CYMER, INC. Patent applications |
Patent application number | Title | Published |
20150083898 | System and Method for Controlling Droplet Timing in an LPP EUV Light Source - A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets. The first curtain is used for detecting the position of the droplets relative to a desired trajectory to the irradiation site so that the position of a droplet generator may be adjusted to direct the droplets to the irradiation site, as in the prior art. A droplet detection module detects each droplet as it passes through the second curtain, determines when the source laser should generate a pulse so that the pulse arrives at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time. | 03-26-2015 |
20140233005 | System and Method for Adjusting Seed Laser Pulse Width to Control EUV Output Energy - A method and apparatus for controlling the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. In one embodiment, a seed laser generates both pre-pulses and main pulses which are amplified and irradiate a target material. The widths of the main pulses are adjusted, for example by the use of an EOM or other optical switch, without adjusting the widths of the pre-pulses, to keep the EUV output energy at a desired level. Only if the main pulse widths are longer or shorter than a desired range is the duty cycle of the laser amplifier adjusted, to keep the main pulse widths in the desired range. Adjusting the main pulse widths in this way before adjusting the pump RF duty cycle allows for less adjustment of the duty cycle, thus causing less adjustment to the pre-pulses. | 08-21-2014 |
20140203195 | Thermal Monitor For An Extreme Ultraviolet Light Source - A first temperature distribution that represents a temperature of an element adjacent to and distinct from a first optical element that is positioned to receive an amplified light beam is accessed. The accessed first temperature distribution is analyzed to determine a temperature metric associated with the element, the determined temperature metric is compared to a baseline temperature metric, and an adjustment to position of the amplified light beam relative to the first optical element is determined based on the comparison. | 07-24-2014 |
20140191133 | Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet Light Dosing - Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements. | 07-10-2014 |
20140191132 | Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet Light Dosing - Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements. | 07-10-2014 |
20140102881 | METHOD OF AND APPARATUS FOR IN-SITU REPAIR OF REFLECTIVE OPTIC - Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography. | 04-17-2014 |
20140098413 | HARSH ENVIRONMENT OPTICAL ELEMENT PROTECTION - Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties. | 04-10-2014 |
20140072006 | System and Method for Seed Laser Mode Stabilization - A method and apparatus for stabilizing the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. In one embodiment, the cavity length of the laser may be adjusted by means of a movable mirror forming one end of the cavity. The time delay from the release of an output pulse to the lasing threshold next being reached is measured at different mirror positions, and a mirror position selected which results in a cavity mode being aligned with the gain peak of the laser, thus producing a minimum time delay from an output pulse of the laser to the next lasing threshold. A Q-switch in the laser allows for pre-lasing and thus jitter-free timing of output pulses. Feedback loops keep the laser output at maximum gain and efficiency, and the attenuation and timing at a desired operating point. | 03-13-2014 |
20130329763 | CORROSION RESISTANT ELECTRODES FOR LASER CHAMBERS - Corrosion resistant electrodes are formed of brass that has been doped with phosphorus. The electrodes are formed of brass that contains about 100 ppm to about 1,000 ppm of phosphorus, and the brass has no visible microporosity at a magnification of 400×. The brass may be cartridge brass that contains about 30 weight percent of zinc and the balance copper. Corrosion resistant electrodes also may be formed by subjecting brass to severe plastic deformation to increase the resistance of the brass to plasma corrosion. The corrosion resistant electrodes can be used in laser systems to generate laser light. | 12-12-2013 |
20130322482 | System and Method for Protecting a Seed Laser in an EUV Light Source With a Bragg AOM - A method and apparatus for protecting the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed in one embodiment, a Bragg AOM is used as a switch on the beam path from the seed laser to other optical components and ultimately to an irradiation site. Power is applied to the Bragg AOM and pulses from the seed laser are thus deflected onto the desired beam path rather than passing straight through the Bragg AOM. Once the pulses have passed through the Bragg AOM, power to the Bragg AOM ceases, so that any reflections from the irradiation site will pass straight through the Bragg AOM and will not be deflected back to the seed laser. Use of the Bragg AOM rather than components previously used results in lower power consumption and better protection for the seed laser. | 12-05-2013 |
