Patent application number | Description | Published |
20150198872 | PHASE SHIFT MASK, PATTERNING METHOD USING THE SAME AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME - A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area. | 07-16-2015 |
20150234286 | PATTERNING METHOD USING SURFACE PLASMON - A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask. | 08-20-2015 |
20150268693 | DISPLAY APPARATUS - A display apparatus includes a display portion configured to display an image, a frame surrounding the display portion, and a block in which a groove is defined. The frame includes a plurality of protrusions. The protrusions have same shapes and are arranged spaced apart by a uniform gap. The groove of the block is configured to receive a protrusion of the frame. | 09-24-2015 |
20150277026 | DISPLAY DEVICE - A display device in a display panel; a backlight unit configured to provide light to the display panel, the display pan& being arranged at a side of a first surface of the backlight unit; and a first light adjustment unit configured to be arranged at a side of a second surface of the backlight unit opposite to the first surface of the backlight unit, the first light adjustment unit including a plurality of reflection portions, reflection portions of the plurality of reflection portions being rotatable so as to be switchable between a light transmission mode and a light reflection mode. | 10-01-2015 |
20150293438 | PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME - A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region. | 10-15-2015 |
20150309763 | SYSTEM AND METHOD FOR IMAGE DISPLAY - An image display system includes a plurality of unit display devices, an image data buffer, and a location recognition unit. The location recognition unit recognizes the locations of the unit display devices and provides the image data buffer with location data. When the image data driver determines that the unit display devices are arranged in a first pattern, the plurality of unit display devices together displays a first image that corresponds to the first pattern. | 10-29-2015 |
20160033857 | MASK FOR PHOTOLITHOGRAPHY, METHOD OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING SUBSTRATE USING THE SAME - A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer. | 02-04-2016 |
20160109793 | MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING A DISPLAY PANEL USING THE SAME - A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other. | 04-21-2016 |