CARL ZEISS LASER OPTICS GMBH Patent applications |
Patent application number | Title | Published |
20130176614 | EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY - An EUV collector mirror shell of an EUV collector for EUV lithography includes a body which has a light incidence-side front part having a reflective optically active area, a rear part, and a cavity between the front and rear parts. The cavity extends essentially along the entire optically active area, and the cavity serves to receive a cooling medium. The body also has at least one inlet and at least one outlet for the cooling medium. A plurality of flow-influencing elements are in the cavity, extending from the front part to the rear part, and connecting the front part to the rear part and monolithically formed with the front and rear parts. | 07-11-2013 |
20130083411 | MIRROR WITH DIELECTRIC COATING - A mirror with a dielectric coating ( | 04-04-2013 |
20120154935 | HOLDING ARRANGEMENT FOR AN OPTICAL ELEMENT - A holding arrangement for an optical element, in particular for a cylindrical lens, includes a basic structure surrounding an optical element and a mounting device by which the optical element is supported on the basic structure. The mounting device has two degrees of freedom so that the optical element can be supported by the mounting device in a manner that allows the optical element to rotate about both about an optical axis and an axis perpendicular to the optical axis. If the optical element is a cylindrical lens, the axis perpendicular to the optical axis can be an axis perpendicular to an axial direction of the cylindrical lens. The disclosure further relates to a manipulator unit for an optical system which includes a holding arrangement. | 06-21-2012 |
20120154895 | OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE - An optical system for generating a light beam for treating a substrate in a substrate plane is disclosed. The light beam has a beam length in a first dimension perpendicular to the propagation direction of the light beam and a beam width in a second dimension perpendicular to the first dimension and also perpendicular to the light propagation direction. | 06-21-2012 |
20120153189 | OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE - An optical system for generating a light beam for treating a substrate arranged in a substrate plane is disclosed. The optical system includes first and second optical arrangements. | 06-21-2012 |
20120140341 | HOLDING ARRANGEMENT FOR AN OPTICAL ELEMENT - A holding arrangement for an optical element includes a basic structure surrounding an optical element and a mounting device by which the optical element can be supported on the basic structure with two degrees of freedom for a rotational movement about an optical axis and a translational movement along a first axis which extends perpendicularly to the optical axis and intersects the optical axis in a center. The mounting device includes four joint locations arranged point-symmetrically with respect to the center and at least one parallel rocker which is displaceable parallel to the first axis. A manipulator unit includes a holding arrangement. | 06-07-2012 |
20120099612 | BANDWIDTH NARROWING MODULE FOR SETTING A SPECTRAL BANDWIDTH OF A LASER BEAM - The disclosure provides a bandwidth narrowing module for setting a spectral bandwidth of a laser beam of a laser light source. The bandwidth narrowing module includes a beam expanding module for expanding a laser beam transversely with respect to a propagation direction of the laser beam and comprising a reflection grating. A first optical component of the bandwidth narrowing module is configured so that a disturbance with a cylindrical portion about a first axis transversely with respect to an optical axis of the bandwidth narrowing module can be impressed on a wavefront of a laser beam. The first optical component is embodied such that it is pivotable about a pivoting axis parallel to the first axis. | 04-26-2012 |
20110051267 | REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM - A reflective optical element ( | 03-03-2011 |
20110025992 | OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT - An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s) is(are) arranged without direct contact with the optical element(s). | 02-03-2011 |
20100328775 | OPTICAL ARRANGEMENT, METHOD OF USE, AND METHOD FOR DETERMINING A DIFFRACTION GRATING - An optical arrangement includes a light source which emits coherent light of a wavelength λ, and a diffraction grating which has a multiplicity of diffraction structures which follow one another periodically at the spacing of a grating period d and are arranged along a base surface, the individual diffraction structures respectively having a blaze flank and an antiblaze flank, the blaze flanks being arranged at an angle β and the antiblaze flanks being arranged at an angle α to the base surface, and respectively neighbouring blaze and antiblaze flanks enclosing an apex angle γ, and an incident light beam being arranged at a Littrow angle θ | 12-30-2010 |
20100079765 | METHOD FOR MEASURING A SPECTRUM OF A NARROWBAND LIGHT SOURCE, AND SPECTROMETER ARRANGEMENT - A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ≧1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon. | 04-01-2010 |
20100024865 | CONTINUOUS COATING INSTALLATION, METHODS FOR PRODUCING CRYSTALLINE SOLAR CELLS, AND SOLAR CELL - A continuous coating installation is disclosed. The installation includes a vacuum chamber having a supply opening for supplying a substrate to be coated and a discharge opening for discharging the coated substrate. The installation also includes a physical vapour deposition device for coating a surface of the substrate, and a laser crystallization system for simultaneously illuminating at least one sub-partial area of a currently coated partial area of the surface of the substrate with at least one laser beam. The installation further includes a transport device for transporting the substrate in a feedthrough direction from the supply opening to the discharge opening and for continuously or discontinuously moving the substrate during the coating thereof in the feedthrough direction. | 02-04-2010 |
20090244712 | OPTICAL SYSTEM AND METHOD FOR SHAPING A PROFILE OF ALASER BEAM - An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element ( | 10-01-2009 |
20090231718 | OPTICAL ILLUMINATION SYSTEM FOR CREATING A LINE BEAM - In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface. | 09-17-2009 |
20090201955 | ILLUMINATION APPARATUS AND METHOD FOR CONTROLLING ENERGY OF A LASER SOURCE - The disclosure relates to an illuminating apparatus for illuminating a sample on a work stage, optionally with a relatively narrow illuminating line of relatively controlled energy, as well as methods for controlling energy of a laser source when illuminating a sample on a work stage with a relatively narrow illuminating line. | 08-13-2009 |
20090027776 | METHOD FOR COATING AN OPTICAL COMPONENT FOR A LASER ARRANGEMENT AND RELATED OPTICAL COMPONENT - A method for coating an optical component comprises providing the optical component. The optical component has a surface formed with parallel, periodically structured surface sections each having a first flank and a second flank. The first flank and the second flank of each surface section are furthermore inclined with respect to one another, and the first flank is formed such that it is smaller than the second flank. The method furthermore comprises at least partly applying a coating to at least the first flank of each surface section. The surface coating has a metal layer and a dielectric multilayer and the metal layer is applied before the dielectric multilayer. The second flank is not coated or is coated with a layer thickness that is formed such that it is smaller than a layer thickness of the surface coating of the first flank. | 01-29-2009 |
20080316748 | ILLUMINATION SYSTEM - Illumination systems and related components and methods are disclosed. | 12-25-2008 |