20130321926 | System and Method for Separating a Main Pulse and a Pre-Pulse Beam from a Laser Source - A dichroic beam splitter module is disclosed for separating a main pulse laser beam from a pre-pulse laser beam each traversing a common beam path. In one embodiment, two dichroic elements are physically aligned along the beam path and are configured to pass the pre-pulse, a laser light having a first wavelength, to target material located near an irradiation site yet reflect the main pulse, a laser light having a second wavelength. The reflected main pulse is then further reflected by two reflective elements or mirrors from the first dichroic element to the second dichroic element and then on to the irradiation site. In alternative embodiments, the first mirror is deformable to alter beam characteristics of the reflected main pulse beam and the second mirror is adjustable to align the main pulse beam to the irradiation site. | 12-05-2013 |
20130320244 | System and Method To Optimize Extreme Ultraviolet Light Generation - Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized. | 12-05-2013 |
20130306110 | Light Collector Mirror Cleaning - A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface. | 11-21-2013 |
20130170516 | System and Method for Extending Gas Life in a Two Chamber Gas Discharge Laser System - A method and system for performing injects of halogen gas into the chambers of a two chamber gas discharge laser such as a MOPA excimer laser for allowing operation of the laser within acceptable parameters and compensating for ageing effects without the necessity of performing refills is described. A parameter reflecting efficiency of the laser is measured, and the change in the parameter with respect to the length of laser operation is estimated. The change in the parameter with respect to the pressure in one of the chambers is also measured. At a given time, the total change in the value of the parameter is estimated, and from this change in pressure that is needed to reverse the change in the value of the parameter is calculated. The pressure in the chamber is then changed to correct for the amount of time that the laser has been in operation. | 07-04-2013 |
20130153792 | DROPLET GENERATOR STEERING SYSTEM - Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning. | 06-20-2013 |
20130153603 | Filter for Material Supply Apparatus - An apparatus supplies a target material to a target location. The apparatus includes a reservoir that holds a target mixture that includes the target material and non-target particles; a supply system that receives the target mixture from the reservoir and that supplies the target mixture to the target location, the supply system including a tube and a nozzle that defines an orifice through which the target mixture is passed; and a filter inside the tube through which the target mixture is passed. | 06-20-2013 |
20130083818 | System and Method for High Accuracy Gas Inject in a Two Chamber Gas Discharge Laser System - Systems and methods for automatically performing a high accuracy gas inject in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. A mathematical model relates the amount of halogen gas in the laser chamber after an inject to the amount of halogen gas present prior to the inject, the amount of halogen gas injected, and the consumption rate of halogen gas in the chamber. A fixed amount of halogen gas is added to the chamber in an initial number of injects to allow transients to settle out, after which the amount of halogen gas to be injected is that calculated to result in a desired amount of halogen gas after the inject according to the model. Measurements are taken after injects to update the actual amount of halogen gas present and the consumption rate of the halogen gas. | 04-04-2013 |
20130070332 | EUV Light Source Components and Methods for Producing, Using and Refurbishing Same - A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the minor with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material. | 03-21-2013 |
20130043401 | Energy Sensors for Light Beam Alignment - An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy. | 02-21-2013 |
20130003773 | System and Method for Automatic Gas Optimization in a Two-Chamber Gas Discharge Laser System - A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction. | 01-03-2013 |
20130000773 | System and Method for High Accuracy Gas Refill in a Two Chamber Gas Discharge Laser System - Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation. | 01-03-2013 |
20120298838 | SYSTEMS AND METHODS FOR IMPLEMENTING AN INTERACTION BETWEEN A LASER SHAPED AS LINE BEAM AND A FILM DEPOSITED ON A SUBSTRATE - A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam. | 11-29-2012 |
20120292527 | Filter for Material Supply Apparatus - A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet. | 11-22-2012 |
20120235066 | DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE - An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma. | 09-20-2012 |
20120223256 | SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE - An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas. | 09-06-2012 |
20120170112 | Multi-Pass Optical Apparatus - An apparatus includes a first plurality of concave reflecting surfaces; a second plurality of reflecting surfaces facing the first plurality of concave reflecting surfaces such that a region is defined between the first and second pluralities; and an input for an optical beam to enter the region and an output for the optical beam to exit the region. The first and second pluralities of reflecting surfaces are arranged relative to each other so that the optical beam is re-imaged at a reflecting surface of one of the pluralities after only one reflection from a reflecting surface of the other of the pluralities and so that overlap of two or more optical beams on each of the reflecting surfaces is avoided. | 07-05-2012 |
