Patent application number | Description | Published |
20080269937 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPUTER-READABLE STORAGE MEDIUM - A substrate processing system of the present invention includes a transfer-in/out section for transferring-in/out a substrate and a processing section for performing a plurality of processing and treatments on the substrate, in which a throughput of substrate processing at a pre-stage performed from when the substrate is transferred in from the transfer-in/out section to when the substrate is transferred out to the external apparatus is set higher than a throughput of substrate processing at a post-stage performed from when the substrate is returned from the external apparatus into the processing section to when the substrate is returned into the transfer-in/out section. | 10-30-2008 |
20090081009 | SUBSTRATE TREATMENT APPARATUS - A substrate treatment apparatus is disclosed. The substrate treatment apparatus includes: a cassette loading portion on which a cassette for containing a substrate is loaded when the cassette is carried to/from outside of the substrate treatment apparatus; a substrate treatment portion for performing a treatment on the substrate; a substrate carrying portion for carrying the substrate in the cassette loaded on the cassette loading portion to the substrate treatment portion, and carrying the substrate that has been subjected to the treatment by the substrate treatment portion to the cassette on the cassette loading portion; a vacant cassette loading portion on which the cassette caused to be vacant by carrying the substrate to the substrate treatment portion is temporarily loaded; and a vacant cassette transfer mechanism for transferring the vacant cassette between the vacant cassette loading portion and the cassette loading portion. | 03-26-2009 |
20090142713 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD - A substrate processing system is used for a light exposure apparatus which performs light exposure at least twice on each of substrates. The system includes a carrier block, and a process section configured to process each of substrates transferred from the carrier block one by one. The process section includes a first coating process section configured to perform a first coating process, a first developing process section configured to perform a first developing process, a second coating process section configured to perform a second coating process, and a second developing process section configured to perform a second developing process. The system further includes an interface block configured to transfer substrates between the process section and the light exposure apparatus, and a substrate transfer mechanism configured to transfer substrates among them. | 06-04-2009 |
20090144008 | Filler metal installation position checking method and filler metal installation position checking system - The present invention is a filler metal installation position checking method and a filler metal installation position checking system for confirming difference between installation position and designed position of a filler metal embedded in a wall surface. A standard surface target | 06-04-2009 |
20090185151 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFER METHOD - A substrate processing system ( | 07-23-2009 |
20090248192 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CONVEYANCE METHOD - A substrate processing system ( | 10-01-2009 |
20100090123 | SCANNING IRRADIATION DEVICE OF CHARGED PARTICLE BEAM - An inexpensive scanning irradiation device of a particle beam is obtained without using a rotating gantry. A first scanning electromagnet and a second scanning electromagnet, whose deflection surfaces of the particle beam are the same, and which bend the particle beam having an incident beam axis angle of approximately 45 degrees relative to a horizontal direction in reverse directions to each other; an electromagnet rotation driving mechanism which integrates the first and the second scanning electromagnets and rotates these scanning electromagnets around the incident beam axis; and a treatment bed are provided. The particle beam deflected by the first and the second scanning electromagnets can be obtained at a range of −45 degrees to +45 degrees in deflection angle from an incident beam axis direction. | 04-15-2010 |
20110108737 | PARTICLE BEAM IRRADIATION APPARATUS - In order to obtain a particle beam irradiation apparatus that enlarges the dose distribution of beam spots while suppressing a decrease of the maximum available range of a charged particle beam, the particle beam irradiation apparatus includes a particle beam acceleration means; particle beam transport means; scanning apparatus that includes first scanning means and second scanning means, and two-dimensionally scans the beam; and irradiation control means that controls the scanning apparatus so as to irradiate the beam onto a target region including a plurality of small regions. The irradiation control means controls the first scanning means so as to scan the beam over a small region serving as an irradiation subject among the plurality of the small regions, and controls the second scanning means so as to change the small region serving as the irradiation subject to be a different small region among the plurality of the small regions. | 05-12-2011 |
20110117492 | PHOTORESIST COATING AND DEVELOPING APPARATUS, SUBSTRATE TRANSFER METHOD AND INTERFACE APPARATUS - A photoresist coating and developing apparatus | 05-19-2011 |
20110218429 | PARTICLE BEAM THERAPY SYSTEM - There is obtained a particle beam therapy system in which the beam size is reduced. There are provided an accelerator | 09-08-2011 |
20110260074 | PARTICLE BEAM THERAPY SYSTEM - The objective of the present invention is to reduce the effect of the hysteresis of a scanning electromagnet so as to obtain a particle beam therapy system that realizes high-accuracy beam irradiation. There are included an irradiation management apparatus ( | 10-27-2011 |
20110292356 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD - Provided is a substrate processing system including a group controller which determines a combination of processing apparatuses having the shortest total processing time including the processing end time in a final processing apparatus, determines a predictable elapsed time up to a processing start time by a predetermined downstream processing apparatus for a wafer lot from a processing end time of the wafer lot by a predetermined processing apparatus in the combination of the processing apparatuses, and determines a timing of discharging the substrate to the predetermined processing apparatus or an upstream processing apparatus of the predetermined processing apparatus so that the predictable elapsed time is set within a predetermined time when the predictable elapsed time exceeds the predetermined time. | 12-01-2011 |
20140061498 | BEAM DATA PROCESSING APPARATUS AND PARTICLE BEAM THERAPY SYSTEM - A beam data processing apparatus has a plurality of channel data conversion units that convert a plurality of analogue signals outputted from a position monitor into digital signals, a position size processing unit that calculates a beam position, based on voltage information items obtained through processing by the plurality of channel data conversion units, an abnormality determination processing unit that determines the beam position and generates a position abnormality signal, and an integrated control unit that controls the plurality of channel data conversion units in such a way that while a beam is stopped at an irradiation spot, digital signal conversion processing is implemented two or more times; the channel data conversion unit has a plurality of A/D converters, a demultiplexer that distributes analogue signals, and a multiplexer that switches respective digital signals processed by the ND converters so as to output them to the position size processing unit. | 03-06-2014 |