAGP Graupera; Anthony Hillsboro OR USAANM Kellogg; SeanAACI PortlandAAST ORAACO USAAGP Kellogg; Sean Portland OR USAANM Utlaut; Mark W.AACI ScappooseAAST ORAACO USAAGP Utlaut; Mark W. Scappoose OR USAANM Parker; N. WilliamAACI HillsboroAAST ORAACO USAAGP Parker; N. William Hillsboro OR US - An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source. | 01-17-2013 |
| 20130015351 | CLUSTERING OF MULTI-MODAL DATA - Information from multiple detectors acquiring different types of information is combined to determine one or more properties of a sample more efficiently than the properties could be determined using a single type of information from a single type of detector. In some embodiments, information is collected simultaneously from the different detectors which can greatly reduce data acquisition time. In some embodiments, information from different points on the sample are grouped based on information from one type of detector and information from the second type of detector related to these points is combined, for example, to create a single spectrum from a second detector of a region of common composition as determined by the first detector. In some embodiments, the data collection is adaptive, that is, the data is analyzed during collection to determine whether sufficient data has been collected to determine a desired property with the desired confidence. | 01-17-2013 |
| 20120328151 | High Accuracy Beam Placement for Local Area Navigation - An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. Preferred embodiments of the present invention can also be used to rapidly navigate to one single bit cell in a memory array or similar structure, for example to characterize or correct a defect in that individual bit cell. High-resolution scanning is used to scan only a “strip” of cells on the one edge of the array (along either the X axis and the Y axis) to locate a row containing the desired cell followed by a similar high-speed scan along the located row (in the remaining direction) until the desired cell location is reached. This allows pattern-recognition tools to be used to automatically “count” the cells necessary to navigate to the desired cell, without the large expenditure of time required to image the entire array. | 12-27-2012 |
| 20120319000 | MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCUSED ION BEAM SYSTEM - The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source. | 12-20-2012 |
| 20120308740 | Beam-Induced Deposition of Low-Resistivity Material - An improved method of beam deposition to deposit a low-resistivity metal. Preferred embodiments of the present invention use a novel focused ion beam induced deposition precursor to deposit low-resistivity metallic material such as tin. Applicants have discovered that by using a methylated or ethylated metal such as hexamethylditin as a precursor, material can be deposited having a resistivity as low as 40 μΩ·cm. | 12-06-2012 |
| 20120292503 | CHARGED-PARTICLE MICROSCOPY WITH OCCLUSION DETECTION - This invention relates to a method of examining a sample using a charged-particle microscope. This invention solves the problem of occlusion effects, whereby a given line-of-sight behind a particular region on a sample and a given detector is blocked by a topographical feature on the sample, thus hampering detection of the emitted radiation emanating from the occluded region. This problem is solved by using at least a first and second detector configuration to detect each portion of the emitted radiation and to produce at least a first and second corresponding image based thereupon; and using computer processing apparatus to automatically compare different members of the set of corresponding images and mathematically identify on the sample at least one occlusion region with an occluded line-of-sight relative to at least one of the detector configurations. | 11-22-2012 |
| 20120292497 | Method and Structure for Controlling Magnetic Field Distributions in an ExB Wien Filter - An ExB Wien mass filter providing a method and structure for mechanically adjusting the magnetic field distributions at the mass filter entrance and exit end caps. The reluctance of the flux return path may be modified by configuring pluralities of magnetic shims within slots at the outer diameters of the entrance and exit end caps, and also by configuring pluralities of magnetic plug shims within circular flux dams surrounding the entrance and exit apertures. Advantages of purely mechanical adjustment for the magnetic fields of the present invention, compared with prior art electromagnet adjustment methods include greater reliability, simplicity, lower cost, and lack of power dissipation. The invention may employ either permanent magnets or electromagnets for generation of the mass-separation magnetic field. | 11-22-2012 |
| 20120280136 | Plasma Source for Charged Particle Beam System - An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure. | 11-08-2012 |
| 20120273677 | IN-COLUMN DETECTOR FOR PARTICLE-OPTICAL COLUMN - The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator. | 11-01-2012 |
| 20120273676 | METHOD FOR DETERMINING A RECONSTRUCTED IMAGE USING A PARTICLE-OPTICAL APPARATUS - The invention relates to a method for determining a reconstructed image using a particle-optical apparatus. The particle-optical apparatus comprises a particle source for producing a beam of particles, an object plane on which an object to be imaged may be placed, a condenser system for illuminating the object plane with the beam of particles, a projection system for forming an image of the object plane by imaging particles transmitted through the object on an image plane, and a detector for detecting the image, the detector comprising a semiconductor sensor having an array of pixels for providing a plurality of pixel signals from respective pixels of the array in response to particles incident on the detector. | 11-01-2012 |
| 20120261587 | Encapsulation of Electrodes in Solid Media for use in conjunction with Fluid High Voltage Isolation - An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid. | 10-18-2012 |
| 20120261586 | Beam Blanker for Interrupting a Beam of Charged Particles - The invention relates to an electrostatic beam blanker for a particle-optical apparatus, in which the blanker is used to generate a train of pulses with a fixed repetition rate. Such pulse trains with a sub-picosecond pulse length are for example used in the study of chemistry in the femtosecond scale. | 10-18-2012 |
| 20120261566 | ABERRATION-CORRECTED WIEN EXB MASS FILTER WITH REMOVAL OF NEUTRALS FROM THE BEAM - A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface. | 10-18-2012 |
| 20120261565 | WIDE APERATURE WIEN EXB MASS FILTER - An ExB Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field. | 10-18-2012 |
