Patent application number | Description | Published |
20090075087 | SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES - New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating. | 03-19-2009 |
20090270299 | Composition for removing protective layer in fabrication of MEMS and method for removing same - There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition. | 10-29-2009 |
20090270300 | Composition for removing protective layer in fabrication of mems and method for removing same - There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition. | 10-29-2009 |
20110171478 | ACID-ETCH RESISTANT, PROTECTIVE COATINGS - New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system. | 07-14-2011 |
20120130004 | SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES - New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer to which may or may not be crosslinked upon heating. | 05-24-2012 |
20130201635 | FLUORINATED SILANE COATING COMPOSITIONS FOR THIN WAFER BONDING AND HANDLING - This invention is related to compositions that prepare substrate surfaces to enable temporary wafer bonding during microelectronics manufacturing, especially using a zonal bonding process. This invention, which comprises compositions made from fluorinated silanes blended in a polar solvent, can be used to form surface coatings or treatments having a high contact angle with water (>85°). The resulting silane solutions are stable at room temperature for longer than one month. | 08-08-2013 |
Patent application number | Description | Published |
20090100536 | Transgenic plants with enhanced agronomic traits - This invention provides transgenic plant cells with recombinant DNA for expression of proteins that are useful for imparting enhanced agronomic trait(s) to transgenic crop plants. This invention also provides transgenic plants and progeny seed comprising the transgenic plant cells where the plants are selected for having an enhanced trait selected from the group of traits consisting of enhanced water use efficiency, enhanced cold tolerance, increased yield, enhanced nitrogen use efficiency, enhanced seed protein and enhanced seed oil. Also disclosed are methods for manufacturing transgenic seed and plants with enhanced traits. | 04-16-2009 |
20100186105 | YIELD AND STRESS TOLERANCE IN TRANSGENIC PLANTS III - Polynucleotides and polypeptides incorporated into expression vectors have been introduced into plants and were ectopically expressed. The polypeptides of the invention have been shown to confer at least one regulatory activity and confer increased yield, greater height, greater early season growth, greater canopy coverage, greater stem diameter, greater late season vigor, increased secondary rooting, more rapid germination, greater cold tolerance, greater tolerance to water deprivation, reduced stomatal conductance, altered C/N sensing, increased low nitrogen tolerance, increased low phosphorus tolerance, or increased tolerance to hyperosmotic stress as compared to the control plant as compared to a control plant. | 07-22-2010 |
20100186106 | YIELD AND STRESS TOLERANCE IN TRANSGENIC PLANTS IV - Polynucleotides and polypeptides incorporated into expression vectors have been introduced into plants and were ectopically expressed. The polypeptides of the invention have been shown to confer at least one regulatory activity and confer increased yield, greater height, greater early season growth, greater canopy coverage, greater stem diameter, greater late season vigor, increased secondary rooting, more rapid germination, greater cold tolerance, greater tolerance to water deprivation, reduced stomatal conductance, altered C/N sensing, increased low nitrogen tolerance, increased low phosphorus tolerance, or increased tolerance to hyperosmotic stress as compared to the control plant as compared to a control plant. | 07-22-2010 |
20100192249 | YIELD AND STRESS TOLERANCE IN TRANSGENIC PLANTS II - Polynucleotides and polypeptides incorporated into expression vectors have been introduced into plants and were ectopically expressed. The polypeptides of the invention have been shown to confer at least one regulatory activity and confer increased yield, greater height, greater early season growth, greater canopy coverage, greater stem diameter, greater late season vigor, increased secondary rooting, more rapid germination, greater cold tolerance, greater tolerance to water deprivation, reduced stomatal conductance, altered C/N sensing, increased low nitrogen tolerance, increased low phosphorus tolerance, or increased tolerance to hyperosmotic stress as compared to the control plant as compared to a control plant. | 07-29-2010 |
20110258734 | GENE SEQUENCES AND USES THEREOF IN PLANTS - This invention provides transgenic plant cells with recombinant DNA for expression of proteins that are useful for imparting enhanced agronomic trait(s) to transgenic crop plants. This invention also provides transgenic plants and progeny seed comprising the transgenic plant cells where the plants are selected for having an enhanced trait selected from the group of traits consisting of enhanced water use efficiency, enhanced cold tolerance, increased yield, enhanced nitrogen use efficiency, enhanced seed protein and enhanced seed oil. Also disclosed are methods for manufacturing transgenic seed and plants with enhanced traits. | 10-20-2011 |
20130074202 | GENE SEQUENCES AND USES THEREOF IN PLANTS - This invention provides transgenic plant cells with recombinant DNA for expression of proteins that are useful for imparting enhanced agronomic trait(s) to transgenic crop plants. This invention also provides transgenic plants and progeny seed comprising the transgenic plant cells where the plants are selected for having an enhanced trait selected from the group of traits consisting of enhanced water use efficiency, enhanced cold tolerance, increased yield, enhanced nitrogen use efficiency, enhanced seed protein and enhanced seed oil. Also disclosed are methods for manufacturing transgenic seed and plants with enhanced traits. | 03-21-2013 |
Patent application number | Description | Published |
