Patent application number | Description | Published |
20080284687 | Display apparatus - A display apparatus, that can prevent thermal destruction and burning with a simple structure, has been disclosed. In the apparatus it is judged that there is possibility of a pattern, whose area with high brightness is small, being displayed frequently, when a state in which the total light emission pulse number remains large occurs with high frequency, and if such a state is detected, the total light emission pulse number (sustain frequency) is reduced to prevent the thermal destruction and burning. | 11-20-2008 |
20080309651 | DRIVE CONTROL CIRCUIT DEVICE FOR FLAT PANEL DISPLAY APPARATUS - Provided is a technology related to a PDP apparatus and capable of realizing the efficiency improvement in the processing of a control circuit including the processing between a control circuit (waveform generating circuit unit) and a non-volatile memory (waveform ROM). In a control circuit of a PDP apparatus, an SFM (serial flash memory) is used as a non-volatile memory, and waveform decoding data and a waveform decoding address set are stored as a first waveform in the SFM. An LSI (waveform generating circuit LSI) stores the data from the waveform decoding data in a first SRAM in an internal SRAM unit and stores the data corresponding to one reading cycle (for example one SF) selected from the waveform decoding address set in a second SRAM in the internal SRAM unit. | 12-18-2008 |
20080316148 | PLASMA DISPLAY DEVICE AND METHOD OF DRIVING THE SAME - A technique capable of suppressing or preventing generation of flickers (blinks) by a sustain period control as well as capable of ensuring or enhancing display quality in a PDP device. The PDP device adjusts a sustain pulse of the sustain period for every subfield by selecting a combination of one or more than one cycle so that start and end timings of a field in fields before and after change are almost the same according to a display load ratio of the subfield of the field. Field weighted emission center positions then becomes almost the same, and flickers and the like are suppressed. | 12-25-2008 |
20100141691 | Display apparatus - A display apparatus, that can prevent thermal destruction and burning with a simple structure, has been disclosed. In the apparatus it is judged that there is possibility of a pattern, whose area with high brightness is small, being displayed frequently, when a state in which the total light emission pulse number remains large occurs with high frequency, and if such a state is detected, the total light emission pulse number (sustain frequency) is reduced to prevent the thermal destruction and burning. | 06-10-2010 |
20100207955 | VIDEO DISPLAY APPARATUS - In a display apparatus such as PDP, in order to obtain well-lighted video while suppressing an increase in power consumption, the luminance level of a specific region of a display panel is decreased in accordance with an average luminance level of the entire display panel. However, when a low-luminance region and a high-luminance region are mixed in display video, even the luminance of the low-luminance region is decreased and gray-scale crush is caused in some cases. An average luminance level for each region is detected, and a shading process is controlled for each region based on the detected region-specific average luminance level and the luminance level of input video. With this control, when the luminance level of the input video signal is higher than a predetermined threshold, the shading process is operated, and when the luminance level is lower than the predetermined threshold, the shading process is stopped. | 08-19-2010 |
Patent application number | Description | Published |
20090075409 | FABRICATION APPARATUS AND FABRICATION METHOD OF SEMICONDUCTOR DEVICE PRODUCED BY HEATING SUBSTRATE - A fabrication apparatus and fabrication method of a semiconductor device are provided, allowing the temperature distribution of a substrate to be rendered uniform. The fabrication apparatus for a semiconductor device includes a susceptor holding the substrate, a heater arranged at a back side of the susceptor, a support member located between the substrate and susceptor, including a support portion, and a spacer located between the susceptor and support member. The spacer has an opening formed corresponding to the site where said support portion is located, at an opposite face side of the support member. | 03-19-2009 |