| 20120256085 | Method of protecting a radiation detector in a charged particle instrument - The invention relates to a Method of protecting a direct electron detector ( | 10-11-2012 |
| 20120217152 | Method for Rapid Switching between a High Current Mode and a Low Current Mode in a Charged Particle Beam System - A method for rapid switching between operating modes with differing beam currents in a charged particle system is disclosed. Many FIB milling applications require precise positioning of a milled pattern within a region of interest (RoI). This may be accomplished by using fiducial marks near the RoI, wherein the FIB is periodically deflected to image these marks during FIB milling. Any drift of the beam relative to the RoI can then be measured and compensated for, enabling more precise positioning of the FIB milling beam. It is often advantageous to use a lower current FIB for imaging since this may enable higher spatial resolution in the image of the marks. For faster FIB milling, a larger beam current is desired. Thus, for optimization of the FIB milling process, a method for rapidly switching between high and low current operating modes is desirable. | 08-30-2012 |
| 20120205539 | Detector for Use in Charged-Particle Microscopy - A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux. | 08-16-2012 |
| 20120200007 | Charged Particle Beam Masking for Laser Ablation Micromachining - An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser. | 08-09-2012 |
| 20120199923 | METHOD AND APPARATUS FOR CONTROLLING TOPOGRAPHICAL VARIATION ON A MILLED CROSS-SECTION OF A STRUCTURE - An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles. | 08-09-2012 |
| 20120199756 | Method for Centering an Optical Element in a TEM Comprising a Contrast Enhancing Element - A method for adjusting or aligning one or more optical elements in a Transmission Electron Microscope (TEM) is disclosed. The TEM is equipped with an objective lens for guiding a beam of electrons to a sample, a diffraction plane in which at least a beam of unscattered electrons is focused and a structure to enhance the Contrast Transfer Function (CTF) which is situated in the diffraction plane or an image thereof. | 08-09-2012 |
| 20120199738 | IN-CHAMBER ELECTRON DETECTOR - A secondary particle detector | 08-09-2012 |
| 20120196440 | Method of Depositing Material - Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. One the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated. | 08-02-2012 |
| 20120195452 | ENCLOSURE FOR ACOUSTIC INSULATION OF AN APPARATUS CONTAINED WITHIN SAID ENCLOSURE - The invention relates to an enclosure with a substantial rectangular configuration, adapted to contain an apparatus sensitive to acoustic vibrations, the enclosure comprising walls and acoustic damping material located within the wall, wherein the acoustic damping material comprises at least one absorbing body of acoustic energy absorbing material located adjacent to a rib of the enclosure. | 08-02-2012 |
| 20120193530 | System and Method for Localization of Large Numbers of Fluorescent Markers in Biological Samples - A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels. | 08-02-2012 |
| 20120187285 | MEASUREMENT AND ENDPOINTING OF SAMPLE THICKNESS - A method for Transmission Electron Microscopy (TEM) sample creation. The use of a Scanning Electron Microscope (SEM)—Scanning Transmission Electron Microscope (STEM) detector in the dual-beam focused ion beam (FIB)/SEM allows a sample to be thinned using the FIB, while the STEM signal is used to monitor sample thickness. A preferred embodiment of the present invention can measure the thickness of or create TEM and STEM samples by using a precise endpoint detection method. Preferred embodiments also enable automatic endpointing during TEM lamella creation and provide users with direct feedback on sample thickness during manual thinning. Preferred embodiments of the present invention thus provide methods for endpointing sample thinning and methods to partially or fully automate endpointing. | 07-26-2012 |
| 20120168638 | Charged Particle Source with Multiple Selectable Particle Emitters - A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described. | 07-05-2012 |
| 20120152731 | METHOD FOR CREATING S/TEM SAMPLE AND SAMPLE STRUCTURE - An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. A novel sample structure and a novel use of a milling pattern allow the creation of S/TEM samples as thin as 50 nm without significant bowing or warping. Preferred embodiments of the present invention provide methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis. | 06-21-2012 |
| 20120128028 | Method of Measuring the Temperature of a Sample Carrier in a Charged Particle-Optical Apparatus - A method of determining the temperature of a sample carrier in a charged particle-optical apparatus, characterized in that the method comprises the observation of the sample carrier with a beam of charged particles, the observation giving information about the temperature of the sample carrier. The invention is based on the insight that a charged particle optical apparatus, such as a TEM, STEM, SEM or FIB, can be used to observe temperature related changes of a sample carrier. The changes may be mechanical changes (e.g. of a bimetal), crystallographic changes (e.g. of a perovskite), and luminescent changes (in intensity or decay time). In a preferred embodiment the sample carrier shows two bimetals, showing metals with different thermal expansion coefficients, bending in opposite directions. The distance between the two bimetals is used as a thermometer. | 05-24-2012 |
| 20120112090 | Charged Particle Source with Integrated Electrostatic Energy Filter - A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion. | 05-10-2012 |
| 20120112062 | Environmental Cell for Charged Particle Beam System - An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable minor. | 05-10-2012 |
| 20120107521 | Protective Layer For Charged Particle Beam Processing - A protective layer is applied to a work piece to protect the surface during charged particle beam processing by directing a fluid toward the surface. The surface is preferably not touched by the applicator. Ink jet print-type print heads are suitable applicators. Ink jet-type print heads allow a wide variety of fluids to be used to form the protective layer. Useful fluids that form protective layers include colloidal silica having small silver particles and hydrocarbon-based inks. | 05-03-2012 |
| 20120103945 | Method And Apparatus For Laser Machining - Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics. | 05-03-2012 |
| 20120091360 | CHARGED PARTICLE BEAM SYSTEM HAVING MULTIPLE USER-SELECTABLE OPERATING MODES - A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled. | 04-19-2012 |
