Patent application number | Description | Published |
20080239261 | Run-off path to collect liquid for an immersion lithography apparatus - An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region. | 10-02-2008 |
20080316445 | Fluid Pressure Compensation for Immersion Lithography Lens - An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly ( | 12-25-2008 |
20090047608 | APPARATUS AND METHOD FOR TRANSFERRING FEATURES TO AN EDGE OF A WAFER - An edge shot (“ES”) exposure apparatus ( | 02-19-2009 |
20090051888 | Liquid jet and recovery system for immersion lithography - A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid. | 02-26-2009 |
20090161084 | Cleanup method for optics in immersion lithography - A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times. | 06-25-2009 |
20090174872 | Cleanup method for optics in immersion lithography - An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object. | 07-09-2009 |
20090195762 | Cleanup method for optics in immersion lithography - An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object. | 08-06-2009 |
20090236543 | Fluorescence Detection Using Lyman-alpha Line Illumination - A method and system is provided that takes advantage of the atmospheric transmission properties of the Hydrogen Lyman-α radiation line (121.6 nm wavelength) to illuminate a sample with high energy VUV photons at least partially in an atmospheric environment. Thus, according to the principles of the present invention, a sample is illuminated by radiation at the Hydrogen Lyman-α radiation line (121.6 nm wavelength), at least partially in an atmospheric environment, and luminescent radiation from the sample at longer wavelengths is detected. The high energy illuminating photons generate luminescent radiation from the sample at longer wavelengths, typically in the visible wavelength range, and this radiation can then be imaged, e.g. with a normal visible microscope. | 09-24-2009 |
20090262322 | Optical arrangement of autofocus elements for use with immersion lithography - A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. In addition, a gap is formed between a member and a surface, through which the exposure beam does not pass, of the optical element. A suction is provided to the gap. | 10-22-2009 |
20090310115 | APPARATUS AND METHOD FOR EXPOSING ADJACENT SITES ON A SUBSTRATE - An exposure apparatus ( | 12-17-2009 |
20090317751 | Optical arrangement of autofocus elements for use with immersion lithography - A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. A gap is formed between a member and a surface of the optical element through which the exposure beam does not pass. The liquid is supplied to the gap. | 12-24-2009 |
20100053588 | Substrate Stage movement patterns for high throughput While Imaging a Reticle to a pair of Imaging Locations - A new and useful optical imaging process is provided for imaging of a plurality of substrates, in a manner that makes efficient use of an optical imaging system with the capability to image a single reticle to a pair of imaging locations, and addresses the types of substrate stage movement patterns to accomplish such imaging in an efficient and effective manner. At least three substrates are imaged by moving their substrate stages in patterns whereby (i) two of the substrates are completely imaged at respective imaging locations, (ii) a substrate on at least one of the three stages is partially imaged at one imaging location and then partially imaged at the other imaging location, and (iii) the movement of the stages of the three substrates is configured to avoid movement of the stages of the three substrates in paths that would cause interference between movement of any one substrate stage with movement of any of the other substrate stages. | 03-04-2010 |
20100149513 | Fluid pressure compensation for immersion litography lens - An immersion lithography system compensates for displacement of the final optical element of the optical assembly caused by the immersion fluid. The system includes an optical assembly to project an image defined by a reticle onto a wafer. The optical assembly includes a final optical element spaced from the wafer by a gap. An immersion element supplies an immersion fluid into the gap and recovers any immersion fluid that escapes the gap. A fluid compensation system applies a force to the final optical element of the optical assembly to compensate for pressure variations of the immersion fluid. | 06-17-2010 |
20110031416 | Liquid jet and recovery system for immersion lithography - A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge. | 02-10-2011 |
20110235007 | Environmental system including a transport region for an immersion lithography apparatus - A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force. | 09-29-2011 |
20120019792 | Liquid jet and recovery system for immersion lithography - A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves. | 01-26-2012 |
20120075609 | OPTICAL ARRANGEMENT OF AUTOFOCUS ELEMENTS FOR USE WITH IMMERSION LITHOGRAPHY - A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass, and a gap formed between the member and the surface of the spherical lens element. The gap communicates with the space and includes lower and upper portions. A wafer is moved below and relative to the spherical lens element and the member, and the liquid is retained between the spherical lens element and the member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space. | 03-29-2012 |
20120268726 | Lyophobic Run-Off Path to Collect Liquid for an Immersion Lithography Apparatus - An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic. | 10-25-2012 |
20140055762 | OPTICAL ARRANGEMENT OF AUTOFOCUS ELEMENTS FOR USE WITH IMMERSION LITHOGRAPHY - A lithographic projection apparatus includes a projection system having a last element from which an exposure light is projected onto a wafer through liquid in a space under the last element. A light incident surface of the last element has a convex shape. A liquid retaining member is disposed adjacent to a surface of the last element through which the exposure light does not pass. The liquid retaining member has an undersurface under which liquid is retained. A gap is formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space. The liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer. | 02-27-2014 |