20090148704 | VAPOR-PHASE PROCESS APPARATUS, VAPOR-PHASE PROCESS METHOD, AND SUBSTRATE - A vapor-phase process apparatus and a vapor-phase process method capable of satisfactorily maintaining quality of processes even when different types of processes are performed are obtained. A vapor-phase process apparatus includes a process chamber, gas supply ports serving as a plurality of gas introduction portions, and a gas supply portion (a gas supply member, a pipe, a flow rate control device, a pipe, and a buffer chamber). The process chamber allows flow of a reaction gas therein. The plurality of gas supply ports are formed in a wall surface (upper wall) of the process chamber along a direction of flow of the reaction gas. The gas supply portion can supply a gas into the process chamber at a different flow rate from each of one gas supply port and another gas supply port different from that one gas supply port among the plurality of gas supply ports. | 06-11-2009 |
20090197399 | METHOD OF GROWING GROUP III-V COMPOUND SEMICONDUCTOR, AND METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE AND ELECTRON DEVICE - Provided are a method of growing a group III-V compound semiconductor, and method of manufacturing a light-emitting device and an electron device, in which risks are reduced and nitrogen can be efficiently supplied at low temperatures. | 08-06-2009 |
20100047933 | SUBSTRATE, SUBSTRATE INSPECTING METHOD AND METHODS OF MANUFACTURING AN ELEMENT AND A SUBSTRATE - A substrate inspection method allowing inspection of all a plurality of substrates each provided at its surface with a plurality of layers by determining quality of the plurality of layers as well as methods of manufacturing the substrate and an element using the substrate inspection method are provided. The substrate inspection method includes a step of preparing the substrate provided at its main surface with the plurality of layers, a film forming step, a local etching step, and an inspection step or a composition analysis step. In the step, a concavity is formed in a region provided with an epitaxial layer of the main surface of the substrate by removing at least partially the epitaxial layer. In the inspection step, the inspection is performed on the layer exposed in the concavity. | 02-25-2010 |
20110177407 | ELECTROCHEMICAL REACTOR, METHOD FOR MANUFACTURING THE ELECTROCHEMICAL REACTOR, GAS DECOMPOSING ELEMENT, AMMONIA DECOMPOSING ELEMENT, AND POWER GENERATOR - [Object] To provide an electrochemical reactor that is small in size but high in throughput capacity, does not generate NOx or carbon dioxide, can be operated at a low running cost, is easy to handle during assembling, and has a simple structure and high durability, a method for manufacturing the reactor, a gas decomposing element, an ammonia decomposing element, and a power generator. | 07-21-2011 |
20110198566 | METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT AND LIGHT EMITTING ELEMENT - A method for manufacturing a light emitting element is directed to a method for manufacturing a light emitting element of a III-V group compound semiconductor having a quantum well structure including In and N, including the steps of: forming a well layer including In and N; forming a barrier layer having a bandgap wider than a bandgap of the well layer; and supplying a gas including N and interrupting epitaxial growth after the step of forming the well layer and before the step of forming the barrier layer. In the step of interrupting epitaxial growth, the gas having decomposition efficiency higher than decomposition efficiency of decomposition from N | 08-18-2011 |
20120003142 | VAPOR-PHASE PROCESS APPARATUS, VAPOR-PHASE PROCESS METHOD, AND SUBSTRATE - A vapor-phase process apparatus and a vapor-phase process method capable of satisfactorily maintaining quality of processes even when different types of processes are performed are obtained. A vapor-phase process apparatus includes a process chamber, gas supply ports serving as a plurality of gas introduction portions, and a gas supply portion (a gas supply member, a pipe, a flow rate control device, a pipe, and a buffer chamber). The process chamber allows flow of a reaction gas therein. The plurality of gas supply ports are formed in a wall surface (upper wall) of the process chamber along a direction of flow of the reaction gas. The gas supply portion can supply a gas into the process chamber at a different flow rate from each of one gas supply port and another gas supply port different from that one gas supply port among the plurality of gas supply ports. | 01-05-2012 |
20120024227 | VAPOR-PHASE PROCESS APPARATUS, VAPOR-PHASE PROCESS METHOD, AND SUBSTRATE - A vapor-phase process apparatus and a vapor-phase process method capable of satisfactorily maintaining quality of processes even when different types of processes are performed are obtained. A vapor-phase process apparatus includes a process chamber, gas supply ports serving as a plurality of gas introduction portions, and a gas supply portion (a gas supply member, a pipe, a flow rate control device, a pipe, and a buffer chamber). The process chamber allows flow of a reaction gas therein. The plurality of gas supply ports are formed in a wall surface (upper wall) of the process chamber along a direction of flow of the reaction gas. The gas supply portion can supply a gas into the process chamber at a different flow rate from each of one gas supply port and another gas supply port different from that one gas supply port among the plurality of gas supply ports. | 02-02-2012 |