20080227193 | Nematode Fatty Acid Desaturase-Like Sequences - Nucleic acid molecules from nematodes encoding fatty acid desaturase polypeptides are described. Fatty acid desaturase-like polypeptide sequences are also provided, as are vectors, host cells, and recombinant methods for production of fatty acid desaturase-like nucleotides and polypeptides. Also described are screening methods for identifying inhibitors and/or activators of fatty acid desaturase-like polypeptides, as well as methods for antibody production. | 09-18-2008 |
20080227955 | Nematode PAN and ZP Receptor-Like Sequences - Nucleic acid molecules from nematodes encoding PAN and ZP domain containing receptor polypeptides are described. PANZP polypeptide sequences are also provided, as are vectors, host cells, and recombinant methods for production of PANZP nucleotides and polypeptides. Also described are screening methods for identifying inhibitors and/or activators, as well as methods for antibody production. | 09-18-2008 |
20090123986 | Nematode Phosphoethanolamine N-Methyltransferase-Like Sequences - Nucleic acid molecules from nematodes encoding phosphoethanolamine n-methyltransferase polypeptides are described. PEAMT-like polypeptide sequences are also provided, as are vectors, host cells, and recombinant methods for production of PEAMT-like nucleotides and polypeptides. Also described are screening methods for identifying inhibitors and/or activators, as well as methods for antibody production. | 05-14-2009 |
20090203127 | Nematode Fatty Acid Desaturase-Like Sequences - Nucleic acid molecules from nematodes encoding fatty acid desaturase polypeptides are described. Fatty acid desaturase-like polypeptide sequences are also provided, as arc vectors, host cells, and recombinant methods for production of fatty acid desaturase-like nucleotides and polypeptides. Also described are screening methods for identifying inhibitors and/or activators of fatty acid desaturase-like polypeptides, as well as methods for antibody production. | 08-13-2009 |
20100248357 | Nematode Fatty Acid Desaturase-Like Sequences - Nucleic acid molecules from nematodes encoding fatty acid desaturase polypeptides are described. Fatty acid desaturase-like polypeptide sequences are also provided, as are vectors, host cells, and recombinant methods for production of fatty acid desaturase-like nucleotides and polypeptides. Also described are screening methods for identifying inhibitors and/or activators of fatty acid desaturase-like polypeptides, as well as methods for antibody production. | 09-30-2010 |
20130029425 | Genetic Inhibition by Double-Stranded RNA - A process is provided of introducing an RNA into a living cell to inhibit gene expression of a target gene in that cell. The process may be practiced ex vivo or in vivo. The RNA has a region with double-stranded structure. Inhibition is sequence-specific in that the nucleotide sequences of the duplex region of the RNA and of a portion of the target gene are identical. The present invention is distinguished from prior art interference in gene expression by antisense or triple-strand methods. | 01-31-2013 |
20130230492 | GENETIC INHIBITION BY DOUBLE-STRANDED RNA - A process is provided of introducing an RNA into a living cell to inhibit gene expression of a target gene in that cell. The process may be practiced ex vivo or in vivo. The RNA has a region with double-stranded structure. Inhibition is sequence-specific in that the nucleotide sequences of the duplex region of the RNA and of a portion of the target gene are identical. The present invention is distinguished from prior art interference in gene expression by antisense or triple-strand methods. | 09-05-2013 |
20140350083 | Genetic Inhibition by Double-Stranded RNA - A process is provided of introducing an RNA into a living cell to inhibit gene expression of a target gene in that cell. The process may be practiced ex vivo or in vivo. The RNA has a region with double-stranded structure. Inhibition is sequence-specific in that the nucleotide sequences of the duplex region of the RNA and of a portion of the target gene are identical. The present invention is distinguished from prior art interference in gene expression by antisense or triple-strand methods. | 11-27-2014 |
Patent application number | Description | Published |
20100234228 | NOVEL SURFACTANTS AND FORMULATIONS - A herbicidal composition is provided comprising an aqueous solution of N-phosphonomethylglycine, predominantly in the form of the potassium salt thereof, at a concentration of at least 300 g a.e./l of the composition; and a surfactant component in solution or stable suspension, emulsion, or dispersion in the water, comprising one or more surfactants in a total amount of about 20 to about 300 g/l of the composition, wherein the composition has a viscosity of less than about 250 centipoise at 0° C. or a Gardner color value less than 10. | 09-16-2010 |
20110034332 | Herbicidal compositions containing N-phosphonomethyl glycine and an auxin herbicide - Herbicidal compositions are provided which cause rapid symptomology while delivering long term control of regrowth of plants. The herbicidal concentrate compositions comprise N-phosphonomethylglycine or a herbicidal derivative thereof, an auxin herbicide or a herbicidal derivative thereof, and at least one surfactant. Also provided is a method for killing or controlling the growth of certain plants by contacting the foliage of the plants with the diluted concentrate composition. | 02-10-2011 |
20140364313 | HERBICIDAL COMPOSITIONS CONTAINING N-PHOSPHONOMETHYL GLYCINE AND AN AUXIN HERBICIDE - Herbicidal compositions are provided which cause rapid symptomology while delivering long term control of regrowth of plants. The herbicidal concentrate compositions comprise N-phosphonomethylglycine or a herbicidal derivative thereof, an auxin herbicide or a herbicidal derivative thereof, and at least one surfactant. Also provided is a method for killing or controlling the growth of certain plants by contacting the foliage of the plants with the diluted concentrate composition. | 12-11-2014 |