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Wu, VT

Ernest Y. Wu, Essex Junction, VT US

Patent application numberDescriptionPublished
20090006014Non-Destructive Electrical Characterization Macro and Methodology for In-Line Interconnect Spacing Monitoring - A method for determining a line-to-line spacing of a device. The method includes experimentally determining a slope k01-01-2009
20120187974Dual Stage Voltage Ramp Stress Test for Gate Dielectrics - A testing system for testing the integrity of a gate dielectric includes a testing apparatus, the testing apparatus including a test probe configured to contact and provide a voltage across the gate dielectric and to measure a current passing through the gate dielectric. The testing system also includes a computing device coupled to the testing apparatus an causing the testing apparatus to apply a constant voltage as part of a first test to the gate dielectric through the test probe until a first predetermined current is measured passing through the gate dielectric and to apply an increasing voltage to the gate dielectric after the first predetermined current is measured.07-26-2012
20120303303CORRECTION FOR STRESS INDUCED LEAKAGE CURRENT IN DIELECTRIC RELIABILITY EVALUATIONS - Methods, apparatus, and computer program products for evaluating current transients measured during an electrical stress evaluation of a dielectric layer in a semiconductor device. Measured current transients are fit to an equation representing a time dependence for stress induced leakage currents. The measured current transients are corrected based upon stress currents computed from the equation to define corrected current transients.11-29-2012
20140195175MEASURING DIELECTRIC BREAKDOWN IN A DYNAMIC MODE - Embodiments of the present invention provide a method, system, and program product for testing a semiconductor device to measure dielectric breakdown. A computer applies a plurality of stress voltages to a semiconductor device under test. The computer determines a plurality of current measurements until a failure criteria occurs, using a predefined voltage ramp rate and a predefined plurality of stress voltage steps, wherein the number of the plurality of current measurements is less than or equal to the number of the predefined plurality of voltage steps. The computer identifies a stress voltage at which the semiconductor device fails. The computer calculates a frequency dependent voltage acceleration factor based on the quotient of the natural log of the voltage at which the semiconductor device under test failed to the natural log of the predetermined voltage ramp rate.07-10-2014
20140351785DIELECTRIC RELIABILITY ASSESSMENT FOR ADVANCED SEMICONDUCTORS - Embodiments relate to methods, computer systems and computer program products for performing a dielectric reliability assessment for an advanced semiconductor. Embodiments include receiving data associated with a test of a macro of the advanced semiconductor to a point of dielectric breakdown. Embodiments also include scaling the data for the macro down to a reference area and extracting a parameter for a Weibull distribution from the scaled down data for the reference area. Embodiments further include deriving a cluster factor (α) from the scaled down data for the reference area and projecting a failure rate for a larger area of the advanced semiconductor based on the extracted parameter, the cluster factor and the recorded data associated with the dielectric breakdown of the macro.11-27-2014
20150061724CORRECTION FOR STRESS INDUCED LEAKAGE CURRENT IN DIELECTRIC RELIABILITY EVALUATIONS - Methods, apparatus, and computer program products for evaluating current transients measured during an electrical stress evaluation of a dielectric layer in a semiconductor device. Measured current transients are fit to an equation representing a time dependence for stress induced leakage currents. The measured current transients are corrected based upon stress currents computed from the equation to define corrected current transients.03-05-2015

Patent applications by Ernest Y. Wu, Essex Junction, VT US

Junru Wu, S. Burlington, VT US

Patent application numberDescriptionPublished
20100072759Piezoelectric Vibrational Energy Harvesting Systems Incorporating Parametric Bending Mode Energy Harvesting - Vibrational energy harvesting (VEH) structures that include resonant beams each having a fundamental resonance frequency and a parametric mode frequency and including at least one piezoelectric layer for generating electrical charge in response to each of fundamental-resonance excitation and parametric-mode excitation of that beam. Circuitry is provided for harvesting the electrical charge from the resonant beam. In some embodiments, the parametric mode frequency of the beam is tuned to be close to its fundamental resonance frequency so as to increase the effective bandwidth of a VEH structure. The effective bandwidth of a VEH structure can be further increased by tuning ones of multiple parametric-mode-enabled resonant beams to slightly different fundamental resonance frequencies and parametric mode frequencies.03-25-2010