20120118234 | METAL ORGANIC CHEMICAL VAPOR DEPOSITION EQUIPMENT - Metal organic chemical vapor deposition equipment is metal organic chemical vapor deposition equipment for forming a film on a substrate by using a reactant gas, and includes a susceptor heating the substrate and having a holding surface for holding the substrate, and a flow channel for introducing the reactant gas to the substrate. The susceptor is rotatable with the holding surface kept facing an inner portion of the flow channel, and a height of the flow channel along a flow direction of the reactant gas is kept constant from a position to a position, and is monotonically decreased from the position to the downstream side. It is thereby possible to improve film formation efficiency while allowing the formed film to have a uniform thickness. | 05-17-2012 |
20130084514 | GAS DECOMPOSITION COMPONENT, AMMONIA DECOMPOSITION COMPONENT, POWER GENERATION APPARATUS, ELECTROCHEMICAL REACTION APPARATUS, AND METHOD FOR PRODUCING GAS DECOMPOSITION COMPONENT - Provided are a gas decomposition component in which an electrochemical reaction is used to reduce the running cost and high treatment performance can be achieved; and a method for producing the gas decomposition component. The gas decomposition component includes a cylindrical MEA | 04-04-2013 |
20130089806 | GAS DECOMPOSITION COMPONENT - Provided is a gas decomposition component that employs an electrochemical reaction and can have high treatment performance, in particular, an ammonia decomposition component. The gas decomposition component includes a MEA | 04-11-2013 |
20130089810 | GAS DECOMPOSITION COMPONENT, AMMONIA DECOMPOSITION COMPONENT, POWER GENERATION APPARATUS, AND ELECTROCHEMICAL REACTION APPARATUS - Provided is a gas decomposition component that employs an electrochemical reaction to reduce the running cost and can have high treatment performance. A gas decomposition component includes a cylindrical-body MEA | 04-11-2013 |
20130101920 | CATALYST, ELECTRODE, FUEL CELL, GAS DETOXIFICATION APPARATUS, AND METHODS FOR PRODUCING CATALYST AND ELECTRODE - Provided are a catalyst, an electrode, a fuel cell, a gas detoxification apparatus, and the like that can promote a general electrochemical reaction causing gas decomposition or the like. A catalyst according to the present invention is used for promoting an electrochemical reaction and is chain particles | 04-25-2013 |
20130171542 | GAS DECOMPOSITION COMPONENT, POWER GENERATION APPARATUS, AND METHOD FOR DECOMPOSING GAS - A gas decomposition component includes a cylindrical membrane electrode assembly (MEA) including a first electrode layer, a cylindrical solid electrolyte layer, and a second electrode layer in order from an inside toward an outside, in a layered structure, wherein an end portion of the cylindrical MEA is sealed, a gas guide pipe is inserted through another end portion of the cylindrical MEA into an inner space of the cylindrical MEA to form a cylindrical channel between the gas guide pipe and an inner circumferential surface of the cylindrical MEA, and a gas flowing through the gas guide pipe toward the sealed portion is made to flow out of the gas guide pipe in a region near the sealed portion so that a flow direction of the gas is reversed and the gas flows through the cylindrical channel in a direction opposite to the flow direction in the guide pipe. | 07-04-2013 |
20130224612 | GAS DECOMPOSITION COMPONENT, POWER GENERATION APPARATUS, AND METHOD FOR DECOMPOSING GAS - Provided are a gas decomposition component, a power generation apparatus including the gas decomposition component, and a method for decomposing a gas. A gas decomposition component includes a cylindrical MEA including a first electrode layer, a cylindrical solid electrolyte layer, and a second electrode layer in order from an inside toward an outside, in a layered structure; a first gas channel through which a first gas that is decomposed flows, the first gas channel being disposed inside the cylindrical MEA; and a second gas channel through which a second gas flows, the second gas channel being disposed outside the cylindrical MEA, wherein the gas decomposition component further includes a heater for heating the entirety of the component; and a preheating pipe through which the first gas to be introduced into the first gas channel passes beforehand to be preheated. | 08-29-2013 |
20130260280 | GAS DECOMPOSITION COMPONENT, METHOD FOR PRODUCING GAS DECOMPOSITION COMPONENT, AND POWER GENERATION APPARATUS - Provided are a gas decomposition component, a method for producing a gas decomposition component, and a power generation apparatus. A gas decomposition component | 10-03-2013 |