Patent application number | Description | Published |
20080200036 | Printable Etching Media For Silicon Dioxide and Silicon Nitride Layers - The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas. | 08-21-2008 |
20080210298 | Combined Etching and Doping Media for Silicon Dioxide Layers and Underlying Silicon - The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of silicon dioxide layers and also for the doping of underlying silicon layers. The present invention also relates secondly to a process in which these media are employed. | 09-04-2008 |
20080210660 | Medium For Etching Oxidic, Transparent, Conductive Layers - The present invention relates to a novel dispensable medium for etching doped tin oxide layers having non-Newtonian flow behaviour for etching surfaces in the production of displays and/or solar cells and to the use thereof. In particular, it relates to corresponding particle-free compositions by means of which fine structures can be etched selectively without damaging or attacking adjacent areas. | 09-04-2008 |
20080217576 | Etching Media for Oxidic, Transparent, Conductive Layers - The present invention relates to a novel etching medium for the structuring of transparent, conductive layers, as are used, for example, in the production of liquid-crystal displays (LCDS) using flat-panel screens or of organic light-emitting displays (OLEDs) or in thin-film solar cells. Specifically, it relates to particle-free compositions by means of which fine structures can be etched selectively in oxidic, transparent and conductive layers without damaging or attacking adjacent areas. The novel liquid etching medium can advantageously be applied by means of printing processes to the oxidic, transparent, conductive layers to be structured. Subsequent heat treatment accelerates or initiates the etching process. | 09-11-2008 |
20100068889 | PARTICLE-CONTAINING ETCHING PASTES FOR SILICON SURFACES AND LAYERS - The present invention relates to particle-containing etching media in the form of etching pastes which are suitable for the full-area or selective etching of extremely fine lines or structures in silicon surfaces and layers and in glass-like surfaces formed from suitable silicon compounds. The present invention also relates to the use of the pastes according to the invention in processes for etching surfaces of this type. | 03-18-2010 |
20100068890 | PRINTABLE MEDIUM FOR ETCHING OXIDIC, TRANSPARENT AND CONDUCTIVE LAYERS - The present invention relates to novel printable etching media having improved properties for use in the process for the production of solar cells. These are corresponding particle-containing compositions by means of which extremely fine lines and structures can be etched very selectively without damaging or attacking adjacent areas. | 03-18-2010 |
20110021037 | COMPOSITION FOR MANUFACTURING SIO2 RESIST LAYERS AND METHOD OF ITS USE - The present invention relates to compositions, which are useful for the generation of patterned or structured SiO | 01-27-2011 |
20120032108 | PRINTABLE ETCHING MEDIA FOR SILICON DIOXIDE AND SILICON NITRIDE LAYERS - The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas. | 02-09-2012 |
20120214270 | PROCESS FOR THE PRODUCTION OF SOLAR CELLS COMPRISING A SELECTIVE EMITTER - The present invention relates to a process for the production of solar cells comprising a selective emitter using an improved etching-paste composition which has significantly improved selectivity for silicon layers | 08-23-2012 |
20130065359 | SELECTIVELY ETCHING OF A CARBON NANO TUBES (CNT) POLYMER MATRIX ON A PLASTIC SUBSTRUCTURE - The present invention refers to a method for selectively structuring of a polymer matrix comprising CNT (carbon nano tubes) on a flexible plastic substructure. The method also includes a suitable etching composition, which allows to proceed the method in a mass production. | 03-14-2013 |
20130334454 | FORMULATIONS OF PRINTABLE ALUMINIUM OXIDE INKS - The present invention relates to the use of printable inks for the formation of Al | 12-19-2013 |
20130341769 | ALUMINIUM OXIDE-BASED METALLISATION BARRIER - The present invention relates to aluminium oxide-based passivation layers which simultaneously act as diffusion barrier for underlying wafer layers against aluminium and other metals. Furthermore, a process and suitable compositions for the production of these layers are described. | 12-26-2013 |
20140000481 | ALUMINIUM OXIDE PASTES AND PROCESS FOR THE USE THEREOF | 01-02-2014 |
20140054260 | SELECTIVELY ETCHING OF A POLYMER MATRIX ON PET - The present invention relates to a method for selectively etching and patterning with high resolution of flexible polymer matrices, which may comprise Ag nano tubes. | 02-27-2014 |
20140166613 | STRUCTURING OF ANTISTATIC AND ANTIREFLECTION COATINGS AND OF CORRESPONDING STACKED LAYERS - The present invention relates to compositions which are particularly suitable for the etching and structuring of transparent, conductive antireflection coatings and of corresponding stacked layers, which are preferably present in touch-sensitive display screens or display elements. The latter are generally also known as touch-sensitive displays, touch panels or touch screens. In particular, these are compositions by means of which fine structures can be etched selectively into conductive transparent oxidic layers and into corresponding layer stacks. | 06-19-2014 |
20140291287 | SELECTIVE ETCHING OF A MATRIX COMPRISING SILVER NANO WIRES - The present invention refers to a method for selectively structuring of a polymer matrix comprising AgNW (silver nano wires) or CNTs (carbon nano tubes) or comprising mixtures of AgNW and CNTs on a flexible plastic substructure or solid glass sheet. The method also includes a suitable etching composition, which allows to proceed the method in a mass production. | 10-02-2014 |