20120092746 | OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LIGHT SOURCE - As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t | 04-19-2012 |
20120087386 | LASER SYSTEM - An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the second seed laser. | 04-12-2012 |
20120019826 | ALIGNMENT OF LIGHT SOURCE FOCUS - An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam. | 01-26-2012 |
20120002687 | Laser System - A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage. | 01-05-2012 |
20110317256 | MASTER OSCILLATOR-POWER AMPLIFIER DRIVE LASER WITH PRE-PULSE FOR EUV LIGHT SOURCE - A device is described herein which may comprise an optical amplifier having a gain band including wavelengths λ | 12-29-2011 |
20110253349 | SYSTEMS AND METHODS FOR COOLING AN OPTIC - Devices are described herein which may comprise an optic having a non-planar surface, the non-planar surface having an optically active portion; and a flow guide directing gas upon the non-planar surface to produce turbulent flow on at least a portion of the optically active portion of the non-planar surface to cool the optic. | 10-20-2011 |
20110249691 | METHOD AND APPARATUS FOR CONTROLLING LIGHT BANDWIDTH - An apparatus includes a light source that produces a light beam, a bandwidth measurement system, a plurality of bandwidth actuation systems, and a control system. Each bandwidth actuation system includes one or more bandwidth actuators and each bandwidth actuation system is connected to an optical feature that is optically coupled to the produced light beam and operable to modify the connected optical feature to select a bandwidth within a bandwidth range of the produced light beam. The control system is connected to the bandwidth measurement system and to the plurality of bandwidth actuation systems. The control system is configured to switch between activating and operating a first bandwidth actuation system and activating and operating a second bandwidth actuation system independently and separately of activating and operating the first bandwidth actuation system based on a provided bandwidth measurement and a selected target bandwidth. | 10-13-2011 |
20110248191 | SYSTEMS AND METHODS FOR TARGET MATERIAL DELIVERY PROTECTION IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE - A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion. | 10-13-2011 |
20110240890 | Extreme Ultraviolet Light Source - An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a portion of an internal surface of the chamber and configured to reduce a flow of light at the source wavelength from the internal surface back along the beam path. | 10-06-2011 |
20110233429 | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave - A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO | 09-29-2011 |
20110205512 | Active Spectral Control of Optical Source - A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam. | 08-25-2011 |
20110194580 | Line Narrowing Module - An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source. | 08-11-2011 |
20110192995 | LPP EUV Light Source Drive Laser System - An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates. | 08-11-2011 |
20110141865 | Metrology for Extreme Ultraviolet Light Source - An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions. | 06-16-2011 |
20110140008 | Beam Transport System for Extreme Ultraviolet Light Source - An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location. | 06-16-2011 |
20110122901 | HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM - A method of line narrowing for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses includes selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive surface of a dispersive wavelength selection optic; changing the curvature of the dispersive surface in a first manner that includes imparting a catenary curvature to the dispersive surface; and changing the curvature of the dispersive surface in a second manner that includes imparting a cylindrical curvature to the dispersive surface. | 05-26-2011 |
20110102759 | Laser System - A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage. | 05-05-2011 |
20110079736 | Laser produced plasma EUV light source - An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose. | 04-07-2011 |
20110069733 | REGENERATIVE RING RESONATOR - A laser includes a regenerative ring resonator that includes a discharge chamber having electrodes and a gain medium between the electrodes for producing a laser beam; a partially-reflective optical coupler, and a beam modification optical system in the path of the laser beam. The beam modification optical system transversely expands a profile of the laser beam such that the near field laser beam profile uniformly fills each aperture within the laser and such that the regenerative ring resonator remains either conditionally stable or marginally unstable when operating the laser at powers that induce thermal lenses in optical elements inside the regenerative ring resonator. | 03-24-2011 |
20110058588 | Drive laser for EUV light source - A device is described herein which may comprise an oscillator having an oscillator cavity length, L | 03-10-2011 |