Junru Wu, South Burlington, VT US

Patent application numberDescriptionPublished
20110214246Aeroacoustic Duster - The aero-acoustic duster invention disclosed herein provides for high particle removal rate from surfaces with low energy expenditure relative to competing vacuum-based devices. The device removes particulate matter from a surface using a two-step process: 1. Acoustic radiation is used to break the adhesive bonds between dust and the surface, forcing particles into a mode where they continuously bounce up and down on the surface; and, 2. A bounded vortex is generated over the surface, with suction in the vortex center and jets for blowing air along the periphery. The jets are tilted in the tangential direction to induce vortex motion within the suction region. The vortex is said to be bounded because streamlines originating in the downward jets are entrained back into the central vortex.09-08-2011

Jun-Ru Wu, South Burlingon, VT US

Patent application numberDescriptionPublished
20110000443APPARATUS AND METHOD FOR ULTRASOUND TREATMENT OF AQUATIC ORGANISMS - The invention provides a method of treating a target area with an ultrasound wave pattern, including: providing an ultrasound apparatus having an ultrasound wave generator operatively attached to a plurality of transducers, coupled to an immersible support and configured to emit an ultrasound wave; immersing the apparatus into a water environment; positioning the apparatus proximate to a target area to treat at least one in situ organism; and emitting a pattern of ultrasound waves from the transducers, the pattern of ultrasound waves additive in effect and emitted onto the target area to threat an in situ underwater organism.01-06-2011
20120061329APPARATUS AND METHOD FOR ULTRASOUND TREATMENT FOR BALLAST WATER MANAGEMENT - The invention provides a method of treating a target area with an ultrasound wave pattern, including: providing an ultrasound apparatus having an ultrasound wave generator operatively attached to a plurality of transducers, coupled to an immersible support and configured to emit an ultrasound wave; immersing the apparatus into a water environment; positioning the apparatus proximate to a target area to treat at least one in situ organism; and emitting a pattern of ultrasound waves from the transducers, the pattern of ultrasound waves additive in effect and emitted onto the target area to threat an in situ underwater organism.03-15-2012

Jun-Ru Wu, South Burlington, VT US

Patent application numberDescriptionPublished
20080257830APPARATUS AND METHOD FOR ULTRASOUND TREATMENT OF AQUATIC ORGANISMS - The invention provides a method of treating a target area with an ultrasound wave pattern, including: providing an ultrasound apparatus having an ultrasound wave generator operatively attached to a plurality of transducers, coupled to an immersible support and configured to emit an ultrasound wave; immersing the apparatus into a water environment; positioning the apparatus proximate to a target area to treat at least one in situ organism; and emitting a pattern of ultrasound waves from the transducers, the pattern of ultrasound waves additive in effect and emitted onto the target area to threat an in situ underwater organism.10-23-2008
20140289997Aeroacoustic Duster - The invention disclosed herein provides for high particle removal rate and/or heat transfer from surfaces. The device removes particulate matter from a surface using a bounded vortex generated over the surface, with suction in the vortex center and jets for blowing air along the periphery. The jets are tilted in the tangential direction to induce vortex motion within the suction region. The vortex is said to be bounded because streamlines originating in the downward jets are entrained back into the central vortex.10-02-2014

Richard S. Wu, Winooski, VT US

Patent application numberDescriptionPublished
20150109873REGULATED POWER GATING FOR GROWABLE MEMORY - A circuit for an integrated circuit power gating system includes a header device connected to a bank of a segmented memory array. The circuit is structured and arranged to: apply a ground input to a gate of the header device to activate the bank, and apply a regulated voltage to the gate of the header device to deactivate the bank. The circuit also includes a precharge circuit that charges the gate of the header device to a precharge voltage that is greater than ground and less than the regulated voltage04-23-2015

Xindong Wu, Essex Junction, VT US

Patent application numberDescriptionPublished
20100179955Relational Pattern Discovery Across Multiple Databases - A system and method of identifying relational patterns across a plurality of databases using a data structure and the data structure itself. The data structure including one or more data node branches, each of the one or more data node branches including one or more data nodes, each of the one or more data nodes representing a data item of interest and corresponding data item support values for the data item across the plurality of databases in relation to other data items represented in the data node branch. The data structure can be used to mine one or more relational patterns considering pattern support data across the plurality of databases at the same time.07-15-2010
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