Patent application number | Description | Published |
20120248292 | LENS-FREE WIDE-FIELD SUPER-RESOLUTION IMAGING DEVICE - A system for imaging objects within a sample includes an image sensor and a sample holder configured to hold the sample, the sample holder disposed adjacent to the image sensor. The system further includes an illumination source configured to scan in two or three dimensions relative to the sensor array and illuminate the sample at a plurality of different locations. The illumination source may include, by way of example, LEDs, laser diodes, or even a screen or display from a portable electronic device. The system includes least one processor configured to reconstruct an image of the sample based on the images obtained from illumination source at the plurality of different scan positions. | 10-04-2012 |
20130105086 | HIGH EFFICIENCY TRIPLE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH PHASE CONTROL | 05-02-2013 |
20130258091 | METHOD AND DEVICE FOR HOLOGRAPHIC OPTO-FLUIDIC MICROSCOPY - A method and system of imaging a moving object within a microfluidic environment includes illuminating a first side of a flow cell configured to carry the moving object within a flow of carrier fluid with an illumination source emitting at least partially coherent light, the at least partially coherent light passing through an aperture prior to illuminating the flow cell. A plurality of lower resolution frame images of the moving object are acquired with an image sensor disposed on an opposing side of the flow cell, wherein the image sensor is angled relative to a direction of flow of the moving object within the carrier fluid. A higher resolution image is reconstructed of the moving object based at least in part on the plurality of lower resolution frame images. | 10-03-2013 |
20130280752 | LENS-FREE TOMOGRAPHIC IMAGING DEVICES AND METHODS - A system for three dimensional imaging of an object contained within a sample includes an image sensor, a sample holder configured to hold the sample, the sample holder disposed adjacent to the image sensor, and an illumination source comprising partially coherent light. The illumination source is configured to illuminate the sample through at least one of an aperture, fiber-optic cable, or optical waveguide interposed between the illumination source and the sample holder, wherein the illumination source is configured to illuminate the sample through a plurality of different angles. | 10-24-2013 |
20140160236 | LENSFREE HOLOGRAPHIC MICROSCOPY USING WETTING FILMS - A method of imaging a sample includes forming a monolayer wetting layer over a sample containing objects therein. A plurality of lower resolution images are obtained of the sample interposed between an illumination source and an image sensor, wherein each lower resolution image is obtained at discrete spatial locations. The plurality of lower resolution images of the sample are converted into a higher resolution image. One or more of an amplitude image and a phase image are reconstructed of the objects contained within the sample. | 06-12-2014 |
20140209244 | SKEW ELIMINATION AND CONTROL IN A PLASMA ENHANCED SUBSTRATE PROCESSING CHAMBER - Methods and apparatus for plasma-enhanced substrate processing are provided herein. In some embodiments, an apparatus for processing a substrate includes: a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber; a substrate support disposed in the process chamber; one or more inductive coils disposed above the dielectric lid to inductively couple RF energy into the processing volume above the substrate support; and one or more first electromagnets to form a first static magnetic field that is substantially vertical in direction and axisymmetric about a central processing axis of the process chamber, and having a magnitude of about 2 to about 10 gauss within the processing volume proximate the lid. | 07-31-2014 |
20140237840 | TUNABLE GAS DELIVERY ASSEMBLY WITH INTERNAL DIFFUSER AND ANGULAR INJECTION - Embodiments of the present invention relate to an apparatus for providing processing gases to a process chamber with improved uniformity. One embodiment of the present invention provides a gas delivery assembly. The gas delivery assembly includes a hub, a nozzle, and one or more gas diffusers disposed in the nozzle. The nozzle has a cylindrical body with a side wall and a top surface. A plurality of injection passages are formed inside the nozzle to deliver processing gases into the process chamber via a plurality of outlets disposed in the side wall. The injection passages are configured to direct process gases out of each outlet disposed in the side wall in a direction which is not radially aligned with a centerline of the hub. | 08-28-2014 |
20140262044 | MU METAL SHIELD COVER - Embodiments of the present invention generally relate to an apparatus for processing substrates having improved magnetic shielding. One embodiment of the present invention provides a plasma processing chamber having an RF match, a plasma source and a plasma region defined between a chamber ceiling and a substrate support. At least one of the RF match, plasma source and plasma region is shielded from any external magnetic field with a shielding material that has a relative magnetic permeability ranging from about 20,000 to about 200,000. As a result, the inherent process non-uniformities of the hardware may be reduced effectively without the overlaid non-uniformities from external factors such as earth's geomagnetic field. | 09-18-2014 |
20140273304 | METHODS FOR REDUCING ETCH NONUNIFORMITY IN THE PRESENCE OF A WEAK MAGNETIC FIELD IN AN INDUCTIVELY COUPLED PLASMA REACTOR - Methods and apparatus for plasma-enhanced substrate processing are provided herein. In some embodiments, a method is provided for processing a substrate in a process chamber having a plurality of electromagnets disposed about the process chamber to form a magnetic field within the process chamber at least at a substrate level. In some embodiments, the method includes determining a first direction of an external magnetic field present within the process chamber while providing no current to the plurality of electromagnets; providing a range of currents to the plurality of electromagnets to create a magnetic field within the process chamber having a second direction opposing the first direction; determining a desired magnitude in the second direction of the magnetic field over the range of currents; and processing a substrate in the process chamber using a plasma while statically providing the magnetic field at the desired magnitude. | 09-18-2014 |
20140367043 | METHOD FOR FAST AND REPEATABLE PLASMA IGNITION AND TUNING IN PLASMA CHAMBERS - Embodiments of the present invention include methods and apparatus for plasma processing in a process chamber using an RF power supply coupled to the process chamber via a matching network. In some embodiments, the method includes providing RF power to the process chamber by the RF power supply at a first frequency while the matching network is in a hold mode, adjusting the first frequency, using the RF power supply, to a second frequency during a first time period to ignite the plasma, adjusting the second frequency, using the RF power supply, to a known third frequency during a second time period while maintaining the plasma, and changing an operational mode of the matching network to an automatic tuning mode to reduce a reflected power of the RF power provided by the RF power supply. | 12-18-2014 |