20110051760 | Active spectral control of DUV laser light source - According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators. | 03-03-2011 |
20100327192 | Alignment Laser - A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set. | 12-30-2010 |
20100309939 | Multi-chamber gas discharge laser bandwidth control through discharge timing - A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset. | 12-09-2010 |
20100294953 | Laser Produced Plasma EUV Light Source - A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region. | 11-25-2010 |
20100258747 | Systems and methods for protecting an EUV light source chamber from high pressure source material leaks - A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component. | 10-14-2010 |
20100176313 | Extreme ultraviolet light source - An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material. | 07-15-2010 |
20100140514 | Gas management system for a laser-produced-plasma EUV light source - Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path. | 06-10-2010 |
20100127191 | Systems and methods for drive laser beam delivery in an euv light source - An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site. | 05-27-2010 |
20100127186 | Laser produced plasma EUV light source - A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume. | 05-27-2010 |
20100108913 | Laser system - A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage. | 05-06-2010 |
20100097704 | Line narrowing module - An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source. | 04-22-2010 |
20100074295 | Immersion lithography laser light source with pulse stretcher - An apparatus and method are disclosed which may comprise a pulsed gas discharge laser lithography light source which may comprise a seed laser portion providing a seed laser output light beam of seed pulses; an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses; the amplifier portion may comprise a ring power amplifier comprising amplifier portion injection optics comprising at least one beam expanding prism, a beam reverser and an input/output coupler; the beam expansion optics and the output coupler may be mounted on an optics assembly with the beam expansion optics rigidly mounted with respect to the optics assembly and the input/output coupler mounted for relative movement with respect to the optics assembly for optical alignment purposes. | 03-25-2010 |
20100054295 | High pulse repetition rate gas discharge laser - A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer. The apparatus and method may comprise an aerodynamic fairing attached to the high voltage electrode to present an aerodynamically smooth surface to the gas flow. | 03-04-2010 |
20100032590 | Debris protection system having a magnetic field for an EUV light source - Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site. | 02-11-2010 |
20100025600 | Systems and methods for heating an EUV collector mirror - As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at least a portion of the second side; and a system generating infrared radiation to heat the absorbing coating and the substrate. | 02-04-2010 |
20100024980 | Laser produced plasma euv light source - An EUV light source is disclosed that may include a laser source, e.g. CO | 02-04-2010 |
20090296758 | Laser system - An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the second seed laser. | 12-03-2009 |
20090296755 | Laser system - A method and apparatus may comprise a laser light source system which may comprise a solid state laser seed beam source providing a seed laser output; a frequency conversion stage converting the seed laser output to a wavelength suitable for seeding an excimer or molecular fluorine gas discharge laser; an excimer or molecular fluorine gas discharge laser gain medium amplifying the converted seed laser output to produce a gas discharge laser output at approximately the converted wavelength. The excimer or molecular fluorine laser may be selected from a group comprising XeCl, XeF, KrF, ArF and F | 12-03-2009 |
20090267005 | Drive laser delivery systems for euv light source - An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma. | 10-29-2009 |
20090256057 | Systems and methods for implementing an interaction between a laser shaped as line beam and a film deposited on a substrate - A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam. | 10-15-2009 |
20090250637 | System and methods for filtering out-of-band radiation in EUV exposure tools - In a first aspect, an apparatus for exposing a substrate with EUV radiation is described herein which may comprise a target material; a laser source generating a laser beam having a wavelength, λ, for irradiating the target material to generate EUV radiation, the laser beam defining a primary polarization direction; at least one mirror reflecting the EUV radiation along a path to the substrate; and a polarization filter disposed along the path filtering at least a portion of light having the wavelength, λ. | 10-08-2009 |
