Patent application number | Description | Published |
20090042124 | RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND - A resist composition includes (A) a compound represented by the following formula (I): | 02-12-2009 |
20090246651 | PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR - A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter. | 10-01-2009 |
20090280416 | BLACK PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER AND METHOD OF PRODUCING THE SAME - A black photosensitive resin composition, a light-shielding color filter using the composition and its production method are provided, the black photosensitive resin composition including: a black colorant; a compound represented by Formula (I) or (II) as defined in the specification; and a photopolymerization initiator. | 11-12-2009 |
20100248149 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION - Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group. | 09-30-2010 |
20110102528 | COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD - An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated. | 05-05-2011 |
20110124824 | DISPERSION COMPOSITION, POLYMERIZABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER, SOLID-STATE IMAGE PICK-UP ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, WAFER LEVEL LENS, AND IMAGE PICK-UP UNIT - A dispersion composition is provided in which the dispersibility of titanium black is high, the sedimentation of titanium black over time is suppressed, and overall dispersibility and storage stability are high. Further, a polymerizable composition is provided in which favorable coating property on a substrate and even film thickness can be obtained, generation of residue in an unexposed region when a pattern is formed can be suppressed, and favorable pattern shape having any steps after exposure/development can be obtained. The dispersion composition contains (A) titanium black, (B) a graft copolymer and (C) a solvent. | 05-26-2011 |
20110159433 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION - Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition. | 06-30-2011 |
20110267714 | NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, AND PLANOGRAPHIC PRINTING PLATE PRECURSOR - Provided is a photopolymerizable composition that is highly sensitive to light having wavelengths of 365 nm and 405 nm, and is capable of forming a curable film that can suppress deterioration in physical properties of the film due to heat-aging. The photopolymerizable composition include: (A) an oxime polymerization initiator which includes a condensed ring formed by containing two or more rings selected from an aromatic ring and a heterocyclic ring, and a cyclic structure which is connected to the condensed ring, the cyclic structure containing a carbonyl group and having an oxime group directly connected to the carbonyl group; and (B) a polymerizable compound. | 11-03-2011 |
20110318691 | RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An embodiment of the composition contains any of compounds of general formula (I) below: | 12-29-2011 |
20110318693 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An embodiment of the composition contains a resin (P) containing a repeating unit (A) that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid. The repeating unit (A) contains a cation structure with a monocyclic or polycyclic heterocycle containing a nitrogen atom. | 12-29-2011 |
20120003583 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION - An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. | 01-05-2012 |
20120003585 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises (A) any of the compounds of General Formula (I) below and (B) a resin that contains the residue (c) of a compound having an ionization potential value lower than that of phenol and when acted on by an acid, exhibits an increased solubility in an alkali developer, | 01-05-2012 |
20120003590 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation. | 01-05-2012 |
20120100481 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive composition, including: (1) a low molecular compound having a molecular weight of 500 to 5,000 and containing (G) an acid-decomposable group; and (2) a compound capable of generating an acid of 305 Å | 04-26-2012 |
20120231393 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below. | 09-13-2012 |
20120301817 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD - An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method. | 11-29-2012 |
20130029254 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION - A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity is 1.2 or less, (b) the weight average molecular weight is from 2,000 to 6,500, and (c) the glass transition temperature (Tg) is 140° C. or more. | 01-31-2013 |
20130171562 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - An actinic ray- or radiation-sensitive resin composition according to the present invention comprises a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å | 07-04-2013 |
20130302726 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND - A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. | 11-14-2013 |
20140030643 | ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION - Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula ( | 01-30-2014 |
20140099572 | ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below. | 04-10-2014 |
20140127627 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME - Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less,
| 05-08-2014 |
20140242502 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group. | 08-28-2014 |
Patent application number | Description | Published |
20090017273 | PIGMENT DISPERSION LIQUID, CURABLE COMPOSITION, COLOR FILTER PRODUCED USING THE SAME, AND SOLID STATE IMAGING DEVICE - The present invention provides a pigment dispersion liquid including a pigment, a compound having a cyclic urea structure and having an acid group or a basic group, a dispersant, and a solvent. The pigment may be a pigment having a urea structure or an imide structure. The pigment may also be a pigment having a barbituric skeleton. | 01-15-2009 |
20090170015 | Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor - The invention provides a dye-containing negative curable composition containing at least a dye soluble in an organic solvent, a photopolymerization initiator, a photopolymerizable compound containing an amine structure, and an organic solvent; a color filter formed from the dye-containing negative curable composition; a method of producing the color filter; and a solid-state image sensor. | 07-02-2009 |
20090236509 | PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER, METHOD OF PRODUCING THE SAME AND SOLID-STATE IMAGE SENSOR - The invention provides a photosensitive resin composition including a black colorant, a photopolymerizable compound, a resin, a photopolymerization initiator and a solvent, the composition capable of forming a light-shielding color filter having a ratio OD | 09-24-2009 |
20110287235 | PIGMENT DISPERSION LIQUID, CURABLE COMPOSITION, COLOR FILTER PRODUCED USING THE SAME, AND SOLID STATE IMAGING DEVICE - A color filter or solid state imaging device comprising a colored pattern formed from a curable composition which includes (A) a pigment, (B) a compound having a defined cyclic urea structure and having an acid group or a basic group, (C) a dispersant, (D) a solvent, (E) a radical polymerizable compound, and (F) a photopolymerization initiator. The pigment may be a pigment having a urea structure or an imide structure. The pigment may also be a pigment having a barbituric skeleton. | 11-24-2011 |
20120094235 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below. | 04-19-2012 |
20130306919 | PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER, METHOD OF PRODUCING THE SAME AND SOLID-STATE IMAGE SENSOR - The invention provides a photosensitive resin composition that includes titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 mgKOH/g to 250 mgKOH/g, a resin B having an acid value of from 26 mgKOH/g to 65 mgKOH/g, a photopolymerization initiator, and a solvent, the photopolymerization initiator including an oxime photopolymerization compound. | 11-21-2013 |