Van Kemenade
Henricus Petrus Van Kemenade, Eindhoven NL
Patent application number | Description | Published |
---|---|---|
20090308245 | METHOD AND DEVICE FOR REDUCING FORMATION OF PARTICULATE MATTER IN GAS STREAMS - A method and device for the reduction of particulate forming vapors in gases, the method comprising passing the gas stream through at least one channel ( | 12-17-2009 |
Johannes Trudo Cornelis Van Kemenade, Eindhoven NL
Patent application number | Description | Published |
---|---|---|
20080298054 | Lamp Assembly - The invention relates to a lamp assembly ( | 12-04-2008 |
20090168415 | METHOD AND SYSTEM FOR ADJUSTING THE LIGHT SETTING FOR A MULTI-COLOR LIGHT SOURCE - The present inventions relates to a method for adjusting the light setting for a multi-color light source, which method comprises receiving input from a user related to at least one of white color, hue, and chroma, and adjusting white color, hue, and chroma of the light source in accordance with the user input. The method is characterized in the step of automatically changing a current hue and chroma level when the user input is received. This automatic change makes possible to render the subsequent adjustment in setting perceivable for the user, which facilitates the adjustment of the light source. The present invention also relates to a corresponding system and computer program product. | 07-02-2009 |
20100053198 | COLOR SELECTION INPUT DEVICE AND METHOD - The invention relates to color selection input, for example by means of a color selection wheel or pad, particularly for a lighting system. The invention provides color selection means ( | 03-04-2010 |
Marc Van Kemenade, Waalre NL
Patent application number | Description | Published |
---|---|---|
20100123886 | Lithographic Apparatus and Device Manufacturing Method - A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields. | 05-20-2010 |
20120057142 | Lithographic Apparatus and Device Manufacturing Method - A lithographic apparatus and method are used for manufacturing a device. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate. A Higher Order Wafer Alignment (HOWA) model is applied so as to model higher order distortions across the substrate. The model is applied using at least one input parameter for which at least one intra-field effect has been taken into account. In an example, the intra-field effect taken into account is the ScanUp-ScanDown effect and/or the ScanLeft-ScanRight effect. | 03-08-2012 |
20120218533 | METHOD OF CALCULATING MODEL PARAMETERS OF A SUBSTRATE, A LITHOGRAPHIC APPARATUS AND AN APPARATUS FOR CONTROLLING LITHOGRAPHIC PROCESSING BY A LITHOGRAPHIC APPARATUS - Estimating model parameters of a lithographic apparatus and controlling lithographic processing by a lithographic apparatus includes performing an exposure using a lithographic apparatus projecting a pattern onto a wafer. A set of predetermined wafer measurement locations is measured. Predetermined and measured locations of the marks are used to generate radial basis functions. Model parameters of said substrate are calculated using the generated radial basis functions as a basis function across said substrate. Finally, the estimated model parameters are used to control the lithographic apparatus in order to expose the substrate. | 08-30-2012 |
Marc Van Kemenade, Eindhoven NL
Patent application number | Description | Published |
---|---|---|
20090195768 | Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark - An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle α with respect to the scribe lane direction: 0°<α<90° and a second area comprising second periodic structure formed by second mark lines extending in a second direction, the second direction being at a second angle β with respect to the scribe lane direction: −90°≦β<0°. | 08-06-2009 |
Paul Van Kemenade, Schijndel NL
Patent application number | Description | Published |
---|---|---|
20110066066 | DEVICE FOR THE DETECTION OF SYMPTOMATIC JAW BEHAVIOUR - A device for detecting symptomatic jaw behaviour in a user includes a mouthpiece ( | 03-17-2011 |