20090238225 | 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements - A method and apparatus for operating a very high repetition gas discharge laser system magnetic switch pulsed power system is disclosed, which may comprise a solid state switch, a charging power supply electrically connected to one side of the solid state switch; a charging inductor electrically connected to the other side of the solid state switch; a deque circuit electrically in parallel with the solid state switch comprising a deque switch; a peaking capacitor electrically connected to the charging inductor, a peaking capacitor charging control system operative to charge the peaking capacitor by opening the deque switch and leaving the solid state switch open and then shutting the solid state switch. The solid state switch may comprise a plurality of solid state switches electrically in parallel. | 09-24-2009 |
20090230326 | Systems and methods for target material delivery in a laser produced plasma EUV light source - Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission. | 09-17-2009 |
20090201955 | ILLUMINATION APPARATUS AND METHOD FOR CONTROLLING ENERGY OF A LASER SOURCE - The disclosure relates to an illuminating apparatus for illuminating a sample on a work stage, optionally with a relatively narrow illuminating line of relatively controlled energy, as well as methods for controlling energy of a laser source when illuminating a sample on a work stage with a relatively narrow illuminating line. | 08-13-2009 |
20090161201 | Drive laser for EUV light source - A device is described herein which may comprise an oscillator having an oscillator cavity length, L | 06-25-2009 |
20090159808 | EUV light source components and methods for producing, using and refurbishing same - A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material. | 06-25-2009 |
20090154642 | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus - A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area. | 06-18-2009 |
20090122825 | Laser system - A method/apparatus may comprise a seed laser oscillator producing an output which may comprise: a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage receiving the output of the seed laser oscillator which may comprise: a ring power amplification stage; a coherence busting mechanism intermediate the seed laser oscillator and the ring power amplification stage which may comprise a beam splitter separating the seed laser output into a main beam and a beam entering an optical delay path which may have a delay length longer than the coherence length of a pulse in the seed laser output and may have a beam angular offset mechanism offsetting a delayed beam and the main beam. | 05-14-2009 |
20090116530 | High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier - An apparatus and method of operation for a high power broad band elongated thin beam laser annealing light source, which may comprise a gas discharge seed laser oscillator having a resonance cavity, providing a seed laser output pulse; a gas discharge amplifier laser amplifying the seed laser output pulse to provide an amplified seed laser pulse output; a divergence correcting multi-optical element optical assembly intermediate the seed laser and the amplifier laser. The divergence correcting optical assembly may adjust the size and/or shape of the seed laser output pulse within a discharge region of the amplifier laser in order to adjust an output parameter of the amplified seed laser pulse output. The divergence correcting optical assembly may comprise a telescope with an adjustable focus. The adjustable telescope may comprise an active feedback-controlled actuator based upon a sensed parameter of the amplified seed laser output from the amplifier laser. | 05-07-2009 |
20090095925 | LPP EUV light source drive laser system - An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO | 04-16-2009 |
20090080476 | Immersion lithography laser light source with pulse stretcher - An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower. | 03-26-2009 |
20090067468 | Laser system - A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a pulse repetition rate less than that of the seed laser system; a beam divider providing each of the respective first and second amplifier gain mediums with seed laser output pulses; a frequency converter modifying the nominal center wavelength of the output of the seed laser to essentially the nominal center wavelength of the amplifier gain medium; a beam combiner combining the outputs of the respective amplifier gain mediums to provide a light source output having the pulse repetition rate of the seed laser; a coherence buster operating on either or both of the output of the seed laser or amplifier gain mediums. | 03-12-2009 |
20090067457 | Ultraviolet laser light source pulse energy control system - A method and apparatus is disclosed which may comprise: a gas discharge laser system energy controller which may comprise: a laser system energy controller providing a first laser operating parameter control signal based on an error signal related to a value of the output energy of the laser system compared to a target value for output energy and an energy controller model of the value of the first laser operating parameter necessary to change the value of the laser system output energy to the target value; a first laser system operating parameter control signal modifier providing a modification to the first laser system operating parameter control signal based upon a controller signal modification model of the impact of a second laser system operating parameter on the value of the first laser system operating parameter necessary to change the value of the output energy to the target value. | 03-12-2009 |
20090057567 | Gas management system for a laser-produced-plasma EUV light source - Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path. | 03-05-2009 |
