Patent application number | Description | Published |
20090032075 | METHODS AND APPARATUS FOR LIQUID CHEMICAL DELIVERY - In a first aspect, an apparatus for chemical delivery to a scrubber is provided. The apparatus comprises: a liquid delivery module comprising: a first input adapted to receive a first input flow of a dilutant; a second input adapted to receive a second input flow of a chemistry; one or more flow couplers coupled to the first input and the second input, and adapted to combine the first input flow and the second input flow into a combined flow; a mixing element coupled to the one or more flow couplers, and adapted to mix the combined flow such that a homogeneity of the combined flow is increased; a flow splitter coupled to the mixing element and adapted to generate at least a first output flow and a second output flow from the combined flow; a first output coupled to the flow splitter and adapted to direct the first output flow toward a first scrubber dispensing element; and a second output coupled to the flow splitter and adapted to direct the second output flow toward a second scrubber dispensing element. Numerous other aspects are provided. | 02-05-2009 |
20090042481 | METHOD OF CALIBRATING OR COMPENSATING SENSOR FOR MEASURING PROPERTY OF A TARGET SURFACE - A method of calibrating or compensating a sensor for measuring property of target surface is provided. In one embodiment, a liquid reference surface is formed on a platen. A sensor is used to measure a feature property of the reference surface. The measured feature property of the reference surface may be used to calibrate the sensor. Further, the sensor is used to measure the feature property of a polishing pad. The measured feature property of the reference surface may be used to compensate the measured feature property of the polishing pad. | 02-12-2009 |
20110079245 | ROLLER ASSEMBLY FOR A BRUSH CLEANING DEVICE IN A CLEANING MODULE - Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate. | 04-07-2011 |
20130332682 | High Sampling Rate Sensor Buffering in Semiconductor Processing Systems - Embodiments of the invention are directed toward systems and/or methods that buffer data from various sensors with a high sampling rate in a semiconductor processing system. Such sampling can provide better data about the processing for diagnosing the conditions leading up to a processing fault in the system. | 12-12-2013 |
20140069890 | SUBSTRATE POLISHING AND FLUID RECYCLING SYSTEM - Embodiments of the present invention are generally directed to a substrate polishing and slurry recycling system. The system includes an extendable gutter that may be positioned to collect processing slurry from the polishing pad during processing and deliver the consumed slurry to a reclamation tank. The reclaimed slurry may be treated and mixed with fresh slurry for delivery to the polishing pad during subsequent substrate polishing. The extendable gutter may be positioned in a second position during rinsing of the polishing pad so that rinsing fluid passes underneath the gutter and is removed from the system without mixing with the reclaimed slurry. | 03-13-2014 |
20140138355 | Recording Measurements by Sensors for a Carrier Head - A pressure control assembly for a carrier head of a polishing apparatus includes a pressure supply line configured to fluidically connect to a chamber of a carrier head, a sensor to responsive to pressure in the chamber and configured to generate a signal representative of the pressure, and a pneumatic control unit configured to receive the signal, to control a pressure applied to the pressure supply line, and to record the signal in a non-transitory storage media of a storage device removably attached to the pneumatic control unit. | 05-22-2014 |
20140273762 | Polishing Pad with Secondary Window Seal - A polishing article has a polishing surface and an aperture, the aperture including a first section and a second section. The polishing article includes a projection extending inwardly into the aperture. The polishing article includes a lower portion on a side of the first surface farther from the polishing surface. A window has a first portion positioned in the first section of the aperture and a second portion extending into the second section of the aperture. The window has a second surface substantially parallel to the polishing surface. A first adhesive adheres the first surface of the projection to the second surface of the window to secure the window to the projection and a second adhesive of different material composition than the first adhesive. The second adhesive is positioned laterally between the second portion of the window and the lower portion of the polishing article. | 09-18-2014 |