20090014668 | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave - A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO | 01-15-2009 |
20080310960 | Cross-flow fan impeller for a transversley excited, pulsed, gas discharge laser - A cross-flow fan impeller for circulating gas in a transversely excited, pulsed, gas discharge laser is disclosed and may comprise a plurality of hubs, the hubs spaced apart along the impeller's rotation axis and establishing at least two impeller segments wherein a first segment has an output flow within 80-120% of a second segment and the first and second segment having differing blade pass frequencies. In some embodiments of this aspect, the first segment may have n number of blades the second segment m number of blades, and m≢n. In one embodiment, the impeller may be configured with n=29 and m=23 and in another embodiment, the impeller may be configured with n=23 and m=19. The impeller may be configured wherein n and m are prime numbers. | 12-18-2008 |
20080283776 | Method and apparatus for EUV plasma source target delivery - An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice. | 11-20-2008 |
20080267242 | Laser system - A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant. | 10-30-2008 |
20080267241 | Laser system - An apparatus/method which may comprise: a very high power line narrowed lithography laser light source which may comprise: a solid state seed laser system which may comprise: a pre-seed laser providing a pre-seed laser output; a fiber amplifier receiving the pre-seed laser output and providing an amplified seed laser pulse which may comprise: a pulse having a nominal wavelength outside of the DUV range; a frequency converter converting to essentially the wavelength of the amplifier gain medium; a first and a second gas discharge laser amplifier gain medium operating at different repetition rates from that of the seed laser output; a beam divider providing the amplifier gain mediums with output pulses from the seed laser; a beam combiner combining the outputs of each respective amplifier gain medium to provide a laser output light pulse beam having the pulse repetition rate of the solid state seed laser system. | 10-30-2008 |
20080253413 | Laser lithography system with improved bandwidth control - A method and apparatus may comprise a seed laser, along with an amplifier laser amplifying the output of the seed laser. A bandwidth metrology module may provide a bandwidth measurement and a bandwidth error signal may be provided using a bandwidth set point. A differential timing system responsive to the error signal can selectively adjust a differential firing time between the seed laser and amplifier laser. A beam dimension and center wavelength control system may adjust a beam dimension, within the cavity of the seed laser, to select bandwidth, and may adjust center wavelength at the same time, using a plurality of beam expansion prisms and at least one other prism or other optical element in the cavity to select center wavelength. | 10-16-2008 |
20080253408 | Method and apparatus to control output spectrum bandwidth of MOPO or MOPA laser - An apparatus and method which may comprise a seed laser defining an optical cavity producing an output. An amplifier may amplify the seed laser output. A bandwidth error signal generator may provide a bandwidth error signal from measured bandwidth and a target. A bandwidth selection element, which may comprise an adjustable sized aperture external to the cavity of the seed laser may selectively alter the bandwidth of the seed laser output. A bandwidth control system may control the bandwidth control element and also selectively adjust a differential firing time between the seed laser and amplifier or another bandwidth selection actuator to cooperated (coarsely or finely) with the bandwidth selection element to control bandwidth of the laser system. | 10-16-2008 |
20080251738 | Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element - A method and apparatus is disclosed that may comprise an ultraviolet light source; an optical element within an optical path of the light source mounted on an optical element mount; a vibration damping mechanism operatively connected to the optical element or to the mount which may comprise a wire mesh pad. The optical element may comprise a center wavelength selection optical element, which may comprise a grating, a mirror, or a prism. The vibration damping mechanism may comprise the wire mesh pad comprising an elastic interface between a driving mechanism lever arm operable to move the optical element or the mount and a driving lever arm actuator. The vibration damping mechanism may comprise a mass damping mechanism comprising a mounting plate connected to the optical element or to the mount; a damping mass; the wire mesh pad comprising an elastic interface between the mounting plate and the damping mass. | 10-16-2008 |
20080232408 | Method and apparatus for stabilizing and tuning the bandwidth of laser light - According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal. | 09-25-2008 |
20080225908 | Laser system - An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism. | 09-18-2008 |
20080225904 | Laser system - An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the second seed laser. | 09-18-2008 |
20080205472 | Laser gas injection system - A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection. | 08-28-2008 |